JP7082042B2 - 可撓性基体シートに孔を連続形成する方法およびそれに関する製品 - Google Patents
可撓性基体シートに孔を連続形成する方法およびそれに関する製品 Download PDFInfo
- Publication number
- JP7082042B2 JP7082042B2 JP2018500609A JP2018500609A JP7082042B2 JP 7082042 B2 JP7082042 B2 JP 7082042B2 JP 2018500609 A JP2018500609 A JP 2018500609A JP 2018500609 A JP2018500609 A JP 2018500609A JP 7082042 B2 JP7082042 B2 JP 7082042B2
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- laser
- laser beam
- glass
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/266—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/55—Working by transmitting the laser beam through or within the workpiece for creating voids inside the workpiece, e.g. for forming flow passages or flow patterns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Laser Beam Processing (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562190823P | 2015-07-10 | 2015-07-10 | |
| US62/190,823 | 2015-07-10 | ||
| PCT/US2016/041485 WO2017011296A1 (en) | 2015-07-10 | 2016-07-08 | Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018528078A JP2018528078A (ja) | 2018-09-27 |
| JP2018528078A5 JP2018528078A5 (enExample) | 2019-08-22 |
| JP7082042B2 true JP7082042B2 (ja) | 2022-06-07 |
Family
ID=56550361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018500609A Active JP7082042B2 (ja) | 2015-07-10 | 2016-07-08 | 可撓性基体シートに孔を連続形成する方法およびそれに関する製品 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11186060B2 (enExample) |
| EP (1) | EP3319911B1 (enExample) |
| JP (1) | JP7082042B2 (enExample) |
| KR (1) | KR102499697B1 (enExample) |
| CN (1) | CN107835794A (enExample) |
| TW (1) | TWI724005B (enExample) |
| WO (1) | WO2017011296A1 (enExample) |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3024137B1 (fr) * | 2014-07-24 | 2016-07-29 | Saint Gobain | Procede de fabrication de feuilles de verre de forme complexe |
| US10429553B2 (en) | 2015-02-27 | 2019-10-01 | Corning Incorporated | Optical assembly having microlouvers |
| JP2018525313A (ja) * | 2015-08-21 | 2018-09-06 | コーニング インコーポレイテッド | 基板ウェブをバルク処理するためのシステム及び方法 |
| US10410883B2 (en) | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10134657B2 (en) | 2016-06-29 | 2018-11-20 | Corning Incorporated | Inorganic wafer having through-holes attached to semiconductor wafer |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| US20180018493A1 (en) * | 2016-07-14 | 2018-01-18 | Keycore Technology Corp. | Fingerprint identification device and manufacturing method thereof |
| WO2018020145A1 (fr) * | 2016-07-25 | 2018-02-01 | Amplitude Systemes | Procédé et appareil pour la découpe de matériaux par multi-faisceaux laser femtoseconde |
| US10821707B2 (en) * | 2018-05-17 | 2020-11-03 | Vaon, Llc | Multi-layer, flat glass structures |
| US11203183B2 (en) | 2016-09-27 | 2021-12-21 | Vaon, Llc | Single and multi-layer, flat glass-sensor structures |
| US11243192B2 (en) | 2016-09-27 | 2022-02-08 | Vaon, Llc | 3-D glass printable hand-held gas chromatograph for biomedical and environmental applications |
| US10073305B2 (en) * | 2016-10-07 | 2018-09-11 | Keycore Technology Corp. | Liquid crystal device with fingerprint identification function |
| US10073288B2 (en) * | 2016-10-07 | 2018-09-11 | Keycore Technology Corp. | Liquid crystal module with fingerprint identification function |
| US11608291B2 (en) | 2016-11-04 | 2023-03-21 | Corning Incorporated | Micro-perforated panel systems, applications, and methods of making micro-perforated panel systems |
| JP7217585B2 (ja) | 2017-04-13 | 2023-02-03 | 株式会社ディスコ | 分割方法 |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| JP7288427B2 (ja) | 2017-07-11 | 2023-06-07 | コーニング インコーポレイテッド | タイル張り状ディスプレイとその製造方法 |
| US10919794B2 (en) | 2017-12-04 | 2021-02-16 | General Atomics | Method of cutting glass using a laser |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| US10424606B1 (en) | 2018-04-05 | 2019-09-24 | Corning Incorporated | Systems and methods for reducing substrate surface disruption during via formation |
| US11152294B2 (en) | 2018-04-09 | 2021-10-19 | Corning Incorporated | Hermetic metallized via with improved reliability |
| US11344973B2 (en) | 2018-04-19 | 2022-05-31 | Corning Incorporated | Methods for forming holes in substrates |
| US11059131B2 (en) | 2018-06-22 | 2021-07-13 | Corning Incorporated | Methods for laser processing a substrate stack having one or more transparent workpieces and a black matrix layer |
| KR102742290B1 (ko) * | 2018-07-30 | 2024-12-12 | 코닝 인코포레이티드 | 단열 창 유닛 |
| KR20210064266A (ko) | 2018-09-20 | 2021-06-02 | 재단법인 공업기술연구원 | 얇은 유리 상의 유리-관통 비아를 위한 구리 금속화 |
| JP2022504169A (ja) * | 2018-10-04 | 2022-01-13 | コーニング インコーポレイテッド | マルチセクションディスプレイを形成するためのシステムおよび方法 |
| DE102018220240A1 (de) * | 2018-11-20 | 2020-05-20 | Flabeg Deutschland Gmbh | Verfahren zum Vereinzeln eines Glaselements in eine Mehrzahl von Glasbauteilen und Schneidsystem zur Durchführung des Verfahrens |
| US11760682B2 (en) | 2019-02-21 | 2023-09-19 | Corning Incorporated | Glass or glass ceramic articles with copper-metallized through holes and processes for making the same |
| TW202103830A (zh) * | 2019-03-25 | 2021-02-01 | 美商康寧公司 | 在玻璃中形成穿孔之方法 |
| KR102728430B1 (ko) * | 2019-05-14 | 2024-11-08 | 쇼오트 글라스 테크놀로지스 (쑤저우) 코퍼레이션 리미티드. | 높은 굽힘 강도의 박형 유리 기판 및 이의 제조 방법 |
| DE102019003822A1 (de) * | 2019-06-02 | 2020-12-03 | Keming Du | Verfahren zur Bearbeitung transparenter Materialien |
| JP7264461B2 (ja) * | 2019-06-05 | 2023-04-25 | 株式会社Nsc | 平面ガラスアンテナの製造方法。 |
| CN110640337B (zh) * | 2019-08-20 | 2021-06-22 | 江苏大学 | 一种液态流动涂层辅助激光背向湿刻加工低锥度玻璃深孔的装置及方法 |
| CN110526564A (zh) * | 2019-09-16 | 2019-12-03 | 蓝思科技(长沙)有限公司 | 一种玻璃裂片方法 |
| CN110773871B (zh) * | 2019-11-08 | 2021-10-12 | 合肥工业大学 | 一种在空速管的非平表面上制备防结冰表面的制备方法 |
| DE102019219462A1 (de) * | 2019-12-12 | 2021-06-17 | Flabeg Deutschland Gmbh | Verfahren zum Schneiden eines Glaselements und Schneidsystem |
| CN113119285A (zh) * | 2020-01-16 | 2021-07-16 | 大族激光科技产业集团股份有限公司 | 陶瓷工件激光打磨砂的方法 |
| WO2022055671A1 (en) * | 2020-09-09 | 2022-03-17 | Corning Incorporated | Glass substrates with blind vias having depth uniformity and methods for forming the same |
| CN112192325B (zh) * | 2020-10-09 | 2022-04-15 | 北京理工大学 | 飞秒激光在透明硬脆材料上加工微纳米尺度通孔的方法 |
| JP2023548304A (ja) * | 2020-10-30 | 2023-11-16 | コーニング インコーポレイテッド | 可変ベッセルビームを用いた部分的な微小穴の形成システムおよび方法 |
| JP7354084B2 (ja) * | 2020-11-17 | 2023-10-02 | Towa株式会社 | レーザ加工装置及び加工品の製造方法 |
| JP2022119546A (ja) * | 2021-02-04 | 2022-08-17 | 株式会社Nsc | 識別コード付きガラス基板およびその製造方法 |
| CN112992880B (zh) * | 2021-04-25 | 2023-08-15 | 江西沃格光电股份有限公司 | 一种Mini-LED背光板通孔的形成方法及电子设备 |
| EP4086030B1 (en) * | 2021-05-07 | 2025-01-22 | Infineon Technologies AG | Method for separating substrates |
| CN113371989A (zh) * | 2021-05-26 | 2021-09-10 | 苏州镭明激光科技有限公司 | 一种半导体芯片的裂片方法及裂片装置 |
| KR102687819B1 (ko) * | 2021-12-20 | 2024-07-24 | 디아이티 주식회사 | 베셀 빔을 이용한 절단 시스템 |
| CN114274384A (zh) * | 2021-12-24 | 2022-04-05 | 唐山国芯晶源电子有限公司 | 一种石英晶圆的切割工艺方法 |
| KR102664778B1 (ko) * | 2022-05-10 | 2024-05-14 | 주식회사 필옵틱스 | 적외선 레이저를 이용한 고속 정밀 관통홀 형성 방법 |
| CN115073015A (zh) * | 2022-06-24 | 2022-09-20 | 河北光兴半导体技术有限公司 | 玻璃盖板的加工方法 |
| CN115385563A (zh) * | 2022-08-11 | 2022-11-25 | 合肥金龙浩科技有限公司 | 一种手机后盖加工工艺 |
| CN115555740A (zh) * | 2022-10-08 | 2023-01-03 | 苏州科韵激光科技有限公司 | 一种玻璃面板钻孔装置及钻孔方法 |
| CN115876108B (zh) * | 2023-03-01 | 2023-10-24 | 菲特(天津)检测技术有限公司 | 内径测量方法、装置及计算机可读存储介质 |
| CN116638198B (zh) * | 2023-05-25 | 2024-08-09 | 深圳市盛三友电子有限公司 | 高精度偏光片边缘检测装置、偏光片开孔方法及加工方法 |
| US20250210586A1 (en) * | 2023-12-26 | 2025-06-26 | Intel Corporation | Semiconductor package substrate dicing and edge passivation |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150166395A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Method for Rapid Laser Drilling of Holes in Glass and Products Made Therefrom |
| US20150166391A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser cut composite glass article and method of cutting |
Family Cites Families (493)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1790397A (en) | 1931-01-27 | Glass workins machine | ||
| US2682134A (en) | 1951-08-17 | 1954-06-29 | Corning Glass Works | Glass sheet containing translucent linear strips |
| US2749794A (en) | 1953-04-24 | 1956-06-12 | Corning Glass Works | Illuminating glassware and method of making it |
| US2932087A (en) | 1954-05-10 | 1960-04-12 | Libbey Owens Ford Glass Co | Template cutting apparatus for bent sheets of glass or the like |
| GB1242172A (en) | 1968-02-23 | 1971-08-11 | Ford Motor Co | A process for chemically cutting glass |
| US3647410A (en) | 1969-09-09 | 1972-03-07 | Owens Illinois Inc | Glass ribbon machine blow head mechanism |
| US3729302A (en) | 1970-01-02 | 1973-04-24 | Owens Illinois Inc | Removal of glass article from ribbon forming machine by vibrating force |
| US3775084A (en) | 1970-01-02 | 1973-11-27 | Owens Illinois Inc | Pressurizer apparatus for glass ribbon machine |
| US3695498A (en) | 1970-08-26 | 1972-10-03 | Ppg Industries Inc | Non-contact thermal cutting |
| US3695497A (en) | 1970-08-26 | 1972-10-03 | Ppg Industries Inc | Method of severing glass |
| DE2231330A1 (de) | 1972-06-27 | 1974-01-10 | Agfa Gevaert Ag | Verfahren und vorrichtung zur erzeugung eines scharfen fokus |
| DE2757890C2 (de) | 1977-12-24 | 1981-10-15 | Fa. Karl Lutz, 6980 Wertheim | Verfahren und Vorrichtung zum Herstellen von Behältnissen aus Röhrenglas, insbesondere Ampullen |
| US4441008A (en) | 1981-09-14 | 1984-04-03 | Ford Motor Company | Method of drilling ultrafine channels through glass |
| US4546231A (en) | 1983-11-14 | 1985-10-08 | Group Ii Manufacturing Ltd. | Creation of a parting zone in a crystal structure |
| JPS6174794A (ja) | 1984-09-17 | 1986-04-17 | Mitsubishi Electric Corp | レ−ザ加工装置の加工ヘツド |
| JPS6246930A (ja) | 1985-08-21 | 1987-02-28 | Bandou Kiko Kk | ガラス板の割断装置 |
| US4646308A (en) | 1985-09-30 | 1987-02-24 | Spectra-Physics, Inc. | Synchronously pumped dye laser using ultrashort pump pulses |
| US4749400A (en) | 1986-12-12 | 1988-06-07 | Ppg Industries, Inc. | Discrete glass sheet cutting |
| EP0272582B1 (en) | 1986-12-18 | 1994-05-18 | Sumitomo Chemical Company, Limited | Light control sheets |
| JPS63192561A (ja) | 1987-02-04 | 1988-08-09 | Nkk Corp | マルチ切断装置 |
| US5104523A (en) | 1987-05-29 | 1992-04-14 | Nippon Sheet Glass Co., Ltd. | Glass-plate sorting system |
| US4918751A (en) | 1987-10-05 | 1990-04-17 | The University Of Rochester | Method for optical pulse transmission through optical fibers which increases the pulse power handling capacity of the fibers |
| IL84255A (en) | 1987-10-23 | 1993-02-21 | Galram Technology Ind Ltd | Process for removal of post- baked photoresist layer |
| JPH01179770A (ja) | 1988-01-12 | 1989-07-17 | Hiroshima Denki Gakuen | 金属とセラミックスとの接合方法 |
| US4764930A (en) | 1988-01-27 | 1988-08-16 | Intelligent Surgical Lasers | Multiwavelength laser source |
| US4907586A (en) | 1988-03-31 | 1990-03-13 | Intelligent Surgical Lasers | Method for reshaping the eye |
| US4929065A (en) | 1988-11-03 | 1990-05-29 | Isotec Partners, Ltd. | Glass plate fusion for macro-gradient refractive index materials |
| US4891054A (en) | 1988-12-30 | 1990-01-02 | Ppg Industries, Inc. | Method for cutting hot glass |
| US5112722A (en) | 1989-04-12 | 1992-05-12 | Nippon Sheet Glass Co., Ltd. | Method of producing light control plate which induces scattering of light at different angles |
| US5104210A (en) | 1989-04-24 | 1992-04-14 | Monsanto Company | Light control films and method of making |
| US5035918A (en) | 1989-04-26 | 1991-07-30 | Amp Incorporated | Non-flammable and strippable plating resist and method of using same |
| US5040182A (en) | 1990-04-24 | 1991-08-13 | Coherent, Inc. | Mode-locked laser |
| EP0614388B1 (en) | 1991-11-06 | 2002-06-12 | LAI, Shui, T. | Corneal surgery device |
| US5265107A (en) | 1992-02-05 | 1993-11-23 | Bell Communications Research, Inc. | Broadband absorber having multiple quantum wells of different thicknesses |
| US5410567A (en) | 1992-03-05 | 1995-04-25 | Corning Incorporated | Optical fiber draw furnace |
| JPH05323110A (ja) | 1992-05-22 | 1993-12-07 | Hitachi Koki Co Ltd | 多ビーム発生素子 |
| US6016223A (en) | 1992-08-31 | 2000-01-18 | Canon Kabushiki Kaisha | Double bessel beam producing method and apparatus |
| JP3553986B2 (ja) | 1992-08-31 | 2004-08-11 | キヤノン株式会社 | 2重ベッセルビーム発生方法及び装置 |
| CA2112843A1 (en) | 1993-02-04 | 1994-08-05 | Richard C. Ujazdowski | Variable repetition rate picosecond laser |
| JPH06318756A (ja) | 1993-05-06 | 1994-11-15 | Toshiba Corp | レ−ザ装置 |
| EP0656241B1 (en) | 1993-06-04 | 1998-12-23 | Seiko Epson Corporation | Apparatus and method for laser machining |
| US5521352A (en) | 1993-09-23 | 1996-05-28 | Laser Machining, Inc. | Laser cutting apparatus |
| US5418803A (en) | 1994-01-11 | 1995-05-23 | American Biogenetic Sciences, Inc. | White light laser technology |
| US6489589B1 (en) | 1994-02-07 | 2002-12-03 | Board Of Regents, University Of Nebraska-Lincoln | Femtosecond laser utilization methods and apparatus and method for producing nanoparticles |
| US5436925A (en) | 1994-03-01 | 1995-07-25 | Hewlett-Packard Company | Colliding pulse mode-locked fiber ring laser using a semiconductor saturable absorber |
| US5400350A (en) | 1994-03-31 | 1995-03-21 | Imra America, Inc. | Method and apparatus for generating high energy ultrashort pulses |
| US5778016A (en) | 1994-04-01 | 1998-07-07 | Imra America, Inc. | Scanning temporal ultrafast delay methods and apparatuses therefor |
| JP2526806B2 (ja) | 1994-04-26 | 1996-08-21 | 日本電気株式会社 | 半導体レ―ザおよびその動作方法 |
| WO1995031023A1 (en) | 1994-05-09 | 1995-11-16 | Massachusetts Institute Of Technology | Dispersion-compensated laser using prismatic end elements |
| US6016324A (en) | 1994-08-24 | 2000-01-18 | Jmar Research, Inc. | Short pulse laser system |
| US5434875A (en) | 1994-08-24 | 1995-07-18 | Tamar Technology Co. | Low cost, high average power, high brightness solid state laser |
| US5776220A (en) | 1994-09-19 | 1998-07-07 | Corning Incorporated | Method and apparatus for breaking brittle materials |
| US5604592A (en) | 1994-09-19 | 1997-02-18 | Textron Defense Systems, Division Of Avco Corporation | Laser ultrasonics-based material analysis system and method using matched filter processing |
| US5578229A (en) | 1994-10-18 | 1996-11-26 | Michigan State University | Method and apparatus for cutting boards using opposing convergent laser beams |
| US5696782A (en) | 1995-05-19 | 1997-12-09 | Imra America, Inc. | High power fiber chirped pulse amplification systems based on cladding pumped rare-earth doped fibers |
| JP3319912B2 (ja) | 1995-06-29 | 2002-09-03 | 株式会社デンソー | 半導体センサ用台座およびその加工方法 |
| JPH09106243A (ja) | 1995-10-12 | 1997-04-22 | Dainippon Printing Co Ltd | ホログラムの複製方法 |
| US5715346A (en) | 1995-12-15 | 1998-02-03 | Corning Incorporated | Large effective area single mode optical waveguide |
| US5736709A (en) | 1996-08-12 | 1998-04-07 | Armco Inc. | Descaling metal with a laser having a very short pulse width and high average power |
| US7353829B1 (en) | 1996-10-30 | 2008-04-08 | Provectus Devicetech, Inc. | Methods and apparatus for multi-photon photo-activation of therapeutic agents |
| JP4237827B2 (ja) | 1996-11-13 | 2009-03-11 | コーニング インコーポレイテッド | 内部にチャンネルが形成されたガラス製品の製造方法 |
| US5781684A (en) | 1996-12-20 | 1998-07-14 | Corning Incorporated | Single mode optical waveguide having large effective area |
| US6156030A (en) | 1997-06-04 | 2000-12-05 | Y-Beam Technologies, Inc. | Method and apparatus for high precision variable rate material removal and modification |
| BE1011208A4 (fr) | 1997-06-11 | 1999-06-01 | Cuvelier Georges | Procede de decalottage de pieces en verre. |
| DE19728766C1 (de) | 1997-07-07 | 1998-12-17 | Schott Rohrglas Gmbh | Verwendung eines Verfahrens zur Herstellung einer Sollbruchstelle bei einem Glaskörper |
| US6078599A (en) | 1997-07-22 | 2000-06-20 | Cymer, Inc. | Wavelength shift correction technique for a laser |
| JP3264224B2 (ja) | 1997-08-04 | 2002-03-11 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
| DE19750320C1 (de) | 1997-11-13 | 1999-04-01 | Max Planck Gesellschaft | Verfahren und Vorrichtung zur Lichtpulsverstärkung |
| AU3908099A (en) | 1997-12-05 | 1999-06-28 | Thermolase Corporation | Skin enhancement using laser light |
| US6501578B1 (en) | 1997-12-19 | 2002-12-31 | Electric Power Research Institute, Inc. | Apparatus and method for line of sight laser communications |
| JPH11197498A (ja) | 1998-01-13 | 1999-07-27 | Japan Science & Technology Corp | 無機材料内部の選択的改質方法及び内部が選択的に改質された無機材料 |
| US6272156B1 (en) | 1998-01-28 | 2001-08-07 | Coherent, Inc. | Apparatus for ultrashort pulse transportation and delivery |
| JPH11240730A (ja) | 1998-02-27 | 1999-09-07 | Nec Kansai Ltd | 脆性材料の割断方法 |
| JPH11269683A (ja) | 1998-03-18 | 1999-10-05 | Armco Inc | 金属表面から酸化物を除去する方法及び装置 |
| US6160835A (en) | 1998-03-20 | 2000-12-12 | Rocky Mountain Instrument Co. | Hand-held marker with dual output laser |
| DE69931690T2 (de) | 1998-04-08 | 2007-06-14 | Asml Netherlands B.V. | Lithographischer Apparat |
| EP0949541B1 (en) | 1998-04-08 | 2006-06-07 | ASML Netherlands B.V. | Lithography apparatus |
| US6256328B1 (en) | 1998-05-15 | 2001-07-03 | University Of Central Florida | Multiwavelength modelocked semiconductor diode laser |
| JPH11347861A (ja) | 1998-06-03 | 1999-12-21 | Amada Co Ltd | レーザ加工機における複合加工方法およびレーザ加工機における複合加工システム |
| JPH11347758A (ja) | 1998-06-10 | 1999-12-21 | Mitsubishi Heavy Ind Ltd | 超精密加工装置 |
| TW419867B (en) | 1998-08-26 | 2001-01-21 | Samsung Electronics Co Ltd | Laser cutting apparatus and method |
| DE19851353C1 (de) | 1998-11-06 | 1999-10-07 | Schott Glas | Verfahren und Vorrichtung zum Schneiden eines Laminats aus einem sprödbrüchigen Werkstoff und einem Kunststoff |
| JP3178524B2 (ja) | 1998-11-26 | 2001-06-18 | 住友重機械工業株式会社 | レーザマーキング方法と装置及びマーキングされた部材 |
| US6259058B1 (en) | 1998-12-01 | 2001-07-10 | Accudyne Display And Semiconductor Systems, Inc. | Apparatus for separating non-metallic substrates |
| US7649153B2 (en) | 1998-12-11 | 2010-01-19 | International Business Machines Corporation | Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed laser beam |
| US6445491B2 (en) | 1999-01-29 | 2002-09-03 | Irma America, Inc. | Method and apparatus for optical sectioning and imaging using time-gated parametric image amplification |
| US6381391B1 (en) | 1999-02-19 | 2002-04-30 | The Regents Of The University Of Michigan | Method and system for generating a broadband spectral continuum and continuous wave-generating system utilizing same |
| DE19908630A1 (de) | 1999-02-27 | 2000-08-31 | Bosch Gmbh Robert | Abschirmung gegen Laserstrahlen |
| WO2000053365A1 (en) | 1999-03-05 | 2000-09-14 | Mitsubishi Denki Kabushiki Kaisha | Laser machining apparatus |
| US6484052B1 (en) | 1999-03-30 | 2002-11-19 | The Regents Of The University Of California | Optically generated ultrasound for enhanced drug delivery |
| TWI223581B (en) | 1999-04-02 | 2004-11-01 | Murata Manufacturing Co | Method for machining ceramic green sheet and apparatus for machining the same |
| US6373565B1 (en) | 1999-05-27 | 2002-04-16 | Spectra Physics Lasers, Inc. | Method and apparatus to detect a flaw in a surface of an article |
| CN2388062Y (zh) | 1999-06-21 | 2000-07-19 | 郭广宗 | 一层有孔一层无孔双层玻璃车船窗 |
| US6449301B1 (en) | 1999-06-22 | 2002-09-10 | The Regents Of The University Of California | Method and apparatus for mode locking of external cavity semiconductor lasers with saturable Bragg reflectors |
| US6259151B1 (en) | 1999-07-21 | 2001-07-10 | Intersil Corporation | Use of barrier refractive or anti-reflective layer to improve laser trim characteristics of thin film resistors |
| US6573026B1 (en) | 1999-07-29 | 2003-06-03 | Corning Incorporated | Femtosecond laser writing of glass, including borosilicate, sulfide, and lead glasses |
| US6452117B2 (en) | 1999-08-26 | 2002-09-17 | International Business Machines Corporation | Method for filling high aspect ratio via holes in electronic substrates and the resulting holes |
| DE19952331C1 (de) | 1999-10-29 | 2001-08-30 | Schott Spezialglas Gmbh | Verfahren und Vorrichtung zum schnellen Schneiden eines Werkstücks aus sprödbrüchigem Werkstoff mittels Laserstrahlen |
| JP2001130921A (ja) | 1999-10-29 | 2001-05-15 | Mitsuboshi Diamond Industrial Co Ltd | 脆性基板の加工方法及び装置 |
| JP2001138083A (ja) | 1999-11-18 | 2001-05-22 | Seiko Epson Corp | レーザー加工装置及びレーザー照射方法 |
| JP4592855B2 (ja) | 1999-12-24 | 2010-12-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US6339208B1 (en) | 2000-01-19 | 2002-01-15 | General Electric Company | Method of forming cooling holes |
| US6552301B2 (en) | 2000-01-25 | 2003-04-22 | Peter R. Herman | Burst-ultrafast laser machining method |
| AU2001261402A1 (en) | 2000-05-11 | 2001-11-20 | Ptg Precision Technology Center Limited Llc | System for cutting brittle materials |
| DE10030388A1 (de) | 2000-06-21 | 2002-01-03 | Schott Glas | Verfahren zur Herstellung von Glassubstraten für elektronische Speichermedien |
| JP3530114B2 (ja) | 2000-07-11 | 2004-05-24 | 忠弘 大見 | 単結晶の切断方法 |
| JP2002040330A (ja) | 2000-07-25 | 2002-02-06 | Olympus Optical Co Ltd | 光学素子切換え制御装置 |
| JP2002045985A (ja) | 2000-08-07 | 2002-02-12 | Matsushita Electric Ind Co Ltd | レーザ楕円穴加工方法およびレーザ楕円穴加工装置 |
| JP4659300B2 (ja) | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
| JP4964376B2 (ja) | 2000-09-13 | 2012-06-27 | 浜松ホトニクス株式会社 | レーザ加工装置及びレーザ加工方法 |
| KR100673073B1 (ko) | 2000-10-21 | 2007-01-22 | 삼성전자주식회사 | 레이저 빔을 이용한 비금속 기판의 절단 방법 및 장치 |
| SE0004096D0 (sv) | 2000-11-08 | 2000-11-08 | Nira Automotive Ab | Positioning system |
| US20020110639A1 (en) | 2000-11-27 | 2002-08-15 | Donald Bruns | Epoxy coating for optical surfaces |
| US20020082466A1 (en) | 2000-12-22 | 2002-06-27 | Jeongho Han | Laser surgical system with light source and video scope |
| JP4880820B2 (ja) | 2001-01-19 | 2012-02-22 | 株式会社レーザーシステム | レーザ支援加工方法 |
| JP2002228818A (ja) | 2001-02-05 | 2002-08-14 | Taiyo Yuden Co Ltd | レーザー加工用回折光学素子、レーザー加工装置及びレーザー加工方法 |
| JP2002321081A (ja) | 2001-04-27 | 2002-11-05 | Ishikawajima Harima Heavy Ind Co Ltd | レーザ照射装置及びレーザ照射方法 |
| US6754429B2 (en) | 2001-07-06 | 2004-06-22 | Corning Incorporated | Method of making optical fiber devices and devices thereof |
| SG108262A1 (en) | 2001-07-06 | 2005-01-28 | Inst Data Storage | Method and apparatus for cutting a multi-layer substrate by dual laser irradiation |
| JPWO2003007370A1 (ja) * | 2001-07-12 | 2004-11-04 | 株式会社日立製作所 | 配線ガラス基板およびその製造方法ならびに配線ガラス基板に用いられる導電性ペーストおよび半導体モジュールならびに配線基板および導体形成方法 |
| JP3775250B2 (ja) | 2001-07-12 | 2006-05-17 | セイコーエプソン株式会社 | レーザー加工方法及びレーザー加工装置 |
| CN1283409C (zh) | 2001-08-10 | 2006-11-08 | 三星钻石工业股份有限公司 | 脆性材料基片的倒角方法以及倒角装置 |
| JP3795778B2 (ja) | 2001-08-24 | 2006-07-12 | 株式会社ノリタケカンパニーリミテド | 水添ビスフェノールa型エポキシ樹脂を用いたレジノイド研削砥石 |
| JP4294239B2 (ja) | 2001-09-17 | 2009-07-08 | 日立ビアメカニクス株式会社 | レーザ加工装置および透過型の1/2波長板 |
| JP2003114400A (ja) | 2001-10-04 | 2003-04-18 | Sumitomo Electric Ind Ltd | レーザ光学システムおよびレーザ加工方法 |
| JP2003154517A (ja) | 2001-11-21 | 2003-05-27 | Seiko Epson Corp | 脆性材料の割断加工方法およびその装置、並びに電子部品の製造方法 |
| US6720519B2 (en) | 2001-11-30 | 2004-04-13 | Matsushita Electric Industrial Co., Ltd. | System and method of laser drilling |
| US6973384B2 (en) | 2001-12-06 | 2005-12-06 | Bellsouth Intellectual Property Corporation | Automated location-intelligent traffic notification service systems and methods |
| JP2003238178A (ja) | 2002-02-21 | 2003-08-27 | Toshiba Ceramics Co Ltd | ガス導入用シャワープレート及びその製造方法 |
| DE60335538D1 (de) | 2002-03-12 | 2011-02-10 | Hamamatsu Photonics Kk | Verfahren zum schneiden eines bearbeiteten objekts |
| US6787732B1 (en) | 2002-04-02 | 2004-09-07 | Seagate Technology Llc | Method for laser-scribing brittle substrates and apparatus therefor |
| US6737345B1 (en) | 2002-09-10 | 2004-05-18 | Taiwan Semiconductor Manufacturing Company | Scheme to define laser fuse in dual damascene CU process |
| JP3929393B2 (ja) | 2002-12-03 | 2007-06-13 | 株式会社日本エミック | 切断装置 |
| JP2004209675A (ja) | 2002-12-26 | 2004-07-29 | Kashifuji:Kk | 押圧切断装置及び押圧切断方法 |
| KR100497820B1 (ko) | 2003-01-06 | 2005-07-01 | 로체 시스템즈(주) | 유리판절단장치 |
| TWI319412B (en) | 2003-01-15 | 2010-01-11 | Sumitomo Rubber Ind | Polymeric-type antistatic agent and antistatic polymer composition and fabricating method thereof |
| JP3775410B2 (ja) | 2003-02-03 | 2006-05-17 | セイコーエプソン株式会社 | レーザー加工方法、レーザー溶接方法並びにレーザー加工装置 |
| CN1758985A (zh) | 2003-03-12 | 2006-04-12 | 浜松光子学株式会社 | 激光加工方法 |
| US7617167B2 (en) | 2003-04-09 | 2009-11-10 | Avisere, Inc. | Machine vision system for enterprise management |
| RU2365547C2 (ru) | 2003-04-22 | 2009-08-27 | Дзе Кока-Кола Компани | Способ и устройство для упрочнения стекла |
| US7511886B2 (en) | 2003-05-13 | 2009-03-31 | Carl Zeiss Smt Ag | Optical beam transformation system and illumination system comprising an optical beam transformation system |
| FR2855084A1 (fr) | 2003-05-22 | 2004-11-26 | Air Liquide | Optique de focalisation pour le coupage laser |
| JP2005000952A (ja) | 2003-06-12 | 2005-01-06 | Nippon Sheet Glass Co Ltd | レーザー加工方法及びレーザー加工装置 |
| JP4820750B2 (ja) | 2003-06-26 | 2011-11-24 | ダンマークス テクニスク ユニバーシテット | 複数の位相コントラストフィルタによる所望波面の生成 |
| EP2269765B1 (en) | 2003-07-18 | 2014-10-15 | Hamamatsu Photonics K.K. | Cut semiconductor chip |
| JP2005104819A (ja) | 2003-09-10 | 2005-04-21 | Nippon Sheet Glass Co Ltd | 合せガラスの切断方法及び合せガラス切断装置 |
| JP2005138143A (ja) | 2003-11-06 | 2005-06-02 | Disco Abrasive Syst Ltd | レーザ光線を利用する加工装置 |
| US7172067B2 (en) | 2003-11-10 | 2007-02-06 | Johnson Level & Tool Mfg. Co., Inc. | Level case with positioning indentations |
| JP2005144487A (ja) | 2003-11-13 | 2005-06-09 | Seiko Epson Corp | レーザ加工装置及びレーザ加工方法 |
| US20080190981A1 (en) | 2003-12-04 | 2008-08-14 | Yasutomo Okajima | Method for Processing Substrate, Apparatus for Processing Substrate, Method for Conveying Substrate and Mechanism for Conveying Substrate |
| US7633033B2 (en) | 2004-01-09 | 2009-12-15 | General Lasertronics Corporation | Color sensing for laser decoating |
| JP4951241B2 (ja) | 2004-01-16 | 2012-06-13 | 独立行政法人科学技術振興機構 | 微細加工方法 |
| JP4074589B2 (ja) | 2004-01-22 | 2008-04-09 | Tdk株式会社 | レーザ加工装置及びレーザ加工方法 |
| WO2005084874A1 (ja) | 2004-03-05 | 2005-09-15 | Olympus Corporation | レーザ加工装置 |
| DE102004012402B3 (de) | 2004-03-13 | 2005-08-25 | Schott Ag | Verfahren zum Freiformschneiden von gewölbten Substraten aus sprödbrüchigem Material |
| JP4418282B2 (ja) | 2004-03-31 | 2010-02-17 | 株式会社レーザーシステム | レーザ加工方法 |
| KR100626554B1 (ko) | 2004-05-11 | 2006-09-21 | 주식회사 탑 엔지니어링 | 비금속재 절단장치 및 비금속재 절단시의 절단깊이 제어방법 |
| US7804043B2 (en) | 2004-06-15 | 2010-09-28 | Laserfacturing Inc. | Method and apparatus for dicing of thin and ultra thin semiconductor wafer using ultrafast pulse laser |
| JP4527488B2 (ja) | 2004-10-07 | 2010-08-18 | 株式会社ディスコ | レーザ加工装置 |
| JP3887394B2 (ja) | 2004-10-08 | 2007-02-28 | 芝浦メカトロニクス株式会社 | 脆性材料の割断加工システム及びその方法 |
| JP3723201B1 (ja) | 2004-10-18 | 2005-12-07 | 独立行政法人食品総合研究所 | 貫通孔を有する金属製基板を用いたマイクロスフィアの製造方法 |
| WO2006046525A1 (ja) | 2004-10-25 | 2006-05-04 | Mitsuboshi Diamond Industrial Co., Ltd. | クラック形成方法およびクラック形成装置 |
| JP4692717B2 (ja) | 2004-11-02 | 2011-06-01 | 澁谷工業株式会社 | 脆性材料の割断装置 |
| JP4222296B2 (ja) | 2004-11-22 | 2009-02-12 | 住友電気工業株式会社 | レーザ加工方法とレーザ加工装置 |
| JP4564343B2 (ja) | 2004-11-24 | 2010-10-20 | 大日本印刷株式会社 | 導電材充填スルーホール基板の製造方法 |
| US7201965B2 (en) | 2004-12-13 | 2007-04-10 | Corning Incorporated | Glass laminate substrate having enhanced impact and static loading resistance |
| KR101096733B1 (ko) | 2004-12-27 | 2011-12-21 | 엘지디스플레이 주식회사 | 기판의 절단장치 및 이를 이용한 기판의 절단방법 |
| KR101170587B1 (ko) | 2005-01-05 | 2012-08-01 | 티에이치케이 인텍스 가부시키가이샤 | 워크의 브레이크 방법 및 장치, 스크라이브 및 브레이크방법, 및 브레이크 기능을 갖는 스크라이브 장치 |
| EP1811547A4 (en) | 2005-02-03 | 2010-06-02 | Nikon Corp | OPTICAL INTEGRATOR, OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD |
| JP2006248885A (ja) | 2005-02-08 | 2006-09-21 | Takeji Arai | 超短パルスレーザによる石英の切断方法 |
| JP2006240948A (ja) | 2005-03-07 | 2006-09-14 | Nippon Sheet Glass Co Ltd | ガラス板製品を切り抜きにより製造する方法 |
| DE102005013783B4 (de) | 2005-03-22 | 2007-08-16 | Jenoptik Automatisierungstechnik Gmbh | Verfahren zum Trennen von spröden Materialien mittels Laser mit unsymmetrischer Strahlungsdichteverteilung |
| US20060261118A1 (en) | 2005-05-17 | 2006-11-23 | Cox Judy K | Method and apparatus for separating a pane of brittle material from a moving ribbon of the material |
| JP4173151B2 (ja) | 2005-05-23 | 2008-10-29 | 株式会社椿本チエイン | コンベヤチェーン |
| JP4490883B2 (ja) | 2005-07-19 | 2010-06-30 | 株式会社レーザーシステム | レーザ加工装置およびレーザ加工方法 |
| DE102005039833A1 (de) | 2005-08-22 | 2007-03-01 | Rowiak Gmbh | Vorrichtung und Verfahren zur Materialtrennung mit Laserpulsen |
| KR20070023958A (ko) | 2005-08-25 | 2007-03-02 | 삼성전자주식회사 | 액정 표시 장치용 기판 절단 시스템 및 상기 시스템을이용한 액정 표시 장치용 기판 절단 방법 |
| US7373041B2 (en) | 2005-08-31 | 2008-05-13 | Schleifring Und Apparatebau Gmbh | Optical rotary coupling |
| US7626138B2 (en) | 2005-09-08 | 2009-12-01 | Imra America, Inc. | Transparent material processing with an ultrashort pulse laser |
| US9138913B2 (en) | 2005-09-08 | 2015-09-22 | Imra America, Inc. | Transparent material processing with an ultrashort pulse laser |
| US8118971B2 (en) | 2005-09-12 | 2012-02-21 | Nippon Sheet Glass Company, Limited | Interlayer film separation method |
| JP2007142000A (ja) | 2005-11-16 | 2007-06-07 | Denso Corp | レーザ加工装置およびレーザ加工方法 |
| US7838331B2 (en) | 2005-11-16 | 2010-11-23 | Denso Corporation | Method for dicing semiconductor substrate |
| US20070111480A1 (en) | 2005-11-16 | 2007-05-17 | Denso Corporation | Wafer product and processing method therefor |
| US7977601B2 (en) | 2005-11-28 | 2011-07-12 | Electro Scientific Industries, Inc. | X and Y orthogonal cut direction processing with set beam separation using 45 degree beam split orientation apparatus and method |
| WO2007069516A1 (en) | 2005-12-16 | 2007-06-21 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, laser irradiation method, and manufacturing method of semiconductor device |
| JP4483793B2 (ja) | 2006-01-27 | 2010-06-16 | セイコーエプソン株式会社 | 微細構造体の製造方法及び製造装置 |
| US7418181B2 (en) | 2006-02-13 | 2008-08-26 | Adc Telecommunications, Inc. | Fiber optic splitter module |
| KR100985428B1 (ko) | 2006-02-15 | 2010-10-05 | 아사히 가라스 가부시키가이샤 | 유리 기판의 모따기 방법 및 장치 |
| US7535634B1 (en) | 2006-02-16 | 2009-05-19 | The United States Of America As Represented By The National Aeronautics And Space Administration | Optical device, system, and method of generating high angular momentum beams |
| JP4672689B2 (ja) | 2006-02-22 | 2011-04-20 | 日本板硝子株式会社 | レーザを用いたガラスの加工方法および加工装置 |
| WO2007096958A1 (ja) | 2006-02-22 | 2007-08-30 | Nippon Sheet Glass Company, Limited | レーザを用いたガラスの加工方法および加工装置 |
| WO2007096460A2 (en) | 2006-02-23 | 2007-08-30 | Picodeon Ltd Oy | Surface treatment technique and surface treatment apparatus associated with ablation technology |
| JP2007253203A (ja) | 2006-03-24 | 2007-10-04 | Sumitomo Electric Ind Ltd | レーザ加工用光学装置 |
| US20070298529A1 (en) | 2006-05-31 | 2007-12-27 | Toyoda Gosei, Co., Ltd. | Semiconductor light-emitting device and method for separating semiconductor light-emitting devices |
| US7897487B2 (en) | 2006-07-03 | 2011-03-01 | Hamamatsu Photonics K.K. | Laser processing method and chip |
| DE102006035555A1 (de) | 2006-07-27 | 2008-01-31 | Eliog-Kelvitherm Industrieofenbau Gmbh | Anordnung und Verfahren zur Verformung von Glasscheiben |
| TWI362370B (en) | 2006-08-18 | 2012-04-21 | Foxsemicon Integrated Tech Inc | Method for cutting a brittle substrate |
| US8168514B2 (en) | 2006-08-24 | 2012-05-01 | Corning Incorporated | Laser separation of thin laminated glass substrates for flexible display applications |
| CN102489883B (zh) | 2006-09-19 | 2015-12-02 | 浜松光子学株式会社 | 激光加工方法和激光加工装置 |
| JP2008132616A (ja) | 2006-11-27 | 2008-06-12 | Shibuya Kogyo Co Ltd | 脆性材料の割断方法とその装置 |
| US8338744B2 (en) | 2006-11-30 | 2012-12-25 | Sumitomo Electric Industries, Ltd. | Condensing optical system, laser processing method and apparatus, and manufacturing method of brittle material blank |
| US8952832B2 (en) | 2008-01-18 | 2015-02-10 | Invensense, Inc. | Interfacing application programs and motion sensors of a device |
| AT504726A1 (de) | 2007-01-05 | 2008-07-15 | Lisec Maschb Gmbh | Verfahren und vorrichtung zum herstellen eines trennspalts in einer glasscheibe |
| JP2008168327A (ja) | 2007-01-15 | 2008-07-24 | Shinko Seisakusho:Kk | レーザ切断装置 |
| US7566657B2 (en) | 2007-01-17 | 2009-07-28 | Hewlett-Packard Development Company, L.P. | Methods of forming through-substrate interconnects |
| JP5318748B2 (ja) | 2007-02-22 | 2013-10-16 | 日本板硝子株式会社 | 陽極接合用ガラス |
| CN101622722B (zh) | 2007-02-27 | 2012-11-21 | 卡尔蔡司激光器材有限责任公司 | 连续涂覆设备、生产晶态薄膜和太阳电池的方法 |
| JP5784273B2 (ja) | 2007-04-05 | 2015-09-24 | チャーム エンジニアリング株式会社 | レーザ加工方法及び切断方法並びに多層基板を有する構造体の分割方法 |
| EP1983154B1 (en) | 2007-04-17 | 2013-12-25 | Services Pétroliers Schlumberger | In-situ correction of triaxial accelerometer and magnetometer measurements made in a well |
| DE102007018674A1 (de) | 2007-04-18 | 2008-10-23 | Lzh Laserzentrum Hannover E.V. | Verfahren zum Bilden von Durchgangslöchern in Bauteilen aus Glas |
| US8236116B2 (en) | 2007-06-06 | 2012-08-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) | Method of making coated glass article, and intermediate product used in same |
| US20080310465A1 (en) | 2007-06-14 | 2008-12-18 | Martin Achtenhagen | Method and Laser Device for Stabilized Frequency Doubling |
| DE112008001873A5 (de) | 2007-07-21 | 2010-06-10 | Du, Keming, Dr. | Optische Anordnung zur Erzeugung von Multistrahlen |
| US8169587B2 (en) | 2007-08-16 | 2012-05-01 | Apple Inc. | Methods and systems for strengthening LCD modules |
| JP2009056482A (ja) | 2007-08-31 | 2009-03-19 | Seiko Epson Corp | 基板分割方法、及び表示装置の製造方法 |
| US20100276505A1 (en) | 2007-09-26 | 2010-11-04 | Roger Earl Smith | Drilling in stretched substrates |
| CN101610870B (zh) | 2007-10-16 | 2013-09-11 | 三星钻石工业股份有限公司 | 脆性材料基板的u形槽加工方法以及使用该方法的去除加工方法、打孔加工方法和倒角方法 |
| KR20090041316A (ko) | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 성막 방법 및 발광 장치의 제작 방법 |
| KR100949152B1 (ko) | 2007-11-23 | 2010-03-25 | 삼성코닝정밀유리 주식회사 | 유리 기판 레이저 절단 장치 |
| KR20090057161A (ko) | 2007-12-01 | 2009-06-04 | 주식회사 이엔팩 | 초발수성 좌변기 시트 |
| CN101462822B (zh) | 2007-12-21 | 2012-08-29 | 鸿富锦精密工业(深圳)有限公司 | 具有通孔的脆性非金属工件及其加工方法 |
| US20090183764A1 (en) | 2008-01-18 | 2009-07-23 | Tenksolar, Inc | Detachable Louver System |
| JP2009178725A (ja) | 2008-01-29 | 2009-08-13 | Sunx Ltd | レーザ加工装置及びレーザ加工方法 |
| KR101303542B1 (ko) | 2008-02-11 | 2013-09-03 | 엘지디스플레이 주식회사 | 평판표시패널 절단장치 |
| PL2285521T3 (pl) | 2008-02-20 | 2019-12-31 | Lasercoil Technologies, Llc | Postępowe laserowe urządzenie wykrawające do cięcia z wysoką prędkością |
| WO2009114372A2 (en) | 2008-03-13 | 2009-09-17 | Honeywell International Inc. | Thermal interconnect and integrated interface systems, methods of production and uses thereof |
| JP5333816B2 (ja) | 2008-03-26 | 2013-11-06 | 旭硝子株式会社 | ガラス板の切線加工装置及び切線加工方法 |
| JP5345334B2 (ja) | 2008-04-08 | 2013-11-20 | 株式会社レミ | 脆性材料の熱応力割断方法 |
| JP5274085B2 (ja) | 2008-04-09 | 2013-08-28 | 株式会社アルバック | レーザー加工装置、レーザービームのピッチ可変方法、及びレーザー加工方法 |
| US8358888B2 (en) | 2008-04-10 | 2013-01-22 | Ofs Fitel, Llc | Systems and techniques for generating Bessel beams |
| US8035901B2 (en) | 2008-04-30 | 2011-10-11 | Corning Incorporated | Laser scoring with curved trajectory |
| EP2119512B1 (en) | 2008-05-14 | 2017-08-09 | Gerresheimer Glas GmbH | Method and device for removing contaminating particles from containers on automatic production system |
| US8053704B2 (en) | 2008-05-27 | 2011-11-08 | Corning Incorporated | Scoring of non-flat materials |
| JP2009297734A (ja) | 2008-06-11 | 2009-12-24 | Nitto Denko Corp | レーザー加工用粘着シート及びレーザー加工方法 |
| US8514476B2 (en) | 2008-06-25 | 2013-08-20 | View, Inc. | Multi-pane dynamic window and method for making same |
| US7810355B2 (en) | 2008-06-30 | 2010-10-12 | Apple Inc. | Full perimeter chemical strengthening of substrates |
| KR101602373B1 (ko) | 2008-07-11 | 2016-03-21 | 에이에스엠엘 네델란즈 비.브이. | 스펙트럼 퓨리티 필터, 방사선 소스, 리소그래피 장치, 및 디바이스 제조 방법 |
| JP2010017990A (ja) | 2008-07-14 | 2010-01-28 | Seiko Epson Corp | 基板分割方法 |
| JP5071868B2 (ja) | 2008-08-11 | 2012-11-14 | オムロン株式会社 | レーザ加工方法、レーザ加工装置、光学素子の製造方法、および光学素子 |
| JP5155774B2 (ja) | 2008-08-21 | 2013-03-06 | 株式会社ノリタケカンパニーリミテド | プラトー面加工用レジノイド超砥粒砥石ホイール |
| JP2010075991A (ja) | 2008-09-29 | 2010-04-08 | Fujifilm Corp | レーザ加工装置 |
| JP5435267B2 (ja) * | 2008-10-01 | 2014-03-05 | 日本電気硝子株式会社 | ガラスロール、ガラスロールの製造装置、及びガラスロールの製造方法 |
| JP5297139B2 (ja) * | 2008-10-09 | 2013-09-25 | 新光電気工業株式会社 | 配線基板及びその製造方法 |
| US8895892B2 (en) | 2008-10-23 | 2014-11-25 | Corning Incorporated | Non-contact glass shearing device and method for scribing or cutting a moving glass sheet |
| US8092739B2 (en) | 2008-11-25 | 2012-01-10 | Wisconsin Alumni Research Foundation | Retro-percussive technique for creating nanoscale holes |
| US8131494B2 (en) | 2008-12-04 | 2012-03-06 | Baker Hughes Incorporated | Rotatable orientation independent gravity sensor and methods for correcting systematic errors |
| US9346130B2 (en) | 2008-12-17 | 2016-05-24 | Electro Scientific Industries, Inc. | Method for laser processing glass with a chamfered edge |
| US20110240476A1 (en) | 2008-12-17 | 2011-10-06 | Ding Wang | Fabrication of conductive nanostructures on a flexible substrate |
| EP2202545A1 (en) | 2008-12-23 | 2010-06-30 | Karlsruher Institut für Technologie | Beam transformation module with an axicon in a double-pass mode |
| KR101020621B1 (ko) | 2009-01-15 | 2011-03-09 | 연세대학교 산학협력단 | 광섬유를 이용하는 광소자 제조 방법, 광섬유를 이용하는 광소자 및 이를 이용한 광 트위저 |
| US8327666B2 (en) | 2009-02-19 | 2012-12-11 | Corning Incorporated | Method of separating strengthened glass |
| US8347651B2 (en) | 2009-02-19 | 2013-01-08 | Corning Incorporated | Method of separating strengthened glass |
| US8341976B2 (en) | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
| US8245540B2 (en) | 2009-02-24 | 2012-08-21 | Corning Incorporated | Method for scoring a sheet of brittle material |
| CN102326232B (zh) | 2009-02-25 | 2016-01-20 | 日亚化学工业株式会社 | 半导体元件的制造方法 |
| CN101502914A (zh) | 2009-03-06 | 2009-08-12 | 苏州德龙激光有限公司 | 用于喷油嘴微孔加工的皮秒激光加工装置 |
| CN201357287Y (zh) | 2009-03-06 | 2009-12-09 | 苏州德龙激光有限公司 | 新型皮秒激光加工装置 |
| JP5300544B2 (ja) | 2009-03-17 | 2013-09-25 | 株式会社ディスコ | 光学系及びレーザ加工装置 |
| KR101041140B1 (ko) | 2009-03-25 | 2011-06-13 | 삼성모바일디스플레이주식회사 | 기판 절단 방법 |
| US20100252959A1 (en) | 2009-03-27 | 2010-10-07 | Electro Scientific Industries, Inc. | Method for improved brittle materials processing |
| US20100279067A1 (en) | 2009-04-30 | 2010-11-04 | Robert Sabia | Glass sheet having enhanced edge strength |
| WO2010129459A2 (en) | 2009-05-06 | 2010-11-11 | Corning Incorporated | Carrier for glass substrates |
| EP2251310B1 (en) | 2009-05-13 | 2012-03-28 | Corning Incorporated | Methods and systems for forming continuous glass sheets |
| US8132427B2 (en) | 2009-05-15 | 2012-03-13 | Corning Incorporated | Preventing gas from occupying a spray nozzle used in a process of scoring a hot glass sheet |
| US8269138B2 (en) | 2009-05-21 | 2012-09-18 | Corning Incorporated | Method for separating a sheet of brittle material |
| DE102009023602B4 (de) | 2009-06-02 | 2012-08-16 | Grenzebach Maschinenbau Gmbh | Vorrichtung zum industriellen Herstellen elastisch verformbarer großflächiger Glasplatten in hoher Stückzahl |
| TWI395630B (zh) | 2009-06-30 | 2013-05-11 | Mitsuboshi Diamond Ind Co Ltd | 使用雷射光之玻璃基板加工裝置 |
| US8592716B2 (en) | 2009-07-22 | 2013-11-26 | Corning Incorporated | Methods and apparatus for initiating scoring |
| CN101637849B (zh) | 2009-08-07 | 2011-12-07 | 苏州德龙激光有限公司 | 皮秒激光加工设备的高精度z轴载物平台 |
| CN201471092U (zh) | 2009-08-07 | 2010-05-19 | 苏州德龙激光有限公司 | 皮秒激光加工设备的高精度z轴载物平台 |
| JP5500914B2 (ja) | 2009-08-27 | 2014-05-21 | 株式会社半導体エネルギー研究所 | レーザ照射装置 |
| US8932510B2 (en) | 2009-08-28 | 2015-01-13 | Corning Incorporated | Methods for laser cutting glass substrates |
| JP2013503105A (ja) | 2009-08-28 | 2013-01-31 | コーニング インコーポレイテッド | 化学強化ガラス基板からガラス品をレーザ割断するための方法 |
| US20110088324A1 (en) | 2009-10-20 | 2011-04-21 | Wessel Robert B | Apparatus and method for solar heat gain reduction in a window assembly |
| JP5715639B2 (ja) | 2009-11-03 | 2015-05-13 | コーニング インコーポレイテッド | 変動速度を有する移動ガラスリボンのレーザスコーリング |
| US8946590B2 (en) | 2009-11-30 | 2015-02-03 | Corning Incorporated | Methods for laser scribing and separating glass substrates |
| US8338745B2 (en) | 2009-12-07 | 2012-12-25 | Panasonic Corporation | Apparatus and methods for drilling holes with no taper or reverse taper |
| US20120234807A1 (en) | 2009-12-07 | 2012-09-20 | J.P. Sercel Associates Inc. | Laser scribing with extended depth affectation into a workplace |
| JP5461205B2 (ja) | 2010-01-19 | 2014-04-02 | 日立造船株式会社 | レーザ加工方法とその装置 |
| TWI438162B (zh) | 2010-01-27 | 2014-05-21 | Wintek Corp | 強化玻璃切割方法及強化玻璃切割預置結構 |
| US9234760B2 (en) | 2010-01-29 | 2016-01-12 | Blackberry Limited | Portable mobile transceiver for GPS navigation and vehicle data input for dead reckoning mode |
| EP2532470A1 (en) | 2010-02-05 | 2012-12-12 | Fujikura Ltd. | Formation method for microstructure, and substrate having microstructure |
| US8743165B2 (en) | 2010-03-05 | 2014-06-03 | Micronic Laser Systems Ab | Methods and device for laser processing |
| US20110238308A1 (en) | 2010-03-26 | 2011-09-29 | Isaac Thomas Miller | Pedal navigation using leo signals and body-mounted sensors |
| US8654538B2 (en) | 2010-03-30 | 2014-02-18 | Ibiden Co., Ltd. | Wiring board and method for manufacturing the same |
| CN102905839B (zh) | 2010-03-30 | 2016-03-09 | Imra美国公司 | 基于激光的材料加工装置和方法 |
| CN102844857A (zh) * | 2010-04-20 | 2012-12-26 | 旭硝子株式会社 | 半导体器件贯通电极用的玻璃基板 |
| US8821211B2 (en) | 2010-04-21 | 2014-09-02 | Lg Chem, Ltd. | Device for cutting of glass sheet |
| DE202010006047U1 (de) | 2010-04-22 | 2010-07-22 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Strahlformungseinheit zur Fokussierung eines Laserstrahls |
| US8245539B2 (en) | 2010-05-13 | 2012-08-21 | Corning Incorporated | Methods of producing glass sheets |
| KR20130079395A (ko) | 2010-05-19 | 2013-07-10 | 미쓰비시 가가꾸 가부시키가이샤 | 카드용 시트 및 카드 |
| JP5488907B2 (ja) | 2010-05-20 | 2014-05-14 | 日本電気硝子株式会社 | ガラスフィルムの回収装置及び回収方法 |
| GB2481190B (en) | 2010-06-04 | 2015-01-14 | Plastic Logic Ltd | Laser ablation |
| SG186384A1 (en) | 2010-06-29 | 2013-01-30 | Corning Inc | Multi-layer glass sheet made by co-drawing using the overflow downdraw fusion process |
| DE102010025967B4 (de) | 2010-07-02 | 2015-12-10 | Schott Ag | Verfahren zur Erzeugung einer Vielzahl von Löchern, Vorrichtung hierzu und Glas-Interposer |
| DE102010025965A1 (de) | 2010-07-02 | 2012-01-05 | Schott Ag | Verfahren zur spannungsarmen Herstellung von gelochten Werkstücken |
| DE202010013161U1 (de) | 2010-07-08 | 2011-03-31 | Oerlikon Solar Ag, Trübbach | Laserbearbeitung mit mehreren Strahlen und dafür geeigneter Laseroptikkopf |
| JP5772827B2 (ja) | 2010-07-12 | 2015-09-02 | 旭硝子株式会社 | インプリントモールド用TiO2含有石英ガラス基材およびその製造方法 |
| WO2012006736A2 (en) * | 2010-07-12 | 2012-01-19 | Filaser Inc. | Method of material processing by laser filamentation |
| FR2962818B1 (fr) | 2010-07-13 | 2013-03-08 | Saint Gobain | Dispositif electrochimique a proprietes de transmission optique et/ou energetique electrocommandables. |
| KR20120015366A (ko) | 2010-07-19 | 2012-02-21 | 엘지디스플레이 주식회사 | 강화유리 절단방법 및 절단장치 |
| JP5580129B2 (ja) | 2010-07-20 | 2014-08-27 | 株式会社アマダ | 固体レーザ加工装置 |
| JP2012024983A (ja) | 2010-07-21 | 2012-02-09 | Shibuya Kogyo Co Ltd | 脆性材料の面取り方法とその装置 |
| JP5669001B2 (ja) | 2010-07-22 | 2015-02-12 | 日本電気硝子株式会社 | ガラスフィルムの割断方法、ガラスロールの製造方法、及びガラスフィルムの割断装置 |
| US8828260B2 (en) | 2010-07-26 | 2014-09-09 | Hamamatsu Photonics K.K. | Substrate processing method |
| US8741777B2 (en) | 2010-07-26 | 2014-06-03 | Hamamatsu Photonics K.K. | Substrate processing method |
| JP2012031018A (ja) | 2010-07-30 | 2012-02-16 | Asahi Glass Co Ltd | 強化ガラス基板及び強化ガラス基板の溝加工方法と強化ガラス基板の切断方法 |
| US8604380B2 (en) | 2010-08-19 | 2013-12-10 | Electro Scientific Industries, Inc. | Method and apparatus for optimally laser marking articles |
| US8584354B2 (en) | 2010-08-26 | 2013-11-19 | Corning Incorporated | Method for making glass interposer panels |
| US8720228B2 (en) | 2010-08-31 | 2014-05-13 | Corning Incorporated | Methods of separating strengthened glass substrates |
| TWI402228B (zh) | 2010-09-15 | 2013-07-21 | Wintek Corp | 強化玻璃切割方法、強化玻璃薄膜製程、強化玻璃切割預置結構及強化玻璃切割件 |
| TWI576320B (zh) | 2010-10-29 | 2017-04-01 | 康寧公司 | 用於裁切玻璃帶之方法與設備 |
| WO2012061304A1 (en) | 2010-11-02 | 2012-05-10 | Georgia Tech Research Corporation | Ultra-thin interposer assemblies with through vias |
| JP5617556B2 (ja) | 2010-11-22 | 2014-11-05 | 日本電気硝子株式会社 | 帯状ガラスフィルム割断装置及び帯状ガラスフィルム割断方法 |
| US8607590B2 (en) | 2010-11-30 | 2013-12-17 | Corning Incorporated | Methods for separating glass articles from strengthened glass substrate sheets |
| EP2646384B1 (en) | 2010-11-30 | 2019-03-27 | Corning Incorporated | Methods of forming high-density arrays of holes in glass |
| US8616024B2 (en) | 2010-11-30 | 2013-12-31 | Corning Incorporated | Methods for forming grooves and separating strengthened glass substrate sheets |
| TW201226345A (en) | 2010-12-27 | 2012-07-01 | Liefco Optical Inc | Method of cutting tempered glass |
| KR101298019B1 (ko) | 2010-12-28 | 2013-08-26 | (주)큐엠씨 | 레이저 가공 장치 |
| JP5780941B2 (ja) | 2010-12-28 | 2015-09-16 | 日東電工株式会社 | 多孔性電極シートおよびその製造方法、ならびに表示装置 |
| WO2012093471A1 (ja) | 2011-01-05 | 2012-07-12 | Kondo Kiyoyuki | ビーム加工装置 |
| WO2012096053A1 (ja) | 2011-01-11 | 2012-07-19 | 旭硝子株式会社 | 強化ガラス板の切断方法 |
| CN102248302A (zh) | 2011-01-13 | 2011-11-23 | 苏州德龙激光有限公司 | 超短脉冲激光异形切割钢化玻璃的装置及其方法 |
| JP2012159749A (ja) | 2011-02-01 | 2012-08-23 | Nichia Chem Ind Ltd | ベッセルビーム発生装置 |
| US8539794B2 (en) | 2011-02-01 | 2013-09-24 | Corning Incorporated | Strengthened glass substrate sheets and methods for fabricating glass panels from glass substrate sheets |
| US8933367B2 (en) | 2011-02-09 | 2015-01-13 | Sumitomo Electric Industries, Ltd. | Laser processing method |
| JP5875121B2 (ja) | 2011-02-10 | 2016-03-02 | 信越ポリマー株式会社 | 単結晶基板の製造方法および内部改質層形成単結晶部材の製造方法 |
| WO2012108052A1 (ja) | 2011-02-10 | 2012-08-16 | 信越ポリマー株式会社 | 単結晶基板製造方法および内部改質層形成単結晶部材 |
| DE102011000768B4 (de) | 2011-02-16 | 2016-08-18 | Ewag Ag | Laserbearbeitungsverfahren und Laserbearbeitungsvorrichtung mit umschaltbarer Laseranordnung |
| US8584490B2 (en) | 2011-02-18 | 2013-11-19 | Corning Incorporated | Laser cutting method |
| JP5193326B2 (ja) | 2011-02-25 | 2013-05-08 | 三星ダイヤモンド工業株式会社 | 基板加工装置および基板加工方法 |
| JP2012187618A (ja) | 2011-03-11 | 2012-10-04 | V Technology Co Ltd | ガラス基板のレーザ加工装置 |
| KR101927543B1 (ko) | 2011-03-31 | 2018-12-10 | 아반스트레이트 가부시키가이샤 | 유리판의 제조 방법 |
| WO2012138009A1 (ko) | 2011-04-07 | 2012-10-11 | (주)네톰 | 무선인식 태그 및 이를 구비한 전자제품 피씨비 및 전자제품 관리 시스템 |
| US8986072B2 (en) | 2011-05-26 | 2015-03-24 | Corning Incorporated | Methods of finishing an edge of a glass sheet |
| WO2012164649A1 (ja) | 2011-05-27 | 2012-12-06 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| TWI547454B (zh) | 2011-05-31 | 2016-09-01 | 康寧公司 | 於玻璃中高速製造微孔洞的方法 |
| KR20140024919A (ko) | 2011-06-15 | 2014-03-03 | 아사히 가라스 가부시키가이샤 | 유리판의 절단 방법 |
| JP2013007842A (ja) | 2011-06-23 | 2013-01-10 | Toyo Seikan Kaisha Ltd | 構造体形成装置、構造体形成方法及び構造体 |
| JP5765421B2 (ja) | 2011-06-28 | 2015-08-19 | 株式会社Ihi | 脆性的な部材を切断する装置、方法、および切断された脆性的な部材 |
| TWI572480B (zh) | 2011-07-25 | 2017-03-01 | 康寧公司 | 經層壓及離子交換之強化玻璃疊層 |
| DE112012003162T5 (de) | 2011-07-29 | 2014-04-17 | Ats Automation Tooling Systems Inc. | Systeme und Verfahren zum Herstellen dünner Siliziumstäbe |
| KR101120471B1 (ko) | 2011-08-05 | 2012-03-05 | (주)지엘코어 | 다중 초점 방식의 펄스 레이저를 이용한 취성 재료 절단 장치 |
| JP5729873B2 (ja) | 2011-08-05 | 2015-06-03 | 株式会社マキタ | 集塵装置 |
| US8635887B2 (en) | 2011-08-10 | 2014-01-28 | Corning Incorporated | Methods for separating glass substrate sheets by laser-formed grooves |
| JP2013043808A (ja) | 2011-08-25 | 2013-03-04 | Asahi Glass Co Ltd | 強化ガラス板切断用保持具及び強化ガラス板の切断方法 |
| DE112012003605T5 (de) | 2011-08-29 | 2014-06-12 | Asahi Glass Co., Ltd. | Verfahren zum Schneiden einer Glasplatte mit erhöhter Festigkeit und Vorrichtung zum Schneiden einer Glasplatte mit erhöhter Festigkeit |
| CN103764579A (zh) | 2011-08-31 | 2014-04-30 | 旭硝子株式会社 | 强化玻璃板的切断方法及强化玻璃板切断装置 |
| US9422184B2 (en) | 2011-09-15 | 2016-08-23 | Nippon Electric Glass Co., Ltd. | Cutting method for glass sheet and glass sheet cutting apparatus |
| JP5861864B2 (ja) | 2011-09-15 | 2016-02-16 | 日本電気硝子株式会社 | ガラス板切断方法およびガラス板切断装置 |
| WO2013039230A1 (ja) | 2011-09-15 | 2013-03-21 | 日本電気硝子株式会社 | ガラス板切断方法 |
| WO2013043173A1 (en) | 2011-09-21 | 2013-03-28 | Raydiance, Inc. | Systems and processes that singulate materials |
| US10239160B2 (en) | 2011-09-21 | 2019-03-26 | Coherent, Inc. | Systems and processes that singulate materials |
| JP5864988B2 (ja) | 2011-09-30 | 2016-02-17 | 浜松ホトニクス株式会社 | 強化ガラス板切断方法 |
| FR2980859B1 (fr) | 2011-09-30 | 2013-10-11 | Commissariat Energie Atomique | Procede et dispositif de lithographie |
| DE102011084128A1 (de) | 2011-10-07 | 2013-04-11 | Schott Ag | Verfahren zum Schneiden eines Dünnglases mit spezieller Ausbildung der Kante |
| JP2013091578A (ja) | 2011-10-25 | 2013-05-16 | Mitsuboshi Diamond Industrial Co Ltd | ガラス基板のスクライブ方法 |
| KR101269474B1 (ko) | 2011-11-09 | 2013-05-30 | 주식회사 모린스 | 강화글라스 절단 방법 |
| US20130129947A1 (en) | 2011-11-18 | 2013-05-23 | Daniel Ralph Harvey | Glass article having high damage resistance |
| US8677783B2 (en) | 2011-11-28 | 2014-03-25 | Corning Incorporated | Method for low energy separation of a glass ribbon |
| KR20130065051A (ko) | 2011-12-09 | 2013-06-19 | 삼성코닝정밀소재 주식회사 | 강화 글라스의 절단 방법 및 이를 이용한 터치스크린패널의 제조방법 |
| JP5979600B2 (ja) | 2011-12-12 | 2016-08-24 | 日本電気硝子株式会社 | 板ガラスの割断離反方法 |
| US9021837B2 (en) | 2011-12-12 | 2015-05-05 | Nippon Electric Glass Co., Ltd. | Method of cleaving and separating a glass sheet and apparatus for cleaving and separating a glass sheet |
| JP2013152986A (ja) | 2012-01-24 | 2013-08-08 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
| US9895771B2 (en) | 2012-02-28 | 2018-02-20 | General Lasertronics Corporation | Laser ablation for the environmentally beneficial removal of surface coatings |
| CN104125934A (zh) | 2012-02-28 | 2014-10-29 | 伊雷克托科学工业股份有限公司 | 用于分离强化玻璃的方法及装置及由该强化玻璃生产的物品 |
| JP2015511571A (ja) | 2012-02-28 | 2015-04-20 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | 強化ガラスの分離のための方法及び装置並びにこれにより生成された製品 |
| WO2013130608A1 (en) | 2012-02-29 | 2013-09-06 | Electro Scientific Industries, Inc. | Methods and apparatus for machining strengthened glass and articles produced thereby |
| US9082764B2 (en) * | 2012-03-05 | 2015-07-14 | Corning Incorporated | Three-dimensional integrated circuit which incorporates a glass interposer and method for fabricating the same |
| JP2013187247A (ja) | 2012-03-06 | 2013-09-19 | Nippon Hoso Kyokai <Nhk> | インターポーザおよびその製造方法 |
| TW201343296A (zh) | 2012-03-16 | 2013-11-01 | Ipg Microsystems Llc | 使一工件中具有延伸深度虛飾之雷射切割系統及方法 |
| TW201339111A (zh) | 2012-03-29 | 2013-10-01 | Global Display Co Ltd | 強化玻璃的切割方法 |
| JP2013203630A (ja) | 2012-03-29 | 2013-10-07 | Asahi Glass Co Ltd | 強化ガラス板の切断方法 |
| JP2013203631A (ja) | 2012-03-29 | 2013-10-07 | Asahi Glass Co Ltd | 強化ガラス板の切断方法、及び強化ガラス板切断装置 |
| US9272941B2 (en) | 2012-04-05 | 2016-03-01 | Sage Electrochromics, Inc. | Method of cutting a panel using a starter crack and a glass panel including a starter crack |
| JP2013216513A (ja) | 2012-04-05 | 2013-10-24 | Nippon Electric Glass Co Ltd | ガラスフィルムの切断方法及びガラスフィルム積層体 |
| JP2015120604A (ja) | 2012-04-06 | 2015-07-02 | 旭硝子株式会社 | 強化ガラス板の切断方法、及び強化ガラス板切断システム |
| FR2989294B1 (fr) | 2012-04-13 | 2022-10-14 | Centre Nat Rech Scient | Dispositif et methode de nano-usinage par laser |
| CN102642092B (zh) | 2012-04-13 | 2015-06-10 | 北京信息科技大学 | 基于激光光束的微孔加工装置及方法 |
| US20130288010A1 (en) | 2012-04-27 | 2013-10-31 | Ravindra Kumar Akarapu | Strengthened glass article having shaped edge and method of making |
| KR20130124646A (ko) | 2012-05-07 | 2013-11-15 | 주식회사 엠엠테크 | 강화 유리 절단 방법 |
| US9365446B2 (en) | 2012-05-14 | 2016-06-14 | Richard Green | Systems and methods for altering stress profiles of glass |
| DE102012010635B4 (de) | 2012-05-18 | 2022-04-07 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Verfahren zur 3D-Strukturierung und Formgebung von Oberflächen aus harten, spröden und optischen Materialien |
| CN102672355B (zh) | 2012-05-18 | 2015-05-13 | 杭州士兰明芯科技有限公司 | Led衬底的划片方法 |
| TWI468354B (zh) | 2012-05-23 | 2015-01-11 | Taiwan Mitsuboshi Diamond Ind Co Ltd | 用於一玻璃基板之切割方法及切割設備 |
| JP6009225B2 (ja) | 2012-05-29 | 2016-10-19 | 浜松ホトニクス株式会社 | 強化ガラス板の切断方法 |
| US9938180B2 (en) | 2012-06-05 | 2018-04-10 | Corning Incorporated | Methods of cutting glass using a laser |
| JP6022223B2 (ja) | 2012-06-14 | 2016-11-09 | 株式会社ディスコ | レーザー加工装置 |
| JP6065910B2 (ja) | 2012-07-09 | 2017-01-25 | 旭硝子株式会社 | 化学強化ガラス板の切断方法 |
| US9462632B2 (en) | 2012-07-17 | 2016-10-04 | Qualcomm Incorporated | Concurrent data streaming using various parameters from the same sensor |
| AT13206U1 (de) | 2012-07-17 | 2013-08-15 | Lisec Maschb Gmbh | Verfahren und Anordnung zum Teilen von Flachglas |
| TW201417928A (zh) | 2012-07-30 | 2014-05-16 | Raydiance Inc | 具訂製邊形及粗糙度之脆性材料切割 |
| US8842358B2 (en) | 2012-08-01 | 2014-09-23 | Gentex Corporation | Apparatus, method, and process with laser induced channel edge |
| KR101395054B1 (ko) | 2012-08-08 | 2014-05-14 | 삼성코닝정밀소재 주식회사 | 강화유리 커팅 방법 및 강화유리 커팅용 스테이지 |
| KR20140022981A (ko) | 2012-08-14 | 2014-02-26 | (주)하드램 | 기판 에지 보호유닛을 포함한 강화유리 레이저 절단 장치 및 방법 |
| KR20140022980A (ko) | 2012-08-14 | 2014-02-26 | (주)하드램 | 강화유리 레이저 절단 장치 및 방법 |
| WO2014028022A1 (en) | 2012-08-16 | 2014-02-20 | Hewlett-Packard Development Company, L.P. | Diagonal openings in photodefinable glass |
| US20140047957A1 (en) | 2012-08-17 | 2014-02-20 | Jih Chun Wu | Robust Torque-Indicating Wrench |
| JP5727433B2 (ja) | 2012-09-04 | 2015-06-03 | イムラ アメリカ インコーポレイテッド | 超短パルスレーザでの透明材料処理 |
| CN102923939B (zh) | 2012-09-17 | 2015-03-25 | 江西沃格光电股份有限公司 | 强化玻璃的切割方法 |
| KR20140036593A (ko) | 2012-09-17 | 2014-03-26 | 삼성디스플레이 주식회사 | 레이저 가공 장치 |
| US20140084040A1 (en) | 2012-09-24 | 2014-03-27 | Electro Scientific Industries, Inc. | Method and apparatus for separating workpieces |
| CN102898014A (zh) | 2012-09-29 | 2013-01-30 | 江苏太平洋石英股份有限公司 | 无接触激光切割石英玻璃制品的方法及其装置 |
| CN102916081B (zh) | 2012-10-19 | 2015-07-08 | 张立国 | 一种薄膜太阳能电池的清边方法 |
| LT6046B (lt) | 2012-10-22 | 2014-06-25 | Uab "Lidaris" | Justiruojamų optinių laikiklių pakeitimo įrenginys ir sistema, turinti tokių įrenginių |
| US20140110040A1 (en) | 2012-10-23 | 2014-04-24 | Ronald Steven Cok | Imprinted micro-louver structure method |
| DE102012110971B4 (de) | 2012-11-14 | 2025-03-20 | Schott Ag | Verfahren zur Herstellung von linienförmig aufgereihten Schädigungsstellen in einem transparenten Werkstück sowie Verfahren und Vorrichtung zum Trennen eines Werkstücks |
| US9991090B2 (en) | 2012-11-15 | 2018-06-05 | Fei Company | Dual laser beam system used with an electron microscope and FIB |
| KR20140064220A (ko) | 2012-11-20 | 2014-05-28 | 에스케이씨 주식회사 | 보안필름의 제조방법 |
| WO2014079478A1 (en) | 2012-11-20 | 2014-05-30 | Light In Light Srl | High speed laser processing of transparent materials |
| WO2014085660A1 (en) | 2012-11-29 | 2014-06-05 | Corning Incorporated | Sacrificial cover layers for laser drilling substrates and methods thereof |
| JP6333282B2 (ja) | 2012-11-29 | 2018-05-30 | コーニング インコーポレイテッド | レーザー損傷及びエッチングによってガラス物品を製造する方法 |
| CN203021443U (zh) | 2012-12-24 | 2013-06-26 | 深圳大宇精雕科技有限公司 | 玻璃板水射流切割机 |
| CN103013374B (zh) | 2012-12-28 | 2014-03-26 | 吉林大学 | 仿生防粘疏水疏油贴膜 |
| SG11201505070VA (en) | 2012-12-29 | 2015-08-28 | Hoya Corp | Glass substrate for magnetic disk and magnetic disk |
| EP2754524B1 (de) | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
| JP2016513016A (ja) | 2013-02-04 | 2016-05-12 | ニューポート コーポレーション | 透明及び半透明な基板をレーザ切断する方法及び装置 |
| US10670510B2 (en) | 2013-02-05 | 2020-06-02 | Massachusetts Institute Of Technology | 3-D holographic imaging continuous flow cytometry |
| US9498920B2 (en) | 2013-02-12 | 2016-11-22 | Carbon3D, Inc. | Method and apparatus for three-dimensional fabrication |
| US9919380B2 (en) | 2013-02-23 | 2018-03-20 | Coherent, Inc. | Shaping of brittle materials with controlled surface and bulk properties |
| CN105339316B (zh) | 2013-02-25 | 2018-11-09 | 康宁股份有限公司 | 制造薄玻璃块的方法 |
| CN103143841B (zh) | 2013-03-08 | 2014-11-26 | 西北工业大学 | 一种利用皮秒激光加工孔的方法 |
| CN105164581B (zh) | 2013-03-08 | 2020-05-01 | Sage电致变色显示有限公司 | 具有多个独立可控区域和内部母线的电致变色器件 |
| KR102209964B1 (ko) | 2013-03-13 | 2021-02-02 | 삼성디스플레이 주식회사 | 피코초 레이저 가공 장치 |
| EP2969375B1 (en) | 2013-03-15 | 2018-09-12 | Kinestral Technologies, Inc. | Laser cutting strengthened glass |
| EP2781296B1 (de) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser |
| WO2014156289A1 (ja) | 2013-03-27 | 2014-10-02 | 住友精化株式会社 | 吸水性樹脂組成物の製造方法 |
| JP6059059B2 (ja) | 2013-03-28 | 2017-01-11 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| WO2014161534A2 (de) | 2013-04-04 | 2014-10-09 | Lpkf Laser & Electronics Ag | Verfahren und vorrichtung zum einbringen von durchbrechungen in ein substrat sowie ein derart hergestelltes substrat |
| DE102013103370A1 (de) * | 2013-04-04 | 2014-10-09 | Lpkf Laser & Electronics Ag | Verfahren zum Einbringen von Durchbrechungen in ein Glassubstrat sowie ein derart hergestelltes Glassubstrat |
| ES2959429T3 (es) | 2013-04-04 | 2024-02-26 | Lpkf Laser & Electronics Se | Procedimiento para la separación de un sustrato |
| CN103273195B (zh) | 2013-05-28 | 2015-03-04 | 江苏大学 | 激光间接冲击下金属薄板的微冲裁自动化装置及其方法 |
| CN103316990B (zh) | 2013-05-28 | 2015-06-10 | 江苏大学 | 脉冲激光驱动飞片加载薄板的微冲裁自动化装置及其方法 |
| US9365413B2 (en) | 2013-05-29 | 2016-06-14 | Freescale Semiconductor, Inc. | Transducer-including devices, and methods and apparatus for their calibration |
| US9776891B2 (en) | 2013-06-26 | 2017-10-03 | Corning Incorporated | Filter and methods for heavy metal remediation of water |
| KR101344368B1 (ko) | 2013-07-08 | 2013-12-24 | 정우라이팅 주식회사 | 수직형 유리관 레이저 절단장치 |
| CN103359948A (zh) | 2013-07-12 | 2013-10-23 | 深圳南玻伟光导电膜有限公司 | 钢化玻璃的切割方法 |
| KR20150009153A (ko) | 2013-07-16 | 2015-01-26 | 동우 화인켐 주식회사 | 강화처리된 유리의 홀 형성 방법 |
| US9102011B2 (en) | 2013-08-02 | 2015-08-11 | Rofin-Sinar Technologies Inc. | Method and apparatus for non-ablative, photoacoustic compression machining in transparent materials using filamentation by burst ultrafast laser pulses |
| US9102007B2 (en) | 2013-08-02 | 2015-08-11 | Rofin-Sinar Technologies Inc. | Method and apparatus for performing laser filamentation within transparent materials |
| CN105592994B (zh) | 2013-08-07 | 2018-10-12 | 通快激光与系统工程有限公司 | 用于加工板状工件的方法和装置及由这类工件制成的产品 |
| US9790128B2 (en) | 2013-08-07 | 2017-10-17 | Corning Incorporated | Laser controlled ion exchange process and glass articles formed therefrom |
| BR112016001216B1 (pt) | 2013-09-04 | 2021-11-16 | Saint-Gobain Glass France | Método para produzir uma vidraça com um revestimento eletricamente condutor com defeitos eletricamente isolados, vidraça com um revestimento eletricamente condutor e uso de uma vidraça |
| CN203509350U (zh) | 2013-09-27 | 2014-04-02 | 东莞市盛雄激光设备有限公司 | 皮秒激光加工装置 |
| CN103531414B (zh) | 2013-10-14 | 2016-03-02 | 南京三乐电子信息产业集团有限公司 | 一种栅控行波管栅网的皮秒脉冲激光切割制备方法 |
| US10017410B2 (en) | 2013-10-25 | 2018-07-10 | Rofin-Sinar Technologies Llc | Method of fabricating a glass magnetic hard drive disk platter using filamentation by burst ultrafast laser pulses |
| US20150122656A1 (en) | 2013-11-04 | 2015-05-07 | Rofin-Sinar Technologies Inc. | Mass based filtration devices and method of fabrication using bursts of ultrafast laser pulses |
| US11053156B2 (en) | 2013-11-19 | 2021-07-06 | Rofin-Sinar Technologies Llc | Method of closed form release for brittle materials using burst ultrafast laser pulses |
| US10005152B2 (en) | 2013-11-19 | 2018-06-26 | Rofin-Sinar Technologies Llc | Method and apparatus for spiral cutting a glass tube using filamentation by burst ultrafast laser pulses |
| US9517929B2 (en) * | 2013-11-19 | 2016-12-13 | Rofin-Sinar Technologies Inc. | Method of fabricating electromechanical microchips with a burst ultrafast laser pulses |
| DE102013223637B4 (de) | 2013-11-20 | 2018-02-01 | Trumpf Laser- Und Systemtechnik Gmbh | Verfahren zum Behandeln eines lasertransparenten Substrats zum anschließenden Trennen des Substrats |
| JP2017501951A (ja) | 2013-11-25 | 2017-01-19 | コーニング インコーポレイテッド | 実質的に柱面を成す鏡面反射面の形状を決定するための方法 |
| US10144088B2 (en) | 2013-12-03 | 2018-12-04 | Rofin-Sinar Technologies Llc | Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses |
| CN103746027B (zh) | 2013-12-11 | 2015-12-09 | 西安交通大学 | 一种在ito导电薄膜表面刻蚀极细电隔离槽的方法 |
| US20150166393A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser cutting of ion-exchangeable glass substrates |
| US20150165563A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Stacked transparent material cutting with ultrafast laser beam optics, disruptive layers and other layers |
| US9687936B2 (en) | 2013-12-17 | 2017-06-27 | Corning Incorporated | Transparent material cutting with ultrafast laser and beam optics |
| US9815730B2 (en) | 2013-12-17 | 2017-11-14 | Corning Incorporated | Processing 3D shaped transparent brittle substrate |
| US9676167B2 (en) | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
| US9850160B2 (en) | 2013-12-17 | 2017-12-26 | Corning Incorporated | Laser cutting of display glass compositions |
| US10442719B2 (en) | 2013-12-17 | 2019-10-15 | Corning Incorporated | Edge chamfering methods |
| US20150165560A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser processing of slots and holes |
| CN103831539B (zh) | 2014-01-10 | 2016-01-20 | 合肥鑫晟光电科技有限公司 | 激光打孔方法及激光打孔系统 |
| DE102014201739B4 (de) | 2014-01-31 | 2021-08-12 | Trumpf Laser- Und Systemtechnik Gmbh | Laserbearbeitungsvorrichtung sowie Verfahren zum Erzeugen zweier Teilstrahlen |
| WO2015127583A1 (en) | 2014-02-25 | 2015-09-03 | Schott Ag | Chemically toughened glass article with low coefficient of thermal expansion |
| EP2913137A1 (de) | 2014-02-26 | 2015-09-02 | Bystronic Laser AG | Laserbearbeitungsvorrichtung und Verfahren |
| MX388829B (es) | 2014-03-04 | 2025-03-20 | Saint Gobain | Metodo para cortar una capa de vidrio laminada, ultradelgada. |
| US11780029B2 (en) | 2014-03-05 | 2023-10-10 | Panasonic Connect North America, division of Panasonic Corporation of North America | Material processing utilizing a laser having a variable beam shape |
| US11204506B2 (en) | 2014-03-05 | 2021-12-21 | TeraDiode, Inc. | Polarization-adjusted and shape-adjusted beam operation for materials processing |
| EP3166895B1 (en) | 2014-07-08 | 2021-11-24 | Corning Incorporated | Methods and apparatuses for laser processing materials |
| EP2965853B2 (en) | 2014-07-09 | 2020-03-25 | High Q Laser GmbH | Processing of material using elongated laser beams |
| JP2017529311A (ja) | 2014-07-11 | 2017-10-05 | コーニング インコーポレイテッド | ガラス物品内にパルスレーザで穿孔を生じさせることによるガラス切断システムおよび方法 |
| US20160009066A1 (en) | 2014-07-14 | 2016-01-14 | Corning Incorporated | System and method for cutting laminated structures |
| JP6788571B2 (ja) | 2014-07-14 | 2020-11-25 | コーニング インコーポレイテッド | 界面ブロック、そのような界面ブロックを使用する、ある波長範囲内で透過する基板を切断するためのシステムおよび方法 |
| EP3169477B1 (en) | 2014-07-14 | 2020-01-29 | Corning Incorporated | System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter |
| US9617180B2 (en) | 2014-07-14 | 2017-04-11 | Corning Incorporated | Methods and apparatuses for fabricating glass articles |
| DE102014213775B4 (de) | 2014-07-15 | 2018-02-15 | Innolas Solutions Gmbh | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen, kristallinen Substraten, insbesondere von Halbleitersubstraten |
| US9757815B2 (en) | 2014-07-21 | 2017-09-12 | Rofin-Sinar Technologies Inc. | Method and apparatus for performing laser curved filamentation within transparent materials |
| CN104344202A (zh) | 2014-09-26 | 2015-02-11 | 张玉芬 | 一种有孔玻璃 |
| US9740063B2 (en) | 2014-11-28 | 2017-08-22 | Japan Display Inc. | Reflective type liquid crystal display device |
| US10047001B2 (en) | 2014-12-04 | 2018-08-14 | Corning Incorporated | Glass cutting systems and methods using non-diffracting laser beams |
| JP6005125B2 (ja) | 2014-12-22 | 2016-10-12 | イムラ アメリカ インコーポレイテッド | 超短パルスレーザでの透明材料処理 |
| WO2016114934A1 (en) | 2015-01-13 | 2016-07-21 | Rofin-Sinar Technologies Inc. | Method and system for scribing brittle material followed by chemical etching |
| HUE055461T2 (hu) | 2015-03-24 | 2021-11-29 | Corning Inc | Kijelzõ üveg kompozíciók lézeres vágása és feldolgozása |
| DE102015111490A1 (de) | 2015-07-15 | 2017-01-19 | Schott Ag | Verfahren und Vorrichtung zum lasergestützten Abtrennen eines Teilstücks von einem flächigen Glaselement |
| CN105081564B (zh) | 2015-08-31 | 2017-03-29 | 大族激光科技产业集团股份有限公司 | 一种强化玻璃内形孔的加工方法 |
| JP6066384B2 (ja) | 2015-10-23 | 2017-01-25 | 大日本印刷株式会社 | 投射装置および投射型映像表示装置 |
| WO2017079570A2 (en) | 2015-11-04 | 2017-05-11 | Duke University | Splise-switching oligonucleotides and methods of use |
| KR20180075707A (ko) | 2015-11-25 | 2018-07-04 | 코닝 인코포레이티드 | 유리 웹의 분리 방법들 |
| DE102015120950B4 (de) | 2015-12-02 | 2022-03-03 | Schott Ag | Verfahren zum lasergestützten Ablösen eines Teilstücks von einem flächigen Glas- oder Glaskeramikelement, flächiges zumindest teilweise keramisiertes Glaselement oder Glaskeramikelement und Kochfläche umfassend ein flächiges Glas- oder Glaskeramikelement |
| DE102016102768A1 (de) | 2016-02-17 | 2017-08-17 | Schott Ag | Verfahren zur Kantenbearbeitung von Glaselementen und verfahrensgemäß bearbeitetes Glaselement |
| CN113399816B (zh) | 2016-09-30 | 2023-05-16 | 康宁股份有限公司 | 使用非轴对称束斑对透明工件进行激光加工的设备和方法 |
-
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150166395A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Method for Rapid Laser Drilling of Holes in Glass and Products Made Therefrom |
| US20150166391A1 (en) | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser cut composite glass article and method of cutting |
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|---|---|
| TWI724005B (zh) | 2021-04-11 |
| KR20180028462A (ko) | 2018-03-16 |
| CN107835794A (zh) | 2018-03-23 |
| EP3319911B1 (en) | 2023-04-19 |
| EP3319911A1 (en) | 2018-05-16 |
| US11186060B2 (en) | 2021-11-30 |
| KR102499697B1 (ko) | 2023-02-14 |
| JP2018528078A (ja) | 2018-09-27 |
| US20170008122A1 (en) | 2017-01-12 |
| TW201707831A (zh) | 2017-03-01 |
| WO2017011296A1 (en) | 2017-01-19 |
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