JP6532941B2 - ブロック共重合体 - Google Patents
ブロック共重合体 Download PDFInfo
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- JP6532941B2 JP6532941B2 JP2017517261A JP2017517261A JP6532941B2 JP 6532941 B2 JP6532941 B2 JP 6532941B2 JP 2017517261 A JP2017517261 A JP 2017517261A JP 2017517261 A JP2017517261 A JP 2017517261A JP 6532941 B2 JP6532941 B2 JP 6532941B2
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- block
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- block copolymer
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- 0 CC(C(Oc(cc1)ccc1O*)=O)=C Chemical compound CC(C(Oc(cc1)ccc1O*)=O)=C 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
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- C08F2/14—Organic medium
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Description
X=1+(D×M)/(K×L)
数式1でDは第1ブロックの密度(D1)と第2ブロックの密度(D2)の比率(D2/D1)であり、Mは、第1ブロックのモル質量(M1)と第2ブロックのモル質量(M2)の比率(M1/M2)であり、Kは1H−NMRで第2ブロックに起因して現れるピークの面積(A2)と第1ブロックに起因して現れるピークの面積(A1)の比率(A2/A1)であり、Lは第1ブロックの繰返し単位1モルが有する水素原子の数(H1)と第2ブロックの繰返し単位1モルが有する水素原子の数(H2)の比率(H1/H2)である。
NMR分析は三重共鳴5mm探針(probe)を有するVarian Unity Inova(500MHz)分光計を含むNMR分光計を使って常温で遂行した。NMR測定用溶媒(CDCl3)に分析対象物質を約10mg/ml程度の濃度に希釈させて使用し、化学的移動はppmで表現した。
br=広い信号、s=単一線、d=二重線、dd=二重二重線、t=三重線、dt=二重三重線、q=四重線、p=五重線、m=多重線。
数平均分子量(Mn)および分子量分布はGPC(Gel permeation chromatography)を使って測定した。5mLバイアル(vial)に実施例または比較例のブロック共重合体またはマクロ開始剤などの分析対象物を入れ、約1mg/mL程度の濃度になるようにTHF(tetrahydro furan)に希釈する。その後、Calibration用標準試料と分析しようとする試料をsyringe filter(pore size:0.45μm)を通じて濾過させた後測定した。分析プログラムはAgilent technologies社のChemStationを使用し、試料のelution timeをcalibration curveと比較して重量平均分子量(Mw)および数平均分子量(Mn)をそれぞれ求め、その比率(Mw/Mn)で分子量分布(PDI)を計算した。GPCの測定条件は下記の通りである。
機器:Agilent technologies社の1200 series
カラム:Polymer laboratories社のPLgel mixed B 2個使用
溶媒:THF
カラム温度:35℃
サンプル濃度:1mg/mL,200L注入
標準試料:ポリスチレン(Mp:3900000、723000、316500、52200、31400、7200、3940、485)
数式1に適用される各変数であるD、M、KおよびLはそれぞれ下記の方式で求めることができる。
下記の化学式Aの化合物(DPM−C12)は次の方式で合成した。250mLのフラスコにヒドロキノン(hydroquinone)(10.0g、94.2mmol)および1−ブロモドデカン(1−Bromododecane)(23.5g、94.2mmol)を入れ,100mLのアセトニトリル(acetonitrile)に溶かした後過量のポタシウムカーボネート(potassium carbonate)を添加し、75oCで約48時間の間窒素条件下で反応させた。反応後残存するポタシウムカーボネートをフィルタリングして除去し、反応に使ったアセトニトリルも除去した。これにDCM(dichloromethane)と水の混合溶媒を添加してウォークアップし、分離した有機層を集めてmgSO4に通過させて脱水した。引き続き、カラムクロマトグラフィーでDCM(dichloromethane)を使って白色固体相の目的物(4−ドデシルオキシフェノール)(9.8g、35.2mmol)を約37%の収得率で得た。
1H−NMR(CDCl3):d6.77(dd、4H);d4.45(s、1H);d3.89(t、2H);d1.75(p、2H);d1.43(p、2H);d1.33−1.26(m、16H);d0.88(t、3H)。
1H−NMR(CDCl3):d7.02(dd、2H);d6.89(dd、2H);d6.32(dt、1H);d5.73(dt、1H);d3.94(t、2H);d2.05(dd、3H);d1.76(p、2H);d1.43(p、2H);1.34−1.27(m、16H);d0.88(t、3H)。
製造例1の単量体(A)5.0gとRAFT(Reversible Addition Fragmentation chain Transfer)試薬(シアノイソプロチルジチオベンゾエート)165mg、ラジカル開始剤であるAIBN(Azobisisobutyronitrile)79mgおよびアニソール11.9mLを25mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、70℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させ、桃色のマクロ開始剤を製造した。前記マクロ開始剤の収得率は約57.0重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ10300および1.21であった。
製造例1の単量体(A)5.0gとRAFT(Reversible Addition Fragmentation chain Transfer)試薬であるシアノイソプロチルジチオベンゾエート106.5mg、ラジカル開始剤であるAIBN(Azobisisobutyronitrile)79mgおよびアニソール11.9mLを25mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、70℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させ、桃色のマクロ開始剤を製造した。前記マクロ開始剤の収得率は約57.0重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ10,400および1.19であった。マクロ開始剤0.3g、ペンタフルオロスチレン単量体3.3gおよびベンゼン1.2mLを10mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、115℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させて薄桃色のブロック共重合体を製造した。前記ブロック共重合体の収得率は約18重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ17、800および1.14であった。前記ブロック共重合体は製造例1の単量体(A)から由来した第1ブロックと前記ペンタフルオロスチレン単量体から由来した第2ブロックを含む。実施例2のブロック共重合体の1HNMRの分析結果は図2に記載した。
製造例1の単量体(A)5.0gとRAFT(Reversible Addition Fragmentation chain Transfer)試薬であるシアノイソプロチルジチオベンゾエート456mg、ラジカル開始剤であるAIBN(Azobisisobutyronitrile)34mgおよびアニソール12.8mLを25mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、70℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させ、桃色のマクロ開始剤を製造した。前記マクロ開始剤の収得率は約60.0重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ5,700および1.18であった。マクロ開始剤0.2g、ペンタフルオロスチレン単量体3.4gおよびアニソール1.2mLを10mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、115℃で15時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させて薄桃色のブロック共重合体を製造した。前記ブロック共重合体の収得率は約16重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ59,000および1.22であった。前記ブロック共重合体は製造例1の単量体(A)から由来した第1ブロックと前記ペンタフルオロスチレン単量体から由来した第2ブロックを含む。実施例3のブロック共重合体の1HNMRの分析結果は図3に記載した。
製造例1の単量体(A)5.0gとRAFT(Reversible Addition Fragmentation chain Transfer)試薬であるシアノイソプロチルジチオベンゾエート106.5mg、ラジカル開始剤であるAIBN(Azobisisobutyronitrile)79mgおよびアニソール11.9mLを25mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、70℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させ、黄色のマクロ開始剤を製造した。前記マクロ開始剤の収得率は約52.0重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ9,100および1.20であった。マクロ開始剤0.5g、ペンタフルオロスチレン単量体4.5gおよびアニソール1.7mLを10mL Schlenk flaskに入れて窒素雰囲気下で常温で30分の間撹はんした後、115℃で4時間の間RAFT(Reversible Addition Fragmentation chain Transfer)重合反応を遂行した。重合後反応溶液を抽出溶媒であるメタノール250mLに沈殿させた後、減圧濾過して乾燥させて淡い黄色のブロック共重合体を製造した。前記ブロック共重合体の収得率は約15重量%であり、数平均分子量(Mn)および分子量分布(Mw/Mn)はそれぞれ23,200および1.12であった。前記ブロック共重合体は製造例1の単量体(A)から由来した第1ブロックと前記ペンタフルオロスチレン単量体から由来した第2ブロックを含む。比較例1のブロック共重合体の1HNMRの分析結果は図4に記載した。
実施例または比較例のブロック共重合体をフルオロベンゼン(fluorobezene)に0.7重量%の固形分濃度に希釈させて製造したコート液をシリコンウェハ上に約5nmの厚さでスピンコート(コート面積:横×縦=1.5cm×1.5cm)し、常温で約1時間の間乾燥させた後、さらに約160℃の温度で約1時間の間熱的熟成(thermal annealing)して自己組織化された膜を形成した。形成された膜に対してSEM(Scanning electron microscope)イメージを撮影した。図5は実施例1に対して撮影したAFMイメージであり、図6は、実施例2に対して撮影したSEMイメージである。図面から確認されるように実施例のブロック共重合体の場合、シリンダー構造の高分子膜が効果的に形成されたし、実施例3の場合もやはりシリンダー構造の高分子膜が形成された。これに対して比較例1の場合、シリンダー構造に適切な相分離が誘導されなかった。図7は、比較例1に対するSEM結果であり、これから効果的なシリンダー構造の相分離が誘導されなかったことを確認することができる。
Claims (10)
- 側鎖を有する第1ブロックと前記第1ブロックとは異なる第2ブロックを含み、
下記の数式1によるXの範囲が2.5〜10であり、
前記第1ブロックは、前記側鎖が連結されている、ハロゲン原子を含まない芳香族構造を含み、前記第2ブロックはハロゲン原子を含む芳香族構造を含み、
前記側鎖は8個以上の鎖形成原子を有する炭化水素鎖であり、前記鎖形成原子は、炭素原子であり、前記第1ブロックは、下記の化学式1で表示される単位を含むブロックであり、前記第2ブロックは、下記の化学式3で表示される単位を含むブロックである、ブロック共重合体:
[数式1]
X=1+(D×M)/(K×L)
数式1でDは第1ブロックの密度(D1)と第2ブロックの密度(D2)の比率(D2/D1)であり、Mは、第1ブロックの繰返し単位のモル質量(M1)と第2ブロックの繰返し単位のモル質量(M2)の比率(M1/M2)であり、Kは1H−NMRで第2ブロックに起因して現れるピークの面積(A2)と第1ブロックに起因して現れるピークの面積(A1)の比率(A2/A1)であり、Lは第1ブロックの繰返し単位1モルが有する水素原子の数(H1)と第2ブロックの繰返し単位1モルが有する水素原子の数(H2)の比率(H1/H2)である;
- 側鎖を有する第1ブロックおよび前記第1ブロックとは異なる第2ブロックを含み、
下記の数式1によるXの範囲が1.1〜1.7であり、
前記第1ブロックは、前記側鎖が連結されている、ハロゲン原子を含まない芳香族構造を含み、前記第2ブロックはハロゲン原子を含む芳香族構造を含み、
前記側鎖は8個以上の鎖形成原子を有する炭化水素鎖であり、前記鎖形成原子は、炭素原子であり、前記第1ブロックは、下記の化学式1で表示される単位を含むブロックであり、前記第2ブロックは、下記の化学式3で表示される単位を含むブロックである、ブロック共重合体:
[数式1]
X=1+(D×M)/(K×L)
数式1でDは第1ブロックの密度(D1)と第2ブロックの密度(D2)の比率(D2/D1)であり、Mは、第1ブロックの繰返し単位のモル質量(M1)と第2ブロックの繰返し単位のモル質量(M2)の比率(M1/M2)であり、Kは1H−NMRで第2ブロックに起因して現れるピークの面積(A2)と第1ブロックに起因して現れるピークの面積(A1)の比率(A2/A1)であり、Lは第1ブロックの繰返し単位1モルが有する水素原子の数(H1)と第2ブロックの繰返し単位1モルが有する水素原子の数(H2)の比率(H1/H2)である;
- シリンダー構造を形成する、請求項1または請求項2に記載のブロック共重合体。
- 前記側鎖は、前記芳香族構造に酸素原子または窒素原子を媒介として連結されている、請求項1または請求項2に記載のブロック共重合体。
- 前記側鎖の鎖形成原子は9個以上である、請求項1または請求項2に記載のブロック共重合体。
- 数平均分子量が3,000〜300,000の範囲内にある、請求項1または請求項2に記載のブロック共重合体。
- 分散度(Mw/Mn)が1.01〜1.60の範囲内にある、請求項1または請求項2に記載のブロック共重合体。
- 自己組織化された請求項1または請求項2に記載のブロック共重合体を含む、高分子膜。
- 自己組織化された請求項1または請求項2に記載のブロック共重合体を含む高分子膜を基板上に形成することを含む、高分子膜の形成方法。
- 基板の表面に形成されている自己組織化された請求項1または請求項2に記載のブロック共重合体を含む高分子膜から前記ブロック共重合体の第1または第2ブロックを除去する段階を含む、パターン形成方法。
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