FR2809829B1 - Nouvelle composition photosensible pour la fabrication de photoresist - Google Patents

Nouvelle composition photosensible pour la fabrication de photoresist

Info

Publication number
FR2809829B1
FR2809829B1 FR0007145A FR0007145A FR2809829B1 FR 2809829 B1 FR2809829 B1 FR 2809829B1 FR 0007145 A FR0007145 A FR 0007145A FR 0007145 A FR0007145 A FR 0007145A FR 2809829 B1 FR2809829 B1 FR 2809829B1
Authority
FR
France
Prior art keywords
photoresist
manufacture
photosensitive composition
new photosensitive
new
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0007145A
Other languages
English (en)
Other versions
FR2809829A1 (fr
Inventor
Evelyne Prat
Mathias Destarac
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0007145A priority Critical patent/FR2809829B1/fr
Application filed by Rhodia Chimie SAS filed Critical Rhodia Chimie SAS
Priority to EP01940668A priority patent/EP1311907A1/fr
Priority to AU2001274180A priority patent/AU2001274180A1/en
Priority to CA002408497A priority patent/CA2408497A1/fr
Priority to KR10-2002-7016555A priority patent/KR100502527B1/ko
Priority to PCT/FR2001/001708 priority patent/WO2001095034A1/fr
Priority to JP2002502523A priority patent/JP3634843B2/ja
Priority to US10/312,638 priority patent/US6953649B2/en
Priority to MXPA02011900A priority patent/MXPA02011900A/es
Publication of FR2809829A1 publication Critical patent/FR2809829A1/fr
Application granted granted Critical
Publication of FR2809829B1 publication Critical patent/FR2809829B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
FR0007145A 2000-06-05 2000-06-05 Nouvelle composition photosensible pour la fabrication de photoresist Expired - Fee Related FR2809829B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR0007145A FR2809829B1 (fr) 2000-06-05 2000-06-05 Nouvelle composition photosensible pour la fabrication de photoresist
AU2001274180A AU2001274180A1 (en) 2000-06-05 2001-06-01 Photosensitive composition for making photoresist
CA002408497A CA2408497A1 (fr) 2000-06-05 2001-06-01 Composition photosensible pour la fabrication de photoresist
KR10-2002-7016555A KR100502527B1 (ko) 2000-06-05 2001-06-01 포토레지스트 제조용 감광성 조성물
EP01940668A EP1311907A1 (fr) 2000-06-05 2001-06-01 Composition photosensible pour la fabrication de photoresist
PCT/FR2001/001708 WO2001095034A1 (fr) 2000-06-05 2001-06-01 Composition photosensible pour la fabrication de photoresist
JP2002502523A JP3634843B2 (ja) 2000-06-05 2001-06-01 フォトレジスト製造用の感光性組成物
US10/312,638 US6953649B2 (en) 2000-06-05 2001-06-01 Photosensitive composition for photoresist manufacture
MXPA02011900A MXPA02011900A (es) 2000-06-05 2001-06-01 Composicion fotosensible para fabricacion de fotorresistente.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0007145A FR2809829B1 (fr) 2000-06-05 2000-06-05 Nouvelle composition photosensible pour la fabrication de photoresist

Publications (2)

Publication Number Publication Date
FR2809829A1 FR2809829A1 (fr) 2001-12-07
FR2809829B1 true FR2809829B1 (fr) 2002-07-26

Family

ID=8850953

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0007145A Expired - Fee Related FR2809829B1 (fr) 2000-06-05 2000-06-05 Nouvelle composition photosensible pour la fabrication de photoresist

Country Status (9)

Country Link
US (1) US6953649B2 (fr)
EP (1) EP1311907A1 (fr)
JP (1) JP3634843B2 (fr)
KR (1) KR100502527B1 (fr)
AU (1) AU2001274180A1 (fr)
CA (1) CA2408497A1 (fr)
FR (1) FR2809829B1 (fr)
MX (1) MXPA02011900A (fr)
WO (1) WO2001095034A1 (fr)

Families Citing this family (43)

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JP4102032B2 (ja) * 2001-03-12 2008-06-18 富士フイルム株式会社 ポジ型レジスト組成物
JP4067284B2 (ja) * 2001-03-12 2008-03-26 富士フイルム株式会社 ポジ型レジスト組成物
TWI297809B (fr) * 2001-10-24 2008-06-11 Toyo Boseki
FR2848556B1 (fr) 2002-12-13 2006-06-16 Bio Merieux Procede de polymerisation radicalaire controlee
JP4725739B2 (ja) 2003-06-26 2011-07-13 Ｊｓｒ株式会社 フォトレジストポリマー組成物
WO2005000924A1 (fr) 2003-06-26 2005-01-06 Symyx Technologies, Inc. Polymeres a base de photoresist
US7696292B2 (en) * 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR100599081B1 (ko) 2004-05-27 2006-07-13 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴 형성방법
US7358035B2 (en) * 2005-06-23 2008-04-15 International Business Machines Corporation Topcoat compositions and methods of use thereof
JPWO2007020734A1 (ja) * 2005-08-12 2009-02-19 ライオン株式会社 ナノ平滑性とエッチング耐性を有するフォトレジストポリマーならびにレジスト組成物
US8029969B2 (en) * 2007-05-14 2011-10-04 Taiwan Semiconductor Manufacturing Company, Ltd. Material and method for photolithography
JP5243738B2 (ja) * 2007-06-26 2013-07-24 国立大学法人豊橋技術科学大学 光分解を利用した高分子ナノ粒子の製造法
KR101580854B1 (ko) * 2008-09-05 2015-12-30 제이에스알 가부시끼가이샤 경화성 수지 조성물, 수지 경화막을 형성하기 위한 세트, 보호막 및 보호막의 형성 방법
JP5206255B2 (ja) * 2008-09-08 2013-06-12 Ｊｓｒ株式会社 新規重合体及びその製造方法
EP2189846B1 (fr) * 2008-11-19 2015-04-22 Rohm and Haas Electronic Materials LLC Procédé de photolithographie ultilisant une composition de photoréserve contenant un copolymère à blocs
FR3008986B1 (fr) * 2013-07-25 2016-12-30 Arkema France Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
EP2829567B1 (fr) * 2013-07-25 2017-03-15 Arkema France Procédé pour commander la période de caractérisation de la morphologie obtenue à partir d'un mélange de copolymères séquencés et de (co)polymères d'un des blocs
EP3078687B1 (fr) 2013-12-06 2020-06-03 LG Chem, Ltd. Copolymère bloc
CN105980342B (zh) 2013-12-06 2019-02-15 株式会社Lg化学 单体和嵌段共聚物
WO2015084124A1 (fr) 2013-12-06 2015-06-11 주식회사 엘지화학 Copolymère bloc
EP3078689B1 (fr) 2013-12-06 2020-12-02 LG Chem, Ltd. Copolymère bloc
WO2015084126A1 (fr) 2013-12-06 2015-06-11 주식회사 엘지화학 Copolymère bloc
US10150832B2 (en) 2013-12-06 2018-12-11 Lg Chem, Ltd. Block copolymer
EP3078693B1 (fr) 2013-12-06 2021-01-27 LG Chem, Ltd. Copolymère bloc
JP6361893B2 (ja) 2013-12-06 2018-07-25 エルジー・ケム・リミテッド ブロック共重合体
WO2015084121A1 (fr) 2013-12-06 2015-06-11 주식회사 엘지화학 Copolymère bloc
WO2015084129A1 (fr) 2013-12-06 2015-06-11 주식회사 엘지화학 Copolymère bloc
JP6410327B2 (ja) 2013-12-06 2018-10-24 エルジー・ケム・リミテッド ブロック共重合体
US10087276B2 (en) 2013-12-06 2018-10-02 Lg Chem, Ltd. Block copolymer
JP6521975B2 (ja) 2013-12-06 2019-05-29 エルジー・ケム・リミテッド ブロック共重合体
JP6347356B2 (ja) 2013-12-06 2018-06-27 エルジー・ケム・リミテッド ブロック共重合体
EP3214102B1 (fr) 2014-09-30 2022-01-05 LG Chem, Ltd. Copolymère bloc
WO2016053010A1 (fr) 2014-09-30 2016-04-07 주식회사 엘지화학 Copolymère séquencé
EP3202800B1 (fr) 2014-09-30 2021-12-29 LG Chem, Ltd. Copolymère bloc
EP3202798B1 (fr) 2014-09-30 2022-01-12 LG Chem, Ltd. Copolymère bloc
WO2016053007A1 (fr) 2014-09-30 2016-04-07 주식회사 엘지화학 Procédé de fabrication d'un substrat à motifs
WO2016053014A1 (fr) 2014-09-30 2016-04-07 주식회사 엘지화학 Procédé de fabrication d'un substrat à motifs
WO2016052999A1 (fr) 2014-09-30 2016-04-07 주식회사 엘지화학 Copolymère séquencé
JP6505212B2 (ja) 2014-09-30 2019-04-24 エルジー・ケム・リミテッド ブロック共重合体
US10240035B2 (en) 2014-09-30 2019-03-26 Lg Chem, Ltd. Block copolymer
EP3202802B1 (fr) 2014-09-30 2022-11-23 LG Chem, Ltd. Copolymère bloc
KR101988145B1 (ko) * 2014-12-02 2019-06-11 미쯔비시 케미컬 주식회사 경화성 조성물 및 막
WO2018118905A1 (fr) * 2016-12-22 2018-06-28 3M Innovative Properties Company Matériaux polymères réticulables et réticulés

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US4689289A (en) * 1986-04-30 1987-08-25 General Electric Company Block polymer compositions
US5071731A (en) * 1990-04-10 1991-12-10 E. I. Du Pont De Nemours And Company Aqueous processable photosensitive element with an elastomeric layer
US5698361A (en) * 1991-10-07 1997-12-16 Fuji Photo Film Co., Ltd. Photosensitive composition
US5368976A (en) * 1992-03-27 1994-11-29 Japan Synthetic Rubber Co., Ltd. Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
DE69322946T2 (de) * 1992-11-03 1999-08-12 Ibm Photolackzusammensetzung
JP3203995B2 (ja) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 感放射線性樹脂組成物
KR100195583B1 (ko) * 1997-04-08 1999-06-15 박찬구 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물
FR2764892B1 (fr) * 1997-06-23 2000-03-03 Rhodia Chimie Sa Procede de synthese de polymeres a blocs
US6379874B1 (en) * 1999-10-26 2002-04-30 Cornell Research Foundation, Inc. Using block copolymers as supercritical fluid developable photoresists
JP4255100B2 (ja) * 2001-04-06 2009-04-15 富士フイルム株式会社 ＡｒＦエキシマレ−ザ−露光用ポジ型フォトレジスト組成物及びそれを用いたパタ−ン形成方法

Also Published As

Publication number Publication date
JP3634843B2 (ja) 2005-03-30
EP1311907A1 (fr) 2003-05-21
WO2001095034A1 (fr) 2001-12-13
US20030165769A1 (en) 2003-09-04
KR100502527B1 (ko) 2005-07-20
JP2003536105A (ja) 2003-12-02
FR2809829A1 (fr) 2001-12-07
MXPA02011900A (es) 2003-04-22
CA2408497A1 (fr) 2001-12-13
AU2001274180A1 (en) 2001-12-17
US6953649B2 (en) 2005-10-11
KR20030076227A (ko) 2003-09-26

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20070228