MXPA02011900A - Composicion fotosensible para fabricacion de fotorresistente. - Google Patents

Composicion fotosensible para fabricacion de fotorresistente.

Info

Publication number
MXPA02011900A
MXPA02011900A MXPA02011900A MXPA02011900A MXPA02011900A MX PA02011900 A MXPA02011900 A MX PA02011900A MX PA02011900 A MXPA02011900 A MX PA02011900A MX PA02011900 A MXPA02011900 A MX PA02011900A MX PA02011900 A MXPA02011900 A MX PA02011900A
Authority
MX
Mexico
Prior art keywords
photosensitive composition
block
photoresist
hydrophobic
novel
Prior art date
Application number
MXPA02011900A
Other languages
English (en)
Inventor
Mathias Destarac
Original Assignee
Rhodia Chimie Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhodia Chimie Sa filed Critical Rhodia Chimie Sa
Publication of MXPA02011900A publication Critical patent/MXPA02011900A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

La invencion se refiere a una nueva composicion fotosensible para fotorresistente y a un sistema que comprende un sustrato y un fotorresistente obtenido a partir de la nueva composicion. La composicion fotosensible para fotorresistente comprende un copolimero con bloques hidrofobicos de los cuales al menos un bloque es un bloque hidrofobico capaz de generar un bloque hidrofilico y que comprende en su extremo un grupo seleccionado entre ditioesteres, tioeteres-tionas, ditiocarbamatos y xantatos, y un compuesto fotoactivo capaz de generar bajo el efecto de una radiacion, una especie activa que reacciona con el bloque hidrofobico para generar el bloque hidrofilico.
MXPA02011900A 2000-06-05 2001-06-01 Composicion fotosensible para fabricacion de fotorresistente. MXPA02011900A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0007145A FR2809829B1 (fr) 2000-06-05 2000-06-05 Nouvelle composition photosensible pour la fabrication de photoresist
PCT/FR2001/001708 WO2001095034A1 (fr) 2000-06-05 2001-06-01 Composition photosensible pour la fabrication de photoresist

Publications (1)

Publication Number Publication Date
MXPA02011900A true MXPA02011900A (es) 2003-04-22

Family

ID=8850953

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA02011900A MXPA02011900A (es) 2000-06-05 2001-06-01 Composicion fotosensible para fabricacion de fotorresistente.

Country Status (9)

Country Link
US (1) US6953649B2 (es)
EP (1) EP1311907A1 (es)
JP (1) JP3634843B2 (es)
KR (1) KR100502527B1 (es)
AU (1) AU2001274180A1 (es)
CA (1) CA2408497A1 (es)
FR (1) FR2809829B1 (es)
MX (1) MXPA02011900A (es)
WO (1) WO2001095034A1 (es)

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JP4102032B2 (ja) * 2001-03-12 2008-06-18 富士フイルム株式会社 ポジ型レジスト組成物
JP4067284B2 (ja) * 2001-03-12 2008-03-26 富士フイルム株式会社 ポジ型レジスト組成物
TWI297809B (es) * 2001-10-24 2008-06-11 Toyo Boseki
FR2848556B1 (fr) 2002-12-13 2006-06-16 Bio Merieux Procede de polymerisation radicalaire controlee
ATE370975T1 (de) 2003-06-26 2007-09-15 Jsr Corp Photoresistpolymerzusammensetzungen
JP2007522262A (ja) 2003-06-26 2007-08-09 シミックス・テクノロジーズ・インコーポレイテッド フォトレジストポリマー
US7696292B2 (en) * 2003-09-22 2010-04-13 Commonwealth Scientific And Industrial Research Organisation Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
KR100599081B1 (ko) 2004-05-27 2006-07-13 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴 형성방법
US7358035B2 (en) * 2005-06-23 2008-04-15 International Business Machines Corporation Topcoat compositions and methods of use thereof
KR20080032098A (ko) * 2005-08-12 2008-04-14 라이온 가부시키가이샤 나노 평활성과 에칭 내성을 가지는 포토레지스트 폴리머 및레지스트 조성물
US8029969B2 (en) 2007-05-14 2011-10-04 Taiwan Semiconductor Manufacturing Company, Ltd. Material and method for photolithography
JP5243738B2 (ja) * 2007-06-26 2013-07-24 国立大学法人豊橋技術科学大学 光分解を利用した高分子ナノ粒子の製造法
KR101580854B1 (ko) * 2008-09-05 2015-12-30 제이에스알 가부시끼가이샤 경화성 수지 조성물, 수지 경화막을 형성하기 위한 세트, 보호막 및 보호막의 형성 방법
JP5206255B2 (ja) * 2008-09-08 2013-06-12 Ｊｓｒ株式会社 新規重合体及びその製造方法
EP2189846B1 (en) * 2008-11-19 2015-04-22 Rohm and Haas Electronic Materials LLC Process for photolithography applying a photoresist composition comprising a block copolymer
FR3008986B1 (fr) 2013-07-25 2016-12-30 Arkema France Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs
EP2829567B1 (en) * 2013-07-25 2017-03-15 Arkema France Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks
EP3078693B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
CN105980342B (zh) 2013-12-06 2019-02-15 株式会社Lg化学 单体和嵌段共聚物
WO2015084133A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
JP6334706B2 (ja) 2013-12-06 2018-05-30 エルジー・ケム・リミテッド ブロック共重合体
EP3078690B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
WO2015084124A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
EP3078694B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
US10227436B2 (en) 2013-12-06 2019-03-12 Lg Chem, Ltd. Block copolymer
JP6419820B2 (ja) 2013-12-06 2018-11-07 エルジー・ケム・リミテッド ブロック共重合体
JP6483695B2 (ja) 2013-12-06 2019-03-13 エルジー・ケム・リミテッド ブロック共重合体
WO2015084126A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
EP3101043B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
JP6402867B2 (ja) 2013-12-06 2018-10-10 エルジー・ケム・リミテッド ブロック共重合体
EP3078688B1 (en) 2013-12-06 2020-03-04 LG Chem, Ltd. Block copolymer
JP6532941B2 (ja) 2014-09-30 2019-06-19 エルジー・ケム・リミテッド ブロック共重合体
JP6394798B2 (ja) 2014-09-30 2018-09-26 エルジー・ケム・リミテッド ブロック共重合体
JP6637495B2 (ja) 2014-09-30 2020-01-29 エルジー・ケム・リミテッド パターン化基板の製造方法
US10633533B2 (en) 2014-09-30 2020-04-28 Lg Chem, Ltd. Block copolymer
EP3214102B1 (en) 2014-09-30 2022-01-05 LG Chem, Ltd. Block copolymer
WO2016053010A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
WO2016053007A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 패턴화 기판의 제조 방법
US10287429B2 (en) 2014-09-30 2019-05-14 Lg Chem, Ltd. Block copolymer
US10703897B2 (en) 2014-09-30 2020-07-07 Lg Chem, Ltd. Block copolymer
US10240035B2 (en) 2014-09-30 2019-03-26 Lg Chem, Ltd. Block copolymer
WO2016088777A1 (ja) * 2014-12-02 2016-06-09 三菱化学株式会社 硬化性組成物及び膜
CN110099938B (zh) * 2016-12-22 2021-01-15 3M创新有限公司 可交联聚合物材料和交联聚合物材料

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US5071731A (en) * 1990-04-10 1991-12-10 E. I. Du Pont De Nemours And Company Aqueous processable photosensitive element with an elastomeric layer
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US5368976A (en) * 1992-03-27 1994-11-29 Japan Synthetic Rubber Co., Ltd. Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder
DE69322946T2 (de) * 1992-11-03 1999-08-12 Ibm Photolackzusammensetzung
JP3203995B2 (ja) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 感放射線性樹脂組成物
KR100195583B1 (ko) * 1997-04-08 1999-06-15 박찬구 양성 포토레지스트 제조용 공중합체 및 이를 함유하는 화학증폭형 양성 포토레지스트 조성물
FR2764892B1 (fr) * 1997-06-23 2000-03-03 Rhodia Chimie Sa Procede de synthese de polymeres a blocs
JP2003513310A (ja) * 1999-10-26 2003-04-08 コーネル・リサーチ・ファンデーション・インコーポレイテッド 超臨界液体現像性フォトレジストとしてのブロックコポリマーの使用
JP4255100B2 (ja) * 2001-04-06 2009-04-15 富士フイルム株式会社 ＡｒＦエキシマレ−ザ−露光用ポジ型フォトレジスト組成物及びそれを用いたパタ−ン形成方法

Also Published As

Publication number Publication date
EP1311907A1 (fr) 2003-05-21
CA2408497A1 (fr) 2001-12-13
KR20030076227A (ko) 2003-09-26
JP3634843B2 (ja) 2005-03-30
FR2809829B1 (fr) 2002-07-26
KR100502527B1 (ko) 2005-07-20
US6953649B2 (en) 2005-10-11
AU2001274180A1 (en) 2001-12-17
WO2001095034A1 (fr) 2001-12-13
JP2003536105A (ja) 2003-12-02
FR2809829A1 (fr) 2001-12-07
US20030165769A1 (en) 2003-09-04

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