JP2010171451A5 - - Google Patents
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- JP2010171451A5 JP2010171451A5 JP2010087342A JP2010087342A JP2010171451A5 JP 2010171451 A5 JP2010171451 A5 JP 2010171451A5 JP 2010087342 A JP2010087342 A JP 2010087342A JP 2010087342 A JP2010087342 A JP 2010087342A JP 2010171451 A5 JP2010171451 A5 JP 2010171451A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- liquid
- exposure
- substrate
- optical path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims 59
- 230000003287 optical effect Effects 0.000 claims 44
- 239000000758 substrate Substances 0.000 claims 31
- 238000007654 immersion Methods 0.000 claims 15
- 238000011084 recovery Methods 0.000 claims 12
- 230000001678 irradiating effect Effects 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010087342A JP5295165B2 (ja) | 2004-06-10 | 2010-04-05 | 露光装置、露光方法及びデバイス製造方法 |
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004172569 | 2004-06-10 | ||
| JP2004172569 | 2004-06-10 | ||
| JP2004245260 | 2004-08-25 | ||
| JP2004245260 | 2004-08-25 | ||
| JP2004330582 | 2004-11-15 | ||
| JP2004330582 | 2004-11-15 | ||
| JP2010087342A JP5295165B2 (ja) | 2004-06-10 | 2010-04-05 | 露光装置、露光方法及びデバイス製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005169549A Division JP4515335B2 (ja) | 2004-06-10 | 2005-06-09 | 露光装置、ノズル部材、及びデバイス製造方法 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011129492A Division JP5634332B2 (ja) | 2004-06-10 | 2011-06-09 | 露光装置、ノズル部材、露光方法、及びデバイス製造方法 |
| JP2012081348A Division JP5671491B2 (ja) | 2004-06-10 | 2012-03-30 | 露光装置、露光方法及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010171451A JP2010171451A (ja) | 2010-08-05 |
| JP2010171451A5 true JP2010171451A5 (enExample) | 2011-08-18 |
| JP5295165B2 JP5295165B2 (ja) | 2013-09-18 |
Family
ID=35503358
Family Applications (10)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010087342A Expired - Fee Related JP5295165B2 (ja) | 2004-06-10 | 2010-04-05 | 露光装置、露光方法及びデバイス製造方法 |
| JP2011129492A Expired - Fee Related JP5634332B2 (ja) | 2004-06-10 | 2011-06-09 | 露光装置、ノズル部材、露光方法、及びデバイス製造方法 |
| JP2012081348A Expired - Fee Related JP5671491B2 (ja) | 2004-06-10 | 2012-03-30 | 露光装置、露光方法及びデバイス製造方法 |
| JP2013148020A Expired - Fee Related JP5671584B2 (ja) | 2004-06-10 | 2013-07-16 | 露光装置、液体回収方法 |
| JP2013148021A Expired - Fee Related JP5671585B2 (ja) | 2004-06-10 | 2013-07-16 | 露光装置、露光方法及びデバイス製造方法 |
| JP2014018538A Expired - Fee Related JP5911898B2 (ja) | 2004-06-10 | 2014-02-03 | 露光装置、露光方法及びデバイス製造方法 |
| JP2015026344A Expired - Lifetime JP6125551B2 (ja) | 2004-06-10 | 2015-02-13 | 露光装置、露光方法及びデバイス製造方法 |
| JP2015237577A Expired - Fee Related JP6154881B2 (ja) | 2004-06-10 | 2015-12-04 | 露光装置、露光方法及びデバイス製造方法 |
| JP2016217602A Expired - Fee Related JP6381609B2 (ja) | 2004-06-10 | 2016-11-07 | 露光装置及びデバイス製造方法 |
| JP2018001582A Pending JP2018063450A (ja) | 2004-06-10 | 2018-01-10 | 露光装置、露光方法及びデバイス製造方法 |
Family Applications After (9)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011129492A Expired - Fee Related JP5634332B2 (ja) | 2004-06-10 | 2011-06-09 | 露光装置、ノズル部材、露光方法、及びデバイス製造方法 |
| JP2012081348A Expired - Fee Related JP5671491B2 (ja) | 2004-06-10 | 2012-03-30 | 露光装置、露光方法及びデバイス製造方法 |
| JP2013148020A Expired - Fee Related JP5671584B2 (ja) | 2004-06-10 | 2013-07-16 | 露光装置、液体回収方法 |
| JP2013148021A Expired - Fee Related JP5671585B2 (ja) | 2004-06-10 | 2013-07-16 | 露光装置、露光方法及びデバイス製造方法 |
| JP2014018538A Expired - Fee Related JP5911898B2 (ja) | 2004-06-10 | 2014-02-03 | 露光装置、露光方法及びデバイス製造方法 |
| JP2015026344A Expired - Lifetime JP6125551B2 (ja) | 2004-06-10 | 2015-02-13 | 露光装置、露光方法及びデバイス製造方法 |
| JP2015237577A Expired - Fee Related JP6154881B2 (ja) | 2004-06-10 | 2015-12-04 | 露光装置、露光方法及びデバイス製造方法 |
| JP2016217602A Expired - Fee Related JP6381609B2 (ja) | 2004-06-10 | 2016-11-07 | 露光装置及びデバイス製造方法 |
| JP2018001582A Pending JP2018063450A (ja) | 2004-06-10 | 2018-01-10 | 露光装置、露光方法及びデバイス製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (7) | US8482716B2 (enExample) |
| EP (4) | EP3203321A1 (enExample) |
| JP (10) | JP5295165B2 (enExample) |
| KR (8) | KR101310472B1 (enExample) |
| CN (1) | CN102736446B (enExample) |
| IL (4) | IL179787A (enExample) |
| SG (3) | SG188877A1 (enExample) |
| TW (6) | TWI639898B (enExample) |
| WO (1) | WO2005122221A1 (enExample) |
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| JP4973754B2 (ja) * | 2004-03-04 | 2012-07-11 | 株式会社ニコン | 露光方法及び露光装置、デバイス製造方法 |
| KR101310472B1 (ko) * | 2004-06-10 | 2013-09-24 | 가부시키가이샤 니콘 엔지니어링 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
| US7481867B2 (en) | 2004-06-16 | 2009-01-27 | Edwards Limited | Vacuum system for immersion photolithography |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| KR101555707B1 (ko) * | 2005-04-18 | 2015-09-25 | 가부시키가이샤 니콘 | 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
| US7474379B2 (en) | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7411658B2 (en) * | 2005-10-06 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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| US8681308B2 (en) * | 2007-09-13 | 2014-03-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| NL1036253A1 (nl) * | 2007-12-10 | 2009-06-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| ATE548679T1 (de) * | 2008-05-08 | 2012-03-15 | Asml Netherlands Bv | Lithografische immersionsvorrichtung, trocknungsvorrichtung, immersionsmetrologievorrichtung und verfahren zur herstellung einer vorrichtung |
| EP2131241B1 (en) * | 2008-05-08 | 2019-07-31 | ASML Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
| US8421993B2 (en) * | 2008-05-08 | 2013-04-16 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
| NL2004362A (en) * | 2009-04-10 | 2010-10-12 | Asml Netherlands Bv | A fluid handling device, an immersion lithographic apparatus and a device manufacturing method. |
| TWI603155B (zh) | 2009-11-09 | 2017-10-21 | 尼康股份有限公司 | 曝光裝置、曝光方法、曝光裝置之維修方法、曝光裝置之調整方法、以及元件製造方法 |
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| US9329496B2 (en) | 2011-07-21 | 2016-05-03 | Nikon Corporation | Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium |
| US9256137B2 (en) | 2011-08-25 | 2016-02-09 | Nikon Corporation | Exposure apparatus, liquid holding method, and device manufacturing method |
| US20130050666A1 (en) | 2011-08-26 | 2013-02-28 | Nikon Corporation | Exposure apparatus, liquid holding method, and device manufacturing method |
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| US9057955B2 (en) | 2013-01-22 | 2015-06-16 | Nikon Corporation | Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method |
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