JP2012514315A5 - - Google Patents

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Publication number
JP2012514315A5
JP2012514315A5 JP2011527532A JP2011527532A JP2012514315A5 JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5 JP 2011527532 A JP2011527532 A JP 2011527532A JP 2011527532 A JP2011527532 A JP 2011527532A JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5
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JP
Japan
Prior art keywords
substrate
liquid
opening
optical system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011527532A
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English (en)
Japanese (ja)
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JP2012514315A (ja
JP5408258B2 (ja
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Publication date
Priority claimed from US12/644,703 external-priority patent/US8896806B2/en
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Publication of JP2012514315A publication Critical patent/JP2012514315A/ja
Publication of JP2012514315A5 publication Critical patent/JP2012514315A5/ja
Application granted granted Critical
Publication of JP5408258B2 publication Critical patent/JP5408258B2/ja
Active legal-status Critical Current
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JP2011527532A 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法 Active JP5408258B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US19383508P 2008-12-29 2008-12-29
US19383308P 2008-12-29 2008-12-29
US19383408P 2008-12-29 2008-12-29
US19383608P 2008-12-29 2008-12-29
US61/193,836 2008-12-29
US61/193,833 2008-12-29
US61/193,835 2008-12-29
US61/193,834 2008-12-29
US12/644,703 US8896806B2 (en) 2008-12-29 2009-12-22 Exposure apparatus, exposure method, and device manufacturing method
US12/644,703 2009-12-22
PCT/JP2009/071914 WO2010076894A1 (en) 2008-12-29 2009-12-25 Exposure apparatus, exposure method, and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013230683A Division JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012514315A JP2012514315A (ja) 2012-06-21
JP2012514315A5 true JP2012514315A5 (enExample) 2013-01-31
JP5408258B2 JP5408258B2 (ja) 2014-02-05

Family

ID=42061940

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011527532A Active JP5408258B2 (ja) 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8896806B2 (enExample)
JP (2) JP5408258B2 (enExample)
KR (2) KR101831984B1 (enExample)
TW (4) TWI598698B (enExample)
WO (1) WO2010076894A1 (enExample)

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JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110222031A1 (en) * 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
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US9268231B2 (en) * 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6212884B2 (ja) * 2013-03-15 2017-10-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
WO2015052781A1 (ja) * 2013-10-08 2015-04-16 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
JP2017520792A (ja) 2014-07-01 2017-07-27 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ装置を製造する方法
CN109690413B (zh) 2016-09-12 2021-04-13 Asml荷兰有限公司 用于光刻设备的流体处理结构
US11156921B2 (en) * 2017-12-15 2021-10-26 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
CN114402263A (zh) 2019-09-13 2022-04-26 Asml荷兰有限公司 流体处置系统和光刻设备

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US9477158B2 (en) * 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method

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