JP2012514315A5 - - Google Patents

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Publication number
JP2012514315A5
JP2012514315A5 JP2011527532A JP2011527532A JP2012514315A5 JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5 JP 2011527532 A JP2011527532 A JP 2011527532A JP 2011527532 A JP2011527532 A JP 2011527532A JP 2012514315 A5 JP2012514315 A5 JP 2012514315A5
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JP
Japan
Prior art keywords
substrate
liquid
opening
optical system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011527532A
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English (en)
Japanese (ja)
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JP5408258B2 (ja
JP2012514315A (ja
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Publication date
Priority claimed from US12/644,703 external-priority patent/US8896806B2/en
Application filed filed Critical
Publication of JP2012514315A publication Critical patent/JP2012514315A/ja
Publication of JP2012514315A5 publication Critical patent/JP2012514315A5/ja
Application granted granted Critical
Publication of JP5408258B2 publication Critical patent/JP5408258B2/ja
Active legal-status Critical Current
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JP2011527532A 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法 Active JP5408258B2 (ja)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US19383608P 2008-12-29 2008-12-29
US19383408P 2008-12-29 2008-12-29
US19383508P 2008-12-29 2008-12-29
US19383308P 2008-12-29 2008-12-29
US61/193,833 2008-12-29
US61/193,836 2008-12-29
US61/193,835 2008-12-29
US61/193,834 2008-12-29
US12/644,703 2009-12-22
US12/644,703 US8896806B2 (en) 2008-12-29 2009-12-22 Exposure apparatus, exposure method, and device manufacturing method
PCT/JP2009/071914 WO2010076894A1 (en) 2008-12-29 2009-12-25 Exposure apparatus, exposure method, and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013230683A Division JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012514315A JP2012514315A (ja) 2012-06-21
JP2012514315A5 true JP2012514315A5 (enExample) 2013-01-31
JP5408258B2 JP5408258B2 (ja) 2014-02-05

Family

ID=42061940

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011527532A Active JP5408258B2 (ja) 2008-12-29 2009-12-25 露光装置、露光方法、及びデバイス製造方法
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013230683A Active JP5668825B2 (ja) 2008-12-29 2013-11-06 露光装置、液浸部材、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8896806B2 (enExample)
JP (2) JP5408258B2 (enExample)
KR (2) KR102087015B1 (enExample)
TW (4) TWI644182B (enExample)
WO (1) WO2010076894A1 (enExample)

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US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
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US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6212884B2 (ja) * 2013-03-15 2017-10-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
EP3057122B1 (en) * 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
CN106662822A (zh) 2014-07-01 2017-05-10 Asml荷兰有限公司 光刻设备和制造光刻设备的方法
CN113156772A (zh) 2016-09-12 2021-07-23 Asml荷兰有限公司 用于光刻设备的流体处理结构及浸没光刻设备
KR102649164B1 (ko) * 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
KR20220058559A (ko) 2019-09-13 2022-05-09 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 시스템 및 리소그래피 장치

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US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
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US8896806B2 (en) * 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method

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