JP2007515798A5 - - Google Patents

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Publication number
JP2007515798A5
JP2007515798A5 JP2006545996A JP2006545996A JP2007515798A5 JP 2007515798 A5 JP2007515798 A5 JP 2007515798A5 JP 2006545996 A JP2006545996 A JP 2006545996A JP 2006545996 A JP2006545996 A JP 2006545996A JP 2007515798 A5 JP2007515798 A5 JP 2007515798A5
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Japan
Prior art keywords
immersion liquid
substrate
projection system
space
barrier member
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JP2006545996A
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Japanese (ja)
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JP4157146B2 (ja
JP2007515798A (ja
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Priority claimed from US10/743,271 external-priority patent/US7394521B2/en
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Publication of JP4157146B2 publication Critical patent/JP4157146B2/ja
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JP2006545996A 2003-12-23 2004-12-15 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4157146B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method
PCT/EP2004/014282 WO2005064405A2 (en) 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008062774A Division JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2007515798A JP2007515798A (ja) 2007-06-14
JP2007515798A5 true JP2007515798A5 (enExample) 2007-08-02
JP4157146B2 JP4157146B2 (ja) 2008-09-24

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JP2006545996A Expired - Fee Related JP4157146B2 (ja) 2003-12-23 2004-12-15 リソグラフィ装置及びデバイス製造方法
JP2008062774A Expired - Fee Related JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

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JP2008062774A Expired - Fee Related JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

Country Status (7)

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US (2) US7394521B2 (enExample)
EP (3) EP1697799A2 (enExample)
JP (2) JP4157146B2 (enExample)
KR (1) KR100855337B1 (enExample)
CN (2) CN100507721C (enExample)
TW (1) TWI261151B (enExample)
WO (1) WO2005064405A2 (enExample)

Families Citing this family (218)

* Cited by examiner, † Cited by third party
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