KR100855337B1 - 리소그래피 장치 및 디바이스 제조 방법 - Google Patents

리소그래피 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR100855337B1
KR100855337B1 KR1020067012462A KR20067012462A KR100855337B1 KR 100855337 B1 KR100855337 B1 KR 100855337B1 KR 1020067012462 A KR1020067012462 A KR 1020067012462A KR 20067012462 A KR20067012462 A KR 20067012462A KR 100855337 B1 KR100855337 B1 KR 100855337B1
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South Korea
Prior art keywords
substrate
immersion liquid
barrier member
projection system
space
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Expired - Fee Related
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KR1020067012462A
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English (en)
Korean (ko)
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KR20060103271A (ko
Inventor
헬마르 반 산텐
알렉세이 유리에비치 콜레스니첸코
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067012462A 2003-12-23 2004-12-15 리소그래피 장치 및 디바이스 제조 방법 Expired - Fee Related KR100855337B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method
US10/743,271 2003-12-23

Publications (2)

Publication Number Publication Date
KR20060103271A KR20060103271A (ko) 2006-09-28
KR100855337B1 true KR100855337B1 (ko) 2008-09-04

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KR1020067012462A Expired - Fee Related KR100855337B1 (ko) 2003-12-23 2004-12-15 리소그래피 장치 및 디바이스 제조 방법

Country Status (7)

Country Link
US (2) US7394521B2 (enExample)
EP (3) EP1697799A2 (enExample)
JP (2) JP4157146B2 (enExample)
KR (1) KR100855337B1 (enExample)
CN (2) CN101872129B (enExample)
TW (1) TWI261151B (enExample)
WO (1) WO2005064405A2 (enExample)

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