CN100507721C - 光刻装置和器件制造方法 - Google Patents

光刻装置和器件制造方法 Download PDF

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Publication number
CN100507721C
CN100507721C CNB2004800383431A CN200480038343A CN100507721C CN 100507721 C CN100507721 C CN 100507721C CN B2004800383431 A CNB2004800383431 A CN B2004800383431A CN 200480038343 A CN200480038343 A CN 200480038343A CN 100507721 C CN100507721 C CN 100507721C
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CN
China
Prior art keywords
substrate
spacer
projection system
immersion liquid
space
Prior art date
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Expired - Fee Related
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CNB2004800383431A
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English (en)
Chinese (zh)
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CN1898606A (zh
Inventor
H·范桑坦
A·Y·科勒斯奈彻科
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ASML Holding NV
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ASML Holding NV
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Publication of CN1898606A publication Critical patent/CN1898606A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNB2004800383431A 2003-12-23 2004-12-15 光刻装置和器件制造方法 Expired - Fee Related CN100507721C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method
US10/743,271 2003-12-23

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2009101391092A Division CN101872129B (zh) 2003-12-23 2004-12-15 光刻装置和器件制造方法

Publications (2)

Publication Number Publication Date
CN1898606A CN1898606A (zh) 2007-01-17
CN100507721C true CN100507721C (zh) 2009-07-01

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Family Applications (2)

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CNB2004800383431A Expired - Fee Related CN100507721C (zh) 2003-12-23 2004-12-15 光刻装置和器件制造方法
CN2009101391092A Expired - Lifetime CN101872129B (zh) 2003-12-23 2004-12-15 光刻装置和器件制造方法

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CN2009101391092A Expired - Lifetime CN101872129B (zh) 2003-12-23 2004-12-15 光刻装置和器件制造方法

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US (2) US7394521B2 (enExample)
EP (3) EP1697799A2 (enExample)
JP (2) JP4157146B2 (enExample)
KR (1) KR100855337B1 (enExample)
CN (2) CN100507721C (enExample)
TW (1) TWI261151B (enExample)
WO (1) WO2005064405A2 (enExample)

Families Citing this family (218)

* Cited by examiner, † Cited by third party
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