CN101688938A - 选择性吸收的线栅偏振器 - Google Patents
选择性吸收的线栅偏振器 Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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Abstract
一种用于使入射光(12)偏振的选择性吸收的多层线栅偏振器(10a-e),包括设置在基底(14)上方的薄膜层的叠层(18),该薄膜层的叠层(18)包括其周期小于光波长的一半的长金属基元(26)的线栅阵列。这些层中的一个可以包括其折射率大于所述基底的折射率的薄膜层。这些薄膜层中的一个(30a-c)可以包括非金属基元的电介质阵列。这些层中的一个(34a-b)包括对入射光具有光学吸收性的材料。
Description
技术领域
本发明一般涉及用于可见和近可见光谱的选择性吸收的线栅偏振器。
背景技术
线栅偏振器(WGP)为设置在基底(例如玻璃)的表面上的平行线的阵列。通常,线栅偏振器是在基底上的线的单个、周期性的阵列。当线的周期大于光波长的约一半时,栅充当衍射光栅。当线的周期小于光波长的约一半时,栅充当偏振器。
虽然希望WGP透射一种偏振的所有光而反射其它偏振的所有光,但没有偏振器是完美的。实际的WGP将透射两种偏振的一些光,并将反射两种偏振的一些光。当光在透明材料(例如玻璃薄片)的表面上入射时,少量的光被反射。例如,在法向入射时,从玻璃的每个表面反射入射光的约4%。
在一些应用中,还希望WGP透射一种偏振的所有光,同时从光学系统中去除另一种偏振的所有光或大部分光。
已建议在WGP下方或在线与基底之间设置膜,以使第一衍射级向较短波长移动,以便改善在部分可见光谱(例如蓝光)中的性能。参见美国专利No.6,122,103。该膜的折射率小于基底的折射率。还已建议蚀刻到基底或下面的层中以进一步减小线栅下方的有效折射率。参见美国专利No.6,122,103。还进一步建议将每条线形成为具有交替的金属与电介质层的复合结构。参见美国专利No.US 6,532,111。
发明内容
已经公认,开发能够选择性吸收光的一种偏振方向的线栅偏振器是有利的。另外,已经公认,开发这样的偏振器是有利的,该偏振器易于并入许多光学系统而不显著改变光学设计,并且是无机的且耐用的。另外,已经公认,线栅偏振器可以充当用于反射一种偏振态的金属和充当用于另一偏振态的有损耗的电介质的薄膜。因此,已经公认,可以将形序双折射(form birefringence)和有效折射率应用于线栅偏振器。已经进一步公认,充当有损耗的电介质的薄膜可以被设计和配置为优先吸收一种偏振中的能量。另外,已经公认,可以将线栅偏振器视为薄膜层,且并入到光学叠层中。
简明并概括而言,本发明旨在用于使入射光偏振且选择性吸收一种偏振的选择性吸收的线栅偏振器。偏振线栅层设置在基底上并具有周期小于入射光波长的一半的平行金属线的阵列。电介质层设置在所述基底上方且包括电介质材料。吸收层设置在所述基底上方且包括这样的材料,该材料对入射光光学吸收,从而一种偏振基本上被吸收。所述吸收层还具有与所述电介质层的折射率不同的折射率。
附图说明
通过结合附图进行的下列详细说明,本发明的附加的特征和优点将显而易见,这些附图通过实例共同示例了本发明的特征;并且,其中:
图1a是根据本发明的一个实施例的选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征);
图1b是根据本发明的另一实施例的另一选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征);
图2是根据本发明的另一实施例的另一选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征);
图3是根据本发明的另一实施例的另一选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征);
图4是根据本发明的另一实施例的另一选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征);以及
图5是根据本发明的另一实施例的另一选择性吸收的多层线栅偏振器的示意性截面侧视图(附图没有按比例绘制并且为清楚起见非常夸大地示出了特征)。
现在将参考并在此使用特定的语言描述所示例的示例性实施例。然而应该理解,并不旨在由此限制本发明的范围。
具体实施方式
已经公认,对于光的一种偏振,线栅偏振器实质上充当反射光(或其一种偏振)的金属,而对于光的另一种偏振,线栅偏振器实质上充当透射光(或其另一种偏振)的有损耗的电介质的薄膜。因此,已经公认可以将两个概念即形序双折射和有效折射率应用于改善偏振器的性能。
通常不将线栅偏振器考虑为形序双折射的实例。通常,双折射意味着材料对于不同的偏振具有不同的折射率。双折射在晶体材料(例如石英)和在拉伸的聚合物中非常普遍。形序双折射是指由材料的形状造成的双折射。
当材料具有材料特性(例如密度)的变化时,在变化的尺度小于光的波长的情况下,折射率与均匀体材料的折射率不同。存在有效折射率,其是均匀薄膜具有的对光造成相同影响的折射率。该效应的理论处理被称为有效介质理论。通过电介质材料利用该现象,以使这些事物成为蛾眼抗反射涂层。
另外,通常不将线栅偏振器考虑为薄膜。在光学中,典型地仅对于电介质材料考虑形序双折射和有效折射率。然而,已经公认,将线栅偏振器处理为具有有效折射率的等效双折射薄膜允许将其视为薄膜叠层中的基元,并使用具有特定性能目标的薄膜设计技术。
本发明利用薄膜结合金属线栅偏振器,以改善或者说设计偏振器的性能。通常,这可包括在线栅下方和其顶上的膜。这些膜中的任何一者是均匀的或者是电介质栅。线栅可以为复合栅、或具有复合线。将线栅与材料不同的、由此折射率不同的多个层结合可以减少希望被透射的偏振的反射。例如,可以配置线栅以透射p偏振光。如上面讨论的,虽然希望透射所有的p偏振光,但典型的线栅将透射两种偏振的一些并且反射两种偏振的一些。然而,已经发现,将线栅处理为双折射薄膜并将线栅与多个薄膜结合可以减少对p偏振光的反射。在一些应用中,还希望线栅偏振器透射p偏振光的所有光,同时从光学系统中去除s偏振光的所有光或大部分光,例如通过在线栅偏振器内将s偏振光吸收为热。以这种方式,线栅偏振器的表现与常见的具有各种用途的基于聚合物的偏振器基本相同。这会使得线栅偏振器向许多光学系统的并入更容易,而不显著改变光学设计。同时,许多光学系统将受益于诸如线栅偏振器的无机偏振器的提高的耐用性。由此,可将线栅配置为反射很少的s偏振光,或者,换句话说,大量吸收s偏振光而不是反射s偏振光。这可通过线栅与多个不同材料的层的结合而实现,这些不同材料层中的特定层具有光学吸收特性。因此,线栅是s偏振的高效反射器还是s偏振的吸收器属于设计选择。通过将电介质膜或栅适当地选择为位于线栅下方或其顶部,可以实现任一结果。
如图1a-4中所示,将总体用10a-e表示的多层线栅偏振器器件示出作为根据本发明的示例性实施例,以使入射光12偏振或者使一种偏振态与正交偏振态基本分离,同时吸收一种偏振态。相信这样的器件在可见光应用中,或者为用在约400-700nm(纳米)或者说0.4-0.7μm(微米)的范围内的可见光上具有显著的效用。这样的可见光应用可包括投影显示设备,例如投影仪。可以将这里描述的多层线栅偏振器器件用于各种不同的应用,例如偏振器、分束器、检偏器等。同样相信这里的器件在近可见光应用,例如紫外和/或红外应用,或者为用在约250-400nm或700-10,000nm的范围内的光上具有效用。因此,这里宽泛地使用术语“光”来表示可见光、紫外光以及红外光,或者在250-10,000nm范围的电磁波。
偏振器10a-e包括承载或支撑多个膜层或膜层的叠层18的基底14,所述多个膜层包括线栅或者线栅层22。基底14对于被处理的光可以是透明的。例如,基底可以是玻璃(Bk7)。其它基底可以为石英或塑料或熔融硅石。另外,基底14相对于剩余薄膜层可以具有充分的厚度ts。此外,基底可以具有折射率(或折光率)ns。例如,玻璃基底(Bk7)具有1.52的折射率(550nm处)。(应理解,折射率随波长稍微变化。)
线栅或线栅层22包括长金属基元或线26的线栅阵列。基元26具有大于光波长的长度,并以比光波长的一半小的周期P位于通常平行的排列中。因此,为用于可见光,基元26具有大于可见光的波长,或者大于700nm(0.7μm)的长度。然而,该长度可以更长。基元26可以具有小于可见光的波长的一半或者小于350nm(0.36μm)的中心至中心的间隔、间距或周期P。在一个方面中,对于可见光应用,周期P可以小于200nm。在另一方面中,对于可见光应用,周期P可以小于120nm。基元26还可具有处于间距或者周期的10至90%的范围的宽度w。对于可见光应用,基元26还可具有小于光波长或者小于400nm(0.4μm)的厚度或高度t。在一个方面,对于可见光应用,厚度可以小于0.2μm。
对于紫外应用,周期P可以小于200nm。在一个方面中,对于紫外应用,周期P可以小于125nm。对于红外应用,周期P可以小于500nm(但大于350nm)。在另一方面中,对于红外应用,周期P可以小于5,000nm。基元26或阵列通常与入射光相互作用,从而通常透射具有基本上均匀和恒定的线偏振态(例如p偏振)的透射束30。如下面将更详细描述的,通常吸收法向反射为反射束34的s偏振。基元通常透射具有与基元局部正交或垂直地取向的第一偏振态(p偏振)的光。应理解,线栅偏振器将以特定程度的效率分离光的偏振态,或者可以透射和/或吸收两种偏振态的部分。剩余反射束可以减小为该偏振中的初始能量的10%或更小。
可以通过光刻在基底上或上方形成基元26或阵列。基元26可以导电,并可以由铝、银、金或铜形成。另外,基元为无机的,因此是坚固的。
多个膜层18可以包括位于线栅层22下方和/或上方的层。因此,可以在基底14与线栅层22之间设置一个或多个层,如图2、3和4中所示。另外,可以在线栅层22上方设置一个或多个层,如图1a、1b、3和4中所示。层18可以由不同的材料或者与基底14不同的材料甚至彼此不同的材料形成。因此,层18可以具有与基底14的折射率ns不同的折射率n。此外,已经发现,其折射率n1-3比基底14的折射率ns大的层中的至少一个减少了p偏振光的反射。因此,根据本发明的一个方面,偏振器10d或10e具有设置在基底14与线栅层22之间的至少一个膜层,并且膜层18a具有比基底14的折射率ns大的折射率n1。根据本发明的另一方面,偏振器可以具有至少两个膜层,或者至少三个薄膜层。
这些层中的一个或多个可以为电介质层30a-c。在一个方面中,电介质层30a和30b可以设置在线栅层22上方,如图1a和1b中所示。在另一方面中,电介质层30c可设置在线栅层22下方,或者在线栅层22与基底之间,如图2中所示。该电介质层可以对入射光具有光学透射性。
另外,这些层中的一个可以为吸收层34a和34b。在一个方面中,吸收层34a可以设置在线栅层22上方,如图1a和1b中所示。在另一方面中,吸收层34b可设置在线栅层22下方,或者在线栅层22与基底14之间,如图2中所示。该吸收层可以对入射光具有光学吸收性。可以通过电介质层分隔线栅层和吸收层。吸收层和电介质层都可以由电介质材料形成或者可包括电介质材料。另外,吸收层和电介质层都可具有不同的折射率。折射率之一可以大于基底的折射率。如上所述,相信与不同电介质层的显著不同的吸收特性相伴随的层的不同折射率导致在吸收电介质层中优先吸收s偏振光中的能量,因而减少对s偏振光的反射。
应理解,不同的材料对不同波长的入射光具有光学透射性或光学吸收性。对于可见光应用,电介质层包括对可见光具有光学透射性的电介质材料,而吸收层包括对可见光具有光学吸收性的材料。类似地,对于紫外光应用,电介质层包括对紫外光具有光学透射性的电介质材料,而吸收层包括对紫外光具有光学吸收性的材料。类似地,对于红外应用,电介质层包括对红外光具有光学透射性的电介质材料,而吸收层包括对红外光具有光学吸收性的材料。
电介质层和吸收层可以由电介质材料形成或者可以包括电介质材料。例如,这些层可以由:氧化铝;三氧化锑;硫化锑;氧化铍;氧化铋;三氟化铋;硫化镉;碲化镉;氟化钙;氧化铈;锥冰晶石;冰晶石;锗;二氧化铪;氟化镧;氧化镧;氯化铅;氟化铅;碲化铅;氟化锂;氟化镁;氧化镁;氟化钕;氧化钕;氧化镨;氧化钪;硅;氧化硅;三氧化二硅;二氧化硅;氟化钠;五氧化钽;碲;二氧化钛;氯化铊;氧化钇;硒化锌;硫化锌;二氧化锆以及其组合形成。可以在基底上沉积膜层。在金属氧化物的情况下,其可以通过从氧化物蒸发剂材料(根据需要具有附加的氧回填物)开始沉积。然而,还可以通过蒸发基底金属,然后用背景中的O2氧化所沉积的材料来沉积材料。
在一个方面中,电介质层和/或吸收层可以由这样的材料形成或者可包括这样的材料,该材料选自:碲化镉、锗、碲化铅、氧化硅、碲、二氧化钛、硅、硫化镉、硒化锌、硫化锌、碲化镉、锗、碲化铅、氧化硅、碲、二氧化钛、硅、氟化镁、氧化铝、碲化镉、锗、这些材料的非化学计量物类、及其组合。相信碲化镉、锗、碲化铅、氧化硅、碲、二氧化钛、硅、硫化镉、硒化锌、硫化锌适合用于紫外范围;相信碲化镉、锗、碲化铅、氧化硅、碲、二氧化钛、硅适合用于可见范围;相信氟化镁、氧化铝、碲化镉、锗、及其组合适合用于红外范围。
在另一方面中,电介质层和/或吸收层可以由这样的材料形成或者可包括这样的材料,该材料选自:氮化硅、氮化钛、碳化钛、碳化硅、钽、氧化铜、氧化亚铜、氯化铜、氯化亚铜、硫化亚铜、钛、钨、氧化铌、硅化铝、氮化硼、氧化硼、氧化钽、碳、及其组合。
除了在此列出的材料之外,还可包括离子状态的材料,特别是过渡金属的氧化物、氢化物、氮化物、盐等等。
可以使用各种沉积技术,例如溅射、化学气相沉积(CVD)或蒸发,沉积上述多种膜电介质材料,从而产生非化学计量的膜。这可用于产生具有与常用的体化学计量材料不同的光学特性的电介质薄膜。例如,可以通过贫氧溅射来制造氧化钛电介质膜,因而与标准膜相比,具有高得多的光学吸收。利用本发明,这样的膜可用于制造这样的线栅,该线栅强烈吸收一种偏振,而不是强烈反射该偏振。
以类似的方式,可以同样实现其他金属氧化物,例如氧化锆、氧化镁、氧化硅等等。还可以利用诸如氟化镁的金属氟化物、利用诸如氮化硅的金属氮化物、以及利用金属硫化物、硅化物或硒化物,实现类似的效果。
可以控制这些膜层的厚度和材料(或折射率),以减少p偏振光的反射或者(交替地或同时地)增加s偏振光的吸收,如下面更加详细的描述。
为了进一步阐述上面的有关材料以及所述材料的特定分子状态或化学计量的重要性的讨论,知道化学计量反应是其中满足键合条件的维持平衡的反应是有用的。然而,需要考虑对特定化学计量化合物的添加剂。例如,存在不满足全枚举的化合物的离子状态。考虑常用的化合物铁锈,其可以为氧化铁(Fe2O3-III价铁)或者氧化亚铁(FeO-II价铁)。注意,在某些条件下,可将氧化亚铁考虑为非化学计量化合物。在本申请中,存在各种离子状态,其中化学元素可以是稳定的,但具有不同的光学特性。因此,合适的沉积技术可制成具有各种光学特性的混合组分的膜。例如,在文献中,存在TiO2、TiO3和TiO4(与各种配合基络合)的文献。铝也具有作为酸或碱化合物稳定的两性性质。由于不能穷举可能的列表,因此要包括所有所关注材料的所有形式和应用是不实际的。通常,可利用被制造为产生所需吸收特性的各种各样的非化学计量或混合态材料来实施本发明。这是当需要高透射且低吸收的膜时通常不可得到的相当大的自由度,因为公知光学材料中的低吸收特性与非混合态的纯的化学计量膜相伴随。因此,难以列出简单的材料列表,或者,难以限定在本发明范围内起作用的有限的材料集合。如所讨论的,利用合适的制造条件,可以限定可在本发明范围内起作用的宽广的几乎是无限的各种材料。
现在返回到附图,薄膜层中的一个或多个(例如电介质层30a-c)可包括这样的电介质栅,该电介质栅包括非金属基元38的阵列。可以彼此基本上平行地取向阵列的非金属基元38和金属基元26。另外,阵列可以具有基本上相等的周期和/或宽度。在一个方面,电介质栅的非金属基元38与金属基元26对准,或者非金属基元38与线栅层的金属基元26对准,如图1a、1b、2和3中所示。在另一方面,电介质栅的非金属基元38与金属基元26是偏离的,或者非金属基元38相对于线栅层的金属基元26是偏离的,如图4中所示。
如上面所讨论的,可以改变薄膜层18的数目、厚度t和材料(或折射率),以减少对p偏振光的反射(增加对p偏振光的透射)和/或减少对s偏振光的透射(增加对s偏振光的反射或吸收)。这些层中的某些层可以具有均匀的结构和材料,而其他层可包括栅,例如线栅层22的金属基元26或电介质栅的非金属基元38。下面将讨论吸收膜或脊的具体结构以及选择其材料和对应厚度的方法的实例。
通常,可由材料的光学指数n和k来确定光学材料和光学膜吸收特性,其中n为标准折射率,且k为代表所关注的材料的吸收特性的复数部分。当k实质为零时,则该材料高度透明或透射性的。在确定用于本发明的具体结构的希望吸收特性时,对具体材料的膜厚的控制可补偿光学参数k值的各种值。具体而言,如果k值低于希望值,则可增加膜厚以在偏振器中补偿或实现希望的性能。类似地,如果k值高于希望值,则通过补偿膜厚的减少,仍可使用该材料。由于膜的确切厚度取决于在应用中所需的波长范围、对透射偏振的透射和反射偏振的吸收的满足具体应用的权衡、以及其他应用相关的问题,因此要限定使k值与膜厚相关的简单规则是不实际的。通常,k的关注范围为0.1至4.5。
表1中示出了示例性的k值。该表表明随着k值而改变的选择性。由该表可以看出,碲化镉是在所有三种带宽中都可工作的一种化合物的实例。碲化铅、氧化硅、碲、二氧化钛和硅石可在紫外(UV)带宽以及可见带宽中工作的化合物。硫化镉、硒化锌和硫化锌是仅在UV波带而不在可见或红外(IR)中具有功能性吸收的化合物。其他化合物可被标识为仅在可见波带、仅在IR波带或仅在UV波带中或者这三种光带的各种组合中进行吸收。还应注意,给出的该表包括未被视为常用或“标准”光学材料的多种材料。这示例出了通过在实施本发明时注意到所需的吸收材料而在本发明中引入的新的自由度。给出该列表,从而表明对具体的波带的可能的化合物贡献,而不被视为包括所有情况。因此,吸收性材料可具有0.1至4.5的k值。
表1
化合物 | UV(k值) | 可见(k值) | IR(k值) |
碲化镉 | 1.739 | 0.406 | 0.23 |
锗 | 3.96 | 2.165 | 0.123 |
碲化铅 | 1.22 | 5.9 | |
氧化硅 | 1.52 | 0.464 | |
碲 | 1.71 | 5.21 | |
二氧化钛 | 3.19 | 0.251 | |
硫化镉 | 1.64 | ||
硒化锌 | 1.421 | ||
硫化锌 | 0.54 |
这些膜层可连续地延伸跨过基底14,并且在至少两个方向上,或者说与线平行和与线正交的两个方向上,其可以为均匀的、一致的或恒定的层。
参考图1a,示出了选择性吸收的多层线栅偏振器10a。偏振器10a包括设置在基底14上的线栅层或线栅22、以及设置在线栅上方的三个膜层30a、34a和30b。线栅22可包括由铝形成的基元或线26。基底可以为玻璃(BK7)。三个膜层设置在线栅层22上或上方。这三个膜层可以不连续而形成电介质栅。设置在线栅层22上的一个膜层30a可以由对入射光光学透射的材料形成,限定电介质层。另一膜层34a设置在电介质层30a上,且包括对入射光光学吸收的材料,限定吸收层。另一膜层30b设置在吸收层34a上,且包括对入射光光学透射的材料,限定另一电介质层。
偏振器10a可被配置用于可见的入射光(400-700nm)。线栅的基元26的厚度或高度twg可以为160nm。第一电介质层或栅30a可具有100nm的厚度t1,并且可由氧化硅(SiO2)形成,其中折射率n1为1.45。吸收层或栅34a也可具有100nm的厚度t2,并且可由对可见光光学吸收的材料形成,其中折射率n2为2.5。栅的周期P可以为144nm。基元的宽度可为周期P的45%,或者57nm。可以使光12以45度入射。
可以通过沉积铝层、二氧化硅层、吸收材料层和二氧化硅层,然后蚀刻这些层以形成脊和线,形成该偏振器10a。
图1a的偏振器10a的性能与在顶部没有电介质栅的类似的偏振器相似,且偏振器10a中所反射的s偏振显著较小,而偏振器10a中所透射的p偏振也较大。由于栅的周期P小于可见光的波长,它们实质上都表现为薄膜。
参考图1b,示出了与图1a的偏振器10a在多数方面相似的另一选择性吸收的多层线栅偏振器10b。另外,偏振器10b包括在基底14b中蚀刻出的沟槽50,以形成从其上延伸的脊54。线栅层22的线26可被支撑在脊54上,由此可具有相同的周期。可通过过蚀刻上述层而将沟槽蚀刻到基底中,形成该偏振器。
参考图2,示出了与上述偏振器在多数方面相似的另一选择性吸收的多层线栅偏振器10c。另外,偏振器10c具有设置在线栅层22与基底14之间的吸收层34b和电介质层30c。
参考图3和4,示出了与上述偏振器在多数方面相似的其他选择性吸收的多层线栅偏振器10d和10e。另外,偏振器10d和10e具有设置在线栅层22上方和下方的其他膜层。
参考图5,示出了与图1a的偏振器10a在许多方面相似的另一选择性吸收的多层线栅偏振器10f。另外,该偏振器包括设置在基底14与线栅层22之间的至少三个层。
这里给出的实例只是可以由本发明实现的许多可能中的一些。通常,对于特定的应用,例如对光的给定波带在入射角的给定范围内优化透射或反射,可以设计均匀层与电介质栅的组合。并且,对于特定的应用,例如对光的给定波带在入射角的给定范围内优化一种偏振的透射和正交偏振的吸收,可以设计均匀层与电介质栅的组合。可以对透射或反射;对透射或吸收,或者对这些特性的某种组合一起进行优化。可以对在偏振器上从空气侧或从基底侧或者从这两侧的入射进行优化。
在美国专利5,986,730;6,081,376;6,122,103;6,208,463;6,243,199;6,288,840;6,348,995;6,108,131;6,452,724;6,710,921;6,234,634;6,447,120以及6,666,556中示出了线栅偏振器、光学系统和/或投影/显示系统的各种方面,这里引用它们作为参考。
尽管已经将线栅偏振器示例为朝向光源或者其中长基元朝向光源,应该理解这仅用于示例的目的。本领域的技术人员将理解,可以将线栅偏振器取向为例如从液晶阵列朝向成像承载束(imaging bearing beam),用于避免使载像束穿过基底、从而避免与穿过介质(例如基底)的光相关联的重影或多次反射的简单目的。这样的配置可以产生背对着光源的线栅偏振器。
虽然上述实例是作为本发明的原理在一种或多种特定的应用中的示例,但对于本领域的普通技术人员而言,很显然,在不需创造性的劳动并且不偏离本发明的原理和构思的情况下,可以在实施的形式、用法和细节上进行多种修改。因此,本发明旨在仅受下面提出的权利要求的限制。
Claims (22)
1.一种用于使入射光偏振且选择性吸收一种偏振的选择性吸收的线栅偏振器器件,所述器件包括:
a)基底;
b)至少两个膜层,其设置在所述基底上方,所述膜层具有彼此不同的折射率;
c)所述两个膜层中的至少一个的折射率大于所述基底的折射率;以及
d)线栅层,其设置在所述基底上方,所述线栅层包括其长度大于入射光的波长且其周期小于所述入射光的波长的一半的长金属基元的阵列;以及
e)所述膜层中的至少一个包括限定吸收层的对所述入射光具有光学吸收性的材料,以便基本吸收一种偏振。
2.根据权利要求1的器件,其中所述至少两个膜层包括设置在所述基底与所述线栅层之间的至少三个连续膜层。
3.根据权利要求1的器件,其中所述至少两个膜层包括设置在所述基底与所述线栅层之间的具有电介质脊阵列的电介质栅,所述线栅层的金属基元和所述电介质栅的电介质脊被取向为彼此基本平行且具有基本相等的周期。
4.根据权利要求1的器件,其中所述至少两个膜层包括设置在所述线栅层上方的具有电介质脊阵列的电介质层,以及设置在所述线栅层与所述电介质层之间且在与所述脊正交的方向上连续的连续膜层。
5.根据权利要求1的器件,其中所述至少两个膜层不连续,从而形成与所述线栅层的基元平行地取向的平行脊的阵列。
6.根据权利要求1的器件,其中所述至少两个膜层所包括的材料选自:已沉积为非化学计量的金属氧化物、金属氮化物、金属氟化物、金属硒化物、金属硫化物、以及其组合。
7.根据权利要求1的器件,其中所述吸收层包括这样的电介质栅,该电介质栅包括非金属基元的阵列,所述阵列的所述非金属和金属基元被取向为彼此基本平行,并且这些阵列具有基本相等的周期。
8.根据权利要求7的器件,其中所述吸收层的材料选自:氮化硅、氮化钛、碳化钛、碳化硅、钽、氧化铜、氧化亚铜、氯化铜、氯化亚铜、硫化亚铜、钛、钨、氧化铌、硅化铝、氮化硼、氧化硼、氧化钽、碳、以及其组合。
9.根据权利要求7的器件,其中所述吸收层的材料具有0.1至4.5的k值。
10.一种用于使入射光偏振且选择性吸收一种偏振的选择性吸收的线栅偏振器器件,所述器件包括:
a)基底,其具有折射率;
b)偏振线栅层,其设置在所述基底上方,且具有周期小于入射光波长的一半的平行金属线的阵列;
c)电介质层,其设置在所述基底上方,且包括电介质材料;以及
d)吸收层,其设置在所述基底上方,包括对所述入射光具有光学吸收性以便基本吸收一种偏振的材料,且具有与所述电介质层的折射率不同的折射率。
11.根据权利要求10的器件,还包括设置在所述基底与所述线栅层之间的至少三个连续膜层,所述连续膜层在于所述线正交的方向上连续。
12.根据权利要求10的器件,其中所述电介质层包括设置在所述基底与所述线栅层之间的具有电介质脊阵列的电介质栅,所述线栅层的金属基元和所述电介质栅的电介质脊被取向为彼此基本平行且具有基本相等的周期。
13.根据权利要求10的器件,其中所述电介质层设置在具有电介质脊阵列的线栅层上方;并且还包括设置在所述线栅层与所述电介质层之间且在与所述脊正交的方向上连续的连续膜层。
14.根据权利要求10的器件,其中所述器件选择性吸收可见光谱内的光;其中所述线栅层的基元的阵列的周期小于350nm;并且其中所述吸收层的材料包括对可见光谱内的光具有光学吸收性的材料。
15.根据权利要求10的器件,其中所述器件选择性吸收紫外光谱内的光;其中所述线栅层的基元的阵列的周期小于200nm;并且其中所述吸收层的材料包括对紫外光谱内的光具有光学吸收性的材料。
16.根据权利要求10的器件,其中所述器件选择性吸收红外光谱内的光;其中所述线栅层的基元的阵列的周期小于500nm;并且其中所述吸收层的材料包括对红外光谱内的光具有光学吸收性的材料。
17.根据权利要求10的器件,其中所述电介质层和所述吸收层均不连续,从而形成其脊与所述线栅层的线平行且对准的脊的阵列。
18.根据权利要求10的器件,其中所述吸收层的材料选自:氮化硅、氮化钛、碳化钛、碳化硅、钽、氧化铜、氧化亚铜、氯化铜、氯化亚铜、硫化亚铜、钛、钨、氧化铌、硅化铝、氮化硼、氧化硼、氧化钽、碳、以及其组合。
19.根据权利要求10的器件,其中所述吸收层的材料具有0.1至4.5的k值。
20.一种用于使入射光偏振且选择性吸收一种偏振的选择性吸收的线栅偏振器器件,所述器件包括:
a)基底,其具有折射率;
b)至少三个不同的层,其设置在所述基底上方,且包括:
i)偏振层,其包括传导性材料;
ii)吸收层,其具有大于所述基底的折射率的折射率,且包括对所
述入射光具有光学吸收性的材料;以及
iii)电介质层,其折射率不同于所述吸收层的折射率;以及
c)所述至少三个层不连续,从而形成周期小于所述入射光的波长的平行脊的阵列。
21.根据权利要求20的器件,其中所述吸收层的材料选自:氮化硅、氮化钛、碳化钛、碳化硅、钽、氧化铜、氧化亚铜、氯化铜、氯化亚铜、硫化亚铜、钛、钨、氧化铌、硅化铝、氮化硼、氧化硼、氧化钽、碳、以及其组合。
22.根据权利要求20的器件,其中所述吸收层的材料具有0.1至4.5的k值。
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CN102455456A (zh) * | 2010-11-01 | 2012-05-16 | 精工爱普生株式会社 | 偏振光元件及其制造方法、投影仪、液晶装置及电子设备 |
CN103197368A (zh) * | 2013-04-28 | 2013-07-10 | 南京大学 | 一种三明治结构线栅宽带偏振器及其制备方法 |
US9261730B2 (en) | 2013-01-03 | 2016-02-16 | Empire Technology Development Llc | Display devices including inorganic components and methods of making and using the same |
CN105542670A (zh) * | 2014-10-24 | 2016-05-04 | 三星Sdi株式会社 | 用于偏光板的粘着膜、包含粘着膜的偏光板以及包含偏光板的光学显示器 |
CN105974644A (zh) * | 2016-07-13 | 2016-09-28 | 深圳市华星光电技术有限公司 | 液晶显示器 |
CN108121031A (zh) * | 2017-12-28 | 2018-06-05 | 深圳市华星光电技术有限公司 | 金属栅偏光片及其制作方法、液晶显示器 |
WO2019006800A1 (zh) * | 2017-07-07 | 2019-01-10 | 深圳市华星光电技术有限公司 | 纳米线栅偏光片的制作方法 |
CN109521507A (zh) * | 2017-09-18 | 2019-03-26 | 朗美通经营有限责任公司 | 衍射光学元件 |
CN109557605A (zh) * | 2017-09-26 | 2019-04-02 | 迪睿合株式会社 | 偏振光元件及其制造方法、以及光学设备 |
CN109677083A (zh) * | 2019-03-01 | 2019-04-26 | 北京伊斯普电子技术有限公司 | 一种红外激光阻断薄膜及其制备方法 |
US10353239B2 (en) | 2017-07-07 | 2019-07-16 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Method of manufacturing nanowire grid polarizer |
CN110095832A (zh) * | 2018-01-31 | 2019-08-06 | 三星显示有限公司 | 偏振器、光学设备、显示设备和制备偏振器的方法 |
CN111812764A (zh) * | 2019-04-10 | 2020-10-23 | 迪睿合株式会社 | 光学元件用薄膜及其制造方法、无机偏振片及其制造方法、以及光学元件和光学仪器 |
CN112241038A (zh) * | 2019-07-17 | 2021-01-19 | 莫克斯泰克公司 | 高指数、弯帽线栅偏振器 |
CN114786529A (zh) * | 2019-12-10 | 2022-07-22 | 欧莱雅 | 用美容组合物填充包装和分配装置的方法 |
WO2022178769A1 (zh) * | 2021-02-25 | 2022-09-01 | 京东方科技集团股份有限公司 | 偏振片及其制造方法、显示面板及显示装置 |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7294851B2 (en) * | 2004-11-03 | 2007-11-13 | Infineon Technologies Ag | Dense seed layer and method of formation |
US7961393B2 (en) * | 2004-12-06 | 2011-06-14 | Moxtek, Inc. | Selectively absorptive wire-grid polarizer |
US8755113B2 (en) * | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
JP4412388B2 (ja) * | 2007-10-31 | 2010-02-10 | セイコーエプソン株式会社 | 光学素子、液晶装置及び電子機器 |
JP5606052B2 (ja) * | 2009-01-13 | 2014-10-15 | キヤノン株式会社 | 光学素子 |
KR101610376B1 (ko) * | 2009-04-10 | 2016-04-08 | 엘지이노텍 주식회사 | 와이어 그리드 편광자, 이를 포함하는 액정 표시 장치 및 와이어 그리드 편광자의 제조 방법 |
US8248696B2 (en) | 2009-06-25 | 2012-08-21 | Moxtek, Inc. | Nano fractal diffuser |
US9214583B2 (en) * | 2010-03-19 | 2015-12-15 | Hirak Mitra | Method to build transparent polarizing solar cell |
NZ605399A (en) | 2010-06-30 | 2014-10-31 | 3M Innovative Properties Co | Multi-layer articles capable of forming color images and methods of forming color images |
US8611007B2 (en) | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
US20150077851A1 (en) | 2010-12-30 | 2015-03-19 | Moxtek, Inc. | Multi-layer absorptive wire grid polarizer |
JP5682312B2 (ja) * | 2011-01-05 | 2015-03-11 | ソニー株式会社 | 固体撮像装置の製造方法 |
JP2012181420A (ja) | 2011-03-02 | 2012-09-20 | Sony Chemical & Information Device Corp | 偏光素子 |
JP5765984B2 (ja) * | 2011-03-28 | 2015-08-19 | キヤノン株式会社 | 偏光分離素子および画像投射装置 |
US8913320B2 (en) | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
US8873144B2 (en) | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
JP2013104992A (ja) * | 2011-11-14 | 2013-05-30 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、プロジェクター、液晶装置、および電子機器 |
KR101841619B1 (ko) * | 2011-11-14 | 2018-03-26 | 삼성디스플레이 주식회사 | 금속선 격자 편광소자를 포함하는 액정 표시 장치 및 그 제조 방법 |
US8922890B2 (en) | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
JP6007830B2 (ja) * | 2012-03-26 | 2016-10-12 | 旭硝子株式会社 | 透過型回折素子 |
US9261635B2 (en) * | 2012-06-29 | 2016-02-16 | Infinera Corporation | Rotator external to photonic integrated circuit |
WO2014035170A1 (ko) * | 2012-08-29 | 2014-03-06 | 주식회사 엘지화학 | 편광 자외선 분리 소자 |
JP2014134564A (ja) * | 2013-01-08 | 2014-07-24 | Canon Inc | 吸収型ワイヤグリッド偏光素子および光学機器 |
KR102117600B1 (ko) * | 2013-05-28 | 2020-06-02 | 삼성디스플레이 주식회사 | 편광판 및 이를 포함하는 액정 표시 장치 |
JP6285131B2 (ja) | 2013-07-10 | 2018-02-28 | デクセリアルズ株式会社 | 偏光板、及び偏光板の製造方法 |
JP6527211B2 (ja) * | 2013-07-10 | 2019-06-05 | デクセリアルズ株式会社 | 偏光板、及び偏光板の製造方法 |
WO2015005480A1 (ja) * | 2013-07-11 | 2015-01-15 | デクセリアルズ株式会社 | 偏光板、及び偏光板の製造方法、バンドル構造の製造方法 |
JP5866577B2 (ja) * | 2013-07-29 | 2016-02-17 | パナソニックIpマネジメント株式会社 | 光学フィルタおよびそれを用いた偏光撮像装置 |
KR102116308B1 (ko) | 2013-09-04 | 2020-06-01 | 삼성디스플레이 주식회사 | 표시 장치 |
US9632223B2 (en) | 2013-10-24 | 2017-04-25 | Moxtek, Inc. | Wire grid polarizer with side region |
JP5983596B2 (ja) | 2013-12-26 | 2016-08-31 | ウシオ電機株式会社 | 紫外線偏光光照射方法及び光配向層付き基板の製造方法 |
JP2015219319A (ja) | 2014-05-15 | 2015-12-07 | デクセリアルズ株式会社 | 無機偏光板及びその製造方法 |
US9726897B2 (en) * | 2014-05-28 | 2017-08-08 | Motex, Inc. | Cube polarizer with minimal optical path length difference |
US10268046B2 (en) * | 2014-05-28 | 2019-04-23 | Moxtek, Inc. | Cube polarizer |
IL232866B (en) * | 2014-05-29 | 2020-08-31 | Elta Systems Ltd | Polarization rotator |
US9684203B2 (en) | 2014-06-25 | 2017-06-20 | Moxtek, Inc. | Wire grid polarizer with dual absorptive regions |
US9632224B2 (en) | 2014-06-25 | 2017-04-25 | Moxtek, Inc. | Broadband, selectively-absorptive wire grid polarizer |
CN106662687A (zh) * | 2014-06-25 | 2017-05-10 | 莫克斯泰克公司 | 具有双吸收区域的线栅偏振器 |
US10088616B2 (en) | 2014-09-19 | 2018-10-02 | Toyota Motor Engineering & Manufacturing North America, Inc. | Panel with reduced glare |
US10234613B2 (en) | 2015-02-06 | 2019-03-19 | Moxtek, Inc. | High contrast inverse polarizer |
JP5936727B2 (ja) * | 2015-02-09 | 2016-06-22 | デクセリアルズ株式会社 | 偏光素子 |
US9703028B2 (en) | 2015-04-03 | 2017-07-11 | Moxtek, Inc. | Wire grid polarizer with phosphonate protective coating |
US10054717B2 (en) | 2015-04-03 | 2018-08-21 | Moxtek, Inc. | Oxidation and moisture barrier layers for wire grid polarizer |
US20160291227A1 (en) | 2015-04-03 | 2016-10-06 | Moxtek, Inc. | Wire Grid Polarizer with Water-Soluble Materials |
US10534120B2 (en) | 2015-04-03 | 2020-01-14 | Moxtek, Inc. | Wire grid polarizer with protected wires |
KR102413970B1 (ko) | 2015-04-08 | 2022-06-28 | 삼성디스플레이 주식회사 | 와이어 그리드 편광자 및 이의 제조방법 |
EP3335432B1 (en) | 2015-08-12 | 2024-02-14 | University of Washington | Backscatter devices and network systems incorporating backscatter devices |
US20170059758A1 (en) | 2015-08-24 | 2017-03-02 | Moxtek, Inc. | Small-Pitch Wire Grid Polarizer |
US11231544B2 (en) | 2015-11-06 | 2022-01-25 | Magic Leap, Inc. | Metasurfaces for redirecting light and methods for fabricating |
US10175401B2 (en) | 2015-11-12 | 2019-01-08 | Moxtek, Inc. | Dual-purpose, absorptive, reflective wire grid polarizer |
CN105487160B (zh) * | 2016-01-15 | 2018-12-18 | 京东方科技集团股份有限公司 | 金属线栅偏振器及其制作方法、显示装置 |
US10527759B2 (en) * | 2016-04-18 | 2020-01-07 | Toyota Motor Engineering & Manufacturing North America, Inc. | Anti-glare panels |
CN113484944A (zh) | 2016-05-06 | 2021-10-08 | 奇跃公司 | 具有用于重定向光的非对称光栅的超表面及其制造方法 |
US10571614B2 (en) | 2016-08-16 | 2020-02-25 | Moxek, Inc. | Wire grid polarizer heat sink having specified reflective layer, absorptive layer, and heat-dissipation layer |
US10444410B2 (en) | 2016-08-16 | 2019-10-15 | Moxtek, Inc. | Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier |
US10408983B2 (en) | 2016-08-16 | 2019-09-10 | Moxtek, Inc. | Durable, high performance wire grid polarizer having permeable junction between top protection layer |
US10139537B2 (en) | 2016-11-22 | 2018-11-27 | Moxtek, Inc. | Multiple-stack wire grid polarizer |
IL268115B2 (en) | 2017-01-27 | 2024-01-01 | Magic Leap Inc | Anti-reflective coatings for cell surfaces |
CA3051414A1 (en) | 2017-01-27 | 2018-08-02 | Magic Leap, Inc. | Diffraction gratings formed by metasurfaces having differently oriented nanobeams |
US10838220B2 (en) | 2017-04-14 | 2020-11-17 | Moxtek, Inc. | Miniature, durable polarization devices |
CN107203014A (zh) * | 2017-06-01 | 2017-09-26 | 武汉华星光电技术有限公司 | 一种蛾眼微结构的制备方法、抗反射基板及电子产品 |
US10690828B2 (en) | 2017-08-30 | 2020-06-23 | Moxtek, Inc. | Adhesive-free polarizer |
US10649121B2 (en) | 2017-10-05 | 2020-05-12 | Moxtek, Inc. | Low Ts wire grid polarizer |
CN109975910B (zh) | 2017-12-28 | 2022-02-18 | 迪睿合株式会社 | 偏振光板及其制造方法以及光学设备 |
JP2019144334A (ja) * | 2018-02-19 | 2019-08-29 | デクセリアルズ株式会社 | 偏光板及びその製造方法、並びに光学機器 |
US10852464B2 (en) * | 2018-03-01 | 2020-12-01 | Moxtek, Inc. | High-contrast polarizer |
JP6642622B2 (ja) | 2018-05-23 | 2020-02-05 | セイコーエプソン株式会社 | ワイヤーグリッド偏光素子、液晶装置、および電子機器 |
JP6826073B2 (ja) | 2018-05-31 | 2021-02-03 | デクセリアルズ株式会社 | 偏光板及びその製造方法、並びに光学機器 |
JP6609351B1 (ja) | 2018-06-18 | 2019-11-20 | デクセリアルズ株式会社 | 偏光板およびその製造方法 |
JP7236230B2 (ja) * | 2018-09-07 | 2023-03-09 | デクセリアルズ株式会社 | 光学素子、液晶表示装置および投射型画像表示装置 |
US20200124779A1 (en) * | 2018-10-22 | 2020-04-23 | Board Of Regents, The University Of Texas System | Layered sheet polarizers and isolators |
CN111198413A (zh) | 2018-11-20 | 2020-05-26 | 迪睿合株式会社 | 偏振光片及具备该偏振光片的光学设备 |
US11150391B2 (en) | 2018-11-30 | 2021-10-19 | Moxtek, Inc. | Flexible wire grid polarizer |
JP7075372B2 (ja) * | 2019-04-26 | 2022-05-25 | デクセリアルズ株式会社 | 偏光板及びその製造方法、並びに光学機器 |
JP7356291B2 (ja) | 2019-08-23 | 2023-10-04 | デクセリアルズ株式会社 | 偏光板及び光学機器 |
US11543584B2 (en) * | 2020-07-14 | 2023-01-03 | Meta Platforms Technologies, Llc | Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon |
US11353644B2 (en) | 2020-10-01 | 2022-06-07 | A. U. Vista, Inc. | Display device having blended display panel |
Family Cites Families (439)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2287598A (en) | 1937-12-28 | 1942-06-23 | Polaroid Corp | Method of manufacturing lightpolarizing bodies |
US2224214A (en) | 1937-12-28 | 1940-12-10 | Polaroid Corp | Light polarizing body |
US2237567A (en) | 1939-05-04 | 1941-04-08 | Polaroid Corp | Light polarizer and process of manufacturing the same |
CH230613A (de) | 1939-11-08 | 1944-01-15 | Ges Foerderung Forschung Technische Physik Eth Zuerich | Anordnung zur Wiedergabe eines Fernsehbildes. |
US2605352A (en) | 1940-08-28 | 1952-07-29 | Fischer Ernst Friedrich | Deformable medium for controlling a light stream |
US2403731A (en) | 1943-04-01 | 1946-07-09 | Eastman Kodak Co | Beam splitter |
US2748659A (en) | 1951-02-26 | 1956-06-05 | Jenaer Glaswerk Schott & Gen | Light source, searchlight or the like for polarized light |
US2887566A (en) | 1952-11-14 | 1959-05-19 | Marks Polarized Corp | Glare-eliminating optical system |
NL197714A (zh) | 1954-06-01 | 1900-01-01 | ||
US2815452A (en) | 1954-11-12 | 1957-12-03 | Baird Associates Inc | Interferometer |
US3046839A (en) | 1959-01-12 | 1962-07-31 | Polaroid Corp | Processes for preparing light polarizing materials |
US3084590A (en) | 1959-02-26 | 1963-04-09 | Gen Electric | Optical system |
NL254460A (zh) | 1960-08-02 | |||
US3235630A (en) | 1962-07-17 | 1966-02-15 | Little Inc A | Method of making an optical tool |
US3293331A (en) | 1962-11-13 | 1966-12-20 | Little Inc A | Method of forming replicas of contoured substrates |
US3291871A (en) | 1962-11-13 | 1966-12-13 | Little Inc A | Method of forming fine wire grids |
US3479168A (en) | 1964-03-09 | 1969-11-18 | Polaroid Corp | Method of making metallic polarizer by drawing fusion |
US3291550A (en) | 1965-04-16 | 1966-12-13 | Polaroid Corp | Metallic grid light-polarizing device |
US3436143A (en) | 1965-11-30 | 1969-04-01 | Bell Telephone Labor Inc | Grid type magic tee |
US3566099A (en) | 1968-09-16 | 1971-02-23 | Polaroid Corp | Light projection assembly |
US3627431A (en) | 1969-12-22 | 1971-12-14 | John Victor Komarniski | Densitometer |
US3631288A (en) | 1970-01-23 | 1971-12-28 | Polaroid Corp | Simplified polarized light projection assembly |
US3653741A (en) | 1970-02-16 | 1972-04-04 | Alvin M Marks | Electro-optical dipolar material |
US3731986A (en) | 1971-04-22 | 1973-05-08 | Int Liquid Xtal Co | Display devices utilizing liquid crystal light modulation |
CH558023A (de) | 1972-08-29 | 1975-01-15 | Battelle Memorial Institute | Polarisationsvorrichtung. |
US3877789A (en) | 1972-11-08 | 1975-04-15 | Marie G R P | Mode transformer for light or millimeter electromagnetic waves |
US4049944A (en) | 1973-02-28 | 1977-09-20 | Hughes Aircraft Company | Process for fabricating small geometry semiconductive devices including integrated components |
US3969545A (en) | 1973-03-01 | 1976-07-13 | Texas Instruments Incorporated | Light polarizing material method and apparatus |
US3857628A (en) | 1973-08-29 | 1974-12-31 | Hoffmann La Roche | Selective polarizer arrangement for liquid crystal displays |
US3857627A (en) | 1973-08-29 | 1974-12-31 | Hoffmann La Roche | Polarizer arrangement for liquid crystal displays |
US3912369A (en) | 1974-07-02 | 1975-10-14 | Gen Electric | Single polarizer reflective liquid crystal display |
US4025688A (en) | 1974-08-01 | 1977-05-24 | Polaroid Corporation | Polarizer lamination |
CH582894A5 (zh) | 1975-03-17 | 1976-12-15 | Bbc Brown Boveri & Cie | |
US4009933A (en) | 1975-05-07 | 1977-03-01 | Rca Corporation | Polarization-selective laser mirror |
US4104598A (en) | 1975-06-09 | 1978-08-01 | Hughes Aircraft Company | Laser internal coupling modulation arrangement with wire grid polarizer serving as a reflector and coupler |
DE2529112C3 (de) | 1975-06-30 | 1978-03-23 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Ultraschall-Applikator für die zeilenweise Ultraschallabtastung von Körpern |
JPS6034742B2 (ja) | 1976-02-20 | 1985-08-10 | ミノルタ株式会社 | 光学的ロ−パスフイルタ− |
US4073571A (en) | 1976-05-05 | 1978-02-14 | Hughes Aircraft Company | Circularly polarized light source |
US4181756A (en) | 1977-10-05 | 1980-01-01 | Fergason James L | Process for increasing display brightness of liquid crystal displays by bleaching polarizers using screen-printing techniques |
DE2818103A1 (de) | 1978-04-25 | 1979-11-08 | Siemens Ag | Verfahren zur herstellung von aus einer vielzahl von auf einer glastraegerplatte angeordneten parallel zueinander ausgerichteten elektrisch leitenden streifen bestehenden polarisatoren |
JPS6033246B2 (ja) | 1978-07-26 | 1985-08-01 | 三立電機株式会社 | 多色表示用偏光板の製造方法 |
DE2915847C2 (de) | 1978-09-29 | 1986-01-16 | Nitto Electric Industrial Co., Ltd., Ibaraki, Osaka | Elektrooptisch aktivierbare Anzeige |
US4221464A (en) | 1978-10-17 | 1980-09-09 | Hughes Aircraft Company | Hybrid Brewster's angle wire grid infrared polarizer |
US4289381A (en) | 1979-07-02 | 1981-09-15 | Hughes Aircraft Company | High selectivity thin film polarizer |
US4308079A (en) | 1980-06-16 | 1981-12-29 | Martin Marietta Corporation | Durability of adhesively bonded aluminum structures and method for inhibiting the conversion of aluminum oxide to aluminum hydroxide |
US4514479A (en) | 1980-07-01 | 1985-04-30 | The United States Of America As Represented By The Secretary Of The Navy | Method of making near infrared polarizers |
DE3169810D1 (en) | 1980-07-28 | 1985-05-15 | Bbc Brown Boveri & Cie | Homeotropic nematic display with an internal reflector |
US4441791A (en) | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
US4466704A (en) | 1981-07-20 | 1984-08-21 | Polaroid Corporation | Patterned polarizer having differently dyed areas |
US4532619A (en) | 1982-01-22 | 1985-07-30 | Hitachi, Ltd. | Method and apparatus for reducing semiconductor laser optical noise |
US4512638A (en) | 1982-08-31 | 1985-04-23 | Westinghouse Electric Corp. | Wire grid polarizer |
US4515441A (en) | 1982-10-13 | 1985-05-07 | Westinghouse Electric Corp. | Dielectric polarizer for high average and high peak power operation |
DE3244885A1 (de) | 1982-12-02 | 1984-06-07 | Merck Patent Gmbh, 6100 Darmstadt | Farbselektiver zirkularpolarisator und seine verwendung |
US4515443A (en) | 1982-12-29 | 1985-05-07 | The United States Of America As Represented By The Secretary Of The Army | Passive optical system for background suppression in starring imagers |
US4560599A (en) | 1984-02-13 | 1985-12-24 | Marquette University | Assembling multilayers of polymerizable surfactant on a surface of a solid material |
FR2564605B1 (fr) | 1984-05-18 | 1987-12-24 | Commissariat Energie Atomique | Cellule a cristal liquide susceptible de presenter une structure homeotrope, a birefringence compensee pour cette structure |
SU1283685A1 (ru) | 1985-02-20 | 1987-01-15 | Предприятие П/Я А-1705 | Решетка-пол ризатор |
US4679910A (en) | 1985-03-20 | 1987-07-14 | Hughes Aircraft Company | Dual liquid-crystal cell-based visible-to-infrared dynamic image converter |
US4688897A (en) | 1985-06-17 | 1987-08-25 | Hughes Aircraft Company | Liquid crystal device |
US4712881A (en) | 1985-06-21 | 1987-12-15 | The United States Of America As Represented By The Secretary Of The Army | Birefringent artificial dielectric structures |
JPS626225A (ja) | 1985-07-02 | 1987-01-13 | Semiconductor Energy Lab Co Ltd | 液晶表示装置 |
JPS6231822A (ja) | 1985-08-02 | 1987-02-10 | Hitachi Ltd | 液晶表示素子 |
US4743093A (en) | 1985-09-16 | 1988-05-10 | Eastman Kodak Company | Optical disc player lens |
FR2588093B1 (fr) | 1985-09-27 | 1987-11-20 | Thomson Csf | Polariseur par absorption differentielle, son procede de realisation et dispositif mettant en oeuvre ledit procede |
JPS6275418A (ja) | 1985-09-27 | 1987-04-07 | Alps Electric Co Ltd | 液晶素子 |
US4724436A (en) | 1986-09-22 | 1988-02-09 | Environmental Research Institute Of Michigan | Depolarizing radar corner reflector |
US4743092A (en) | 1986-11-26 | 1988-05-10 | The United States Of America As Represented By The Secretary Of The Army | Polarizing grids for far-infrared and method for making same |
US4759611A (en) | 1986-12-19 | 1988-07-26 | Polaroid Corporation, Patent Department | Liquid crystal display having silylated light polarizers |
US4795233A (en) | 1987-03-09 | 1989-01-03 | Honeywell Inc. | Fiber optic polarizer |
DE3707984A1 (de) | 1987-03-12 | 1988-09-22 | Max Planck Gesellschaft | Polarisierender spiegel fuer optische strahlung |
US4840757A (en) | 1987-05-19 | 1989-06-20 | S. D. Warren Company | Replicating process for interference patterns |
FR2623649B1 (fr) | 1987-11-23 | 1992-05-15 | Asulab Sa | Cellule d'affichage a cristal liquide |
US4865670A (en) | 1988-02-05 | 1989-09-12 | Mortimer Marks | Method of making a high quality polarizer |
FR2629924B1 (fr) | 1988-04-08 | 1992-09-04 | Comp Generale Electricite | Polariseur a couches dielectriques |
US4893905A (en) | 1988-06-10 | 1990-01-16 | Hughes Aircraft Company | Optical light valve system for providing phase conjugated beam of controllable intensity |
JP2703930B2 (ja) | 1988-06-29 | 1998-01-26 | 日本電気株式会社 | 複屈折回折格子型偏光子 |
JPH0212105A (ja) | 1988-06-29 | 1990-01-17 | Nec Corp | 複屈折回折格子型偏光子 |
JPH0215238A (ja) | 1988-07-04 | 1990-01-18 | Stanley Electric Co Ltd | 異方性補償ホメオトロピック液晶表示装置 |
JPH0223304A (ja) | 1988-07-12 | 1990-01-25 | Toray Ind Inc | 可視偏光フイルム |
US4895769A (en) | 1988-08-09 | 1990-01-23 | Polaroid Corporation | Method for preparing light polarizer |
US4915463A (en) | 1988-10-18 | 1990-04-10 | The United States Of America As Represented By The Department Of Energy | Multilayer diffraction grating |
US4939526A (en) | 1988-12-22 | 1990-07-03 | Hughes Aircraft Company | Antenna system having azimuth rotating directive beam with selectable polarization |
US4913529A (en) | 1988-12-27 | 1990-04-03 | North American Philips Corp. | Illumination system for an LCD display system |
US4870649A (en) | 1988-12-28 | 1989-09-26 | American Telephone And Telegraph Company, At&T Bell Laboratories | Tranverse mode control in solid state lasers |
US4946231A (en) | 1989-05-19 | 1990-08-07 | The United States Of America As Represented By The Secretary Of The Army | Polarizer produced via photographic image of polarizing grid |
US5599551A (en) * | 1989-06-06 | 1997-02-04 | Kelly; Patrick D. | Genital lubricants containing zinc as an anti-viral agent |
US5486949A (en) | 1989-06-20 | 1996-01-23 | The Dow Chemical Company | Birefringent interference polarizer |
US5279689A (en) | 1989-06-30 | 1994-01-18 | E. I. Du Pont De Nemours And Company | Method for replicating holographic optical elements |
CA2020180C (en) | 1989-06-30 | 2000-01-04 | Stephen A. Zager | Method for making optically readable media containing embossed information |
US5235443A (en) | 1989-07-10 | 1993-08-10 | Hoffmann-La Roche Inc. | Polarizer device |
EP0416157A1 (de) | 1989-09-07 | 1991-03-13 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Polarisator |
FR2653234A1 (fr) | 1989-10-13 | 1991-04-19 | Philips Electronique Lab | Dispositif du type miroir dans le domaine des rayons x-uv. |
JPH03132603A (ja) | 1989-10-18 | 1991-06-06 | Matsushita Electric Ind Co Ltd | 偏光子 |
JP2924055B2 (ja) | 1989-12-08 | 1999-07-26 | セイコーエプソン株式会社 | 反射型液晶表示素子 |
US5267029A (en) | 1989-12-28 | 1993-11-30 | Katsumi Kurematsu | Image projector |
US5235449A (en) | 1990-03-02 | 1993-08-10 | Hitachi, Ltd. | Polarizer with patterned diacetylene layer, method for producing the same, and liquid crystal display device including such polarizer |
US5401587A (en) | 1990-03-27 | 1995-03-28 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Anisotropic nanophase composite material and method of producing same |
JPH03289692A (ja) | 1990-04-06 | 1991-12-19 | Matsushita Electric Ind Co Ltd | 空間光変調素子及びこれを用いたホログラム画像情報記録装置 |
JP2681304B2 (ja) | 1990-05-16 | 1997-11-26 | 日本ビクター株式会社 | 表示装置 |
KR920010809B1 (ko) | 1990-05-19 | 1992-12-17 | 주식회사 금성사 | Lcd 프로젝터의 광학 시스템 |
US5083857A (en) | 1990-06-29 | 1992-01-28 | Texas Instruments Incorporated | Multi-level deformable mirror device |
US5115305A (en) | 1990-07-05 | 1992-05-19 | Baur Thomas G | Electrically addressable liquid crystal projection system with high efficiency and light output |
US5157526A (en) | 1990-07-06 | 1992-10-20 | Hitachi, Ltd. | Unabsorbing type polarizer, method for manufacturing the same, polarized light source using the same, and apparatus for liquid crystal display using the same |
JP2902456B2 (ja) | 1990-08-09 | 1999-06-07 | 株式会社豊田中央研究所 | 無機偏光薄膜 |
US5113285A (en) | 1990-09-28 | 1992-05-12 | Honeywell Inc. | Full color three-dimensional flat panel display |
JPH07104450B2 (ja) | 1990-10-17 | 1995-11-13 | スタンレー電気株式会社 | 二軸性光学素子とその製造方法 |
FR2669126B1 (fr) | 1990-11-09 | 1993-01-22 | Thomson Csf | Systeme de visualisation d'images fournies par un modulateur spatial avec transfert d'energie. |
US5387953A (en) | 1990-12-27 | 1995-02-07 | Canon Kabushiki Kaisha | Polarization illumination device and projector having the same |
US5092774A (en) | 1991-01-09 | 1992-03-03 | National Semiconductor Corporation | Mechanically compliant high frequency electrical connector |
JP2698218B2 (ja) | 1991-01-18 | 1998-01-19 | シャープ株式会社 | 反射型液晶表示装置及びその製造方法 |
US5122887A (en) | 1991-03-05 | 1992-06-16 | Sayett Group, Inc. | Color display utilizing twisted nematic LCDs and selective polarizers |
EP0518111B1 (en) | 1991-05-29 | 1997-04-09 | Matsushita Electric Industrial Co., Ltd. | Projection image display system |
EP0588937B1 (en) | 1991-06-13 | 1996-08-28 | Minnesota Mining And Manufacturing Company | Retroreflecting polarizer |
US5245471A (en) | 1991-06-14 | 1993-09-14 | Tdk Corporation | Polarizers, polarizer-equipped optical elements, and method of manufacturing the same |
DE69232747T2 (de) | 1991-06-14 | 2003-01-02 | Hughes Aircraft Co | Verfahren zum vertikalen Ausrichten von Flüssigkristallen |
DE69221968T2 (de) | 1991-06-28 | 1998-03-05 | Philips Electronics Nv | Bildwiedergabeanordnung |
US5122907A (en) | 1991-07-03 | 1992-06-16 | Polatomic, Inc. | Light polarizer and method of manufacture |
JP2754964B2 (ja) | 1991-08-13 | 1998-05-20 | 日本電気株式会社 | 多極コネクタの嵌合構造 |
US5196953A (en) | 1991-11-01 | 1993-03-23 | Rockwell International Corporation | Compensator for liquid crystal display, having two types of layers with different refractive indices alternating |
EP0543061B1 (en) | 1991-11-20 | 1998-07-15 | Hamamatsu Photonics K.K. | Light amplifying polarizer |
JP2796005B2 (ja) | 1992-02-10 | 1998-09-10 | 三菱電機株式会社 | 投影露光装置及び偏光子 |
US5383053A (en) | 1992-04-07 | 1995-01-17 | Hughes Aircraft Company | Virtual image display having a high efficiency grid beamsplitter |
US5422756A (en) | 1992-05-18 | 1995-06-06 | Minnesota Mining And Manufacturing Company | Backlighting system using a retroreflecting polarizer |
JP3414399B2 (ja) | 1992-06-30 | 2003-06-09 | シチズン時計株式会社 | 液晶表示ユニット及び液晶表示ユニットを用いた液晶プロジェクタ |
WO1994009401A1 (en) | 1992-10-20 | 1994-04-28 | Hughes-Jvc Technology Corporation | Liquid crystal light valve with minimized double reflection |
US5480748A (en) | 1992-10-21 | 1996-01-02 | International Business Machines Corporation | Protection of aluminum metallization against chemical attack during photoresist development |
JPH06138413A (ja) | 1992-10-29 | 1994-05-20 | Canon Inc | プレート型偏光分離装置及び該偏光分離装置を用いた偏光照明装置 |
JP3250853B2 (ja) | 1992-11-09 | 2002-01-28 | 松下電器産業株式会社 | 液晶表示装置およびそれを用いた投写型表示装置 |
JP2698521B2 (ja) | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
US5333072A (en) | 1992-12-31 | 1994-07-26 | Minnesota Mining And Manufacturing Company | Reflective liquid crystal display overhead projection system using a reflective linear polarizer and a fresnel lens |
US5325218A (en) | 1992-12-31 | 1994-06-28 | Minnesota Mining And Manufacturing Company | Cholesteric polarizer for liquid crystal display and overhead projector |
TW289095B (zh) | 1993-01-11 | 1996-10-21 | ||
GB2274922B (en) | 1993-01-21 | 1996-10-23 | Sharp Kk | Liquid crystal projector |
US5522111A (en) | 1993-03-02 | 1996-06-04 | Marshalltown Trowel Company | Finishing trowel handle |
US5594561A (en) | 1993-03-31 | 1997-01-14 | Palomar Technologies Corporation | Flat panel display with elliptical diffuser and fiber optic plate |
JP3168765B2 (ja) | 1993-04-01 | 2001-05-21 | 松下電器産業株式会社 | 偏光装置および該偏光装置を用いた投写型表示装置 |
US5349192A (en) | 1993-05-20 | 1994-09-20 | Wisconsin Alumni Research Foundation | Solid state detector for polarized x-rays |
US5486935A (en) | 1993-06-29 | 1996-01-23 | Kaiser Aerospace And Electronics Corporation | High efficiency chiral nematic liquid crystal rear polarizer for liquid crystal displays having a notch polarization bandwidth of 100 nm to 250 nm |
US5391091A (en) | 1993-06-30 | 1995-02-21 | American Nucleonics Corporation | Connection system for blind mate electrical connector applications |
AU6245994A (en) | 1993-07-27 | 1995-02-28 | Physical Optics Corporation | High-brightness directional viewing screen |
CN1050672C (zh) | 1993-09-10 | 2000-03-22 | 日本化药株式会社 | 偏光元件和起偏振片及其生产方法 |
JPH0784252A (ja) | 1993-09-16 | 1995-03-31 | Sharp Corp | 液晶表示装置 |
US5514478A (en) | 1993-09-29 | 1996-05-07 | Alcan International Limited | Nonabrasive, corrosion resistant, hydrophilic coatings for aluminum surfaces, methods of application, and articles coated therewith |
DE69427282T2 (de) | 1993-10-01 | 2001-11-29 | Raytheon Co | Subtraktive fluessigkristall-farbanzeigevorrichtung mit aktiver matrix mit integrierter raeumlicher lichtbegrenzung |
US5576854A (en) | 1993-11-12 | 1996-11-19 | Hughes-Jvc Technology Corporation | Liquid crystal light valve projector with improved contrast ratio and with 0.27 wavelength compensation for birefringence in the liquid crystal light valve |
US6122403A (en) | 1995-07-27 | 2000-09-19 | Digimarc Corporation | Computer system linked by using information in data objects |
US5499126A (en) | 1993-12-02 | 1996-03-12 | Ois Optical Imaging Systems, Inc. | Liquid crystal display with patterned retardation films |
US5517356A (en) | 1993-12-15 | 1996-05-14 | Corning Incorporated | Glass polarizer for visible light |
US5430573A (en) | 1993-12-15 | 1995-07-04 | Corning Incorporated | UV-absorbing, polarizing glass article |
BE1007993A3 (nl) | 1993-12-17 | 1995-12-05 | Philips Electronics Nv | Belichtingsstelsel voor een kleurenbeeldprojectie-inrichting en circulaire polarisator geschikt voor toepassing in een dergelijk belichtingsstelsel en kleurenbeeldprojectie-inrichting bevattende een dergelijk belichtingsstelsel met circulaire polarisator. |
US5882774A (en) | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
US6096375A (en) | 1993-12-21 | 2000-08-01 | 3M Innovative Properties Company | Optical polarizer |
JP3501299B2 (ja) | 1993-12-28 | 2004-03-02 | 日本ビクター株式会社 | 半導体装置 |
US5455589A (en) | 1994-01-07 | 1995-10-03 | Millitech Corporation | Compact microwave and millimeter wave radar |
GB2286058A (en) | 1994-01-21 | 1995-08-02 | Sharp Kk | Switchable holographic apparatus |
JP3278521B2 (ja) | 1994-01-28 | 2002-04-30 | 松下電器産業株式会社 | 背面投写型画像表示装置 |
US5969861A (en) | 1994-02-07 | 1999-10-19 | Nikon Corporation | Polarizing optical system |
JP2765471B2 (ja) | 1994-02-15 | 1998-06-18 | 日本電気株式会社 | 投写型液晶表示装置 |
US5638197A (en) | 1994-04-04 | 1997-06-10 | Rockwell International Corp. | Inorganic thin film compensator for improved gray scale performance in twisted nematic liquid crystal displays and method of making |
US5504603A (en) | 1994-04-04 | 1996-04-02 | Rockwell International Corporation | Optical compensator for improved gray scale performance in liquid crystal display |
US5619352A (en) | 1994-04-04 | 1997-04-08 | Rockwell International Corporation | LCD splay/twist compensator having varying tilt and /or azimuthal angles for improved gray scale performance |
WO1995033224A1 (en) | 1994-05-31 | 1995-12-07 | Philips Electronics N.V. | Display device having a diffusing display panel |
US5485499A (en) | 1994-08-05 | 1996-01-16 | Moxtek, Inc. | High throughput reflectivity and resolution x-ray dispersive and reflective structures for the 100 eV to 5000 eV energy range and method of making the devices |
US5513023A (en) | 1994-10-03 | 1996-04-30 | Hughes Aircraft Company | Polarizing beamsplitter for reflective light valve displays having opposing readout beams onto two opposing surfaces of the polarizer |
US6049428A (en) | 1994-11-18 | 2000-04-11 | Optiva, Inc. | Dichroic light polarizers |
KR0147607B1 (ko) | 1994-11-25 | 1998-09-15 | 김광호 | 반사형 액정 투사장치의 광학계 |
JPH08240790A (ja) | 1994-12-16 | 1996-09-17 | Sharp Corp | 自動立体表示装置および空間光変調器 |
JP2864464B2 (ja) | 1994-12-22 | 1999-03-03 | 日本ビクター株式会社 | 反射型アクティブ・マトリクス・ディスプレイ・パネル及びその製造方法 |
JPH08184711A (ja) | 1994-12-29 | 1996-07-16 | Sony Corp | 偏光光学素子 |
EP0722253A3 (en) | 1995-01-10 | 1996-10-30 | Ibm | Arrangements for projection display devices using optical valves in reflection |
US5510215A (en) | 1995-01-25 | 1996-04-23 | Eastman Kodak Company | Method for patterning multilayer dielectric color filter |
US5652667A (en) | 1995-02-03 | 1997-07-29 | Victor Company Of Japan, Ltd. | Liquid crystal display apparatus |
EP0731456A2 (en) | 1995-03-04 | 1996-09-11 | Sony Corporation | Optical pickup and optical recording medium reproducing apparatus |
US5808795A (en) | 1995-03-06 | 1998-09-15 | Nikon Corporation | Projection type display apparatus |
US6062694A (en) | 1995-03-06 | 2000-05-16 | Nikon Corporation | Projection type display apparatus |
JP3005706B2 (ja) | 1995-03-13 | 2000-02-07 | 極東開発工業株式会社 | ダンプトラック用荷台の床組み |
US5719695A (en) | 1995-03-31 | 1998-02-17 | Texas Instruments Incorporated | Spatial light modulator with superstructure light shield |
US5751388A (en) | 1995-04-07 | 1998-05-12 | Honeywell Inc. | High efficiency polarized display |
US5535047A (en) | 1995-04-18 | 1996-07-09 | Texas Instruments Incorporated | Active yoke hidden hinge digital micromirror device |
EP0744634B1 (en) | 1995-05-23 | 2003-01-08 | Kyocera Corporation | Method of producing an optical polarizer |
EP0871923A1 (en) | 1995-06-26 | 1998-10-21 | Minnesota Mining And Manufacturing Company | Transflective displays with reflective polarizing transflector |
US5686979A (en) | 1995-06-26 | 1997-11-11 | Minnesota Mining And Manufacturing Company | Optical panel capable of switching between reflective and transmissive states |
EP0753785B1 (de) | 1995-07-11 | 2016-05-11 | Rolic AG | Übertragung von Polarisationsmustern auf polarisationsempfindliche Photoschichten |
WO1997004350A1 (fr) | 1995-07-17 | 1997-02-06 | Seiko Epson Corporation | Dispositif a cristaux liquides couleur a reflexion et appareil electronique utilisant ledit dispositif |
US5978056A (en) | 1995-10-15 | 1999-11-02 | Victor Company Of Japan, Ltd | Reflection-type display apparatus having antireflection films |
JPH09146061A (ja) | 1995-11-17 | 1997-06-06 | Matsushita Electric Ind Co Ltd | 液晶プロジェクション装置 |
JP3126910B2 (ja) | 1995-11-29 | 2001-01-22 | 東洋電機製造株式会社 | 歯車装置 |
JPH09159988A (ja) | 1995-12-12 | 1997-06-20 | Nikon Corp | 投射型表示装置 |
US6181386B1 (en) | 1995-12-29 | 2001-01-30 | Duke University | Projecting images |
CA2193790C (en) | 1995-12-29 | 2001-03-13 | Duke University | Projecting images |
US5751466A (en) | 1996-01-11 | 1998-05-12 | University Of Alabama At Huntsville | Photonic bandgap apparatus and method for delaying photonic signals |
US5838403A (en) | 1996-02-14 | 1998-11-17 | Physical Optics Corporation | Liquid crystal display system with internally reflecting waveguide for backlighting and non-Lambertian diffusing |
JP3282986B2 (ja) | 1996-02-28 | 2002-05-20 | 富士通株式会社 | 液晶表示装置 |
US5867316A (en) | 1996-02-29 | 1999-02-02 | Minnesota Mining And Manufacturing Company | Multilayer film having a continuous and disperse phase |
US5828489A (en) | 1996-04-12 | 1998-10-27 | Rockwell International Corporation | Narrow wavelength polarizing beamsplitter |
JP3767047B2 (ja) | 1996-04-26 | 2006-04-19 | セイコーエプソン株式会社 | 投写型表示装置 |
US5826959A (en) | 1996-05-09 | 1998-10-27 | Pioneer Electronic Corporation | Projection image display apparatus |
JP3738505B2 (ja) | 1996-05-10 | 2006-01-25 | 株式会社ニコン | 投射型表示装置 |
US5841494A (en) | 1996-06-26 | 1998-11-24 | Hall; Dennis R. | Transflective LCD utilizing chiral liquid crystal filter/mirrors |
US5982541A (en) | 1996-08-12 | 1999-11-09 | Nationsl Research Council Of Canada | High efficiency projection displays having thin film polarizing beam-splitters |
US5912762A (en) | 1996-08-12 | 1999-06-15 | Li; Li | Thin film polarizing device |
US6291797B1 (en) | 1996-08-13 | 2001-09-18 | Nippon Sheet Glass Co., Ltd. | Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device |
JPH1073722A (ja) | 1996-08-30 | 1998-03-17 | Sony Corp | 偏光光学素子及びその製造方法 |
JP3557317B2 (ja) | 1996-09-02 | 2004-08-25 | テキサス インスツルメンツ インコーポレイテツド | プロジエクタ装置及び色分離合成装置 |
EP0829744B1 (en) | 1996-09-12 | 2005-03-23 | Sharp Kabushiki Kaisha | Parallax barrier and display |
US6096155A (en) | 1996-09-27 | 2000-08-01 | Digital Optics Corporation | Method of dicing wafer level integrated multiple optical elements |
US5833360A (en) | 1996-10-17 | 1998-11-10 | Compaq Computer Corporation | High efficiency lamp apparatus for producing a beam of polarized light |
US6390626B2 (en) | 1996-10-17 | 2002-05-21 | Duke University | Image projection system engine assembly |
US5991075A (en) | 1996-11-25 | 1999-11-23 | Ricoh Company, Ltd. | Light polarizer and method of producing the light polarizer |
US5914818A (en) | 1996-11-29 | 1999-06-22 | Texas Instruments Incorporated | Offset projection lens for use with reflective spatial light modulators |
US6056407A (en) | 1996-12-18 | 2000-05-02 | Seiko Epson Corporation | Projection display device |
JPH10186302A (ja) | 1996-12-27 | 1998-07-14 | Fujitsu Ltd | 表示装置及び偏光光源装置 |
US6008951A (en) | 1996-12-31 | 1999-12-28 | Texas Instruments Incorporated | Offset projection zoom lens with fixed rear group for reflective spatial light modulators |
US6075235A (en) | 1997-01-02 | 2000-06-13 | Chun; Cornell Seu Lun | High-resolution polarization-sensitive imaging sensors |
US5886754A (en) | 1997-01-17 | 1999-03-23 | Industrial Technology Research Institute | Liquid crystal display projector |
JPH10260403A (ja) | 1997-01-20 | 1998-09-29 | Seiko Epson Corp | 液晶装置及び電子機器 |
US5890095A (en) | 1997-01-21 | 1999-03-30 | Nichols Research Corporation | System for receiving and enhancing electromagnetic radiation input signals |
US6249378B1 (en) | 1997-02-28 | 2001-06-19 | Nikon Corporation | Mirror and projection type display apparatus |
DE69839860D1 (de) | 1997-03-10 | 2008-09-25 | Fujifilm Corp | Optischer Kompensationsfilm für Flüssigkristallanzeigen |
US5958345A (en) | 1997-03-14 | 1999-09-28 | Moxtek, Inc. | Thin film sample support |
US6010221A (en) | 1997-05-22 | 2000-01-04 | Nikon Corporation | Projection type display apparatus |
US5844722A (en) | 1997-06-05 | 1998-12-01 | Hughes-Jvc Technology Corporation | Internal aperture mask for embedded optics |
US6055103A (en) | 1997-06-28 | 2000-04-25 | Sharp Kabushiki Kaisha | Passive polarisation modulating optical element and method of making such an element |
US6247816B1 (en) | 1997-08-07 | 2001-06-19 | International Business Machines Corporation | Optical system for projection displays using spatial light modulators |
US5973833A (en) | 1997-08-29 | 1999-10-26 | Lightware, Inc. | High efficiency polarizing converter |
US5930050A (en) | 1997-10-21 | 1999-07-27 | Texas Instruments Incorporated | Anamorphic lens for providing wide-screen images generated by a spatial light modulator |
US5907427A (en) | 1997-10-24 | 1999-05-25 | Time Domain Corporation | Photonic band gap device and method using a periodicity defect region to increase photonic signal delay |
US6486997B1 (en) | 1997-10-28 | 2002-11-26 | 3M Innovative Properties Company | Reflective LCD projection system using wide-angle Cartesian polarizing beam splitter |
US7023602B2 (en) | 1999-05-17 | 2006-04-04 | 3M Innovative Properties Company | Reflective LCD projection system using wide-angle Cartesian polarizing beam splitter and color separation and recombination prisms |
US6005918A (en) | 1997-12-19 | 1999-12-21 | Picker International, Inc. | X-ray tube window heat shield |
JP3372466B2 (ja) | 1997-12-22 | 2003-02-04 | ティーディーケイ株式会社 | 偏光板の製造方法 |
US6016173A (en) | 1998-02-18 | 2000-01-18 | Displaytech, Inc. | Optics arrangement including a compensator cell and static wave plate for use in a continuously viewable, reflection mode, ferroelectric liquid crystal spatial light modulating system |
US5900976A (en) | 1998-02-20 | 1999-05-04 | Displaytech, Inc. | Display system including a polarizing beam splitter |
US6654168B1 (en) | 1998-03-31 | 2003-11-25 | Corning Incorporated | Inorganic visible light reflection polarizer |
US6496287B1 (en) | 1998-04-09 | 2002-12-17 | Rolic Ag | Optical identification element |
US6108131A (en) | 1998-05-14 | 2000-08-22 | Moxtek | Polarizer apparatus for producing a generally polarized beam of light |
US6208463B1 (en) | 1998-05-14 | 2001-03-27 | Moxtek | Polarizer apparatus for producing a generally polarized beam of light |
US5943171A (en) | 1998-06-03 | 1999-08-24 | International Business Machines Corporation | Head mounted displays utilizing reflection light valves |
WO2000002087A1 (en) | 1998-07-02 | 2000-01-13 | Koninklijke Philips Electronics N.V. | Image projection system |
US6081376A (en) | 1998-07-16 | 2000-06-27 | Moxtek | Reflective optical polarizer device with controlled light distribution and liquid crystal display incorporating the same |
EP1104543B1 (en) | 1998-08-21 | 2002-12-04 | Olivier M. Parriaux | Device for measuring translation, rotation or velocity via light beam interference |
US6082861A (en) | 1998-09-16 | 2000-07-04 | International Business Machines Corporation | Optical system and method for high contrast projection display |
US6331060B1 (en) | 1998-10-08 | 2001-12-18 | Sony Corporation | Projection-type display device and method of adjustment thereof |
US6185041B1 (en) | 1998-10-23 | 2001-02-06 | Duke University | Projection lens and system |
US6172816B1 (en) | 1998-10-23 | 2001-01-09 | Duke University | Optical component adjustment for mitigating tolerance sensitivities |
US6172813B1 (en) | 1998-10-23 | 2001-01-09 | Duke University | Projection lens and system including a reflecting linear polarizer |
JP2000147487A (ja) | 1998-11-06 | 2000-05-26 | Ricoh Co Ltd | 液晶表示装置 |
US6215547B1 (en) | 1998-11-19 | 2001-04-10 | Eastman Kodak Company | Reflective liquid crystal modulator based printing system |
US5986730A (en) | 1998-12-01 | 1999-11-16 | Moxtek | Dual mode reflective/transmissive liquid crystal display apparatus |
US6181458B1 (en) | 1998-12-18 | 2001-01-30 | Eastman Kodak Company | Mechanical grating device with optical coating and method of making mechanical grating device with optical coating |
US6490017B1 (en) | 1999-01-28 | 2002-12-03 | Duke University | Separating white light into polarized, colored light |
JP3743190B2 (ja) | 1999-02-02 | 2006-02-08 | セイコーエプソン株式会社 | 電気光学装置取り付けユニット及びそれを利用した投写型表示装置 |
JP3603650B2 (ja) | 1999-03-08 | 2004-12-22 | セイコーエプソン株式会社 | 調整機構及びこれを用いた投写型表示装置 |
WO2000057215A1 (en) | 1999-03-22 | 2000-09-28 | Mems Optical, Inc. | Diffractive selectively polarizing beam splitter and beam routing prisms produced thereby |
JP2000284117A (ja) | 1999-03-30 | 2000-10-13 | Fuji Elelctrochem Co Ltd | グリッド偏光子及びその製造方法 |
JP3371846B2 (ja) | 1999-04-06 | 2003-01-27 | 日本電気株式会社 | ホログラム素子 |
EP1045272A3 (en) | 1999-04-12 | 2004-02-25 | Matsushita Electric Industrial Co., Ltd. | Reflective color liquid crystal display device |
US6010121A (en) | 1999-04-21 | 2000-01-04 | Lee; Chi Ping | Work piece clamping device of workbench |
US6515785B1 (en) | 1999-04-22 | 2003-02-04 | 3M Innovative Properties Company | Optical devices using reflecting polarizing materials |
US6122103A (en) * | 1999-06-22 | 2000-09-19 | Moxtech | Broadband wire grid polarizer for the visible spectrum |
US6288840B1 (en) | 1999-06-22 | 2001-09-11 | Moxtek | Imbedded wire grid polarizer for the visible spectrum |
US6981771B1 (en) | 1999-07-01 | 2006-01-03 | Sanyo Electric Co., Ltd. | Rear projection display device |
US7306338B2 (en) | 1999-07-28 | 2007-12-11 | Moxtek, Inc | Image projection system with a polarizing beam splitter |
US6666556B2 (en) | 1999-07-28 | 2003-12-23 | Moxtek, Inc | Image projection system with a polarizing beam splitter |
US6447120B2 (en) | 1999-07-28 | 2002-09-10 | Moxtex | Image projection system with a polarizing beam splitter |
US6234634B1 (en) | 1999-07-28 | 2001-05-22 | Moxtek | Image projection system with a polarizing beam splitter |
US6282025B1 (en) | 1999-08-02 | 2001-08-28 | New Focus, Inc. | Optical polarization beam combiner/splitter |
JP4427837B2 (ja) | 1999-09-03 | 2010-03-10 | 住友化学株式会社 | ワイヤーグリッド型偏光光学素子 |
US6243199B1 (en) | 1999-09-07 | 2001-06-05 | Moxtek | Broad band wire grid polarizing beam splitter for use in the visible wavelength region |
US6398364B1 (en) | 1999-10-06 | 2002-06-04 | Optical Coating Laboratory, Inc. | Off-axis image projection display system |
US6310345B1 (en) | 1999-10-12 | 2001-10-30 | The United States Of America As Represented By The Secretary Of The Army | Polarization-resolving infrared imager |
US6781640B1 (en) | 1999-11-15 | 2004-08-24 | Sharp Laboratories Of America, Inc. | Projection display having polarization compensator |
US6375330B1 (en) | 1999-12-30 | 2002-04-23 | Gain Micro-Optics, Inc. | Reflective liquid-crystal-on-silicon projection engine architecture |
WO2001082923A1 (en) | 2000-02-14 | 2001-11-08 | Merck & Co., Inc. | Estrogen receptor modulators |
US6340230B1 (en) | 2000-03-10 | 2002-01-22 | Optical Coating Laboratory, Inc. | Method of using a retarder plate to improve contrast in a reflective imaging system |
EP1143744B1 (en) | 2000-03-17 | 2008-09-24 | Hitachi, Ltd. | Image display device |
US6661475B1 (en) | 2000-03-23 | 2003-12-09 | Infocus Corporation | Color video projection system employing reflective liquid crystal display device |
US6411749B2 (en) | 2000-05-11 | 2002-06-25 | Micro-Optice, Inc. | In-line fiber optic polarization combiner/divider |
US6624936B2 (en) | 2000-05-11 | 2003-09-23 | 3M Innovative Properties Company | Color-compensated information displays |
JP2001330728A (ja) | 2000-05-22 | 2001-11-30 | Jasco Corp | ワイヤーグリット型偏光子及びその製造方法 |
JP2001343512A (ja) | 2000-05-31 | 2001-12-14 | Canon Inc | 回折光学素子及びそれを有する光学系 |
JP3642267B2 (ja) | 2000-07-05 | 2005-04-27 | セイコーエプソン株式会社 | 照明光学系およびこれを備えたプロジェクタ |
WO2002003129A1 (fr) | 2000-07-05 | 2002-01-10 | Sony Corporation | Element d'affichage d'image et dispositif y relatif |
US6704469B1 (en) | 2000-09-12 | 2004-03-09 | Finisar Corporation | Polarization beam combiner/splitter |
US6409525B1 (en) | 2000-12-11 | 2002-06-25 | Tyco Electronics Corporation | Terminal position housing assembly |
WO2002052305A2 (en) | 2000-12-27 | 2002-07-04 | Technion Research And Development Foundation Ltd. | Space-variant subwavelength polarization grating and applications thereof |
US6532111B2 (en) | 2001-03-05 | 2003-03-11 | Eastman Kodak Company | Wire grid polarizer |
GB0106050D0 (en) | 2001-03-12 | 2001-05-02 | Suisse Electronique Microtech | Polarisers and mass-production method and apparatus for polarisers |
US6585378B2 (en) | 2001-03-20 | 2003-07-01 | Eastman Kodak Company | Digital cinema projector |
US20020167727A1 (en) | 2001-03-27 | 2002-11-14 | Hansen Douglas P. | Patterned wire grid polarizer and method of use |
US7375887B2 (en) | 2001-03-27 | 2008-05-20 | Moxtek, Inc. | Method and apparatus for correcting a visible light beam using a wire-grid polarizer |
CN1503915A (zh) | 2001-04-20 | 2004-06-09 | 3M创新有限公司 | 用于定位光学棱镜的方法及设备 |
KR20030064371A (ko) | 2001-05-18 | 2003-07-31 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 편광 장치 |
DE10124803A1 (de) | 2001-05-22 | 2002-11-28 | Zeiss Carl | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator |
US20020181824A1 (en) | 2001-05-30 | 2002-12-05 | Shangyuan Huang | Compact polarization beam combiner/splitter |
US6669343B2 (en) | 2001-05-31 | 2003-12-30 | Koninklijke Philips Electronics N.V. | Image display system |
US6511183B2 (en) | 2001-06-02 | 2003-01-28 | Koninklijke Philips Electronics N.V. | Digital image projector with oriented fixed-polarization-axis polarizing beamsplitter |
US6609795B2 (en) | 2001-06-11 | 2003-08-26 | 3M Innovative Properties Company | Polarizing beam splitter |
US6813077B2 (en) | 2001-06-19 | 2004-11-02 | Corning Incorporated | Method for fabricating an integrated optical isolator and a novel wire grid structure |
US6510200B1 (en) | 2001-06-29 | 2003-01-21 | Osmic, Inc. | Multi-layer structure with variable bandpass for monochromatization and spectroscopy |
US6899432B2 (en) | 2001-08-06 | 2005-05-31 | Advanced Digital Optics, Inc. | Color management system having a transmissive panel and optical isolator |
US6857747B2 (en) | 2001-08-06 | 2005-02-22 | Advanced Digital Optics, Inc. | Color management system |
US6893130B2 (en) | 2001-08-06 | 2005-05-17 | Advanced Digital Optics, Inc. | Color management system having a field lens |
WO2003019247A1 (fr) | 2001-08-24 | 2003-03-06 | Asahi Glass Company, Limited | Polariseur multicouches a diffraction et element a cristaux liquides |
US6547396B1 (en) | 2001-12-27 | 2003-04-15 | Infocus Corporation | Stereographic projection system |
EP1300698B1 (en) | 2001-10-01 | 2011-11-02 | Sony Corporation | Polarization selecting prism for a projection device |
US6922287B2 (en) | 2001-10-12 | 2005-07-26 | Unaxis Balzers Aktiengesellschaft | Light coupling element |
US6714350B2 (en) | 2001-10-15 | 2004-03-30 | Eastman Kodak Company | Double sided wire grid polarizer |
JP2003202523A (ja) | 2001-11-02 | 2003-07-18 | Nec Viewtechnology Ltd | 偏光ユニット、該偏光ユニットを用いた偏光照明装置及び該偏光照明装置を用いた投写型表示装置 |
US7085050B2 (en) | 2001-12-13 | 2006-08-01 | Sharp Laboratories Of America, Inc. | Polarized light beam splitter assembly including embedded wire grid polarizer |
US20030117708A1 (en) | 2001-12-21 | 2003-06-26 | Koninklijke Philips Electronics N.V. | Sealed enclosure for a wire-grid polarizer and subassembly for a display system |
US6947215B2 (en) | 2001-12-27 | 2005-09-20 | Canon Kabushiki Kaisha | Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system |
US7061561B2 (en) | 2002-01-07 | 2006-06-13 | Moxtek, Inc. | System for creating a patterned polarization compensator |
US6909473B2 (en) | 2002-01-07 | 2005-06-21 | Eastman Kodak Company | Display apparatus and method |
US20050008839A1 (en) | 2002-01-30 | 2005-01-13 | Cramer Ronald Dean | Method for hydrophilizing materials using hydrophilic polymeric materials with discrete charges |
DE60325555D1 (de) | 2002-02-12 | 2009-02-12 | Oc Oerlikon Balzers Ag | Optisches bauteil mit submikrometer-hohlräumen |
US6590695B1 (en) | 2002-02-26 | 2003-07-08 | Eastman Kodak Company | Micro-mechanical polarization-based modulator |
MXPA04008145A (es) | 2002-02-28 | 2004-11-26 | 3M Innovative Properties Co | Divisores compuestos de haces de polarizacion. |
KR20030079268A (ko) | 2002-04-03 | 2003-10-10 | 삼성에스디아이 주식회사 | 프로젝션 디스플레이 시스템 |
US7050234B2 (en) | 2002-05-01 | 2006-05-23 | Adc Telecommunications, Inc. | Lossless beam combination in a dual fiber collimator using a polarizing beamsplitter |
US6785050B2 (en) | 2002-05-09 | 2004-08-31 | Moxtek, Inc. | Corrosion resistant wire-grid polarizer and method of fabrication |
US6899440B2 (en) | 2002-05-17 | 2005-05-31 | Infocus Corporation | Polarized light source system with mirror and polarization converter |
TW523119U (en) | 2002-05-24 | 2003-03-01 | Coretronic Corp | Structure of polarizer module |
US6876784B2 (en) | 2002-05-30 | 2005-04-05 | Nanoopto Corporation | Optical polarization beam combiner/splitter |
JP2004062148A (ja) | 2002-06-04 | 2004-02-26 | Canon Inc | 光学部品及びその製造方法 |
US6805445B2 (en) | 2002-06-05 | 2004-10-19 | Eastman Kodak Company | Projection display using a wire grid polarization beamsplitter with compensator |
US7131737B2 (en) | 2002-06-05 | 2006-11-07 | Moxtek, Inc. | Housing for mounting a beamsplitter and a spatial light modulator with an output optical path |
US6823093B2 (en) | 2002-06-11 | 2004-11-23 | Jds Uniphase Corporation | Tunable micro-optic architecture for combining light beam outputs of dual capillary polarization-maintaining optical fibers |
JP4310080B2 (ja) | 2002-06-17 | 2009-08-05 | キヤノン株式会社 | 回折光学素子およびこれを備えた光学系、光学装置 |
US20040047039A1 (en) | 2002-06-17 | 2004-03-11 | Jian Wang | Wide angle optical device and method for making same |
US7386205B2 (en) | 2002-06-17 | 2008-06-10 | Jian Wang | Optical device and method for making same |
US6859303B2 (en) | 2002-06-18 | 2005-02-22 | Nanoopto Corporation | Optical components exhibiting enhanced functionality and method of making same |
JP2004045672A (ja) | 2002-07-11 | 2004-02-12 | Canon Inc | 偏光分離素子およびそれを用いた光学系 |
CN1692291A (zh) | 2002-08-01 | 2005-11-02 | 纳诺普托公司 | 精密相位延迟装置和其制造方法 |
US7227684B2 (en) | 2002-08-21 | 2007-06-05 | Jian Wang | Method and system for providing beam polarization |
CN1270309C (zh) | 2002-08-29 | 2006-08-16 | 索尼株式会社 | 光头和光记录媒体驱动装置 |
US7324180B2 (en) | 2002-09-06 | 2008-01-29 | Dai Nippon Printing Co., Ltd. | Laminated retardation optical element, process of producing the same, and liquid crystal display |
US6809873B2 (en) | 2002-09-09 | 2004-10-26 | Eastman Kodak Company | Color illumination system for spatial light modulators using multiple double telecentric relays |
US6751003B2 (en) | 2002-09-12 | 2004-06-15 | Eastman Kodak Company | Apparatus and method for selectively exposing photosensitive materials using a reflective light modulator |
US6920272B2 (en) | 2002-10-09 | 2005-07-19 | Nanoopto Corporation | Monolithic tunable lasers and reflectors |
US7013064B2 (en) | 2002-10-09 | 2006-03-14 | Nanoopto Corporation | Freespace tunable optoelectronic device and method |
US6665119B1 (en) | 2002-10-15 | 2003-12-16 | Eastman Kodak Company | Wire grid polarizer |
JP4376507B2 (ja) | 2002-11-01 | 2009-12-02 | リコー光学株式会社 | 偏光光学素子 |
JP4363029B2 (ja) | 2002-11-06 | 2009-11-11 | ソニー株式会社 | 分割波長板フィルターの製造方法 |
US6811274B2 (en) | 2002-12-04 | 2004-11-02 | General Electric Company | Polarization sensitive optical substrate |
JP3599052B2 (ja) | 2002-12-13 | 2004-12-08 | ソニー株式会社 | 画像表示装置 |
US7113335B2 (en) | 2002-12-30 | 2006-09-26 | Sales Tasso R | Grid polarizer with suppressed reflectivity |
US7113336B2 (en) | 2002-12-30 | 2006-09-26 | Ian Crosby | Microlens including wire-grid polarizer and methods of manufacture |
EP1597616A4 (en) | 2003-02-10 | 2008-04-09 | Nanoopto Corp | UNIVERSAL BROADBAND POLARIZER, DEVICES COMPRISING THE POLARIZER, AND METHOD FOR MANUFACTURING THE POLARIZER |
US6943941B2 (en) | 2003-02-27 | 2005-09-13 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US20040174596A1 (en) | 2003-03-05 | 2004-09-09 | Ricoh Optical Industries Co., Ltd. | Polarization optical device and manufacturing method therefor |
KR101162135B1 (ko) | 2003-03-13 | 2012-07-03 | 아사히 가라스 가부시키가이샤 | 회절 소자 및 광학 장치 |
WO2004085670A2 (en) | 2003-03-24 | 2004-10-07 | Perkinelmer Las, Inc. | Polarization detection |
JP2004309903A (ja) | 2003-04-09 | 2004-11-04 | Ricoh Opt Ind Co Ltd | 無機偏光素子および偏光光学素子および液晶素子 |
US7159987B2 (en) | 2003-04-21 | 2007-01-09 | Seiko Epson Corporation | Display device, lighting device and projector |
US20040227994A1 (en) | 2003-05-16 | 2004-11-18 | Jiaying Ma | Polarizing beam splitter and projection systems using the polarizing beam splitter |
US6846089B2 (en) | 2003-05-16 | 2005-01-25 | 3M Innovative Properties Company | Method for stacking surface structured optical films |
WO2004106982A2 (en) | 2003-05-22 | 2004-12-09 | Optical Research Associates | Optical combiner designs and head mounted displays |
US7206133B2 (en) | 2003-05-22 | 2007-04-17 | Optical Research Associates | Light distribution apparatus and methods for illuminating optical systems |
US20040258355A1 (en) | 2003-06-17 | 2004-12-23 | Jian Wang | Micro-structure induced birefringent waveguiding devices and methods of making same |
DE10327963A1 (de) | 2003-06-19 | 2005-01-05 | Carl Zeiss Jena Gmbh | Polarisationsstrahlteiler |
JP4425059B2 (ja) * | 2003-06-25 | 2010-03-03 | シャープ株式会社 | 偏光光学素子、およびそれを用いた表示装置 |
US6769779B1 (en) | 2003-07-22 | 2004-08-03 | Eastman Kodak Company | Housing for mounting modulation and polarization components in alignment with an optical path |
US6821135B1 (en) | 2003-08-06 | 2004-11-23 | Tyco Electronics Corporation | Alignment plate for aligning connector terminals |
KR100512141B1 (ko) * | 2003-08-11 | 2005-09-05 | 엘지전자 주식회사 | 와이어 그리드 편광자 제조 방법 |
EP1660240A2 (en) | 2003-08-19 | 2006-05-31 | Nanoopto Corporation | Sub-micron-scale patterning method and system |
JP4386413B2 (ja) | 2003-08-25 | 2009-12-16 | 株式会社エンプラス | ワイヤーグリッド偏光子の製造方法 |
JP4593894B2 (ja) | 2003-09-01 | 2010-12-08 | キヤノン株式会社 | 光学式エンコーダ |
DE10341596B4 (de) | 2003-09-05 | 2009-01-29 | Carl Zeiss | Polarisationsstrahlteiler |
JP4475501B2 (ja) | 2003-10-09 | 2010-06-09 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 分光素子、回折格子、複合回折格子、カラー表示装置、および分波器 |
JP2005121906A (ja) | 2003-10-16 | 2005-05-12 | Fuji Photo Film Co Ltd | 反射型光変調アレイ素子及び露光装置 |
TWI223103B (en) | 2003-10-23 | 2004-11-01 | Ind Tech Res Inst | Wire grid polarizer with double metal layers |
JP2005172844A (ja) | 2003-12-05 | 2005-06-30 | Enplas Corp | ワイヤグリッド偏光子 |
KR20050057767A (ko) | 2003-12-11 | 2005-06-16 | 엘지전자 주식회사 | 해상도 향상 장치 및 방법 그리고 이를 이용한디스플레이장치 |
US7203001B2 (en) | 2003-12-19 | 2007-04-10 | Nanoopto Corporation | Optical retarders and related devices and systems |
TWI230834B (en) | 2003-12-31 | 2005-04-11 | Ind Tech Res Inst | High-transmissivity polarizing module constituted with sub-wavelength structure |
JP4527986B2 (ja) | 2004-01-07 | 2010-08-18 | 旭化成イーマテリアルズ株式会社 | ワイヤグリッド型偏光子 |
CN1910672A (zh) | 2004-01-16 | 2007-02-07 | 皇家飞利浦电子股份有限公司 | 光学系统 |
US7234816B2 (en) | 2004-02-03 | 2007-06-26 | 3M Innovative Properties Company | Polarizing beam splitter assembly adhesive |
US20050181128A1 (en) | 2004-02-12 | 2005-08-18 | Nikolov Anguel N. | Films for optical use and methods of making such films |
JP2005242080A (ja) | 2004-02-27 | 2005-09-08 | Victor Co Of Japan Ltd | ワイヤグリッドポラライザ |
CN100337143C (zh) | 2004-03-03 | 2007-09-12 | 株式会社日立制作所 | 光学单元以及使用该光学单元的投影型图像显示装置 |
JP4451268B2 (ja) | 2004-03-04 | 2010-04-14 | 株式会社リコー | 光学素子及びその製造方法と、これを用いた光学製品、光ピックアップ及び光情報処理装置 |
US7256938B2 (en) | 2004-03-17 | 2007-08-14 | General Atomics | Method for making large scale multilayer dielectric diffraction gratings on thick substrates using reactive ion etching |
US7025464B2 (en) | 2004-03-30 | 2006-04-11 | Goldeneye, Inc. | Projection display systems utilizing light emitting diodes and light recycling |
US7670758B2 (en) | 2004-04-15 | 2010-03-02 | Api Nanofabrication And Research Corporation | Optical films and methods of making the same |
US20050275944A1 (en) | 2004-06-11 | 2005-12-15 | Wang Jian J | Optical films and methods of making the same |
US7155073B2 (en) | 2004-05-07 | 2006-12-26 | Canon Kabushiki Kaisha | Polarization element and optical device using polarization element |
US20060001969A1 (en) | 2004-07-02 | 2006-01-05 | Nanoopto Corporation | Gratings, related optical devices and systems, and methods of making such gratings |
JP4442760B2 (ja) | 2004-08-06 | 2010-03-31 | 旭化成イーマテリアルズ株式会社 | 無機物の選択的パターン形成方法及びグリッド型偏光素子 |
DE102004041222A1 (de) | 2004-08-26 | 2006-03-02 | Carl Zeiss Jena Gmbh | Photonische Kristallstruktur |
TWI245108B (en) | 2004-08-27 | 2005-12-11 | Asia Optical Co Inc | Laser sight |
US7414784B2 (en) | 2004-09-23 | 2008-08-19 | Rohm And Haas Denmark Finance A/S | Low fill factor wire grid polarizer and method of use |
US7466484B2 (en) | 2004-09-23 | 2008-12-16 | Rohm And Haas Denmark Finance A/S | Wire grid polarizers and optical elements containing them |
KR100623026B1 (ko) | 2004-10-06 | 2006-09-19 | 엘지전자 주식회사 | 선 격자 편광자 및 그 제조방법 |
JP2006126338A (ja) | 2004-10-27 | 2006-05-18 | Nippon Sheet Glass Co Ltd | 偏光子およびその製造方法 |
JP2006133402A (ja) | 2004-11-04 | 2006-05-25 | Canon Inc | 偏光分離素子及びそれを有する光学系 |
JP2006133403A (ja) | 2004-11-04 | 2006-05-25 | Canon Inc | 偏光分離素子 |
US7261418B2 (en) | 2004-11-12 | 2007-08-28 | 3M Innovative Properties Company | Projection apparatus |
EP1838899A2 (en) | 2004-11-30 | 2007-10-03 | Agoura Technologies Inc. | Applications and fabrication techniques for large scale wire grid polarizers |
US7351346B2 (en) | 2004-11-30 | 2008-04-01 | Agoura Technologies, Inc. | Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths |
US20080055721A1 (en) | 2006-08-31 | 2008-03-06 | Perkins Raymond T | Light Recycling System with an Inorganic, Dielectric Grid Polarizer |
US7961393B2 (en) | 2004-12-06 | 2011-06-14 | Moxtek, Inc. | Selectively absorptive wire-grid polarizer |
US7800823B2 (en) | 2004-12-06 | 2010-09-21 | Moxtek, Inc. | Polarization device to polarize and further control light |
US7630133B2 (en) | 2004-12-06 | 2009-12-08 | Moxtek, Inc. | Inorganic, dielectric, grid polarizer and non-zero order diffraction grating |
US7570424B2 (en) * | 2004-12-06 | 2009-08-04 | Moxtek, Inc. | Multilayer wire-grid polarizer |
US20080055720A1 (en) | 2006-08-31 | 2008-03-06 | Perkins Raymond T | Optical Data Storage System with an Inorganic, Dielectric Grid Polarizer |
US20080055719A1 (en) | 2006-08-31 | 2008-03-06 | Perkins Raymond T | Inorganic, Dielectric Grid Polarizer |
US20080055549A1 (en) | 2006-08-31 | 2008-03-06 | Perkins Raymond T | Projection Display with an Inorganic, Dielectric Grid Polarizer |
US7619816B2 (en) | 2004-12-15 | 2009-11-17 | Api Nanofabrication And Research Corp. | Structures for polarization and beam control |
JP2006201540A (ja) | 2005-01-21 | 2006-08-03 | Asahi Kasei Corp | ワイヤグリッド偏光板及びその製造方法 |
JP4652110B2 (ja) | 2005-04-21 | 2011-03-16 | 株式会社日立製作所 | 投射型映像表示装置 |
JP4760135B2 (ja) * | 2005-05-24 | 2011-08-31 | ソニー株式会社 | 光学装置及び光学装置の製造方法 |
US8237876B2 (en) | 2005-05-25 | 2012-08-07 | Kim Leong Tan | Tilted C-plate retarder compensator and display systems incorporating the same |
JP4275692B2 (ja) | 2005-10-17 | 2009-06-10 | 旭化成株式会社 | ワイヤグリッド偏光板及びそれを用いた液晶表示装置 |
US20070183025A1 (en) | 2005-10-31 | 2007-08-09 | Koji Asakawa | Short-wavelength polarizing elements and the manufacture and use thereof |
KR100707083B1 (ko) | 2005-11-24 | 2007-04-13 | 엘지전자 주식회사 | 선 격자 편광자 및 그 제조방법 |
US7475991B2 (en) | 2005-12-22 | 2009-01-13 | 3M Innovative Properties Company | Polarizing beamsplitter assembly |
US20070217008A1 (en) | 2006-03-17 | 2007-09-20 | Wang Jian J | Polarizer films and methods of making the same |
JP2007257750A (ja) | 2006-03-24 | 2007-10-04 | Hitachi Media Electoronics Co Ltd | 光ピックアップおよび光ディスク装置 |
US20070242352A1 (en) | 2006-04-13 | 2007-10-18 | Macmaster Steven William | Wire-grid polarizers, methods of fabrication thereof and their use in transmissive displays |
US20070297052A1 (en) | 2006-06-26 | 2007-12-27 | Bin Wang | Cube wire-grid polarizing beam splitter |
JP5380796B2 (ja) * | 2006-07-07 | 2014-01-08 | ソニー株式会社 | 偏光素子及び液晶プロジェクター |
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-
2007
- 2007-06-22 US US11/767,353 patent/US7961393B2/en active Active
-
2008
- 2008-06-19 WO PCT/US2008/067423 patent/WO2009002791A1/en active Application Filing
- 2008-06-19 CN CN200880021345.8A patent/CN101688938B/zh active Active
- 2008-06-19 EP EP08780859A patent/EP2158506A1/en not_active Withdrawn
- 2008-06-19 JP JP2010513393A patent/JP5184624B2/ja active Active
-
2011
- 2011-12-02 JP JP2011264798A patent/JP5277455B2/ja not_active Expired - Fee Related
-
2012
- 2012-07-05 JP JP2012151860A patent/JP5224252B2/ja active Active
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Also Published As
Publication number | Publication date |
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JP5184624B2 (ja) | 2013-04-17 |
JP5277455B2 (ja) | 2013-08-28 |
JP5224252B2 (ja) | 2013-07-03 |
EP2158506A1 (en) | 2010-03-03 |
US20080278811A1 (en) | 2008-11-13 |
CN101688938B (zh) | 2013-06-05 |
WO2009002791A1 (en) | 2008-12-31 |
JP2012098738A (ja) | 2012-05-24 |
US7961393B2 (en) | 2011-06-14 |
JP2010530994A (ja) | 2010-09-16 |
JP2012256055A (ja) | 2012-12-27 |
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