ATE419550T1 - Optisches bauteil mit submikrometer-hohlräumen - Google Patents
Optisches bauteil mit submikrometer-hohlräumenInfo
- Publication number
- ATE419550T1 ATE419550T1 AT03700802T AT03700802T ATE419550T1 AT E419550 T1 ATE419550 T1 AT E419550T1 AT 03700802 T AT03700802 T AT 03700802T AT 03700802 T AT03700802 T AT 03700802T AT E419550 T1 ATE419550 T1 AT E419550T1
- Authority
- AT
- Austria
- Prior art keywords
- microchannels
- microstructures
- optical component
- substrate
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D21/00—Separation of suspended solid particles from liquids by sedimentation
- B01D21/0012—Settling tanks making use of filters, e.g. by floating layers of particulate material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
- B01D39/2027—Metallic material
- B01D39/2051—Metallic foam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502753—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by bulk separation arrangements on lab-on-a-chip devices, e.g. for filtration or centrifugation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B1/00—Devices without movable or flexible elements, e.g. microcapillary devices
- B81B1/002—Holes characterised by their shape, in either longitudinal or sectional plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/06—Fluid handling related problems
- B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/06—Fluid handling related problems
- B01L2200/0647—Handling flowable solids, e.g. microscopic beads, cells, particles
- B01L2200/0668—Trapping microscopic beads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/14—Process control and prevention of errors
- B01L2200/141—Preventing contamination, tampering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/06—Auxiliary integrated devices, integrated components
- B01L2300/0681—Filter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0809—Geometry, shape and general structure rectangular shaped
- B01L2300/0816—Cards, e.g. flat sample carriers usually with flow in two horizontal directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0809—Geometry, shape and general structure rectangular shaped
- B01L2300/0825—Test strips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/16—Surface properties and coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0406—Moving fluids with specific forces or mechanical means specific forces capillary forces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0409—Moving fluids with specific forces or mechanical means specific forces centrifugal forces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/08—Regulating or influencing the flow resistance
- B01L2400/084—Passive control of flow resistance
- B01L2400/086—Passive control of flow resistance using baffles or other fixed flow obstructions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/50273—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the means or forces applied to move the fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502761—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip specially adapted for handling suspended solids or molecules independently from the bulk fluid flow, e.g. for trapping or sorting beads, for physically stretching molecules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502769—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements
- B01L3/502784—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements specially adapted for droplet or plug flow, e.g. digital microfluidics
- B01L3/502792—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by multiphase flow arrangements specially adapted for droplet or plug flow, e.g. digital microfluidics for moving individual droplets on a plate, e.g. by locally altering surface tension
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/10—Microfilters, e.g. for gas or fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0323—Grooves
- B81B2203/0338—Channels
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12097—Ridge, rib or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/913—Material designed to be responsive to temperature, light, moisture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249961—With gradual property change within a component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249975—Void shape specified [e.g., crushed, flat, round, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249976—Voids specified as closed
- Y10T428/249977—Specified thickness of void-containing component [absolute or relative], numerical cell dimension or density
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
- Y10T428/249979—Specified thickness of void-containing component [absolute or relative] or numerical cell dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
- Y10T428/24998—Composite has more than two layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/11—Automated chemical analysis
- Y10T436/111666—Utilizing a centrifuge or compartmented rotor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/11—Automated chemical analysis
- Y10T436/112499—Automated chemical analysis with sample on test slide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
- Y10T436/25375—Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
- Y10T436/25375—Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.]
- Y10T436/255—Liberation or purification of sample or separation of material from a sample [e.g., filtering, centrifuging, etc.] including use of a solid sorbent, semipermeable membrane, or liquid extraction
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Metallurgy (AREA)
- General Health & Medical Sciences (AREA)
- Hematology (AREA)
- Clinical Laboratory Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Computer Hardware Design (AREA)
- Geology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Polarising Elements (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Optical Measuring Cells (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Light Guides In General And Applications Therefor (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Steroid Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35628402P | 2002-02-12 | 2002-02-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE419550T1 true ATE419550T1 (de) | 2009-01-15 |
Family
ID=27734629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03700802T ATE419550T1 (de) | 2002-02-12 | 2003-02-12 | Optisches bauteil mit submikrometer-hohlräumen |
Country Status (10)
Country | Link |
---|---|
US (4) | US6884500B2 (de) |
EP (2) | EP1474710B1 (de) |
JP (1) | JP4373793B2 (de) |
KR (1) | KR100960183B1 (de) |
CN (1) | CN100592112C (de) |
AT (1) | ATE419550T1 (de) |
AU (1) | AU2003202404A1 (de) |
DE (1) | DE60325555D1 (de) |
TW (1) | TWI266899B (de) |
WO (1) | WO2003069381A2 (de) |
Families Citing this family (80)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1474710B1 (de) * | 2002-02-12 | 2008-12-31 | OC Oerlikon Balzers AG | Optisches bauteil mit submikrometer-hohlräumen |
US6785050B2 (en) * | 2002-05-09 | 2004-08-31 | Moxtek, Inc. | Corrosion resistant wire-grid polarizer and method of fabrication |
JP2004271828A (ja) * | 2003-03-07 | 2004-09-30 | Mitsubishi Electric Corp | 光学素子およびその製造方法 |
DE10341596B4 (de) * | 2003-09-05 | 2009-01-29 | Carl Zeiss | Polarisationsstrahlteiler |
DE10343720A1 (de) * | 2003-09-12 | 2005-04-28 | Zeiss Carl Jena Gmbh | Polarisationsstrahlteiler auf Basis eines hochfrequenten Gitters |
JP2006003447A (ja) * | 2004-06-15 | 2006-01-05 | Sony Corp | 偏光分離素子及びその製造方法 |
US7471866B2 (en) * | 2004-06-29 | 2008-12-30 | Her Majesty The Queen In Right Of Canada As Represented By The Minister Of Industry, Through The Communications Research Centre Canada | Waveguiding structures with embedded microchannels and method for fabrication thereof |
JP2006126338A (ja) * | 2004-10-27 | 2006-05-18 | Nippon Sheet Glass Co Ltd | 偏光子およびその製造方法 |
US7570424B2 (en) | 2004-12-06 | 2009-08-04 | Moxtek, Inc. | Multilayer wire-grid polarizer |
US7961393B2 (en) | 2004-12-06 | 2011-06-14 | Moxtek, Inc. | Selectively absorptive wire-grid polarizer |
US7800823B2 (en) | 2004-12-06 | 2010-09-21 | Moxtek, Inc. | Polarization device to polarize and further control light |
KR101228486B1 (ko) * | 2004-12-16 | 2013-01-31 | 도레이 카부시키가이샤 | 편광판, 그 제조방법 및 그것을 이용한 액정 표시 장치 |
WO2007108773A1 (en) * | 2006-03-23 | 2007-09-27 | Agengy For Science, Technology And Research | Device for analyzing the status of a particle |
US20070267057A1 (en) * | 2006-05-17 | 2007-11-22 | Haluzak Charles C | Optical device and method of forming the same |
US8000210B2 (en) * | 2006-06-07 | 2011-08-16 | Konica Minolta Holdings, Inc. | Quarter-wave plate, and optical pickup device |
CN102692662B (zh) * | 2006-08-30 | 2015-06-24 | 佳能电子株式会社 | 光学滤光器以及摄像装置 |
US8755113B2 (en) | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
JP4842763B2 (ja) * | 2006-10-23 | 2011-12-21 | 株式会社リコー | 光学素子および光学装置 |
JP5403862B2 (ja) * | 2006-11-28 | 2014-01-29 | チェイル インダストリーズ インコーポレイテッド | 微細金属パターンの製造方法 |
CN101622557A (zh) * | 2007-01-12 | 2010-01-06 | 东丽株式会社 | 偏振片和使用该偏振片的液晶显示装置 |
JP4488033B2 (ja) | 2007-02-06 | 2010-06-23 | ソニー株式会社 | 偏光素子及び液晶プロジェクター |
US7789515B2 (en) | 2007-05-17 | 2010-09-07 | Moxtek, Inc. | Projection device with a folded optical path and wire-grid polarizer |
JP5045249B2 (ja) * | 2007-06-01 | 2012-10-10 | セイコーエプソン株式会社 | 偏光素子の製造方法 |
JP4412372B2 (ja) | 2007-09-12 | 2010-02-10 | セイコーエプソン株式会社 | 偏光素子の製造方法 |
JP5045327B2 (ja) * | 2007-09-18 | 2012-10-10 | セイコーエプソン株式会社 | 偏光素子及びその製造方法、液層装置、電子機器 |
JP4412388B2 (ja) * | 2007-10-31 | 2010-02-10 | セイコーエプソン株式会社 | 光学素子、液晶装置及び電子機器 |
KR100962064B1 (ko) | 2007-11-19 | 2010-06-08 | 미래나노텍(주) | 박막 탑 레이어를 갖는 와이어 그리드 편광판 및 그 제조방법 |
JP5139830B2 (ja) * | 2008-02-12 | 2013-02-06 | 旭化成イーマテリアルズ株式会社 | ワイヤグリッド型偏光素子 |
EP2261704A4 (de) * | 2008-04-03 | 2012-10-10 | Asahi Glass Co Ltd | Drahtgitterpolarisierer und verfahren zu seiner herstellung |
WO2009125751A1 (ja) * | 2008-04-08 | 2009-10-15 | 旭硝子株式会社 | ワイヤグリッド型偏光子の製造方法 |
WO2010005059A1 (ja) * | 2008-07-10 | 2010-01-14 | 旭硝子株式会社 | ワイヤグリッド型偏光子およびその製造方法 |
US20120075699A1 (en) * | 2008-10-29 | 2012-03-29 | Mark Alan Davis | Segmented film deposition |
JP2010204626A (ja) | 2009-02-05 | 2010-09-16 | Asahi Glass Co Ltd | ワイヤグリッド型偏光子およびその製造方法 |
FR2942047B1 (fr) * | 2009-02-09 | 2011-06-17 | Commissariat Energie Atomique | Structure et procede d'alignement d'une fibre optique et d'un guide d'ondes submicronique |
JP5402101B2 (ja) * | 2009-03-06 | 2014-01-29 | セイコーエプソン株式会社 | 偏光素子、投射型表示装置、液晶装置、電子機器 |
KR101610376B1 (ko) * | 2009-04-10 | 2016-04-08 | 엘지이노텍 주식회사 | 와이어 그리드 편광자, 이를 포함하는 액정 표시 장치 및 와이어 그리드 편광자의 제조 방법 |
US8248696B2 (en) | 2009-06-25 | 2012-08-21 | Moxtek, Inc. | Nano fractal diffuser |
JP2010049280A (ja) * | 2009-11-25 | 2010-03-04 | Seiko Epson Corp | 偏光素子の製造方法 |
JP2011141468A (ja) * | 2010-01-08 | 2011-07-21 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、電子機器 |
JP5672702B2 (ja) * | 2010-01-08 | 2015-02-18 | セイコーエプソン株式会社 | 偏光素子、偏光素子の製造方法、電子機器 |
JP2010160504A (ja) * | 2010-02-24 | 2010-07-22 | Seiko Epson Corp | プロジェクタ |
JP2012002971A (ja) | 2010-06-16 | 2012-01-05 | Seiko Epson Corp | 偏光素子及びその製造方法、液晶装置、電子機器 |
MY183366A (en) * | 2010-07-15 | 2021-02-18 | Commw Scient Ind Res Org | Surface treatment |
EP2601546A4 (de) * | 2010-08-05 | 2014-11-12 | 3M Innovative Properties Co | Mehrschichtiger film mit matter oberflächenschicht und artikel |
US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
US8611007B2 (en) | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
US8913320B2 (en) | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
US8873144B2 (en) | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
WO2012162880A1 (zh) * | 2011-05-31 | 2012-12-06 | 苏州苏大维格光电科技股份有限公司 | 一种反射式彩色滤光片 |
US8922890B2 (en) | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
JP6198045B2 (ja) * | 2012-08-31 | 2017-09-20 | パナソニックIpマネジメント株式会社 | 液晶表示装置 |
JP5929860B2 (ja) * | 2013-09-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子製造方法 |
US9354374B2 (en) | 2013-10-24 | 2016-05-31 | Moxtek, Inc. | Polarizer with wire pair over rib |
EP3063570B1 (de) * | 2013-10-29 | 2021-03-17 | CSEM Centre Suisse D'electronique Et De Microtechnique SA | Kopplungsstruktur für ein optisches gitter |
JP5929881B2 (ja) * | 2013-12-11 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
JP5929886B2 (ja) * | 2013-12-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
WO2016056277A1 (ja) * | 2014-10-10 | 2016-04-14 | Jx日鉱日石エネルギー株式会社 | 光学位相差部材、光学位相差部材を備える複合光学部材、及び光学位相差部材の製造方法 |
US10054717B2 (en) | 2015-04-03 | 2018-08-21 | Moxtek, Inc. | Oxidation and moisture barrier layers for wire grid polarizer |
US9995864B2 (en) | 2015-04-03 | 2018-06-12 | Moxtek, Inc. | Wire grid polarizer with silane protective coating |
US10534120B2 (en) | 2015-04-03 | 2020-01-14 | Moxtek, Inc. | Wire grid polarizer with protected wires |
US9703028B2 (en) | 2015-04-03 | 2017-07-11 | Moxtek, Inc. | Wire grid polarizer with phosphonate protective coating |
US10444410B2 (en) | 2016-08-16 | 2019-10-15 | Moxtek, Inc. | Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier |
US10408983B2 (en) | 2016-08-16 | 2019-09-10 | Moxtek, Inc. | Durable, high performance wire grid polarizer having permeable junction between top protection layer |
US10571614B2 (en) | 2016-08-16 | 2020-02-25 | Moxek, Inc. | Wire grid polarizer heat sink having specified reflective layer, absorptive layer, and heat-dissipation layer |
CN109804281A (zh) * | 2016-11-22 | 2019-05-24 | 莫克斯泰克公司 | 外涂线栅偏振器 |
WO2018105586A1 (ja) * | 2016-12-06 | 2018-06-14 | Scivax株式会社 | 光学部材および当該光学部材を用いた液晶パネル、並びにそれらの製造方法 |
CN108802878B (zh) * | 2017-04-27 | 2021-02-26 | 清华大学 | 松树状金属纳米光栅 |
FI128376B (en) | 2017-06-02 | 2020-04-15 | Dispelix Oy | Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating |
TWI641878B (zh) * | 2017-09-22 | 2018-11-21 | 友達光電股份有限公司 | 線柵偏光器以及使用此線柵偏光器的顯示面板 |
JP6484373B1 (ja) * | 2018-06-26 | 2019-03-13 | デクセリアルズ株式会社 | 偏光板及びこれを備える光学機器 |
CN108873140B (zh) * | 2018-07-25 | 2020-12-29 | Tcl华星光电技术有限公司 | 金属线栅偏光片的制作方法及金属线栅偏光片 |
CN112912160A (zh) * | 2018-08-31 | 2021-06-04 | 浩康生物系统公司 | 超快颗粒分选 |
TW202014740A (zh) * | 2018-10-01 | 2020-04-16 | 友達光電股份有限公司 | 偏光基板及其製造方法 |
JP7175390B2 (ja) * | 2018-10-03 | 2022-11-18 | モックステック・インコーポレーテッド | 耐久性のある高性能ワイヤグリッド偏光子 |
CN109590036B (zh) * | 2018-12-17 | 2024-04-19 | 苏州汶颢微流控技术股份有限公司 | 一种elisa芯片及其使用方法 |
TWI835950B (zh) | 2018-12-17 | 2024-03-21 | 美商應用材料股份有限公司 | 用於封裝的pvd定向沉積 |
JP7443781B2 (ja) * | 2020-01-18 | 2024-03-06 | ウシオ電機株式会社 | 透過型回折格子素子及び光を波長に応じた向きに進ませる方法 |
WO2021233968A1 (en) * | 2020-05-22 | 2021-11-25 | Interdigital Ce Patent Holdings, Sas | High color uniformity double material diffraction grating comprising step-like cavities |
JP2023529613A (ja) * | 2020-06-03 | 2023-07-11 | アプライド マテリアルズ インコーポレイテッド | 導波路格子の勾配封入 |
CA3197714A1 (en) * | 2020-10-08 | 2022-04-14 | University Of South Australia | Microfluidic device and method for analysis of a particulate sample |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5278103A (en) * | 1993-02-26 | 1994-01-11 | Lsi Logic Corporation | Method for the controlled formation of voids in doped glass dielectric films |
US6454945B1 (en) * | 1995-06-16 | 2002-09-24 | University Of Washington | Microfabricated devices and methods |
US6709869B2 (en) * | 1995-12-18 | 2004-03-23 | Tecan Trading Ag | Devices and methods for using centripetal acceleration to drive fluid movement in a microfluidics system |
US6376781B1 (en) * | 1996-05-03 | 2002-04-23 | Micron Technology, Inc. | Low resistance contacts fabricated in high aspect ratio openings by resputtering |
GB2320129B (en) | 1996-06-24 | 2001-09-26 | United Microelectronics Corp | Method of fabricating an aluminium plug for contact with a semiconductor device |
US5880018A (en) * | 1996-10-07 | 1999-03-09 | Motorola Inc. | Method for manufacturing a low dielectric constant inter-level integrated circuit structure |
US6303464B1 (en) * | 1996-12-30 | 2001-10-16 | Intel Corporation | Method and structure for reducing interconnect system capacitance through enclosed voids in a dielectric layer |
US6632399B1 (en) * | 1998-05-22 | 2003-10-14 | Tecan Trading Ag | Devices and methods for using centripetal acceleration to drive fluid movement in a microfluidics system for performing biological fluid assays |
JP3654553B2 (ja) * | 1997-06-19 | 2005-06-02 | 株式会社リコー | 光学素子 |
US6288840B1 (en) * | 1999-06-22 | 2001-09-11 | Moxtek | Imbedded wire grid polarizer for the visible spectrum |
US6706519B1 (en) * | 1999-06-22 | 2004-03-16 | Tecan Trading Ag | Devices and methods for the performance of miniaturized in vitro amplification assays |
US6122103A (en) * | 1999-06-22 | 2000-09-19 | Moxtech | Broadband wire grid polarizer for the visible spectrum |
US6875619B2 (en) * | 1999-11-12 | 2005-04-05 | Motorola, Inc. | Microfluidic devices comprising biochannels |
US6210540B1 (en) | 2000-03-03 | 2001-04-03 | Optical Coating Laboratory, Inc. | Method and apparatus for depositing thin films on vertical surfaces |
EP1410045A2 (de) * | 2000-11-22 | 2004-04-21 | Burstein Technologies, Inc. | Vorrichtung und verfahren zur abscheidung von agglomeraten und diversen partikeln |
US6949377B2 (en) * | 2001-03-05 | 2005-09-27 | Ho Winston Z | Chemiluminescence-based microfluidic biochip |
JP2002328222A (ja) * | 2001-04-26 | 2002-11-15 | Nippon Sheet Glass Co Ltd | 偏光素子及びその製造方法 |
KR100878103B1 (ko) | 2001-05-04 | 2009-01-14 | 도쿄엘렉트론가부시키가이샤 | 순차적 증착 및 에칭에 의한 이온화된 pvd |
AU2002337653A1 (en) * | 2001-07-25 | 2003-02-17 | The Trustees Of Princeton University | Nanochannel arrays and their preparation and use for high throughput macromolecular analysis |
EP1474710B1 (de) * | 2002-02-12 | 2008-12-31 | OC Oerlikon Balzers AG | Optisches bauteil mit submikrometer-hohlräumen |
-
2003
- 2003-02-12 EP EP20030700802 patent/EP1474710B1/de not_active Expired - Lifetime
- 2003-02-12 KR KR1020047012035A patent/KR100960183B1/ko not_active IP Right Cessation
- 2003-02-12 EP EP20080169323 patent/EP2031425A1/de not_active Withdrawn
- 2003-02-12 US US10/366,095 patent/US6884500B2/en not_active Expired - Fee Related
- 2003-02-12 AT AT03700802T patent/ATE419550T1/de not_active IP Right Cessation
- 2003-02-12 WO PCT/CH2003/000102 patent/WO2003069381A2/en active Application Filing
- 2003-02-12 DE DE60325555T patent/DE60325555D1/de not_active Expired - Lifetime
- 2003-02-12 JP JP2003568449A patent/JP4373793B2/ja not_active Expired - Fee Related
- 2003-02-12 AU AU2003202404A patent/AU2003202404A1/en not_active Abandoned
- 2003-02-12 CN CN03803717A patent/CN100592112C/zh not_active Expired - Fee Related
- 2003-02-12 TW TW92102873A patent/TWI266899B/zh not_active IP Right Cessation
-
2005
- 2005-04-12 US US11/104,186 patent/US7026046B2/en not_active Expired - Fee Related
-
2006
- 2006-03-06 US US11/368,813 patent/US7371329B2/en not_active Expired - Fee Related
-
2008
- 2008-02-19 US US12/033,235 patent/US7507467B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP4373793B2 (ja) | 2009-11-25 |
JP2005517973A (ja) | 2005-06-16 |
AU2003202404A8 (en) | 2003-09-04 |
EP1474710A2 (de) | 2004-11-10 |
WO2003069381A3 (en) | 2003-11-13 |
US7507467B2 (en) | 2009-03-24 |
US20050208211A1 (en) | 2005-09-22 |
US7026046B2 (en) | 2006-04-11 |
US6884500B2 (en) | 2005-04-26 |
KR20040093704A (ko) | 2004-11-08 |
US20080152892A1 (en) | 2008-06-26 |
WO2003069381A2 (en) | 2003-08-21 |
US20030180024A1 (en) | 2003-09-25 |
DE60325555D1 (de) | 2009-02-12 |
EP2031425A1 (de) | 2009-03-04 |
EP1474710B1 (de) | 2008-12-31 |
KR100960183B1 (ko) | 2010-05-27 |
US7371329B2 (en) | 2008-05-13 |
AU2003202404A1 (en) | 2003-09-04 |
TW200304551A (en) | 2003-10-01 |
TWI266899B (en) | 2006-11-21 |
CN1781036A (zh) | 2006-05-31 |
US20060147679A1 (en) | 2006-07-06 |
CN100592112C (zh) | 2010-02-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE419550T1 (de) | Optisches bauteil mit submikrometer-hohlräumen | |
WO2004093142A3 (en) | Light emitting device methods | |
PH12013500599B1 (en) | Polarizing photochromic devices and methods of making the same | |
WO2007142788A3 (en) | Laser ablation resist | |
BR0102061B1 (pt) | processo para a produÇço de uma camada revestida por pulverizaÇço tÉrmica graduada sobre um substrato. | |
EP1526584A3 (de) | Photosensitive Halbleiternanokristalle, photosensitive Verbindung Halbleiternanokristalle enthaltend und Verfahren zur Herstellung von Halbleiternanokristall-Strukturen diese benutzend | |
DK1595001T3 (da) | Fremgangsmåde til overtrækning af en overflade | |
ATE527121T1 (de) | Sicherheitsvorrichtung | |
WO2004097518A3 (en) | A method of forming stepped structures employing imprint lithography | |
TW200632542A (en) | Mask, mask forming method, pattern forming method, and wiring pattern forming method | |
ATE459986T1 (de) | Verfahren für die herstellung eigekapselten organischen elektronischen vorrichtungen | |
SG131011A1 (en) | Silicon based substrate with hafnium containing barrier layer | |
DK1309412T3 (da) | Fremgangsmåde til belægning af et tekstureret sliplag | |
BR0109077A (pt) | Dispositivo hermeticamente revestido e método de fabricação do mesmo | |
WO2005078817A3 (en) | Manufacture of flat panel light emitting devices | |
DE602005018303D1 (de) | Wärmedämmschicht | |
ATE484609T1 (de) | Verfahren zur herstellung einer funktionsschicht | |
BR0211413B1 (pt) | substrato revestido de um filme compósito, e, processo de fabricação do mesmo. | |
DE602004008331D1 (de) | Mikrokomponente mit einer hermetischen mikrokavität und verfahren zur herstellung solch einer mikrokomponente | |
EP1570301A4 (de) | Retroreflektor mit gesteuerter divergenz,hergestellt durch das verfahren lokalisierter substratbelastung | |
WO2007029845A3 (en) | Method and device for manufacturing structure having pattern, and method for manufacturing mold | |
DE602006002459D1 (de) | Optoelektronische Vorrichtung mit einem Laser mit integriertem Modulator und Herstellungsverfahren dafür | |
DE602004009715D1 (de) | Elektrolumineszierende Vorrichtung und zugehörige Herstellungsmethode | |
ATE518256T1 (de) | Verfahren zur herstellung eines nitrid-halbleiter-bauelements | |
ATE324691T1 (de) | Oberflächenemittierendes lichtemittierendes halbleiterbauteil und verfahren zu dessen herstellung, optisches modul und lichtübertragungs-vorrichtung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |