WO2022178769A1 - 偏振片及其制造方法、显示面板及显示装置 - Google Patents
偏振片及其制造方法、显示面板及显示装置 Download PDFInfo
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- WO2022178769A1 WO2022178769A1 PCT/CN2021/077932 CN2021077932W WO2022178769A1 WO 2022178769 A1 WO2022178769 A1 WO 2022178769A1 CN 2021077932 W CN2021077932 W CN 2021077932W WO 2022178769 A1 WO2022178769 A1 WO 2022178769A1
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Classifications
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- G—PHYSICS
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- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G—PHYSICS
- G02—OPTICS
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- G02B5/18—Diffraction gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Definitions
- the present application relates to the field of display technology, and in particular, to a polarizer and a manufacturing method thereof, a display panel and a display device.
- the traditional iodine-based polarizer is one of the core components of the display part.
- its incompatibility with many processes due to its inability to withstand high temperatures limits the development of display devices.
- wire grid polarizers In order to reduce device cost and improve the durability of polarizers, more durable wire grid polarizers (WGPs) have replaced traditional iodine-based polarizers.
- the wire grid polarizer is composed of a group of regularly arranged subwavelength metal wire grids - to a certain extent, the metalness in the direction perpendicular to the wire grid is destroyed; its optical properties are as follows: the linearly polarized light parallel to the wire grid can be reflected , while the linearly polarized light perpendicular to the direction of the metal grating can be transmitted.
- Such nanoscale linear polarizers are usually fabricated from aluminum, which has high reflectivity and relatively low cost compared to other materials.
- the linearly polarized light parallel to the wire grid will be reflected on the surface of the wire grid polarizer, and the light reflected from the wire grid polarizer will reduce the display quality of the image.
- the present application provides a polarizer, a manufacturing method thereof, a display panel and a display device.
- the reflectivity can be greatly reduced, the display quality of the image can be improved, and the structure of the polarizer can be more stable.
- a polarizer comprises an antireflection layer, a first support layer and a grating layer stacked in sequence along the incident direction of the light;
- the grating layer includes a plurality of first grid bars arranged along the first direction, and the plurality of first grid bars are arranged at intervals from each other;
- the first support layer includes a plurality of first support bars arranged along the first direction and spaced apart from each other, and second support bars arranged along the second direction and located between two adjacent first support bars, the The second direction forms an included angle with the first direction, the included angle is greater than 0 degrees and less than 180 degrees, and the first support bars are arranged corresponding to the first grid bars;
- the antireflection layer includes a plurality of second grid bars arranged along the first direction, the plurality of second grid bars are arranged at intervals from each other, and the positions of the second grid bars correspond to the positions of the first grid bars setting, a third gap is formed between two adjacent second grid bars;
- the anti-reflection layer, the first support layer and the grating layer form an optical resonant cavity structure, or the anti-reflection layer is used for absorbing light reflected by the grating layer.
- the second direction is perpendicular to the first direction; and/or,
- the second support bars located between two different adjacent first support bars are at least partially located on the same straight line; and/or,
- the second support bars located between two different adjacent first support bars are not located on the same straight line.
- the duty cycle of the grating layer is 0.3 ⁇ 0.6; and/or,
- the height of the grating layer is greater than the height of the first support layer, and the height of the first support layer is greater than the height of the anti-reflection layer; and/or,
- the height of the grating layer is 100 nm to 250 nm
- the height of the first support layer is 70 nm to 200 nm
- the height of the antireflection layer is 5 nm to 100 nm.
- the orthographic projection of the first support bar along the light incident direction and the orthographic projection of the corresponding first grid bar at least partially overlap, and the orthographic projection of the first support bar along the light incident direction and the corresponding orthographic projection of the first grid bar.
- the orthographic projections of the first grid lines are at least partially coincident;
- the distance between the orthographic projection of the side edge of the first support bar along the light incident direction and the orthographic projection of the side edge of the first grid bar corresponding thereto is less than or equal to 40 nm, and the side edge of the second grid bar is less than or equal to 40 nm.
- the distance between the orthographic projection of and the orthographic projection of the corresponding side of the first grid strip is less than or equal to 20 nm.
- the material of the grating layer is a metal material; the material of the first support layer is a transparent material.
- the polarizer includes a second support layer, the second support layer is located on the side of the antireflection layer away from the first support layer, and the second support layer includes a plurality of strips along the first direction.
- the third support bars are arranged and spaced apart from each other, and the fourth support bars are arranged along the second direction and located between two adjacent third support bars, and the positions of the third support bars correspond to the first support bars.
- the fourth support bar is arranged corresponding to the second support bar; and/or,
- the material of the second support layer is a transparent material.
- the polarizer further includes a substrate, and the substrate is located on a side of the grating layer away from the first support layer; or, the substrate is located at a side of the antireflection layer away from the first support layer side.
- a method for manufacturing a polarizer for preparing the above-mentioned polarizer, and the method for manufacturing a polarizer includes:
- the antireflection layer is formed on the first support layer.
- the fourth support bar is arranged corresponding to the second support bar; and/or,
- the material of the second support layer is a transparent material.
- a method for manufacturing a polarizer for preparing the above-mentioned polarizer includes:
- the grating layer is formed on the first support layer.
- the method before forming the antireflection layer on the transparent substrate, the method further includes: forming a second support layer on the substrate, the second support layer comprising a plurality of third A support bar, and a fourth support bar disposed along the second direction and located between two adjacent third support bars, and the position of the third support bar is set corresponding to the position of the first grid bar ;and / or,
- the fourth support bar is arranged corresponding to the second support bar; and/or,
- the material of the second support layer is a transparent material.
- a display panel is provided, and the display panel includes the above-mentioned polarizer.
- a display device including the above-mentioned display panel.
- the polarizing plate and its manufacturing method, display panel and display device of the present application can greatly reduce the reflectivity by setting the specific structure of the polarizing plate, improve the display quality of the image, and at the same time make the structure of the polarizing plate more stable.
- the polarizer of the present application can achieve the effect of reducing the reflectivity in two ways. That is, the reflectivity of the polarizer to ambient light is reduced, so as to prevent the reflected ambient light from affecting the display quality of the image.
- the polarizer of the present application includes an antireflection layer, a first support layer and a grating layer stacked in sequence along the light incident direction, where the light refers to ambient light.
- the optical resonant cavity structure is formed by the antireflection layer, the first support layer and the grating layer.
- white light enters the polarizer from the incident direction, passes through the anti-reflection layer and the first support layer, is reflected on the surface of the grating layer, and exits from the anti-reflection layer away from the first support layer, thereby becoming a certain color light reflection, thereby reducing the overall reflectivity of the polarizer.
- the first support layer located between the antireflection layer and the grating layer is a dielectric layer, which acts as a matching layer to induce the maximum reflectivity of the film system near a specific wavelength.
- the first support layer is not only a part of the optical resonant cavity structure, but at the same time, by setting the specific structure of the first support layer, that is, including a plurality of first support layers spaced from each other along the first direction
- the support bar and the second support bar disposed along the second direction and located between the two adjacent first support bars can play a good supporting role and make the overall structure of the polarizer more firm.
- the antireflection layer can directly absorb the light reflected by the grating layer, so as to achieve the effect of reducing the reflectivity.
- the first support layer can not only play a good supporting role, but also make the overall structure of the polarizer firmer; at the same time, since the first support layer is located between the antireflection layer and the grating layer , the absorption layer and the grating layer can be separated to avoid the mutual influence between the absorption effect of the antireflection layer and the polarization effect of the grating layer.
- FIG. 1 is a schematic plan view of the structure of the polarizer of Example 1 of the present application.
- FIG. 2 is a schematic cross-sectional structure diagram along the A-A direction in FIG. 1 .
- FIG. 3 is a schematic cross-sectional structure diagram along the B-B direction in FIG. 1 .
- FIG. 4 is a schematic cross-sectional structure diagram along the C-C direction in FIG. 1 .
- FIG. 5 is a schematic plan view of the structure of the grating layer of the polarizing plate according to Example 1 of the present application.
- FIG. 6 is a schematic plan view of the structure of the first support layer of the polarizer of Example 1 of the present application.
- Example 7 is a schematic plan view of the structure of another embodiment of the first support layer of the polarizer of Example 1 of the present application.
- Example 8 to 11 are schematic structural diagrams in which the layers of the polarizer of Example 1 of the present application are stacked in sequence.
- Example 12 is a schematic cross-sectional structural diagram of another embodiment of the polarizing plate of Example 1 of the present application.
- FIG. 23 is a schematic cross-sectional structure diagram of the polarizer of Example 2 of the present application.
- Example 24 is a schematic cross-sectional structural diagram of another embodiment of the polarizing plate of Example 2 of the present application.
- the polarizer 1 includes an antireflection layer 10 , a first support layer 20 , a grating layer 30 and a substrate 40 that are stacked in sequence along the light incident direction F. That is, the substrate 40 is located on the side of the grating layer 30 away from the first support layer 20 .
- the substrate 40 is a transparent substrate, and the material of the substrate 40 may be glass, quartz stone, PI, PET, etc., which is not specifically limited herein.
- the grating layer 30 includes first grid bars 31 arranged along the first direction L, and a plurality of first grid bars 31 are arranged at intervals from each other. That is, the plurality of first grid bars 31 are all arranged along the first direction L, and the plurality of first grid bars 31 are arranged at intervals from each other.
- the first support layer 20 includes a plurality of first support bars 21 arranged along the first direction L and spaced apart from each other (that is, the plurality of first support bars 21 are all arranged along the first direction L, and the plurality of first support bars 21 are mutually spaced), and a second support bar 22 located between two adjacent first support bars 21 arranged along the second direction W, where the second direction W and the first direction L form an included angle (that is, the second direction W is not parallel to the first direction L), that is, the first support bar 21 and the second support bar 22 form an included angle ⁇ , the included angle ⁇ is greater than 0 degrees and less than 180 degrees, and the position of the first support bar 21 corresponds to the first The position of the grid bars 31 is set.
- the first support layer 20 is integrally formed, that is, the first support bar 21 and the second support bar 22 are integrally formed.
- the antireflection layer 10 includes a plurality of second grid bars 11 arranged along the first direction L, the plurality of second grid bars 11 are spaced apart from each other, and the positions of the second grid bars 11 correspond to the positions of the first grid bars 31 . That is, the plurality of second grid bars 11 are all arranged along the first direction L, and the plurality of second grid bars 11 are arranged at intervals from each other.
- the included angle ⁇ formed by the second direction W and the first direction L is equal to 90 degrees, that is, the second direction W (the setting direction of the second support bars 22 ) is perpendicular to the first direction L (the first support bar 22 )
- the arrangement direction of the bar 21); that is, the second support bar 22 is perpendicular to the first support bar 21 to facilitate the manufacturing process.
- the width w2 of the second support bar 22 is 20 nm ⁇ 200 nm.
- the second support bars 22 located between two different adjacent first support bars 21 may be located on the same straight line.
- the second support bars 22 located between two different adjacent first support bars 21 may also be a part of the second support bars 22 located on the same straight line and another part of the second support bars 22 are located on another straight line. In other embodiments, it can also be said that the second support bars 22 located between two different adjacent first support bars 21 are not located on the same straight line.
- the number of second support bars 22 between two adjacent first support bars 21 may be multiple, so as to better support.
- a plurality of second support bars 22 between two adjacent first support bars 21 are arranged at intervals to better support.
- the period p of the grating layer 30 is 100 nm-140 nm, preferably, 100 nm, 120 nm and 140 nm.
- the duty ratio of the grating layer 30 is 0.3 ⁇ 0.6, wherein the duty ratio is the proportion of the first grating strips 31 in the period p of the grating layer 30 , that is, the width w of the first grating layer 31 and the period of one grating layer 30
- the height h1 of the grating layer is greater than the height h2 of the first support layer, and the height h2 of the first support layer is greater than the height h3 of the antireflection layer.
- the height h1 of the grating layer is 100 nm to 250 nm, the height h2 of the first support layer is 10 nm to 200 nm, and the height h3 of the antireflection layer is 5 nm to 100 nm.
- the orthographic projection of the first support bar 21 along the light incident direction F completely coincides with the orthographic projection of the corresponding first grid bar 31, and the orthographic projection of the second grid bar 11 along the light incident direction F and its corresponding The orthographic projections of the first grid bars 31 are completely coincident, so that the polarization effect of the polarizer 1 itself can be avoided to the greatest extent.
- the orthographic projection of the first support bar 21 along the light incident direction F and the orthographic projection of the corresponding first grid bar 31 may at least partially overlap, and the orthographic projection of the second grid bar 11 along the light incident direction F and at least partially coincide with the orthographic projection of the corresponding first grid bar 31 .
- the distance between the orthographic projection of the side of the first support bar 21 and the orthographic projection of the side of the first grid bar 31 corresponding thereto is less than or equal to 40 nm
- the side of the second grid bar 11 is less than or equal to 40 nm.
- the distance between the orthographic projection of the side and the orthographic projection of the side of the corresponding first grid bar 31 is less than or equal to 20 nm. That is, the first support bar 21 is slightly offset from the first grid bar 31 , and the second grid bar 11 is slightly offset from the first grid bar 31 .
- the anti-reflection layer 10 , the first support layer 20 and the grating layer 30 form an optical resonant cavity structure, or the anti-reflection layer 10 is used to absorb the light reflected by the grating layer 30 .
- the polarizing plate 1 of this embodiment can achieve the effect of reducing the reflectivity in two different ways. That is, the reflectivity of the polarizer 1 to ambient light is reduced, so as to avoid the influence of ambient light on the display quality of the image.
- the polarizing plate 1 of this embodiment includes an antireflection layer 10 , a first support layer 20 and a grating layer 30 stacked in sequence along the light incident direction F, where the light refers to ambient light.
- the optical resonant cavity structure D is formed by the antireflection layer 10 , the first support layer 20 and the grating layer 30 .
- the white light enters the polarizer 1 along the arrow direction E (light incident direction), passes through the antireflection layer 10 and the first supporting layer 20 , and passes through the grating layer 30
- the surface of the polarizer is reflected, and exits from the side of the antireflection layer 10 away from the first support layer 20 along the arrow direction E′, so as to reflect light of a certain color, thereby reducing the overall reflectivity of the polarizer 1 .
- the first support layer 20 located between the anti-reflection layer 10 and the grating layer 30 is a dielectric layer, which acts as a matching layer and functions to induce the reflectivity of the film system near a specific wavelength to the maximum. Since the optical properties of the structure are sensitive to the thickness of the first support layer 20 , different colors can be induced to reflect by simply changing the thickness of the first support layer 20 .
- the first support layer 20 not only acts as a part of the optical resonant cavity structure, but at the same time, by setting the specific structure of the first support layer 20, that is, including a plurality of strips spaced from each other along the first direction
- the first support bar 21 and the second support bar 22 disposed along the second direction and located between the two adjacent first support bars 21 can play a good supporting role and make the overall structure of the polarizer 1 more efficient. for firmness.
- the material of the grating layer 30 is a metal material, such as aluminum, silver, platinum, gold or a metal compound.
- the material of the first support layer 20 is a transparent material, such as silicon oxide.
- the reflectivity of the grating layer 30 is greater than the reflectivity of the anti-reflection layer 10 , and the light transmittance of the grating layer 30 is smaller than that of the anti-reflection layer 10 .
- the material of the antireflection layer 10 can be a metal material, such as chromium, titanium or molybdenum; it can also be a non-metallic material, such as a ceramic material, that is, a composite material in which nano-scale metal particles are mixed with silicon oxide.
- the anti-reflection layer 10 can directly absorb the light reflected by the grating layer 30, so as to achieve the effect of reducing the reflectivity.
- the first support layer 20 can not only play a good supporting role, but also make the overall structure of the polarizer 1 firmer; at the same time, since the first support layer 20 is located between the antireflection layer 10 and the Between the grating layers 30 , the absorption layer and the grating layer 30 can be separated to avoid the mutual influence between the absorption effect of the antireflection layer 10 and the polarization effect of the grating layer 30 .
- the materials of the grating layer 30 and the first support layer 20 are the same as in the first method, and the material of the anti-reflection layer 10 having the function of absorbing the light reflected by the grating layer 30 is metal oxide, such as copper oxide or chromium oxide.
- the polarizer 1 of this embodiment is a wire grid polarizer (WGP)
- the supporting function of the first supporting layer 20 is particularly significant. This is because, in the wire grid polarizers (WGP), the metal grating (the first grid bar 31 of the grating layer 30) is a nanoscale wire grid structure, and adding a structure to the metal grating is prone to overturning. problems, thereby making the overall structure unstable.
- the polarizer 1 further includes a second support layer 50 , and the second support layer 50 is located on the side of the antireflection layer 10 away from the first support layer 20 .
- the second support layer 50 includes a plurality of third support bars 51 arranged along the first direction L and spaced apart from each other, and fourth support bars arranged along the second direction W and located between two adjacent third support bars 51 52.
- the positions of the third support bars 51 are set corresponding to the positions of the first grid bars 31 .
- the fourth support bar 52 is disposed corresponding to the second support bar 22 .
- the second support layer 50 is integrally formed, that is, the third support bar 51 and the fourth support bar 52 are integrally formed.
- the second support layer 50 by arranging the second support layer 50 , the support effect can be further improved, and the stability of the overall structure can be enhanced.
- the second support layer 50 is located on the side of the anti-reflection layer 10 away from the first support layer 20 , that is to say, the light is incident from the second support layer 50 to the anti-reflection layer 10 , the matching of blocking can be achieved, allowing more Light enters the antireflection layer 10 .
- the second support layer 50, the antireflection layer 10, the first support layer 20 and the grating layer 30 form an optical resonant cavity structure D, which can reduce the reflection of incident light, thereby greatly reducing the reflectivity and improving the image quality. Display quality.
- the orthographic projection of the fourth support bar 52 along the incident direction completely overlaps with the orthographic projection of the corresponding second support bar 22 to avoid affecting the polarization effect of the polarizer 1 itself. But not limited to this, the orthographic projection of the fourth support bar 52 and the orthographic projection of the corresponding second support bar 22 may also partially overlap.
- the width of the fourth support bar 52 is 20 nm ⁇ 200 nm.
- the material of the second support layer 50 is a transparent material.
- the materials of the second support layer 50 and the first support layer 20 are the same or different. In this embodiment, the materials of the second support layer 50 and the first support layer 20 are both silicon oxide.
- FIG. 8 to FIG. 11 are schematic diagrams of the layers stacked in sequence.
- the second support layer 50 may not be included.
- the reflectivity can be greatly reduced, the display quality of the image can be improved, and the structure of the polarizer can be more stable. It is proved by experiments that the polarization degree of the polarizer 1 in this embodiment can be 99.9-99.999%, the transmittance will decrease by 5%-10%, and the reflectivity will decrease from more than 40% to less than 10%.
- This embodiment also provides a method for manufacturing a polarizer, which is used for preparing the above-mentioned polarizer 1 .
- the manufacturing method of the polarizer comprises the following steps:
- Step 100 forming a grating layer on the substrate
- Step 200 forming a first support layer on the grating layer
- Step 300 forming an antireflection layer on the first support layer
- Step 400 forming a second support layer on the anti-reflection layer.
- the manufacturing method of the polarizer 1 in this embodiment includes:
- step 100 forming the grating layer 30 on the substrate 40 includes: as shown in FIG. 13 , depositing a grating material layer 30 ′ on one side surface of the transparent substrate 40 ; then, as shown in FIG. 14 , in A layer of photoresist layer 71 is formed on the grating material layer 30 ′; then, as shown in FIG. 15 , the photoresist layer 71 is patterned to form a photoresist grating 72 ; then, as shown in FIG.
- the grating material layer 30 ′ not covered by the photoresist grating 72 is etched to form the first grid bars 31 of the grating layer 30 , and a first gap is formed between two adjacent first grid bars 31 33; Finally, the photoresist grating 72 is washed away by a stripping solution.
- the photoresist layer 71 may be patterned by a photolithography apparatus, and further, the photoresist layer 71 may be patterned by a dry etching technique (eg, Inductively Coupled Plasma Etching (ICP)).
- ICP Inductively Coupled Plasma Etching
- nano-imprinting can also be used instead of photoresist, and nano-imprinting can be used to form patterning. Both the photoresist and the nano-imprint glue in this embodiment are commercially available products.
- step 200 forming the first support layer 20 on the grating layer 30 includes: as shown in FIG. Filling the photoresist material 73 (that is, filling the photoresist material 73 in the first gap 33 formed between the two adjacent first grid bars 31), and curing the photoresist material 73, Make the upper surface of the photoresist material 73 and the upper surface of the first grid bar 31 at the same level; then, as shown in FIG. 18 , on the upper surface of the first grid bar 31 and the A first support material layer is formed on the upper surface of the adhesive material 73 , and the first support material layer is patterned to form the first support layer 20 .
- the photoresist material 73 may be filled between the two adjacent first grating bars 31 of the grating layer 30 by coating or printing.
- step 300 forming the antireflection layer 10 on the first support layer 20 includes: filling light between two adjacent first support bars 21 of the first support layer 20
- the photoresist material 73 that is, the photoresist material 73 is filled in the second gap (not shown in the figure) formed between the two adjacent first support bars 21 ), and the photoresist material 73 is cured , so that the upper surface of the photoresist material 73 and the upper surface of the first support bar 21 are at the same level; then, as shown in FIG.
- An absorbing material layer 10 ′ is formed on the upper surface of the resist material 73 ; then, as shown in FIG. 20 , the absorbing material layer 10 ′ is patterned to form the second grid bars 11 of the anti-reflection layer 10 .
- a third gap 13 is formed between two adjacent second grid bars 11 .
- step 400 forming the second support layer 50 on the anti-reflection layer 10 includes: as shown in FIG. 21 , between two adjacent second grid bars 11 of the anti-reflection layer 10 Filling the photoresist material 73 (that is, filling the photoresist material 73 in the third gap 13 formed between the two adjacent second grid bars 11 ), and curing the photoresist material 73 , so that the upper surface of the photoresist material 73 and the upper surface of the second grid bar 11 are located on the same level; A second support material layer is formed on the upper surface of the resist material 73 , and the second support material layer is patterned to form the second support layer 50 .
- the photoresist material 73 filled in each gap (the first gap 33, the second gap and the third gap 13) is washed away with a stripping liquid, and the photoresist material 73 as shown in FIG. 2 is formed. structure.
- This embodiment also provides a display panel, which includes the above-mentioned polarizer.
- This embodiment also provides a display device, which includes the above-mentioned display panel.
- the overall structure of the polarizer 1 in this embodiment is basically the same as that in Embodiment 1, and the difference lies in that the polarizer 1 includes substrates 40, The antireflection layer 10 , the first support layer 20 and the grating layer 30 . That is, the substrate 40 is located on the side of the antireflection layer 10 away from the first support layer 20 .
- the antireflection layer 10 in the first way to reduce the reflectivity, the antireflection layer 10 , the first support layer 20 and the grating layer 30 are used to form the optical resonant cavity structure.
- the anti-reflection layer 10 can directly absorb the light reflected by the grating layer 30, so as to achieve the effect of reducing the reflectivity.
- the specific position of the second support layer 50 is slightly different from that in Embodiment 1.
- the second support layer 50 is located on the side of the antireflection layer 10 away from the first support layer 20 , and located between the substrate 40 and the antireflection layer 10 .
- the function played by the second support layer 50 in this embodiment is the same as that in Embodiment 1, and will not be repeated here.
- the second support layer 50 may not be included.
- This embodiment also provides a method for manufacturing a polarizer, which is used for preparing the above-mentioned polarizer 1 .
- the manufacturing method of the polarizer comprises the following steps:
- Step 100' forming a second support layer on the substrate
- Step 200' forming an antireflection layer on the substrate
- Step 300' forming a first support layer on the antireflection layer
- Step 400' forming a grating layer on the first support layer.
- step 100' is omitted, and the antireflection layer 10 is directly formed on the substrate 40, and the subsequent steps remain unchanged.
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Abstract
Description
Claims (13)
- 一种偏振片,其特征在于,所述偏振片沿光线入射方向包括依次叠设的减反层、第一支撑层和光栅层;所述光栅层包括多条沿第一方向设置的第一栅条,多条所述第一栅条相互间隔设置;所述第一支撑层包括多条沿第一方向设置且相互间隔的第一支撑条、以及沿第二方向设置的位于相邻的两个第一支撑条之间的第二支撑条,所述第二方向与所述第一方向形成有夹角,所述夹角大于0度且小于180度,所述第一支撑条的对应于所述第一栅条的设置;所述减反层包括多条沿第一方向设置的第二栅条,多条所述第二栅条相互间隔设置,且所述第二栅条的位置对应于所述第一栅条的位置设置;所述减反层、所述第一支撑层和所述光栅层形成光学谐振腔结构,或者,所述减反层用于吸收所述光栅层反射的光线。
- 如权利要求1所述的偏振片,其特征在于,所述第二方向垂直于所述第一方向;和/或,位于不同的两个相邻的所述第一支撑条之间的所述第二支撑条至少部分位于同一直线上;和/或,位于不同的两个相邻的所述第一支撑条之间的所述第二支撑条不位于同一直线上。
- 如权利要求1所述的偏振片,其特征在于,所述光栅层的占空比为0.3~0.6;和/或,所述光栅层的高度大于所述第一支撑层的高度,所述第一支撑层的高度大于所述减反层的高度;和/或,所述光栅层的高度为100nm~250nm,所述第一支撑层的高度为的70nm~200nm,所述减反层的高度为的5nm~100nm。
- 如权利要求1所述的偏振片,其特征在于,沿光线入射方向所述第 一支撑条的正投影和与其对应的所述第一栅条的正投影至少部分重合,沿光线入射方向所述第一支撑条的正投影和与其对应的所述第一栅条的正投影至少部分重合;沿光线入射方向所述第一支撑条的侧边的正投影和与其对应的所述第一栅条的侧边的正投影之间的距离小于或等于40nm,所述第二栅条的侧边的正投影和与其对应的所述第一栅条的侧边的正投影之间的距离小于或等于20nm。
- 如权利要求1所述的偏振片,其特征在于,所述光栅层的材料为金属材料;所述第一支撑层的材料为透明材料。
- 如权利要求1-5中任意一项所述的偏振片,其特征在于,所述偏振片包括第二支撑层,所述第二支撑层位于所述减反层远离所述第一支撑层的一侧,所述第二支撑层包括多条沿第一方向设置且相互间隔的第三支撑条、以及沿所述第二方向设置的位于相邻的两个第三支撑条之间的第四支撑条,所述第三支撑条的位置对应于所述第一栅条的位置设置;和/或,所述第四支撑条对应于所述第二支撑条设置;和/或,所述第二支撑层的材料为透明材料。
- 如权利要求1-5中任意一项所述的偏振片,其特征在于,所述偏振片还包括基板,所述基板位于所述光栅层远离所述第一支撑层的一侧;或者,所述基板位于所述减反层远离所述第一支撑层的一侧。
- 一种偏振片制造方法,用于制备权利要求1-5任一项所述的偏振片,其特征在于,所述偏振片制造方法包括:在基板上形成所述光栅层;在所述光栅层上形成所述第一支撑层;在所述第一支撑层上形成所述减反层。
- 根据权利要求8所述的偏振片制造方法,其特征在于,在所述第一支撑层上形成所述减反层之后,还包括:在所述减反层上形成第二支撑层,所述第二支撑层包括多条沿第一方向设置且相互间隔的第三支撑条、以及 沿所述第二方向设置的位于相邻的两个第三支撑条之间的第四支撑条,且所述第三支撑条的位置对应于所述第一栅条的位置设置;和/或,所述第四支撑条对应于所述第二支撑条设置;和/或,所述第二支撑层的材料为透明材料。
- 一种偏振片制造方法,用于制备权利要求1-5任一项所述的偏振片,其特征在于,所述偏振片制造方法包括:在基板上形成所述减反层;在所述减反层上形成所述第一支撑层;在所述第一支撑层上形成所述光栅层。
- 根据权利要求10所述的偏振片制造方法,其特征在于,在透明基板上形成所述减反层之前,还包括:在所述基板上形成第二支撑层,所述第二支撑层包括多条沿第一方向设置且相互间隔的第三支撑条、以及沿所述第二方向设置的位于相邻的两个第三支撑条之间的第四支撑条,且所述第三支撑条的位置对应于所述第一栅条的位置设置;和/或,所述第四支撑条对应于所述第二支撑条设置;和/或,所述第二支撑层的材料为透明材料。
- 一种显示面板,其特征在于,所述显示面板包括权利要求1-7中任意一项所述的偏振片。
- 一种显示装置,其特征在于,所述显示装置包括权利要求12所述的显示面板。
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CN202180000305.0A CN115280196A (zh) | 2021-02-25 | 2021-02-25 | 偏振片及其制造方法、显示面板及显示装置 |
US17/619,807 US20240012189A1 (en) | 2021-02-25 | 2021-02-25 | Polarizer and manufacturing method thereof, display panel and display apparatus |
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