CH691970A5 - Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. - Google Patents

Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. Download PDF

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Publication number
CH691970A5
CH691970A5 CH00408/97A CH40897A CH691970A5 CH 691970 A5 CH691970 A5 CH 691970A5 CH 00408/97 A CH00408/97 A CH 00408/97A CH 40897 A CH40897 A CH 40897A CH 691970 A5 CH691970 A5 CH 691970A5
Authority
CH
Switzerland
Prior art keywords
alkyl
formula
methyl
hydrogen
bis
Prior art date
Application number
CH00408/97A
Other languages
German (de)
English (en)
Inventor
David George Dr Leppard
Manfred Koehler
Andreas Valet
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Priority to CH00408/97A priority Critical patent/CH691970A5/de
Publication of CH691970A5 publication Critical patent/CH691970A5/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Medicinal Chemistry (AREA)
  • Biochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Dental Preparations (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH00408/97A 1996-03-04 1997-02-21 Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. CH691970A5 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CH00408/97A CH691970A5 (de) 1996-03-04 1997-02-21 Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH55896 1996-03-04
CH00408/97A CH691970A5 (de) 1996-03-04 1997-02-21 Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.

Publications (1)

Publication Number Publication Date
CH691970A5 true CH691970A5 (de) 2001-12-14

Family

ID=4189800

Family Applications (1)

Application Number Title Priority Date Filing Date
CH00408/97A CH691970A5 (de) 1996-03-04 1997-02-21 Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen.

Country Status (22)

Country Link
US (2) US6020528A (cg-RX-API-DMAC7.html)
JP (1) JP4168352B2 (cg-RX-API-DMAC7.html)
KR (1) KR100474236B1 (cg-RX-API-DMAC7.html)
CN (1) CN1092201C (cg-RX-API-DMAC7.html)
AT (1) AT404729B (cg-RX-API-DMAC7.html)
BE (1) BE1011437A5 (cg-RX-API-DMAC7.html)
BR (1) BR9701154A (cg-RX-API-DMAC7.html)
CA (1) CA2198803C (cg-RX-API-DMAC7.html)
CH (1) CH691970A5 (cg-RX-API-DMAC7.html)
DE (2) DE19708294B4 (cg-RX-API-DMAC7.html)
DK (1) DK176096B1 (cg-RX-API-DMAC7.html)
ES (1) ES2132018B1 (cg-RX-API-DMAC7.html)
FR (1) FR2745575B1 (cg-RX-API-DMAC7.html)
GB (1) GB2310855B (cg-RX-API-DMAC7.html)
IT (1) IT1290006B1 (cg-RX-API-DMAC7.html)
NL (1) NL1005424C2 (cg-RX-API-DMAC7.html)
NO (1) NO309571B1 (cg-RX-API-DMAC7.html)
RU (1) RU2180667C2 (cg-RX-API-DMAC7.html)
SE (1) SE520727C2 (cg-RX-API-DMAC7.html)
SG (1) SG55281A1 (cg-RX-API-DMAC7.html)
TW (1) TW408136B (cg-RX-API-DMAC7.html)
ZA (1) ZA971810B (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003019295A1 (en) * 2001-08-21 2003-03-06 Ciba Specialty Chemicals Holding Inc. Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
WO2006092434A1 (de) * 2005-03-03 2006-09-08 Basf Aktiengesellschaft Radikalisch härtbare beschichtungsmassen

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* Cited by examiner, † Cited by third party
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AT404729B (de) 1999-02-25
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