DE69809029T2 - Nicht-flüchtige phenylglyoxalsäureester - Google Patents

Nicht-flüchtige phenylglyoxalsäureester

Info

Publication number
DE69809029T2
DE69809029T2 DE69809029T DE69809029T DE69809029T2 DE 69809029 T2 DE69809029 T2 DE 69809029T2 DE 69809029 T DE69809029 T DE 69809029T DE 69809029 T DE69809029 T DE 69809029T DE 69809029 T2 DE69809029 T2 DE 69809029T2
Authority
DE
Germany
Prior art keywords
phenylglyoxal
volatile
acid esters
esters
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69809029T
Other languages
English (en)
Other versions
DE69809029D1 (de
Inventor
George Leppard
Manfred Koehler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of DE69809029D1 publication Critical patent/DE69809029D1/de
Publication of DE69809029T2 publication Critical patent/DE69809029T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
DE69809029T 1997-01-30 1998-01-23 Nicht-flüchtige phenylglyoxalsäureester Expired - Lifetime DE69809029T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH19597 1997-01-30
PCT/EP1998/000351 WO1998033761A1 (en) 1997-01-30 1998-01-23 Non-volatile phenylglyoxalic esters

Publications (2)

Publication Number Publication Date
DE69809029D1 DE69809029D1 (de) 2002-12-05
DE69809029T2 true DE69809029T2 (de) 2003-06-05

Family

ID=4181427

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69809029T Expired - Lifetime DE69809029T2 (de) 1997-01-30 1998-01-23 Nicht-flüchtige phenylglyoxalsäureester

Country Status (14)

Country Link
US (1) US6048660A (de)
EP (1) EP0956280B1 (de)
JP (1) JP4171073B2 (de)
KR (1) KR100548976B1 (de)
CN (1) CN1157359C (de)
AU (1) AU718619B2 (de)
BR (1) BR9806940B1 (de)
CA (1) CA2275667A1 (de)
DE (1) DE69809029T2 (de)
DK (1) DK0956280T3 (de)
ES (1) ES2184233T3 (de)
TW (1) TW460450B (de)
WO (1) WO1998033761A1 (de)
ZA (1) ZA98724B (de)

Families Citing this family (125)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304353A (zh) * 1999-03-09 2001-07-18 李·艾辛格 组织或图案表面在一种样品上的应用
DE19913353A1 (de) * 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings
US6470128B1 (en) 2001-03-30 2002-10-22 Alcatel UV-curable coating composition for optical fiber for a fast cure and with improved adhesion to glass
KR100898877B1 (ko) * 2002-02-04 2009-05-25 시바 홀딩 인크 고도로 플루오르화된 단량체 내의 플루오르화 광개시제
EP1487881A2 (de) * 2002-02-04 2004-12-22 Ciba SC Holding AG Oberflächen-aktive photoinitiatoren
DE60322345D1 (en) * 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
EP1499645B1 (de) * 2002-04-26 2006-03-15 Ciba SC Holding AG Einbaufähiger photoinitiator
DE10241299A1 (de) 2002-09-04 2004-03-25 Basf Ag Strahlungshärtbare Polyurethane mit verkappten Aminogrupppen
US7285363B2 (en) * 2002-11-08 2007-10-23 The University Of Connecticut Photoactivators, methods of use, and the articles derived therefrom
JP4116890B2 (ja) * 2003-01-31 2008-07-09 富士フイルム株式会社 インクジェット記録用インクおよび画像形成方法
JP2004231863A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd インクジェット記録用インクおよび画像形成方法
DE10316890A1 (de) * 2003-04-12 2004-11-04 Basf Coatings Ag Mit aktinischer Strahlung aktivierbare Initiatoren enthaltende Mischungen sowie Zwei- und Mehrkomponentensysteme, Verfahren zu ihrer Herstellung und ihre Verwendung
DE10348463A1 (de) 2003-10-14 2005-05-25 Basf Ag Hyperverzweigte Polyester mit ethylenisch ungesättigten Gruppen
DE102004030674A1 (de) 2004-06-24 2006-01-19 Basf Ag Vorrichtung und Verfahren zum Härten mit energiereicher Strahlung unter Inertgasatmosphäre
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure
EP1836002B1 (de) * 2004-12-22 2012-08-29 Basf Se Verfahren zur herstellung von festhaftenden überzügen
DE102004063102A1 (de) 2004-12-22 2006-07-13 Basf Ag Strahlungshärtbare Verbindungen
WO2006089935A1 (de) 2005-02-24 2006-08-31 Basf Aktiengesellschaft Strahlungshärtbare wässrige polyurethandispersionen
DE102005010109A1 (de) 2005-03-02 2006-09-07 Basf Ag Modifizierte Polyolefinwachse
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
PL1951184T3 (pl) * 2005-11-09 2012-06-29 Valeant Pharmaceuticals Int Inc Kompozycje do wybielania zębów i sposoby
DE102005057683A1 (de) 2005-12-01 2007-06-06 Basf Ag Strahlungshärtbare wasserelmulgierbare Polyisocyanate
CN101416111B (zh) 2006-03-28 2012-07-04 富士胶片株式会社 感光性组合物及感光性薄膜、以及图案的形成方法及印制电路板
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US20100266989A1 (en) 2006-11-09 2010-10-21 Klox Technologies Inc. Teeth whitening compositions and methods
CN101616946B (zh) 2007-02-15 2012-07-18 巴斯夫欧洲公司 聚氨酯分散体及其制备和用途
DE102008002008A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
DE102007026196A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
US8481623B2 (en) 2007-06-21 2013-07-09 Basf Se Radiation-curable coating masses with high adhesion
US8193279B2 (en) 2007-06-21 2012-06-05 Basf Se Flexible, radiation-curable coating compositions
DE102008041654A1 (de) 2007-08-31 2009-03-05 Basf Se Neue Beschichtungsmittel
DE102008043202A1 (de) 2007-10-29 2009-04-30 Basf Se Verfahren zur Kantenleimung von Textilien
US8632952B2 (en) * 2007-11-20 2014-01-21 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same
EP2235078B1 (de) * 2008-01-17 2011-11-16 Basf Se Modifizierte olefinpolymere
EP2344577B1 (de) 2008-10-07 2014-02-26 Basf Se Bedruckbare substrate mit gasbarriere
DE102008052586A1 (de) * 2008-10-21 2010-04-22 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur
EP2342237B1 (de) 2008-11-03 2014-04-23 Basf Se Fotoinitiatormischungen
NZ717641A (en) 2008-11-07 2017-09-29 Klox Tech Inc Combination of an oxidant and a photoactivator for the healing of wounds
DE102009046713A1 (de) 2008-11-27 2010-06-02 Basf Se Strahlungshärtbare Beschichtungsmassen
DE102010001956A1 (de) 2009-02-17 2010-08-19 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
EP2410971B1 (de) 2009-03-24 2017-08-16 Basf Se Strahlungshärtbare hochfunktionelle polyurethan(meth)acrylate
DE102010003308A1 (de) 2009-03-31 2011-01-13 Basf Se Strahlungshärtbare wasseremulgierbare Polyurethan(meth)acrylate
EP2421905B1 (de) 2009-04-22 2013-03-13 Basf Se Strahlungshärtbare beschichtungsmassen
DK2453922T3 (en) 2009-07-17 2018-01-02 Klox Tech Inc ANTIBACTERIAL ORAL COMPOSITION
US8415437B2 (en) 2009-08-05 2013-04-09 Basf Se (Meth)acrylated melamine formaldehyde resins
US9212252B2 (en) 2009-08-06 2015-12-15 Basf Se Radiation-curable, water-dispersible polyurethanes and polyurethane dispersions
DE102010044204A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
DE102010044206A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
CN102442909B (zh) * 2010-06-25 2013-10-30 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
DE102010026490A1 (de) 2010-07-07 2012-01-12 Basf Se Verfahren zur Herstellung von feinstrukturierten Oberflächen
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US9090736B2 (en) 2011-02-22 2015-07-28 Basf Se Rheological agent for radiation-curable coating compositions
ES2535938T3 (es) 2011-02-22 2015-05-19 Basf Se Agentes para modificar la reología para masas de recubrimiento que pueden curar por radiación
WO2012171833A1 (de) 2011-06-14 2012-12-20 Basf Se Strahlungshärtbare wässrige polyurethandispersionen
WO2013110566A1 (de) 2012-01-27 2013-08-01 Basf Se Strahlungshärtbare antimikrobielle beschichtungsmasse
WO2013110504A1 (en) 2012-01-27 2013-08-01 Basf Se Radiation-curable antimicrobial coatings
US8728455B2 (en) 2012-01-27 2014-05-20 Basf Se Radiation-curable antimicrobial coatings
US20150045493A1 (en) 2012-03-19 2015-02-12 Basf Se Radiation-Curable Coating Compositions
WO2013139602A1 (de) 2012-03-19 2013-09-26 Basf Se Strahlungshärtbare wässrige dispersionen
US9193888B2 (en) 2012-03-19 2015-11-24 Basf Se Radiation-curable aqueous dispersions
US20130281913A1 (en) 2012-04-20 2013-10-24 Klox Technologies Inc. Biophotonic compositions and methods for providing biophotonic treatment
US11116841B2 (en) 2012-04-20 2021-09-14 Klox Technologies Inc. Biophotonic compositions, kits and methods
CN104379624B (zh) 2012-05-30 2016-10-19 巴斯夫欧洲公司 辐射可固化的化合物
US9296907B2 (en) 2012-05-30 2016-03-29 Basf Se Radiation-curable compounds
US9801803B2 (en) 2012-06-04 2017-10-31 L'oreal Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with UV-LED
JP6010352B2 (ja) 2012-06-07 2016-10-19 株式会社オートネットワーク技術研究所 硬化性増感剤、光硬化材料、硬化物及びワイヤーハーネス材料
US20150191620A1 (en) 2012-07-20 2015-07-09 Basf Se Fast-Drying, Radiation-Curable Coating Compounds
US9809724B2 (en) 2012-08-09 2017-11-07 Basf Se Radiation-curable formulations with high adhesion
JP6231570B2 (ja) 2012-09-14 2017-11-15 ヴァレアント ファーマシューティカルズ インターナショナル インコーポレイテッドＶａｌｅａｎｔ Ｐｈａｒｍａｃｅｕｔｉｃａｌｓ Ｉｎｔｅｒｎａｔｉｏｎａｌ， Ｉｎｃ． 歯のホワイトニングのための組成物および方法
EP2909165B1 (de) 2012-10-19 2018-05-30 IGM Group B.V. Hybride photoinitiatoren
WO2014063920A1 (de) 2012-10-24 2014-05-01 Basf Se Strahlungshärtbare wasserdispergierbare polyurethan(meth)acrylate
ES2628490T3 (es) 2012-11-16 2017-08-03 Basf Se Poliuretanos, dispersiones de los mismos, su preparación y uso
EP2931811A2 (de) 2012-12-14 2015-10-21 Basf Se (meth)acrylierte aminoharze
US20140276354A1 (en) 2013-03-14 2014-09-18 Klox Technologies Inc. Biophotonic materials and uses thereof
WO2014161817A1 (de) 2013-04-03 2014-10-09 Basf Se Verfahren zur reduzierung der restmonomerenmenge in einer wässrigen polymerisatdispersion
CA2916337C (en) 2013-07-03 2022-03-22 Klox Technologies Inc. Biophotonic compositions comprising a chromophore and a gelling agent for treating wounds
WO2015028397A1 (en) 2013-08-26 2015-03-05 Basf Se Radiation-curable water-dispersible polyurethane (meth)acrylates
RU2656392C2 (ru) 2013-10-16 2018-06-06 Басф Се Способ получения водоэмульгируемых полиуретанакрилатов
US9676921B2 (en) * 2013-10-30 2017-06-13 Xerox Corporation Curable latex inks comprising an unsaturated polyester for indirect printing
CA2927948C (en) 2013-11-05 2022-04-26 Construction Research & Technology Gmbh Novel binding agent systems
CN103709036B (zh) * 2013-12-03 2015-07-29 天津久日化学股份有限公司 双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂
UA117159C2 (uk) 2014-01-14 2018-06-25 Кроноплюс Текнікал Аг Багатошарова будівельна плита для внутрішнього та зовнішнього застосування
AR099941A1 (es) 2014-04-01 2016-08-31 Klox Tech Inc Composiciones para relleno de tejido y métodos de uso
EP2942361A1 (de) 2014-05-06 2015-11-11 Basf Se Anfeuerung mit Tensiden in wässrigen, unter UV-Strahlung härtbaren Polyurethandispersionen
DK3201261T3 (en) 2014-10-01 2019-04-08 Basf Se PROCEDURE FOR Curing HARDWARE COMPOSITIONS
EP3212826B1 (de) 2014-10-31 2020-10-14 Klox Technologies Inc. Lichtaktivierbare fasern und textilmedien
BR112017012656A2 (pt) 2014-12-17 2017-12-26 Basf Se composição de revestimento aquosa, substrato, poliuretano dispersível em água, processo para preparar um poliuretano dispersível em água, extendido na cadeia e reticulado, método para revestir um substrato, e, uso de um poliuretano dispersível em água.
US20160223269A1 (en) 2015-02-04 2016-08-04 Outlast Technologies, LLC Thermal management films containing phase change materials
US10003053B2 (en) 2015-02-04 2018-06-19 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
US10431858B2 (en) 2015-02-04 2019-10-01 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
KR20180041165A (ko) 2015-08-17 2018-04-23 바스프 에스이 폴리우레탄 (메트)아크릴레이트를 포함하는 수성 중합체 조성물
EP3173449A1 (de) 2015-11-27 2017-05-31 BASF Coatings GmbH Verbund aus zwei festkörpern
PT3500535T (pt) 2016-08-19 2020-09-01 Xylo Tech Ag Painel revestido e processo de fabrico do painel revestido
JP1599373S (de) 2017-04-03 2018-03-12
CN110944957B (zh) 2017-06-02 2022-07-08 科思创(荷兰)有限公司 光纤用耐热性可辐射固化涂料
WO2019090218A1 (en) 2017-11-03 2019-05-09 Dsm Ip Assets, B.V. Water-blocking systems including fibers coated with liquid radiation curable sap compositions
US20210208333A1 (en) 2018-06-01 2021-07-08 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber via alternative oligomers and the coatings produced therefrom
EP3820927A1 (de) 2018-07-13 2021-05-19 Miwon Austria Forschung und Entwicklung GmbH Wasserdispergierbare polyurethan(meth)acrylate für durch aktinische bestrahlung härtbare beschichtungen
EP3597669A1 (de) 2018-07-20 2020-01-22 Clariant International Ltd Lichthärtbare harzzusammensetzung zum 3d-drucken
EP3597668A1 (de) 2018-07-20 2020-01-22 Clariant International Ltd Lichthärtbare harzzusammensetzung zum 3d-drucken
EP3867207A1 (de) 2018-12-03 2021-08-25 Ms Holding B.V. Gefüllte strahlungshärtbare zusammensetzungen zur beschichtung von optischen fasern und daraus hergestellte beschichtungen
JP2022533793A (ja) 2019-05-24 2022-07-25 コベストロ （ネザーランズ） ビー．ヴィー． 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
WO2020239564A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
CN114207063B (zh) 2019-07-31 2023-07-25 科思创(荷兰)有限公司 具有多功能长臂低聚物的涂覆光纤用辐射固化组合物
US20220325106A1 (en) 2019-10-08 2022-10-13 Basf Se Thermally curable two-component coating compounds
KR20220164527A (ko) 2020-04-03 2022-12-13 코베스트로 (네덜란드) 비.브이. 다층 광학 디바이스
EP4127794A1 (de) 2020-04-03 2023-02-08 Covestro (Netherlands) B.V. Selbstheilende optische fasern und zusammensetzungen zu ihrer herstellung
EP4127006A1 (de) 2020-04-03 2023-02-08 Covestro (Netherlands) B.V. Verfahren zur synthese von multiwasserstoffbindenden oligomeren
WO2022002909A1 (en) 2020-06-30 2022-01-06 Covestro (Netherlands) B.V. Viscosity index improvers in optical fiber coatings
DE102020132126A1 (de) 2020-12-03 2022-06-09 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Strukturiertes Material
EP4294879A1 (de) 2021-02-22 2023-12-27 Covestro (Netherlands) B.V. Verfahren zur bereitstellung von beschichtungen mit geringem glanz
CN117858913A (zh) 2021-08-26 2024-04-09 巴斯夫欧洲公司 可固化组合物和由其形成的3d打印物体及形成该3d打印物体的方法
WO2023072891A1 (en) 2021-10-29 2023-05-04 Covestro (Netherlands) B.V. Radical-curable composition
WO2023156441A1 (en) 2022-02-17 2023-08-24 Basf Coatings Gmbh Uv-curable coating compositions
WO2023194237A1 (en) 2022-04-06 2023-10-12 Basf Se Curable composition for 3d printing process and 3d-printed object formed therefrom and 3d printing process using the same
WO2023205224A2 (en) 2022-04-21 2023-10-26 Covestro (Netherlands) B.V. Low-volatility radiation curable compositions for coating optical fibers
WO2023227683A1 (en) 2022-05-25 2023-11-30 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2024042073A1 (en) 2022-08-24 2024-02-29 Covestro (Netherlands) B.V. Process for providing low gloss coatings

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532737A (en) * 1967-02-02 1970-10-06 Sterling Drug Inc Esters of arylglyoxylic acids
US3754006A (en) * 1967-02-02 1973-08-21 Sterling Drug Inc Esters and amides of substituted glyoxylic acids
US3704313A (en) * 1968-10-10 1972-11-28 Rorer Inc William H P-cyclohexylphenylglycolic acid and derivatives thereof
US3657325A (en) * 1969-12-03 1972-04-18 Sterling Drug Inc Esters of substituted glyoxylic acids
US3930868A (en) * 1973-05-23 1976-01-06 The Richardson Company Light sensitive arylglyoxyacrylate compositions
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DE2825955A1 (de) * 1978-06-14 1980-01-03 Bayer Ag Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln
US4475999A (en) * 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
AU569084B2 (en) * 1983-06-27 1988-01-21 Stauffer Chemical Company Photopolymerizable composition
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
US5795581A (en) * 1995-03-31 1998-08-18 Sandia Corporation Controlled release of molecular components of dendrimer/bioactive complexes

Also Published As

Publication number Publication date
KR100548976B1 (ko) 2006-02-03
JP4171073B2 (ja) 2008-10-22
BR9806940A (pt) 2000-03-28
CA2275667A1 (en) 1998-08-06
JP2001511137A (ja) 2001-08-07
ZA98724B (en) 1998-07-30
DK0956280T3 (da) 2003-02-24
AU6096398A (en) 1998-08-25
KR20000070608A (ko) 2000-11-25
EP0956280B1 (de) 2002-10-30
AU718619B2 (en) 2000-04-20
WO1998033761A1 (en) 1998-08-06
BR9806940B1 (pt) 2010-12-14
CN1244190A (zh) 2000-02-09
CN1157359C (zh) 2004-07-14
TW460450B (en) 2001-10-21
ES2184233T3 (es) 2003-04-01
EP0956280A1 (de) 1999-11-17
US6048660A (en) 2000-04-11
DE69809029D1 (de) 2002-12-05

Similar Documents

Publication Publication Date Title
DE69809029T2 (de) Nicht-flüchtige phenylglyoxalsäureester
ID20807A (id) Asam sulfonilaminokarboksilat
ID22095A (id) Asam aril-akrilat ester
ID22799A (id) Turunan-turunan asam arilsulfonilamino hidroksamat
ID22809A (id) Turunan-turunan asam arilsulfonil hidroksamat
ID18063A (id) Turunan-turunan asam arilsufonilamino hidroksamat
ID20809A (id) Asam diaminokarboksilat tersubstitusi
ID28833A (id) Turunan asam 3-aril-2-hidroksipropionat
ATE239005T1 (de) (4-sulfonylamino)-tetrahydropyran-4-carbonsäure hydroxamiden
DE69918278D1 (de) Substituierte indolalkansäure
DK1003720T3 (da) Aryloxyarylsulfonylaminohydroxamsyrederivater
ID24686A (id) Enzim-enzim biosintetik asam amino tanaman
DE69839412D1 (de) Führungsdraht
DK1100769T3 (da) Aminomethylcarboxylsyrederivater
DE69522690D1 (de) alpha-ketogultarsäure dehydrogenasegen
ID23502A (id) Pembuatan asam tereftalat
ID24376A (id) Turunan-turunan asam amidokarboksilat
ID27390A (id) Pembuatan asam akrilat
DE69606053T2 (de) Modifizierte fluorsulfonsäure
ID17416A (id) Pembuatan asam akrilat
PT878467E (pt) Acidos 6-aminotetra-hidroisoquinolinacarboxilicos e 7-aminotetra-hidroisoquinolinacarboxilicos substituidos
ID28810A (id) Senyawa-senyawa amida-omega asam n-arilsulfonilamino
ID20656A (id) Ko-produksi ester
ID22841A (id) Penggunaan larutan-larutan asam manonatrium iminodiasetat di dalam pembuatan asam n-fosfonometiliminodiasetat
NO991561D0 (no) 3-alkoksyisoksazol-4-yl-substituerte 2-aminokarboksylsyreforbindelser

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC