ES2184233T3 - Esteres fenilglioxalicos no volatiles. - Google Patents

Esteres fenilglioxalicos no volatiles.

Info

Publication number
ES2184233T3
ES2184233T3 ES98905335T ES98905335T ES2184233T3 ES 2184233 T3 ES2184233 T3 ES 2184233T3 ES 98905335 T ES98905335 T ES 98905335T ES 98905335 T ES98905335 T ES 98905335T ES 2184233 T3 ES2184233 T3 ES 2184233T3
Authority
ES
Spain
Prior art keywords
rent
hydrogen
formula
independently
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES98905335T
Other languages
English (en)
Inventor
David George Leppard
Manfred Kohler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of ES2184233T3 publication Critical patent/ES2184233T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids

Landscapes

  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Cosmetics (AREA)
  • Holo Graphy (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Fats And Perfumes (AREA)

Abstract

LA INVENCION SE REFIERE A COMPUESTOS DE FORMULA (I), EN LOS QUE R 1 Y R 2 , INDEPENDIENTEMENTE ENTRE SI, SON, POR EJEMPLO, UN GRUPO DE FORMULA (II); R 3 , R 4 , R SUB,5 , R 6 Y R 7 , INDEPENDIENTEMENTE ENTRE SI, SON, POR EJEMPLO, HIDROGENO, ALQUILO C 1 - C 12 , OR 8, SR 9 , NR 10 R 11 , HALOGENO O FENILO; R 8 , R 9 , R 10 , R 11 , INDEPENDIENTEMENTE ENTRE SI, SON, POR EJEMPLO, ALQUILO C 1 - C 12 ; R 12 ES, POR EJEMPLO, ALQUILO C 1 - C 8 ; R 13 ES, POR EJEMPLO, ALQUILO C 1 - C 12 ; R 14 ES, POR EJEMPLO, HIDROGENO; Y ES ALQUILENO C 1 - C 12 , ALQUENILENO C4 - C 8 , ALQUINILENO C 4 - C 8 O CICLOHEX ILENO, O ES FENILENO O ALQUILENO C 4 - C 40 INTERRUMPIDO UNA O MAS VECES POR - O -, - S - O - NR 15 -, O Y ES UN GRUPO DE FORMULA (III), (IV), (V), (VI), (VII), (VIII), (IX), (X) O (XI); Y 1 ES TAL Y COMO SE DEFINIO Y, CON EXCEPC ION DE LA FORMULA (V); R 15 ES HIDROGENO, ALQUILO C 1 - C 12 O FENILO; Y R 16 ES HIDROGENO, CH 2 OH O ALQUILO C 1 - C 4 . SE INCLUYEN ASIMISMO MEZCLAS DE DICHOS COMPUESTOSCON FOTOINICIADORES ADICIONALES, QUE SON ADECUADAS PARA FOTOPOLIMERIZAR COMPUESTOS QUE PRESENTAN DOBLES ENLACES ETILENICAMENTE INSATURADOS.
ES98905335T 1997-01-30 1998-01-23 Esteres fenilglioxalicos no volatiles. Expired - Lifetime ES2184233T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH19597 1997-01-30

Publications (1)

Publication Number Publication Date
ES2184233T3 true ES2184233T3 (es) 2003-04-01

Family

ID=4181427

Family Applications (1)

Application Number Title Priority Date Filing Date
ES98905335T Expired - Lifetime ES2184233T3 (es) 1997-01-30 1998-01-23 Esteres fenilglioxalicos no volatiles.

Country Status (14)

Country Link
US (1) US6048660A (es)
EP (1) EP0956280B1 (es)
JP (1) JP4171073B2 (es)
KR (1) KR100548976B1 (es)
CN (1) CN1157359C (es)
AU (1) AU718619B2 (es)
BR (1) BR9806940B1 (es)
CA (1) CA2275667A1 (es)
DE (1) DE69809029T2 (es)
DK (1) DK0956280T3 (es)
ES (1) ES2184233T3 (es)
TW (1) TW460450B (es)
WO (1) WO1998033761A1 (es)
ZA (1) ZA98724B (es)

Families Citing this family (134)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE268260T1 (de) * 1999-03-09 2004-06-15 Lee Eisinger Auftragen von texturierten oder gemusterten oberflächen auf einen prototyp
DE19913353A1 (de) 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings
US6470128B1 (en) 2001-03-30 2002-10-22 Alcatel UV-curable coating composition for optical fiber for a fast cure and with improved adhesion to glass
EP1487881A2 (en) * 2002-02-04 2004-12-22 Ciba SC Holding AG Surface-active photoinitiators
KR100898877B1 (ko) * 2002-02-04 2009-05-25 시바 홀딩 인크 고도로 플루오르화된 단량체 내의 플루오르화 광개시제
DE60322345D1 (en) * 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
ES2259413T3 (es) * 2002-04-26 2006-10-01 Ciba Specialty Chemicals Holding Inc. Fotoiniciador incorporable.
DE10241299A1 (de) 2002-09-04 2004-03-25 Basf Ag Strahlungshärtbare Polyurethane mit verkappten Aminogrupppen
US7285363B2 (en) * 2002-11-08 2007-10-23 The University Of Connecticut Photoactivators, methods of use, and the articles derived therefrom
JP4116890B2 (ja) * 2003-01-31 2008-07-09 富士フイルム株式会社 インクジェット記録用インクおよび画像形成方法
JP2004231863A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd インクジェット記録用インクおよび画像形成方法
DE10316890A1 (de) * 2003-04-12 2004-11-04 Basf Coatings Ag Mit aktinischer Strahlung aktivierbare Initiatoren enthaltende Mischungen sowie Zwei- und Mehrkomponentensysteme, Verfahren zu ihrer Herstellung und ihre Verwendung
DE10348463A1 (de) 2003-10-14 2005-05-25 Basf Ag Hyperverzweigte Polyester mit ethylenisch ungesättigten Gruppen
DE102004030674A1 (de) 2004-06-24 2006-01-19 Basf Ag Vorrichtung und Verfahren zum Härten mit energiereicher Strahlung unter Inertgasatmosphäre
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure
JP5421533B2 (ja) * 2004-12-22 2014-02-19 チバ ホールディング インコーポレーテッド 強接着性コーティングの製造方法
DE102004063102A1 (de) 2004-12-22 2006-07-13 Basf Ag Strahlungshärtbare Verbindungen
JP5769359B2 (ja) 2005-02-24 2015-08-26 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 放射線硬化な水性ポリウレタン分散液
DE102005010109A1 (de) 2005-03-02 2006-09-07 Basf Ag Modifizierte Polyolefinwachse
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
JP5366553B2 (ja) * 2005-11-09 2013-12-11 クロックス テクノロジーズ インコーポレイテッド 歯のホワイトニング組成物及び方法
DE102005057683A1 (de) 2005-12-01 2007-06-06 Basf Ag Strahlungshärtbare wasserelmulgierbare Polyisocyanate
CN101416111B (zh) 2006-03-28 2012-07-04 富士胶片株式会社 感光性组合物及感光性薄膜、以及图案的形成方法及印制电路板
JP2010505977A (ja) * 2006-10-03 2010-02-25 チバ ホールディング インコーポレーテッド フェニルグリオキシレート型の光開始剤を含む光硬化性組成物
US20100266989A1 (en) 2006-11-09 2010-10-21 Klox Technologies Inc. Teeth whitening compositions and methods
CN101616946B (zh) 2007-02-15 2012-07-18 巴斯夫欧洲公司 聚氨酯分散体及其制备和用途
DE102007026196A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
DE102008002008A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
US8193279B2 (en) 2007-06-21 2012-06-05 Basf Se Flexible, radiation-curable coating compositions
EP2160423A1 (de) 2007-06-21 2010-03-10 Basf Se Strahlungshärtbare beschichtungsmassen mit hoher haftung
DE102008041654A1 (de) 2007-08-31 2009-03-05 Basf Se Neue Beschichtungsmittel
DE102008043202A1 (de) 2007-10-29 2009-04-30 Basf Se Verfahren zur Kantenleimung von Textilien
EP2182410A4 (en) * 2007-11-20 2011-04-13 Hitachi Chemical Co Ltd PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THE SAME
EP2235078B1 (en) * 2008-01-17 2011-11-16 Basf Se Modified olefin polymers
EP2344577B1 (en) * 2008-10-07 2014-02-26 Basf Se Printable gas barriers
DE102008052586A1 (de) * 2008-10-21 2010-04-22 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur
CN102203136B (zh) 2008-11-03 2013-11-13 巴斯夫欧洲公司 光敏引发剂混合物
NZ592651A (en) 2008-11-07 2013-05-31 Klox Technologies Inc Oxidatitive photoactivated skin rejeuvenation composition comprising hyaluronic acid, glucosamine, or allantoin
DE102009046713A1 (de) 2008-11-27 2010-06-02 Basf Se Strahlungshärtbare Beschichtungsmassen
DE102010001956A1 (de) 2009-02-17 2010-08-19 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
WO2010108863A1 (de) 2009-03-24 2010-09-30 Basf Se Strahlungshärtbare hochfunktionelle polyurethan(meth)acrylate
DE102010003308A1 (de) 2009-03-31 2011-01-13 Basf Se Strahlungshärtbare wasseremulgierbare Polyurethan(meth)acrylate
US8648126B2 (en) 2009-04-22 2014-02-11 Basf Se Radiation-curable coating compositions
PL2453922T3 (pl) 2009-07-17 2018-03-30 Klox Technologies Inc. Przeciwbakteryjna doustna kompozycja
EP2350154B1 (de) 2009-08-05 2012-09-19 Basf Se (meth)acrylierte melamin-formaldehyd-harze
US9212252B2 (en) 2009-08-06 2015-12-15 Basf Se Radiation-curable, water-dispersible polyurethanes and polyurethane dispersions
DE102010044204A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
DE102010044206A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
CN102442909B (zh) * 2010-06-25 2013-10-30 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
DE102010026490A1 (de) 2010-07-07 2012-01-12 Basf Se Verfahren zur Herstellung von feinstrukturierten Oberflächen
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US9090736B2 (en) 2011-02-22 2015-07-28 Basf Se Rheological agent for radiation-curable coating compositions
KR20140006959A (ko) 2011-02-22 2014-01-16 바스프 에스이 방사선-경화성 코팅 물질용 레올로지 작용제
CN103608375B (zh) 2011-06-14 2015-09-09 巴斯夫欧洲公司 可辐射固化聚氨酯水分散体
WO2013110566A1 (de) 2012-01-27 2013-08-01 Basf Se Strahlungshärtbare antimikrobielle beschichtungsmasse
US8728455B2 (en) 2012-01-27 2014-05-20 Basf Se Radiation-curable antimicrobial coatings
WO2013110504A1 (en) 2012-01-27 2013-08-01 Basf Se Radiation-curable antimicrobial coatings
CN104204021B (zh) 2012-03-19 2018-04-20 巴斯夫欧洲公司 可辐射固化的含水分散体
US9193888B2 (en) 2012-03-19 2015-11-24 Basf Se Radiation-curable aqueous dispersions
CN104204118B (zh) 2012-03-19 2017-04-12 巴斯夫欧洲公司 可辐射固化的涂料组合物
US11116841B2 (en) 2012-04-20 2021-09-14 Klox Technologies Inc. Biophotonic compositions, kits and methods
US20130281913A1 (en) 2012-04-20 2013-10-24 Klox Technologies Inc. Biophotonic compositions and methods for providing biophotonic treatment
US9296907B2 (en) 2012-05-30 2016-03-29 Basf Se Radiation-curable compounds
AU2013269835B2 (en) 2012-05-30 2016-02-04 Basf Se Radiation-curable compounds
EP2854754B1 (en) 2012-06-04 2019-04-24 L'oreal Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with uv-led
JP6010352B2 (ja) 2012-06-07 2016-10-19 株式会社オートネットワーク技術研究所 硬化性増感剤、光硬化材料、硬化物及びワイヤーハーネス材料
KR20150036655A (ko) 2012-07-20 2015-04-07 바스프 에스이 급속-건조, 방사선-경화성 코팅 화합물
US9809724B2 (en) 2012-08-09 2017-11-07 Basf Se Radiation-curable formulations with high adhesion
EP2895139B1 (en) 2012-09-14 2019-10-23 Bausch Health Companies Inc. Methods for teeth whitening
EP2909165B1 (en) * 2012-10-19 2018-05-30 IGM Group B.V. Hybrid photoinitiators
WO2014063920A1 (de) 2012-10-24 2014-05-01 Basf Se Strahlungshärtbare wasserdispergierbare polyurethan(meth)acrylate
WO2014076073A1 (en) 2012-11-16 2014-05-22 Basf Se Polyurethanes, dispersions thereof, their preparation and use
EP2931811A2 (en) 2012-12-14 2015-10-21 Basf Se (meth)acrylated amino resins
US20140276354A1 (en) 2013-03-14 2014-09-18 Klox Technologies Inc. Biophotonic materials and uses thereof
WO2014161817A1 (de) 2013-04-03 2014-10-09 Basf Se Verfahren zur reduzierung der restmonomerenmenge in einer wässrigen polymerisatdispersion
HK1219890A1 (zh) 2013-07-03 2017-04-21 广东科洛克生物医药集团有限公司 治疗不癒合伤口的组合物和方法
CA2922235A1 (en) 2013-08-26 2015-03-05 Basf Se Radiation-curable water-dispersible polyurethane (meth)acrylates
JP2016540837A (ja) 2013-10-16 2016-12-28 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 水と乳化可能なポリウレタンアクリレートの製造法
US9676921B2 (en) * 2013-10-30 2017-06-13 Xerox Corporation Curable latex inks comprising an unsaturated polyester for indirect printing
US9840635B2 (en) 2013-11-05 2017-12-12 Construction Research & Technology, Gmbh Binding agent systems
CN103709036B (zh) * 2013-12-03 2015-07-29 天津久日化学股份有限公司 双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂
WO2015106771A1 (de) 2014-01-14 2015-07-23 Kronoplus Technical Ag Mehrschichtige bauplatte für den innen- und aussenbereich
JP2017509433A (ja) 2014-04-01 2017-04-06 クロックス テクノロジーズ インコーポレイテッドＫｌｏｘ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｉｎｃ． 組織充填剤組成物および使用方法
EP2942361A1 (en) 2014-05-06 2015-11-11 Basf Se Grain enhancement with surfactants in water-based uv-radiation curable polyurethane dispersions
WO2016050398A1 (de) 2014-10-01 2016-04-07 Basf Se Verfahren zur härtung von härtbaren zusammensetzungen
RU2017117187A (ru) 2014-10-31 2018-11-30 Клокс Текнолоджиз Инк. Фотоактивируемые волокна и тканые материалы
PL3233958T3 (pl) 2014-12-17 2021-02-22 Basf Se Kompozycja powlekająca do utwardzania promieniowaniem na bazie poliuretanów o wydłużonych łańcuchach i usieciowanych
US20160223269A1 (en) 2015-02-04 2016-08-04 Outlast Technologies, LLC Thermal management films containing phase change materials
US10003053B2 (en) 2015-02-04 2018-06-19 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
US10431858B2 (en) 2015-02-04 2019-10-01 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
CN107922573B (zh) 2015-08-17 2023-08-25 巴斯夫欧洲公司 包含聚氨酯(甲基)丙烯酸酯的水性聚合物组合物
EP3173449A1 (de) 2015-11-27 2017-05-31 BASF Coatings GmbH Verbund aus zwei festkörpern
US11702843B2 (en) 2016-08-19 2023-07-18 Xylo Technologies Ag Coated panel and method for manufacturing a coated panel
JP1609254S (es) 2017-04-03 2018-07-17
KR102588712B1 (ko) 2017-06-02 2023-10-17 코베스트로 (네덜란드) 비.브이. 광섬유용의 내열성 방사선 경화성 코팅
WO2019090218A1 (en) 2017-11-03 2019-05-09 Dsm Ip Assets, B.V. Water-blocking systems including fibers coated with liquid radiation curable sap compositions
US20210208333A1 (en) 2018-06-01 2021-07-08 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber via alternative oligomers and the coatings produced therefrom
WO2020012039A1 (en) 2018-07-13 2020-01-16 Miwon Austria Forschung Und Entwicklung Gmbh Water-dispersible polyurethane (meth)acrylates for actinic radiation curable coatings
EP3597668A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
EP3597669A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
US11932571B2 (en) 2019-05-24 2024-03-19 Covestro (Netherland) B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2021021971A1 (en) 2019-07-31 2021-02-04 Dsm Ip Assets B.V. Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers
ES2971221T3 (es) 2019-10-08 2024-06-04 Basf Se Composiciones de revestimiento de dos componentes térmicamente curables
US11358899B2 (en) 2020-04-03 2022-06-14 Covestro (Netherlands) B.V. Self-healing optical fibers and the compositions used to create the same
JP7793535B2 (ja) 2020-04-03 2026-01-05 コベストロ （ネザーランズ） ビー．ヴィー． 多水素結合オリゴマーの合成方法
WO2021202638A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Multi-layered optical devices
CN115777077A (zh) 2020-06-30 2023-03-10 科思创(荷兰)有限公司 光纤涂料的粘度指数改进剂
DE102020132126A1 (de) 2020-12-03 2022-06-09 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Strukturiertes Material
CN116888221A (zh) 2021-02-22 2023-10-13 科思创(荷兰)有限公司 提供低光泽涂层的方法
EP4392470A1 (en) 2021-08-26 2024-07-03 Basf Se Curable composition and 3d-printed object formed therefrom and process for forming the same
PL4423155T3 (pl) 2021-10-29 2025-12-08 Covestro (Netherlands) B.V. Kompozycja utwardzalna rodnikowo
US20250101253A1 (en) 2022-02-17 2025-03-27 Basf Coatings Gmbh Uv-curable coating compositions
EP4504494A1 (en) 2022-04-06 2025-02-12 Basf Se Curable composition for 3d printing process and 3d-printed object formed therefrom and 3d printing process using the same
JP2025514927A (ja) 2022-04-21 2025-05-13 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバを被覆するための低揮発性放射線硬化性組成物
EP4532576A1 (en) 2022-05-25 2025-04-09 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2024042074A1 (en) 2022-08-24 2024-02-29 Covestro (Netherlands) B.V. Process for providing low gloss coatings
CN120344325A (zh) 2022-12-15 2025-07-18 科思创(荷兰)有限公司 通过辐射固化制备低光泽涂层表面的方法
WO2024141320A1 (en) 2022-12-29 2024-07-04 Basf Se Radiation curable liquid composition, process of forming 3d-printed object and 3d-printed object
WO2024160696A2 (en) 2023-01-31 2024-08-08 Basf Se Curable composition, 3d-printed object formed therefrom and process of forming the same
TW202537950A (zh) * 2023-09-25 2025-10-01 荷蘭商科思創（荷蘭）有限責任公司 用於光固化組成物的光起始劑(一)
US12187852B1 (en) 2024-01-02 2025-01-07 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions
US12428514B2 (en) 2024-01-02 2025-09-30 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions
WO2025147337A1 (en) 2024-01-02 2025-07-10 Covestro Llc Polysilanes, methods for their preparation, and the use thereof in coating compositions
US20250215139A1 (en) 2024-01-02 2025-07-03 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions
WO2025147343A1 (en) 2024-01-02 2025-07-10 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532737A (en) * 1967-02-02 1970-10-06 Sterling Drug Inc Esters of arylglyoxylic acids
US3754006A (en) * 1967-02-02 1973-08-21 Sterling Drug Inc Esters and amides of substituted glyoxylic acids
US3704313A (en) * 1968-10-10 1972-11-28 Rorer Inc William H P-cyclohexylphenylglycolic acid and derivatives thereof
US3657325A (en) * 1969-12-03 1972-04-18 Sterling Drug Inc Esters of substituted glyoxylic acids
US3930868A (en) * 1973-05-23 1976-01-06 The Richardson Company Light sensitive arylglyoxyacrylate compositions
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
DE2825955A1 (de) * 1978-06-14 1980-01-03 Bayer Ag Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln
US4475999A (en) * 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
AU569084B2 (en) * 1983-06-27 1988-01-21 Stauffer Chemical Company Photopolymerizable composition
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
US5795581A (en) * 1995-03-31 1998-08-18 Sandia Corporation Controlled release of molecular components of dendrimer/bioactive complexes

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CA2275667A1 (en) 1998-08-06
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CN1157359C (zh) 2004-07-14
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JP2001511137A (ja) 2001-08-07
WO1998033761A1 (en) 1998-08-06
EP0956280B1 (en) 2002-10-30
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DE69809029T2 (de) 2003-06-05
DE69809029D1 (de) 2002-12-05
KR20000070608A (ko) 2000-11-25
AU6096398A (en) 1998-08-25
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BR9806940B1 (pt) 2010-12-14
BR9806940A (pt) 2000-03-28

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