CN1244190A - 非挥发性苯基乙醛酸酯 - Google Patents
非挥发性苯基乙醛酸酯 Download PDFInfo
- Publication number
- CN1244190A CN1244190A CN98801985A CN98801985A CN1244190A CN 1244190 A CN1244190 A CN 1244190A CN 98801985 A CN98801985 A CN 98801985A CN 98801985 A CN98801985 A CN 98801985A CN 1244190 A CN1244190 A CN 1244190A
- Authority
- CN
- China
- Prior art keywords
- alkyl
- group
- phenyl
- perhaps
- alkoxyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Paints Or Removers (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Fats And Perfumes (AREA)
Abstract
Description
实施例的光引发剂 | 浓度[%] | 耐擦性[m/min] | 摆测硬度[s] |
1 | 2 | 40 | 167 |
1 | 3 | 50 | 171 |
2 | 2 | 35 | 168 |
2 | 3 | 50 | 165 |
实施例的光引发剂 | 耐擦性[m/min] |
1 | 20 |
2 | 20 |
实施例的光引发剂 | 耐擦性[m/min] | 摆测硬度[s] |
1 | 10 | 144 |
2 | 10 | 144 |
Claims (16)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH195/1997 | 1997-01-30 | ||
CH19597 | 1997-01-30 | ||
CH195/97 | 1997-01-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1244190A true CN1244190A (zh) | 2000-02-09 |
CN1157359C CN1157359C (zh) | 2004-07-14 |
Family
ID=4181427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB98801985XA Expired - Lifetime CN1157359C (zh) | 1997-01-30 | 1998-01-23 | 非挥发性苯基乙醛酸酯 |
Country Status (14)
Country | Link |
---|---|
US (1) | US6048660A (zh) |
EP (1) | EP0956280B1 (zh) |
JP (1) | JP4171073B2 (zh) |
KR (1) | KR100548976B1 (zh) |
CN (1) | CN1157359C (zh) |
AU (1) | AU718619B2 (zh) |
BR (1) | BR9806940B1 (zh) |
CA (1) | CA2275667A1 (zh) |
DE (1) | DE69809029T2 (zh) |
DK (1) | DK0956280T3 (zh) |
ES (1) | ES2184233T3 (zh) |
TW (1) | TW460450B (zh) |
WO (1) | WO1998033761A1 (zh) |
ZA (1) | ZA98724B (zh) |
Cited By (7)
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---|---|---|---|---|
CN1307207C (zh) * | 2002-04-26 | 2007-03-28 | 西巴特殊化学品控股有限公司 | 可引入的光敏引发剂 |
CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
CN101175773B (zh) * | 2005-05-13 | 2010-04-14 | 蓝宝迪有限公司 | 苯基乙醛酸酯经光解产生低迁移性碎片 |
WO2011160262A1 (zh) * | 2010-06-25 | 2011-12-29 | 北京英力科技发展有限公司 | 低挥发性苯甲酰基甲酸酯 |
CN102442909A (zh) * | 2010-06-25 | 2012-05-09 | 北京英力科技发展有限公司 | 低挥发低迁移性苯甲酰基甲酸酯 |
CN101243109B (zh) * | 2005-08-05 | 2013-01-02 | 蓝宝迪有限公司 | 含低提取性和低挥发性共引发剂的可光聚合体系 |
CN103709036A (zh) * | 2013-12-03 | 2014-04-09 | 天津久日化学股份有限公司 | 新型双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂 |
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WO2023205224A2 (en) | 2022-04-21 | 2023-10-26 | Covestro (Netherlands) B.V. | Low-volatility radiation curable compositions for coating optical fibers |
WO2023227683A1 (en) | 2022-05-25 | 2023-11-30 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
WO2024042073A1 (en) | 2022-08-24 | 2024-02-29 | Covestro (Netherlands) B.V. | Process for providing low gloss coatings |
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DE2825955A1 (de) * | 1978-06-14 | 1980-01-03 | Bayer Ag | Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln |
US4475999A (en) * | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
AU569084B2 (en) * | 1983-06-27 | 1988-01-21 | Stauffer Chemical Company | Photopolymerizable composition |
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US5795581A (en) * | 1995-03-31 | 1998-08-18 | Sandia Corporation | Controlled release of molecular components of dendrimer/bioactive complexes |
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1998
- 1998-01-23 EP EP98905335A patent/EP0956280B1/en not_active Expired - Lifetime
- 1998-01-23 DE DE69809029T patent/DE69809029T2/de not_active Expired - Lifetime
- 1998-01-23 TW TW087100902A patent/TW460450B/zh active
- 1998-01-23 BR BRPI9806940-3A patent/BR9806940B1/pt not_active IP Right Cessation
- 1998-01-23 WO PCT/EP1998/000351 patent/WO1998033761A1/en active IP Right Grant
- 1998-01-23 ES ES98905335T patent/ES2184233T3/es not_active Expired - Lifetime
- 1998-01-23 CA CA002275667A patent/CA2275667A1/en not_active Abandoned
- 1998-01-23 CN CNB98801985XA patent/CN1157359C/zh not_active Expired - Lifetime
- 1998-01-23 AU AU60963/98A patent/AU718619B2/en not_active Ceased
- 1998-01-23 JP JP53250998A patent/JP4171073B2/ja not_active Expired - Lifetime
- 1998-01-23 KR KR1019997006856A patent/KR100548976B1/ko not_active IP Right Cessation
- 1998-01-23 DK DK98905335T patent/DK0956280T3/da active
- 1998-01-28 US US09/014,555 patent/US6048660A/en not_active Expired - Lifetime
- 1998-01-29 ZA ZA98724A patent/ZA98724B/xx unknown
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1307207C (zh) * | 2002-04-26 | 2007-03-28 | 西巴特殊化学品控股有限公司 | 可引入的光敏引发剂 |
CN101175773B (zh) * | 2005-05-13 | 2010-04-14 | 蓝宝迪有限公司 | 苯基乙醛酸酯经光解产生低迁移性碎片 |
CN101243109B (zh) * | 2005-08-05 | 2013-01-02 | 蓝宝迪有限公司 | 含低提取性和低挥发性共引发剂的可光聚合体系 |
CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
WO2011160262A1 (zh) * | 2010-06-25 | 2011-12-29 | 北京英力科技发展有限公司 | 低挥发性苯甲酰基甲酸酯 |
CN102442909A (zh) * | 2010-06-25 | 2012-05-09 | 北京英力科技发展有限公司 | 低挥发低迁移性苯甲酰基甲酸酯 |
CN102442909B (zh) * | 2010-06-25 | 2013-10-30 | 北京英力科技发展有限公司 | 低挥发低迁移性苯甲酰基甲酸酯 |
CN103709036A (zh) * | 2013-12-03 | 2014-04-09 | 天津久日化学股份有限公司 | 新型双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂 |
Also Published As
Publication number | Publication date |
---|---|
AU718619B2 (en) | 2000-04-20 |
ES2184233T3 (es) | 2003-04-01 |
EP0956280A1 (en) | 1999-11-17 |
DE69809029D1 (de) | 2002-12-05 |
ZA98724B (en) | 1998-07-30 |
EP0956280B1 (en) | 2002-10-30 |
TW460450B (en) | 2001-10-21 |
JP2001511137A (ja) | 2001-08-07 |
KR20000070608A (ko) | 2000-11-25 |
CA2275667A1 (en) | 1998-08-06 |
AU6096398A (en) | 1998-08-25 |
WO1998033761A1 (en) | 1998-08-06 |
JP4171073B2 (ja) | 2008-10-22 |
US6048660A (en) | 2000-04-11 |
KR100548976B1 (ko) | 2006-02-03 |
BR9806940A (pt) | 2000-03-28 |
DK0956280T3 (da) | 2003-02-24 |
BR9806940B1 (pt) | 2010-12-14 |
DE69809029T2 (de) | 2003-06-05 |
CN1157359C (zh) | 2004-07-14 |
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