SG152898A1 - Alignment systems and methods for lithographic systems - Google Patents

Alignment systems and methods for lithographic systems

Info

Publication number
SG152898A1
SG152898A1 SG200305606-6A SG2003056066A SG152898A1 SG 152898 A1 SG152898 A1 SG 152898A1 SG 2003056066 A SG2003056066 A SG 2003056066A SG 152898 A1 SG152898 A1 SG 152898A1
Authority
SG
Singapore
Prior art keywords
systems
alignment
methods
lithographic
determining unit
Prior art date
Application number
SG200305606-6A
Other languages
English (en)
Inventor
Bilsen Franciscus Bernardus Maria Van
Jacobus Burghoorn
Haren Richard Johannes Franciscus Van
Paul Christiaan Hinnen
Horssen Hermanus Gerardus Van
Jeroen Huijbregtse
Andre Bernardus Jeunink
Henry Megens
Navarro Y Koren
Hoite Pieter Theodoor Tolsma
Hubertus Johannes Gertrudus Simons
Johny Rutger Schuurhuis
Sicco Ian Schets
Lee Young Bok
Allan Reuben Dunbar
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03076422A external-priority patent/EP1477860A1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG152898A1 publication Critical patent/SG152898A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
SG200305606-6A 2002-09-20 2003-09-19 Alignment systems and methods for lithographic systems SG152898A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US41186102P 2002-09-20 2002-09-20
US41360102P 2002-09-26 2002-09-26
EP03075954 2003-04-01
EP03076422A EP1477860A1 (en) 2003-05-12 2003-05-12 Lithographic marker structure compliant with microelectronic device processing

Publications (1)

Publication Number Publication Date
SG152898A1 true SG152898A1 (en) 2009-06-29

Family

ID=33303964

Family Applications (4)

Application Number Title Priority Date Filing Date
SG200305606-6A SG152898A1 (en) 2002-09-20 2003-09-19 Alignment systems and methods for lithographic systems
SG200305607A SG125922A1 (en) 2002-09-20 2003-09-19 Device inspection
SG200305609A SG125923A1 (en) 2002-09-20 2003-09-19 Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure
SG200305608A SG120949A1 (en) 2002-09-20 2003-09-19 Alignment system and methods for lithographic systems using at least two wavelengths

Family Applications After (3)

Application Number Title Priority Date Filing Date
SG200305607A SG125922A1 (en) 2002-09-20 2003-09-19 Device inspection
SG200305609A SG125923A1 (en) 2002-09-20 2003-09-19 Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure
SG200305608A SG120949A1 (en) 2002-09-20 2003-09-19 Alignment system and methods for lithographic systems using at least two wavelengths

Country Status (6)

Country Link
US (12) US7330261B2 (ja)
JP (10) JP4222926B2 (ja)
KR (5) KR100632889B1 (ja)
CN (4) CN100476599C (ja)
SG (4) SG152898A1 (ja)
TW (4) TWI227814B (ja)

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TW200415449A (en) 2004-08-16
KR100543536B1 (ko) 2006-01-20
JP2008211247A (ja) 2008-09-11
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US20110128520A1 (en) 2011-06-02
CN1506768B (zh) 2011-01-26
JP5508448B2 (ja) 2014-05-28
US20080180668A1 (en) 2008-07-31
US7332732B2 (en) 2008-02-19
US20040114143A1 (en) 2004-06-17
KR100597041B1 (ko) 2006-07-04
JP4362347B2 (ja) 2009-11-11
SG120949A1 (en) 2006-04-26
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JP2004282017A (ja) 2004-10-07
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US20050189502A1 (en) 2005-09-01
CN1495540A (zh) 2004-05-12
US7330261B2 (en) 2008-02-12
KR20040025867A (ko) 2004-03-26
US20060091330A1 (en) 2006-05-04
KR100552455B1 (ko) 2006-02-20
TW200416500A (en) 2004-09-01
CN1534271A (zh) 2004-10-06
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US20060081791A1 (en) 2006-04-20

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