JP5915521B2 - 搬送装置、搬送方法、露光装置、及びデバイス製造方法 - Google Patents

搬送装置、搬送方法、露光装置、及びデバイス製造方法 Download PDF

Info

Publication number
JP5915521B2
JP5915521B2 JP2012500640A JP2012500640A JP5915521B2 JP 5915521 B2 JP5915521 B2 JP 5915521B2 JP 2012500640 A JP2012500640 A JP 2012500640A JP 2012500640 A JP2012500640 A JP 2012500640A JP 5915521 B2 JP5915521 B2 JP 5915521B2
Authority
JP
Japan
Prior art keywords
substrate
plate holder
carry
unit
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012500640A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2011102410A1 (ja
Inventor
麻子 金城
麻子 金城
牛島 康之
康之 牛島
哲嗣 花崎
哲嗣 花崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=44482996&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP5915521(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2011102410A1 publication Critical patent/JPWO2011102410A1/ja
Application granted granted Critical
Publication of JP5915521B2 publication Critical patent/JP5915521B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • B65G49/064Transporting devices for sheet glass in a horizontal position
    • B65G49/065Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G51/00Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
    • B65G51/02Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
    • B65G51/03Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups
    • B65G2249/045Details of suction cups suction cups
JP2012500640A 2010-02-17 2011-02-17 搬送装置、搬送方法、露光装置、及びデバイス製造方法 Active JP5915521B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US30535510P 2010-02-17 2010-02-17
US30543910P 2010-02-17 2010-02-17
US61/305,439 2010-02-17
US61/305,355 2010-02-17
PCT/JP2011/053356 WO2011102410A1 (ja) 2010-02-17 2011-02-17 搬送装置、搬送方法、露光装置、及びデバイス製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2014201948A Division JP2015008334A (ja) 2010-02-17 2014-09-30 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2016077555A Division JP6191721B2 (ja) 2010-02-17 2016-04-07 搬送装置、搬送方法、露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JPWO2011102410A1 JPWO2011102410A1 (ja) 2013-06-17
JP5915521B2 true JP5915521B2 (ja) 2016-05-11

Family

ID=44482996

Family Applications (6)

Application Number Title Priority Date Filing Date
JP2012500640A Active JP5915521B2 (ja) 2010-02-17 2011-02-17 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2014201948A Pending JP2015008334A (ja) 2010-02-17 2014-09-30 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2016077555A Active JP6191721B2 (ja) 2010-02-17 2016-04-07 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2016240766A Pending JP2017059852A (ja) 2010-02-17 2016-12-12 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法
JP2017155480A Active JP6512248B2 (ja) 2010-02-17 2017-08-10 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2019075822A Active JP6780732B2 (ja) 2010-02-17 2019-04-11 搬送装置、露光装置、及びデバイス製造方法

Family Applications After (5)

Application Number Title Priority Date Filing Date
JP2014201948A Pending JP2015008334A (ja) 2010-02-17 2014-09-30 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2016077555A Active JP6191721B2 (ja) 2010-02-17 2016-04-07 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2016240766A Pending JP2017059852A (ja) 2010-02-17 2016-12-12 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法
JP2017155480A Active JP6512248B2 (ja) 2010-02-17 2017-08-10 搬送装置、搬送方法、露光装置、及びデバイス製造方法
JP2019075822A Active JP6780732B2 (ja) 2010-02-17 2019-04-11 搬送装置、露光装置、及びデバイス製造方法

Country Status (5)

Country Link
JP (6) JP5915521B2 (ko)
KR (3) KR102172551B1 (ko)
CN (3) CN106876311B (ko)
TW (4) TWI777060B (ko)
WO (1) WO2011102410A1 (ko)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8699001B2 (en) * 2009-08-20 2014-04-15 Nikon Corporation Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
JPWO2013031222A1 (ja) * 2011-08-30 2015-03-23 株式会社ニコン 物体搬送装置、物体処理装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体の搬送方法、及び物体交換方法
US9360772B2 (en) * 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
WO2014024483A1 (ja) * 2012-08-08 2014-02-13 株式会社ニコン 物体交換方法、物体交換システム、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
EP4009356A1 (en) * 2012-11-30 2022-06-08 Nikon Corporation Carrier system, exposure apparatus, carrier method, exposure method, device manufacturing method, and suction device
JP6095394B2 (ja) * 2013-02-13 2017-03-15 東レエンジニアリング株式会社 基板処理システム及び基板処理方法
JP6142217B2 (ja) * 2013-02-25 2017-06-07 株式会社ブイ・テクノロジー 露光用基板搬送装置
JP6079529B2 (ja) * 2013-09-18 2017-02-15 三星ダイヤモンド工業株式会社 支持機構および搬送装置
CN103824792A (zh) * 2014-02-28 2014-05-28 上海和辉光电有限公司 一种储藏柜及控制方法
TWI710440B (zh) 2014-11-10 2020-11-21 美商布魯克斯自動機械公司 工具自動教導方法及設備
US10752449B2 (en) * 2015-03-30 2020-08-25 Nikon Corporation Object carrier device, exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, object carrying method, and exposure method
TWI699582B (zh) * 2015-07-01 2020-07-21 日商信越工程股份有限公司 貼合器件的製造裝置及製造方法
WO2017057465A1 (ja) * 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法
US9776809B1 (en) * 2016-03-31 2017-10-03 Core Flow Ltd. Conveying system with vacuum wheel
JP6773435B2 (ja) 2016-03-31 2020-10-21 株式会社オーク製作所 露光装置
JP6320448B2 (ja) * 2016-04-28 2018-05-09 Towa株式会社 樹脂封止装置および樹脂封止方法
CN105824200B (zh) * 2016-05-31 2017-08-29 京东方科技集团股份有限公司 一种基板支撑结构及曝光机
JP6874314B2 (ja) * 2016-09-30 2021-05-19 株式会社ニコン 物体保持装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
JP6905830B2 (ja) * 2017-01-11 2021-07-21 株式会社Screenホールディングス 基板処理装置および基板処理方法
CN108502543B (zh) * 2017-02-28 2020-01-24 上海微电子装备(集团)股份有限公司 一种基板传输装置及方法
CN111149059B (zh) * 2017-09-29 2022-08-26 株式会社尼康 基板搬运、曝光装置、方法、平板显示器及元件制造方法
KR102458992B1 (ko) * 2017-09-29 2022-10-25 가부시키가이샤 니콘 기판 반송 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 기판 반송 방법, 및 노광 방법
WO2019064585A1 (ja) * 2017-09-29 2019-04-04 株式会社ニコン 基板搬送装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、基板搬送方法、及び露光方法
CN111164513B (zh) * 2017-09-29 2022-08-16 株式会社尼康 基板搬运、曝光装置、方法、平板显示器及元件制造方法
KR102089350B1 (ko) * 2018-04-24 2020-03-16 세메스 주식회사 기판 이송 장치 및 이를 포함하는 기판 처리 장치
KR102054714B1 (ko) * 2018-05-09 2019-12-12 주식회사 글로벌시스템즈 트레이순환형 비접촉 정밀 처리 시스템
WO2019223872A1 (en) * 2018-05-24 2019-11-28 Applied Materials, Inc. Magnetic levitation system for transporting a carrier, carrier for a magnetic levitation system, processing system for vertically processing a substrate, and method of transporting a carrier
CN111352305A (zh) * 2018-12-20 2020-06-30 上海微电子装备(集团)股份有限公司 一种基板交接装置及基板交接方法
TWI798367B (zh) * 2019-02-26 2023-04-11 日商東麗工程股份有限公司 塗布裝置
JP7196734B2 (ja) * 2019-03-29 2022-12-27 株式会社ニコン 基板搬送装置、露光装置、フラットパネルディスプレイ製造方法、デバイス製造方法、及び露光方法
KR102182632B1 (ko) * 2019-06-10 2020-11-24 주식회사 크레셈 반도체 기판 검사장치
CN110498233B (zh) * 2019-07-26 2021-04-27 江苏科技大学 二维无接触输送平台装置
JP7390142B2 (ja) * 2019-09-20 2023-12-01 株式会社Screenホールディングス 基板処理装置および基板搬送方法
JP6898488B1 (ja) * 2020-03-18 2021-07-07 日東電工株式会社 光学積層体の搬送装置及び搬送方法
CN112124958A (zh) * 2020-09-02 2020-12-25 合肥芯碁微电子装备股份有限公司 吸盘装置和具有其的激光成像设备
WO2022224366A1 (ja) * 2021-04-21 2022-10-27 エア・ウォーター・マッハ株式会社 弾性シート搬送装置および弾性シート打抜きシステム
JP7085682B1 (ja) * 2021-04-21 2022-06-16 エア・ウォーター・マッハ株式会社 弾性シート搬送装置
GB202215215D0 (en) * 2022-10-14 2022-11-30 Lam Res Ag Device for conveying a wafer-shaped article

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004331319A (ja) * 2003-05-07 2004-11-25 Olympus Corp 浮上搬送装置
JP2005026446A (ja) * 2003-07-02 2005-01-27 Nikon Corp 基板搬送装置、露光装置、基板計測装置及び基板搬送方法
JP2006210393A (ja) * 2005-01-25 2006-08-10 Dainippon Printing Co Ltd 基板加工装置、基板搬送装置、基板制御方法
JP2006324510A (ja) * 2005-05-19 2006-11-30 Shinko Electric Co Ltd 気体浮上搬送装置
JP2008074576A (ja) * 2006-09-22 2008-04-03 Olympus Corp 基板搬送システム
JP2008166359A (ja) * 2006-12-27 2008-07-17 Tokyo Electron Ltd 基板処理装置
JP2009026783A (ja) * 2007-07-17 2009-02-05 Ihi Corp 薄板移送装置、薄板処理移送システム、及び薄板移送方法
JP2009094184A (ja) * 2007-10-05 2009-04-30 Toray Ind Inc 基板処理装置および処理方法
JP2009231846A (ja) * 2004-12-30 2009-10-08 Asml Netherlands Bv 基板ハンドラ
JP2010021396A (ja) * 2008-07-11 2010-01-28 Tokyo Electron Ltd 基板処理装置

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US100169A (en) 1870-02-22 Harris harding margeson
US3731823A (en) * 1971-06-01 1973-05-08 Ibm Wafer transport system
EP0529125B1 (en) * 1991-08-27 1996-07-31 International Business Machines Corporation Method and apparatus for generating high resolution optical images
JP2969034B2 (ja) * 1993-06-18 1999-11-02 東京エレクトロン株式会社 搬送方法および搬送装置
JPH09270383A (ja) * 1996-03-29 1997-10-14 Nikon Corp 基板搬送装置及び基板搬送方法
JPH10169A (ja) 1996-06-14 1998-01-06 Matsushita Electric Works Ltd 浴槽装置
JP3070006B2 (ja) * 1997-02-07 2000-07-24 株式会社オーク製作所 薄板状ワークの搬送方法
JPH10275850A (ja) * 1997-03-28 1998-10-13 Nikon Corp 露光装置
TW396490B (en) * 1997-11-14 2000-07-01 Dainippon Screen Mfg Wafer processor
JPH11288995A (ja) * 1998-04-04 1999-10-19 Tokyo Electron Ltd 搬送システム及び処理装置
KR100825691B1 (ko) * 1999-07-26 2008-04-29 가부시키가이샤 니콘 기판지지장치 및 기판처리장치
JP4249869B2 (ja) * 1999-12-22 2009-04-08 株式会社オーク製作所 基板搬送装置
JP2001343753A (ja) * 2000-05-31 2001-12-14 Orc Mfg Co Ltd 基板搬送機構および露光装置
JP2002368065A (ja) * 2001-06-08 2002-12-20 Hiroshi Akashi 位置合わせ装置
JP2004083180A (ja) * 2002-08-26 2004-03-18 Sharp Corp シート状基板の搬送装置及び搬送方法
JP4305918B2 (ja) * 2004-01-30 2009-07-29 東京エレクトロン株式会社 浮上式基板搬送処理装置
JP4626205B2 (ja) * 2004-07-28 2011-02-02 シンフォニアテクノロジー株式会社 基板の受渡し方法、及びその装置
JP2006176255A (ja) * 2004-12-21 2006-07-06 Murata Mach Ltd 搬送システム
JP4356936B2 (ja) * 2005-01-21 2009-11-04 東京エレクトロン株式会社 塗布、現像装置及びその方法
JP4378301B2 (ja) * 2005-02-28 2009-12-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法及び基板処理プログラム
JP4571525B2 (ja) * 2005-03-10 2010-10-27 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US7576835B2 (en) * 2005-07-06 2009-08-18 Asml Netherlands B.V. Substrate handler, lithographic apparatus and device manufacturing method
JP2007150280A (ja) * 2005-11-04 2007-06-14 Dainippon Printing Co Ltd 基板支持装置、基板支持方法、基板加工装置、基板加工方法、表示装置構成部材の製造方法
JP4745040B2 (ja) * 2005-12-05 2011-08-10 東京エレクトロン株式会社 基板搬送装置及び基板処理装置
JP4801523B2 (ja) * 2006-07-21 2011-10-26 本田技研工業株式会社 板材の把持装置
JP4318714B2 (ja) * 2006-11-28 2009-08-26 東京エレクトロン株式会社 塗布装置
WO2008120785A1 (ja) * 2007-04-03 2008-10-09 Nsk Ltd. 露光装置及び露光方法
JP2008300723A (ja) * 2007-06-01 2008-12-11 Nec Electronics Corp 処理装置
JP2009016388A (ja) * 2007-06-29 2009-01-22 Canon Inc 原版搬送装置、露光装置およびデバイス製造方法
CN101743632B (zh) * 2007-07-17 2012-02-15 株式会社Ihi 薄板输送装置、薄板处理输送系统及薄板输送方法
JP4798799B2 (ja) * 2007-08-20 2011-10-19 Necエンジニアリング株式会社 版給排装置及びそれを用いた刷版作成装置
JP4495752B2 (ja) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 基板処理装置及び塗布装置
JP2009168860A (ja) * 2008-01-10 2009-07-30 Olympus Corp 基板用ステージ装置
JP2009295950A (ja) * 2008-05-09 2009-12-17 Nsk Ltd スキャン露光装置およびスキャン露光方法
JP5167999B2 (ja) * 2008-07-16 2013-03-21 株式会社Ihi 基板移送システム及び基板移送方法
JP4898749B2 (ja) * 2008-08-04 2012-03-21 大林精工株式会社 走査露光装置および横電界方式液晶表示装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004331319A (ja) * 2003-05-07 2004-11-25 Olympus Corp 浮上搬送装置
JP2005026446A (ja) * 2003-07-02 2005-01-27 Nikon Corp 基板搬送装置、露光装置、基板計測装置及び基板搬送方法
JP2009231846A (ja) * 2004-12-30 2009-10-08 Asml Netherlands Bv 基板ハンドラ
JP2006210393A (ja) * 2005-01-25 2006-08-10 Dainippon Printing Co Ltd 基板加工装置、基板搬送装置、基板制御方法
JP2006324510A (ja) * 2005-05-19 2006-11-30 Shinko Electric Co Ltd 気体浮上搬送装置
JP2008074576A (ja) * 2006-09-22 2008-04-03 Olympus Corp 基板搬送システム
JP2008166359A (ja) * 2006-12-27 2008-07-17 Tokyo Electron Ltd 基板処理装置
JP2009026783A (ja) * 2007-07-17 2009-02-05 Ihi Corp 薄板移送装置、薄板処理移送システム、及び薄板移送方法
JP2009094184A (ja) * 2007-10-05 2009-04-30 Toray Ind Inc 基板処理装置および処理方法
JP2010021396A (ja) * 2008-07-11 2010-01-28 Tokyo Electron Ltd 基板処理装置

Also Published As

Publication number Publication date
JPWO2011102410A1 (ja) 2013-06-17
CN106876311A (zh) 2017-06-20
KR20190108202A (ko) 2019-09-23
JP2015008334A (ja) 2015-01-15
TW201838076A (zh) 2018-10-16
CN107017191B (zh) 2020-08-14
TWI661505B (zh) 2019-06-01
CN107017191A (zh) 2017-08-04
TW201142977A (en) 2011-12-01
TW201933520A (zh) 2019-08-16
TWI587430B (zh) 2017-06-11
KR20180088493A (ko) 2018-08-03
CN102763209B (zh) 2017-02-08
JP2016157133A (ja) 2016-09-01
WO2011102410A1 (ja) 2011-08-25
TW201731009A (zh) 2017-09-01
JP2017207779A (ja) 2017-11-24
KR20130006612A (ko) 2013-01-17
JP6191721B2 (ja) 2017-09-06
CN102763209A (zh) 2012-10-31
KR102023655B1 (ko) 2019-09-23
TWI777060B (zh) 2022-09-11
KR101883319B1 (ko) 2018-07-31
TWI631649B (zh) 2018-08-01
CN106876311B (zh) 2021-01-05
JP6780732B2 (ja) 2020-11-04
JP2017059852A (ja) 2017-03-23
JP2019124962A (ja) 2019-07-25
KR102172551B1 (ko) 2020-11-02
JP6512248B2 (ja) 2019-05-15

Similar Documents

Publication Publication Date Title
JP6191721B2 (ja) 搬送装置、搬送方法、露光装置、及びデバイス製造方法
TWI740113B (zh) 物體更換裝置、物體更換方法、曝光裝置、曝光方法以及元件製造方法
CN113238461B (zh) 曝光装置、平板显示器的制造方法、元件制造方法、及曝光方法
JP6245308B2 (ja) 基板搬送方法、デバイス製造方法、基板搬送装置および露光装置
CN110114725B (zh) 搬运装置、曝光装置、平板显示器的制造方法、以及元件制造方法
JP5469852B2 (ja) 搬送装置、搬送方法、露光装置、露光方法、及びデバイス製造方法
JP5471088B2 (ja) 基板保持部材、基板搬送装置、基板搬送方法、ステージ装置、露光装置及びデバイス製造方法
JP2011113086A (ja) 受け渡し機構、ステージ装置、搬送装置、露光装置、及びデバイス製造方法
JP2010267807A (ja) 基板保持装置、ステージ装置、露光装置、及びデバイス製造方法
JP2011086764A (ja) 基板支持部材、搬送装置、露光装置、及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140206

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140206

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141209

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150209

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150901

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151102

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160308

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160321

R150 Certificate of patent or registration of utility model

Ref document number: 5915521

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250