JP5915521B2 - 搬送装置、搬送方法、露光装置、及びデバイス製造方法 - Google Patents
搬送装置、搬送方法、露光装置、及びデバイス製造方法 Download PDFInfo
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- JP5915521B2 JP5915521B2 JP2012500640A JP2012500640A JP5915521B2 JP 5915521 B2 JP5915521 B2 JP 5915521B2 JP 2012500640 A JP2012500640 A JP 2012500640A JP 2012500640 A JP2012500640 A JP 2012500640A JP 5915521 B2 JP5915521 B2 JP 5915521B2
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- 238000000034 method Methods 0.000 title claims description 61
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000758 substrate Substances 0.000 claims description 878
- 230000007246 mechanism Effects 0.000 claims description 126
- 238000012546 transfer Methods 0.000 claims description 71
- 230000033001 locomotion Effects 0.000 claims description 50
- 230000008569 process Effects 0.000 claims description 44
- 238000001514 detection method Methods 0.000 claims description 36
- 238000012545 processing Methods 0.000 claims description 32
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- 238000005286 illumination Methods 0.000 claims description 8
- 230000007723 transport mechanism Effects 0.000 claims description 3
- 238000005339 levitation Methods 0.000 claims 2
- 230000008520 organization Effects 0.000 claims 1
- 238000002347 injection Methods 0.000 description 89
- 239000007924 injection Substances 0.000 description 89
- 230000032258 transport Effects 0.000 description 19
- 238000007667 floating Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 13
- 238000006073 displacement reaction Methods 0.000 description 10
- 230000002093 peripheral effect Effects 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
- B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
- B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
- B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
- B65G2249/045—Details of suction cups suction cups
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30535510P | 2010-02-17 | 2010-02-17 | |
US30543910P | 2010-02-17 | 2010-02-17 | |
US61/305,439 | 2010-02-17 | ||
US61/305,355 | 2010-02-17 | ||
PCT/JP2011/053356 WO2011102410A1 (ja) | 2010-02-17 | 2011-02-17 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014201948A Division JP2015008334A (ja) | 2010-02-17 | 2014-09-30 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2016077555A Division JP6191721B2 (ja) | 2010-02-17 | 2016-04-07 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011102410A1 JPWO2011102410A1 (ja) | 2013-06-17 |
JP5915521B2 true JP5915521B2 (ja) | 2016-05-11 |
Family
ID=44482996
Family Applications (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012500640A Active JP5915521B2 (ja) | 2010-02-17 | 2011-02-17 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2014201948A Pending JP2015008334A (ja) | 2010-02-17 | 2014-09-30 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2016077555A Active JP6191721B2 (ja) | 2010-02-17 | 2016-04-07 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2016240766A Pending JP2017059852A (ja) | 2010-02-17 | 2016-12-12 | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
JP2017155480A Active JP6512248B2 (ja) | 2010-02-17 | 2017-08-10 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2019075822A Active JP6780732B2 (ja) | 2010-02-17 | 2019-04-11 | 搬送装置、露光装置、及びデバイス製造方法 |
Family Applications After (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014201948A Pending JP2015008334A (ja) | 2010-02-17 | 2014-09-30 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2016077555A Active JP6191721B2 (ja) | 2010-02-17 | 2016-04-07 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2016240766A Pending JP2017059852A (ja) | 2010-02-17 | 2016-12-12 | 露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び露光方法 |
JP2017155480A Active JP6512248B2 (ja) | 2010-02-17 | 2017-08-10 | 搬送装置、搬送方法、露光装置、及びデバイス製造方法 |
JP2019075822A Active JP6780732B2 (ja) | 2010-02-17 | 2019-04-11 | 搬送装置、露光装置、及びデバイス製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (6) | JP5915521B2 (ko) |
KR (3) | KR102172551B1 (ko) |
CN (3) | CN106876311B (ko) |
TW (4) | TWI777060B (ko) |
WO (1) | WO2011102410A1 (ko) |
Families Citing this family (38)
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US8699001B2 (en) * | 2009-08-20 | 2014-04-15 | Nikon Corporation | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
JPWO2013031222A1 (ja) * | 2011-08-30 | 2015-03-23 | 株式会社ニコン | 物体搬送装置、物体処理装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、物体の搬送方法、及び物体交換方法 |
US9360772B2 (en) * | 2011-12-29 | 2016-06-07 | Nikon Corporation | Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method |
WO2014024483A1 (ja) * | 2012-08-08 | 2014-02-13 | 株式会社ニコン | 物体交換方法、物体交換システム、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
EP4009356A1 (en) * | 2012-11-30 | 2022-06-08 | Nikon Corporation | Carrier system, exposure apparatus, carrier method, exposure method, device manufacturing method, and suction device |
JP6095394B2 (ja) * | 2013-02-13 | 2017-03-15 | 東レエンジニアリング株式会社 | 基板処理システム及び基板処理方法 |
JP6142217B2 (ja) * | 2013-02-25 | 2017-06-07 | 株式会社ブイ・テクノロジー | 露光用基板搬送装置 |
JP6079529B2 (ja) * | 2013-09-18 | 2017-02-15 | 三星ダイヤモンド工業株式会社 | 支持機構および搬送装置 |
CN103824792A (zh) * | 2014-02-28 | 2014-05-28 | 上海和辉光电有限公司 | 一种储藏柜及控制方法 |
TWI710440B (zh) | 2014-11-10 | 2020-11-21 | 美商布魯克斯自動機械公司 | 工具自動教導方法及設備 |
US10752449B2 (en) * | 2015-03-30 | 2020-08-25 | Nikon Corporation | Object carrier device, exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, object carrying method, and exposure method |
TWI699582B (zh) * | 2015-07-01 | 2020-07-21 | 日商信越工程股份有限公司 | 貼合器件的製造裝置及製造方法 |
WO2017057465A1 (ja) * | 2015-09-30 | 2017-04-06 | 株式会社ニコン | 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに計測方法 |
US9776809B1 (en) * | 2016-03-31 | 2017-10-03 | Core Flow Ltd. | Conveying system with vacuum wheel |
JP6773435B2 (ja) | 2016-03-31 | 2020-10-21 | 株式会社オーク製作所 | 露光装置 |
JP6320448B2 (ja) * | 2016-04-28 | 2018-05-09 | Towa株式会社 | 樹脂封止装置および樹脂封止方法 |
CN105824200B (zh) * | 2016-05-31 | 2017-08-29 | 京东方科技集团股份有限公司 | 一种基板支撑结构及曝光机 |
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JP6905830B2 (ja) * | 2017-01-11 | 2021-07-21 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
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KR102458992B1 (ko) * | 2017-09-29 | 2022-10-25 | 가부시키가이샤 니콘 | 기판 반송 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 기판 반송 방법, 및 노광 방법 |
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GB202215215D0 (en) * | 2022-10-14 | 2022-11-30 | Lam Res Ag | Device for conveying a wafer-shaped article |
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CN107017191B (zh) | 2020-08-14 |
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CN107017191A (zh) | 2017-08-04 |
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TW201933520A (zh) | 2019-08-16 |
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CN102763209A (zh) | 2012-10-31 |
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