JP2011514652A - チャンバ壁に一体化されたモータを伴う基板処理装置 - Google Patents
チャンバ壁に一体化されたモータを伴う基板処理装置 Download PDFInfo
- Publication number
- JP2011514652A JP2011514652A JP2010517162A JP2010517162A JP2011514652A JP 2011514652 A JP2011514652 A JP 2011514652A JP 2010517162 A JP2010517162 A JP 2010517162A JP 2010517162 A JP2010517162 A JP 2010517162A JP 2011514652 A JP2011514652 A JP 2011514652A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- substrate transfer
- rotors
- stator module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/0084—Programme-controlled manipulators comprising a plurality of manipulators
- B25J9/0087—Dual arms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
Abstract
Description
Claims (31)
- 基板搬送装置であって、
隔離された雰囲気を保持できる基板搬送チャンバを定義する内面を有する周壁と、
少なくとも1つの実質的にリング形状のモータであり、前記周壁の前記内面および隣接する外面の間に前記周壁内に位置する少なくとも1つのステータモジュールを有すると共に、前記リング形状のモータにより包囲された前記周壁の表面が所定の装置の取り付け用に構成されるように前記搬送チャンバ内で実質的な接触のない状態で懸垂される少なくとも1つのロータを有する、リング形状のモータと、
前記少なくとも1つのロータに接続され、少なくとも1枚の基板を保持するよう構成された少なくとも1つのエンドエフェクタを有する、少なくとも1本の基板搬送アームと、
を備えることを特徴とする基板搬送装置。 - 前記少なくとも1つのロータが前記搬送チャンバ内に実質的な接触のない状態で磁気的に懸垂されることを特徴とする請求項1に記載の基板搬送装置。
- 前記所定の装置は、前記搬送チャンバ内の真空を制御するよう構成された流体流動装置であることを特徴とする請求項1に記載の基板搬送装置。
- 前記実質的にリング形状のモータは、前記流体流動装置を包囲することを特徴とする請求項3に記載の基板搬送装置。
- 前記少なくとも1つのステータモジュールは、前記周壁の側面または底面内に位置することを特徴とする請求項1に記載の基板搬送装置。
- 前記流体流動装置は、真空システムを備えることを特徴とする請求項1に記載の基板搬送装置。
- 前記少なくとも1本の基板搬送アームは、実質的に反対方向に伸展可能な2本の搬送アームを備えることを特徴とする請求項1に記載の基板搬送装置。
- 前記少なくとも1本の基板搬送アームは、実質的に同一方向に伸展可能な2本の搬送アームを備えることを特徴とする請求項1に記載の基板搬送装置。
- 前記少なくとも1本の基板移送アームは、それぞれが前記少なくとも1つのロータの各1つの回転中心に対し回転自在である、個別に回転自在の2本の搬送アームを備えることを特徴とする請求項1に記載の基板搬送装置。
- 前記少なくとも1つのステータモジュールは、前記周壁に対し取り外し可能に結合されることを特徴とする請求項1に記載の基板搬送装置。
- 前記少なくとも1つのステータモジュール内に位置する少なくとも1つのセンサと、前記少なくとも1つのロータ上に位置するセンサトラックと、を備えた位置フィードバックシステムをさらに備えることを特徴とする請求項1に記載の基板搬送装置。
- 基板搬送装置であって、
チャンバを形成するフレームと、
少なくとも部分的に前記チャンバの周壁内に埋め込まれた複数のステータモジュールセットであり、前記複数のステータモジュールセットのそれぞれが前記複数のステータモジュールセット内の他の異なるステータモジュールセットから半径方向に離れている場合に、それぞれが各モータの一部を形成する、ステータモジュールセットと、
それぞれが実質的な接触のない状態で前記ステータモジュールセットの各1つにより支持されている、複数のロータと、
それぞれが基板を支持するよう構成されている、前記複数のロータの各1つに接続された、少なくとも1つのエンドエフェクタと、
を含み、前記ステータモジュールセットのそれぞれおよび各ロータは、前記少なくとも1つのエンドエフェクタの各1つの伸展および退避をもたらすよう構成されることを特徴とする基板搬送装置。 - 前記複数のステータモジュールセットのそれぞれおよび前記複数のロータの各1つは、実質的にリング形状のモータを形成することを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のステータモジュールセットは、少なくとも部分的に前記チャンバの側壁に埋め込まれていることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のステータモジュールセットは、少なくとも部分的に前記チャンバの底壁に埋め込まれていることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のステータモジュールセットのそれぞれは、少なくとも1つの巻線セットと、前記少なくとも1つの巻線セットを前記チャンバの雰囲気から隔離するよう構成されたハウジングと、を備えることを特徴とする請求項12に記載の基板搬送装置。
- 前記少なくとも1つの巻線セットのそれぞれは、前記少なくとも1つの巻線セットの他の異なるものと周方向に間隔をあけて配置されていることを特徴とする請求項16に記載の基板搬送装置。
- 一端において前記複数のロータの各1つが回転自在に接続され、反対側の端部において前記少なくとも1つのエンドエフェクタに回転自在に結合された少なくとも1つのアームリンクをさらに備えることを特徴とする請求項12に記載の基板搬送装置。
- 前記少なくとも1つのアームリンクは、連結橋を備えることを特徴とする請求項18に記載の基板搬送装置。
- 前記複数のロータは、一般的な積層構成を有する少なくとも2つのロータを備え、前記少なくとも1つのエンドエフェクタは、前記少なくとも2つのロータ間の空間を突き抜けて通過するよう構成されることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のロータは、一般的な積層構成を有する少なくとも2つのロータを備え、前記少なくとも1つのエンドエフェクタは、前記少なくとも2つのロータの上または下を通過するよう構成されることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のロータは、同心円状に配置された少なくとも2つのロータを備えることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のロータおよび前記複数のステータモジュールセットは、前記フレームおよびチャンバの底面が妨げられないように構成されることを特徴とする請求項12に記載の基板搬送装置。
- 前記複数のステータモジュールセット内に位置する少なくとも1つのセンサと、前記複数のロータ上に位置する少なくとも1つのセンサトラックと、を備えた位置フィードバックシステムをさらに備えることを特徴とする請求項12に記載の基板搬送装置。
- 基板処理装置であって、
所定の雰囲気を保持できる少なくとも1つの隔離可能なチャンバを有するフレームと、 少なくとも1枚の基板を搬送するよう構成されている、前記少なくとも1つの隔離可能なチャンバ内に少なくとも部分的に位置する基板搬送装置と、
を含み、前記基板搬送装置は、
前記少なくとも1つの隔離可能なチャンバの周壁内に取り外し可能に埋め込まれた、少なくとも2つのネスト化されたステータモジュールと、
それぞれが、少なくとも2つのネスト化されたモータを形成する前記少なくとも1つのステータのそれぞれにより、前記少なくとも2つのネスト化されたモータの1つが、前記少なくとも2つのネスト化されたモータの他の1つの別のものにより包囲されるよう、実質的な接触のない状態で支持されている、前記少なくとも1つの隔離可能なチャンバ内に位置する少なくとも2つのロータと、
基板を保持するための少なくとも1つのエンドエフェクタを有する、前記少なくとも2つのロータに結合された、少なくとも1本の搬送アームと、
を含み、前記少なくとも2つのネスト化されたモータは、前記少なくとも1本の搬送アームに少なくとも2自由度の動きをもたらすことを特徴とする基板処理装置。 - 前記少なくとも1つの隔離可能なチャンバの妨げのない底面を介して、前記少なくとも1つの隔離可能なチャンバに結合された、真空/通気システムをさらに備えることを特徴とする請求項25に記載の基板処理装置。
- 前記少なくとも2つのネスト化されたステータモジュールは、トルクを適用するよう構成され、セルフベアリングは、各ロータに前記少なくとも1本の搬送アームの動きを生じさせることを特徴とする請求項25に記載の基板処理装置。
- 前記少なくとも1つの隔離可能なチャンバは、前記少なくとも1つのステータモジュールを前記周壁内に挿入するために、前記少なくとも1つの隔離可能なチャンバの少なくとも1つの側面上に少なくとも1つの開口部を備えることを特徴とする請求項25に記載の基板処理装置。
- 前記少なくとも1つの隔離可能なチャンバは、直列構成で配置された少なくとも2つの隔離可能なチャンバを備えることを特徴とする請求項25に記載の基板処理装置。
- 前記少なくとも2つの隔離可能なチャンバの1つは、対称的な基板搬送装置を含み、前記少なくとも2つの隔離可能なチャンバの他の1つは、左右相称の基板搬送装置を含むことを特徴とする請求項29に記載の基板処理装置。
- 基板搬送装置であって、
基板搬送チャンバを形成するフレームと、
前記基板搬送チャンバの周壁上に周方向に分配された、各ステータモジュールを前記周壁に独立させて取り付け可能なステータモジュールセットを備え、前記ステータモジュールのそれぞれと共に動作する少なくとも1つの共通リングロータをさらに備えた、少なくとも1つのモータと、
それぞれが基板を支持するよう構成されている、前記少なくとも1つの共通リングロータに接続された、少なくとも1つのエンドエフェクタと、
を含み、前記ステータモジュールセットおよび前記少なくとも1つの共通リングロータは、前記少なくとも1つのエンドエフェクタのモータに少なくとも1自由度の動きをもたらすよう構成されていることを特徴とする基板搬送装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US95033107P | 2007-07-17 | 2007-07-17 | |
PCT/US2008/070346 WO2009012396A2 (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
US12/175,278 US8008884B2 (en) | 2007-07-17 | 2008-07-17 | Substrate processing apparatus with motors integral to chamber walls |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014027707A Division JP6040182B2 (ja) | 2007-07-17 | 2014-02-17 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2011514652A true JP2011514652A (ja) | 2011-05-06 |
Family
ID=40260379
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010517162A Pending JP2011514652A (ja) | 2007-07-17 | 2008-07-17 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
JP2014027707A Active JP6040182B2 (ja) | 2007-07-17 | 2014-02-17 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
JP2016216382A Active JP6466386B2 (ja) | 2007-07-17 | 2016-11-04 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014027707A Active JP6040182B2 (ja) | 2007-07-17 | 2014-02-17 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
JP2016216382A Active JP6466386B2 (ja) | 2007-07-17 | 2016-11-04 | チャンバ壁に一体化されたモータを伴う基板処理装置 |
Country Status (5)
Country | Link |
---|---|
US (3) | US8008884B2 (ja) |
JP (3) | JP2011514652A (ja) |
KR (6) | KR101825595B1 (ja) |
CN (1) | CN101801817B (ja) |
WO (1) | WO2009012396A2 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014078693A (ja) * | 2012-10-11 | 2014-05-01 | Tes Co Ltd | 基板移送装置 |
WO2014077379A1 (ja) * | 2012-11-14 | 2014-05-22 | 東京エレクトロン株式会社 | 基板処理装置及び基板搬送方法 |
JP2014123761A (ja) * | 2007-07-17 | 2014-07-03 | Brooks Automation Inc | チャンバ壁に一体化されたモータを伴う基板処理装置 |
KR20160086393A (ko) * | 2013-11-13 | 2016-07-19 | 브룩스 오토메이션 인코퍼레이티드 | 씰링된 로봇 드라이브 |
US10348172B2 (en) | 2013-11-13 | 2019-07-09 | Brooks Automation, Inc. | Sealed switched reluctance motor |
US10564221B2 (en) | 2013-11-13 | 2020-02-18 | Brooks Automation, Inc. | Method and apparatus for brushless electrical machine control |
US10742092B2 (en) | 2013-11-13 | 2020-08-11 | Brooks Automation, Inc. | Position feedback for sealed environments |
JP2022539695A (ja) * | 2019-06-27 | 2022-09-13 | アプライド マテリアルズ インコーポレイテッド | プラズマ処理を統合したビームラインアーキテクチャ |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9117870B2 (en) * | 2008-03-27 | 2015-08-25 | Lam Research Corporation | High throughput cleaner chamber |
CH699897A2 (fr) * | 2008-11-10 | 2010-05-14 | Etel Sa | Robot parallèle du type SCARA. |
US8562272B2 (en) | 2010-02-16 | 2013-10-22 | Lam Research Corporation | Substrate load and unload mechanisms for high throughput |
US8282698B2 (en) * | 2010-03-24 | 2012-10-09 | Lam Research Corporation | Reduction of particle contamination produced by moving mechanisms in a process tool |
US8893642B2 (en) | 2010-03-24 | 2014-11-25 | Lam Research Corporation | Airflow management for low particulate count in a process tool |
DE102010031252A1 (de) * | 2010-07-12 | 2012-01-12 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungseinrichtung |
DE102010031245B4 (de) * | 2010-07-12 | 2013-04-11 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage |
CN103476551B (zh) * | 2010-11-10 | 2016-08-10 | 布鲁克斯自动化公司 | 双臂机器人 |
US8610323B2 (en) | 2011-02-04 | 2013-12-17 | Hamilton Sundstrand Corporation | Bearingless machine |
KR102371755B1 (ko) | 2011-09-16 | 2022-03-07 | 퍼시몬 테크놀로지스 코포레이션 | 패시브 회전자를 가진 로봇 구동 |
US10476354B2 (en) | 2011-09-16 | 2019-11-12 | Persimmon Technologies Corp. | Robot drive with isolated optical encoder |
KR102244137B1 (ko) | 2011-10-26 | 2021-04-23 | 브룩스 오토메이션 인코퍼레이티드 | 반도체 웨이퍼 취급 및 이송 |
JP5872744B2 (ja) * | 2012-10-05 | 2016-03-01 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 回転ポジショニング装置 |
US20140234057A1 (en) * | 2013-02-15 | 2014-08-21 | Jacob Newman | Apparatus And Methods For Moving Wafers |
TWI709185B (zh) | 2013-08-26 | 2020-11-01 | 美商布魯克斯自動機械公司 | 基板搬運裝置 |
TWI793401B (zh) * | 2013-11-13 | 2023-02-21 | 美商布魯克斯自動機械美國公司 | 運送設備 |
JP6378595B2 (ja) * | 2014-09-19 | 2018-08-22 | 東京エレクトロン株式会社 | 基板搬送装置 |
US10141827B2 (en) * | 2015-04-03 | 2018-11-27 | Benjamin Ishak | Electromagnetic toroidal motor |
KR20230113410A (ko) * | 2015-07-13 | 2023-07-28 | 브룩스 오토메이션 인코퍼레이티드 | 기판 이송 장치 |
KR102587203B1 (ko) * | 2015-07-13 | 2023-10-10 | 브룩스 오토메이션 인코퍼레이티드 | 온 더 플라이 자동 웨이퍼 센터링 방법 및 장치 |
CN105196539A (zh) * | 2015-08-19 | 2015-12-30 | 深圳市克洛普斯科技有限公司 | 基于选择顺应性装配机械手臂scara的fdm 3d打印机 |
CN105883441A (zh) * | 2016-01-07 | 2016-08-24 | 襄阳忠良工程机械有限责任公司 | 转盘式过渡输送机 |
USD803283S1 (en) * | 2016-05-16 | 2017-11-21 | Veeco Instruments Inc. | Wafer handling assembly |
US11270904B2 (en) | 2016-07-12 | 2022-03-08 | Brooks Automation Us, Llc | Substrate processing apparatus |
US10734912B2 (en) * | 2016-08-24 | 2020-08-04 | Beckhoff Automation Gmbh | Stator device for a linear motor, linear drive system, and method for operating a stator device |
US10186449B2 (en) * | 2016-12-31 | 2019-01-22 | Applied Materials, Inc. | Apparatus and methods for wafer rotation to improve spatial ALD process uniformity |
CN107309442A (zh) * | 2017-07-21 | 2017-11-03 | 中信戴卡股份有限公司 | 一种自动去车轮正面毛刺装置 |
US10453725B2 (en) | 2017-09-19 | 2019-10-22 | Applied Materials, Inc. | Dual-blade robot including vertically offset horizontally overlapping frog-leg linkages and systems and methods including same |
US11574830B2 (en) | 2018-03-16 | 2023-02-07 | Brooks Automation Us, Llc | Substrate transport apparatus |
US11649855B1 (en) | 2022-04-28 | 2023-05-16 | Skf Canada Limited | Contaminant-free work piece processing system |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01153638U (ja) * | 1988-04-04 | 1989-10-23 | ||
JPH024024U (ja) * | 1988-06-20 | 1990-01-11 | ||
JPH10581A (ja) * | 1996-06-07 | 1998-01-06 | Daikin Ind Ltd | ワーク搬送ロボット |
JPH10316241A (ja) * | 1997-05-19 | 1998-12-02 | Yaskawa Electric Corp | ウェハ搬送装置 |
JPH11191581A (ja) * | 1997-12-26 | 1999-07-13 | Komatsu Ltd | ハンドリング用ロボット |
JP2001156150A (ja) * | 1999-11-30 | 2001-06-08 | Anelva Corp | 基板搬送ロボット及び基板搬送方法 |
JP2002026105A (ja) * | 2000-07-05 | 2002-01-25 | Daikin Ind Ltd | 真空搬送モジュール |
JP2003068620A (ja) * | 2001-08-28 | 2003-03-07 | Sendai Nikon:Kk | 露光装置 |
JP2007019216A (ja) * | 2005-07-07 | 2007-01-25 | Rorze Corp | 基板の搬送ロボット |
Family Cites Families (302)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US874998A (en) * | 1906-08-02 | 1907-12-31 | William Schumacher | Reversible sign for automobiles and like purposes. |
US956945A (en) * | 1910-01-15 | 1910-05-03 | William F Cremean | Supporting-saddle for running-boards. |
US2564221A (en) | 1948-01-22 | 1951-08-14 | Bailey Meter Co | Electromagnetic motion responsive device |
US3205485A (en) | 1960-10-21 | 1965-09-07 | Ti Group Services Ltd | Screening vane electro-mechanical transducer |
US3560774A (en) | 1968-12-16 | 1971-02-02 | Raymond R Reeves | Rotary stepping motor with eccentric rotor |
DE2102020A1 (de) | 1971-01-16 | 1972-09-21 | Luc J | Klebeverfahren, Einrichtungen zur Durchfuhrung des Verfahrens und Anwen düngen des Verfahrens |
US3860843A (en) | 1970-06-26 | 1975-01-14 | Matsushita Electric Ind Co Ltd | Rotating electric machine with reduced cogging |
US3697992A (en) | 1970-07-09 | 1972-10-10 | Us Navy | Servo compensation for inertia change |
US3750151A (en) * | 1971-08-25 | 1973-07-31 | H Dill | Three-phase rotating ring display |
DE2603882A1 (de) | 1976-02-02 | 1977-08-04 | Gutehoffnungshuette Sterkrade | Schnellaufendes rotationssystem |
US4210865A (en) | 1977-12-12 | 1980-07-01 | Chaika Leopold I | Position sensor of linearly moving bodies |
DE2847930A1 (de) | 1978-11-04 | 1980-05-14 | Teldix Gmbh | Magnetische lagereinrichtung |
US4547678A (en) | 1980-01-11 | 1985-10-15 | Califone International, Inc. | Hybrid electric vehicle control methods and devices |
US4360753A (en) | 1980-05-08 | 1982-11-23 | Shannon E Paul | Motor having concentric ring rotor |
JPS57135917U (ja) | 1981-02-20 | 1982-08-25 | ||
JPH0646036B2 (ja) | 1982-11-19 | 1994-06-15 | セイコー電子工業株式会社 | 軸流分子ポンプ |
US4659991A (en) | 1983-03-31 | 1987-04-21 | Ndt Technologies, Inc. | Method and apparatus for magnetically inspecting elongated objects for structural defects |
GB2140042B (en) | 1983-05-20 | 1988-06-08 | Rieter Ag Maschf | Open-end yarn piecer |
EP0129731A1 (en) | 1983-06-15 | 1985-01-02 | The Perkin-Elmer Corporation | Wafer handling system |
JPS6056493U (ja) * | 1983-09-27 | 1985-04-19 | 横河電機株式会社 | 直接駆動形ロボット |
US4717874A (en) | 1984-02-10 | 1988-01-05 | Kabushiki Kaisha Sg | Reluctance type linear position detection device |
US4628499A (en) | 1984-06-01 | 1986-12-09 | Scientific-Atlanta, Inc. | Linear servoactuator with integrated transformer position sensor |
JPS61152304A (ja) | 1984-12-26 | 1986-07-11 | Hitachi Ltd | スピンドル装置 |
DE3610479A1 (de) | 1986-03-27 | 1987-10-01 | Vacuumschmelze Gmbh | Magnetischer wegsensor |
US5080549A (en) | 1987-05-11 | 1992-01-14 | Epsilon Technology, Inc. | Wafer handling system with Bernoulli pick-up |
US5003260A (en) | 1987-05-28 | 1991-03-26 | Auchterlonie Richard C | Inductive position sensor having plural phase windings on a support and a displaceable phase sensing element returning a phase indicating signal by electromagnetic induction to eliminate wire connections |
US4874998A (en) | 1987-06-11 | 1989-10-17 | International Business Machines Corporation | Magnetically levitated fine motion robot wrist with programmable compliance |
JPS6423468A (en) | 1987-07-17 | 1989-01-26 | Nippon Denki Home Electronics | Optical head support mechanism |
DE3808331A1 (de) | 1988-03-12 | 1989-09-28 | Kernforschungsanlage Juelich | Magnetische lagerung mit permanentmagneten zur aufnahme der radialen lagerkraefte |
JPH01240268A (ja) | 1988-03-17 | 1989-09-25 | Seiko Seiki Co Ltd | 研削盤のドレス方法 |
JP2852747B2 (ja) | 1988-03-18 | 1999-02-03 | セイコー精機株式会社 | 内面研削盤 |
WO1989012907A1 (en) | 1988-06-17 | 1989-12-28 | Epsilon Technology, Inc. | Wafer handling system with bernoulli pick-up |
US4922197A (en) | 1988-08-01 | 1990-05-01 | Eaton Corporation | High resolution proximity detector employing magnetoresistive sensor disposed within a pressure resistant enclosure |
SE468589B (sv) | 1988-11-10 | 1993-02-15 | Spirac Engineering Ab | Spiraltransportoer |
US5210490A (en) | 1989-01-11 | 1993-05-11 | Nartron Corporation | Linear position sensor having coaxial or parallel primary and secondary windings |
US5124863A (en) | 1989-06-27 | 1992-06-23 | Canon Denshi Kabushiki Kaisha | Disk drive device having reduced thickness |
US5015998A (en) | 1989-08-09 | 1991-05-14 | Kollmorgen Corporation | Null seeking position sensor |
JPH0374164A (ja) | 1989-08-14 | 1991-03-28 | Hitachi Ltd | 電動機 |
DE3931661A1 (de) | 1989-08-25 | 1991-04-04 | Leybold Ag | Magnetgelagerte vakuumpumpe |
NL8902471A (nl) | 1989-10-05 | 1991-05-01 | Philips Nv | Tweetraps positioneerinrichting. |
ES2130295T3 (es) * | 1989-10-20 | 1999-07-01 | Applied Materials Inc | Aparato de tipo robot. |
US4992733A (en) | 1989-11-17 | 1991-02-12 | Visi-Trak Corporation | Position sensing transducer having a circular magnet with an integral flux distorting member and two magnetic field sensors |
US5204621A (en) | 1990-02-08 | 1993-04-20 | Papst-Motoren Gmbh & Co. Kg | Position sensor employing a soft magnetic core |
JPH03276317A (ja) | 1990-03-27 | 1991-12-06 | Toshiba Corp | 磁気軸受の制御装置 |
US5202695A (en) | 1990-09-27 | 1993-04-13 | Sperry Marine Inc. | Orientation stabilization by software simulated stabilized platform |
JPH04209996A (ja) | 1990-11-30 | 1992-07-31 | Daikin Ind Ltd | 高速度回転真空ポンプの磁気軸受 |
US5450009A (en) | 1990-12-28 | 1995-09-12 | Kabushiki Kaisha Komatsu Seisakusho | Magnetic sensor and structure of its mounting |
US5252870A (en) | 1991-03-01 | 1993-10-12 | Jacobsen Stephen C | Magnetic eccentric motion motor |
JPH04308823A (ja) | 1991-04-05 | 1992-10-30 | Ricoh Co Ltd | 手ぶれ補正機能付きカメラ |
US5180276A (en) * | 1991-04-18 | 1993-01-19 | Brooks Automation, Inc. | Articulated arm transfer device |
EP0512516B1 (en) | 1991-05-08 | 1995-12-20 | Koyo Seiko Co., Ltd. | Magnetic drive device |
US5113102A (en) * | 1991-05-09 | 1992-05-12 | Huntington Mechanical Laboratories, Inc. | Rotary motion transmitter and heat treatment method for sealed chamber |
US5314868A (en) | 1991-08-06 | 1994-05-24 | Koyo Seiko Co., Ltd. | Bearing device |
JP3125212B2 (ja) | 1991-08-23 | 2001-01-15 | 武田薬品工業株式会社 | 2−ピペラジノン誘導体およびその用途 |
US5351004A (en) | 1991-10-15 | 1994-09-27 | Eldec Corporation | Saturable core proximity sensor including a flux director and a magnetic target element |
US5285154A (en) | 1991-10-15 | 1994-02-08 | Eldec Corporation | Saturable core proximity sensor aligned perpendicular to a magnet target having a plate and a non-magnetic metal housing |
JP3347766B2 (ja) | 1992-06-08 | 2002-11-20 | 日本トムソン株式会社 | リニアエンコーダ及びこれを具備した案内ユニット |
JP3544208B2 (ja) * | 1992-07-07 | 2004-07-21 | 株式会社荏原製作所 | 磁気浮上搬送装置 |
JPH0674234A (ja) * | 1992-08-24 | 1994-03-15 | Mitsui Eng & Shipbuild Co Ltd | 反発磁気浮上型回転装置 |
FR2696057B1 (fr) | 1992-09-22 | 1997-06-13 | Aerospatiale | Moteur-couple allonge et dispositif de commande en debattement angulaire le comportant. |
FR2695968B1 (fr) | 1992-09-22 | 1994-12-23 | Aerospatiale | Dispositif à palier magnétique et à butée mécanique pour le positionnement d'un corps tournant par rapport à un corps statorique. |
EP1179611B1 (de) | 1992-10-06 | 2004-09-15 | Unaxis Balzers Aktiengesellschaft | Kammer für den Transport von Werkstücken |
JP3178747B2 (ja) | 1992-10-30 | 2001-06-25 | キヤノン株式会社 | 視線検出装置 |
US5469053A (en) | 1992-11-02 | 1995-11-21 | A - Tech Corporation | E/U core linear variable differential transformer for precise displacement measurement |
US5386738A (en) | 1992-12-22 | 1995-02-07 | Honeywell Inc. | Direct torque control moment gyroscope |
US5334892A (en) | 1992-12-22 | 1994-08-02 | Anorad Corporation | Positioning device for planar positioning |
JP3312218B2 (ja) | 1993-01-21 | 2002-08-05 | 光洋精工株式会社 | 磁気軸受装置 |
JP3189464B2 (ja) | 1993-02-19 | 2001-07-16 | 株式会社デンソー | 回転位置検出装置 |
JP3147568B2 (ja) | 1993-03-05 | 2001-03-19 | アイシン精機株式会社 | アクチュエータのショックアブソーバへの固定構造 |
JP3135410B2 (ja) | 1993-04-14 | 2001-02-13 | 光洋精工株式会社 | 磁気軸受装置 |
KR100303018B1 (ko) * | 1993-04-16 | 2001-11-22 | 스탠리 디. 피에코스 | 관절형아암이송장치 |
JPH0712091A (ja) | 1993-09-24 | 1995-01-17 | Ebara Corp | 磁気軸受装置 |
JP2740893B2 (ja) | 1993-11-01 | 1998-04-15 | 日本サーボ株式会社 | 永久磁石式ステッピングモータ |
AT407196B (de) | 1993-11-17 | 2001-01-25 | Amo Automatisierung Messtechni | Positionsmelder für automatisierung |
DE4342539A1 (de) | 1993-12-14 | 1995-06-22 | Skf Textilmasch Komponenten | Schaftloser Spinnrotor einer Offenend-Spinnmaschine |
US5444368A (en) | 1994-01-10 | 1995-08-22 | H. Magnetic Corp. | Differential reactance permanent magnet position transducer |
US5642298A (en) | 1994-02-16 | 1997-06-24 | Ade Corporation | Wafer testing and self-calibration system |
US6989647B1 (en) | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
JP3874430B2 (ja) * | 1994-05-25 | 2007-01-31 | 株式会社荏原製作所 | スクリュー流体機械 |
US5998783A (en) | 1994-06-01 | 1999-12-07 | Stridsberg Innovation Ab | Heat protected position transducer in an electric motor |
JPH081475A (ja) * | 1994-06-22 | 1996-01-09 | Nippon Seiko Kk | ターンテーブル装置 |
US5801721A (en) | 1994-09-09 | 1998-09-01 | Signtech U.S.A. Ltd. | Apparatus for producing an image on a first side of a substrate and a mirror image on a second side of the substrate |
US5589769A (en) | 1994-09-30 | 1996-12-31 | Honeywell Inc. | Position detection apparatus including a circuit for receiving a plurality of output signal values and fitting the output signal values to a curve |
US5808437A (en) | 1994-12-02 | 1998-09-15 | Sulzer Electronics Ag | Method for compensation of periodic shaking forces in an electrical rotating field machine |
US5753991A (en) | 1994-12-02 | 1998-05-19 | Hydro-Quebec | Multiphase brushless AC electric machine |
US5568048A (en) | 1994-12-14 | 1996-10-22 | General Motors Corporation | Three sensor rotational position and displacement detection apparatus with common mode noise rejection |
US6246233B1 (en) | 1994-12-30 | 2001-06-12 | Northstar Technologies Inc. | Magnetoresistive sensor with reduced output signal jitter and temperature compensation |
JP4076581B2 (ja) | 1995-04-03 | 2008-04-16 | レビトロニクス エルエルシー | 電磁式回転駆動装置を有する回転機器 |
JPH08323505A (ja) | 1995-06-01 | 1996-12-10 | Koyo Seiko Co Ltd | 工作機械 |
US5741113A (en) * | 1995-07-10 | 1998-04-21 | Kensington Laboratories, Inc. | Continuously rotatable multiple link robot arm mechanism |
DE19529038A1 (de) | 1995-08-08 | 1997-02-13 | Pfeiffer Vacuum Gmbh | Magnetlager für einen Rotor |
US5924975A (en) | 1995-08-30 | 1999-07-20 | International Business Machines Corporation | Linear pump |
GB2305022B (en) | 1995-09-05 | 2000-04-26 | Switched Reluctance Drives Ltd | Starting a single-phase reluctance motor |
US5818137A (en) | 1995-10-26 | 1998-10-06 | Satcon Technology, Inc. | Integrated magnetic levitation and rotation system |
US6299404B1 (en) * | 1995-10-27 | 2001-10-09 | Brooks Automation Inc. | Substrate transport apparatus with double substrate holders |
US5647724A (en) * | 1995-10-27 | 1997-07-15 | Brooks Automation Inc. | Substrate transport apparatus with dual substrate holders |
US5830272A (en) | 1995-11-07 | 1998-11-03 | Sputtered Films, Inc. | System for and method of providing a controlled deposition on wafers |
US5670876A (en) | 1995-11-14 | 1997-09-23 | Fisher Controls International, Inc. | Magnetic displacement sensor including first and second flux paths wherein the first path has a fixed reluctance and a sensor disposed therein |
US5633545A (en) | 1995-12-06 | 1997-05-27 | International Business Machines Corporation | Disk drive in-hub radial-gap spindle motor with coils generating axial fields |
JP3740770B2 (ja) | 1995-12-28 | 2006-02-01 | 日本精工株式会社 | 密閉型アクチュエ−タ |
US6074180A (en) | 1996-05-03 | 2000-06-13 | Medquest Products, Inc. | Hybrid magnetically suspended and rotated centrifugal pumping apparatus and method |
JPH09319727A (ja) | 1996-05-31 | 1997-12-12 | Hitachi Ltd | データプロセッサ及びデータ処理システム |
US6015272A (en) | 1996-06-26 | 2000-01-18 | University Of Pittsburgh | Magnetically suspended miniature fluid pump and method of designing the same |
US6244835B1 (en) | 1996-06-26 | 2001-06-12 | James F. Antaki | Blood pump having a magnetically suspended rotor |
JPH1023781A (ja) | 1996-07-04 | 1998-01-23 | Ebara Corp | 磁気軸受電源装置 |
FR2750748B1 (fr) | 1996-07-05 | 1998-11-20 | Aerospatiale | Palier magnetique actif longitudinalement et transversalement |
US7087143B1 (en) | 1996-07-15 | 2006-08-08 | Semitool, Inc. | Plating system for semiconductor materials |
CA2213810C (en) | 1996-08-29 | 2006-06-06 | Lewis Dale Pennington | Benzo¬b|thiophene compounds, intermediates, processes, compositions and methods |
JP3550465B2 (ja) | 1996-08-30 | 2004-08-04 | 株式会社日立製作所 | ターボ真空ポンプ及びその運転方法 |
EP0938646B1 (de) | 1996-11-14 | 2001-09-19 | Brose Fahrzeugteile GmbH & Co. KG | Anordnungen zum erfassen einer rotatorischen oder translatorischen bewegung |
US5838121A (en) | 1996-11-18 | 1998-11-17 | Applied Materials, Inc. | Dual blade robot |
DE19652562C2 (de) | 1996-12-17 | 1999-07-22 | Heidenhain Gmbh Dr Johannes | Positionsmeßeinrichtung |
JPH10184685A (ja) | 1996-12-25 | 1998-07-14 | Fuji Xerox Co Ltd | 磁気軸受 |
US5841274A (en) | 1997-01-29 | 1998-11-24 | Mitutoyo Corporation | Induced current absolute position transducer using a code-track-type scale and read head |
JP3757016B2 (ja) * | 1997-02-20 | 2006-03-22 | ローツェ株式会社 | ハンドリング用ロボット |
NL1005344C2 (nl) | 1997-02-21 | 1998-08-24 | Stichting Tech Wetenschapp | Aangedreven magneetlager. |
JPH10270535A (ja) | 1997-03-25 | 1998-10-09 | Nikon Corp | 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法 |
US5886432A (en) | 1997-04-28 | 1999-03-23 | Ultratech Stepper, Inc. | Magnetically-positioned X-Y stage having six-degrees of freedom |
NL1006599C2 (nl) | 1997-07-16 | 1999-01-19 | Hollandse Signaalapparaten Bv | Stelsel voor het stabiliseren van een op een beweegbaar platform geplaatst object. |
JPH1151693A (ja) | 1997-08-06 | 1999-02-26 | Nippon Thompson Co Ltd | リニアエンコーダ装置 |
KR19990026296A (ko) | 1997-09-23 | 1999-04-15 | 윤종용 | 비동축 유도 모터용 동심 제어 장치 |
JP3627132B2 (ja) | 1997-11-18 | 2005-03-09 | 東京エレクトロン株式会社 | 基板乾燥処理装置及び基板乾燥処理方法 |
US6078119A (en) | 1997-11-26 | 2000-06-20 | Ebara Corporation | Bearingless rotary machine |
JP3630964B2 (ja) | 1997-12-26 | 2005-03-23 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
US6085760A (en) | 1997-12-31 | 2000-07-11 | Placontrol, Inc. | Animate form dental flossing device |
US6097183A (en) | 1998-04-14 | 2000-08-01 | Honeywell International Inc. | Position detection apparatus with correction for non-linear sensor regions |
DE19816936A1 (de) | 1998-04-16 | 1999-10-21 | Siemens Ag | Antennen-Transponder-Anordnung zur Energieübertragung und Winkelmessung |
US6176668B1 (en) | 1998-05-20 | 2001-01-23 | Applied Komatsu Technology, Inc. | In-situ substrate transfer shuttle |
US6206176B1 (en) | 1998-05-20 | 2001-03-27 | Applied Komatsu Technology, Inc. | Substrate transfer shuttle having a magnetic drive |
US6086362A (en) | 1998-05-20 | 2000-07-11 | Applied Komatsu Technology, Inc. | Multi-function chamber for a substrate processing system |
US6522130B1 (en) | 1998-07-20 | 2003-02-18 | Uqm Technologies, Inc. | Accurate rotor position sensor and method using magnet and sensors mounted adjacent to the magnet and motor |
JP3601757B2 (ja) | 1998-08-03 | 2004-12-15 | オークマ株式会社 | 永久磁石モータ |
US6324134B1 (en) | 1998-08-05 | 2001-11-27 | Seiko Instruments Inc. | Disk recording and reproducing apparatus |
US6058760A (en) | 1998-08-18 | 2000-05-09 | Kvh Industries, Inc. | Apparatus and method for sensing angular displacement |
US6485531B1 (en) | 1998-09-15 | 2002-11-26 | Levitronix Llc | Process chamber |
DE19849613A1 (de) | 1998-10-28 | 2000-05-04 | Philips Corp Intellectual Pty | Anordnung zur Messung einer relativen linearen Position |
JP2000138275A (ja) * | 1998-10-29 | 2000-05-16 | Seiko Epson Corp | 半導体製造装置 |
US6208045B1 (en) | 1998-11-16 | 2001-03-27 | Nikon Corporation | Electric motors and positioning devices having moving magnet arrays and six degrees of freedom |
US6147421A (en) | 1998-11-16 | 2000-11-14 | Nikon Corporation | Platform positionable in at least three degrees of freedom by interaction with coils |
US6485250B2 (en) * | 1998-12-30 | 2002-11-26 | Brooks Automation Inc. | Substrate transport apparatus with multiple arms on a common axis of rotation |
US6261247B1 (en) | 1998-12-31 | 2001-07-17 | Ball Semiconductor, Inc. | Position sensing system |
US6416215B1 (en) | 1999-12-14 | 2002-07-09 | University Of Kentucky Research Foundation | Pumping or mixing system using a levitating magnetic element |
US6127749A (en) | 1999-02-10 | 2000-10-03 | Nikon Corporation Of Japan | Two-dimensional electric motor |
US6358128B1 (en) * | 1999-03-05 | 2002-03-19 | Ebara Corporation | Polishing apparatus |
JP2001074006A (ja) | 1999-09-03 | 2001-03-23 | Amitec:Kk | ストロークセンサ |
JP4209996B2 (ja) | 1999-04-16 | 2009-01-14 | スタンレー電気株式会社 | プロジェクタ型車両用灯具 |
CN1372479A (zh) | 1999-04-23 | 2002-10-02 | 文特拉西斯特股份有限公司 | 旋转血泵及其控制系统 |
US6876896B1 (en) | 1999-04-26 | 2005-04-05 | Ab Tetrapak | Variable motion system and method |
TNSN00086A1 (fr) | 1999-04-26 | 2002-05-30 | Int Paper Co | Machoire de scellage par induction |
EP1052761A3 (en) | 1999-05-06 | 2001-05-09 | Yukio Kinoshita | A rotary electric machine |
US6285097B1 (en) | 1999-05-11 | 2001-09-04 | Nikon Corporation | Planar electric motor and positioning device having transverse magnets |
JP3105210B1 (ja) | 1999-05-17 | 2000-10-30 | ファナック株式会社 | ステータ構造 |
US6279412B1 (en) | 1999-05-19 | 2001-08-28 | Brooks Automation, Inc. | Corrosion resistant exoskeleton arm linkage assembly |
US6326750B1 (en) | 1999-06-17 | 2001-12-04 | Emerson Electric Co. | Active reduction of torque irregularities in rotating machines |
JP2001009770A (ja) * | 1999-07-01 | 2001-01-16 | Tamagawa Seiki Co Ltd | 同芯軸型モータによるddロボット |
JP3777272B2 (ja) | 1999-07-05 | 2006-05-24 | 本田技研工業株式会社 | 車両におけるエンジン始動/停止装置 |
JP3923696B2 (ja) * | 1999-07-19 | 2007-06-06 | 株式会社荏原製作所 | 基板回転装置 |
FR2797478B1 (fr) | 1999-08-09 | 2001-10-12 | Cit Alcatel | Palier magnetique de centrage a commande en basculement de grande amplitude |
TWI248718B (en) | 1999-09-02 | 2006-02-01 | Koninkl Philips Electronics Nv | Displacement device |
US6227817B1 (en) | 1999-09-03 | 2001-05-08 | Magnetic Moments, Llc | Magnetically-suspended centrifugal blood pump |
US6758593B1 (en) | 2000-10-09 | 2004-07-06 | Levtech, Inc. | Pumping or mixing system using a levitating magnetic element, related system components, and related methods |
JP2001224154A (ja) | 2000-02-10 | 2001-08-17 | Japan Science & Technology Corp | マルチポール磁気浮上回転方法およびその装置 |
US6537011B1 (en) | 2000-03-10 | 2003-03-25 | Applied Materials, Inc. | Method and apparatus for transferring and supporting a substrate |
US6781524B1 (en) | 2000-03-17 | 2004-08-24 | Magnemotion, Inc. | Passive position-sensing and communications for vehicles on a pathway |
US6498410B1 (en) | 2000-03-28 | 2002-12-24 | Ibiden Co., Ltd. | Motor and pressure generating apparatus incorporating the motor |
JP4341140B2 (ja) | 2000-03-31 | 2009-10-07 | ミツミ電機株式会社 | 電子機器 |
US6509732B1 (en) | 2000-05-01 | 2003-01-21 | Honeywell International Inc. | Enhanced methods for sensing positions of an actuator moving longitudinally |
US6789126B1 (en) * | 2000-05-09 | 2004-09-07 | Sun Microsystems, Inc. | Addressing message gates in a distributed computing environment |
US6559567B2 (en) | 2000-05-12 | 2003-05-06 | Levitronix Llc | Electromagnetic rotary drive |
JP2001326201A (ja) * | 2000-05-16 | 2001-11-22 | Ebara Corp | ポリッシング装置 |
JP2001351874A (ja) | 2000-06-09 | 2001-12-21 | Ebara Corp | 基板回転装置 |
US6445093B1 (en) | 2000-06-26 | 2002-09-03 | Nikon Corporation | Planar motor with linear coil arrays |
JP2002022403A (ja) | 2000-07-13 | 2002-01-23 | Tokyo Keiso Co Ltd | 変位検出器および変位検出方法 |
GB0020501D0 (en) | 2000-08-18 | 2000-10-11 | Switched Reluctance Drives Ltd | Apparatus and method for controlling an electric machine |
JP3979561B2 (ja) | 2000-08-30 | 2007-09-19 | 株式会社日立製作所 | 交流電動機の駆動システム |
DE10043235A1 (de) | 2000-09-02 | 2002-03-14 | Leybold Vakuum Gmbh | Vakuumpumpe |
US6690159B2 (en) | 2000-09-28 | 2004-02-10 | Eldec Corporation | Position indicating system |
DE50003742D1 (de) | 2000-10-04 | 2003-10-23 | Nti Ag Zuerich | Verfahren zur Erhöhung der Positioniergenauigkeit eines relativ zu einem Stator bewegbar angeordneten Elements |
JP2002122137A (ja) | 2000-10-10 | 2002-04-26 | Sankyo Seiki Mfg Co Ltd | 軸受装置 |
US6431011B1 (en) | 2000-11-02 | 2002-08-13 | Murray F. Feller | Magnetic flow sensor and method |
AU2002225701A1 (en) * | 2000-11-14 | 2002-05-27 | Airex Corporation | Integrated magnetic bearing |
JP3757118B2 (ja) | 2001-01-10 | 2006-03-22 | 株式会社日立製作所 | 非接触式回転位置センサ及び非接触式回転位置センサを有する絞弁組立体 |
US6642711B2 (en) | 2001-01-24 | 2003-11-04 | Texas Instruments Incorporated | Digital inductive position sensor |
US6691074B1 (en) | 2001-02-08 | 2004-02-10 | Netmore Ltd. | System for three dimensional positioning and tracking |
US6518747B2 (en) | 2001-02-16 | 2003-02-11 | Quantum Design, Inc. | Method and apparatus for quantitative determination of accumulations of magnetic particles |
US7036207B2 (en) | 2001-03-02 | 2006-05-02 | Encap Motor Corporation | Stator assembly made from a plurality of toroidal core segments and motor using same |
EP1243969A1 (en) | 2001-03-20 | 2002-09-25 | Asm Lithography B.V. | Lithographic projection apparatus and positioning system |
US20020149270A1 (en) | 2001-04-12 | 2002-10-17 | Hazelton Andrew J. | Planar electric motor with two sided magnet array |
US7196604B2 (en) | 2001-05-30 | 2007-03-27 | Tt Electronics Technology Limited | Sensing apparatus and method |
GB0126014D0 (en) | 2001-10-30 | 2001-12-19 | Sensopad Technologies Ltd | Modulated field position sensor |
US6650079B2 (en) | 2001-06-01 | 2003-11-18 | Nikon Corporation | System and method to control planar motors |
US20030085676A1 (en) | 2001-06-28 | 2003-05-08 | Michael Binnard | Six degree of freedom control of planar motors |
US6879126B2 (en) | 2001-06-29 | 2005-04-12 | Medquest Products, Inc | Method and system for positioning a movable body in a magnetic bearing system |
JP5134182B2 (ja) * | 2001-07-13 | 2013-01-30 | ブルックス オートメーション インコーポレイテッド | 独立多エンドエフェクタを備えた基板移送装置 |
JP2003052146A (ja) | 2001-08-06 | 2003-02-21 | Sankyo Seiki Mfg Co Ltd | 周面対向型モータ |
US6573088B2 (en) | 2001-08-08 | 2003-06-03 | Dade Microscan Inc. | Automated random access microbiological analyzer |
ES2236564T3 (es) | 2001-08-10 | 2005-07-16 | EBM-PAPST ST. GEORGEN GMBH & CO. KG | Procedimiento para el control de la conmutacion de un motor conmutado electronicamente, y un motor conmutado electronicamente para llevar a cabo un procedimiento de este tipo. |
JP3849921B2 (ja) | 2001-09-26 | 2006-11-22 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN101083419B (zh) | 2001-10-01 | 2013-03-27 | 麦克纳莫绅有限公司 | 同步机器设计及制造 |
US20030102721A1 (en) | 2001-12-04 | 2003-06-05 | Toshio Ueta | Moving coil type planar motor control |
US6927505B2 (en) | 2001-12-19 | 2005-08-09 | Nikon Corporation | Following stage planar motor |
US7115066B1 (en) | 2002-02-11 | 2006-10-03 | Lee Paul Z | Continuously variable ratio transmission |
GB2402491B (en) | 2002-02-22 | 2005-08-24 | Fast Technology Ag | Magnetically neutral displacement (torque) transducer for a ferromagnetic member with coil(s) and magnetic field sensor(s) |
US6991710B2 (en) | 2002-02-22 | 2006-01-31 | Semitool, Inc. | Apparatus for manually and automatically processing microelectronic workpieces |
US7023118B1 (en) | 2002-03-14 | 2006-04-04 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | System for controlling a magnetically levitated rotor |
US6800833B2 (en) | 2002-03-29 | 2004-10-05 | Mariusch Gregor | Electromagnetically levitated substrate support |
JP4197103B2 (ja) * | 2002-04-15 | 2008-12-17 | 株式会社荏原製作所 | ポリッシング装置 |
JP3912779B2 (ja) | 2002-05-08 | 2007-05-09 | 松下電器産業株式会社 | 磁気式位置検出装置 |
US20060279149A1 (en) | 2002-05-16 | 2006-12-14 | Silphenix Gmbh | Passive dynamically stabilizing magnetic bearing and drive unit |
US7578649B2 (en) * | 2002-05-29 | 2009-08-25 | Brooks Automation, Inc. | Dual arm substrate transport apparatus |
US20040021437A1 (en) | 2002-07-31 | 2004-02-05 | Maslov Boris A. | Adaptive electric motors and generators providing improved performance and efficiency |
US6745145B2 (en) | 2002-06-24 | 2004-06-01 | Lsi Logic Corporation | Methods and systems for enhanced automated system testing |
US6909281B2 (en) | 2002-07-03 | 2005-06-21 | Fisher Controls International Llc | Position sensor using a compound magnetic flux source |
US7988398B2 (en) | 2002-07-22 | 2011-08-02 | Brooks Automation, Inc. | Linear substrate transport apparatus |
EP1535313B1 (en) | 2002-07-22 | 2018-10-31 | Brooks Automation, Inc. | Substrate processing apparatus |
JP2004106084A (ja) * | 2002-09-17 | 2004-04-08 | Ebara Corp | ポリッシング装置及び基板処理装置 |
US20050174087A1 (en) | 2004-02-10 | 2005-08-11 | Koyo Seiko Co., Ltd. | Control magnetic bearing device |
DE10244234A1 (de) | 2002-09-23 | 2004-03-25 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
JP2004122253A (ja) * | 2002-09-30 | 2004-04-22 | Tokyo Electron Ltd | 搬送装置 |
FR2845469B1 (fr) | 2002-10-07 | 2005-03-11 | Moving Magnet Tech | Capteur de position analogique a reluctance variable |
US6813543B2 (en) | 2002-10-08 | 2004-11-02 | Brooks-Pri Automation, Inc. | Substrate handling system for aligning and orienting substrates during a transfer operation |
US20040070300A1 (en) | 2002-10-10 | 2004-04-15 | Fu Zhenxing (Zack) | Low torque ripple surface mounted magnet synchronous motors for electric power assisted steering |
US6879076B2 (en) | 2002-12-09 | 2005-04-12 | Johnny D. Long | Ellipsoid generator |
US6698737B1 (en) | 2002-12-14 | 2004-03-02 | Ronald Lee Blessing | Clamping jig |
US7030528B2 (en) | 2003-02-06 | 2006-04-18 | General Motors Corporation | Dual concentric AC motor |
JP2004245703A (ja) | 2003-02-14 | 2004-09-02 | Mitsuba Corp | 回転角検出装置 |
DE60322016D1 (de) | 2003-02-18 | 2008-08-21 | Minebea Co Ltd | Rotor und Stator einer elektrischen Maschine mit reduziertem pulsierenden Moment |
JP2004253741A (ja) | 2003-02-21 | 2004-09-09 | Sumitomo Eaton Noba Kk | 移動装置及び半導体製造装置 |
DE10309351A1 (de) | 2003-03-03 | 2004-09-16 | Robert Bosch Gmbh | Druckregler |
TWI327985B (en) | 2003-04-14 | 2010-08-01 | Daifuku Kk | Apparatus for transporting plate-shaped work piece |
US6803758B1 (en) | 2003-04-25 | 2004-10-12 | Delphi Technologies, Inc. | Non-contact magnetically variable differential transformer |
US7245047B2 (en) | 2003-05-01 | 2007-07-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
AU2003902255A0 (en) | 2003-05-09 | 2003-05-29 | Queensland University Of Technology | Motor |
US20050035046A1 (en) | 2003-06-06 | 2005-02-17 | Hanson Kyle M. | Wet chemical processing chambers for processing microfeature workpieces |
US7596425B2 (en) * | 2003-06-13 | 2009-09-29 | Dainippon Screen Mfg. Co., Ltd. | Substrate detecting apparatus and method, substrate transporting apparatus and method, and substrate processing apparatus and method |
DE10330434A1 (de) | 2003-07-04 | 2005-02-03 | Jostra Ag | Zentrifugal-Pumpe |
DE10394095D2 (de) | 2003-07-09 | 2006-11-02 | Rena Sondermaschinen Gmbh | Vorrichtung zur Reinigung von Wafern nach dem CMP-Prozeß |
US6902646B2 (en) | 2003-08-14 | 2005-06-07 | Advanced Energy Industries, Inc. | Sensor array for measuring plasma characteristics in plasma processing environments |
EP1510867A1 (en) | 2003-08-29 | 2005-03-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8016541B2 (en) | 2003-09-10 | 2011-09-13 | Brooks Automation, Inc. | Substrate handling system for aligning and orienting substrates during a transfer operation |
EP1517042A1 (en) | 2003-09-17 | 2005-03-23 | Mecos Traxler AG | Magnetic bearing device and vacuum pump |
US7229258B2 (en) | 2003-09-25 | 2007-06-12 | Medforte Research Foundation | Streamlined unobstructed one-pass axial-flow pump |
WO2005030296A2 (en) | 2003-09-25 | 2005-04-07 | Medforte Research Foundation | Axial-flow blood pump with magnetically suspended, radially and axially stabilized impeller |
US7070398B2 (en) | 2003-09-25 | 2006-07-04 | Medforte Research Foundation | Axial-flow blood pump with magnetically suspended, radially and axially stabilized impeller |
US6952086B1 (en) | 2003-10-10 | 2005-10-04 | Curtiss-Wright Electro-Mechanical Corporation | Linear position sensing system and coil switching methods for closed-loop control of large linear induction motor systems |
JP4767488B2 (ja) | 2003-10-23 | 2011-09-07 | Ntn株式会社 | 磁気浮上型ポンプ |
JP4202889B2 (ja) | 2003-10-29 | 2008-12-24 | 株式会社神戸製鋼所 | 薄膜形成方法及び装置 |
JP2005158826A (ja) | 2003-11-20 | 2005-06-16 | Anelva Corp | マルチアーム型基板搬送ロボット及び基板搬送方法 |
JP4606033B2 (ja) | 2004-01-30 | 2011-01-05 | 三菱電機株式会社 | 同期モータの回転子位置検出調整方法 |
JP4522106B2 (ja) | 2004-02-04 | 2010-08-11 | 山洋電気株式会社 | リニアモータ |
US7264430B2 (en) | 2004-02-26 | 2007-09-04 | Federal Mogul World Wide, Inc | Magnetically levitated high-speed spindle for shaping irregular surfaces |
US20060238053A1 (en) | 2004-03-01 | 2006-10-26 | The University Of Toledo | Conical bearingless motor/generator |
JP2005253179A (ja) | 2004-03-03 | 2005-09-15 | Canon Inc | 位置決め装置、露光装置およびデバイス製造方法 |
JP4333421B2 (ja) | 2004-03-16 | 2009-09-16 | セイコーエプソン株式会社 | 映像表示装置 |
FR2869090B1 (fr) | 2004-04-15 | 2007-09-07 | Gaz De France | Procede pour raccorder une conduite de derivation a une canalisation principale et reseau souterrain de distribution de fluide |
US7246985B2 (en) * | 2004-04-16 | 2007-07-24 | Axcelis Technologies, Inc. | Work-piece processing system |
US7235906B2 (en) | 2004-05-10 | 2007-06-26 | Airex Corporation | Magnetic bearing using displacement winding techniques |
JP4324736B2 (ja) | 2004-05-17 | 2009-09-02 | 株式会社島津製作所 | 磁気軸受制御装置 |
US7135855B2 (en) | 2004-05-17 | 2006-11-14 | David Scott Nyce | Simplified inductive position sensor and circuit configuration |
GB0411053D0 (en) | 2004-05-18 | 2004-06-23 | Ricardo Uk Ltd | Data processing |
US20050269892A1 (en) | 2004-05-18 | 2005-12-08 | Duff William B Jr | Induction machine rotors with improved frequency response |
JP4587708B2 (ja) | 2004-05-20 | 2010-11-24 | コニカミノルタオプト株式会社 | 位置検出装置、手振れ補正機構、および撮像装置 |
JP5264171B2 (ja) * | 2004-06-09 | 2013-08-14 | ブルックス オートメーション インコーポレイテッド | 基板搬送装置 |
US7205741B2 (en) | 2004-06-24 | 2007-04-17 | Asml Netherlands B.V. | Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method |
JP4085074B2 (ja) | 2004-06-24 | 2008-04-30 | ファナック株式会社 | 磁気式角度検出器における回転体の製造方法 |
JP4732716B2 (ja) | 2004-06-29 | 2011-07-27 | 株式会社アルバック | 搬送装置及びその制御方法並びに真空処理装置 |
US7249992B2 (en) | 2004-07-02 | 2007-07-31 | Strasbaugh | Method, apparatus and system for use in processing wafers |
EP1621785A1 (en) | 2004-07-30 | 2006-02-01 | Mecos Traxler AG | Method and apparatus for controlling a magnetic bearing device |
US20080257070A1 (en) | 2004-08-02 | 2008-10-23 | Nctengineering Gmbh | Sensor Electronic |
CN1730947A (zh) * | 2004-08-04 | 2006-02-08 | 李国坤 | 磁动泵 |
JP4649951B2 (ja) | 2004-10-28 | 2011-03-16 | 日本電産株式会社 | モータおよび電機子の製造方法 |
WO2006053384A1 (en) | 2004-11-17 | 2006-05-26 | Queensland University Of Technology | Fluid pump |
JP2006174526A (ja) | 2004-12-13 | 2006-06-29 | Nippon Densan Corp | モータ |
US7230355B2 (en) | 2004-12-21 | 2007-06-12 | Baldor Electric Company | Linear hybrid brushless servo motor |
US20060275155A1 (en) | 2005-01-28 | 2006-12-07 | Robert Thibodeau | Rotational apparatus |
JP4600060B2 (ja) | 2005-02-01 | 2010-12-15 | コニカミノルタオプト株式会社 | 駆動装置 |
JP4733405B2 (ja) * | 2005-02-22 | 2011-07-27 | 株式会社国際電気セミコンダクターサービス | 熱処理装置及び熱処理方法 |
WO2007008941A2 (en) | 2005-07-11 | 2007-01-18 | Brooks Automation, Inc. | Substrate transport apparatus with automated alignment |
US8573919B2 (en) * | 2005-07-11 | 2013-11-05 | Brooks Automation, Inc. | Substrate transport apparatus |
JP4770308B2 (ja) | 2005-07-15 | 2011-09-14 | 日立電線株式会社 | トルクセンサ |
WO2007029623A1 (ja) | 2005-09-05 | 2007-03-15 | Tokyo Institute Of Technology | 使い捨て磁気浮上式血液ポンプ |
EP1732011A1 (en) | 2005-11-23 | 2006-12-13 | Mecos Traxler AG | Compact magnetic bearing device and method of operating the device with calculation of distribution of currents in the windings |
FR2894023B1 (fr) | 2005-11-29 | 2008-02-22 | Electricfil Automotive Soc Par | Capteur magnetique de position pour un mobile ayant une course lineaire limitee |
JP4815204B2 (ja) | 2005-12-01 | 2011-11-16 | アイチエレック株式会社 | 永久磁石回転機及び圧縮機 |
WO2007068496A1 (en) | 2005-12-15 | 2007-06-21 | Nctengineering Gmbh | Sensor |
US7468589B2 (en) | 2006-01-13 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus having a controlled motor, and motor control system and method |
US8104488B2 (en) | 2006-02-22 | 2012-01-31 | Applied Materials, Inc. | Single side workpiece processing |
JP4977378B2 (ja) | 2006-02-23 | 2012-07-18 | 山梨日本電気株式会社 | 磁気センサ、回転検出装置及び位置検出装置 |
US7795861B2 (en) | 2006-05-02 | 2010-09-14 | Cairos Technologies Ag | Method and apparatus for controlling a movable object for localization within a positioning area |
JP2007312516A (ja) | 2006-05-18 | 2007-11-29 | Canon Inc | 駆動装置、露光装置及びデバイス製造方法 |
US7868610B2 (en) | 2006-06-09 | 2011-01-11 | The Regents Of The University Of California | Angular motion tracking sensor |
US8701519B2 (en) | 2006-06-28 | 2014-04-22 | Genmark Automation, Inc. | Robot with belt-drive system |
JP2009542611A (ja) | 2006-07-03 | 2009-12-03 | ザパロイド・リミテッド | アルファ−シヌクレイン凝集の阻害 |
US20080067968A1 (en) | 2006-09-12 | 2008-03-20 | Nikon Corporation | Identifying and compensating force-ripple and side-forces produced by linear actuators |
US8137048B2 (en) | 2006-09-27 | 2012-03-20 | Vserv Technologies | Wafer processing system with dual wafer robots capable of asynchronous motion |
JP5379954B2 (ja) | 2007-02-09 | 2013-12-25 | 株式会社東芝 | 制御盤試験用端子台、制御盤自動試験装置、及び仮設制御装置 |
JP5130762B2 (ja) | 2007-03-26 | 2013-01-30 | 住友電気工業株式会社 | 広帯域光源装置 |
US8283813B2 (en) * | 2007-06-27 | 2012-10-09 | Brooks Automation, Inc. | Robot drive with magnetic spindle bearings |
KR101660894B1 (ko) | 2007-06-27 | 2016-10-10 | 브룩스 오토메이션 인코퍼레이티드 | 다차원 위치 센서 |
US7834618B2 (en) * | 2007-06-27 | 2010-11-16 | Brooks Automation, Inc. | Position sensor system |
KR101825595B1 (ko) * | 2007-07-17 | 2018-02-05 | 브룩스 오토메이션 인코퍼레이티드 | 챔버 벽들에 일체화된 모터들을 갖는 기판 처리 장치 |
US8264187B2 (en) * | 2009-01-11 | 2012-09-11 | Applied Materials, Inc. | Systems, apparatus and methods for making an electrical connection |
-
2008
- 2008-07-17 KR KR1020157033830A patent/KR101825595B1/ko active IP Right Grant
- 2008-07-17 KR KR1020197018398A patent/KR20190077134A/ko not_active Application Discontinuation
- 2008-07-17 KR KR1020107003353A patent/KR20100056468A/ko active Search and Examination
- 2008-07-17 CN CN200880108254.8A patent/CN101801817B/zh active Active
- 2008-07-17 KR KR1020217030740A patent/KR102617936B1/ko active IP Right Grant
- 2008-07-17 KR KR1020237018304A patent/KR20230079518A/ko active Application Filing
- 2008-07-17 JP JP2010517162A patent/JP2011514652A/ja active Pending
- 2008-07-17 US US12/175,278 patent/US8008884B2/en active Active
- 2008-07-17 WO PCT/US2008/070346 patent/WO2009012396A2/en active Application Filing
- 2008-07-17 KR KR1020187002939A patent/KR20180014247A/ko active Search and Examination
-
2011
- 2011-08-26 US US13/219,267 patent/US8237391B2/en active Active
-
2012
- 2012-08-06 US US13/567,812 patent/US8680803B2/en active Active
-
2014
- 2014-02-17 JP JP2014027707A patent/JP6040182B2/ja active Active
-
2016
- 2016-11-04 JP JP2016216382A patent/JP6466386B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01153638U (ja) * | 1988-04-04 | 1989-10-23 | ||
JPH024024U (ja) * | 1988-06-20 | 1990-01-11 | ||
JPH10581A (ja) * | 1996-06-07 | 1998-01-06 | Daikin Ind Ltd | ワーク搬送ロボット |
JPH10316241A (ja) * | 1997-05-19 | 1998-12-02 | Yaskawa Electric Corp | ウェハ搬送装置 |
JPH11191581A (ja) * | 1997-12-26 | 1999-07-13 | Komatsu Ltd | ハンドリング用ロボット |
JP2001156150A (ja) * | 1999-11-30 | 2001-06-08 | Anelva Corp | 基板搬送ロボット及び基板搬送方法 |
JP2002026105A (ja) * | 2000-07-05 | 2002-01-25 | Daikin Ind Ltd | 真空搬送モジュール |
JP2003068620A (ja) * | 2001-08-28 | 2003-03-07 | Sendai Nikon:Kk | 露光装置 |
JP2007019216A (ja) * | 2005-07-07 | 2007-01-25 | Rorze Corp | 基板の搬送ロボット |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014123761A (ja) * | 2007-07-17 | 2014-07-03 | Brooks Automation Inc | チャンバ壁に一体化されたモータを伴う基板処理装置 |
JP2014078693A (ja) * | 2012-10-11 | 2014-05-01 | Tes Co Ltd | 基板移送装置 |
TWI579953B (zh) * | 2012-11-14 | 2017-04-21 | 東京威力科創股份有限公司 | 基板處理裝置及基板運送方法 |
WO2014077379A1 (ja) * | 2012-11-14 | 2014-05-22 | 東京エレクトロン株式会社 | 基板処理装置及び基板搬送方法 |
JP2014099494A (ja) * | 2012-11-14 | 2014-05-29 | Tokyo Electron Ltd | 基板処理装置及び基板搬送方法 |
US9929030B2 (en) | 2012-11-14 | 2018-03-27 | Tokyo Electron Limited | Substrate processing device and substrate transfer method |
US10348172B2 (en) | 2013-11-13 | 2019-07-09 | Brooks Automation, Inc. | Sealed switched reluctance motor |
JP2017505091A (ja) * | 2013-11-13 | 2017-02-09 | ブルックス オートメーション インコーポレイテッド | 密封型ロボット駆動部 |
KR20160086393A (ko) * | 2013-11-13 | 2016-07-19 | 브룩스 오토메이션 인코퍼레이티드 | 씰링된 로봇 드라이브 |
US10468936B2 (en) | 2013-11-13 | 2019-11-05 | Brooks Automation, Inc. | Sealed robot drive |
US10564221B2 (en) | 2013-11-13 | 2020-02-18 | Brooks Automation, Inc. | Method and apparatus for brushless electrical machine control |
JP2020103033A (ja) * | 2013-11-13 | 2020-07-02 | ブルックス オートメーション インコーポレイテッド | 密封型ロボット駆動部 |
US10742092B2 (en) | 2013-11-13 | 2020-08-11 | Brooks Automation, Inc. | Position feedback for sealed environments |
KR102224756B1 (ko) * | 2013-11-13 | 2021-03-08 | 브룩스 오토메이션 인코퍼레이티드 | 씰링된 로봇 드라이브 |
US11181582B2 (en) | 2013-11-13 | 2021-11-23 | Brooks Automation, Inc. | Method and apparatus for brushless electrical machine control |
US11404939B2 (en) | 2013-11-13 | 2022-08-02 | Brooks Automation, US LLC | Position feedback for sealed environments |
US11444521B2 (en) | 2013-11-13 | 2022-09-13 | Brooks Automation Us, Llc | Sealed switched reluctance motor |
US11799346B2 (en) | 2013-11-13 | 2023-10-24 | Brooks Automation Us, Llc | Sealed robot drive |
JP2022539695A (ja) * | 2019-06-27 | 2022-09-13 | アプライド マテリアルズ インコーポレイテッド | プラズマ処理を統合したビームラインアーキテクチャ |
Also Published As
Publication number | Publication date |
---|---|
KR20210119580A (ko) | 2021-10-05 |
JP6466386B2 (ja) | 2019-02-06 |
US20090022571A1 (en) | 2009-01-22 |
WO2009012396A2 (en) | 2009-01-22 |
JP6040182B2 (ja) | 2016-12-07 |
JP2017022426A (ja) | 2017-01-26 |
WO2009012396A3 (en) | 2009-03-05 |
KR101825595B1 (ko) | 2018-02-05 |
WO2009012396A9 (en) | 2009-04-23 |
US20120301261A1 (en) | 2012-11-29 |
KR20100056468A (ko) | 2010-05-27 |
KR20190077134A (ko) | 2019-07-02 |
KR20150140401A (ko) | 2015-12-15 |
CN101801817A (zh) | 2010-08-11 |
US8680803B2 (en) | 2014-03-25 |
JP2014123761A (ja) | 2014-07-03 |
US8237391B2 (en) | 2012-08-07 |
KR20180014247A (ko) | 2018-02-07 |
CN101801817B (zh) | 2015-07-22 |
US20110316370A1 (en) | 2011-12-29 |
KR102617936B1 (ko) | 2023-12-27 |
US8008884B2 (en) | 2011-08-30 |
KR20230079518A (ko) | 2023-06-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6466386B2 (ja) | チャンバ壁に一体化されたモータを伴う基板処理装置 | |
US20240063682A1 (en) | Sealed robot drive | |
TWI609557B (zh) | 馬達模組、多軸馬達驅動組件、多軸機器人設備、及電子裝置製造系統與方法 | |
TWI512869B (zh) | 具有一體形成於室壁之馬達之基板處理裝置 | |
EP3068591B1 (en) | Sealed robot drive | |
TWI587995B (zh) | 小型化直接驅動心軸 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110513 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120918 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121002 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20121226 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130401 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20131015 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140217 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140225 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20140502 |