JP2001500628A - マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡 - Google Patents

マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡

Info

Publication number
JP2001500628A
JP2001500628A JP09532621A JP53262197A JP2001500628A JP 2001500628 A JP2001500628 A JP 2001500628A JP 09532621 A JP09532621 A JP 09532621A JP 53262197 A JP53262197 A JP 53262197A JP 2001500628 A JP2001500628 A JP 2001500628A
Authority
JP
Japan
Prior art keywords
image
aperture
microlens
array
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP09532621A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001500628A5 (enExample
Inventor
ケニス シー ジョンソン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JP2001500628A publication Critical patent/JP2001500628A/ja
Publication of JP2001500628A5 publication Critical patent/JP2001500628A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0036—Scanning details, e.g. scanning stages
    • G02B21/0044—Scanning details, e.g. scanning stages moving apertures, e.g. Nipkow disks, rotating lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0028—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Radiology & Medical Imaging (AREA)
  • Surgery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
JP09532621A 1996-02-28 1997-02-20 マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡 Ceased JP2001500628A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US1243496P 1996-02-28 1996-02-28
US60/012,434 1996-02-28
PCT/US1997/002949 WO1997034171A2 (en) 1996-02-28 1997-02-20 Microlens scanner for microlithography and wide-field confocal microscopy

Publications (2)

Publication Number Publication Date
JP2001500628A true JP2001500628A (ja) 2001-01-16
JP2001500628A5 JP2001500628A5 (enExample) 2004-11-25

Family

ID=21754960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09532621A Ceased JP2001500628A (ja) 1996-02-28 1997-02-20 マイクロリトグラフィ用マイクロレンズスキャナ及び広フィールド共焦顕微鏡

Country Status (6)

Country Link
US (1) US6133986A (enExample)
EP (1) EP0991959B1 (enExample)
JP (1) JP2001500628A (enExample)
AU (1) AU1975197A (enExample)
DE (1) DE69729659T2 (enExample)
WO (1) WO1997034171A2 (enExample)

Cited By (70)

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JP2002514739A (ja) * 1997-10-31 2002-05-21 カール・ツアイス・シュティフテュング・ハンデルンド・アルス・カール・ツアイス 光学的アレイシステムおよびマイクロタイタープレート用読み取り器
JP2003015309A (ja) * 2001-06-29 2003-01-17 Pentax Corp 多重露光描画方法及び多重露光描画装置
JP2003057836A (ja) * 2001-08-17 2003-02-28 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2003057837A (ja) * 2001-08-21 2003-02-28 Pentax Corp 多重露光描画装置および多重露光描画方法
JP2003084444A (ja) * 2001-07-05 2003-03-19 Pentax Corp 多重露光描画方法及び多重露光描画装置
JP2004062156A (ja) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP2004062155A (ja) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置
JP2004226407A (ja) * 2003-01-18 2004-08-12 Hentze-Lissotschenko Patentverwaltungs Gmbh & Co Kg 物体の光学的捕捉用捕捉装置、該捕捉装置の稼動方法ならびに走査装置および共焦点顕微鏡
JP2004287082A (ja) * 2003-03-20 2004-10-14 Tadahiro Omi マスク描画装置
JP2004309640A (ja) * 2003-04-03 2004-11-04 Shinko Electric Ind Co Ltd 露光装置および露光方法、ならびに描画装置および描画方法
JP2005020001A (ja) * 2003-06-24 2005-01-20 Asml Holding Nv マスクレス・リソグラフィのための投影光学系
US6859223B2 (en) 2002-05-30 2005-02-22 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus and pattern writing method
JP2005510860A (ja) * 2001-11-27 2005-04-21 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ 画像化装置
US6903798B2 (en) 2002-05-16 2005-06-07 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus and pattern writing method
JP2005148634A (ja) * 2003-11-19 2005-06-09 Tadahiro Omi マスク描画手法、及びマスク描画装置
WO2005078776A1 (en) * 2004-02-12 2005-08-25 Fuji Photo Film Co., Ltd. Pattern forming process
JP2005244238A (ja) * 2004-02-27 2005-09-08 Asml Netherlands Bv リソグラフィ機器及びデバイスの製造方法
JP2005277209A (ja) * 2004-03-25 2005-10-06 Tadahiro Omi パターン露光装置および二次元光像発生装置
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置
JP2005317970A (ja) * 2004-04-30 2005-11-10 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2005339531A (ja) * 2004-05-18 2005-12-08 Agfa Gevaert Nv デジタル信号における周期的変動の抑制
JP2005338852A (ja) * 2004-05-26 2005-12-08 Asml Holding Nv リソグラフィシステム
JP2005354063A (ja) * 2004-06-08 2005-12-22 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2005124462A1 (ja) * 2004-06-15 2005-12-29 Fujifilm Corporation 感光性組成物、並びにパターン形成方法及び永久パターン
JP2006011371A (ja) * 2004-05-26 2006-01-12 Fuji Photo Film Co Ltd パターン形成方法
JP2006018228A (ja) * 2004-05-31 2006-01-19 Fuji Photo Film Co Ltd パターン形成方法
JP2006030873A (ja) * 2004-07-21 2006-02-02 Fuji Photo Film Co Ltd 画像形成装置および画像形成方法
JP2006133784A (ja) * 2004-11-08 2006-05-25 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2006148123A (ja) * 2004-11-22 2006-06-08 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
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JP2006186370A (ja) * 2004-12-27 2006-07-13 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2006184840A (ja) * 2004-03-22 2006-07-13 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2006191060A (ja) * 2004-12-28 2006-07-20 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2006269802A (ja) * 2005-03-24 2006-10-05 Nano System Solutions:Kk 大面積マスクレス露光方法及び露光装置
JP2006295175A (ja) * 2005-04-08 2006-10-26 Asml Netherlands Bv コントラスト装置のブレーズ部を用いるリソグラフィ装置及び素子製造方法
JP2006343750A (ja) * 2005-06-08 2006-12-21 Asml Netherlands Bv デジタル画像を書き込むためのリソグラフィ装置及びデバイス製造方法
JP2007500366A (ja) * 2003-07-29 2007-01-11 コダック グラフィック コミュニケーションズ カナダ カンパニー 不均一な光弁
JP2007010785A (ja) * 2005-06-28 2007-01-18 Fujifilm Holdings Corp 永久パターン形成方法
JP2007025394A (ja) * 2005-07-19 2007-02-01 Fujifilm Holdings Corp パターン形成方法
JP2007086373A (ja) * 2005-09-21 2007-04-05 Fujifilm Corp 永久パターン形成方法
JP2007114758A (ja) * 2005-09-21 2007-05-10 Tohoku Univ 露光方法
US7268856B2 (en) 2005-05-31 2007-09-11 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus and block number determining method
JP2007534166A (ja) * 2004-04-14 2007-11-22 ライテル・インストルメンツ 射出瞳透過率を計測する方法および装置
JP2007536512A (ja) * 2004-05-07 2007-12-13 ウイスコンシン アラムニ リサーチ ファンデーション Ｄｎａマイクロアレイ合成用の画像ロッキングシステム
JP2007329455A (ja) * 2006-04-13 2007-12-20 Asml Holding Nv パターニング用デバイスへの照明効率を改善する光学系
JP2008047875A (ja) * 2006-06-30 2008-02-28 Asml Netherlands Bv マスクレスリソグラフィにおけるパターン発生器の制御システム
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JP2008160109A (ja) * 2006-12-21 2008-07-10 Asml Netherlands Bv リソグラフィ装置および方法
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JP2009055060A (ja) * 2004-04-30 2009-03-12 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
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JP2009290220A (ja) * 2004-12-27 2009-12-10 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
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JP2011507007A (ja) * 2007-11-23 2011-03-03 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 多焦点スポット生成器及び多焦点マルチ・スポット走査顕微鏡
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JP2012503325A (ja) * 2008-09-22 2012-02-02 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブルパターニングデバイス及びリソグラフィ方法
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US8390787B2 (en) 2004-12-22 2013-03-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2013048258A (ja) * 2005-03-30 2013-03-07 Asml Netherlands Bv データフィルタ処理を利用したリソグラフィ装置及びデバイス製造法
CN103048885A (zh) * 2011-10-11 2013-04-17 中山新诺科技有限公司 无掩膜曝光系统及方法
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JP2015513671A (ja) * 2012-02-23 2015-05-14 ザ ユナイテッド ステイツ オブ アメリカ， アズ リプレゼンテッド バイ ザ セクレタリー， デパートメント オブ ヘルス アンド ヒューマン サービシーズ 多焦点構造化照射顕微鏡検査システムおよび方法

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