JP6042457B2 - デバイス、露光装置および放射誘導方法 - Google Patents
デバイス、露光装置および放射誘導方法 Download PDFInfo
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- JP6042457B2 JP6042457B2 JP2014558046A JP2014558046A JP6042457B2 JP 6042457 B2 JP6042457 B2 JP 6042457B2 JP 2014558046 A JP2014558046 A JP 2014558046A JP 2014558046 A JP2014558046 A JP 2014558046A JP 6042457 B2 JP6042457 B2 JP 6042457B2
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- radiation
- waveguide
- liquid
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4296—Coupling light guides with opto-electronic elements coupling with sources of high radiant energy, e.g. high power lasers, high temperature light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Couplings Of Light Guides (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本出願は、2012年2月23日に出願された米国特許仮出願第61/602,491号の利益を主張し、その全体が本明細書に援用される。
従って、デバイス60は、簡単な構造を有することができる。
Claims (11)
- 自身を通過する放射に対して透明な物質の連続体の形状を成す導波路であって、前記連続体が入射面および出射面を有する導波路と、
前記入射面および/または前記出射面を冷却するよう構成された冷却器であって、前記入射面および/または前記出射面を冷却する液体と、前記液体を保持するためのキャップと、を備える冷却器と、
加圧下で前記液体を保持するよう構成された加圧器と、
を備え、
前記加圧器は、
前記キャップ内でフレキシブルな膜により前記液体から分離されたガスポケットと、
前記ガスポケット中のガスを加圧するよう構成されたコンプレッサと、
を備えることを特徴とするデバイス。 - 前記導波路は、光ファイバを備えることを特徴とする請求項1に記載のデバイス。
- 前記液体は、前記導波路を通過する放射に対して透明であることを特徴とする請求項1または2に記載のデバイス。
- 前記液体は、1より大きく且つ前記物質の屈折率よりも小さい屈折率を有することを特徴とする請求項1から3のいずれかに記載のデバイス。
- 前記冷却器は、前記液体が前記入射面および/または前記出射面を横切って流れるような循環路を備えることを特徴とする請求項1から4のいずれかに記載のデバイス。
- 前記冷却器は、前記入射面および/または前記出射面の温度よりも高い温度に加熱するよう構成された加熱器を備えることを特徴とする請求項1から5のいずれかに記載のデバイス。
- 前記導波路に円偏光放射を供給するよう構成された放射源を備えることを特徴とする請求項1から6のいずれかに記載のデバイス。
- 約405nmの波長を有する放射を誘導するよう構成された請求項1から7のいずれかに記載のデバイス。
- 請求項1から8のいずれかに記載のデバイスを備える放射エミッタを有することを特徴とする露光装置。
- 固定部および可動部を備え、複数の放射ビームをパターンに基づいて選択されたターゲット上の位置に投影するよう構成された投影システムを備えることを特徴とする請求項9に記載の露光装置。
- 放射に対して透明な物質の連続体の形状を成す導波路を通して放射を誘導するステップであって、前記連続体が入射面および出射面を有するステップと、
キャップに保持された液体を用いて前記入射面および/または前記出射面を冷却するステップと、
前記キャップ内でフレキシブルな膜により前記液体から分離されたガスポケット中のガスを加圧することにより、前記液体を加圧するステップと、
を備えることを特徴とする放射誘導方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261602491P | 2012-02-23 | 2012-02-23 | |
US61/602,491 | 2012-02-23 | ||
PCT/EP2013/051355 WO2013124114A1 (en) | 2012-02-23 | 2013-01-24 | Device, lithographic apparatus, method for guiding radiation and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015510614A JP2015510614A (ja) | 2015-04-09 |
JP6042457B2 true JP6042457B2 (ja) | 2016-12-14 |
Family
ID=47664259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014558046A Expired - Fee Related JP6042457B2 (ja) | 2012-02-23 | 2013-01-24 | デバイス、露光装置および放射誘導方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9715183B2 (ja) |
JP (1) | JP6042457B2 (ja) |
KR (1) | KR101650830B1 (ja) |
CN (1) | CN104115068B (ja) |
IL (1) | IL233540A0 (ja) |
NL (1) | NL2010176A (ja) |
WO (1) | WO2013124114A1 (ja) |
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EP3177965A4 (en) * | 2014-08-07 | 2018-03-14 | Orbotech Ltd. | Lift printing system |
US10193004B2 (en) | 2014-10-19 | 2019-01-29 | Orbotech Ltd. | LIFT printing of conductive traces onto a semiconductor substrate |
CN107111205B (zh) | 2014-11-12 | 2020-12-15 | 奥宝科技有限公司 | 具有多个输出光束的声光偏光器 |
EP3247816A4 (en) | 2015-01-19 | 2018-01-24 | Orbotech Ltd. | Printing of three-dimensional metal structures with a sacrificial support |
WO2016116921A1 (en) * | 2015-01-21 | 2016-07-28 | Orbotech Ltd. | Angled lift jetting |
CN107849687B (zh) | 2015-07-09 | 2020-01-14 | 奥博泰克有限公司 | 对激光诱导正向转移喷射角度的控制 |
KR102546450B1 (ko) | 2015-11-22 | 2023-06-21 | 오르보테크 엘티디. | 프린팅된 3-차원 구조들의 표면 특성들의 제어 |
JP6866193B2 (ja) * | 2017-03-10 | 2021-04-28 | 東京応化工業株式会社 | 紫外線照射装置及び紫外線照射方法 |
TW201901887A (zh) | 2017-05-24 | 2019-01-01 | 以色列商奧寶科技股份有限公司 | 於未事先圖樣化基板上電器互連電路元件 |
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2013
- 2013-01-24 JP JP2014558046A patent/JP6042457B2/ja not_active Expired - Fee Related
- 2013-01-24 CN CN201380010004.1A patent/CN104115068B/zh not_active Expired - Fee Related
- 2013-01-24 WO PCT/EP2013/051355 patent/WO2013124114A1/en active Application Filing
- 2013-01-24 KR KR1020147019922A patent/KR101650830B1/ko active IP Right Grant
- 2013-01-24 NL NL2010176A patent/NL2010176A/en not_active Application Discontinuation
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CN104115068B (zh) | 2017-04-05 |
CN104115068A (zh) | 2014-10-22 |
WO2013124114A1 (en) | 2013-08-29 |
US9715183B2 (en) | 2017-07-25 |
KR20140107495A (ko) | 2014-09-04 |
US20140347641A1 (en) | 2014-11-27 |
IL233540A0 (en) | 2014-08-31 |
NL2010176A (en) | 2013-08-26 |
JP2015510614A (ja) | 2015-04-09 |
KR101650830B1 (ko) | 2016-08-24 |
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