AU6601996A - Lithography systems employing programmable reticles - Google Patents

Lithography systems employing programmable reticles

Info

Publication number
AU6601996A
AU6601996A AU66019/96A AU6601996A AU6601996A AU 6601996 A AU6601996 A AU 6601996A AU 66019/96 A AU66019/96 A AU 66019/96A AU 6601996 A AU6601996 A AU 6601996A AU 6601996 A AU6601996 A AU 6601996A
Authority
AU
Australia
Prior art keywords
reticles
systems employing
lithography systems
employing programmable
programmable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU66019/96A
Inventor
G. R. Padmanabhan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LSI Corp
Original Assignee
LSI Logic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LSI Logic Corp filed Critical LSI Logic Corp
Publication of AU6601996A publication Critical patent/AU6601996A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
AU66019/96A 1995-07-31 1996-07-25 Lithography systems employing programmable reticles Abandoned AU6601996A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US509530 1983-06-29
US50953095A 1995-07-31 1995-07-31
PCT/US1996/012330 WO1997005526A1 (en) 1995-07-31 1996-07-25 Lithography systems employing programmable reticles

Publications (1)

Publication Number Publication Date
AU6601996A true AU6601996A (en) 1997-02-26

Family

ID=24027009

Family Applications (1)

Application Number Title Priority Date Filing Date
AU66019/96A Abandoned AU6601996A (en) 1995-07-31 1996-07-25 Lithography systems employing programmable reticles

Country Status (2)

Country Link
AU (1) AU6601996A (en)
WO (1) WO1997005526A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU1975197A (en) * 1996-02-28 1997-10-01 Kenneth C. Johnson Microlens scanner for microlithography and wide-field confocal microscopy
US6489984B1 (en) 1998-12-29 2002-12-03 Kenneth C. Johnson Pixel cross talk suppression in digital microprinters
US6498685B1 (en) 1999-01-11 2002-12-24 Kenneth C. Johnson Maskless, microlens EUV lithography system
SE517345C2 (en) * 1999-01-18 2002-05-28 Micronic Laser Systems Ab Method and system for manufacturing large screen panels with improved precision
US6883158B1 (en) * 1999-05-20 2005-04-19 Micronic Laser Systems Ab Method for error reduction in lithography
US6624880B2 (en) 2001-01-18 2003-09-23 Micronic Laser Systems Ab Method and apparatus for microlithography
CN1791839A (en) 2001-11-07 2006-06-21 应用材料有限公司 Optical spot grid array printer
DE10354112B4 (en) * 2003-11-19 2008-07-31 Qimonda Ag Method and arrangement for repairing memory chips by means of micro-lithography method
US10670972B2 (en) 2014-06-13 2020-06-02 Infineon Technologies Ag Method and apparatus for exposing a structure on a substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013466A (en) * 1975-06-26 1977-03-22 Western Electric Company, Inc. Method of preparing a circuit utilizing a liquid crystal artwork master
JPS63129619A (en) * 1986-11-20 1988-06-02 Toshiba Corp Pattern exposure method and mask for exposure and transfer of pattern
JPS63159853A (en) * 1986-12-24 1988-07-02 Hitachi Ltd Reticle

Also Published As

Publication number Publication date
WO1997005526A1 (en) 1997-02-13

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