EP1102875B1 - Alkalisches zink-nickelbad - Google Patents
Alkalisches zink-nickelbad Download PDFInfo
- Publication number
- EP1102875B1 EP1102875B1 EP99940077A EP99940077A EP1102875B1 EP 1102875 B1 EP1102875 B1 EP 1102875B1 EP 99940077 A EP99940077 A EP 99940077A EP 99940077 A EP99940077 A EP 99940077A EP 1102875 B1 EP1102875 B1 EP 1102875B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- nickel
- anode
- zinc
- bath
- alkaline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Definitions
- the invention relates to an electroplating bath for applying zinc-nickel coatings with an anode, a cathode and an alkaline electrolyte.
- the alkaline zinc-nickel electroplating baths disclosed in German patent specification 37 12 511 have recently been used, which have the following composition, for example: 11.3 g / l ZnO 4.1 g / l NiSO 4 * 6H 2 O 120 g / l NaOH 5.1 g / l polyethyleneimine.
- the amines contained in the electroplating bath serve as complexing agents for the nickel ions, which are otherwise insoluble in the alkaline medium.
- the composition of the baths varies depending on the manufacturer.
- the electroplating baths are usually operated with insoluble nickel anodes.
- the zinc concentration is determined by adding zinc and the nickel concentration by adding a nickel solution, for example a nickel sulfate solution, kept constant.
- the formation of the second phase is due to a reaction of the amines, that in alkaline solution on nickel anodes to nitriles (among others can also be converted to cyanide). Due to the decomposition of the amines new complexing agents must also be continuously added to the bath, which drives up the cost of the process.
- Anodes other than nickel anodes cannot be used because of this dissolve in the alkaline electrolyte, which is also disadvantageous Effects on the quality of the coating.
- the problem underlying the invention is an alkaline one To create zinc-nickel electroplating bath, which is inexpensive zinc-nickel coatings delivers high quality.
- the invention proposes the anode of the to separate alkaline electrolyte through an ion exchange membrane.
- a cation exchange membrane has proven to be particularly advantageous made out of a perfluorinated polymer, since this has negligible electrical resistance, however have a high chemical and mechanical resistance.
- the zinc-nickel bath acts as a catholyte in the solution according to the invention.
- sulfuric or phosphoric acid can be used as the anolyte become.
- the anode material used in the electroplating cell according to the invention usual anodes, e.g. Platinized titanium anodes are eligible because of this are no longer exposed to the basic zinc-nickel bath.
- the 1 shows an electroplating cell 1, which has an anode 2 and a cathode 3, which is the workpiece to be coated.
- the the Catholyte 4 surrounding the cathode is alkaline and consists of a zinc-nickel electroplating bath known composition, in which as a complexing agent for Nickel ion amines are used.
- the anolyte 5 surrounding the anode 2 can consist for example of sulfuric or phosphoric acid.
- Anolyte 5 and catholyte 4 are separated from one another by a perfluorinated cation exchange membrane 6 Cut. This membrane 6 enables an unimpeded flow of current through the Bad, however, prevents the catholyte 4, especially those contained therein Amines, comes into contact with the anode 2, which results in the introduction to the description detailed reactions including their adverse effects be avoided.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Electrolytic Production Of Metals (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Description
11,3 | g/l ZnO |
4,1 | g/l NiSO4*6H2O |
120 | g/l NaOH |
5,1 | g/l Polyethylenimin. |
Claims (4)
- Alkalisches Galvanikbad (1) zum Aufbringen von Zink-Nickel-Überzügen mit einer Anode (2), einer Kathode (3) und einem alkalischen Katholyten (4) in dem Amine als Komplexbildner für die Nickelionen eingesetzt werden, dadurch gekennzeichnet, daß die Anode von dem alkalischen Katholyten durch eine lonenaustauschermembran (6) getrennt ist.
- Galvanikbad nach Anspruch 1, dadurch gekennzeichnet, daß die Anode (2) durch eine perfluorierte Kationenaustauschermembran (6) von dem alkalischen Katholyten (4) getrennt ist.
- Galvanikbad nach Anspruch 1 oder 2, gekennzeichnet durch Schwefelsäure, Phosphorsäure, Methansulfonsäure, Amidosulfonsäure und/oder Phosphonsäure als Anolyt (5).
- Galvanikbad nach einem der Ansprüche 1 bis 3, gekennzeichnet durch eine platinierte Titananode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03003890A EP1344850B1 (de) | 1998-07-30 | 1999-07-29 | Alkalisches Zink-Nickelbad |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19834353 | 1998-07-30 | ||
DE19834353A DE19834353C2 (de) | 1998-07-30 | 1998-07-30 | Alkalisches Zink-Nickelbad |
PCT/EP1999/005443 WO2000006807A2 (de) | 1998-07-30 | 1999-07-29 | Alkalisches zink-nickelbad |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03003890A Division EP1344850B1 (de) | 1998-07-30 | 1999-07-29 | Alkalisches Zink-Nickelbad |
EP03003890.5 Division-Into | 2003-02-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1102875A2 EP1102875A2 (de) | 2001-05-30 |
EP1102875B1 true EP1102875B1 (de) | 2003-06-11 |
Family
ID=7875843
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03003890A Expired - Lifetime EP1344850B1 (de) | 1998-07-30 | 1999-07-29 | Alkalisches Zink-Nickelbad |
EP99940077A Revoked EP1102875B1 (de) | 1998-07-30 | 1999-07-29 | Alkalisches zink-nickelbad |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03003890A Expired - Lifetime EP1344850B1 (de) | 1998-07-30 | 1999-07-29 | Alkalisches Zink-Nickelbad |
Country Status (22)
Country | Link |
---|---|
US (4) | US6602394B1 (de) |
EP (2) | EP1344850B1 (de) |
JP (2) | JP4716568B2 (de) |
KR (1) | KR20010071074A (de) |
CN (1) | CN1311830A (de) |
AT (2) | ATE242821T1 (de) |
AU (1) | AU5415299A (de) |
BG (1) | BG105184A (de) |
BR (1) | BR9912589A (de) |
CA (1) | CA2339144A1 (de) |
CZ (1) | CZ298904B6 (de) |
DE (3) | DE19834353C2 (de) |
EE (1) | EE200100059A (de) |
ES (2) | ES2277624T3 (de) |
HR (1) | HRP20010044B1 (de) |
HU (1) | HUP0103951A3 (de) |
IL (1) | IL141086A0 (de) |
MX (1) | MXPA01000932A (de) |
PL (1) | PL198149B1 (de) |
SK (1) | SK285453B6 (de) |
TR (1) | TR200100232T2 (de) |
WO (1) | WO2000006807A2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1712660A1 (de) | 2005-04-12 | 2006-10-18 | Enthone Inc. | Unlösliche Anode |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19834353C2 (de) * | 1998-07-30 | 2000-08-17 | Hillebrand Walter Gmbh & Co Kg | Alkalisches Zink-Nickelbad |
US8852417B2 (en) | 1999-04-13 | 2014-10-07 | Applied Materials, Inc. | Electrolytic process using anion permeable barrier |
US20060157355A1 (en) * | 2000-03-21 | 2006-07-20 | Semitool, Inc. | Electrolytic process using anion permeable barrier |
US8236159B2 (en) * | 1999-04-13 | 2012-08-07 | Applied Materials Inc. | Electrolytic process using cation permeable barrier |
US20060189129A1 (en) * | 2000-03-21 | 2006-08-24 | Semitool, Inc. | Method for applying metal features onto barrier layers using ion permeable barriers |
DE10026956A1 (de) * | 2000-05-30 | 2001-12-13 | Walter Hillebrand Galvanotechn | Zink-Legierungsbad |
US6755960B1 (en) | 2000-06-15 | 2004-06-29 | Taskem Inc. | Zinc-nickel electroplating |
ES2250166T5 (es) | 2000-06-15 | 2016-05-20 | Coventya Inc | Electrochapado de zinc-níquel |
US7628898B2 (en) * | 2001-03-12 | 2009-12-08 | Semitool, Inc. | Method and system for idle state operation |
DE10223622B4 (de) * | 2002-05-28 | 2005-12-08 | Walter Hillebrand Gmbh & Co. Kg Galvanotechnik | Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute |
US8377283B2 (en) | 2002-11-25 | 2013-02-19 | Coventya, Inc. | Zinc and zinc-alloy electroplating |
WO2004108995A1 (en) * | 2003-06-03 | 2004-12-16 | Taskem Inc. | Zinc and zinc-alloy electroplating |
DE10261493A1 (de) * | 2002-12-23 | 2004-07-08 | METAKEM Gesellschaft für Schichtchemie der Metalle mbH | Anode zur Galvanisierung |
US20050121332A1 (en) * | 2003-10-03 | 2005-06-09 | Kochilla John R. | Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation |
US20050133376A1 (en) * | 2003-12-19 | 2005-06-23 | Opaskar Vincent C. | Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom |
FR2864553B1 (fr) * | 2003-12-31 | 2006-09-01 | Coventya | Installation de depot de zinc ou d'alliages de zinc |
US7442286B2 (en) * | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
DE102004061255B4 (de) | 2004-12-20 | 2007-10-31 | Atotech Deutschland Gmbh | Verfahren für den kontinuierlichen Betrieb von sauren oder alkalischen Zink- oder Zinklegierungsbädern und Vorrichtung zur Durchführung desselben |
ES2574158T3 (es) * | 2005-04-26 | 2016-06-15 | Atotech Deutschland Gmbh | Baño galvánico alcalino con una membrana de filtración |
EP1717351A1 (de) * | 2005-04-27 | 2006-11-02 | Enthone Inc. | Galvanikbad |
JP4738910B2 (ja) * | 2005-06-21 | 2011-08-03 | 日本表面化学株式会社 | 亜鉛−ニッケル合金めっき方法 |
US20070043474A1 (en) * | 2005-08-17 | 2007-02-22 | Semitool, Inc. | Systems and methods for predicting process characteristics of an electrochemical treatment process |
DE102005051632B4 (de) * | 2005-10-28 | 2009-02-19 | Enthone Inc., West Haven | Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen |
JP4819612B2 (ja) * | 2006-08-07 | 2011-11-24 | ルネサスエレクトロニクス株式会社 | めっき処理装置および半導体装置の製造方法 |
DE102007040005A1 (de) | 2007-08-23 | 2009-02-26 | Ewh Industrieanlagen Gmbh & Co. Kg | Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad |
DE102007060200A1 (de) | 2007-12-14 | 2009-06-18 | Coventya Gmbh | Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad |
TWI384094B (zh) * | 2008-02-01 | 2013-02-01 | Zhen Ding Technology Co Ltd | 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置 |
EP2096193B1 (de) | 2008-02-21 | 2013-04-03 | Atotech Deutschland GmbH | Verfahren zur Herstellung von korrosionsresistentem Zink und Zink-Nickel-plattierten linearen oder komplex geformten Teilen |
DE102008058086B4 (de) | 2008-11-18 | 2013-05-23 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen |
KR100977068B1 (ko) * | 2010-01-25 | 2010-08-19 | 한용순 | 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액 |
EP2384800B1 (de) | 2010-05-07 | 2013-02-13 | Dr.Ing. Max Schlötter GmbH & Co. KG | Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen |
DE102010044551A1 (de) | 2010-09-07 | 2012-03-08 | Coventya Gmbh | Anode sowie deren Verwendung in einem alkalischen Galvanikbad |
EP2565297A3 (de) | 2011-08-30 | 2013-04-24 | Rohm and Haas Electronic Materials LLC | Haftungsförderung von cyanidfreier weißer Bronze |
CN103849915B (zh) * | 2012-12-06 | 2016-08-31 | 北大方正集团有限公司 | 电镀装置和pcb板导通孔镀铜的方法 |
CN103911650B (zh) * | 2014-04-02 | 2016-07-06 | 广东达志环保科技股份有限公司 | 一种应用于碱性锌镍合金电镀的阳极 |
DE202015002289U1 (de) | 2015-03-25 | 2015-05-06 | Hartmut Trenkner | Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen |
US10156020B2 (en) | 2015-07-22 | 2018-12-18 | Dipsol Chemicals Co., Ltd. | Zinc alloy plating method |
RU2613826C1 (ru) | 2015-07-22 | 2017-03-21 | Дипсол Кемикалз Ко., Лтд. | Способ гальваностегии цинковым сплавом |
WO2017171113A1 (ko) * | 2016-03-29 | 2017-10-05 | (주) 테크윈 | 전해조 및 전해 방법 |
CN106987879A (zh) * | 2016-11-23 | 2017-07-28 | 瑞尔太阳能投资有限公司 | 电沉积装置及其电沉积方法 |
EP3358045A1 (de) | 2017-02-07 | 2018-08-08 | Dr.Ing. Max Schlötter GmbH & Co. KG | Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen |
PT3415665T (pt) | 2017-06-14 | 2024-01-23 | Dr Ing Max Schloetter Gmbh & Co Kg | Processo para a deposição galvânica de revestimentos de zinco-níquel a partir de um banho alcalino de liga de zinco-alumínio com degradação reduzida de aditivos |
EP3914757B1 (de) | 2019-01-24 | 2023-04-05 | Atotech Deutschland GmbH & Co. KG | Verfahren zur elektrolytischen abscheidung von zink-nickel-legierungen unter verwendung eines membrananodensystems |
CN110462107A (zh) | 2019-02-15 | 2019-11-15 | 迪普索股份公司 | 锌或锌合金电镀方法和系统 |
JP6750186B1 (ja) | 2019-11-28 | 2020-09-02 | ユケン工業株式会社 | めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法 |
CN114787425A (zh) | 2019-12-20 | 2022-07-22 | 德国艾托特克有限两合公司 | 用于在衬底上沉积锌-镍合金的方法及系统 |
EP4273303A1 (de) | 2022-05-05 | 2023-11-08 | Atotech Deutschland GmbH & Co. KG | Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon |
CN115821346A (zh) * | 2022-11-16 | 2023-03-21 | 广州超邦化工有限公司 | 一种中碳钢机加件镀碱性锌镍合金的方法 |
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-
1998
- 1998-07-30 DE DE19834353A patent/DE19834353C2/de not_active Expired - Lifetime
-
1999
- 1999-07-24 US US09/744,706 patent/US6602394B1/en not_active Expired - Lifetime
- 1999-07-29 ES ES03003890T patent/ES2277624T3/es not_active Expired - Lifetime
- 1999-07-29 EP EP03003890A patent/EP1344850B1/de not_active Expired - Lifetime
- 1999-07-29 BR BR9912589-7A patent/BR9912589A/pt not_active Application Discontinuation
- 1999-07-29 AT AT99940077T patent/ATE242821T1/de active
- 1999-07-29 PL PL345970A patent/PL198149B1/pl unknown
- 1999-07-29 TR TR2001/00232T patent/TR200100232T2/xx unknown
- 1999-07-29 IL IL14108699A patent/IL141086A0/xx unknown
- 1999-07-29 MX MXPA01000932A patent/MXPA01000932A/es unknown
- 1999-07-29 EP EP99940077A patent/EP1102875B1/de not_active Revoked
- 1999-07-29 CN CN99809138A patent/CN1311830A/zh active Pending
- 1999-07-29 SK SK89-2001A patent/SK285453B6/sk not_active IP Right Cessation
- 1999-07-29 WO PCT/EP1999/005443 patent/WO2000006807A2/de active IP Right Grant
- 1999-07-29 ES ES99940077T patent/ES2201759T3/es not_active Expired - Lifetime
- 1999-07-29 HU HU0103951A patent/HUP0103951A3/hu unknown
- 1999-07-29 AT AT03003890T patent/ATE346180T1/de active
- 1999-07-29 DE DE59914011T patent/DE59914011D1/de not_active Expired - Lifetime
- 1999-07-29 AU AU54152/99A patent/AU5415299A/en not_active Abandoned
- 1999-07-29 CA CA002339144A patent/CA2339144A1/en not_active Abandoned
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- 1999-07-29 JP JP2000562585A patent/JP4716568B2/ja not_active Expired - Lifetime
- 1999-07-29 EE EEP200100059A patent/EE200100059A/xx unknown
- 1999-07-29 KR KR1020017001285A patent/KR20010071074A/ko not_active Application Discontinuation
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2001
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- 2001-01-25 BG BG105184A patent/BG105184A/xx unknown
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2003
- 2003-07-11 US US10/618,352 patent/US20040104123A1/en not_active Abandoned
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2008
- 2008-02-13 US US12/030,750 patent/US7807035B2/en not_active Expired - Lifetime
- 2008-03-18 JP JP2008069722A patent/JP2008150713A/ja active Pending
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2010
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1712660A1 (de) | 2005-04-12 | 2006-10-18 | Enthone Inc. | Unlösliche Anode |
US7666283B2 (en) | 2005-04-12 | 2010-02-23 | Enthone Inc. | Insoluble anode |
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