DE59905937D1 - Alkalisches zink-nickelbad - Google Patents

Alkalisches zink-nickelbad

Info

Publication number
DE59905937D1
DE59905937D1 DE59905937T DE59905937T DE59905937D1 DE 59905937 D1 DE59905937 D1 DE 59905937D1 DE 59905937 T DE59905937 T DE 59905937T DE 59905937 T DE59905937 T DE 59905937T DE 59905937 D1 DE59905937 D1 DE 59905937D1
Authority
DE
Germany
Prior art keywords
alkaline zinc
nickel bath
zinc nickel
alkaline
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59905937T
Other languages
English (en)
Inventor
Ernst-Walter Hillebrand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Walter Hillebrand & Co GmbH
Original Assignee
Walter Hillebrand & Co GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE59905937(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Walter Hillebrand & Co GmbH filed Critical Walter Hillebrand & Co GmbH
Application granted granted Critical
Publication of DE59905937D1 publication Critical patent/DE59905937D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
DE59905937T 1998-07-30 1999-07-29 Alkalisches zink-nickelbad Expired - Lifetime DE59905937D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19834353A DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad
PCT/EP1999/005443 WO2000006807A2 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad

Publications (1)

Publication Number Publication Date
DE59905937D1 true DE59905937D1 (de) 2003-07-17

Family

ID=7875843

Family Applications (3)

Application Number Title Priority Date Filing Date
DE19834353A Expired - Lifetime DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad
DE59905937T Expired - Lifetime DE59905937D1 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad
DE59914011T Expired - Lifetime DE59914011D1 (de) 1998-07-30 1999-07-29 Alkalisches Zink-Nickelbad

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19834353A Expired - Lifetime DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59914011T Expired - Lifetime DE59914011D1 (de) 1998-07-30 1999-07-29 Alkalisches Zink-Nickelbad

Country Status (22)

Country Link
US (4) US6602394B1 (de)
EP (2) EP1344850B1 (de)
JP (2) JP4716568B2 (de)
KR (1) KR20010071074A (de)
CN (1) CN1311830A (de)
AT (2) ATE242821T1 (de)
AU (1) AU5415299A (de)
BG (1) BG105184A (de)
BR (1) BR9912589A (de)
CA (1) CA2339144A1 (de)
CZ (1) CZ298904B6 (de)
DE (3) DE19834353C2 (de)
EE (1) EE200100059A (de)
ES (2) ES2277624T3 (de)
HR (1) HRP20010044B1 (de)
HU (1) HUP0103951A3 (de)
IL (1) IL141086A0 (de)
MX (1) MXPA01000932A (de)
PL (1) PL198149B1 (de)
SK (1) SK285453B6 (de)
TR (1) TR200100232T2 (de)
WO (1) WO2000006807A2 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
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DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US8852417B2 (en) 1999-04-13 2014-10-07 Applied Materials, Inc. Electrolytic process using anion permeable barrier
US8236159B2 (en) * 1999-04-13 2012-08-07 Applied Materials Inc. Electrolytic process using cation permeable barrier
US20060157355A1 (en) * 2000-03-21 2006-07-20 Semitool, Inc. Electrolytic process using anion permeable barrier
US20060189129A1 (en) * 2000-03-21 2006-08-24 Semitool, Inc. Method for applying metal features onto barrier layers using ion permeable barriers
DE10026956A1 (de) * 2000-05-30 2001-12-13 Walter Hillebrand Galvanotechn Zink-Legierungsbad
WO2001096631A1 (en) 2000-06-15 2001-12-20 Taskem Inc. Zinc-nickel electroplating
US6755960B1 (en) 2000-06-15 2004-06-29 Taskem Inc. Zinc-nickel electroplating
US7628898B2 (en) * 2001-03-12 2009-12-08 Semitool, Inc. Method and system for idle state operation
DE10223622B4 (de) * 2002-05-28 2005-12-08 Walter Hillebrand Gmbh & Co. Kg Galvanotechnik Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute
US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10261493A1 (de) * 2002-12-23 2004-07-08 METAKEM Gesellschaft für Schichtchemie der Metalle mbH Anode zur Galvanisierung
ES2609080T3 (es) * 2003-06-03 2017-04-18 Coventya, Inc. Revestimiento electrolítico de cinc y aleaciones de cinc
US20050121332A1 (en) * 2003-10-03 2005-06-09 Kochilla John R. Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation
US20050133376A1 (en) * 2003-12-19 2005-06-23 Opaskar Vincent C. Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
FR2864553B1 (fr) * 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE102004061255B4 (de) 2004-12-20 2007-10-31 Atotech Deutschland Gmbh Verfahren für den kontinuierlichen Betrieb von sauren oder alkalischen Zink- oder Zinklegierungsbädern und Vorrichtung zur Durchführung desselben
EP1712660A1 (de) * 2005-04-12 2006-10-18 Enthone Inc. Unlösliche Anode
ES2574158T3 (es) * 2005-04-26 2016-06-15 Atotech Deutschland Gmbh Baño galvánico alcalino con una membrana de filtración
EP1717351A1 (de) * 2005-04-27 2006-11-02 Enthone Inc. Galvanikbad
JP4738910B2 (ja) * 2005-06-21 2011-08-03 日本表面化学株式会社 亜鉛−ニッケル合金めっき方法
US20070043474A1 (en) * 2005-08-17 2007-02-22 Semitool, Inc. Systems and methods for predicting process characteristics of an electrochemical treatment process
DE102005051632B4 (de) * 2005-10-28 2009-02-19 Enthone Inc., West Haven Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
JP4819612B2 (ja) * 2006-08-07 2011-11-24 ルネサスエレクトロニクス株式会社 めっき処理装置および半導体装置の製造方法
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DE102007060200A1 (de) 2007-12-14 2009-06-18 Coventya Gmbh Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
TWI384094B (zh) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
EP2096193B1 (de) 2008-02-21 2013-04-03 Atotech Deutschland GmbH Verfahren zur Herstellung von korrosionsresistentem Zink und Zink-Nickel-plattierten linearen oder komplex geformten Teilen
DE102008058086B4 (de) 2008-11-18 2013-05-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
KR100977068B1 (ko) * 2010-01-25 2010-08-19 한용순 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
EP2384800B1 (de) 2010-05-07 2013-02-13 Dr.Ing. Max Schlötter GmbH & Co. KG Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen
DE102010044551A1 (de) 2010-09-07 2012-03-08 Coventya Gmbh Anode sowie deren Verwendung in einem alkalischen Galvanikbad
EP2565297A3 (de) 2011-08-30 2013-04-24 Rohm and Haas Electronic Materials LLC Haftungsförderung von cyanidfreier weißer Bronze
CN103849915B (zh) * 2012-12-06 2016-08-31 北大方正集团有限公司 电镀装置和pcb板导通孔镀铜的方法
CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
US9903038B2 (en) 2015-07-22 2018-02-27 Dipsol Chemicals Co., Ltd. Zinc alloy plating method
EP3042985B1 (de) 2015-07-22 2019-04-10 Dipsol Chemicals Co., Ltd. Zinklegierungsplattierungsverfahren
WO2017171113A1 (ko) * 2016-03-29 2017-10-05 (주) 테크윈 전해조 및 전해 방법
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3358045A1 (de) 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
PL3415665T3 (pl) 2017-06-14 2024-03-25 Dr.Ing. Max Schlötter Gmbh & Co. Kg Sposób osadzania galwanicznego powłok ze stopu cynku i niklu z alkalicznej kąpieli stopu cynku i niklu z ograniczoną degradacją dodatków
US20220119978A1 (en) 2019-01-24 2022-04-21 Atotech Deutschland Gmbh Membrane anode system for electrolytic zinc-nickel alloy deposition
CN110462107A (zh) 2019-02-15 2019-11-15 迪普索股份公司 锌或锌合金电镀方法和系统
JP6750186B1 (ja) 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
JP2023507479A (ja) 2019-12-20 2023-02-22 アトテック ドイチュラント ゲー・エム・ベー・ハー ウント コー． カー・ゲー 亜鉛ニッケル合金を基材上に堆積するための方法およびシステム
EP4273303A1 (de) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon

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Also Published As

Publication number Publication date
MXPA01000932A (es) 2002-06-04
US20080164150A1 (en) 2008-07-10
DE59914011D1 (de) 2007-01-04
EP1102875A2 (de) 2001-05-30
CZ2001189A3 (cs) 2001-08-15
WO2000006807A3 (de) 2000-05-04
HUP0103951A3 (en) 2003-05-28
JP2002521572A (ja) 2002-07-16
JP4716568B2 (ja) 2011-07-06
US8486235B2 (en) 2013-07-16
EP1102875B1 (de) 2003-06-11
PL198149B1 (pl) 2008-05-30
EP1344850A1 (de) 2003-09-17
HUP0103951A2 (hu) 2002-02-28
CA2339144A1 (en) 2000-02-10
ATE242821T1 (de) 2003-06-15
BR9912589A (pt) 2001-05-02
EE200100059A (et) 2002-10-15
DE19834353C2 (de) 2000-08-17
SK892001A3 (en) 2001-10-08
ES2277624T3 (es) 2007-07-16
AU5415299A (en) 2000-02-21
CN1311830A (zh) 2001-09-05
SK285453B6 (sk) 2007-01-04
US20110031127A1 (en) 2011-02-10
ATE346180T1 (de) 2006-12-15
BG105184A (en) 2001-10-31
EP1344850B1 (de) 2006-11-22
HRP20010044B1 (en) 2005-06-30
US20040104123A1 (en) 2004-06-03
WO2000006807A2 (de) 2000-02-10
DE19834353A1 (de) 2000-02-03
PL345970A1 (en) 2002-01-14
IL141086A0 (en) 2002-02-10
TR200100232T2 (tr) 2001-06-21
CZ298904B6 (cs) 2008-03-05
US6602394B1 (en) 2003-08-05
KR20010071074A (ko) 2001-07-28
JP2008150713A (ja) 2008-07-03
US7807035B2 (en) 2010-10-05
ES2201759T3 (es) 2004-03-16
HRP20010044A2 (en) 2001-12-31

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8363 Opposition against the patent