ATE429528T1 - Alkalisches galvanikbad mit einer filtrationsmembran - Google Patents

Alkalisches galvanikbad mit einer filtrationsmembran

Info

Publication number
ATE429528T1
ATE429528T1 AT05009127T AT05009127T ATE429528T1 AT E429528 T1 ATE429528 T1 AT E429528T1 AT 05009127 T AT05009127 T AT 05009127T AT 05009127 T AT05009127 T AT 05009127T AT E429528 T1 ATE429528 T1 AT E429528T1
Authority
AT
Austria
Prior art keywords
filtration membrane
galvanic bath
alkaline galvanic
alkaline
cathode
Prior art date
Application number
AT05009127T
Other languages
English (en)
Inventor
Karlheinz Arzt
Jens-Eric Geissler
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE429528(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Application granted granted Critical
Publication of ATE429528T1 publication Critical patent/ATE429528T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
AT05009127T 2005-04-26 2005-04-26 Alkalisches galvanikbad mit einer filtrationsmembran ATE429528T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05009127A EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Publications (1)

Publication Number Publication Date
ATE429528T1 true ATE429528T1 (de) 2009-05-15

Family

ID=35530823

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05009127T ATE429528T1 (de) 2005-04-26 2005-04-26 Alkalisches galvanikbad mit einer filtrationsmembran

Country Status (11)

Country Link
US (1) US8293092B2 (de)
EP (2) EP2050841B1 (de)
JP (1) JP4955657B2 (de)
KR (1) KR101301275B1 (de)
CN (3) CN101146934A (de)
AT (1) ATE429528T1 (de)
BR (1) BRPI0610765B1 (de)
CA (1) CA2600273C (de)
DE (1) DE502005007138D1 (de)
ES (2) ES2324169T3 (de)
WO (1) WO2006114305A1 (de)

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ITTO20070704A1 (it) * 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US8177944B2 (en) 2007-12-04 2012-05-15 Ebara Corporation Plating apparatus and plating method
DE102008056776A1 (de) 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
EP2384800B1 (de) 2010-05-07 2013-02-13 Dr.Ing. Max Schlötter GmbH & Co. KG Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen
IT1405319B1 (it) * 2010-12-27 2014-01-03 Fontana R D S R L Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) * 2012-10-12 2014-07-18 주식회사 익스톨 금속 도금장치
EP2784189A1 (de) 2013-03-28 2014-10-01 Coventya SAS Elektroplattierungsbad für Zink-Eisen-Legierungen, Verfahren zur Ablagerung von Zink-Eisen-Legierung auf einer Vorrichtung sowie solche Vorrichtung
CN106715763B (zh) 2015-03-13 2019-06-07 奥野制药工业株式会社 夹具用电解剥离剂
MX368366B (es) 2015-07-22 2019-09-30 Dipsol Chem Metodo de electrodeposicion de aleacion de zinc.
JP5830202B1 (ja) 2015-07-22 2015-12-09 ディップソール株式会社 亜鉛合金めっき方法
KR102399444B1 (ko) * 2016-05-24 2022-05-19 코벤트야 인크. 아연-니켈-철 3원 합금 및 이러한 합금 도금용 알칼리성 전해질
CA3032224A1 (en) 2016-07-29 2018-02-01 Simon Fraser University Methods of electrochemical deposition
EP3358045A1 (de) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
FI3415665T3 (fi) 2017-06-14 2024-02-06 Dr Ing Max Schloetter Gmbh & Co Kg Menetelmä sinkki-nikkeliseoskerroksien erottamiseksi galvaanisesti emäksisestä sinkki-nikkeliseoskylvystä vähemmällä lisäaineiden hajoamisella
ES2757530T3 (es) 2017-09-28 2020-04-29 Atotech Deutschland Gmbh Método para depositar electrolíticamente una capa de aleación de zinc-níquel sobre al menos un sustrato a tratar
US11165091B2 (en) 2018-01-23 2021-11-02 City University Of Hong Kong Battery system and a method of forming a battery
BR112021013239A2 (pt) * 2019-01-24 2021-09-14 Atotech Deutschland Gmbh Sistema de anodo de membrana para deposição de liga de níquel zinco eletrolítica
WO2020166062A1 (ja) 2019-02-15 2020-08-20 ディップソール株式会社 亜鉛又は亜鉛合金電気めっき方法及びシステム
RU2712582C1 (ru) * 2019-07-16 2020-01-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (de) * 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon

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US5417840A (en) 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
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JPH11200099A (ja) 1998-01-08 1999-07-27 Toyo Kohan Co Ltd 不溶性陽極を用いるめっき方法およびめっき装置
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE19840019C1 (de) 1998-09-02 2000-03-16 Atotech Deutschland Gmbh Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren
JP2000087299A (ja) * 1998-09-08 2000-03-28 Ebara Corp 基板メッキ装置
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
JP4060012B2 (ja) * 1999-07-19 2008-03-12 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき装置
ES2250166T5 (es) 2000-06-15 2016-05-20 Coventya Inc Electrochapado de zinc-níquel
FR2839729B1 (fr) * 2002-05-16 2005-02-11 Univ Toulouse Procede de protection d'un substrat en acier ou alliage d'aluminium contre la corrosion permettant de lui conferer des proprietes tribologiques, et substrat obtenu
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
EP1553211B1 (de) 2002-07-25 2014-04-02 Shinryo Corporation Zinn-silber-kupfer-metallabscheidungslösung, diese enthaltender metallabscheidungsfilm und verfahren zur herstellung des metallabscheidungsfilms
ES2609080T3 (es) * 2003-06-03 2017-04-18 Coventya, Inc. Revestimiento electrolítico de cinc y aleaciones de cinc
JP4120497B2 (ja) * 2003-06-27 2008-07-16 Ｊｆｅスチール株式会社 電気亜鉛系めっき鋼板
FR2864553B1 (fr) * 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

Also Published As

Publication number Publication date
CN101146934A (zh) 2008-03-19
EP1717353A1 (de) 2006-11-02
EP1717353B1 (de) 2009-04-22
BRPI0610765A2 (pt) 2010-07-20
DE502005007138D1 (de) 2009-06-04
CA2600273A1 (en) 2006-11-02
JP4955657B2 (ja) 2012-06-20
ES2324169T3 (es) 2009-07-31
KR20070122454A (ko) 2007-12-31
US8293092B2 (en) 2012-10-23
CN104911676B (zh) 2017-11-17
CA2600273C (en) 2014-08-12
EP2050841B1 (de) 2016-05-11
CN104911676A (zh) 2015-09-16
EP2050841A1 (de) 2009-04-22
ES2574158T3 (es) 2016-06-15
JP2008539329A (ja) 2008-11-13
CN104911651A (zh) 2015-09-16
KR101301275B1 (ko) 2013-08-29
US20090107845A1 (en) 2009-04-30
BRPI0610765B1 (pt) 2017-04-04
WO2006114305A1 (en) 2006-11-02

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