DE502005007138D1 - Alkalisches Galvanikbad mit einer Filtrationsmembran - Google Patents

Alkalisches Galvanikbad mit einer Filtrationsmembran

Info

Publication number
DE502005007138D1
DE502005007138D1 DE502005007138T DE502005007138T DE502005007138D1 DE 502005007138 D1 DE502005007138 D1 DE 502005007138D1 DE 502005007138 T DE502005007138 T DE 502005007138T DE 502005007138 T DE502005007138 T DE 502005007138T DE 502005007138 D1 DE502005007138 D1 DE 502005007138D1
Authority
DE
Germany
Prior art keywords
filtration membrane
electroplating bath
alkaline electroplating
alkaline
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE502005007138T
Other languages
English (en)
Inventor
Karlheinz Arzt
Jens-Eric Geissler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35530823&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE502005007138(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of DE502005007138D1 publication Critical patent/DE502005007138D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/06—Filtering particles other than ions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
DE502005007138T 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran Active DE502005007138D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05009127A EP1717353B1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Publications (1)

Publication Number Publication Date
DE502005007138D1 true DE502005007138D1 (de) 2009-06-04

Family

ID=35530823

Family Applications (1)

Application Number Title Priority Date Filing Date
DE502005007138T Active DE502005007138D1 (de) 2005-04-26 2005-04-26 Alkalisches Galvanikbad mit einer Filtrationsmembran

Country Status (11)

Country Link
US (1) US8293092B2 (de)
EP (2) EP1717353B1 (de)
JP (1) JP4955657B2 (de)
KR (1) KR101301275B1 (de)
CN (3) CN104911676B (de)
AT (1) ATE429528T1 (de)
BR (1) BRPI0610765B1 (de)
CA (1) CA2600273C (de)
DE (1) DE502005007138D1 (de)
ES (2) ES2324169T3 (de)
WO (1) WO2006114305A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090107545A1 (en) * 2006-10-09 2009-04-30 Soltaix, Inc. Template for pyramidal three-dimensional thin-film solar cell manufacturing and methods of use
ITTO20070704A1 (it) 2007-10-05 2009-04-06 Create New Technology S R L Sistema e metodo di placcatura di leghe metalliche mediante tecnologia galvanica
US8177944B2 (en) 2007-12-04 2012-05-15 Ebara Corporation Plating apparatus and plating method
DE102008056776A1 (de) 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
ES2404844T3 (es) 2010-05-07 2013-05-29 Dr.Ing. Max Schlötter Gmbh & Co. Kg Regeneración de electrolitos de cinc-níquel alcalinos mediante la eliminación de iones cianuro
IT1405319B1 (it) * 2010-12-27 2014-01-03 Fontana R D S R L Procedimento di rivestimento di pezzi metallici filettati
KR101420865B1 (ko) * 2012-10-12 2014-07-18 주식회사 익스톨 금속 도금장치
EP2784189A1 (de) 2013-03-28 2014-10-01 Coventya SAS Elektroplattierungsbad für Zink-Eisen-Legierungen, Verfahren zur Ablagerung von Zink-Eisen-Legierung auf einer Vorrichtung sowie solche Vorrichtung
JP6142408B2 (ja) 2015-03-13 2017-06-07 奥野製薬工業株式会社 治具用電解剥離剤
BR112015028629A2 (pt) * 2015-07-22 2017-07-25 Dipsol Chem método de eletrogalvanização de liga de zinco
EP3042985B1 (de) 2015-07-22 2019-04-10 Dipsol Chemicals Co., Ltd. Zinklegierungsplattierungsverfahren
CA3024991A1 (en) * 2016-05-24 2017-11-30 Coventya, Inc. Ternary zinc-nickel-iron alloys and alkaline electrolytes for plating such alloys
CA3032224A1 (en) * 2016-07-29 2018-02-01 Simon Fraser University Methods of electrochemical deposition
EP3358045A1 (de) * 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
ES2969188T3 (es) 2017-06-14 2024-05-16 Dr Ing Max Schloetter Gmbh & Co Kg Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos
EP3461933B1 (de) 2017-09-28 2019-09-04 ATOTECH Deutschland GmbH Verfahren zur elektrolytischen abscheidung einer schicht aus zink-nickel-legierung auf mindestens einem zu behandelnden substrat
US11165091B2 (en) 2018-01-23 2021-11-02 City University Of Hong Kong Battery system and a method of forming a battery
CA3127517A1 (en) * 2019-01-24 2020-07-30 Atotech Deutschland Gmbh Membrane anode system for electrolytic zinc-nickel alloy deposition
WO2020166062A1 (ja) 2019-02-15 2020-08-20 ディップソール株式会社 亜鉛又は亜鉛合金電気めっき方法及びシステム
RU2712582C1 (ru) * 2019-07-16 2020-01-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Ивановский государственный химико-технологический университет" Электролит для электроосаждения цинк-железных покрытий
EP4273303A1 (de) * 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon

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GB381931A (en) * 1931-07-11 1932-10-11 Mond Nickel Co Ltd Improvements relating to electro-plating and the electrodeposition of metals
US3945900A (en) 1972-05-02 1976-03-23 Dorr-Oliver Incorporated Electro ultrafiltration process and apparatus
IE39814B1 (en) * 1973-08-03 1979-01-03 Parel Sa Electrochemical process and apparatus
US4250002A (en) * 1979-09-19 1981-02-10 Hooker Chemicals & Plastics Corp. Polymeric microporous separators for use in electrolytic processes and devices
US4421611A (en) 1982-09-30 1983-12-20 Mcgean-Rohco, Inc. Acetylenic compositions and nickel plating baths containing same
JPS6353285A (ja) 1986-08-22 1988-03-07 Nippon Hyomen Kagaku Kk 亜鉛−ニツケル合金めつき液
JPH01116094A (ja) * 1987-10-28 1989-05-09 Eagle Ind Co Ltd 隔膜鍍金法
JPH02141596A (ja) * 1988-11-21 1990-05-30 Yuken Kogyo Kk ジンケート型亜鉛合金メッキ浴
JPH0444375A (ja) * 1990-06-12 1992-02-14 Zexel Corp レーザ共振器のアライメント装置
US5443727A (en) 1990-10-30 1995-08-22 Minnesota Mining And Manufacturing Company Articles having a polymeric shell and method for preparing same
US5082538A (en) 1991-01-09 1992-01-21 Eltech Systems Corporation Process for replenishing metals in aqueous electrolyte solutions
CN2175238Y (zh) * 1993-09-29 1994-08-24 北京科技大学 锌-镍合金电镀用阳极
US5417840A (en) 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US5631102A (en) * 1996-02-12 1997-05-20 Wilson Greatbatch Ltd. Separator insert for electrochemical cells
JPH11200099A (ja) 1998-01-08 1999-07-27 Toyo Kohan Co Ltd 不溶性陽極を用いるめっき方法およびめっき装置
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE19840019C1 (de) 1998-09-02 2000-03-16 Atotech Deutschland Gmbh Wäßriges alkalisches cyanidfreies Bad zur galvanischen Abscheidung von Zink- oder Zinklegierungsüberzügen sowie Verfahren
JP2000087299A (ja) * 1998-09-08 2000-03-28 Ebara Corp 基板メッキ装置
US6383352B1 (en) 1998-11-13 2002-05-07 Mykrolis Corporation Spiral anode for metal plating baths
JP4060012B2 (ja) * 1999-07-19 2008-03-12 日本エレクトロプレイテイング・エンジニヤース株式会社 カップ式めっき装置
DE60023190T3 (de) 2000-06-15 2016-03-10 Coventya, Inc. Zink-nickel-elektroplattierung
FR2839729B1 (fr) * 2002-05-16 2005-02-11 Univ Toulouse Procede de protection d'un substrat en acier ou alliage d'aluminium contre la corrosion permettant de lui conferer des proprietes tribologiques, et substrat obtenu
DE10225203A1 (de) 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
AU2003252677A1 (en) 2002-07-25 2004-02-16 Shinryo Electronics Co., Ltd. Tin-silver-copper plating solution, plating film containing the same, and method for forming the plating film
EP1639155B1 (de) 2003-06-03 2016-11-02 Coventya, Inc. Galvanische abscheidung von zink und zinklegierungen
JP4120497B2 (ja) * 2003-06-27 2008-07-16 Ｊｆｅスチール株式会社 電気亜鉛系めっき鋼板
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys

Also Published As

Publication number Publication date
JP2008539329A (ja) 2008-11-13
EP2050841B1 (de) 2016-05-11
US8293092B2 (en) 2012-10-23
BRPI0610765B1 (pt) 2017-04-04
JP4955657B2 (ja) 2012-06-20
ATE429528T1 (de) 2009-05-15
CN101146934A (zh) 2008-03-19
CN104911676B (zh) 2017-11-17
CN104911676A (zh) 2015-09-16
ES2324169T3 (es) 2009-07-31
EP1717353A1 (de) 2006-11-02
KR101301275B1 (ko) 2013-08-29
US20090107845A1 (en) 2009-04-30
CA2600273A1 (en) 2006-11-02
CA2600273C (en) 2014-08-12
EP2050841A1 (de) 2009-04-22
CN104911651A (zh) 2015-09-16
WO2006114305A1 (en) 2006-11-02
ES2574158T3 (es) 2016-06-15
BRPI0610765A2 (pt) 2010-07-20
KR20070122454A (ko) 2007-12-31
EP1717353B1 (de) 2009-04-22

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