ATE346180T1 - Alkalisches zink-nickelbad - Google Patents

Alkalisches zink-nickelbad

Info

Publication number
ATE346180T1
ATE346180T1 AT03003890T AT03003890T ATE346180T1 AT E346180 T1 ATE346180 T1 AT E346180T1 AT 03003890 T AT03003890 T AT 03003890T AT 03003890 T AT03003890 T AT 03003890T AT E346180 T1 ATE346180 T1 AT E346180T1
Authority
AT
Austria
Prior art keywords
alkaline zinc
nickel bath
alkaline
zinc
anode
Prior art date
Application number
AT03003890T
Other languages
English (en)
Inventor
Ernst-Walter Hillebrand
Original Assignee
Walter Hillebrand Gmbh & Co Ga
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE346180(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Walter Hillebrand Gmbh & Co Ga filed Critical Walter Hillebrand Gmbh & Co Ga
Application granted granted Critical
Publication of ATE346180T1 publication Critical patent/ATE346180T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
AT03003890T 1998-07-30 1999-07-29 Alkalisches zink-nickelbad ATE346180T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19834353A DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad

Publications (1)

Publication Number Publication Date
ATE346180T1 true ATE346180T1 (de) 2006-12-15

Family

ID=7875843

Family Applications (2)

Application Number Title Priority Date Filing Date
AT99940077T ATE242821T1 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad
AT03003890T ATE346180T1 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT99940077T ATE242821T1 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad

Country Status (22)

Country Link
US (4) US6602394B1 (de)
EP (2) EP1102875B1 (de)
JP (2) JP4716568B2 (de)
KR (1) KR20010071074A (de)
CN (1) CN1311830A (de)
AT (2) ATE242821T1 (de)
AU (1) AU5415299A (de)
BG (1) BG105184A (de)
BR (1) BR9912589A (de)
CA (1) CA2339144A1 (de)
CZ (1) CZ298904B6 (de)
DE (3) DE19834353C2 (de)
EE (1) EE200100059A (de)
ES (2) ES2277624T3 (de)
HR (1) HRP20010044B1 (de)
HU (1) HUP0103951A3 (de)
IL (1) IL141086A0 (de)
MX (1) MXPA01000932A (de)
PL (1) PL198149B1 (de)
SK (1) SK285453B6 (de)
TR (1) TR200100232T2 (de)
WO (1) WO2000006807A2 (de)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
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DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US8852417B2 (en) 1999-04-13 2014-10-07 Applied Materials, Inc. Electrolytic process using anion permeable barrier
US20060157355A1 (en) * 2000-03-21 2006-07-20 Semitool, Inc. Electrolytic process using anion permeable barrier
US8236159B2 (en) 1999-04-13 2012-08-07 Applied Materials Inc. Electrolytic process using cation permeable barrier
US20060189129A1 (en) * 2000-03-21 2006-08-24 Semitool, Inc. Method for applying metal features onto barrier layers using ion permeable barriers
DE10026956A1 (de) * 2000-05-30 2001-12-13 Walter Hillebrand Galvanotechn Zink-Legierungsbad
US6755960B1 (en) 2000-06-15 2004-06-29 Taskem Inc. Zinc-nickel electroplating
ATE306572T1 (de) 2000-06-15 2005-10-15 Taskem Inc Zink-nickel-elektroplattierung
US7628898B2 (en) * 2001-03-12 2009-12-08 Semitool, Inc. Method and system for idle state operation
DE10223622B4 (de) * 2002-05-28 2005-12-08 Walter Hillebrand Gmbh & Co. Kg Galvanotechnik Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute
US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10261493A1 (de) * 2002-12-23 2004-07-08 METAKEM Gesellschaft für Schichtchemie der Metalle mbH Anode zur Galvanisierung
AU2003239929A1 (en) * 2003-06-03 2005-01-04 Coventya Sas Zinc and zinc-alloy electroplating
US20050121332A1 (en) * 2003-10-03 2005-06-09 Kochilla John R. Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation
US20050133376A1 (en) * 2003-12-19 2005-06-23 Opaskar Vincent C. Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
FR2864553B1 (fr) * 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE102004061255B4 (de) * 2004-12-20 2007-10-31 Atotech Deutschland Gmbh Verfahren für den kontinuierlichen Betrieb von sauren oder alkalischen Zink- oder Zinklegierungsbädern und Vorrichtung zur Durchführung desselben
EP1712660A1 (de) * 2005-04-12 2006-10-18 Enthone Inc. Unlösliche Anode
ES2574158T3 (es) * 2005-04-26 2016-06-15 Atotech Deutschland Gmbh Baño galvánico alcalino con una membrana de filtración
EP1717351A1 (de) * 2005-04-27 2006-11-02 Enthone Inc. Galvanikbad
JP4738910B2 (ja) * 2005-06-21 2011-08-03 日本表面化学株式会社 亜鉛−ニッケル合金めっき方法
US20070043474A1 (en) * 2005-08-17 2007-02-22 Semitool, Inc. Systems and methods for predicting process characteristics of an electrochemical treatment process
DE102005051632B4 (de) * 2005-10-28 2009-02-19 Enthone Inc., West Haven Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
JP4819612B2 (ja) * 2006-08-07 2011-11-24 ルネサスエレクトロニクス株式会社 めっき処理装置および半導体装置の製造方法
DE102007040005A1 (de) 2007-08-23 2009-02-26 Ewh Industrieanlagen Gmbh & Co. Kg Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad
DE102007060200A1 (de) 2007-12-14 2009-06-18 Coventya Gmbh Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
TWI384094B (zh) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
EP2096193B1 (de) 2008-02-21 2013-04-03 Atotech Deutschland GmbH Verfahren zur Herstellung von korrosionsresistentem Zink und Zink-Nickel-plattierten linearen oder komplex geformten Teilen
DE102008058086B4 (de) 2008-11-18 2013-05-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
KR100977068B1 (ko) * 2010-01-25 2010-08-19 한용순 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
PL2384800T3 (pl) 2010-05-07 2013-07-31 Dr Ing Max Schloetter Gmbh & Co Kg Regeneracja alkalicznych elektrolitów cynkowo-niklowych drogą usuwania jonów cynkowych
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EP2738290A1 (de) 2011-08-30 2014-06-04 Rohm and Haas Electronic Materials LLC Haftungsförderung von cyanidfreier weißer Bronze
CN103849915B (zh) * 2012-12-06 2016-08-31 北大方正集团有限公司 电镀装置和pcb板导通孔镀铜的方法
CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
KR101622528B1 (ko) 2015-07-22 2016-05-18 딥솔 가부시키가이샤 아연 합금 도금 방법
MX368366B (es) 2015-07-22 2019-09-30 Dipsol Chem Metodo de electrodeposicion de aleacion de zinc.
WO2017171113A1 (ko) * 2016-03-29 2017-10-05 (주) 테크윈 전해조 및 전해 방법
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3358045A1 (de) 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
HUE065554T2 (hu) 2017-06-14 2024-06-28 Dr Ing Max Schloetter Gmbh & Co Kg Eljárás cink-nikkel ötvözet rétegek elektrolitikus lecsapására egy alkálikus cink-nikkel ötvözet fürdõbõl adalékok korlátozott lebomlása mellett
MX2021008925A (es) * 2019-01-24 2021-08-24 Atotech Deutschland Gmbh Sistema de anodo de membrana para deposito electrolitico de aleacion de cinc-niquel.
EP3715506A4 (de) 2019-02-15 2021-04-14 Dipsol Chemicals Co., Ltd. Zink- oder zinklegierungen elektropliermethode und -system
JP6750186B1 (ja) 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
US11946152B2 (en) 2019-12-20 2024-04-02 Atotech Deutschland GmbH & Co. KG Method and system for depositing a zinc-nickel alloy on a substrate
EP4273303A1 (de) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon
CN115821346A (zh) * 2022-11-16 2023-03-21 广州超邦化工有限公司 一种中碳钢机加件镀碱性锌镍合金的方法

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Also Published As

Publication number Publication date
MXPA01000932A (es) 2002-06-04
US7807035B2 (en) 2010-10-05
DE19834353A1 (de) 2000-02-03
HRP20010044A2 (en) 2001-12-31
IL141086A0 (en) 2002-02-10
WO2000006807A3 (de) 2000-05-04
CZ298904B6 (cs) 2008-03-05
JP2008150713A (ja) 2008-07-03
WO2000006807A2 (de) 2000-02-10
HUP0103951A2 (hu) 2002-02-28
CZ2001189A3 (cs) 2001-08-15
JP2002521572A (ja) 2002-07-16
DE59905937D1 (de) 2003-07-17
US20110031127A1 (en) 2011-02-10
AU5415299A (en) 2000-02-21
BG105184A (en) 2001-10-31
US20080164150A1 (en) 2008-07-10
BR9912589A (pt) 2001-05-02
CA2339144A1 (en) 2000-02-10
TR200100232T2 (tr) 2001-06-21
ATE242821T1 (de) 2003-06-15
DE19834353C2 (de) 2000-08-17
SK285453B6 (sk) 2007-01-04
EP1344850B1 (de) 2006-11-22
US20040104123A1 (en) 2004-06-03
ES2201759T3 (es) 2004-03-16
EP1102875A2 (de) 2001-05-30
CN1311830A (zh) 2001-09-05
HRP20010044B1 (en) 2005-06-30
US8486235B2 (en) 2013-07-16
SK892001A3 (en) 2001-10-08
EE200100059A (et) 2002-10-15
PL345970A1 (en) 2002-01-14
KR20010071074A (ko) 2001-07-28
EP1102875B1 (de) 2003-06-11
EP1344850A1 (de) 2003-09-17
HUP0103951A3 (en) 2003-05-28
PL198149B1 (pl) 2008-05-30
ES2277624T3 (es) 2007-07-16
JP4716568B2 (ja) 2011-07-06
DE59914011D1 (de) 2007-01-04
US6602394B1 (en) 2003-08-05

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