DK1080252T3 - Fremgangsmåde til elektrolytisk kobberplettering af substrater - Google Patents

Fremgangsmåde til elektrolytisk kobberplettering af substrater

Info

Publication number
DK1080252T3
DK1080252T3 DK99952102T DK99952102T DK1080252T3 DK 1080252 T3 DK1080252 T3 DK 1080252T3 DK 99952102 T DK99952102 T DK 99952102T DK 99952102 T DK99952102 T DK 99952102T DK 1080252 T3 DK1080252 T3 DK 1080252T3
Authority
DK
Denmark
Prior art keywords
copper
substrates
copper plating
electrolytic copper
separate
Prior art date
Application number
DK99952102T
Other languages
English (en)
Inventor
Juergen Hupe
Walter Kronenberg
Eugen Breitkreuz
Ulrich Schmergel
Original Assignee
Blasberg Oberflaechentech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Blasberg Oberflaechentech filed Critical Blasberg Oberflaechentech
Application granted granted Critical
Publication of DK1080252T3 publication Critical patent/DK1080252T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
DK99952102T 1998-05-16 1999-05-14 Fremgangsmåde til elektrolytisk kobberplettering af substrater DK1080252T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19822076 1998-05-16
PCT/EP1999/003321 WO1999060188A2 (de) 1998-05-16 1999-05-14 Verfahren zur galvanischen verkupferung von substraten

Publications (1)

Publication Number Publication Date
DK1080252T3 true DK1080252T3 (da) 2003-01-06

Family

ID=7868038

Family Applications (1)

Application Number Title Priority Date Filing Date
DK99952102T DK1080252T3 (da) 1998-05-16 1999-05-14 Fremgangsmåde til elektrolytisk kobberplettering af substrater

Country Status (22)

Country Link
US (1) US6576111B1 (da)
EP (1) EP1080252B1 (da)
JP (1) JP2002515549A (da)
KR (1) KR100545664B1 (da)
CN (1) CN1170965C (da)
AT (1) ATE221930T1 (da)
AU (1) AU4261799A (da)
CA (1) CA2331750A1 (da)
DE (1) DE59902276D1 (da)
DK (1) DK1080252T3 (da)
HU (1) HUP0102016A3 (da)
IL (1) IL139418A0 (da)
IS (1) IS5703A (da)
NO (1) NO20005777L (da)
PL (1) PL344529A1 (da)
RO (1) RO119838B1 (da)
RU (1) RU2222643C2 (da)
SK (1) SK16912000A3 (da)
TR (1) TR200003368T2 (da)
WO (1) WO1999060188A2 (da)
YU (1) YU70900A (da)
ZA (1) ZA200006624B (da)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3725083B2 (ja) * 2002-02-21 2005-12-07 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング メッキ設備における金属イオン供給源の有効保存を可能とする方法
US7776741B2 (en) 2008-08-18 2010-08-17 Novellus Systems, Inc. Process for through silicon via filing
US10472730B2 (en) 2009-10-12 2019-11-12 Novellus Systems, Inc. Electrolyte concentration control system for high rate electroplating
US9109295B2 (en) * 2009-10-12 2015-08-18 Novellus Systems, Inc. Electrolyte concentration control system for high rate electroplating
CN107636209B (zh) * 2015-06-26 2021-07-02 住友金属矿山股份有限公司 导电性基板
US10692735B2 (en) 2017-07-28 2020-06-23 Lam Research Corporation Electro-oxidative metal removal in through mask interconnect fabrication

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0137397B1 (de) * 1983-09-28 1990-08-29 Blasberg-Oberflächentechnik GmbH Saures galvanisches Kupferbad und Verfahren zu seiner Herstellung
JPS62112996A (ja) * 1985-11-11 1987-05-23 Mitsubishi Metal Corp 伝熱体
DE4001960A1 (de) * 1990-01-24 1991-07-25 Roland Schnetteler Verfahren zum elektrochemischen beschichten von stahlbaendern mit zink-nickellegierungen
JPH04320088A (ja) * 1991-04-18 1992-11-10 Cmk Corp プリント配線板の製造方法

Also Published As

Publication number Publication date
KR100545664B1 (ko) 2006-01-24
EP1080252A1 (de) 2001-03-07
PL344529A1 (en) 2001-11-05
HUP0102016A2 (hu) 2001-09-28
HUP0102016A3 (en) 2002-03-28
NO20005777D0 (no) 2000-11-15
TR200003368T2 (tr) 2001-04-20
SK16912000A3 (sk) 2001-08-06
AU4261799A (en) 1999-12-06
WO1999060188A2 (de) 1999-11-25
CN1170965C (zh) 2004-10-13
RU2222643C2 (ru) 2004-01-27
IL139418A0 (en) 2001-11-25
CA2331750A1 (en) 1999-11-25
WO1999060188A3 (de) 2000-01-13
EP1080252B1 (de) 2002-08-07
NO20005777L (no) 2000-11-15
IS5703A (is) 2000-11-02
JP2002515549A (ja) 2002-05-28
CN1301313A (zh) 2001-06-27
YU70900A (sh) 2003-02-28
ZA200006624B (en) 2001-06-01
KR20010043597A (ko) 2001-05-25
RO119838B1 (ro) 2005-04-29
DE59902276D1 (de) 2002-09-12
ATE221930T1 (de) 2002-08-15
US6576111B1 (en) 2003-06-10

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