HUP0102016A2 - Eljárás szubsztrátumok rézzel való bevonására - Google Patents
Eljárás szubsztrátumok rézzel való bevonásáraInfo
- Publication number
- HUP0102016A2 HUP0102016A2 HU0102016A HUP0102016A HUP0102016A2 HU P0102016 A2 HUP0102016 A2 HU P0102016A2 HU 0102016 A HU0102016 A HU 0102016A HU P0102016 A HUP0102016 A HU P0102016A HU P0102016 A2 HUP0102016 A2 HU P0102016A2
- Authority
- HU
- Hungary
- Prior art keywords
- copper
- separate
- substrates
- copperplating
- copper ions
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract 2
- 229940116318 copper carbonate Drugs 0.000 abstract 2
- 229910001431 copper ion Inorganic materials 0.000 abstract 2
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 1
- 239000001569 carbon dioxide Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Automation & Control Theory (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Optical Integrated Circuits (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- ing And Chemical Polishing (AREA)
Abstract
A találmány tárgya: eljárás szubsztrátumok rézzel való bevonásáraoldhatatlan anódok alkalmazásával savas fürdőben, az elfogyott rézionok külön történő pótlásával, amelyre jellemző, hogy a réz ionoknagyobb hányadát közvetlenül viszik be rézkarbonát és/vagy bázisosréz-karbonát alakjában, diafragmák és segéd elektrolitok nélkül éskülön tankot üzemeltetve bypass üzemmódban a munka elektrolithozképest. Ebben a külön tankban különítik el a felszabadult szén-dioxidgázt. Ó
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19822076 | 1998-05-16 | ||
PCT/EP1999/003321 WO1999060188A2 (de) | 1998-05-16 | 1999-05-14 | Verfahren zur galvanischen verkupferung von substraten |
Publications (2)
Publication Number | Publication Date |
---|---|
HUP0102016A2 true HUP0102016A2 (hu) | 2001-09-28 |
HUP0102016A3 HUP0102016A3 (en) | 2002-03-28 |
Family
ID=7868038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HU0102016A HUP0102016A3 (en) | 1998-05-16 | 1999-05-14 | Method for copperplating substrates |
Country Status (22)
Country | Link |
---|---|
US (1) | US6576111B1 (hu) |
EP (1) | EP1080252B1 (hu) |
JP (1) | JP2002515549A (hu) |
KR (1) | KR100545664B1 (hu) |
CN (1) | CN1170965C (hu) |
AT (1) | ATE221930T1 (hu) |
AU (1) | AU4261799A (hu) |
CA (1) | CA2331750A1 (hu) |
DE (1) | DE59902276D1 (hu) |
DK (1) | DK1080252T3 (hu) |
HU (1) | HUP0102016A3 (hu) |
IL (1) | IL139418A0 (hu) |
IS (1) | IS5703A (hu) |
NO (1) | NO20005777L (hu) |
PL (1) | PL344529A1 (hu) |
RO (1) | RO119838B1 (hu) |
RU (1) | RU2222643C2 (hu) |
SK (1) | SK16912000A3 (hu) |
TR (1) | TR200003368T2 (hu) |
WO (1) | WO1999060188A2 (hu) |
YU (1) | YU70900A (hu) |
ZA (1) | ZA200006624B (hu) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3725083B2 (ja) * | 2002-02-21 | 2005-12-07 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | メッキ設備における金属イオン供給源の有効保存を可能とする方法 |
US7776741B2 (en) | 2008-08-18 | 2010-08-17 | Novellus Systems, Inc. | Process for through silicon via filing |
US10472730B2 (en) | 2009-10-12 | 2019-11-12 | Novellus Systems, Inc. | Electrolyte concentration control system for high rate electroplating |
US9109295B2 (en) * | 2009-10-12 | 2015-08-18 | Novellus Systems, Inc. | Electrolyte concentration control system for high rate electroplating |
CN107636209B (zh) * | 2015-06-26 | 2021-07-02 | 住友金属矿山股份有限公司 | 导电性基板 |
US10692735B2 (en) | 2017-07-28 | 2020-06-23 | Lam Research Corporation | Electro-oxidative metal removal in through mask interconnect fabrication |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0137397B1 (de) * | 1983-09-28 | 1990-08-29 | Blasberg-Oberflächentechnik GmbH | Saures galvanisches Kupferbad und Verfahren zu seiner Herstellung |
JPS62112996A (ja) * | 1985-11-11 | 1987-05-23 | Mitsubishi Metal Corp | 伝熱体 |
DE4001960A1 (de) * | 1990-01-24 | 1991-07-25 | Roland Schnetteler | Verfahren zum elektrochemischen beschichten von stahlbaendern mit zink-nickellegierungen |
JPH04320088A (ja) * | 1991-04-18 | 1992-11-10 | Cmk Corp | プリント配線板の製造方法 |
-
1999
- 1999-05-14 IL IL13941899A patent/IL139418A0/xx unknown
- 1999-05-14 KR KR1020007012742A patent/KR100545664B1/ko not_active IP Right Cessation
- 1999-05-14 SK SK1691-2000A patent/SK16912000A3/sk unknown
- 1999-05-14 CA CA002331750A patent/CA2331750A1/en not_active Abandoned
- 1999-05-14 RU RU2000131604/02A patent/RU2222643C2/ru not_active IP Right Cessation
- 1999-05-14 AU AU42617/99A patent/AU4261799A/en not_active Abandoned
- 1999-05-14 YU YU70900A patent/YU70900A/sh unknown
- 1999-05-14 JP JP2000549788A patent/JP2002515549A/ja active Pending
- 1999-05-14 HU HU0102016A patent/HUP0102016A3/hu unknown
- 1999-05-14 CN CNB998062502A patent/CN1170965C/zh not_active Expired - Fee Related
- 1999-05-14 RO ROA200001121A patent/RO119838B1/ro unknown
- 1999-05-14 PL PL99344529A patent/PL344529A1/xx unknown
- 1999-05-14 TR TR2000/03368T patent/TR200003368T2/xx unknown
- 1999-05-14 AT AT99952102T patent/ATE221930T1/de not_active IP Right Cessation
- 1999-05-14 DK DK99952102T patent/DK1080252T3/da active
- 1999-05-14 WO PCT/EP1999/003321 patent/WO1999060188A2/de active IP Right Grant
- 1999-05-14 EP EP99952102A patent/EP1080252B1/de not_active Expired - Lifetime
- 1999-05-14 DE DE59902276T patent/DE59902276D1/de not_active Expired - Lifetime
- 1999-05-14 US US09/674,509 patent/US6576111B1/en not_active Expired - Fee Related
-
2000
- 2000-11-02 IS IS5703A patent/IS5703A/is unknown
- 2000-11-15 NO NO20005777A patent/NO20005777L/no not_active Application Discontinuation
- 2000-11-15 ZA ZA200006624A patent/ZA200006624B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
KR100545664B1 (ko) | 2006-01-24 |
EP1080252A1 (de) | 2001-03-07 |
PL344529A1 (en) | 2001-11-05 |
HUP0102016A3 (en) | 2002-03-28 |
NO20005777D0 (no) | 2000-11-15 |
TR200003368T2 (tr) | 2001-04-20 |
SK16912000A3 (sk) | 2001-08-06 |
AU4261799A (en) | 1999-12-06 |
WO1999060188A2 (de) | 1999-11-25 |
CN1170965C (zh) | 2004-10-13 |
RU2222643C2 (ru) | 2004-01-27 |
DK1080252T3 (da) | 2003-01-06 |
IL139418A0 (en) | 2001-11-25 |
CA2331750A1 (en) | 1999-11-25 |
WO1999060188A3 (de) | 2000-01-13 |
EP1080252B1 (de) | 2002-08-07 |
NO20005777L (no) | 2000-11-15 |
IS5703A (is) | 2000-11-02 |
JP2002515549A (ja) | 2002-05-28 |
CN1301313A (zh) | 2001-06-27 |
YU70900A (sh) | 2003-02-28 |
ZA200006624B (en) | 2001-06-01 |
KR20010043597A (ko) | 2001-05-25 |
RO119838B1 (ro) | 2005-04-29 |
DE59902276D1 (de) | 2002-09-12 |
ATE221930T1 (de) | 2002-08-15 |
US6576111B1 (en) | 2003-06-10 |
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