TR200100232T2 - Alkalik çinko-nikel banyosu. - Google Patents

Alkalik çinko-nikel banyosu.

Info

Publication number
TR200100232T2
TR200100232T2 TR2001/00232T TR200100232T TR200100232T2 TR 200100232 T2 TR200100232 T2 TR 200100232T2 TR 2001/00232 T TR2001/00232 T TR 2001/00232T TR 200100232 T TR200100232 T TR 200100232T TR 200100232 T2 TR200100232 T2 TR 200100232T2
Authority
TR
Turkey
Prior art keywords
nickel bath
alkaline zinc
alkaline
zinc
bath
Prior art date
Application number
TR2001/00232T
Other languages
English (en)
Inventor
Hillebrand Ernst-Walter
Original Assignee
Walter Hillebrand Gmbh & Co.Galvanotechnik
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TR200100232(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Walter Hillebrand Gmbh & Co.Galvanotechnik filed Critical Walter Hillebrand Gmbh & Co.Galvanotechnik
Publication of TR200100232T2 publication Critical patent/TR200100232T2/tr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)

Abstract

Alkalik bir çinko-nikel banyoda arzu edilmeyen yan reaksiyonlarin önlenmesi için, anodun alkalit elektrolitten ayrilmasi önerilmektedir.
TR2001/00232T 1998-07-30 1999-07-29 Alkalik çinko-nikel banyosu. TR200100232T2 (tr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19834353A DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad

Publications (1)

Publication Number Publication Date
TR200100232T2 true TR200100232T2 (tr) 2001-06-21

Family

ID=7875843

Family Applications (1)

Application Number Title Priority Date Filing Date
TR2001/00232T TR200100232T2 (tr) 1998-07-30 1999-07-29 Alkalik çinko-nikel banyosu.

Country Status (22)

Country Link
US (4) US6602394B1 (tr)
EP (2) EP1102875B1 (tr)
JP (2) JP4716568B2 (tr)
KR (1) KR20010071074A (tr)
CN (1) CN1311830A (tr)
AT (2) ATE242821T1 (tr)
AU (1) AU5415299A (tr)
BG (1) BG105184A (tr)
BR (1) BR9912589A (tr)
CA (1) CA2339144A1 (tr)
CZ (1) CZ298904B6 (tr)
DE (3) DE19834353C2 (tr)
EE (1) EE200100059A (tr)
ES (2) ES2277624T3 (tr)
HR (1) HRP20010044B1 (tr)
HU (1) HUP0103951A3 (tr)
IL (1) IL141086A0 (tr)
MX (1) MXPA01000932A (tr)
PL (1) PL198149B1 (tr)
SK (1) SK285453B6 (tr)
TR (1) TR200100232T2 (tr)
WO (1) WO2000006807A2 (tr)

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ATE306572T1 (de) † 2000-06-15 2005-10-15 Taskem Inc Zink-nickel-elektroplattierung
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US7628898B2 (en) * 2001-03-12 2009-12-08 Semitool, Inc. Method and system for idle state operation
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US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
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US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
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KR100977068B1 (ko) * 2010-01-25 2010-08-19 한용순 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
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CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
BR112015028629A2 (pt) 2015-07-22 2017-07-25 Dipsol Chem método de eletrogalvanização de liga de zinco
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WO2017171113A1 (ko) * 2016-03-29 2017-10-05 (주) 테크윈 전해조 및 전해 방법
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3358045A1 (de) 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
HUE065554T2 (hu) 2017-06-14 2024-06-28 Dr Ing Max Schloetter Gmbh & Co Kg Eljárás cink-nikkel ötvözet rétegek elektrolitikus lecsapására egy alkálikus cink-nikkel ötvözet fürdõbõl adalékok korlátozott lebomlása mellett
TWI841670B (zh) * 2019-01-24 2024-05-11 德商德國艾托特克公司 用於電解鋅-鎳合金沉積之膜陽極系統
JP6582353B1 (ja) 2019-02-15 2019-10-02 ディップソール株式会社 亜鉛又は亜鉛合金電気めっき方法及びシステム
JP6750186B1 (ja) 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
WO2021123129A1 (en) 2019-12-20 2021-06-24 Atotech Deutschland Gmbh Method and system for depositing a zinc-nickel alloy on a substrate
EP4273303A1 (en) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof
CN115821346A (zh) * 2022-11-16 2023-03-21 广州超邦化工有限公司 一种中碳钢机加件镀碱性锌镍合金的方法

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Also Published As

Publication number Publication date
WO2000006807A3 (de) 2000-05-04
HUP0103951A3 (en) 2003-05-28
US20110031127A1 (en) 2011-02-10
BR9912589A (pt) 2001-05-02
US20080164150A1 (en) 2008-07-10
EP1102875A2 (de) 2001-05-30
US20040104123A1 (en) 2004-06-03
AU5415299A (en) 2000-02-21
SK285453B6 (sk) 2007-01-04
US8486235B2 (en) 2013-07-16
CN1311830A (zh) 2001-09-05
HRP20010044B1 (en) 2005-06-30
EE200100059A (et) 2002-10-15
HUP0103951A2 (hu) 2002-02-28
SK892001A3 (en) 2001-10-08
IL141086A0 (en) 2002-02-10
JP4716568B2 (ja) 2011-07-06
EP1344850A1 (de) 2003-09-17
DE19834353A1 (de) 2000-02-03
CZ2001189A3 (cs) 2001-08-15
PL345970A1 (en) 2002-01-14
HRP20010044A2 (en) 2001-12-31
EP1344850B1 (de) 2006-11-22
WO2000006807A2 (de) 2000-02-10
DE59914011D1 (de) 2007-01-04
EP1102875B1 (de) 2003-06-11
DE59905937D1 (de) 2003-07-17
KR20010071074A (ko) 2001-07-28
ES2277624T3 (es) 2007-07-16
US7807035B2 (en) 2010-10-05
JP2008150713A (ja) 2008-07-03
PL198149B1 (pl) 2008-05-30
US6602394B1 (en) 2003-08-05
BG105184A (en) 2001-10-31
DE19834353C2 (de) 2000-08-17
ATE346180T1 (de) 2006-12-15
CA2339144A1 (en) 2000-02-10
JP2002521572A (ja) 2002-07-16
MXPA01000932A (es) 2002-06-04
CZ298904B6 (cs) 2008-03-05
ATE242821T1 (de) 2003-06-15
ES2201759T3 (es) 2004-03-16

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