HRP20010044B1 - Alkali zinc nickel bath - Google Patents

Alkali zinc nickel bath

Info

Publication number
HRP20010044B1
HRP20010044B1 HR20010044A HRP20010044A HRP20010044B1 HR P20010044 B1 HRP20010044 B1 HR P20010044B1 HR 20010044 A HR20010044 A HR 20010044A HR P20010044 A HRP20010044 A HR P20010044A HR P20010044 B1 HRP20010044 B1 HR P20010044B1
Authority
HR
Croatia
Prior art keywords
nickel bath
zinc nickel
alkali zinc
anode
alkali
Prior art date
Application number
HR20010044A
Other languages
English (en)
Inventor
Hillebrand Ernst-Walter
Original Assignee
Walter Hillebrand Gmbh & Co. Galvanotechnik
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HRP20010044(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Walter Hillebrand Gmbh & Co. Galvanotechnik filed Critical Walter Hillebrand Gmbh & Co. Galvanotechnik
Publication of HRP20010044A2 publication Critical patent/HRP20010044A2/hr
Publication of HRP20010044B1 publication Critical patent/HRP20010044B1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
HR20010044A 1998-07-30 2001-01-16 Alkali zinc nickel bath HRP20010044B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19834353A DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad
PCT/EP1999/005443 WO2000006807A2 (de) 1998-07-30 1999-07-29 Alkalisches zink-nickelbad

Publications (2)

Publication Number Publication Date
HRP20010044A2 HRP20010044A2 (en) 2001-12-31
HRP20010044B1 true HRP20010044B1 (en) 2005-06-30

Family

ID=7875843

Family Applications (1)

Application Number Title Priority Date Filing Date
HR20010044A HRP20010044B1 (en) 1998-07-30 2001-01-16 Alkali zinc nickel bath

Country Status (22)

Country Link
US (4) US6602394B1 (de)
EP (2) EP1102875B1 (de)
JP (2) JP4716568B2 (de)
KR (1) KR20010071074A (de)
CN (1) CN1311830A (de)
AT (2) ATE242821T1 (de)
AU (1) AU5415299A (de)
BG (1) BG105184A (de)
BR (1) BR9912589A (de)
CA (1) CA2339144A1 (de)
CZ (1) CZ298904B6 (de)
DE (3) DE19834353C2 (de)
EE (1) EE200100059A (de)
ES (2) ES2277624T3 (de)
HR (1) HRP20010044B1 (de)
HU (1) HUP0103951A3 (de)
IL (1) IL141086A0 (de)
MX (1) MXPA01000932A (de)
PL (1) PL198149B1 (de)
SK (1) SK285453B6 (de)
TR (1) TR200100232T2 (de)
WO (1) WO2000006807A2 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US8236159B2 (en) * 1999-04-13 2012-08-07 Applied Materials Inc. Electrolytic process using cation permeable barrier
US8852417B2 (en) 1999-04-13 2014-10-07 Applied Materials, Inc. Electrolytic process using anion permeable barrier
US20060157355A1 (en) * 2000-03-21 2006-07-20 Semitool, Inc. Electrolytic process using anion permeable barrier
US20060189129A1 (en) * 2000-03-21 2006-08-24 Semitool, Inc. Method for applying metal features onto barrier layers using ion permeable barriers
DE10026956A1 (de) * 2000-05-30 2001-12-13 Walter Hillebrand Galvanotechn Zink-Legierungsbad
US6755960B1 (en) 2000-06-15 2004-06-29 Taskem Inc. Zinc-nickel electroplating
DE60023190T3 (de) † 2000-06-15 2016-03-10 Coventya, Inc. Zink-nickel-elektroplattierung
US7628898B2 (en) * 2001-03-12 2009-12-08 Semitool, Inc. Method and system for idle state operation
DE10223622B4 (de) * 2002-05-28 2005-12-08 Walter Hillebrand Gmbh & Co. Kg Galvanotechnik Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute
US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10261493A1 (de) * 2002-12-23 2004-07-08 METAKEM Gesellschaft für Schichtchemie der Metalle mbH Anode zur Galvanisierung
AU2003239929A1 (en) * 2003-06-03 2005-01-04 Coventya Sas Zinc and zinc-alloy electroplating
US20050121332A1 (en) * 2003-10-03 2005-06-09 Kochilla John R. Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation
US20050133376A1 (en) * 2003-12-19 2005-06-23 Opaskar Vincent C. Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
FR2864553B1 (fr) * 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE102004061255B4 (de) * 2004-12-20 2007-10-31 Atotech Deutschland Gmbh Verfahren für den kontinuierlichen Betrieb von sauren oder alkalischen Zink- oder Zinklegierungsbädern und Vorrichtung zur Durchführung desselben
EP1712660A1 (de) 2005-04-12 2006-10-18 Enthone Inc. Unlösliche Anode
DE502005007138D1 (de) * 2005-04-26 2009-06-04 Atotech Deutschland Gmbh Alkalisches Galvanikbad mit einer Filtrationsmembran
EP1717351A1 (de) * 2005-04-27 2006-11-02 Enthone Inc. Galvanikbad
JP4738910B2 (ja) * 2005-06-21 2011-08-03 日本表面化学株式会社 亜鉛−ニッケル合金めっき方法
US20070043474A1 (en) * 2005-08-17 2007-02-22 Semitool, Inc. Systems and methods for predicting process characteristics of an electrochemical treatment process
DE102005051632B4 (de) * 2005-10-28 2009-02-19 Enthone Inc., West Haven Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
JP4819612B2 (ja) * 2006-08-07 2011-11-24 ルネサスエレクトロニクス株式会社 めっき処理装置および半導体装置の製造方法
DE102007040005A1 (de) 2007-08-23 2009-02-26 Ewh Industrieanlagen Gmbh & Co. Kg Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad
DE102007060200A1 (de) 2007-12-14 2009-06-18 Coventya Gmbh Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
TWI384094B (zh) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
EP2096193B1 (de) 2008-02-21 2013-04-03 Atotech Deutschland GmbH Verfahren zur Herstellung von korrosionsresistentem Zink und Zink-Nickel-plattierten linearen oder komplex geformten Teilen
DE102008058086B4 (de) 2008-11-18 2013-05-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
KR100977068B1 (ko) * 2010-01-25 2010-08-19 한용순 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
EP2384800B1 (de) 2010-05-07 2013-02-13 Dr.Ing. Max Schlötter GmbH & Co. KG Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen
DE102010044551A1 (de) 2010-09-07 2012-03-08 Coventya Gmbh Anode sowie deren Verwendung in einem alkalischen Galvanikbad
EP2565297A3 (de) 2011-08-30 2013-04-24 Rohm and Haas Electronic Materials LLC Haftungsförderung von cyanidfreier weißer Bronze
CN103849915B (zh) * 2012-12-06 2016-08-31 北大方正集团有限公司 电镀装置和pcb板导通孔镀铜的方法
CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
KR101622527B1 (ko) 2015-07-22 2016-05-18 딥솔 가부시키가이샤 아연 합금 도금 방법
WO2016075964A1 (ja) 2015-07-22 2016-05-19 ディップソール株式会社 亜鉛合金めっき方法
WO2017171113A1 (ko) * 2016-03-29 2017-10-05 (주) 테크윈 전해조 및 전해 방법
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3358045A1 (de) 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
SI3415665T1 (sl) 2017-06-14 2024-06-28 Dr. Ing. Max Schloetter Gmbh & Co. Kg Postopek za galvansko ločitev prevlek iz zlitine cinka in niklja iz alkalne kopeli zlitine iz cinka in niklja z manjšo razgradnjo aditivov
US20220119978A1 (en) 2019-01-24 2022-04-21 Atotech Deutschland Gmbh Membrane anode system for electrolytic zinc-nickel alloy deposition
EP3715506A4 (de) 2019-02-15 2021-04-14 Dipsol Chemicals Co., Ltd. Zink- oder zinklegierungen elektropliermethode und -system
JP6750186B1 (ja) 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
MX2022007695A (es) 2019-12-20 2022-07-19 Atotech Deutschland Gmbh & Co Kg Metodo y sistema para depositar una aleacion de zinc-niquel sobre un sustrato.
EP4273303A1 (de) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Verfahren zum abscheiden einer zink-nickel-legierung auf einem substrat, ein wässriges zink-nickel-abscheidungsbad, ein glanzmittel und verwendung davon

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE925264C (de) 1952-11-15 1955-03-17 Hesse & Co Dr Verfahren zum Vernickeln ohne Nickelanoden
GB1349735A (en) 1969-11-20 1974-04-10 Fulmer Res Inst Ltd Electrodeposited metal coatings
US3660170A (en) * 1970-04-08 1972-05-02 Gen Electric Dendrite-inhibiting additive for battery cell having zinc electrode
US3718549A (en) 1971-06-14 1973-02-27 Kewanee Oil Co Alkaline nickel plating solutions
JPS5128533A (en) * 1974-09-04 1976-03-10 Matsushita Electric Ind Co Ltd Aen nitsukerugokin metsukyodenkaieki
GB1602404A (en) 1978-04-06 1981-11-11 Ibm Electroplating of chromium
US4192908A (en) * 1979-06-15 1980-03-11 The United States Of America As Represented By The Secretary Of The Navy Mass-transport separator for alkaline nickel-zinc cells and cell
JPS5893886A (ja) 1981-11-30 1983-06-03 Tokuyama Soda Co Ltd 電気メツキ方法
JPS5893899A (ja) 1981-11-30 1983-06-03 Sumitomo Metal Ind Ltd 電気メツキの浴管理方法
US4469564A (en) * 1982-08-11 1984-09-04 At&T Bell Laboratories Copper electroplating process
DE3310730A1 (de) 1983-03-24 1984-03-29 Daimler-Benz Ag, 7000 Stuttgart Verfahren zum entfernen ueberschuessiger metall-ionen aus sauren chloridhaltigen galvanischen baeder
JPS59193295A (ja) 1983-04-15 1984-11-01 Hitachi Ltd ニツケルめつき方法及び装置
DE3712511C3 (de) * 1986-04-14 1995-06-29 Dipsol Chem Alkalisches cyanidfreies Elektroplattierungsbad und Verwendung dieses Bades
US4889602B1 (en) 1986-04-14 1995-11-14 Dipsol Chem Electroplating bath and method for forming zinc-nickel alloy coating
US4832812A (en) * 1987-09-08 1989-05-23 Eco-Tec Limited Apparatus for electroplating metals
JPH02175894A (ja) * 1988-12-28 1990-07-09 Kosaku:Kk スズ、スズ合金電気めっき方法及び同電気めっき装置
FR2650304B1 (fr) 1989-07-25 1991-10-04 Siderurgie Fse Inst Rech Procede de revetement electrolytique d'une surface metallique, et cellule d'electrolyse pour sa mise en oeuvre
JPH049493A (ja) * 1990-04-27 1992-01-14 Permelec Electrode Ltd 鋼板の電気錫メッキ方法
JP2764337B2 (ja) * 1990-05-10 1998-06-11 新日本製鐵株式会社 Ｎｉ又はＮｉ―Ｚｎ合金又はＮｉ―Ｚｎ―Ｃｏ合金メッキ方法
JPH0444374A (ja) 1990-06-12 1992-02-14 Matsushita Electric Ind Co Ltd エキシマレーザ装置
US5310465A (en) * 1990-06-14 1994-05-10 Vaughan Daniel J Electrodialytic oxydation-reduction of metals
JPH0452296A (ja) * 1990-06-20 1992-02-20 Permelec Electrode Ltd 銅めっき方法
JPH08375Y2 (ja) * 1990-08-15 1996-01-10 株式会社アルメックス メッキ装置の陽極構造
EP0483937A1 (de) 1990-10-24 1992-05-06 ATOTECH Deutschland GmbH Membranelektrolysemodul, Verfahren und dessen Verwendung
DE4035316C2 (de) 1990-11-07 1993-11-04 Daimler Benz Ag Verfahren zur elektrolytischen rueckgewinnung von nickel aus chloridhaltigen elektrolytischen baedern
JPH04176893A (ja) 1990-11-08 1992-06-24 Kawasaki Steel Corp Ｓｎ―Ｎｉ合金めっき方法
US5162079A (en) 1991-01-28 1992-11-10 Eco-Tec Limited Process and apparatus for control of electroplating bath composition
JP2997072B2 (ja) * 1991-02-13 2000-01-11 ディップソール株式会社 亜鉛−ニッケル合金めっき浴及び被めっき物上の黒色析出を防止する方法
JPH059776A (ja) * 1991-07-01 1993-01-19 Fujitsu Ltd プリント配線板のめつき方法
JPH059799A (ja) 1991-07-05 1993-01-19 Kawasaki Steel Corp 硫酸浴Ｚｎ−Ｎｉ電気めつきにおける金属イオンの供給方法及び装置
JPH05128533A (ja) 1991-11-05 1993-05-25 Nec Eng Ltd 光デイスク再生装置
FR2686352B1 (fr) 1992-01-16 1995-06-16 Framatome Sa Appareil et procede de revetement electrolytique de nickel.
US5417840A (en) * 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US5405523A (en) * 1993-12-15 1995-04-11 Taskem Inc. Zinc alloy plating with quaternary ammonium polymer
JPH10130878A (ja) 1996-11-01 1998-05-19 Asahi Glass Co Ltd 電解ニッケルめっき方法
US5883762A (en) 1997-03-13 1999-03-16 Calhoun; Robert B. Electroplating apparatus and process for reducing oxidation of oxidizable plating anions and cations
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad

Also Published As

Publication number Publication date
EP1344850A1 (de) 2003-09-17
ES2201759T3 (es) 2004-03-16
EP1344850B1 (de) 2006-11-22
WO2000006807A3 (de) 2000-05-04
IL141086A0 (en) 2002-02-10
AU5415299A (en) 2000-02-21
US20080164150A1 (en) 2008-07-10
US20110031127A1 (en) 2011-02-10
SK285453B6 (sk) 2007-01-04
HRP20010044A2 (en) 2001-12-31
EE200100059A (et) 2002-10-15
SK892001A3 (en) 2001-10-08
TR200100232T2 (tr) 2001-06-21
JP2008150713A (ja) 2008-07-03
BG105184A (en) 2001-10-31
ATE346180T1 (de) 2006-12-15
JP4716568B2 (ja) 2011-07-06
DE19834353A1 (de) 2000-02-03
DE59905937D1 (de) 2003-07-17
DE59914011D1 (de) 2007-01-04
KR20010071074A (ko) 2001-07-28
US6602394B1 (en) 2003-08-05
ATE242821T1 (de) 2003-06-15
PL198149B1 (pl) 2008-05-30
BR9912589A (pt) 2001-05-02
EP1102875B1 (de) 2003-06-11
PL345970A1 (en) 2002-01-14
WO2000006807A2 (de) 2000-02-10
DE19834353C2 (de) 2000-08-17
CZ2001189A3 (cs) 2001-08-15
CA2339144A1 (en) 2000-02-10
US7807035B2 (en) 2010-10-05
CN1311830A (zh) 2001-09-05
US20040104123A1 (en) 2004-06-03
US8486235B2 (en) 2013-07-16
HUP0103951A2 (hu) 2002-02-28
ES2277624T3 (es) 2007-07-16
JP2002521572A (ja) 2002-07-16
HUP0103951A3 (en) 2003-05-28
MXPA01000932A (es) 2002-06-04
CZ298904B6 (cs) 2008-03-05
EP1102875A2 (de) 2001-05-30

Similar Documents

Publication Publication Date Title
PL345970A1 (en) Alkali zinc nickel bath
WO2003054988A3 (en) Additive for alkaline batteries
AU2002256115A1 (en) Zinc/air cell
ZA200108711B (en) Water purification process.
AU547061B2 (en) Fluorinated ion exchange membrane
WO2004083488A3 (en) Electrolytic cell for production of aluminum from alumina
WO2003014419A3 (de) Elektrolysezelle, insbesondere zur elektrochemischen herstellung von chlor
WO2004013381A3 (en) Insoluble anode loop in copper electrodeposition cell for interconnect formation
ES2063405T3 (es) Fabricacion de acido cromico utilizando membranas bipolares.
ES2120106T3 (es) Procedimiento para la obtencion de hidroxidos metalicos.
ATE263855T1 (de) Elektrolysezelle zur herstellung eines alkalimetalls
PL1702090T3 (pl) Urządzenie do powlekania cynkiem lub stopami cynku
CA2109708A1 (fr) Electrode pour cellule electrolytique, son utilisation et procede l'utilisant
AU2002321709A1 (en) Secondary alkaline electrochemical generators with a zinc anode
WO2000009781A8 (en) Spiral feed and discharge manifold for electrolytic cells
EP1195454A3 (de) Kathoden- und Anodenkasette einer Testvorrichtung zur Elektroplattierung
AU4261799A (en) Method for electro copperplating substrates
JPS57145969A (en) Chemical plating method
EP1323200A4 (de) Herstellungsverfahren für nickelhydroxidmaterial
TW278254B (en) Improved secondary lithium battery
Skomoroski Palladium Electroplating Bath and Process
RO99640B1 (ro) Electrolit de depunere electrochimica a aliajului cupru-zinc
HUT52571A (en) Process for production on galvanic way of sliding surface of lead, tin, copper and politetrafluorethilene
Parkinson et al. Electrodeposition of Sulfur-Bearing Nickel
JPS57101359A (en) Improvement of zinc-bromine battery

Legal Events

Date Code Title Description
A1OB Publication of a patent application
AIPI Request for the grant of a patent on the basis of a substantive examination of a patent application
B1PR Patent granted
ODRP Renewal fee for the maintenance of a patent

Payment date: 20180719

Year of fee payment: 20

PB20 Patent expired after termination of 20 years

Effective date: 20190729