MX2022007695A - Metodo y sistema para depositar una aleacion de zinc-niquel sobre un sustrato. - Google Patents

Metodo y sistema para depositar una aleacion de zinc-niquel sobre un sustrato.

Info

Publication number
MX2022007695A
MX2022007695A MX2022007695A MX2022007695A MX2022007695A MX 2022007695 A MX2022007695 A MX 2022007695A MX 2022007695 A MX2022007695 A MX 2022007695A MX 2022007695 A MX2022007695 A MX 2022007695A MX 2022007695 A MX2022007695 A MX 2022007695A
Authority
MX
Mexico
Prior art keywords
nickel
zinc
catholyte
substrate
ions
Prior art date
Application number
MX2022007695A
Other languages
English (en)
Inventor
Thomas Freese
Steven Leonhard
Original Assignee
Atotech Deutschland Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh & Co Kg filed Critical Atotech Deutschland Gmbh & Co Kg
Publication of MX2022007695A publication Critical patent/MX2022007695A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/20—Regeneration of process solutions of rinse-solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/22—Regeneration of process solutions by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

La presente invención se refiere a un método para depositar una aleación de zinc-níquel sobre un sustrato, comprendiendo el método los pasos: (a) proporcionar el sustrato, (b) proporcionar un baño acuoso de deposición de zinc-níquel como catolito en un compartimiento de deposición en donde - el compartimento de deposición comprende al menos un ánodo con un anolito, y - el anolito está separado del catolito por al menos una membrana, y el catolito comprende (i) iones de níquel, (ii) al menos un agente formador de complejos para iones de níquel, y (iii) iones de zinc, (c) poner en contacto el sustrato con el catolito en el compartimiento de deposición de tal manera que la aleación de zinc-níquel se deposite electrolíticamente sobre el sustrato, y así obtener un sustrato revestido de zinc-níquel, en donde después del paso (c) los iones de níquel en el catolito tienen una concentración más baja que antes de la etapa (c), (d) enjuagar el sustrato revestido de zinc-níquel en un compartimiento de enjuague que comprende agua, de manera que se obtiene un sustrato enjuagado revestido de zinc-níquel y agua de enjuague, comprendiendo el agua de enjuague una parte del al menos un agente formador de complejos de iones para iones níquel y una parte de los iones de níquel, caracterizado porque (i) al menos una parte del agua de enjuague y/o al menos una parte del catolito se trata en un primer compartimento de tratamiento de manera que el agua se separa del al menos un agente formador de complejos para los iones de níquel y los iones de níquel, (ii) al menos una parte del al menos un agente formador de complejos separado del agua se devuelve en el catolito, y (iii) se añade una fuente de iones de níquel al catolito, con la condición de que la fuente de iones de níquel no comprenda dicho al menos un agente formador de complejos para iones de níquel o cualquier otro agente formador de complejos para iones de níquel.
MX2022007695A 2019-12-20 2020-12-18 Metodo y sistema para depositar una aleacion de zinc-niquel sobre un sustrato. MX2022007695A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19218655 2019-12-20
PCT/EP2020/086976 WO2021123129A1 (en) 2019-12-20 2020-12-18 Method and system for depositing a zinc-nickel alloy on a substrate

Publications (1)

Publication Number Publication Date
MX2022007695A true MX2022007695A (es) 2022-07-19

Family

ID=69061071

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2022007695A MX2022007695A (es) 2019-12-20 2020-12-18 Metodo y sistema para depositar una aleacion de zinc-niquel sobre un sustrato.

Country Status (8)

Country Link
US (1) US11946152B2 (es)
EP (1) EP4077771A1 (es)
JP (1) JP2023507479A (es)
KR (1) KR20220118443A (es)
CN (1) CN114787425A (es)
MX (1) MX2022007695A (es)
TW (1) TW202132629A (es)
WO (1) WO2021123129A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4273303A1 (en) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE10225203A1 (de) * 2002-06-06 2003-12-18 Goema Ag Verfahren und Vorrichtung zur Spülwasserrückführung und Reinigung eines Prozessbades
US20040026255A1 (en) * 2002-08-06 2004-02-12 Applied Materials, Inc Insoluble anode loop in copper electrodeposition cell for interconnect formation
DE10254952A1 (de) * 2002-08-31 2004-03-04 Henkel Kgaa Mehrstufiges Verfahren zur Aufarbeitung von Phosphatierabwasser unter Einsatz eines schwach sauren Ionenaustauschers
DE10355077A1 (de) 2003-11-24 2005-06-09 Walter Hillebrand Gmbh & Co. Galvanotechnik Verfahren zum abwasserarmen Betrieb eines alkalischen Zink-Nickel-Bades
US20060254923A1 (en) * 2005-05-11 2006-11-16 The Boeing Company Low hydrogen embrittlement (LHE) zinc-nickel plating for high strength steels (HSS)
DE102010055143B4 (de) 2010-12-18 2022-12-01 Umicore Galvanotechnik Gmbh Direktkontakt-Membrananode für die Verwendung in Elektrolysezellen
EP2976447A1 (en) * 2013-03-21 2016-01-27 ATOTECH Deutschland GmbH Apparatus and method for electrolytic deposition of metal layers on workpieces
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen

Also Published As

Publication number Publication date
CN114787425A (zh) 2022-07-22
EP4077771A1 (en) 2022-10-26
JP2023507479A (ja) 2023-02-22
US20220349080A1 (en) 2022-11-03
WO2021123129A1 (en) 2021-06-24
KR20220118443A (ko) 2022-08-25
US11946152B2 (en) 2024-04-02
TW202132629A (zh) 2021-09-01

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