CN1221309A - 装有芯片封装的电路基板的端电极及其制造方法 - Google Patents
装有芯片封装的电路基板的端电极及其制造方法 Download PDFInfo
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Abstract
一种用于其上安装了芯片封装的电路基板的端电极,该端电极在电路基片上形成,并包括:一个在电路基板上形成的下阶梯部分;以及一个在上述下阶梯部分上形成的上阶梯部分。
Description
本发明涉及的是:一种芯片封装、一种芯片载体和用于制造该芯片载体的方法、一种用于电路基板的端电极和用于制作该端电极的方法、以及包括安装在电路基板上的上述芯片封装的复合体(此后将“安装了芯片封装的复合体”简称为复合体)。
近年来,LSI(大规模集成电路)的集成度显著地提高了,因此一个LSI芯片的引脚数目也在增多。对于采用LSI芯片封装的电子设备来说,却希望减小其大小和厚度,因而发展了一些高密度安装技术,用于将LSI芯片以高密度安装在电路基板上。对这样的LSI芯片封装的形状和结构提出了各种建议(参见NIKKEI ELECTRONICS1993.8.2,No.587,“LSI封装展望,促进高密度安装”,pp93-99)。
在本说明书中,“芯片载体”指的是包括端电极(用于和LSI芯片的电极相连接)和接触电极(用于和电路基板相连接)的基片;“芯片封装”指的是其上安装了LSI芯片的芯片载体;芯片封装作为一个整体安装在一个电路基板上,形成一个“安装了芯片封装的复合体”。
下面将概略地介绍将常规芯片封装安装在一个电路基板上的已知方法。
首先,芯片载体是以如下的方式来形成的。通过采用激光束或者冲模技术,在一个印刷电路板上形成通路孔。除了采用印刷电路板之外,也可以采用陶瓷板。在印刷电路板上预先形成了端电极。此后,通过电镀或类似技术使印刷电路板中的内部导体与端电极相连接。其后,采用小片接合方式将LSI芯片以朝上的状态粘结在上述芯片载体的上表面上,再采用丝焊接方式将LSI芯片的电极焊盘与芯片载体上表面上的端电极相连接。在所获得的组合产品上,采用模塑树脂来覆盖LSI芯片和焊丝,从而密封该组合产品。
其次,采用印刷和类似方法,在设置在印刷电路板下表面(亦即在将芯片封装安装在电路基板上时与电路基板相对的表面)上的电极上形成一层焊料层。此后,采用红外线回流或类似技术来熔化上述焊料层,形成焊球(其直径大约为700μm)。这样,就获得了芯片载体。也可以将预先准备好的焊料球粘结在芯片载体的端电极上,从而获得芯片封装。
再其次,将芯片封装置于这样的位置上,亦即使上述焊料球位于电路基板上的预定位置上。此后,将芯片封装置于电路基板上,采用红外线回流或类似技术熔化上述焊料球,从而使芯片封装下表面上的端电极与电路基板上的端电极相连接。这样,就获得了安装了芯片封装的复合体。
然而,上述已知技术存在如下的问题:
1.由于为了使芯片载体的端电极与LSI芯片的电极焊盘相连接而进行了丝焊,因此芯片载体所占据的面积大于LSI芯片的面积。另外,由于在丝焊连接之后进行模塑树脂密封,因此所获得的芯片封装的厚度大于焊丝的环线高度。这一点阻碍了芯片封装大小和厚度的减小。
2.由于信号需要通过具有较长长度的焊丝,输入/输出信号有可能被延迟,因此降低了芯片封装的高频特性,使芯片封装有可能产生噪音。
3.成阵列地配置于芯片封装下表面上的焊料球妨碍了LSI芯片上的端子之间距离的减小。一般说来,焊料球之间需要有大约1mm的路离。
4.焊料球的大小决定了芯片封装和电路基板之间的距离。换句话说,芯片封装和电路基板之间的间距不可能小于焊料球的大小。
5.当芯片载体是采用不同于电路基板的材料制成时,由热冲击所产生的应力将会集中在焊料连接部分上,因而造成裂缝,其结果会增大焊料连接部分的电阻。
本发明提供的芯片载体包括:具有上表面、下表面和内部导线;在载体的上表面上所形成的多个端电极,这些端电极使LSI芯片和内部导线之间实现电气连接;在载体的下表面上形成了多个凹入部位,用于使一个电路基板上的多个电极与上述内部导线之间实现电气连接,这些凹入部位与内部导体相电气连接。
在本发明的一种实施例中,上述芯片载体进一步包括多个接触电极,它们与电路基板上的电极相连接,上述接触电极被埋设在相应的凹入部分中,并由导电性粘结剂构成。
在本发明的另一种实施例中,上述多个接触电极由载体的下表面向外凸出。
在本发明的再一种实施例中,上述载体包括多个通路孔;内部导线的至少一部分由设置在上述通路孔中的导电性材料构成;载体的至少某些凹入部位由上述多个通路孔构成。
在本发明的再一种实施例中,载体是由多层相互层叠在一起的绝缘层构成,载体具有多个通路孔,用于将载体的上下表面连接在一起,所述的内部导线由设置在多个通路孔中的导电性粘结材料和设置在所述多层绝缘层中的至少一层上的导电层组成。
在本发明的再一种实施例中,所述导电性粘结剂具有柔性。
在本发明的再一种实施例中,内部导体由一种从由Cu、Ag和AgPd中选出的材料制成。
另外,本发明的芯片封装由芯片载体和一个以芯片倒装方式安装在载体上的LSI芯片组成,其中芯片载体包括:具有上表面、下表面和内部导体的载体;载体的上表面上形成多个端电极,这些端电极使LSI芯片和内部导线之间实现电气连接;多个凹入部位,用于使一个电路基板上的多个电极与上述内部导线实现电气连接,这些凹入部位设置在载体的下表面上;其中LSI芯片包括:设置在LSI芯片上的电极焊盘以及在电极焊盘上形成的凸型电极,该凸型电极和芯片载体上的相应端电极通过设置在它们之间的焊结层实现电气连接,LSI芯片和芯片载体之间的空隙用模塑树脂来填充和密封。
在本发明的一种实施例中,芯片封装进一步包括与电路基板上的电极相连接的多个接触电极,这些接触电极埋设在相应的多个凹入部位之一中,接触电极由导电性粘结剂构成。
在本发明的另一种实施例中,LSI芯片的凸型电极具有两级阶梯型的凸型形状。
在本发明的再一种实施例中,所述导电性粘结剂具有柔性。
在本发明的再一种实施例中,所述粘结层由一种从导电性粘结剂、非匀质性导电性材料和焊料中选择出的材料构成。
另外,本发明的芯片封装包括芯片载体和一个以倒装方式安装在芯片载体上LSI芯片,其中芯片载体包括:具有上表面、下表面和内部导体的载体;在载体的上表面上形成的多个端电极,用于使LSI芯片和内部导线之间实现电气连接;多个接触电极,用于使电路基板上的多个电极与内部导线实现电气连接,接触电极设置在载体的下表面上,由导电性粘结剂构成,并埋设在载体下表面上所形成的多个凹入部位中;其中LSI芯片包括:设置在LSI芯片上的电极焊区以及在电极焊区上形成的凸型电极,该凸型电极和芯片载体上的相应端电极通过设置在它们之间的粘结层实现电气连接,LSI芯片和芯片载体之间的空隙用模塑树脂充填密封。
在本发明的一种实施列中,LSI芯片上的凸型电极具有两级阶梯型的凸型形状。
在本发明的另一种实施例中,所述导电性粘结剂具有柔性。
在本发明的再一种实施例中,所述粘结层由一种从导电性粘结剂、非匀质性导电性材料和焊料中选择出的材料构成。
本发明的一种制造芯片载体的方法包括如下步骤:在多层未经烧结的生料板上形成通路孔;在上述多层生料板中的一组上的通路孔中埋设内部导线的一部分,并通过涂覆方法在该组多层生料板上形成内部导线;通过将上述多层生料板中没有将其内部导线的一部分埋设在通路孔之中的生料板层叠在一组将其内部导线的一部分埋设在通路孔之中的生料板上,形成一个多层结构,并对该多层结构进行加压处理;对上述多层结构进行烧结,以便形成载体,在载体的下表面上形成多个凹入部位。
在本发明的一种实施例中,该方法进一步包括通过在载体的多个凹入部位中埋设导电性粘结剂来形成多个接触电极的步骤。
在本发明的另一种实施例中,所述导电性粘结剂具有柔性。
本发明的一种用于其上安装了芯片封装的电路基板的端电极,该端电极在电路基片上形成,并包括:一个在电路基板上形成的下阶梯部分;一个在上述下阶梯部分上形成的上阶梯部分。
在本发明的一种实施例中,所述上阶梯部分在平行于电路基板方向上的截面面积小于下阶梯部分在平行于电路基片方向上的截面面积。
另外,本发明的一种用于在电路基极上制作端电极的方法包括如下步骤:通过第一光刻步骤在电路基板上形成第一保护膜,该第一膜在对应于电路基板上的电极焊盘的位置上具有第一开口;在上述第一保护膜上的第一开口中形成端电极的下阶梯部分;通过第二光刻步骤在电路基板上形成第二保护膜,该第二保护膜在对应于端电极的下阶梯部分的位置上具有第二开口,该第二开口小于上述第一开口;在第二保护膜的第二开口中形成端电极的上阶梯部分;除去上述第一和第二保护膜,从而形成端电极。
本发明的一种安装了芯片封装的复合体,包括安装在电路基板上的芯片封装,而芯片封装包括芯片载体和以倒装方式安装在芯片载体上的LSI芯片,其中芯片载体包括:具有上表面、下表面和内部导线的载体导线;在载体的上表面上所形成的多个端电极,这些多个端电极使LSI芯片和内部导线之间实现电气连接;多个接触电极,用于使电路基板上的多个电极与内部导线实现电气连接,接触电极设置在载体的下表面上,由导电性粘结剂构成,并埋设在载体下表的多个凹入部位中;其中LSI芯片包括:设置在LSI芯片上的电极焊盘以及在电极焊盘上形成的凸型电极,该凸型电极和芯片载体上的相应端电极通过设置在它们之间的粘结层实现电气连接,LSI芯片和芯片载体之间的空隙用模塑树脂来充填密封;其中电路基板的端电极与芯片载体上的相应接触电极相接触。
在本发明的一种实施例中,所述电路基板上的端电极朝着载体上的相应凹入部位向外凸出。
在本发明另一种实施例中,电路基片上的端电极具有两级阶梯型的凸型形状。
根据本发明的芯片载体,用于以倒装方式安装LSI芯片的端电极设置在芯片载体的上表面上。在芯片载体的下表面上设置了用于和电路基板上的电极相连接的接触电极。此外,上述端电极和接触电极通过位于载体之内的内部导线进行电互连。通过使用这样的芯片载体,就能够将LSI芯片中的电路与电路基板上的电路相连接,而不需要占据大的空间。由于LSI芯片和电路基板之间的连接没有采用焊丝,电信号在LSI芯片和电路基板之间传递时只需要通过一个相对短的路径,其结果是和采用焊丝相比较,减小了连接所产生的分布电阻和分布电容,从而改善了芯片组件的高频特性。另外,通过采用载体内部的内部导线和类似物,可以使端电极的布置安排不同于接触电极的布置安排。
另外,所述接触电极是由埋设在载体下表面上的多个凹入部位之中的导电性粘结剂来形成的。导电性粘结剂的作用是一方面以机械方式将载体固定在电路基板上,另一方面使载体的内部导体与电路基板上的端电极实现电气连接。通过使接触电极位于载体下表面上的多个凹入部位之中,就能够减小载体和电路基板之间的间距。由于接触电极是用导电性粘结剂来形成的,接触电极和电路基板之间的连接很稳定,因此提高了可靠性。尤其应指出的是这样的互连能够抵抗热冲击。
根据本发明的用于制造芯片载体的方法,通过在载体下表面上的凹入部位中填入导电性粘结剂,就能够很容易地形成接触电极。
本发明的包括以倒装方式安装在上述芯片载体上的LSI芯片的芯片封装结构紧凑,而且很薄。由于能够以相对简单的方式来进行载体下表面上多个凹入部位中的填入步骤,因此可以由芯片封装的购买者自己在将芯片封装安装在电路基板上之前进行上述填入步骤。
根据本发明,电路基板上的端电极具有凸出的形状,因此能够很容易地插入到构成芯片载体的接触电极的凹入部位中。在本发明的用于制作端电极的方法中,通过采用光刻技术,能够以高的成品率来形成具有两级阶梯形状的微小凸型电极。
在本发明的安装了芯片封装的复合体中,接触电极是用导电性粘结剂来形成的,因此能够保证芯片载体与电路基板上的连接具有机械/电气稳定性。
因此,本发明的优点是:(1)能够提供一种芯片封装,它具有更小的尺寸和厚度,同时具有优良的高频特性,能够高的可靠性和稳定性与电路基板连接;(2)为上述芯片封装提供了一种芯片载体及其制造方法;(3)为电路基板提供了一种适合用于上述芯片封装的端电极及其制作方法,并进一步提供了一种将上述芯片封装安装在电路基板上的复合体。
在结合附图来阅读下面的详细说明之后,本技术领域里的普通技术人员将能够认识到本发明的上述和其他优点。
附图1是本发明的一种芯片封装的剖视图;
附图2是本发明的另一种芯片封装的剖视图;
附图3是本发明的一种芯片载体的剖视图;
附图4是本发明的另一种芯片载体的剖视图;
附图5A至5I是剖视图,显示了用于制作本发明的芯片载体的各个方法步骤;
附图6是剖视图,显示了本发明电路基板上的凸型端电极;
附图7A至7D是剖视图,显示了用于形成如附图6所示凸型端电极的各个方法步骤;
附图8是本发明的装有芯片封装的复合体的剖视图;
附图9是本发明的另一种装有芯片封装的复合体的剖视图。
下面将结合附图对本发明的实施例进行详细说明。
如附图1所示,本实施例的芯片封装19包括一个芯片载体12及一个以倒装方式安装在芯片载体12上的LSI芯片7。
上述LSI芯片7包括多个电极焊盘8和凸型电极11,在每一电极焊盘8上都形成了一个凸型电极11。任何已知和适合的LSI芯片都可以用作上述LSI芯片7。用于本发明的LSI芯片的典型尺寸是10mm×10mm×0.5mm。上述电极焊盘8和凸型电极11都设置在LSI芯片7的边缘部分上,用于将芯片上所形成的集成电路的布线与外部电路相连接。现在,凸型电极11之间的间距一般在大约0.200mm-0.120mm的范围内,将来还有可能采用更小的间距。每一个凸型电极11与芯片载体12上的多个端电极6中的一个通过设置在它们之间面上所形成的焊接层9(导电性粘结剂)实现电气连接。凸型电极11最好具有两级阶梯型的凸型形状(亦即其形状由一个凸型部分组成其中一个部分位于另一部分之上),以便实现凸型电极11和芯片载体12上的端电极6之间的稳定互连。焊接层(导电性粘合物)9除了用导电性粘结剂构成之外,还可以由非均质性材料或焊料形成。LSI芯片7和芯片载体12之间的空隙用模塑树脂10来填充,以便实现密封。
下面将结合图3对芯片载体12进行详细的说明。本实施例的芯片载体12包括用作载体1的多层陶瓷基片,该载体1进一步包括一层内部导线。在载体1的上表面上设置了多个端电极6,用于实现LSI芯片7上的凸型电极11和内部导线之间的电气连接。在载体1的下表面上提供了多个凹入部位,用于实现电路基板(图3中未示)上的电极和内部导线之间的电气连接。每一个凹入部位的深度在大约20-100μm的范围之内,其内径大约为200μm。在每一个凹入部位中埋设了多个接触电极5中的一个,其方式应使该接触电极5和电路基板上的电极相接触。在本实施例中,上述接触电极5由载体1的下表面向下凸出大约10-20μm。然而,如果电路基板上的电极具有两级阶梯型的凸型结构,接触电极5就不需要由载体1的下表面向下凸出对此下面将加以说明。
每一个接触电极5通过内部导线和一个相应的端电极6相连接。其结果是不需通过焊丝就可以实现LSI芯片7和电路基板(图中未示之间的电气互连。这样,就能够获得优良的高频特性。在本实施例中,载体1中的内部导线由埋入到载体上的通路孔2中的通路3和基片内部的布线4组成。内部导线用于实现端电极6和接触电极5之间的电气连接,其中端电极6以相对小的间距安排在载体1上表面的边缘部分上,而接触电极5则以较大的间距安排在载体1的下表面上。由于LSI芯片7的电极焊盘8设置在LSI芯片的边缘部位上,因此端电极6就只能设置在载体1上表面的边缘部位上。然而,接触电极5的位置并不限于载体1下表面的边缘部位,通过利用载体1下面的整个面积来布置接触电极5,就可能以较大的间距来有效地设置接触电极。这样,就能够容易地避免在相邻接触电极5之间产生短路现象。增大接触电极5之间的间距也能够允许增大每一接触电极5的尺寸,其结果是能够在接触电极5和电路基板之间获得可靠的电气/机械互连。在本实施例中,接触电极5之间的最小容许间距为大约400μm。也可以在基片内部的布线部位上设置电路元件,例如电阻,电容等等。
LSI芯片7以如下所述的方式安装在芯片载体12上:
再参见附图1,通过球形焊接方式,在LSI芯片7的电极焊盘8上形成凸型电极11,该凸型电极由Au制成,具有两级阶梯型的凸型形状。然后,在每一个凸出电极11的端头部位上涂上导电性粘结剂9。此后,将凸型电极11置于对应于芯片载体12上的端电极6的位置上。随后,将LSI芯片7置于芯片载体12上,对导电性粘结剂进行热固化。用模塑树脂10来填充LSI芯片7和芯片载体12之间的空隙,并对模塑树脂10进行热固化。在LSI芯片7上形成的凸型电极11可以具有任何的结构,例如用电镀方式形成的Au凸块、用电镀方式形成的焊料凸块、或者焊料球形凸块等等,只要能够允许以倒装方式进行安装即可。
本发明的芯片载体12和芯片封装19的一个重要特点是用填入到载体1的凹入部位的导电性粘结剂来形成芯片载体12的接触电极5。上述导电性粘结剂可以采用例如由Ablestik公司生产的聚合导电性粘结剂。由这样的导电性粘结剂所形成的接触电极5具有如下的优点:
芯片封装19和安装该封装的电路基板之间的间距与采用诸如焊料球之类的电极时相比大大减小了。此外,这样的接触电极5能够很容易地和电路基板上的任何凸出的电极相连接。通过将电路基板上的凸出电极插入到芯片封装19上的接触电极5中,就能够相对容易的防止诸如粘结剂流动和凸出电极5短路之类的问题。另外,在电路基板的凸出电极和导电性粘结剂之间能够确保较大的接触面积,从而提供了大的结合强度,改善了可靠性。特别是当导电性粘结剂具有柔性时,即使受热冲击时,也能够避免接触电极5产生破裂。
也可以采用如附图4所示的基片来作为本发明芯片载体12的载体1,通过通路3将接触电极5直接与端电极6相连接。在附图2中显示了一个采用上述基片的芯片封装实例。在这一封装中,没有提供基片内部的布线。然而,在载体1的上表面上提供了引线(图中未示),使之由端电极6伸出,因而能够将通路孔2和通路3置于不同于端电极6的位置上。尽管如附图4所示的芯片载体的设计自由度和附图3所示的芯片载体相比是减小了,但是仍然可能采用这种方式以不同于端电极6的图形来安排接触电极5。附图2显示的芯片封装是将LSI芯片7装在芯片载体12上的情形。
下面将参照附图5A-5I对本发明的芯片载体的制造方法进行说明。
首先,如附图5A所示,在多个未经烧结的陶瓷生料板1a和1b上分别用激光束或模冲法形成通路孔2a和2b。在形成如附图3所示的芯片载体时,根据所采用的生料板1a或1b,通路孔2a和2b可以有不同的布局图形;然而,在附图5A-5I中,为了简明起见,通路孔2a和2b在所有的生料板1a和1b上都具有相同的布局图形。
诸如由日本电气玻璃公司生产的陶瓷生料板(以MLS-100作为其主要原料)可以用作生料板1a和1b。将厚度大约为200μm的5-10块这样的生料板层迭在一起来形成载体1。未经烧结的生料板1a和1b(其厚度:200μM)经过烧结之后将具有大约为150μM的厚度,因此整个载体1的厚度在0.7mm-1.5mm的范围之内。载体1最好具有较小的厚度,以便减小芯片载体和芯片封装的厚度。
其次,如附图5B所示,通过印制法,在生料板1a的通路孔2a中埋入导电性材料,形成通路3a。此后,如附图5F所示,通过印制形成内部基片之间的布线4a。这样,就形成了内部导线的构件。
将其通路孔2b中没有形成通路的生料板1b置于多层生料板1a上,以形成一个多层结构。此后,在加热的同时对该多层结构加压。此后如附图5G所示,对层叠在一起的生料板1a和1b进行烧结,形成载体1,其下表面上具有多个凹部2b。上述凹部2b由载体1最下层的生料板1b上的通路乳2b(未填充的)构成。上述载体1的制造步骤可以用其他已知的方法来代替。
在进行烧结之后,如附图5H所示,在载体1的上表面上形成端电极6。其次,如附图5I所示,通过在一个掩模14上进行印制,在载体1的面对电路基板一面上的多个凹入部位2b中埋入导电性粘结剂。在上述印制过程中采用刮板13。这样,就在载体1的凹入部位2b中埋入了导电性粘接剂,形成接触电极5。上述导电性粘结剂可以具有柔软性。导电性粘结剂中包含导电性颗粒,导电性颗粒最好由AgPd、Au、Ag、Cu或复合合金粉末构成。
填充凹入部位2b中的接触电极5可以由载体1的表面向外凸出,也可以不凸出。当接触电极5不凸出于载体1的表面时,电路基板上所形成的电极形状应该使之能够插入到载体1的凹入部位2b之中。
在用上述方法来形成载体1时,每一个接触电极5的长度,亦即在垂直于载体1下表面方向上的尺寸,由构成载体1最下层的生料板1b的厚度来确定。如果生料板1b经过烧结之后的厚度为150μm,那么每一个接触电极5的长度就在150-170μm的范围之内。如果增加每一个接触电极5的长度,接触电极所具有的相对较大的电阻值就会变得不可忽视。因此,接触电极5的长度最好等于或小于200μm。
当内部导线用非贵金属制成时,在生料板1b的通路孔2b中填充导电性粘结剂之前,可以在通路孔2b的内表面镀上一层不会氧化的导体,例如金。通过这样的镀层,就增大了导电性粘结剂和生料板1b之间的电气接触面积,从而减小了接触电极5和内部导线之间的电阻。
形成接触电极5的步骤可以在将LSI芯片安装在载体1上之前进行,也可以在其后进行。在某些情况下,可以将装有LSI芯片、但是不具有接触电极5的芯片封装出售给用户。在这样的情况下,至少可以在将芯片封装安装在电路基板上之前将接触电极5埋入到载体1下表面上的凹入部位2b中。
除了玻璃陶瓷之外,用于制造载体1的材料可以是具有良好散热性能的氧化铝。
在制造如附图4所示的芯片载体时,省略了形成内部基片的布线4的步骤,因而只进行如附图5A-5E的步骤。附图5C-5E分别对应于附图5G-5I。
下面,将结合附图6对适合于芯片载体12和芯片封装19的电路基板17上的电极结构进行说明。电路基板17具有两级阶梯型的凸型形状的端电极6,这样的端电极适合于用于载体1上的接触电极5基本上不凸出于载体1下表面的情况。
如附图6所示的电路基板17包括在其上表面上形成的电极焊盘,16,并进一步包括在电极焊盘16上形成的具有两级阶梯型的凸型形状的端电极18。每一个端电极18的下阶梯部分在电路基板17上形成,而上阶梯则在下阶梯上形成。从电路基板的上方来看,端电极18的形状即可以是圆形的,也可以是方形的。上阶梯部分在平行于电路基板方向上的截面面积最好小于下阶梯部分在同一方向上的截面面积。端电极18可以由能够进行电镀的金属,例如Au、Cu、Ag,以及焊料制成。电极焊盘16可以用任何能够电镀的材料来形成。电路基板17可以具有如附图6所示的通路孔22、通路23、和基片内部的布线24。
下面将参照附图7A-7D来说明在电路基板上形成具有两级阶梯型形状的凸型电极18的方法。
首先,如附图7A所示,通过光刻方法在设置了电极焊盘16的电路基片17上形成一层保持膜A,保护膜A在上述电极焊盘16的位置上形成了开口(内径大约为250μm),芯片载体12上的接触电极5将与这些电极焊盘16相连接。
其次,如附图7B所示,在保护膜A的上述开口中设端电极8的下阶梯部分18a(其厚度大约为几十μm)。这样,就在电路基板17的未被保护膜A覆盖的区域上有选择性地形成了端电极18的下阶梯部分18a。下阶梯部分18a的形状和大小取决于保持护A上的开口的形状和大小,其分布图形由保护膜A上的开口的分布图形来确定。
此后,如附图7C所示,通过光刻方法在电路基板17上形成保护膜B。保护膜B在每一个端电极18的下阶梯部分18a的中心部位附近具有开口(其内径大约为100μm)。保护膜B上的上述开口小于保护膜A上的开口。此后,如附图7D所示,通过电镀方式来形成端电极18的上阶梯部分18b(其高度大约为几十μm)。
最后,通过溶解或打磨方法除去保护膜A和B。此后,如必要,可以进行清洗处理。这样,就在电路基板17的电极焊盘16上形成了具有两级阶梯型凸出形状的端电极18。
本发明对电镀材料没有任何特殊限制,任何可以电镀的材料,例如Au、Cu、Ag,以及焊料均可以用作电镀材料。
下面将结合附图8说明将本发明的芯片封装安装在上述电路基板上的方法。
在采用导电性粘结剂来形成芯片封装19上的接触电极5之后,将接触电极5的位置对准电路基板17上的相应端电极18的位置。所采用的电路基片17上具有通路孔和基片内部的布线。
此后,将端电极18插入到芯片封装19的凹入部位之中。在芯片封装19的凹入部位中已经预先填入了接触电极5。此后,在50-150℃的温度下对构成接触电极5的导电性粘结剂进行固化。这样,接触电极5就以电气和机械方式与端电极18相连接,并从而将芯片封装19安装在电路基板17上。以这种方式获得的安装了芯片载体的复合体具有如下的优点:在接触电极5和电路基板17上的端电极之间获得了牢固的连接,即使电路基片17的热膨胀系数不同于载体1的膨胀系数,载体1也不大可能产生裂缝。在导电性粘结剂具有柔性的情况下,接触电极5具有能够抵抗热冲击的优良可靠性。此外,减小了载体1和电路基板17之间的距离(亦即间距),从而能够减小安装了芯片封装的复合体的整体厚度。
附图9显示了安装了芯片封装19的复合体,其中是将芯片封装19安装在不具有凸出端电极18的电路基板上。在这一实施例中,接触电极5直接粘结在电路基板17的电极焊接盘16上。
如上所述,根据本发明的实施例,LSI芯片7是以倒装方式安装在芯片载体12上,因此芯片封装19占据较小的面积,并具有较薄的厚度。此外,芯片封装19内部的布线仅仅延伸相对短的距离,从而能够获得优良的频率特性。
此外,芯片载体12上的接触电极5是由填入到载体1下表面上的凹入部位中的导电性粘结剂来形成的。通过将电路基板17的电极焊盘16上所形成的具有两级阶梯型凸型形状的端电极18插入到接触电极5之中,可以在端电极18和接触电极5之间获得牢固的连接。安装了芯片封装19的复合体的整体厚度也能够被减小。
这样,本发明提供了一种占据较小面积的芯片封装(包括安装在芯片载体上的LSI芯片)。此外,在将芯片封装安装在电路基板上之后,从电路基板出发所测得的芯片封装的厚度也很小。因此,本发明的芯片封装适合于进行高密度安装。
由于芯片封装的接触电极是由导电性粘结剂制成的,并最好采用具有柔性的导电性粘结剂,因此能够通过将电路基板的端电极上所形成的具有两级凸型形状的电极插入到接触电极之中,将芯片封装安装在电路基片上,同时能够保持在进行上述安装之后所获得的电路部件的厚度。
此外,在将电路基板上所形成的具有两级阶梯型凸型形状的端电极插入到芯片封装的接触电极之中时,端电极的上述凸型形状能够防止粘结剂的蠕变和相邻端电极之间的短路现象。另外,这样的端电极能够以高的几率并以较大的接触面积和导电性粘结剂相接触,从而增加了焊接的可靠性。
本技术领域里的普通技术人员在不脱离本发明的范围和实质性内容的前提下还可以对本发明作出种种改进。因此,下面的权利要求不应局限于说明书的内容,而是应该获得更为广泛的解释。
Claims (3)
1.一种用于其上安装了芯片封装的电路基板的端电极,该端电极在电路基片上形成,并包括:
一个在电路基板上形成的下阶梯部分;以及
一个在上述下阶梯部分上形成的上阶梯部分。
2.如权利要求1所述用于电路基板的端电极,其特征在于上阶梯部分在平行于电路基板方向上的截面面积小于下阶梯部分在平行于电路基片方向上的截面面积。
3.一种用于在电路基板上制作端电极的方法,包括如下步骤:
通过第一光刻步骤在电路基板上形成第一保护膜,该第一保护膜在对应于电路基板上的电极焊盘的位置上具有第一开口;
在上述第一保护膜上的第一开口中形成端电极的下阶梯部分;
通过第二光刻步骤在电路基板上形成第二保护膜,该第二保护膜在对应于端电极的下阶梯部分的位置上具有第二开口,该第二开口小于上述第一开口;
在第二保护膜的第二开口中形成端电极的上阶梯部分;
除去上述第一和第二保护膜,从而形成端电极。
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- 1994-12-09 US US08/353,438 patent/US5640051A/en not_active Expired - Fee Related
- 1994-12-13 CN CN94112790A patent/CN1048824C/zh not_active Expired - Fee Related
- 1994-12-13 CN CNB981225861A patent/CN1159956C/zh not_active Expired - Fee Related
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Cited By (2)
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CN103247545A (zh) * | 2012-02-08 | 2013-08-14 | 英飞凌科技股份有限公司 | 半导体装置及其方法 |
CN110999550A (zh) * | 2017-08-14 | 2020-04-10 | 索尼公司 | 电子组件模块、其制造方法、内窥镜装置和移动相机 |
Also Published As
Publication number | Publication date |
---|---|
EP0657932B1 (en) | 2001-09-05 |
US5640051A (en) | 1997-06-17 |
EP0657932A2 (en) | 1995-06-14 |
CN1159956C (zh) | 2004-07-28 |
US5628919A (en) | 1997-05-13 |
DE69428181T2 (de) | 2002-06-13 |
DE69428181D1 (de) | 2001-10-11 |
CN1113607A (zh) | 1995-12-20 |
CN1048824C (zh) | 2000-01-26 |
EP0657932A3 (en) | 1996-02-28 |
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