KR20170070264A - 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 - Google Patents

액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 Download PDF

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Publication number
KR20170070264A
KR20170070264A KR1020177015903A KR20177015903A KR20170070264A KR 20170070264 A KR20170070264 A KR 20170070264A KR 1020177015903 A KR1020177015903 A KR 1020177015903A KR 20177015903 A KR20177015903 A KR 20177015903A KR 20170070264 A KR20170070264 A KR 20170070264A
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KR
South Korea
Prior art keywords
fluid
pressure
porous member
space
collection tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020177015903A
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English (en)
Korean (ko)
Inventor
알렉스 카 팀 푼
레너드 와이 펑 코
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20170070264A publication Critical patent/KR20170070264A/ko
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
KR1020177015903A 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법 Abandoned KR20170070264A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US50031203P 2003-09-03 2003-09-03
US60/500,312 2003-09-03
US54132904P 2004-02-02 2004-02-02
US60/541,329 2004-02-02
PCT/US2004/022915 WO2005024517A2 (en) 2003-09-03 2004-07-16 Apparatus and method for providing fluid for immersion lithography

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020147029538A Division KR101748923B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Publications (1)

Publication Number Publication Date
KR20170070264A true KR20170070264A (ko) 2017-06-21

Family

ID=34278701

Family Applications (8)

Application Number Title Priority Date Filing Date
KR1020177015903A Abandoned KR20170070264A (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020127020883A Expired - Fee Related KR101308826B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117024246A Expired - Fee Related KR101371917B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117019694A Expired - Fee Related KR101288140B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020137016869A Expired - Fee Related KR101590686B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020067003381A Expired - Fee Related KR101238114B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147005373A Expired - Fee Related KR101523180B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147029538A Expired - Fee Related KR101748923B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Family Applications After (7)

Application Number Title Priority Date Filing Date
KR1020127020883A Expired - Fee Related KR101308826B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117024246A Expired - Fee Related KR101371917B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020117019694A Expired - Fee Related KR101288140B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020137016869A Expired - Fee Related KR101590686B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020067003381A Expired - Fee Related KR101238114B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147005373A Expired - Fee Related KR101523180B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
KR1020147029538A Expired - Fee Related KR101748923B1 (ko) 2003-09-03 2004-07-16 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법

Country Status (7)

Country Link
US (8) US7292313B2 (enExample)
EP (4) EP2960702B1 (enExample)
JP (10) JP4288426B2 (enExample)
KR (8) KR20170070264A (enExample)
CN (1) CN101430508B (enExample)
TW (6) TWI475332B (enExample)
WO (1) WO2005024517A2 (enExample)

Families Citing this family (224)

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US20190137888A1 (en) 2019-05-09
CN101430508A (zh) 2009-05-13
KR20110114681A (ko) 2011-10-19
JP6123855B2 (ja) 2017-05-10
JP5835428B2 (ja) 2015-12-24
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KR20140130244A (ko) 2014-11-07
US20180039187A1 (en) 2018-02-08
JP2018028701A (ja) 2018-02-22
KR20120096113A (ko) 2012-08-29
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EP1660925B1 (en) 2015-04-29
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US20090296053A1 (en) 2009-12-03
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HK1091271A1 (en) 2007-01-12
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WO2005024517A3 (en) 2005-09-29
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