JP2017116968A - 液浸リソグラフィ装置及び液浸リソグラフィ方法 - Google Patents
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Abstract
【解決手段】流体は、液浸リソグラフィプロセス中にレンズと基板との間の空間内に供給される。流体は前記空間に流体的に接続された多孔質部材を通じて該空間へ供給され、該空間から回収される。前記多孔質部材中の圧力を前記多孔質部材のバブルポイントより低く維持することにより、流体回収中に該流体に空気が混入することによって生じるノイズを解消することができる。さらに、回収流路を介し、多孔質部材を通じて前記空間から前記流体を引き出すことと、前記空間からの前記流体の引き出し中に前記多孔質部材中の流体の圧力を前記多孔質部材のバブルポイントより低く維持することとを備えている。
【選択図】図3
Description
この出願は、2003年9月3日に提出された米国仮特許出願第60/500,312、及び2004年2月2日に提出された米国仮特許出願第60/541,329の全ての開示に基づくとともに、それらの優先権の利益を主張し、これらの仮出願の全ての開示を援用して本文の記載の一部とする。
ラフィプロセス中に、レンズと基板との間の空間に供給される。流体は、前記空間に流体的に接続された多孔質部材を介して該空間に供給されかつ該空間から回収される。前記多孔質部材のバブルポイントより低く該多孔質部材の圧力を維持することで、流体回収中に該流体に空気が混入することにより発生するノイズの除去が可能となる。前記バブルポイントは、前記多孔質部材中の孔(最大孔)の大きさ及び流体が前記多孔質部材に対してなす接触角(前記多孔質材の性質及び前記流体の性質に基づくパラメータとしての)に依存して決まる多孔質部材の特性である。前記バブルポイントは一般に非常に低圧力なので、この低圧力の制御は重要な課題である。
、前記圧力制御システムは、前記多孔質部材に流体的に接続された流体レベルバッファと;前記流体レベルバッファでの圧力又は流体レベルを検出するように構成されたセンサと;前記多孔質部材を介して前記空間から前記流体を引き出している間に、前記センサからの検出信号に基づいて、前記流体回収出口を通じて前記空間から引き出される前記流体の流速(流量)を調節して前記多孔質部材の前記表面での圧力を前記多孔質部材のバブルポイントより低く維持するように構成されたコントローラとを備えている。前記圧力制御システムは、前記流体回収出口の下流に配置されたバルブを備え、前記コントローラは前記バルブを制御して前記流体回収出口を通じて前記空間から引き出される前記流体の前記流速(流量)を調整するように構成されている。更に他の実施形態では、前記圧力制御システムは、前記流体回収出口に流体的に接続された回収タンクと;前記回収タンク内の圧力を調整するように構成された可制御バキュームレギュレータとを備えている。前記コントローラは前記可制御バキュームレギュレータを制御して、前記回収タンク内の前記圧力を制御することによって前記回収タンクに前記流体回収出口を通じて前記空間から引き出される前記流体の前記流速(流量)を調節するように構成されている。
換される必要がある。独立した部品として外側部30を形成することは、メンテナンスの容易化を促進する。それは、ノズル20全体を交換するのに対して、外側部の交換後の再調整や再キャリブレーションの時間を最小にすることもできる。ノズル20の製造性は、ノズル20が2つの独立した部品で形成される場合に、改善することもできる。代替の実施形態では、ノズル20は単一の部品から製造され得ることが理解される。
でない場合にはオフされる。
Claims (20)
- 基板と終端光学素子との間の液浸液体を介して前記基板上に像を投影する液浸リソグラフィ装置であって、
前記終端光学素子を有し、前記基板上に像を投影する投影光学系と、
前記終端光学素子の周囲に配置されたノズルと、を備え、
前記ノズルは、液浸液体を供給する第1開口と、前記第1開口から供給された液浸液体を回収可能な第2開口と、前記終端光学素子の下側の光路の周囲に配置された下面とを有する第1部材、および前記第1開口から供給された液浸液体を回収可能な回収部を有する第2部材と、を有し、
前記回収部は、前記光路に対して前記下面の外側であって、前記下面の周囲に配置され、
前記第1部材と前記第2部材とは離間して配置され、
前記第2部材の前記回収部は、前記光路に対して、前記第1部材の前記下面よりも外側で前記第2部材と前記基板との間の液浸液体を回収可能である液浸リソグラフィ装置。 - 前記像が前記基板上に投影されている時に、前記終端光学素子の端面と前記基板との距離が、前記第1部材の下面と前記基板との距離よりも大きくなるように前記第1部材が配置されている請求項1記載の液浸リソグラフィ装置。
- 前記第1開口と前記第2開口は、同じ高さに設けられている請求項1又は2記載の液浸リソグラフィ装置。
- 前記第1部材は、前記終端光学素子から離間して配置される請求項1〜3のいずれか一項に記載の液浸リソグラフィ装置。
- 前記第1開口と前記第2開口は、前記下面よりも高い位置に配置される請求項1〜4のいずれか一項に記載の液浸リソグラフィ装置。
- 前記下面は、前記基板に対して実質的に平行である請求項1〜5のいずれか一項に記載の液浸リソグラフィ装置。
- 前記基板が第1方向に移動しながら走査露光される請求項1〜6のいずれか一項に記載の液浸リソグラフィ装置。
- 前記第1開口と前記第2開口は、前記第1方向と交差する第2方向に関して、前記終端光学素子の一側及び他側に配置される請求項7に記載の液浸リソグラフィ装置。
- 前記第1開口からの液体供給と前記第2開口からの液体回収によって、前記液浸液体が前記終端光学素子を横切るように流れる請求項1〜8のいずれか一項記載の液浸リソグラフィ装置。
- 前記第2部材の前記回収部は、前記第1開口を介して供給され、前記光路に対して、前記第1部材の前記下面よりも外側に引き出された液浸液体を回収可能である請求項1〜9のいずれか一項記載の液浸リソグラフィ装置。
- 前記第1開口から供給された液浸液体を介して前記基板に前記像が投影される請求項1〜10のいずれか一項記載の液浸リソグラフィ装置。
- 前記回収部を介して液浸液体を回収するための圧力を制御する圧力制御システムをさらに備え、
前記圧力制御システムは、回収流路を介して前記回収部に接続された第1タンクと、前記第1タンクに接続され、前記第1タンク内の圧力を制御する真空レギュレータとを有する請求項1〜11のいずれか一項記載の液浸リソグラフィ装置。 - 前記圧力制御システムは、前記回収流路に配置され、前記回収部から前記第1タンクへの液体流れを調整するバルブを有する請求項12記載の液浸リソグラフィ装置。
- 前記圧力制御システムは、前記回収流路に配置され、前記回収部からの前記液体回収が不要の場合にオフとされるバルブを有する請求項12又は13記載の液浸リソグラフィ装置。
- 前記回収流路は、前記第1タンクの上部に接続される請求項12〜14のいずれか一項記載の液浸リソグラフィ装置。
- 前記真空レギュレータは、前記第1タンクの上部に接続される請求項12〜15のいずれか一項記載の液浸リソグラフィ装置。
- 前記圧力制御システムは、前記液体を回収するための圧力を測定する圧力センサを有し、前記圧力センサからのセンサ信号に基づいて前記真空レギュレータが制御される請求項12〜16のいずれか一項記載の液浸リソグラフィ装置。
- 前記第2部材が取り付けられる取付部材と、
前記第2部材と前記取付部材との間に配置された振動減衰材とを備える請求項12〜17のいずれか一項に記載の液浸リソグラフィ装置。 - 前記像が前記基板上に投影されている時に、前記終端光学素子の端面と前記基板との距離は、1.0〜5.0mmである請求項1〜18のいずれか一項記載の液浸リソグラフィ装置。
- ノズルを使って、投影光学系の終端光学素子と基板との間の光路を液浸液体で満たすと前記終端光学素子と前記基板との間の液浸液体を介して前記基板上に像を投影する液浸リソグラフィ方法であって、
前記ノズルの第1部材に設けられた第1開口を介して液浸液体を供給することと、
前記第1部材に設けられた第2開口を介して、前記第1開口を介して供給された液浸液体を回収することと、
前記第1開口から供給された液浸液体を、前記ノズルの第2部材の回収部を介して回収することと、を含み、
前記第1部材は、前記光路の周囲に配置された下面を有し、
前記回収部は、前記光路に対して前記下面の外側であって、前記下面の周囲に配置され、
前記第1部材と前記第2部材とは離間して配置され、
前記回収部は、前記光路に対して、前記第1部材の前記下面よりも外側で前記第2部材と前記基板との間の液浸液体を回収可能である液浸リソグラフィ方法。
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US50031203P | 2003-09-03 | 2003-09-03 | |
US60/500,312 | 2003-09-03 | ||
US54132904P | 2004-02-02 | 2004-02-02 | |
US60/541,329 | 2004-02-02 |
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JP2006525323A Expired - Lifetime JP4288426B2 (ja) | 2003-09-03 | 2004-07-16 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2008242895A Expired - Fee Related JP4894834B2 (ja) | 2003-09-03 | 2008-09-22 | 液浸リソグラフィのための装置、露光方法、及び液浸装置 |
JP2010255404A Expired - Fee Related JP5338791B2 (ja) | 2003-09-03 | 2010-11-15 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2012015910A Expired - Fee Related JP5435051B2 (ja) | 2003-09-03 | 2012-01-27 | 液浸リソグラフィシステム、液浸リソグラフィ方法、及びデバイス製造方法 |
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JP2014148358A Expired - Fee Related JP5835428B2 (ja) | 2003-09-03 | 2014-07-18 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2015166994A Expired - Lifetime JP6123855B2 (ja) | 2003-09-03 | 2015-08-26 | 液浸リソグラフィのための流体の供給装置及び方法 |
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JP2017224256A Pending JP2018028701A (ja) | 2003-09-03 | 2017-11-22 | 液浸リソグラフィシステムにおいてレンズと基板との間の空間から流体を回収する方法及び液浸リソグラフィ装置 |
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JP2008242895A Expired - Fee Related JP4894834B2 (ja) | 2003-09-03 | 2008-09-22 | 液浸リソグラフィのための装置、露光方法、及び液浸装置 |
JP2010255404A Expired - Fee Related JP5338791B2 (ja) | 2003-09-03 | 2010-11-15 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2012015910A Expired - Fee Related JP5435051B2 (ja) | 2003-09-03 | 2012-01-27 | 液浸リソグラフィシステム、液浸リソグラフィ方法、及びデバイス製造方法 |
JP2013186437A Expired - Fee Related JP5692316B2 (ja) | 2003-09-03 | 2013-09-09 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2014148358A Expired - Fee Related JP5835428B2 (ja) | 2003-09-03 | 2014-07-18 | 液浸リソグラフィのための流体の供給装置及び方法 |
JP2015166994A Expired - Lifetime JP6123855B2 (ja) | 2003-09-03 | 2015-08-26 | 液浸リソグラフィのための流体の供給装置及び方法 |
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