JP5426814B2 - インプリントリソグラフィ用の材料 - Google Patents

インプリントリソグラフィ用の材料 Download PDF

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Publication number
JP5426814B2
JP5426814B2 JP2006554142A JP2006554142A JP5426814B2 JP 5426814 B2 JP5426814 B2 JP 5426814B2 JP 2006554142 A JP2006554142 A JP 2006554142A JP 2006554142 A JP2006554142 A JP 2006554142A JP 5426814 B2 JP5426814 B2 JP 5426814B2
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JP
Japan
Prior art keywords
imprint
imprint material
material according
surfactant
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006554142A
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English (en)
Japanese (ja)
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JP2007523249A5 (enExample
JP2007523249A (ja
Inventor
シュ，フランク・ワイ
ワッツ，マイケル・ピイ・シイ
ステイシイ，ニコラス・エイ
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University of Texas System
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University of Texas System
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006554142A 2004-02-23 2005-02-14 インプリントリソグラフィ用の材料 Expired - Fee Related JP5426814B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/784,911 US8076386B2 (en) 2004-02-23 2004-02-23 Materials for imprint lithography
US10/784,911 2004-02-23
PCT/US2005/004415 WO2005082992A1 (en) 2004-02-23 2005-02-14 Materials for imprint lithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012139488A Division JP5753132B2 (ja) 2004-02-23 2012-06-21 インプリントリソグラフィ用の材料

Publications (3)

Publication Number Publication Date
JP2007523249A JP2007523249A (ja) 2007-08-16
JP2007523249A5 JP2007523249A5 (enExample) 2013-11-21
JP5426814B2 true JP5426814B2 (ja) 2014-02-26

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Family Applications (3)

Application Number Title Priority Date Filing Date
JP2006554142A Expired - Fee Related JP5426814B2 (ja) 2004-02-23 2005-02-14 インプリントリソグラフィ用の材料
JP2012139488A Expired - Lifetime JP5753132B2 (ja) 2004-02-23 2012-06-21 インプリントリソグラフィ用の材料
JP2014258521A Expired - Lifetime JP6326700B2 (ja) 2004-02-23 2014-12-22 インプリントリソグラフィ用の材料

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2012139488A Expired - Lifetime JP5753132B2 (ja) 2004-02-23 2012-06-21 インプリントリソグラフィ用の材料
JP2014258521A Expired - Lifetime JP6326700B2 (ja) 2004-02-23 2014-12-22 インプリントリソグラフィ用の材料

Country Status (6)

Country Link
US (1) US8076386B2 (enExample)
EP (2) EP2261280B1 (enExample)
JP (3) JP5426814B2 (enExample)
MY (1) MY141006A (enExample)
TW (1) TWI324622B (enExample)
WO (1) WO2005082992A1 (enExample)

Families Citing this family (193)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
KR100632632B1 (ko) * 2004-05-28 2006-10-12 삼성전자주식회사 나노 결정의 다층 박막 제조 방법 및 이를 이용한유·무기 하이브리드 전기 발광 소자
ATE477515T1 (de) * 2004-06-03 2010-08-15 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8846195B2 (en) * 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
JP5000112B2 (ja) * 2005-09-09 2012-08-15 東京応化工業株式会社 ナノインプリントリソグラフィによるパターン形成方法
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
JP4929722B2 (ja) * 2006-01-12 2012-05-09 日立化成工業株式会社 光硬化型ナノプリント用レジスト材及びパターン形成法
US7360851B1 (en) 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
US8012395B2 (en) 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US8142702B2 (en) * 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography
SG185929A1 (en) * 2007-11-21 2012-12-28 Molecular Imprints Inc Porous template and imprinting stack for nano-imprint lithography
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
US9323143B2 (en) * 2008-02-05 2016-04-26 Canon Nanotechnologies, Inc. Controlling template surface composition in nano-imprint lithography
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
KR20100033704A (ko) * 2008-09-22 2010-03-31 엘지전자 주식회사 미세패턴을 구비하는 스탬퍼
US20100072671A1 (en) * 2008-09-25 2010-03-25 Molecular Imprints, Inc. Nano-imprint lithography template fabrication and treatment
US8470188B2 (en) * 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US20100090341A1 (en) * 2008-10-14 2010-04-15 Molecular Imprints, Inc. Nano-patterned active layers formed by nano-imprint lithography
US20100098858A1 (en) * 2008-10-17 2010-04-22 Molecular Imprints, Inc. Fluid Dispense System Coating
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
US8075299B2 (en) * 2008-10-21 2011-12-13 Molecular Imprints, Inc. Reduction of stress during template separation
US20100098847A1 (en) * 2008-10-21 2010-04-22 Molecular Imprints, Inc. Drop Deposition Materials for Imprint Lithography
US20100095862A1 (en) * 2008-10-22 2010-04-22 Molecular Imprints, Inc. Double Sidewall Angle Nano-Imprint Template
US20100104852A1 (en) * 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
US8652393B2 (en) * 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
US20100112220A1 (en) * 2008-11-03 2010-05-06 Molecular Imprints, Inc. Dispense system set-up and characterization
US20100109205A1 (en) * 2008-11-04 2010-05-06 Molecular Imprints, Inc. Photocatalytic reactions in nano-imprint lithography processes
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
US9164375B2 (en) 2009-06-19 2015-10-20 Canon Nanotechnologies, Inc. Dual zone template chuck
US8913230B2 (en) 2009-07-02 2014-12-16 Canon Nanotechnologies, Inc. Chucking system with recessed support feature
US20110030770A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Nanostructured organic solar cells
US20110031650A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Adjacent Field Alignment
CN102648438A (zh) * 2009-08-26 2012-08-22 分子制模股份有限公司 功能性纳米微粒
US20110048518A1 (en) 2009-08-26 2011-03-03 Molecular Imprints, Inc. Nanostructured thin film inorganic solar cells
US8802747B2 (en) * 2009-08-26 2014-08-12 Molecular Imprints, Inc. Nanoimprint lithography processes for forming nanoparticles
JP5564383B2 (ja) 2009-09-30 2014-07-30 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
US20110084417A1 (en) * 2009-10-08 2011-04-14 Molecular Imprints, Inc. Large area linear array nanoimprinting
US20110165412A1 (en) * 2009-11-24 2011-07-07 Molecular Imprints, Inc. Adhesion layers in nanoimprint lithograhy
US20110140304A1 (en) 2009-12-10 2011-06-16 Molecular Imprints, Inc. Imprint lithography template
WO2011094317A2 (en) 2010-01-26 2011-08-04 Molecular Imprints, Inc. Micro-conformal templates for nanoimprint lithography
US8980751B2 (en) 2010-01-27 2015-03-17 Canon Nanotechnologies, Inc. Methods and systems of material removal and pattern transfer
US8691134B2 (en) 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
US20110180127A1 (en) 2010-01-28 2011-07-28 Molecular Imprints, Inc. Solar cell fabrication by nanoimprint lithography
US20110189329A1 (en) * 2010-01-29 2011-08-04 Molecular Imprints, Inc. Ultra-Compliant Nanoimprint Lithography Template
KR101772993B1 (ko) 2010-02-05 2017-08-31 캐논 나노테크놀로지즈 인코퍼레이티드 고 콘트라스트 정렬 마크를 갖는 주형
WO2011100050A2 (en) 2010-02-09 2011-08-18 Molecular Imprints, Inc. Process gas confinement for nano-imprinting
JP5491931B2 (ja) * 2010-03-30 2014-05-14 富士フイルム株式会社 ナノインプリント方法およびモールド製造方法
EP2564271B1 (en) 2010-04-27 2015-12-16 Canon Nanotechnologies, Inc. Separation control substrate/template for nanoimprint lithography
WO2011143327A2 (en) 2010-05-11 2011-11-17 Molecular Imprints, Inc. Nanostructured solar cell
SG186878A1 (en) 2010-07-02 2013-02-28 Tokuyama Corp Photocurable composition for imprint and method for formation of pattern using the composition
US8541053B2 (en) 2010-07-08 2013-09-24 Molecular Imprints, Inc. Enhanced densification of silicon oxide layers
US8891080B2 (en) 2010-07-08 2014-11-18 Canon Nanotechnologies, Inc. Contaminate detection and substrate cleaning
NL2007128A (en) 2010-08-16 2012-02-20 Asml Netherlands Bv Imprint lithography inspection method and apparatus.
KR101861644B1 (ko) 2010-09-24 2018-05-28 캐논 나노테크놀로지즈 인코퍼레이티드 다단계 임프린팅을 통한 고콘트라스트 정렬 마크
WO2012061816A2 (en) 2010-11-05 2012-05-10 Molecular Imprints, Inc. Patterning of non-convex shaped nanostructures
EP2635522A4 (en) 2010-11-05 2014-06-11 Molecular Imprints Inc NANOPRÄGUNGS-LITHOGRAPHIEVERSTELLUNG FUNCTIONAL NANOPARTICLE WITH TWO SEPARATE LAYERS
US8926888B2 (en) 2011-02-25 2015-01-06 Board Of Regents, The University Of Texas System Fluorinated silazane release agents in nanoimprint lithography
JP2014103135A (ja) * 2011-03-10 2014-06-05 Toyo Gosei Kogyo Kk 光硬化物の製造方法
JP5761860B2 (ja) * 2011-03-25 2015-08-12 富士フイルム株式会社 インプリントシステム、及びインプリント方法
US20120261849A1 (en) * 2011-04-14 2012-10-18 Canon Kabushiki Kaisha Imprint apparatus, and article manufacturing method using same
JP6306501B2 (ja) 2011-04-25 2018-04-04 キヤノン ナノテクノロジーズ，インコーポレーテッド テンプレートおよびテンプレートを基板と位置合わせするための方法
JP5611912B2 (ja) * 2011-09-01 2014-10-22 株式会社東芝 インプリント用レジスト材料、パターン形成方法、及びインプリント装置
JP5806903B2 (ja) 2011-09-30 2015-11-10 富士フイルム株式会社 ナノインプリント方法およびそれに用いられるレジスト組成物
US9452574B2 (en) 2011-12-19 2016-09-27 Canon Nanotechnologies, Inc. Fabrication of seamless large area master templates for imprint lithography using step and repeat tools
JP5959865B2 (ja) 2012-02-09 2016-08-02 キヤノン株式会社 光硬化物及びその製造方法
US9616614B2 (en) 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP5846974B2 (ja) 2012-03-13 2016-01-20 富士フイルム株式会社 光インプリント用硬化性組成物、パターン形成方法およびパターン
JP6071255B2 (ja) * 2012-06-04 2017-02-01 キヤノン株式会社 光硬化物
US20130337176A1 (en) * 2012-06-19 2013-12-19 Seagate Technology Llc Nano-scale void reduction
SG11201505712VA (en) 2013-03-15 2015-08-28 Canon Nanotechnologies Inc Nano imprinting with reusable polymer template with metallic or oxide coating
TWI637234B (zh) 2013-07-12 2018-10-01 美商佳能奈米科技股份有限公司 用於壓印微影術之利用方向性圖案化模板的液滴圖案生成技術
JP6526653B2 (ja) 2013-11-08 2019-06-05 キャノン・ナノテクノロジーズ・インコーポレーテッド 改善されたオーバレイ補正のための低接触インプリントリソグラフィテンプレート用チャックシステム
US9155201B2 (en) 2013-12-03 2015-10-06 Eastman Kodak Company Preparation of articles with conductive micro-wire pattern
US10124529B2 (en) 2013-12-10 2018-11-13 Canon Nanotechnologies, Inc. Imprint lithography template and method for zero-gap imprinting
CN106030406B (zh) 2013-12-30 2020-04-24 佳能纳米技术公司 用于亚20nm特征的均匀压印图案转移的方法
KR102305247B1 (ko) 2013-12-31 2021-09-27 캐논 나노테크놀로지즈 인코퍼레이티드 국부 필드 임프린팅을 위한 비대칭 템플릿 형상 변조
CN107075661B (zh) * 2014-09-26 2020-03-17 韩国机械研究院 形成有多个纳米间隙的基底及其制备方法
AU2015323940B2 (en) 2014-09-29 2021-05-20 Magic Leap, Inc. Architectures and methods for outputting different wavelength light out of waveguides
AT516558B1 (de) * 2014-12-10 2018-02-15 Joanneum Res Forschungsgmbh Prägelack, Verfahren zum Prägen sowie mit dem Prägelack beschichtete Substratoberfläche
KR102630754B1 (ko) 2015-03-16 2024-01-26 매직 립, 인코포레이티드 증강 현실 펄스 옥시미트리
AU2016278006B2 (en) 2015-06-15 2021-09-02 Magic Leap, Inc. Virtual and augmented reality systems and methods
US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
US10488753B2 (en) 2015-09-08 2019-11-26 Canon Kabushiki Kaisha Substrate pretreatment and etch uniformity in nanoimprint lithography
US10131134B2 (en) 2015-10-30 2018-11-20 Canon Kabushiki Kaisha System and method for discharging electrostatic charge in nanoimprint lithography processes
US10211051B2 (en) 2015-11-13 2019-02-19 Canon Kabushiki Kaisha Method of reverse tone patterning
JP2017135304A (ja) * 2016-01-29 2017-08-03 旭化成株式会社 微細パタン形成用積層体
US10654216B2 (en) 2016-03-30 2020-05-19 Canon Kabushiki Kaisha System and methods for nanoimprint lithography
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10134588B2 (en) 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
CA3019946C (en) 2016-04-08 2023-02-28 Magic Leap, Inc. Augmented reality systems and methods with variable focus lens elements
US11226553B2 (en) 2016-05-11 2022-01-18 Dic Corporation Photo-imprinting curable composition and pattern transferring method using the same
WO2017197020A1 (en) 2016-05-12 2017-11-16 Magic Leap, Inc. Distributed light manipulation over imaging waveguide
US10509313B2 (en) 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10035296B2 (en) 2016-10-13 2018-07-31 Canon Kabushiki Kaisha Methods for controlling spread of imprint material
US10627715B2 (en) 2016-10-31 2020-04-21 Canon Kabushiki Kaisha Method for separating a nanoimprint template from a substrate
US11454883B2 (en) 2016-11-14 2022-09-27 Canon Kabushiki Kaisha Template replication
EP3542216A4 (en) 2016-11-18 2020-10-07 Magic Leap, Inc. MULTI-LAYER LIQUID CRYSTAL DIFFRACTION NETWORKS TO REDIRECT LIGHT FROM LARGE INCIDENCE ANGLE RANGES
US11067860B2 (en) 2016-11-18 2021-07-20 Magic Leap, Inc. Liquid crystal diffractive devices with nano-scale pattern and methods of manufacturing the same
CA3044241A1 (en) 2016-11-18 2018-05-24 Magic Leap, Inc. Waveguide light multiplexer using crossed gratings
CN115469458B (zh) 2016-11-18 2025-06-03 奇跃公司 空间可变液晶衍射光栅
US10969680B2 (en) 2016-11-30 2021-04-06 Canon Kabushiki Kaisha System and method for adjusting a position of a template
IL304304B2 (en) 2016-12-08 2024-08-01 Magic Leap Inc Diffractive devices based on cholesteric liquid crystal
CN115657363A (zh) 2016-12-14 2023-01-31 奇跃公司 使用具有表面对准图案的软压印复制对液晶图案化
US10578984B2 (en) 2016-12-20 2020-03-03 Canon Kabushiki Kaisha Adaptive chucking system
US10288999B2 (en) 2016-12-20 2019-05-14 Canon Kabushiki Kaisha Methods for controlling extrusions during imprint template replication processes
US10991582B2 (en) 2016-12-21 2021-04-27 Canon Kabushiki Kaisha Template for imprint lithography including a recession, an apparatus of using the template, and a method of fabricating an article
US10712660B2 (en) 2016-12-21 2020-07-14 Canon Kabushiki Kaisha Template for imprint lithography including a recession and an apparatus and method of using the template
US10371896B2 (en) 2016-12-22 2019-08-06 Magic Leap, Inc. Color separation in planar waveguides using dichroic filters
AU2018210527B2 (en) 2017-01-23 2022-12-01 Magic Leap, Inc. Eyepiece for virtual, augmented, or mixed reality systems
CA3052831A1 (en) 2017-02-23 2018-08-30 Magic Leap, Inc. Variable-focus virtual image devices based on polarization conversion
US10079152B1 (en) 2017-02-24 2018-09-18 Canon Kabushiki Kaisha Method for forming planarized etch mask structures over existing topography
US9971249B1 (en) 2017-02-27 2018-05-15 Canon Kabushiki Kaisha Method and system for controlled ultraviolet light exposure
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography
IL269317B2 (en) 2017-03-21 2023-11-01 Magic Leap Inc An eye imaging device that uses optical refractive elements
US10303049B2 (en) 2017-03-22 2019-05-28 Canon Kabushiki Kaisha Reducing electric charge in imprint lithography
US10534259B2 (en) 2017-03-28 2020-01-14 Canon Kabushiki Kaisha Method and system for imprint force control
US10866510B2 (en) 2017-07-31 2020-12-15 Canon Kabushiki Kaisha Overlay improvement in nanoimprint lithography
US10996560B2 (en) 2017-07-31 2021-05-04 Canon Kabushiki Kaisha Real-time correction of template deformation in nanoimprint lithography
US10580659B2 (en) 2017-09-14 2020-03-03 Canon Kabushiki Kaisha Planarization process and apparatus
IL273397B2 (en) 2017-09-21 2024-09-01 Magic Leap Inc An augmented reality display with a waveguide configured to capture images of an eye and/or environment
US11448958B2 (en) 2017-09-21 2022-09-20 Canon Kabushiki Kaisha System and method for controlling the placement of fluid resist droplets
US10935883B2 (en) 2017-09-29 2021-03-02 Canon Kabushiki Kaisha Nanoimprint template with light blocking material and method of fabrication
US10895806B2 (en) 2017-09-29 2021-01-19 Canon Kabushiki Kaisha Imprinting method and apparatus
US11036130B2 (en) 2017-10-19 2021-06-15 Canon Kabushiki Kaisha Drop placement evaluation
US10788749B2 (en) 2017-11-30 2020-09-29 Canon Kabushiki Kaisha System and method for improving the throughput of a nanoimprint system
US10663869B2 (en) 2017-12-11 2020-05-26 Canon Kabushiki Kaisha Imprint system and imprinting process with spatially non-uniform illumination
WO2019118930A1 (en) 2017-12-15 2019-06-20 Magic Leap, Inc. Eyepieces for augmented reality display system
US10409178B2 (en) * 2017-12-18 2019-09-10 Canon Kabushiki Kaisha Alignment control in nanoimprint lithography based on real-time system identification
US10996561B2 (en) 2017-12-26 2021-05-04 Canon Kabushiki Kaisha Nanoimprint lithography with a six degrees-of-freedom imprint head module
US11194247B2 (en) 2018-01-31 2021-12-07 Canon Kabushiki Kaisha Extrusion control by capillary force reduction
TWI799550B (zh) 2018-03-27 2023-04-21 日商富士軟片股份有限公司 壓印用硬化性組成物、脫模劑、硬化物、圖案形成方法和微影方法
EP3547026B1 (en) * 2018-03-28 2023-11-29 CSEM Centre Suisse d'Electronique et de Microtechnique SA Method for producing a metal stamp for embossing a nano- and/or microstructure on a metal device as well as uses thereof and devices made therewith
US11249405B2 (en) 2018-04-30 2022-02-15 Canon Kabushiki Kaisha System and method for improving the performance of a nanoimprint system
US10739675B2 (en) 2018-05-31 2020-08-11 Canon Kabushiki Kaisha Systems and methods for detection of and compensation for malfunctioning droplet dispensing nozzles
US10921706B2 (en) 2018-06-07 2021-02-16 Canon Kabushiki Kaisha Systems and methods for modifying mesa sidewalls
US10990004B2 (en) 2018-07-18 2021-04-27 Canon Kabushiki Kaisha Photodissociation frame window, systems including a photodissociation frame window, and methods of using a photodissociation frame window
US11294277B2 (en) 2018-07-25 2022-04-05 Canon Kabushiki Kaisha Process of imprinting a substrate with fluid control features
JP2020035924A (ja) * 2018-08-30 2020-03-05 キオクシア株式会社 原版
US10976657B2 (en) 2018-08-31 2021-04-13 Canon Kabushiki Kaisha System and method for illuminating edges of an imprint field with a gradient dosage
JP7064011B2 (ja) 2018-09-28 2022-05-09 富士フイルム株式会社 インプリント用硬化性組成物、インプリント用硬化性組成物の製造方法、硬化物、パターン製造方法および半導体素子の製造方法
US11131923B2 (en) 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
CN113302546A (zh) 2018-11-20 2021-08-24 奇跃公司 用于增强现实显示系统的目镜
US11281095B2 (en) 2018-12-05 2022-03-22 Canon Kabushiki Kaisha Frame curing template and system and method of using the frame curing template
US10754078B2 (en) 2018-12-20 2020-08-25 Canon Kabushiki Kaisha Light source, a shaping system using the light source and an article manufacturing method
US11243466B2 (en) 2019-01-31 2022-02-08 Canon Kabushiki Kaisha Template with mass velocity variation features, nanoimprint lithography apparatus that uses the template, and methods that use the template
US11442359B2 (en) 2019-03-11 2022-09-13 Canon Kabushiki Kaisha Method of separating a template from a shaped film on a substrate
US11209730B2 (en) 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
KR102698137B1 (ko) 2019-03-22 2024-08-23 후지필름 가부시키가이샤 패턴 형성용 조성물, 키트, 패턴의 제조 방법, 패턴, 및, 반도체 소자의 제조 방법
US11181819B2 (en) 2019-05-31 2021-11-23 Canon Kabushiki Kaisha Frame curing method for extrusion control
WO2020246405A1 (ja) 2019-06-07 2020-12-10 富士フイルム株式会社 パターン形成用組成物、硬化膜、積層体、パターンの製造方法および半導体素子の製造方法
US11402749B2 (en) 2019-06-19 2022-08-02 Canon Kabushiki Kaisha Drop pattern correction for nano-fabrication
CN114286962A (zh) 2019-06-20 2022-04-05 奇跃公司 用于增强现实显示系统的目镜
US11373861B2 (en) 2019-07-05 2022-06-28 Canon Kabushiki Kaisha System and method of cleaning mesa sidewalls of a template
US11164302B2 (en) 2019-08-08 2021-11-02 Canon Kabushiki Kaisha Systems and methods for classifying images of an imprinted film
US11549020B2 (en) 2019-09-23 2023-01-10 Canon Kabushiki Kaisha Curable composition for nano-fabrication
US11327409B2 (en) 2019-10-23 2022-05-10 Canon Kabushiki Kaisha Systems and methods for curing an imprinted field
US11429022B2 (en) 2019-10-23 2022-08-30 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11215921B2 (en) 2019-10-31 2022-01-04 Canon Kabushiki Kaisha Residual layer thickness compensation in nano-fabrication by modified drop pattern
US11550216B2 (en) 2019-11-25 2023-01-10 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11366384B2 (en) 2019-12-18 2022-06-21 Canon Kabushiki Kaisha Nanoimprint lithography system and method for adjusting a radiation pattern that compensates for slippage of a template
US11567401B2 (en) 2019-12-20 2023-01-31 Canon Kabushiki Kaisha Nanofabrication method with correction of distortion within an imprint system
US11126079B1 (en) 2020-04-09 2021-09-21 Canon Kabushiki Kaisha Nano-fabrication system with cleaning system for cleaning a faceplate of a dispenser and method of cleaning the faceplate
US11262651B2 (en) 2020-05-28 2022-03-01 Canon Kabushiki Kaisha System for detecting accumulated material on a faceplate of a dispenser and method of inspecting the faceplate
US11262652B2 (en) 2020-06-25 2022-03-01 Canon Kabushiki Kaisha Nanofabrication method with correction of distortion within an imprint system
US11774849B2 (en) 2020-09-22 2023-10-03 Canon Kabushiki Kaisha Method and system for adjusting edge positions of a drop pattern
US12415357B2 (en) 2020-10-27 2025-09-16 Canon Kabushiki Kaisha Method of cleaning fluid dispenser by applying suction force and vibrating meniscus
US11994797B2 (en) 2020-10-28 2024-05-28 Canon Kabushiki Kaisha System and method for shaping a film with a scaled calibration measurement parameter
US11747731B2 (en) 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator
US11815811B2 (en) 2021-03-23 2023-11-14 Canon Kabushiki Kaisha Magnification ramp scheme to mitigate template slippage
US12111570B2 (en) 2021-03-29 2024-10-08 Canon Kabushiki Kaisha Shaping system with cutouts in an optical diaphragm and method of use
US11614693B2 (en) 2021-06-30 2023-03-28 Canon Kabushiki Kaisha Method of determining the initial contact point for partial fields and method of shaping a surface
US12269282B2 (en) 2021-10-15 2025-04-08 Canon Kabushiki Kaisha Nanoimprint lithography template with peripheral pockets, system of using the template, and method of using the template
US12124165B2 (en) 2021-10-25 2024-10-22 Canon Kabushiki Kaisha Apparatus and method for optimizing actuator forces
US12321103B2 (en) 2021-12-20 2025-06-03 Canon Kabushiki Kaisha System and method of generating a set of illumination patterns for use in a photomechanical shaping system
US12153342B2 (en) 2022-08-30 2024-11-26 Canon Kabushiki Kaisha Nanofabrication method with correction of distortion within an imprint system
US12409466B2 (en) 2022-12-12 2025-09-09 Canon Kabushiki Kaisha Method and system for switching a dispensed fluid in a nanofabrication dispensing system
US12235587B2 (en) 2023-03-28 2025-02-25 Canon Kabushiki Kaisha Method and system for determining initial contact control values for shaping partial fields and method and system for shaping partial fields
CN117289548B (zh) * 2023-11-27 2024-01-26 青岛天仁微纳科技有限责任公司 一种用于微细线栅制备的高精压印装置及方法

Family Cites Families (347)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US877036A (en) * 1907-11-04 1908-01-21 United Shoe Machinery Ab Inseam-trimming machine.
US3527062A (en) 1968-09-25 1970-09-08 Singer General Precision Universal joint flexure hinge
US3810874A (en) 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US3783520A (en) 1970-09-28 1974-01-08 Bell Telephone Labor Inc High accuracy alignment procedure utilizing moire patterns
US3807027A (en) 1972-03-31 1974-04-30 Johns Manville Method of forming the bell end of a bell and spigot joint
US3807029A (en) 1972-09-05 1974-04-30 Bendix Corp Method of making a flexural pivot
US3811665A (en) 1972-09-05 1974-05-21 Bendix Corp Flexural pivot with diaphragm means
US3807087A (en) * 1972-10-10 1974-04-30 Mattel Inc Automatic battery cut-off system for electric motor-driven toy vehicles using rechargeable batteries
US3919351A (en) 1973-08-29 1975-11-11 Ppg Industries Inc Composition useful in making extensible films
FR2325018A1 (fr) 1975-06-23 1977-04-15 Ibm Dispositif de mesure d'intervalle pour definir la distance entre deux faces ou plus
IT1068535B (it) 1975-11-03 1985-03-21 Ibm Apparecchio e processo elettrolito grafico
US4062600A (en) 1976-04-05 1977-12-13 Litton Systems, Inc. Dual-gimbal gyroscope flexure suspension
US4098001A (en) 1976-10-13 1978-07-04 The Charles Stark Draper Laboratory, Inc. Remote center compliance system
DE2800476A1 (de) 1977-01-07 1978-07-13 Instruments Sa Verfahren zur duplizierung einer optischen flaeche sowie so hergestelltes beugungsgitter
US4155169A (en) 1978-03-16 1979-05-22 The Charles Stark Draper Laboratory, Inc. Compliant assembly system device
US4251277A (en) 1978-04-24 1981-02-17 Sws Silicones Corporation Compositions containing thiofunctional polysiloxanes
US4201800A (en) 1978-04-28 1980-05-06 International Business Machines Corp. Hardened photoresist master image mask process
JPS6053675B2 (ja) 1978-09-20 1985-11-27 富士写真フイルム株式会社 スピンコ−テイング方法
US4202107A (en) 1978-10-23 1980-05-13 Watson Paul C Remote axis admittance system
US4326805A (en) 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4337579A (en) 1980-04-16 1982-07-06 The Charles Stark Draper Laboratory, Inc. Deformable remote center compliance device
JPS573875A (en) 1980-06-11 1982-01-09 Tamura Kaken Kk Photopolymerizable ink composition
US4355469A (en) 1980-11-28 1982-10-26 The Charles Stark Draper Laboratory, Inc. Folded remote center compliance device
SE454519B (sv) * 1981-09-11 1988-05-09 Inst Mekhaniki Metallopolimern Sjevsmorjande kompositmaterial
US4414750A (en) 1981-10-19 1983-11-15 The Charles Stark Draper Laboratory, Inc. Single stage remote center compliance device
DE3208081A1 (de) 1982-03-06 1983-09-08 Braun Ag, 6000 Frankfurt Verfahren zur herstellung einer siebartigen scherfolie fuer einen elektrisch betriebenen trockenrasierapparat mit erhebungen auf ihrer der haut zugewandten flaeche
US4617238A (en) 1982-04-01 1986-10-14 General Electric Company Vinyloxy-functional organopolysiloxane compositions
US4426247A (en) 1982-04-12 1984-01-17 Nippon Telegraph & Telephone Public Corporation Method for forming micropattern
US4440804A (en) 1982-08-02 1984-04-03 Fairchild Camera & Instrument Corporation Lift-off process for fabricating self-aligned contacts
US4544572A (en) 1982-09-07 1985-10-01 Minnesota Mining And Manufacturing Company Coated ophthalmic lenses and method for coating the same
JPS5972727A (ja) 1982-10-19 1984-04-24 Matsushita Electric Ind Co Ltd 位置合わせ用テ−ブル
US4451507A (en) 1982-10-29 1984-05-29 Rca Corporation Automatic liquid dispensing apparatus for spinning surface of uniform thickness
FR2538923A1 (fr) 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
US4514439A (en) 1983-09-16 1985-04-30 Rohm And Haas Company Dust cover
US4507331A (en) 1983-12-12 1985-03-26 International Business Machines Corporation Dry process for forming positive tone micro patterns
US4512848A (en) 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4517337A (en) 1984-02-24 1985-05-14 General Electric Company Room temperature vulcanizable organopolysiloxane compositions and method for making
US4552833A (en) 1984-05-14 1985-11-12 International Business Machines Corporation Radiation sensitive and oxygen plasma developable resist
US4614667A (en) 1984-05-21 1986-09-30 Minnesota Mining And Manufacturing Company Composite low surface energy liner of perfluoropolyether
DE3583707D1 (de) 1984-06-26 1991-09-12 Asahi Glass Co Ltd Durchsichtiger schwer schmutzender gegenstand mit niedriger reflexion.
US4694703A (en) 1984-06-28 1987-09-22 Lear Siegler, Inc. Circumferentially oriented flexure suspension
JPS61116358A (ja) 1984-11-09 1986-06-03 Mitsubishi Electric Corp フオトマスク材料
US4908298A (en) 1985-03-19 1990-03-13 International Business Machines Corporation Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
EP0228671A1 (en) 1985-12-23 1987-07-15 General Electric Company Method for the production of a coated substrate with controlled surface characteristics
US4657845A (en) 1986-01-14 1987-04-14 International Business Machines Corporation Positive tone oxygen plasma developable photoresist
US4692205A (en) 1986-01-31 1987-09-08 International Business Machines Corporation Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings
US4724222A (en) 1986-04-28 1988-02-09 American Telephone And Telegraph Company, At&T Bell Laboratories Wafer chuck comprising a curved reference surface
US4737425A (en) 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
KR900004269B1 (ko) 1986-06-11 1990-06-18 가부시기가이샤 도시바 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치
US4929083A (en) 1986-06-19 1990-05-29 Xerox Corporation Focus and overlay characterization and optimization for photolithographic exposure
DE3760773D1 (en) 1986-07-25 1989-11-16 Oki Electric Ind Co Ltd Negative resist material, method for its manufacture and method for using it
JPS6376330A (ja) 1986-09-18 1988-04-06 Oki Electric Ind Co Ltd 半導体装置の製造方法
FR2604553A1 (fr) 1986-09-29 1988-04-01 Rhone Poulenc Chimie Substrat polymere rigide pour disque optique et les disques optiques obtenus a partir dudit substrat
US4707218A (en) 1986-10-28 1987-11-17 International Business Machines Corporation Lithographic image size reduction
JPS63162132A (ja) 1986-12-26 1988-07-05 Nippon Thompson Co Ltd Ｘｙテ−ブル
US4931351A (en) 1987-01-12 1990-06-05 Eastman Kodak Company Bilayer lithographic process
US6391798B1 (en) 1987-02-27 2002-05-21 Agere Systems Guardian Corp. Process for planarization a semiconductor substrate
US5736424A (en) 1987-02-27 1998-04-07 Lucent Technologies Inc. Device fabrication involving planarization
US4731155A (en) 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US4808511A (en) 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
US4936951A (en) 1987-10-26 1990-06-26 Matsushita Electric Industrial Co., Ltd. Method of reducing proximity effect in electron beam resists
JPH01163027A (ja) 1987-12-21 1989-06-27 Matsushita Electric Ind Co Ltd 光学素子の成形方法およびその装置
US5028366A (en) 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
DE3805631A1 (de) 1988-02-24 1989-09-07 Teldix Gmbh Drehschwingungsantrieb
US4883561A (en) 1988-03-29 1989-11-28 Bell Communications Research, Inc. Lift-off and subsequent bonding of epitaxial films
US4846931A (en) 1988-03-29 1989-07-11 Bell Communications Research, Inc. Method for lifting-off epitaxial films
US4891303A (en) 1988-05-26 1990-01-02 Texas Instruments Incorporated Trilayer microlithographic process using a silicon-based resist as the middle layer
JPH0625235B2 (ja) * 1988-06-21 1994-04-06 信越化学工業株式会社 硬化性弾性組成物
JPH0269936A (ja) 1988-07-28 1990-03-08 Siemens Ag 半導体材料上の樹脂構造の形成方法
US4921778A (en) 1988-07-29 1990-05-01 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material
US5108875A (en) 1988-07-29 1992-04-28 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material
EP0355496A3 (en) 1988-08-15 1990-10-10 Sumitomo Heavy Industries Co., Ltd. Position detector employing a sector fresnel zone plate
JP2546350B2 (ja) 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
US4964945A (en) 1988-12-09 1990-10-23 Minnesota Mining And Manufacturing Company Lift off patterning process on a flexible substrate
US5439766A (en) 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
CA2010169A1 (en) 1989-02-21 1990-08-21 Masakazu Uekita Multi-layer resist
US4999280A (en) 1989-03-17 1991-03-12 International Business Machines Corporation Spray silylation of photoresist images
US5169494A (en) 1989-03-27 1992-12-08 Matsushita Electric Industrial Co., Ltd. Fine pattern forming method
JP3001607B2 (ja) 1989-04-24 2000-01-24 シーメンス、アクチエンゲゼルシヤフト 二層法における寸法安定な構造転写方法
ES2103261T3 (es) 1989-04-24 1997-09-16 Siemens Ag Procedimiento para la generacion de estructuras resistentes a la corrosion.
US5110514A (en) 1989-05-01 1992-05-05 Soane Technologies, Inc. Controlled casting of a shrinkable material
US5053318A (en) 1989-05-18 1991-10-01 Shipley Company Inc. Plasma processing with metal mask integration
CA2011927C (en) 1989-06-02 1996-12-24 Alan Lee Sidman Microlithographic method for producing thick, vertically-walled photoresist patterns
US4919748A (en) 1989-06-30 1990-04-24 At&T Bell Laboratories Method for tapered etching
JP2704001B2 (ja) 1989-07-18 1998-01-26 キヤノン株式会社 位置検出装置
US5151754A (en) 1989-10-06 1992-09-29 Kabushiki Kaisha Toshiba Method and an apparatus for measuring a displacement between two objects and a method and an apparatus for measuring a gap distance between two objects
US5362606A (en) 1989-10-18 1994-11-08 Massachusetts Institute Of Technology Positive resist pattern formation through focused ion beam exposure and surface barrier silylation
US5139925A (en) 1989-10-18 1992-08-18 Massachusetts Institute Of Technology Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser
US5204381A (en) 1990-02-13 1993-04-20 The United States Of America As Represented By The United States Department Of Energy Hybrid sol-gel optical materials
JP3197010B2 (ja) 1990-03-05 2001-08-13 株式会社東芝 間隔設定方法及び間隔設定装置
US5073230A (en) 1990-04-17 1991-12-17 Arizona Board Of Regents Acting On Behalf Of Arizona State University Means and methods of lifting and relocating an epitaxial device layer
US5328810A (en) 1990-05-07 1994-07-12 Micron Technology, Inc. Method for reducing, by a factor or 2-N, the minimum masking pitch of a photolithographic process
US5149592A (en) * 1990-05-09 1992-09-22 Avery Dennison Corporation Ultraviolet radiation curable clearcoat
JP2586692B2 (ja) 1990-05-24 1997-03-05 松下電器産業株式会社 パターン形成材料およびパターン形成方法
JP2524436B2 (ja) 1990-09-18 1996-08-14 インターナショナル・ビジネス・マシーンズ・コーポレイション 表面処理方法
DE4029912A1 (de) 1990-09-21 1992-03-26 Philips Patentverwaltung Verfahren zur bildung mindestens eines grabens in einer substratschicht
US5314772A (en) 1990-10-09 1994-05-24 Arizona Board Of Regents High resolution, multi-layer resist for microlithography and method therefor
US5126006A (en) 1990-10-30 1992-06-30 International Business Machines Corp. Plural level chip masking
US5072126A (en) 1990-10-31 1991-12-10 International Business Machines Corporation Promixity alignment using polarized illumination and double conjugate projection lens
US6174931B1 (en) 1991-02-28 2001-01-16 3M Innovative Properties Company Multi-stage irradiation process for production of acrylic based compositions and compositions made thereby
US5240878A (en) 1991-04-26 1993-08-31 International Business Machines Corporation Method for forming patterned films on a substrate
JPH04327939A (ja) * 1991-04-26 1992-11-17 Matsushita Electric Ind Co Ltd 樹脂製凹版およびその製造方法
US5212147A (en) 1991-05-15 1993-05-18 Hewlett-Packard Company Method of forming a patterned in-situ high Tc superconductive film
DE69217574T2 (de) 1991-05-17 1997-06-12 Asahi Glass Co Ltd Oberflächenbehandeltes Substrat
US5206983A (en) 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
US5421981A (en) 1991-06-26 1995-06-06 Ppg Industries, Inc. Electrochemical sensor storage device
EP0524759A1 (en) 1991-07-23 1993-01-27 AT&T Corp. Device fabrication process
US5242711A (en) 1991-08-16 1993-09-07 Rockwell International Corp. Nucleation control of diamond films by microlithographic patterning
JPH0553289A (ja) 1991-08-22 1993-03-05 Nec Corp 位相シフトレチクルの製造方法
JPH0555654A (ja) 1991-08-26 1993-03-05 Nec Corp 圧電素子変位拡大機構
US5317386A (en) 1991-09-06 1994-05-31 Eastman Kodak Company Optical monitor for measuring a gap between two rollers
DE4228853C2 (de) 1991-09-18 1993-10-21 Schott Glaswerke Optischer Wellenleiter mit einem planaren oder nur geringfügig gewölbten Substrat und Verfahren zu dessen Herstellung sowie Verwendung eines solchen
JPH0580530A (ja) 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
US5277749A (en) 1991-10-17 1994-01-11 International Business Machines Corporation Methods and apparatus for relieving stress and resisting stencil delamination when performing lift-off processes that utilize high stress metals and/or multiple evaporation steps
US5331020A (en) 1991-11-14 1994-07-19 Dow Corning Limited Organosilicon compounds and compositions containing them
US5263073A (en) 1991-12-20 1993-11-16 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College Scanning systems for high resolution E-beam and X-ray lithography
US5204467A (en) * 1991-12-20 1993-04-20 E. I. Du Pont De Nemours And Company Visible photosensitizers for photopolymerizable compositions
US5204739A (en) 1992-02-07 1993-04-20 Karl Suss America, Inc. Proximity mask alignment using a stored video image
US5244818A (en) 1992-04-08 1993-09-14 Georgia Tech Research Corporation Processes for lift-off of thin film materials and for the fabrication of three dimensional integrated circuits
US5545367A (en) 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
EP0568478A1 (en) 1992-04-29 1993-11-03 International Business Machines Corporation Darkfield alignment system using a confocal spatial filter
US5376810A (en) 1992-06-26 1994-12-27 California Institute Of Technology Growth of delta-doped layers on silicon CCD/S for enhanced ultraviolet response
JPH06180505A (ja) * 1992-07-02 1994-06-28 Hitachi Ltd 配線構造体及びその製造方法
US5298556A (en) 1992-07-21 1994-03-29 Tse Industries, Inc. Mold release composition and method coating a mold core
US5601641A (en) 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
US5431777A (en) 1992-09-17 1995-07-11 International Business Machines Corporation Methods and compositions for the selective etching of silicon
TW227628B (enExample) 1992-12-10 1994-08-01 Samsung Electronics Co Ltd
DE69405451T2 (de) 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche
US5348616A (en) 1993-05-03 1994-09-20 Motorola, Inc. Method for patterning a mold
US5482768A (en) 1993-05-14 1996-01-09 Asahi Glass Company Ltd. Surface-treated substrate and process for its production
US5861467A (en) 1993-05-18 1999-01-19 Dow Corning Corporation Radiation curable siloxane compositions containing vinyl ether functionality and methods for their preparation
US5594042A (en) 1993-05-18 1997-01-14 Dow Corning Corporation Radiation curable compositions containing vinyl ether functional polyorganosiloxanes
US5380474A (en) 1993-05-20 1995-01-10 Sandia Corporation Methods for patterned deposition on a substrate
US5324683A (en) 1993-06-02 1994-06-28 Motorola, Inc. Method of forming a semiconductor structure having an air region
JP2837063B2 (ja) 1993-06-04 1998-12-14 シャープ株式会社 レジストパターンの形成方法
US5414027A (en) * 1993-07-15 1995-05-09 Himont Incorporated High melt strength, propylene polymer, process for making it, and use thereof
US5389696A (en) 1993-09-17 1995-02-14 Miles Inc. Process for the production of molded products using internal mold release agents
US6180239B1 (en) 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US6776094B1 (en) 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5776748A (en) 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US5900160A (en) 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
US5512131A (en) 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
NL9401260A (nl) 1993-11-12 1995-06-01 Cornelis Johannes Maria Van Ri Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan.
KR970009858B1 (ko) 1994-01-12 1997-06-18 엘지반도체 주식회사 다층 레지스트 패턴 형성방법
US5534101A (en) 1994-03-02 1996-07-09 Telecommunication Research Laboratories Method and apparatus for making optical components by direct dispensing of curable liquid
US5417802A (en) 1994-03-18 1995-05-23 At&T Corp. Integrated circuit manufacturing
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US5453157A (en) 1994-05-16 1995-09-26 Texas Instruments Incorporated Low temperature anisotropic ashing of resist for semiconductor fabrication
US5670415A (en) 1994-05-24 1997-09-23 Depositech, Inc. Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
US5542978A (en) 1994-06-10 1996-08-06 Johnson & Johnson Vision Products, Inc. Apparatus for applying a surfactant to mold surfaces
US5837314A (en) 1994-06-10 1998-11-17 Johnson & Johnson Vision Products, Inc. Method and apparatus for applying a surfactant to mold surfaces
US5523878A (en) 1994-06-30 1996-06-04 Texas Instruments Incorporated Self-assembled monolayer coating for micro-mechanical devices
US5425964A (en) 1994-07-22 1995-06-20 Rockwell International Corporation Deposition of multiple layer thin films using a broadband spectral monitor
US5515167A (en) 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5458520A (en) 1994-12-13 1995-10-17 International Business Machines Corporation Method for producing planar field emission structure
US5868966A (en) 1995-03-30 1999-02-09 Drexel University Electroactive inorganic organic hybrid materials
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US5743998A (en) 1995-04-19 1998-04-28 Park Scientific Instruments Process for transferring microminiature patterns using spin-on glass resist media
US5820769A (en) 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
US5948570A (en) 1995-05-26 1999-09-07 Lucent Technologies Inc. Process for dry lithographic etching
JP3624476B2 (ja) 1995-07-17 2005-03-02 セイコーエプソン株式会社 半導体レーザ装置の製造方法
CN1191614A (zh) * 1995-07-19 1998-08-26 希巴特殊化学控股公司 多相光引发剂,可光聚合组合物及其应用
US5654238A (en) 1995-08-03 1997-08-05 International Business Machines Corporation Method for etching vertical contact holes without substrate damage caused by directional etching
WO1997007429A1 (en) 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US5566584A (en) 1995-08-31 1996-10-22 Beta Squared, Inc. Flexure support for a fixture positioning device
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US5545570A (en) 1995-09-29 1996-08-13 Taiwan Semiconductor Manufacturing Company Method of inspecting first layer overlay shift in global alignment process
US6468642B1 (en) 1995-10-03 2002-10-22 N.V. Bekaert S.A. Fluorine-doped diamond-like coatings
SE508373C2 (sv) 1995-10-30 1998-09-28 Obducat Ab Kruptosystem för optiskt lagringsmedia
US7758794B2 (en) 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US20030080471A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US5747102A (en) 1995-11-16 1998-05-05 Nordson Corporation Method and apparatus for dispensing small amounts of liquid material
US5684066A (en) 1995-12-04 1997-11-04 H.B. Fuller Licensing & Financing, Inc. Protective coatings having enhanced properties
JP2842362B2 (ja) 1996-02-29 1999-01-06 日本電気株式会社 重ね合わせ測定方法
US5725788A (en) 1996-03-04 1998-03-10 Motorola Apparatus and method for patterning a surface
US5669303A (en) 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
ES2201280T3 (es) * 1996-03-27 2004-03-16 Novartis Ag Procedimiento para la fabricacion de un polimero poroso a partir de una mezcla.
ES2212080T3 (es) * 1996-03-27 2004-07-16 Novartis Ag Polimero poroso con alto contenido de agua.
DE69729376T2 (de) * 1996-03-27 2005-06-02 Novartis Ag Verfahren zur herstellung von porösen polymeren unter anwendung eines porenbildendes agens
JP3832891B2 (ja) 1996-03-28 2006-10-11 日本トムソン株式会社 リニア電磁アクチュエータを用いたｘｙテーブル
US5942443A (en) 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
US5802914A (en) 1996-05-30 1998-09-08 Eastman Kodak Company Alignment mechanism using flexures
US5888650A (en) 1996-06-03 1999-03-30 Minnesota Mining And Manufacturing Company Temperature-responsive adhesive article
US5779799A (en) 1996-06-21 1998-07-14 Micron Technology, Inc. Substrate coating apparatus
JPH1039501A (ja) * 1996-07-19 1998-02-13 Sekisui Finechem Co Ltd 着色感光性樹脂組成物及びカラーフィルタ
US6074827A (en) 1996-07-30 2000-06-13 Aclara Biosciences, Inc. Microfluidic method for nucleic acid purification and processing
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
US6039897A (en) 1996-08-28 2000-03-21 University Of Washington Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
DE19648844C1 (de) 1996-11-26 1997-09-18 Jenoptik Jena Gmbh Einrichtung und Verfahren zur Abformung mikrosystemtechnischer Strukturen
US6204343B1 (en) 1996-12-11 2001-03-20 3M Innovative Properties Company Room temperature curable resin
US5895263A (en) 1996-12-19 1999-04-20 International Business Machines Corporation Process for manufacture of integrated circuit device
US5792821A (en) 1997-01-06 1998-08-11 American Dental Association Health Foundation Polymerizable cyclodextrin derivatives
US6495624B1 (en) 1997-02-03 2002-12-17 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US6156389A (en) 1997-02-03 2000-12-05 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US6143412A (en) 1997-02-10 2000-11-07 President And Fellows Of Harvard College Fabrication of carbon microstructures
DE19710420C2 (de) 1997-03-13 2001-07-12 Helmut Fischer Gmbh & Co Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz
US6335149B1 (en) 1997-04-08 2002-01-01 Corning Incorporated High performance acrylate materials for optical interconnects
US5948470A (en) 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US5948219A (en) 1997-05-07 1999-09-07 Advanced Micro Devices, Inc. Apparatus for selectively exposing a semiconductor topography to an electric field
US6174932B1 (en) * 1998-05-20 2001-01-16 Denovus Llc Curable sealant composition
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置
US5926690A (en) 1997-05-28 1999-07-20 Advanced Micro Devices, Inc. Run-to-run control process for controlling critical dimensions
JPH1143521A (ja) * 1997-05-30 1999-02-16 Matsushita Electric Ind Co Ltd モールド組成物、モールド部品およびモールド部品の製造方法
US6033977A (en) 1997-06-30 2000-03-07 Siemens Aktiengesellschaft Dual damascene structure
US5912049A (en) 1997-08-12 1999-06-15 Micron Technology, Inc. Process liquid dispense method and apparatus
US6132632A (en) 1997-09-11 2000-10-17 International Business Machines Corporation Method and apparatus for achieving etch rate uniformity in a reactive ion etcher
US6475704B1 (en) 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
JPH11133201A (ja) * 1997-10-29 1999-05-21 Menicon Co Ltd 光学材料
US5877861A (en) 1997-11-14 1999-03-02 International Business Machines Corporation Method for overlay control system
US5937758A (en) 1997-11-26 1999-08-17 Motorola, Inc. Micro-contact printing stamp
US5991022A (en) 1997-12-09 1999-11-23 N&K Technology, Inc. Reflectance spectrophotometric apparatus with toroidal mirrors
US6117708A (en) 1998-02-05 2000-09-12 Micron Technology, Inc. Use of residual organic compounds to facilitate gate break on a carrier substrate for a semiconductor device
US6150680A (en) 1998-03-05 2000-11-21 Welch Allyn, Inc. Field effect semiconductor device having dipole barrier
US6114404A (en) 1998-03-23 2000-09-05 Corning Incorporated Radiation curable ink compositions and flat panel color filters made using same
TW352421B (en) 1998-04-27 1999-02-11 United Microelectronics Corp Method and process of phase shifting mask
JP3780700B2 (ja) 1998-05-26 2006-05-31 セイコーエプソン株式会社 パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法
US6150231A (en) 1998-06-15 2000-11-21 Siemens Aktiengesellschaft Overlay measurement technique using moire patterns
DE19828969A1 (de) 1998-06-29 1999-12-30 Siemens Ag Verfahren zur Herstellung von Halbleiterbauelementen
KR100273172B1 (ko) 1998-08-01 2001-03-02 윤덕용 아크릴 측쇄에 디옥사스피로환기 유도체를 갖는 화합물을 이용한 포토레지스트
US5907782A (en) 1998-08-15 1999-05-25 Acer Semiconductor Manufacturing Inc. Method of forming a multiple fin-pillar capacitor for a high density dram cell
US6096655A (en) 1998-09-02 2000-08-01 International Business Machines, Corporation Method for forming vias and trenches in an insulation layer for a dual-damascene multilevel interconnection structure
TWI230712B (en) * 1998-09-15 2005-04-11 Novartis Ag Polymers
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6218316B1 (en) 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
US6204922B1 (en) 1998-12-11 2001-03-20 Filmetrics, Inc. Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample
US6168845B1 (en) 1999-01-19 2001-01-02 International Business Machines Corporation Patterned magnetic media and method of making the same using selective oxidation
US6274294B1 (en) 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
US6245421B1 (en) 1999-02-04 2001-06-12 Kodak Polychrome Graphics Llc Printable media for lithographic printing having a porous, hydrophilic layer and a method for the production thereof
US6565928B2 (en) 1999-03-08 2003-05-20 Tokyo Electron Limited Film forming method and film forming apparatus
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
JP4286374B2 (ja) 1999-03-30 2009-06-24 新日鐵化学株式会社 シリコーン樹脂及びこれを含有する感光性樹脂組成物
US6342097B1 (en) 1999-04-23 2002-01-29 Sdc Coatings, Inc. Composition for providing an abrasion resistant coating on a substrate with a matched refractive index and controlled tintability
US6387783B1 (en) 1999-04-26 2002-05-14 International Business Machines Corporation Methods of T-gate fabrication using a hybrid resist
JP3939048B2 (ja) 1999-05-17 2007-06-27 セイコーインスツル株式会社 圧電アクチュエータ
JP2003502169A (ja) 1999-06-11 2003-01-21 ボシュ・アンド・ロム・インコーポレイテッド コンタクトレンズおよび他の眼科製品を製造するための保護被覆を備えたレンズ鋳型
US6188150B1 (en) 1999-06-16 2001-02-13 Euv, Llc Light weight high-stiffness stage platen
US6255022B1 (en) 1999-06-17 2001-07-03 Taiwan Semiconductor Manufacturing Company Dry development process for a bi-layer resist system utilized to reduce microloading
US6467761B1 (en) 1999-06-21 2002-10-22 The United States Of America As Represented By The Secretary Of Commerce Positioning stage
JP2001143982A (ja) 1999-06-29 2001-05-25 Applied Materials Inc 半導体デバイス製造のための統合臨界寸法制御
US6344105B1 (en) 1999-06-30 2002-02-05 Lam Research Corporation Techniques for improving etch rate uniformity
ES2326465T3 (es) * 1999-07-19 2009-10-13 Tokuyama Corporation Composicion endurecible fotocromatica.
US6190929B1 (en) 1999-07-23 2001-02-20 Micron Technology, Inc. Methods of forming semiconductor devices and methods of forming field emission displays
US6383928B1 (en) 1999-09-02 2002-05-07 Texas Instruments Incorporated Post copper CMP clean
AU7361200A (en) 1999-09-10 2001-04-10 Nano-Tex, Llc Water-repellent and soil-resistant finish for textiles
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6329256B1 (en) 1999-09-24 2001-12-11 Advanced Micro Devices, Inc. Self-aligned damascene gate formation with low gate resistance
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
DE19958966A1 (de) 1999-12-07 2001-06-13 Infineon Technologies Ag Erzeugung von Resiststrukturen
US6091485A (en) 1999-12-15 2000-07-18 N & K Technology, Inc. Method and apparatus for optically determining physical parameters of underlayers
ATE294648T1 (de) 1999-12-23 2005-05-15 Univ Massachusetts Verfahren zur herstellung von submikron mustern auf filmen
US6696157B1 (en) 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
US6245581B1 (en) 2000-04-19 2001-06-12 Advanced Micro Devices, Inc. Method and apparatus for control of critical dimension using feedback etch control
US6756165B2 (en) 2000-04-25 2004-06-29 Jsr Corporation Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element
US6774183B1 (en) 2000-04-27 2004-08-10 Bostik, Inc. Copolyesters having improved retained adhesion
JP2002023349A (ja) * 2000-07-11 2002-01-23 Toray Ind Inc 感光性樹脂凸版材
WO2002008835A2 (en) 2000-07-16 2002-01-31 Board Of Regents, The University Of Texas System High-resolution overlay alignment methods and systems for imprint lithography
EP2270592B1 (en) 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US20050037143A1 (en) 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
JP2004505273A (ja) 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
US6326627B1 (en) 2000-08-02 2001-12-04 Archimedes Technology Group, Inc. Mass filtering sputtered ion source
US6777170B1 (en) 2000-08-04 2004-08-17 Massachusetts Institute Of Technology Stereolithographic patterning by variable dose light delivery
US6730256B1 (en) 2000-08-04 2004-05-04 Massachusetts Institute Of Technology Stereolithographic patterning with interlayer surface modifications
DE60035130T2 (de) * 2000-08-11 2008-02-07 Tokuyama Corp., Shunan Verfahren zur Herstellung eines photochromen, gehärteten Produkts
US8016277B2 (en) 2000-08-21 2011-09-13 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
US6531407B1 (en) 2000-08-31 2003-03-11 Micron Technology, Inc. Method, structure and process flow to reduce line-line capacitance with low-K material
US6448301B1 (en) 2000-09-08 2002-09-10 3M Innovative Properties Company Crosslinkable polymeric compositions and use thereof
US6455411B1 (en) 2000-09-11 2002-09-24 Texas Instruments Incorporated Defect and etch rate control in trench etch for dual damascene patterning of low-k dielectrics
JP2002097233A (ja) * 2000-09-21 2002-04-02 Nippon Shokubai Co Ltd ラジカル重合性樹脂乾燥性付与剤、ラジカル重合性樹脂組成物及びラジカル重合性樹脂組成物硬化物
EP2306242A3 (en) 2000-10-12 2011-11-02 Board of Regents, The University of Texas System Method of forming a pattern on a substrate
US6503914B1 (en) 2000-10-23 2003-01-07 Board Of Regents, The University Of Texas System Thienopyrimidine-based inhibitors of the Src family
AU2002223792A1 (en) * 2000-11-10 2002-05-21 Durand Technology Limited Optical recording materials
KR20020047490A (ko) 2000-12-13 2002-06-22 윤종용 실리콘을 함유하는 감광성 폴리머 및 이를 포함하는레지스트 조성물
US6632742B2 (en) 2001-04-18 2003-10-14 Promos Technologies Inc. Method for avoiding defects produced in the CMP process
US6783719B2 (en) 2001-01-19 2004-08-31 Korry Electronics, Co. Mold with metal oxide surface compatible with ionic release agents
US6489068B1 (en) 2001-02-21 2002-12-03 Advanced Micro Devices, Inc. Process for observing overlay errors on lithographic masks
KR100970661B1 (ko) * 2001-02-27 2010-07-15 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 신규 폴리머, 폴리머 합성 방법 및 포토레지스트 조성물
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
KR100442859B1 (ko) 2001-04-04 2004-08-02 삼성전자주식회사 실리콘을 함유하는 알킬 비닐 에테르의 중합체로이루어지는 감광성 폴리머 및 이를 포함하는 레지스트조성물
US6534418B1 (en) 2001-04-30 2003-03-18 Advanced Micro Devices, Inc. Use of silicon containing imaging layer to define sub-resolution gate structures
US6541360B1 (en) 2001-04-30 2003-04-01 Advanced Micro Devices, Inc. Bi-layer trim etch process to form integrated circuit gate structures
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6541356B2 (en) 2001-05-21 2003-04-01 International Business Machines Corporation Ultimate SIMOX
US6737489B2 (en) 2001-05-21 2004-05-18 3M Innovative Properties Company Polymers containing perfluorovinyl ethers and applications for such polymers
US6736857B2 (en) 2001-05-25 2004-05-18 3M Innovative Properties Company Method for imparting soil and stain resistance to carpet
US6847433B2 (en) 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
TW488080B (en) 2001-06-08 2002-05-21 Au Optronics Corp Method for producing thin film transistor
US6561706B2 (en) 2001-06-28 2003-05-13 Advanced Micro Devices, Inc. Critical dimension monitoring from latent image
CA2454570C (en) 2001-07-25 2016-12-20 The Trustees Of Princeton University Nanochannel arrays and their preparation and use for high throughput macromolecular analysis
JP2003057818A (ja) * 2001-08-20 2003-02-28 Asahi Kasei Corp 厚膜導体回路用液状感光性樹脂組成物
US6721529B2 (en) 2001-09-21 2004-04-13 Nexpress Solutions Llc Release agent donor member having fluorocarbon thermoplastic random copolymer overcoat
WO2003035932A1 (en) 2001-09-25 2003-05-01 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate by using capillary force
US6790905B2 (en) 2001-10-09 2004-09-14 E. I. Du Pont De Nemours And Company Highly repellent carpet protectants
JP2003118008A (ja) * 2001-10-17 2003-04-23 Mitsui Chemicals Inc 樹脂成型体の製造方法
US6716767B2 (en) 2001-10-31 2004-04-06 Brewer Science, Inc. Contact planarization materials that generate no volatile byproducts or residue during curing
AU2002365226A1 (en) 2001-11-07 2003-09-02 Dow Global Technologies Inc. Planarized microelectronic substrates
US6649272B2 (en) 2001-11-08 2003-11-18 3M Innovative Properties Company Coating composition comprising fluorochemical polyether silane polycondensate and use thereof
US6890688B2 (en) 2001-12-18 2005-05-10 Freescale Semiconductor, Inc. Lithographic template and method of formation and use
JP4038688B2 (ja) 2002-02-19 2008-01-30 日産化学工業株式会社 反射防止膜形成組成物
US6737202B2 (en) 2002-02-22 2004-05-18 Motorola, Inc. Method of fabricating a tiered structure using a multi-layered resist stack and use
US7455955B2 (en) 2002-02-27 2008-11-25 Brewer Science Inc. Planarization method for multi-layer lithography processing
JP2004002702A (ja) * 2002-02-28 2004-01-08 Merck Patent Gmbh プレポリマー材料、ポリマー材料、インプリンティングプロセスおよびその使用
EP1342736B1 (en) 2002-02-28 2013-05-08 Merck Patent GmbH Prepolymer material, polymer material, imprinting process and their Use
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6743713B2 (en) 2002-05-15 2004-06-01 Institute Of Microelectronics Method of forming dual damascene pattern using dual bottom anti-reflective coatings (BARC)
US6849558B2 (en) 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
US20030235787A1 (en) 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
WO2004009505A1 (en) 2002-07-23 2004-01-29 Shell Internationale Research Maatschappij B.V. Hydrophobic surface treatment composition and method of making and using same
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US7365103B2 (en) 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20040112862A1 (en) 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
KR101158297B1 (ko) * 2002-12-26 2012-06-26 닛산 가가쿠 고교 가부시키 가이샤 알칼리 용해형 리소그라피용 갭 필링재 형성조성물
US6770852B1 (en) 2003-02-27 2004-08-03 Lam Research Corporation Critical dimension variation compensation across a wafer by means of local wafer temperature control
US20040168613A1 (en) 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US6830819B2 (en) 2003-03-18 2004-12-14 Xerox Corporation Fluorosilicone release agent for fluoroelastomer fuser members
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
WO2004086471A1 (en) 2003-03-27 2004-10-07 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
US20040202865A1 (en) 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
TWI228638B (en) 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
JP2005014348A (ja) 2003-06-25 2005-01-20 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
US20050084804A1 (en) 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7122482B2 (en) 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography

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US20050187339A1 (en) 2005-08-25
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US8076386B2 (en) 2011-12-13
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