JP5166509B2 - 蒸着装置 - Google Patents
蒸着装置 Download PDFInfo
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- JP5166509B2 JP5166509B2 JP2010294471A JP2010294471A JP5166509B2 JP 5166509 B2 JP5166509 B2 JP 5166509B2 JP 2010294471 A JP2010294471 A JP 2010294471A JP 2010294471 A JP2010294471 A JP 2010294471A JP 5166509 B2 JP5166509 B2 JP 5166509B2
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- collar
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- deposition apparatus
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- vapor
- Prior art date
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- 238000007740 vapor deposition Methods 0.000 title claims description 35
- 238000009834 vaporization Methods 0.000 claims description 27
- 230000008016 vaporization Effects 0.000 claims description 27
- 239000007788 liquid Substances 0.000 claims description 22
- 230000008021 deposition Effects 0.000 claims description 13
- 238000000034 method Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 6
- 239000006200 vaporizer Substances 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000006199 nebulizer Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000000889 atomisation Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002663 nebulization Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/06—Preventing bumping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/06—Flash distillation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/16—Evaporating by spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
- B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
- B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S165/00—Heat exchange
- Y10S165/911—Vaporization
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Nozzles (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Description
前記カラー50は、円筒形、四角形、長方形、三角形、多角形を有しうる。前記カラー50は、前記蒸気流出口40と同一形状であり得るが、他の形状でもあり得る。前記カラー50は、一般的に円筒形になりうる。
15 気化チャンバ、
20 液体流入口、
25 噴霧器、
30 ヒーター、
35 表面、
40 蒸気流出口、
45 蒸気ノズル、
50 カラー、
60 基板、
62 液体薄膜、
A1〜A4 断面積。
Claims (23)
- 液体流入口と蒸気流出口とを有する気化チャンバと、
前記蒸気流出口に備えられた蒸気ノズルと、
前記気化チャンバと前記蒸気ノズルとの間に位置し、前記蒸気ノズルの吐出口を通じたコンダクタンスが変化しないようにしつつ、前記気化チャンバ内の圧力を増大させるカラーと、を含む蒸着装置。 - 前記カラーは、前記蒸気ノズルの断面積より小さな断面積を有することを特徴とする請求項1に記載の蒸着装置。
- 前記カラーは、前記蒸気流出口に挿入可能な第1部分を含むことを特徴とする請求項1または請求項2に記載の蒸着装置。
- 前記カラーは、環状リングを含むことを特徴とする請求項3に記載の蒸着装置。
- 前記第1部分は、外側に延びた部分をさらに含むことを特徴とする請求項3に記載の蒸着装置。
- 前記第1部分は、環状フランジを備えた環状リングを含むことを特徴とする請求項5に記載の蒸着装置。
- 前記外側に延びた部分は、少なくとも1つのタブを含むことを特徴とする請求項5に記載の蒸着装置。
- 前記第1部分は、前記蒸気ノズルの断面積より小さな断面積を有することを特徴とする請求項3〜7のいずれか1項に記載の蒸着装置。
- 前記カラーは、前記蒸気流出口に挿入される第1部分を含む第1カラーと、前記第1部分に挿入される第2カラーと、を含み、前記第2カラーは前記蒸気ノズルの断面積より小さな断面積を有することを特徴とする請求項1に記載の蒸着装置。
- 前記カラーは、前記蒸気流出口に挿入される第1部分、及び前記第1部分に連結された第2部分を含み、前記第2部分は、前記蒸気ノズルの断面積より小さな断面積を有することを特徴とする請求項1に記載の蒸着装置。
- 前記第1部分は、フランジを有し、前記第2部分は、前記フランジに連結されたことを特徴とする請求項10に記載の蒸着装置。
- 前記フランジは、前記カラーから外側に延びたことを特徴とする請求項11に記載の蒸着装置。
- 前記フランジは、前記カラーから内側に延びたことを特徴とする請求項11に記載の蒸着装置。
- 前記フランジは、前記カラーから内側及び外側に延びたことを特徴とする請求項11に記載の蒸着装置。
- 前記第2部分は、前記第1部分に着脱可能に連結されたことを特徴とする請求項10〜14のいずれか1項に記載の蒸着装置。
- 前記第2部分は、前記第1部分に永久的に連結されたことを特徴とする請求項10〜14のいずれか1項に記載の蒸着装置。
- 前記第1部分は、環状リングを含むことを特徴とする請求項10に記載の蒸着装置。
- 前記第1部分は、環状フランジを備えた環状リングを含むことを特徴とする請求項10に記載の蒸着装置。
- 前記第2部分は、第2環状フランジを含み、前記第2環状フランジは、前記環状フランジに連結され、前記第2環状フランジは、前記蒸気ノズルの断面積より小さな断面積を有することを特徴とする請求項18に記載の蒸着装置。
- 前記第1部分は、外側に延びた部分をさらに含むことを特徴とする請求項10に記載の蒸着装置。
- 前記外側に延びた部分は少なくとも1つのタブを含むことを特徴とする請求項20に記載の蒸着装置。
- 前記カラーは、着脱可能であることを特徴とする請求項1〜21のいずれか1項に記載の蒸着装置。
- 液体流入口と蒸気流出口とを有し、前記蒸気流出口の断面積より大きな断面積を有する気化チャンバと、
前記蒸気流出口に備えられ、前記蒸気流出口の断面積より小さな断面積を有する蒸気ノズルと、
前記気化チャンバと前記蒸気ノズルとの間に位置し、前記蒸気ノズルの断面積より小さな断面積を有する着脱可能なカラーと、を含む蒸着装置。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/650,586 | 2009-12-31 | ||
US12/650,586 US8590338B2 (en) | 2009-12-31 | 2009-12-31 | Evaporator with internal restriction |
KR10-2010-0123484 | 2010-12-06 | ||
KR1020100123484A KR101243923B1 (ko) | 2009-12-31 | 2010-12-06 | 증착 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011137232A JP2011137232A (ja) | 2011-07-14 |
JP5166509B2 true JP5166509B2 (ja) | 2013-03-21 |
Family
ID=44185819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010294471A Active JP5166509B2 (ja) | 2009-12-31 | 2010-12-29 | 蒸着装置 |
Country Status (5)
Country | Link |
---|---|
US (3) | US8590338B2 (ja) |
JP (1) | JP5166509B2 (ja) |
KR (1) | KR101243923B1 (ja) |
CN (2) | CN105920864A (ja) |
TW (1) | TWI456081B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130089039A (ko) | 2012-02-01 | 2013-08-09 | 삼성디스플레이 주식회사 | 증착 소스, 증착 장치 및 유기 발광 표시 장치 제조 방법 |
WO2014141330A1 (ja) | 2013-03-13 | 2014-09-18 | パナソニック株式会社 | 電子デバイス |
CN104561905B (zh) * | 2014-12-29 | 2017-07-14 | 昆山国显光电有限公司 | 一种线性蒸发源 |
RU190474U1 (ru) * | 2018-12-24 | 2019-07-02 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") | Электродуговой испаритель |
WO2023013952A1 (ko) * | 2021-08-03 | 2023-02-09 | 주성엔지니어링(주) | 버퍼탱크 및 버퍼탱크를 포함하는 공급블록과, 가스 공급 장치 |
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-
2009
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2010
- 2010-12-06 KR KR1020100123484A patent/KR101243923B1/ko active IP Right Grant
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- 2010-12-29 TW TW099146499A patent/TWI456081B/zh active
- 2010-12-31 CN CN201610352091.4A patent/CN105920864A/zh active Pending
- 2010-12-31 CN CN2010106230329A patent/CN102114358A/zh active Pending
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CN102114358A (zh) | 2011-07-06 |
TW201134963A (en) | 2011-10-16 |
US20140050863A1 (en) | 2014-02-20 |
KR20110079502A (ko) | 2011-07-07 |
CN105920864A (zh) | 2016-09-07 |
TWI456081B (zh) | 2014-10-11 |
US8590338B2 (en) | 2013-11-26 |
US8904819B2 (en) | 2014-12-09 |
JP2011137232A (ja) | 2011-07-14 |
US20110154854A1 (en) | 2011-06-30 |
US20140054325A1 (en) | 2014-02-27 |
KR101243923B1 (ko) | 2013-03-14 |
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