JP4748842B2 - 電子装置 - Google Patents
電子装置 Download PDFInfo
- Publication number
- JP4748842B2 JP4748842B2 JP2000328046A JP2000328046A JP4748842B2 JP 4748842 B2 JP4748842 B2 JP 4748842B2 JP 2000328046 A JP2000328046 A JP 2000328046A JP 2000328046 A JP2000328046 A JP 2000328046A JP 4748842 B2 JP4748842 B2 JP 4748842B2
- Authority
- JP
- Japan
- Prior art keywords
- tft
- film
- region
- gate
- channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
- H10D30/6715—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
- H10D30/6715—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions
- H10D30/6719—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions having significant overlap between the lightly-doped drains and the gate electrodes, e.g. gate-overlapped LDD [GOLDD] TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0221—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8723—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/874—Passivation; Containers; Encapsulations including getter material or desiccant
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30786699 | 1999-10-29 | ||
| JP11-307866 | 1999-10-29 | ||
| JP1999307866 | 1999-10-29 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011021551A Division JP5138054B2 (ja) | 1999-10-29 | 2011-02-03 | 電子装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001195015A JP2001195015A (ja) | 2001-07-19 |
| JP2001195015A5 JP2001195015A5 (enExample) | 2007-12-13 |
| JP4748842B2 true JP4748842B2 (ja) | 2011-08-17 |
Family
ID=17974117
Family Applications (11)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000328046A Expired - Fee Related JP4748842B2 (ja) | 1999-10-29 | 2000-10-27 | 電子装置 |
| JP2011021551A Expired - Lifetime JP5138054B2 (ja) | 1999-10-29 | 2011-02-03 | 電子装置の作製方法 |
| JP2011246267A Withdrawn JP2012054248A (ja) | 1999-10-29 | 2011-11-10 | 電子装置及び電子装置の作製方法 |
| JP2011246262A Expired - Lifetime JP5364774B2 (ja) | 1999-10-29 | 2011-11-10 | 表示装置、表示モジュール及び電子機器 |
| JP2013018332A Active JP5723899B2 (ja) | 1999-10-29 | 2013-02-01 | 電子装置 |
| JP2013258006A Expired - Lifetime JP5688447B2 (ja) | 1999-10-29 | 2013-12-13 | 電子装置 |
| JP2014227940A Expired - Lifetime JP5952375B2 (ja) | 1999-10-29 | 2014-11-10 | 表示装置 |
| JP2016090255A Expired - Lifetime JP6259488B2 (ja) | 1999-10-29 | 2016-04-28 | 表示装置 |
| JP2016090253A Expired - Lifetime JP6154934B2 (ja) | 1999-10-29 | 2016-04-28 | 表示装置 |
| JP2017127374A Withdrawn JP2017207763A (ja) | 1999-10-29 | 2017-06-29 | 電子装置 |
| JP2019082962A Withdrawn JP2019164358A (ja) | 1999-10-29 | 2019-04-24 | 電子装置 |
Family Applications After (10)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011021551A Expired - Lifetime JP5138054B2 (ja) | 1999-10-29 | 2011-02-03 | 電子装置の作製方法 |
| JP2011246267A Withdrawn JP2012054248A (ja) | 1999-10-29 | 2011-11-10 | 電子装置及び電子装置の作製方法 |
| JP2011246262A Expired - Lifetime JP5364774B2 (ja) | 1999-10-29 | 2011-11-10 | 表示装置、表示モジュール及び電子機器 |
| JP2013018332A Active JP5723899B2 (ja) | 1999-10-29 | 2013-02-01 | 電子装置 |
| JP2013258006A Expired - Lifetime JP5688447B2 (ja) | 1999-10-29 | 2013-12-13 | 電子装置 |
| JP2014227940A Expired - Lifetime JP5952375B2 (ja) | 1999-10-29 | 2014-11-10 | 表示装置 |
| JP2016090255A Expired - Lifetime JP6259488B2 (ja) | 1999-10-29 | 2016-04-28 | 表示装置 |
| JP2016090253A Expired - Lifetime JP6154934B2 (ja) | 1999-10-29 | 2016-04-28 | 表示装置 |
| JP2017127374A Withdrawn JP2017207763A (ja) | 1999-10-29 | 2017-06-29 | 電子装置 |
| JP2019082962A Withdrawn JP2019164358A (ja) | 1999-10-29 | 2019-04-24 | 電子装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US6384427B1 (enExample) |
| EP (1) | EP1096303B1 (enExample) |
| JP (11) | JP4748842B2 (enExample) |
| KR (1) | KR100682803B1 (enExample) |
| DE (1) | DE60044417D1 (enExample) |
Families Citing this family (153)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6859548B2 (en) | 1996-09-25 | 2005-02-22 | Kabushiki Kaisha Toshiba | Ultrasonic picture processing method and ultrasonic picture processing apparatus |
| JP3641342B2 (ja) * | 1997-03-07 | 2005-04-20 | Tdk株式会社 | 半導体装置及び有機elディスプレイ装置 |
| US6384427B1 (en) * | 1999-10-29 | 2002-05-07 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device |
| JP4727029B2 (ja) * | 1999-11-29 | 2011-07-20 | 株式会社半導体エネルギー研究所 | El表示装置、電気器具及びel表示装置用の半導体素子基板 |
| TW465122B (en) | 1999-12-15 | 2001-11-21 | Semiconductor Energy Lab | Light-emitting device |
| US6611108B2 (en) * | 2000-04-26 | 2003-08-26 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device and driving method thereof |
| TW577813B (en) | 2000-07-10 | 2004-03-01 | Semiconductor Energy Lab | Film forming apparatus and method of manufacturing light emitting device |
| US7019457B2 (en) * | 2000-08-03 | 2006-03-28 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device having both electrodes formed on the insulating layer |
| US6906458B2 (en) * | 2000-08-11 | 2005-06-14 | Seiko Epson Corporation | Method for manufacturing organic EL device, organic EL device and electronic apparatus |
| US7430025B2 (en) | 2000-08-23 | 2008-09-30 | Semiconductor Energy Laboratory Co., Ltd. | Portable electronic device |
| US7009203B2 (en) * | 2000-12-14 | 2006-03-07 | Samsung Soi Co., Ltd. | Organic EL device and method for manufacturing the same |
| KR100365519B1 (ko) * | 2000-12-14 | 2002-12-18 | 삼성에스디아이 주식회사 | 유기 전계발광 디바이스 및 이의 제조 방법 |
| KR100554763B1 (ko) * | 2001-01-29 | 2006-02-22 | 세이코 엡슨 가부시키가이샤 | 반도체 장치, 회로 기판, 전기 광학 장치 및 전자기기 |
| JP4693253B2 (ja) * | 2001-01-30 | 2011-06-01 | 株式会社半導体エネルギー研究所 | 発光装置、電子機器 |
| JP4037117B2 (ja) * | 2001-02-06 | 2008-01-23 | 株式会社日立製作所 | 表示装置 |
| US7569849B2 (en) | 2001-02-16 | 2009-08-04 | Ignis Innovation Inc. | Pixel driver circuit and pixel circuit having the pixel driver circuit |
| JP4443063B2 (ja) * | 2001-02-28 | 2010-03-31 | 株式会社日立製作所 | 電界効果トランジスタ及びそれを使用した画像表示装置 |
| US6844608B2 (en) | 2001-05-07 | 2005-01-18 | Advanced Micro Devices, Inc. | Reversible field-programmable electric interconnects |
| KR100895901B1 (ko) * | 2001-05-07 | 2009-05-04 | 어드밴스드 마이크로 디바이시즈, 인코포레이티드 | 메모리 효과를 갖는 스위치 요소 |
| US6627944B2 (en) | 2001-05-07 | 2003-09-30 | Advanced Micro Devices, Inc. | Floating gate memory device using composite molecular material |
| US6781868B2 (en) * | 2001-05-07 | 2004-08-24 | Advanced Micro Devices, Inc. | Molecular memory device |
| JP4886160B2 (ja) * | 2001-05-07 | 2012-02-29 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | セルフアセンブリによるポリマーフィルムを用いた記憶装置およびその製造方法 |
| US6873540B2 (en) * | 2001-05-07 | 2005-03-29 | Advanced Micro Devices, Inc. | Molecular memory cell |
| WO2003005774A1 (en) * | 2001-05-24 | 2003-01-16 | Orion Electric Co., Ltd. | Container for encapsulating oled and manufacturing method thereof |
| KR100437765B1 (ko) * | 2001-06-15 | 2004-06-26 | 엘지전자 주식회사 | 고온용 기판을 이용한 박막트랜지스터 제조방법과 이를 이용한 표시장치의 제조방법 |
| JP2004533022A (ja) * | 2001-06-22 | 2004-10-28 | インターナショナル・ビジネス・マシーンズ・コーポレーション | パッシブ駆動マトリクス・ディスプレイ |
| US6858481B2 (en) | 2001-08-13 | 2005-02-22 | Advanced Micro Devices, Inc. | Memory device with active and passive layers |
| JP2005500682A (ja) | 2001-08-13 | 2005-01-06 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | メモリセル |
| US6838720B2 (en) * | 2001-08-13 | 2005-01-04 | Advanced Micro Devices, Inc. | Memory device with active passive layers |
| US6806526B2 (en) | 2001-08-13 | 2004-10-19 | Advanced Micro Devices, Inc. | Memory device |
| US6768157B2 (en) | 2001-08-13 | 2004-07-27 | Advanced Micro Devices, Inc. | Memory device |
| JP4865165B2 (ja) | 2001-08-29 | 2012-02-01 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US6590157B2 (en) * | 2001-09-21 | 2003-07-08 | Eastman Kodak Company | Sealing structure for highly moisture-sensitive electronic device element and method for fabrication |
| US7488986B2 (en) * | 2001-10-26 | 2009-02-10 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| US6956240B2 (en) * | 2001-10-30 | 2005-10-18 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
| KR100763171B1 (ko) * | 2001-11-07 | 2007-10-08 | 엘지.필립스 엘시디 주식회사 | 액티브 매트릭스 유기전계발광소자 및 그 제조방법 |
| US7042024B2 (en) * | 2001-11-09 | 2006-05-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting apparatus and method for manufacturing the same |
| JP4149168B2 (ja) | 2001-11-09 | 2008-09-10 | 株式会社半導体エネルギー研究所 | 発光装置 |
| CN101009322B (zh) * | 2001-11-09 | 2012-06-27 | 株式会社半导体能源研究所 | 发光器件 |
| US8153184B2 (en) | 2001-11-26 | 2012-04-10 | Samsung Mobile Display Co., Ltd. | Organic EL display device and method of manufacturing the same |
| KR100656490B1 (ko) * | 2001-11-26 | 2006-12-12 | 삼성에스디아이 주식회사 | 풀칼라 유기전계 발광표시소자 및 그의 제조방법 |
| CN1245703C (zh) * | 2001-12-11 | 2006-03-15 | 精工爱普生株式会社 | 显示装置及其电子机器 |
| US6815903B2 (en) * | 2001-12-11 | 2004-11-09 | Seiko Epson Corporation | Display device and electronic apparatus |
| CN1432984A (zh) | 2002-01-18 | 2003-07-30 | 株式会社半导体能源研究所 | 发光器件 |
| JP3706107B2 (ja) * | 2002-01-18 | 2005-10-12 | 株式会社半導体エネルギー研究所 | 発光装置及び電子機器 |
| JP4490403B2 (ja) * | 2002-01-18 | 2010-06-23 | 株式会社半導体エネルギー研究所 | 発光装置 |
| JP3939666B2 (ja) * | 2002-01-18 | 2007-07-04 | 株式会社半導体エネルギー研究所 | 発光装置及び電子機器 |
| SG126714A1 (en) * | 2002-01-24 | 2006-11-29 | Semiconductor Energy Lab | Light emitting device and method of manufacturing the same |
| KR100433407B1 (ko) * | 2002-02-06 | 2004-05-31 | 삼성광주전자 주식회사 | 업라이트형 진공청소기 |
| TWI285515B (en) | 2002-02-22 | 2007-08-11 | Semiconductor Energy Lab | Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus |
| US7579771B2 (en) | 2002-04-23 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
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| JP3874899B2 (ja) * | 1997-07-24 | 2007-01-31 | 株式会社半導体エネルギー研究所 | 液晶パネルの作製方法 |
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| JPH1165471A (ja) * | 1997-08-20 | 1999-03-05 | Semiconductor Energy Lab Co Ltd | 電気光学装置 |
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| US6274887B1 (en) | 1998-11-02 | 2001-08-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method therefor |
| US6617644B1 (en) * | 1998-11-09 | 2003-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of manufacturing the same |
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2000
- 2000-10-26 US US09/697,685 patent/US6384427B1/en not_active Expired - Lifetime
- 2000-10-27 DE DE60044417T patent/DE60044417D1/de not_active Expired - Lifetime
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- 2000-10-27 JP JP2000328046A patent/JP4748842B2/ja not_active Expired - Fee Related
- 2000-10-30 KR KR1020000063943A patent/KR100682803B1/ko not_active Expired - Lifetime
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2002
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- 2003-12-23 US US10/745,007 patent/US7208765B2/en not_active Expired - Fee Related
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- 2011-02-03 JP JP2011021551A patent/JP5138054B2/ja not_active Expired - Lifetime
- 2011-11-10 JP JP2011246267A patent/JP2012054248A/ja not_active Withdrawn
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- 2013-12-13 JP JP2013258006A patent/JP5688447B2/ja not_active Expired - Lifetime
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2015064592A (ja) | 2015-04-09 |
| EP1096303B1 (en) | 2010-05-19 |
| JP2016167086A (ja) | 2016-09-15 |
| JP2017207763A (ja) | 2017-11-24 |
| JP5138054B2 (ja) | 2013-02-06 |
| DE60044417D1 (de) | 2010-07-01 |
| JP2013137552A (ja) | 2013-07-11 |
| JP2014063194A (ja) | 2014-04-10 |
| JP2019164358A (ja) | 2019-09-26 |
| JP5723899B2 (ja) | 2015-05-27 |
| US6384427B1 (en) | 2002-05-07 |
| US7208765B2 (en) | 2007-04-24 |
| JP2001195015A (ja) | 2001-07-19 |
| JP2016184167A (ja) | 2016-10-20 |
| JP5364774B2 (ja) | 2013-12-11 |
| JP5688447B2 (ja) | 2015-03-25 |
| JP2012083763A (ja) | 2012-04-26 |
| JP6259488B2 (ja) | 2018-01-10 |
| US20040135146A1 (en) | 2004-07-15 |
| KR100682803B1 (ko) | 2007-02-15 |
| US6670637B2 (en) | 2003-12-30 |
| EP1096303A2 (en) | 2001-05-02 |
| JP5952375B2 (ja) | 2016-07-13 |
| JP6154934B2 (ja) | 2017-06-28 |
| EP1096303A3 (en) | 2006-05-17 |
| US20020134979A1 (en) | 2002-09-26 |
| KR20010070174A (ko) | 2001-07-25 |
| JP2012054248A (ja) | 2012-03-15 |
| JP2011097104A (ja) | 2011-05-12 |
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