JP2010147281A5 - 半導体装置 - Google Patents

半導体装置 Download PDF

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Publication number
JP2010147281A5
JP2010147281A5 JP2008323581A JP2008323581A JP2010147281A5 JP 2010147281 A5 JP2010147281 A5 JP 2010147281A5 JP 2008323581 A JP2008323581 A JP 2008323581A JP 2008323581 A JP2008323581 A JP 2008323581A JP 2010147281 A5 JP2010147281 A5 JP 2010147281A5
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electrode
semiconductor substrate
main surface
pad
elements
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JP5308145B2 (ja
JP2010147281A (ja
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Priority to JP2008323581A priority Critical patent/JP5308145B2/ja
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Priority to US12/640,766 priority patent/US8106518B2/en
Publication of JP2010147281A publication Critical patent/JP2010147281A/ja
Priority to US13/340,165 priority patent/US8816506B2/en
Publication of JP2010147281A5 publication Critical patent/JP2010147281A5/ja
Publication of JP5308145B2 publication Critical patent/JP5308145B2/ja
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Priority to US14/464,026 priority patent/US9076700B2/en
Priority to US14/716,791 priority patent/US9318418B2/en
Priority to US15/061,444 priority patent/US9691739B2/en
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Claims (2)

  1. さ方向に沿って互いに反対側に位置する第1主面と第2主面とを有する半導体基板と、
    記半導体基板の第1主面に形成された複数の素子と、
    記半導体基板の第1主面において前記複数の素子を覆うようにして形成された層間絶縁膜と、
    記複数の素子と電気的に接続するようにして、前記層間絶縁膜の表面に形成されたパッドと、
    記パッドに電気的に接続するようにして形成されたバンプ形状の第1電極と、
    記第1電極と電気的に接続するようにして、前記半導体基板の第2主面に形成された第2電極とを有し、
    前記第1電極は、前記パッドを貫通し、前記半導体基板側に向かって突出するような突出部を有し、
    前記第2電極は、前記半導体基板の第2主面側から第1主面側に向かって、前記第1電極の突出部に達し、かつ、前記パッドには達しないような第2電極用孔部の内側を覆うようにして形成されていることで、前記第1電極と電気的に接続されていることを特徴とする半導体装置。
  2. 請求項1記載の半導体装置において、
    前記第1電極の突出部は、前記半導体基板内に達する深さまで突出していることを特徴とする半導体装置。
JP2008323581A 2008-12-19 2008-12-19 半導体装置 Active JP5308145B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2008323581A JP5308145B2 (ja) 2008-12-19 2008-12-19 半導体装置
US12/640,766 US8106518B2 (en) 2008-12-19 2009-12-17 Semiconductor device and method of manufacturing the same
US13/340,165 US8816506B2 (en) 2008-12-19 2011-12-29 Semiconductor device and method of manufacturing the same
US14/464,026 US9076700B2 (en) 2008-12-19 2014-08-20 Semiconductor device and method of manufacturing same
US14/716,791 US9318418B2 (en) 2008-12-19 2015-05-19 Semiconductor device and method of manufacturing same
US15/061,444 US9691739B2 (en) 2008-12-19 2016-03-04 Semiconductor device and method of manufacturing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008323581A JP5308145B2 (ja) 2008-12-19 2008-12-19 半導体装置

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JP2010147281A JP2010147281A (ja) 2010-07-01
JP2010147281A5 true JP2010147281A5 (ja) 2012-02-02
JP5308145B2 JP5308145B2 (ja) 2013-10-09

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