JP2007016214A - 樹脂組成物およびそれを用いた表示装置 - Google Patents
樹脂組成物およびそれを用いた表示装置 Download PDFInfo
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- JP2007016214A JP2007016214A JP2006151113A JP2006151113A JP2007016214A JP 2007016214 A JP2007016214 A JP 2007016214A JP 2006151113 A JP2006151113 A JP 2006151113A JP 2006151113 A JP2006151113 A JP 2006151113A JP 2007016214 A JP2007016214 A JP 2007016214A
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- 150000001875 compounds Chemical class 0.000 claims description 78
- 125000004432 carbon atom Chemical group C* 0.000 claims description 59
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- 125000000962 organic group Chemical group 0.000 claims description 29
- 229910052757 nitrogen Inorganic materials 0.000 claims description 19
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- 229910052801 chlorine Inorganic materials 0.000 claims description 7
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- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 229910052740 iodine Inorganic materials 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
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- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 9
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 9
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 9
- 0 C*C*NN*N Chemical compound C*C*NN*N 0.000 description 8
- 150000004982 aromatic amines Chemical class 0.000 description 8
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- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 7
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 7
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 7
- 150000008065 acid anhydrides Chemical class 0.000 description 7
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- 238000010438 heat treatment Methods 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000002105 nanoparticle Substances 0.000 description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 7
- 150000002923 oximes Chemical class 0.000 description 7
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- 239000010703 silicon Substances 0.000 description 7
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
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- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
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- 238000003756 stirring Methods 0.000 description 6
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
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- 150000000000 tetracarboxylic acids Chemical class 0.000 description 5
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 4
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 4
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 4
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000004693 Polybenzimidazole Substances 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
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- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 4
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- FMLYSTGQBVZCGN-UHFFFAOYSA-N oxosilicon(2+) oxygen(2-) titanium(4+) Chemical compound [O-2].[Ti+4].[Si+2]=O.[O-2].[O-2] FMLYSTGQBVZCGN-UHFFFAOYSA-N 0.000 description 4
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- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 3
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- JHGFRCLDPHKRBS-UHFFFAOYSA-N [Sn+2]=O.[O-2].[Zr+4].[O-2].[O-2] Chemical compound [Sn+2]=O.[O-2].[Zr+4].[O-2].[O-2] JHGFRCLDPHKRBS-UHFFFAOYSA-N 0.000 description 3
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- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 3
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- KEEJZKZQHBPNFA-UHFFFAOYSA-N 2-[tris(2-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC=C1C(C=1C(=CC=CC=1)N)(C=1C(=CC=CC=1)N)C1=CC=CC=C1N KEEJZKZQHBPNFA-UHFFFAOYSA-N 0.000 description 2
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Images
Abstract
【解決手段】(a)酸アミド構造で表される構造単位および/または2個の環からなる構造で表される構造単位を有する樹脂100重量部および(b)フェノール、またはエーテル基からなる構造で表される熱架橋剤10〜100重量部を含有することを特徴とする樹脂組成物。
【選択図】なし
Description
6インチシリコンウエハ上に、樹脂組成物(以下ワニスと呼ぶ)をプリベーク後の膜厚が5μmとなるように塗布し、ついでホットプレート(東京エレクトロン(株)製の塗布現像装置Mark−7)を用いて、120℃で2分プリベークすることにより、樹脂膜を得た。
大日本スクリーン製造(株)製ラムダエースSTM−602を使用し、プリベーク後および現像後の膜は屈折率1.629で測定し、キュア膜は屈折率1.773で測定した。
露光機(GCA社製i線ステッパーDSW−8000)に、パターンの切られたレチクルをセットし、365nmの露光強度で露光時間を変化させて感光性樹脂膜をi線で露光した。
上記方法で作製した樹脂膜を、光洋サーモシステム(株)製イナートオーブンINH−21CDを用いて、窒素気流下(酸素濃度20ppm以下)、140℃で30分熱処理し、その後230℃まで30分で昇温して230℃で1時間熱処理し、キュア膜(耐熱性樹脂膜)を作製した。
ワニスを6インチシリコンウエハ上に回転塗布し、次いで、120℃のホットプレート(Mark−7)で3分間ベークし、最終的に厚さ10μmのプリベーク膜を作製した。この膜をi線ステッパー(GCA製DSW−8000)を用いて0〜800mJ/cm2の露光量にて25mJ/cm2ステップで露光し、露光後、2.38%のテトラメチルアンモニウム(TMAH)水溶液(三菱ガス化学(株)製、ELM−D)で60秒現像、ついで純水でリンスし、現像後の膜を得た。ポジ型の感光性樹脂組成物の場合は、感度は露光部分が現像で完全に溶出して無くなった露光量とした。ネガ型の感光性樹脂組成物の場合、感度は現像前の膜厚の90%が現像後に残る露光量とした。
上記方法で得られた現像後の膜を、上記方法で熱処理してキュア膜を作製し、光学顕微鏡を用いて、100μmのパターンの周りのシワの有無を観察した。
上記方法で作製したキュア膜を、東京応化工業(株)製剥離液106に70℃で10分間浸漬処理を行った。処理後のキュア膜について、クラックの有無を20倍の光学顕微鏡で評価した。また、処理前後の膜厚を測定し、膜減り量を求めた。
5センチ角ガラス基板上に作製した膜厚1.0μmのキュア膜について、紫外可視分光光度計MultiSpec−1500(島津製作所(株)製)を用いて、波長400nmの透過率を測定した。
5センチ角ガラス基板上に作製したキュア膜について、プリズムカプラーMODEL2010(Metricon(株)製)を用いて、室温22℃での633nm(He−Neレーザー使用)における膜面に対して垂直方向の屈折率(TE)を測定した。
2,2−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン(セントラル硝子(株)製、BAHF)18.3g(0.05モル)をアセトン100mL、プロピレンオキシド(東京化成(株))17.4g(0.3モル)に溶解させ、−15℃に冷却した。ここに3−ニトロベンゾイルクロリド(東京化成(株)製)20.4g(0.11モル)をアセトン100mLに溶解させた溶液を滴下した。滴下終了後、−15℃で4時間攪拌し、その後室温に戻した。析出した白色固体をろ別し、50℃で真空乾燥した。
乾燥窒素気流下、TrisP−PA(商品名、本州化学工業(株)製)、21.22g(0.05モル)と5−ナフトキノンジアジドスルホン酸クロリド(東洋合成(株)製、NAC−5)26.8g(0.1モル)を1,4−ジオキサン450gに溶解させ、室温にした。ここに、1,4−ジオキサン50gと混合したトリエチルアミン12.65gを、系内が35℃以上にならないように滴下した。滴下後40℃で2時間攪拌した。トリエチルアミン塩を濾過し、濾液を水に投入した。その後、析出した沈殿を濾過で集め、さらに1%塩酸水1Lで洗浄した。その後、さらに水2Lで2回洗浄した。この沈殿を真空乾燥機で乾燥し、下記式で表されるキノンジアジド化合物を得た。
熱架橋剤HMOM−TPHAP(本州化学工業(株)製、純度80%)の20%乳酸エチル溶液をエバポレーターで濃縮し、50%乳酸エチル溶液にした。この溶液を2日間放置し、白色の結晶を得た。得られたHMOM−TPHAPの純度は、島津製作所(株)製の高速液体クロマトグラフィーで、カラムにODSを、展開溶媒にアセトニトリル/水=70:30を用い、254nmで分析したところ、純度98%であることが判った。その構造を下に示す。
4,4’−[1−[4−[1−(4−ヒドロキシフェニル−1)−1−メチルエチル]フェニル]エチリデン]ビスフェノール(本州化学工業(株)製、TrisP−PA)169.6g(0.4モル)を、水酸化ナトリウム80g(2.0モル)を純水800gに溶解させた溶液に溶解させた。完全に溶解した後、20〜25℃で36〜38%のホルマリン水溶液686gを2時間かけて滴下した。その後20℃〜25℃で17時間攪拌した。これに硫酸98gと水552gを加えて中和を行い、そのまま2日放置した。放置後に溶液に生じた針状の白色結晶を濾過で集め、水100mLで洗浄した。この白色結晶を50℃で48時間真空乾燥した。このものを島津製作所(株)製の高速液体クロマトグラフィーで、カラムにODSを、展開溶媒にアセトニトリル/水=70:30を用い、254nmで分析したところ、出発原料は完全に消失し、純度88%であることが判った。さらに、重溶媒にDMSO−d6を用いてNMR(日本電子(株)製 GX−270)により分析したところ、ヘキサメチロール化したTrisP−PAであることが判った。
1,1,1−トリス(4−ヒドロキシフェニル)エタン(本州化学工業(株)製、TrisP−HAP)103.2g(0.4モル)を、水酸化ナトリウム80g(2.0モル)を純水800gに溶解させた溶液に溶解させた。完全に溶解した後、20〜25℃で36〜38%のホルマリン水溶液686gを2時間かけて滴下した。その後20℃〜25℃で17時間攪拌した。これに硫酸98gと水552gを加えて中和を行い、そのまま2日放置した。放置後に溶液に生じた針状の白色結晶を濾過で集め、水100mLで洗浄した。この白色結晶を50℃で48時間真空乾燥した。このものを島津製作所(株)製の高速液体クロマトグラフィーで、カラムにODSを、展開溶媒にアセトニトリル/水=70:30を用い、254nmで分析したところ、出発原料は完全に消失し、純度92%であることが判った。さらに、重溶媒にDMSO−d6を用いてNMR(日本電子(株)製 GX−270)により分析したところ、ヘキサメチロール化したTrisP−PAであることが判った。
4,4’−エチリデンビスフェノール(本州化学工業(株)製、BPE)85.6g(0.4モル)を、水酸化ナトリウム80g(2.0モル)を純水800gに溶解させた溶液に溶解させた。完全に溶解した後、20〜25℃で36〜38%のホルマリン水溶液686gを2時間かけて滴下した。その後20℃〜25℃で17時間攪拌した。これに硫酸98gと水552gを加えて中和を行い、そのまま2日放置した。放置後に溶液に生じた針状の白色結晶を濾過で集め、水100mLで洗浄した。この白色結晶を50℃で48時間真空乾燥した。このものを島津製作所(株)製の高速液体クロマトグラフィーで、カラムにODSを、展開溶媒にアセトニトリル/水=70:30を用い、254nmで分析したところ、出発原料は完全に消失し、純度90%であることが判った。さらに、重溶媒にDMSO−d6を用いてNMR(日本電子(株)製 GX−270)により分析したところ、テトラメチロール化したBPEであることが判った。
乾燥窒素気流下、BAHF32.9g(0.09モル)をNMP500gに溶解させた。ここに3,3’,4,4’−ジフェニルエーテルテトラカルボン酸二無水物31.0g(0.1モル、マナック(株)製、ODPA)をNMP50gとともに加えて、30℃で2時間攪拌した。その後、3−アミノフェノール2.18g(0.02モル、東京化成(株)製)を加え、40℃で2時間攪拌を続けた。さらにピリジン5g(東京化成(株)製)をトルエン30g(東京化成(株)製)に希釈して、溶液に加え、冷却管を付け系外に水をトルエンとともに共沸で除去しながら溶液の温度を120℃にして2時間、さらに180℃で2時間反応させた。この溶液の温度が室温にまで低下したら、水3Lに溶液を投入し、白色の粉体を得た。この粉体をろ過で集め、さらに水で3回洗浄を行った。洗浄後、白色粉体を50℃の真空乾燥機で72時間乾燥させた。こうしてポリイミドポリマー粉体を得た。
実施例1で熱架橋剤を加えない以外は、同様の評価を行ったところ、膜が完全に溶解し、全く耐薬品性が無かった。
乾燥窒素気流下、合成例1で得られたヒドロキシル基含有ジアミン57.4g(0.095モル)、SiDA1.24g(0.005モル)をNMP200gに溶解した。ここにODPA31.0g(マナック(株)製、0.1モル、)を加え、40℃で2時間攪拌した。その後、ジメチルホルアミドジメチルアセタール(三菱レーヨン(株)製、DFA)7.14g(0.06モル)をNMP5gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間攪拌を続けた。攪拌終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。さらに水2Lで3回洗浄を行い、集めたポリマー固体を50℃の真空乾燥機で72時間乾燥しポリアミド酸ポリマーを得た。
実施例2において熱架橋剤を加えなかった以外は実施例2と同様にして、ワニスを得た。このワニスから作製したキュア膜の耐薬品性を評価したところ、全てが完全に溶解した。
実施例2において熱架橋剤として、ニカラックMW30HM(三和ケミカル(株)製)を8g用いた以外は実施例2と同様にしてワニスを得た。このワニスから作製したキュア膜の膜減り量は0.5μmであった。キュア膜のパターンのコーナー部にシワ状のものが観察された。感度は1000mJ/cm2であった。
実施例2において熱架橋剤として、ニカラックN2702(三和ケミカル(株)製)を8g用いた以外は、実施例2と同様にして、ワニスを得た。このワニスから作製したキュア膜の膜減り量は0.6μmであった。キュア膜のパターンのコーナー部にシワ状のものが観察された。感度は500mJ/cm2であった。
実施例2において、熱架橋剤溶液を4g(架橋剤量0.8g)とした以外は実施例2と同様にして、ワニスを得た。このワニスから作製したキュア膜の耐薬品性を調べたところ、膜減り量が1.2μmであった。感度は600mJ/cm2であった。キュア膜にはシワ状のものは観察されず、外観良好であった。
実施例2において熱架橋剤として、合成例4で得られた化合物を8g用いた以外は実施例2と同様にして、ワニスを得た。このワニスから作製したキュア膜の膜減り量は0.1μmであった。キュア膜のパターンにシワ状のものは観察されず、外観良好であった。感度は300mJ/cm2であった。
実施例2において熱架橋剤として、合成例6で得られた化合物を8g用いた以外は実施例2と同様にして、ワニスを得た。このワニスから作製したキュア膜の膜減り量は0.25μmであった。キュア膜のパターンにシワ状のものは観察されず、外観良好であった。感度は300mJ/cm2であった。
ノボラック樹脂(m−クレゾール:p−クレゾール=45/55(モル比))1.05g、光酸発生剤として合成例2のキノンジアジド化合物0.07g、熱架橋剤として合成例4で合成した化合物0.28gに乳酸エチル3gとガンマブチロラクトン2gを加え、ネガ型の感光性樹脂組成物を調製した。このワニスから作製したキュア膜は耐薬品性試験で完全に溶解し、耐薬品性がなかった。
乾燥窒素気流下、BAHF18.3g(0.05モル)をNMP50g、グリシジルメチルエーテル26.4g(0.3モル)に溶解させ、溶液の温度を−15℃まで冷却した。ここにジフェニルエーテルジカルボン酸ジクロリド14.7g(日本農薬(株)製、0.050モル)をGBL25gに溶解させた溶液を内部の温度が0℃を越えないように滴下した。滴下終了後、6時間−15℃で攪拌を続けた。反応終了後、溶液をメタノールを10重量%含んだ水3Lに投入して白色の沈殿を集めた。この沈殿をろ過で集めて、水で3回洗浄した後、50℃の真空乾燥機で72時間乾燥し、ポリヒドロキシアミドのポリマーを得た。
乾燥窒素気流下、無水トリメリット酸(東京化成(株)製)19.2g(0.1モル)、2,4−トリレンジイソシアネート(東京化成(株)製)17.4g(0.1モル)、ジアザビシクロ[5.4.0]ウンデセン−7(東京化成(株)製)0.2gをNMP250gを加え、窒素気流下、100℃まで昇温し、100℃で2時間反応させた。次いで、150℃で1時間反応させた後、NMP79.4gを加え(固形分10%)、室温まで冷却した。
乾燥窒素気流下、BAHF3.66g(0.01モル)、4,4’−ジアミノジフェニルエーテル(和歌山精化(株)製)10.1g(0.05モル)、3,3’−ジアミノジフェニルスルホン(小西化学(株)製)9.92g(0.04モル)をNMP80g、トリエチルアミン(和光純薬(株)製)20.2g(0.2モル)に溶解し、−10℃に冷却した。ここにイソフタル酸クロリド(東京化成(株)製)20.3g(0.1モル)をシクロヘキサノン(東京化成(株)製)80gに溶解させた溶液を内温が0℃を越えないように徐々に滴下した。滴下終了後、―10℃で3時間、その後1時間かけて室温に戻し、さらに1時間攪拌を続けた。攪拌終了後、析出しているトリエチルアミンの塩酸塩をろ過で除き、ろ液を水3Lに投入した。析出した白色のポリマー沈殿をろ過で集め、さらに水で洗浄を行った。その後、50℃の真空乾燥機で72時間乾燥を行った。
実施例1で得たポリマー10gに、熱架橋剤HMOM−TPHAP20g(20%の乳酸エチル溶液として、本州化学工業(株)製、架橋剤量4g)、エトキシ化ビスフェノールAジメタクリレート2g(新中村化学工業(株)製、NKエステルBPE−100)、トリメチロールプロパントリアクリレート0.5g、1,2−オクタンジオン−1−[4−(フェニルチオ)フェニル]−2−(o−ベンゾイルオキシム)0.1gをEL20gとGBL20gに溶解させた。
実施例1で得られたポリマー10gに、熱架橋剤HMOM−TPHAP20g(20%の乳酸エチル溶液として、本州化学工業(株)製、架橋剤量4g)、エトキシ化ビスフェノールAジメタクリレート2g(新中村化学工業(株)製、NKエステルBPE−100)、トリメチロールプロパントリアクリレート0.5g、ビス(ジエチルアミノフェニル)ケトン0.1g(保土谷化学(株)製)、酸化ケイ素−酸化チタン複合粒子であるTR−513(商品名、γ−ブチロラクトン分散液、数平均粒子径15nm、粒子含有量30重量%、触媒化成工業(株)製)30gと乳酸エチル20gを加えて均一な溶液を得た。この溶液を用いたキュア膜の耐薬品性を評価したところ、膜減り量は0.1μmであった。シワの発生の有無を観察したが、シワ発生は見られなかった。感度は200mJ/cm2であった。屈折率は1.72であり、透過率は96%であった。
実施例1で得たポリマー10gに、熱架橋剤HMOM−TPHAP10g(20%の乳酸エチル溶液として、本州化学工業(株)製、架橋剤量2g)、合成例2のキノンジアジド化合物2.5gを乳酸エチル20gとガンマブチロラクトン20gを加えて均一な溶液を得た。この溶液を用いたキュア膜の耐薬品性を評価したところ、膜減り量は0.35μmであった。シワの発生の有無を観察したが、シワ発生は見られなかった。感度は300mJ/cm2であった。
実施例1で得たポリマー10gに、熱架橋剤HMOM−TPHAP10g(20%の乳酸エチル溶液として、本州化学工業(株)製、架橋剤量2g)、合成例2のキノンジアジド化合物2.5g、酸化ケイ素−酸化チタン複合粒子であるTR−520(商品名、γ−ブチロラクトン分散液、数平均粒子径15nm、粒子含有量30重量%、触媒化成工業(株)製)30gと乳酸エチル20gを加えて均一な溶液を得た。この溶液を用いたキュア膜の耐薬品性を評価したところ、膜減り量は0.1μmであった。シワの発生の有無を観察したが、シワ発生は見られなかった。感度は350mJ/cm2であった。屈折率は1.76であり、透過率は94%であった。
実施例5で得たポリマー10gに、熱架橋剤HMOM−TPHAP10g(20%の乳酸エチル溶液として、本州化学工業(株)製、架橋剤量2g)、合成例2のキノンジアジド化合物2.5g、酸化ケイ素−酸化チタン複合粒子であるTR−520(商品名、γ−ブチロラクトン分散液、数平均粒子径15nm、粒子含有量30重量%、触媒化成工業(株)製)30gと乳酸エチル20gを加えて均一な溶液を得た。この溶液を用いたキュア膜の耐薬品性を評価したところ、膜減り量は0.3μmであった。シワの発生の有無を観察したが、シワ発生は見られなかった。感度は、350mJ/cm2であった。屈折率は1.77であり、透過率は95%であった。
TFTを用いた有機EL表示装置を以下の方法で作製した(図1参照)。
2 配線
3 絶縁膜
4 平坦化膜
5 第一電極
6 基板
7 コンタクトホール
8 絶縁層
Claims (7)
- (a)一般式(1)で表される構造単位および/または一般式(2)で表される構造単位を有する樹脂100重量部および(b)一般式(3)で表される熱架橋剤10〜100重量部を含有することを特徴とする樹脂組成物。
- 請求項1記載の樹脂組成物に、さらに(c)光酸発生剤0.01〜50重量部を含有することを特徴とするポジ型感光性樹脂組成物。
- (a)請求項1記載の樹脂組成物に、さらに(d)光重合開始剤0.1〜20重量部および(e)エチレン性不飽和結合を2個以上有する化合物1〜100重量部を含有することを特徴とするネガ型感光性樹脂組成物。
- (f)フィラーを含有することを特徴とする請求項1記載の樹脂組成物。
- (f)フィラーが、数平均粒子径100nm以下の粒子であることを特徴とする請求項4記載の樹脂組成物。
- 薄膜トランジスタ(TFT)が形成された基板上に、平坦化膜および表示素子をこの順に有する表示装置であって、該平坦化膜が、請求項1〜5のいずれか記載の樹脂組成物を用いて形成されてなることを特徴とする表示装置。
- 前記表示素子が有機エレクトロルミネッセンス素子であることを特徴とする請求項6記載の表示装置。
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