WO2018087990A1 - ジアミン化合物、それを用いた耐熱性樹脂および樹脂組成物 - Google Patents
ジアミン化合物、それを用いた耐熱性樹脂および樹脂組成物 Download PDFInfo
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- WO2018087990A1 WO2018087990A1 PCT/JP2017/030746 JP2017030746W WO2018087990A1 WO 2018087990 A1 WO2018087990 A1 WO 2018087990A1 JP 2017030746 W JP2017030746 W JP 2017030746W WO 2018087990 A1 WO2018087990 A1 WO 2018087990A1
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- resin
- general formula
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- aromatic
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- -1 Diamine compound Chemical class 0.000 title claims abstract description 95
- 239000011342 resin composition Substances 0.000 title claims abstract description 83
- 229920006015 heat resistant resin Polymers 0.000 title claims abstract description 56
- 239000004065 semiconductor Substances 0.000 claims abstract description 63
- 239000010410 layer Substances 0.000 claims abstract description 45
- 239000011229 interlayer Substances 0.000 claims abstract description 32
- 239000000126 substance Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims description 83
- 239000011347 resin Substances 0.000 claims description 83
- 125000003118 aryl group Chemical group 0.000 claims description 73
- 150000001875 compounds Chemical class 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 66
- 125000000962 organic group Chemical group 0.000 claims description 62
- 229910052751 metal Inorganic materials 0.000 claims description 56
- 239000002184 metal Substances 0.000 claims description 56
- 125000001931 aliphatic group Chemical group 0.000 claims description 55
- 238000000034 method Methods 0.000 claims description 50
- 229920001721 polyimide Polymers 0.000 claims description 42
- 239000004642 Polyimide Substances 0.000 claims description 40
- 239000002243 precursor Substances 0.000 claims description 35
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 27
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 24
- 229910052731 fluorine Inorganic materials 0.000 claims description 24
- 239000011737 fluorine Substances 0.000 claims description 24
- 239000010949 copper Substances 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 125000005843 halogen group Chemical group 0.000 claims description 18
- 238000007789 sealing Methods 0.000 claims description 18
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 125000002723 alicyclic group Chemical group 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 15
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- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 125000002947 alkylene group Chemical group 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
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- 125000004185 ester group Chemical group 0.000 claims description 10
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 10
- 229920002647 polyamide Polymers 0.000 claims description 10
- 229920002577 polybenzoxazole Polymers 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 9
- 125000004849 alkoxymethyl group Chemical group 0.000 claims description 9
- 125000003368 amide group Chemical group 0.000 claims description 9
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- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
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- 239000004693 Polybenzimidazole Substances 0.000 claims description 3
- 238000010828 elution Methods 0.000 claims description 3
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- 238000000059 patterning Methods 0.000 claims 2
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- 230000001681 protective effect Effects 0.000 abstract description 5
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- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 88
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- 230000015572 biosynthetic process Effects 0.000 description 40
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- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 32
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- 238000006243 chemical reaction Methods 0.000 description 24
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 23
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- 235000012431 wafers Nutrition 0.000 description 22
- 239000002253 acid Substances 0.000 description 21
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 20
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 19
- 150000003949 imides Chemical group 0.000 description 19
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 17
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- 239000002244 precipitate Substances 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 14
- 238000006798 ring closing metathesis reaction Methods 0.000 description 14
- 238000001914 filtration Methods 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 125000004427 diamine group Chemical group 0.000 description 12
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- 239000011521 glass Substances 0.000 description 10
- 239000002981 blocking agent Substances 0.000 description 9
- 238000001723 curing Methods 0.000 description 9
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 8
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
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- 238000011156 evaluation Methods 0.000 description 7
- 125000003709 fluoroalkyl group Chemical group 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
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- 238000002161 passivation Methods 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 6
- SPEUIVXLLWOEMJ-UHFFFAOYSA-N acetaldehyde dimethyl acetal Natural products COC(C)OC SPEUIVXLLWOEMJ-UHFFFAOYSA-N 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 6
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- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
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- 229940116333 ethyl lactate Drugs 0.000 description 6
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
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- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 5
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- 239000002585 base Substances 0.000 description 4
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 4
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- AJOJTMNIQSTBAP-UHFFFAOYSA-N (1,2,2,6,6-pentamethylpiperidin-3-yl) prop-2-enoate Chemical compound CN1C(C)(C)CCC(OC(=O)C=C)C1(C)C AJOJTMNIQSTBAP-UHFFFAOYSA-N 0.000 description 2
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- GIIUJJXXMYYQQD-UHFFFAOYSA-N (2,2,6,6-tetramethylpiperidin-1-yl) prop-2-enoate Chemical compound CC1(C)CCCC(C)(C)N1OC(=O)C=C GIIUJJXXMYYQQD-UHFFFAOYSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 2
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- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
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- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 2
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Images
Classifications
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
- C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C237/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups
- C07C237/28—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a non-condensed six-membered aromatic ring of the carbon skeleton
- C07C237/40—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a non-condensed six-membered aromatic ring of the carbon skeleton having the nitrogen atom of the carboxamide group bound to a carbon atom of a six-membered aromatic ring
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C235/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
- C07C235/02—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C235/04—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C235/18—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having at least one of the singly-bound oxygen atoms further bound to a carbon atom of a six-membered aromatic ring, e.g. phenoxyacetamides
- C07C235/24—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton being acyclic and saturated having at least one of the singly-bound oxygen atoms further bound to a carbon atom of a six-membered aromatic ring, e.g. phenoxyacetamides having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a six-membered aromatic ring
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C237/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups
- C07C237/02—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atoms of the carboxamide groups bound to acyclic carbon atoms of the carbon skeleton
- C07C237/04—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atoms of the carboxamide groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H—ELECTRICITY
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Definitions
- the present invention relates to a novel diamine compound, a heat resistant resin using the same, and a resin composition using the heat resistant resin. More specifically, the present invention relates to a photosensitive resin composition suitable for a surface protective film of a semiconductor element, an interlayer insulating film, an insulating layer or a flat layer of an organic electroluminescent element (organic EL).
- organic EL organic electroluminescent element
- Patent Document 1 polyimide resins, polybenzoxazole resins, and the like that are excellent in heat resistance, mechanical properties, and the like have been widely used for surface protective films and interlayer insulating films of semiconductor elements of electronic devices.
- Patent Document 2 polyimide resins, polybenzoxazole resins, and the like that are excellent in heat resistance, mechanical properties, and the like have been widely used for surface protective films and interlayer insulating films of semiconductor elements of electronic devices.
- Patent Document 2 one method for forming a through hole or the like is etching using a positive photoresist.
- this method has a problem that it requires a step of applying and removing a photoresist and is complicated. Therefore, studies have been made on heat-resistant materials imparted with photosensitivity for the purpose of rationalizing work processes.
- polyimide and polybenzoxazole thermally dehydrate and cyclize their precursor coating film to obtain a thin film having excellent heat resistance and mechanical properties. In that case, firing at a high temperature of about 350 ° C. is usually required.
- MRAM Magnetic Resistive Random Access Memory
- a sealing resin are vulnerable to high temperatures. Therefore, it is cured by firing at a low temperature of about 200 ° C. or lower for use as a surface protective film of such an element or an interlayer insulating film of a fan-out wafer level package for forming a rewiring structure on a sealing resin.
- a polyimide resin or a polybenzoxazole resin that can provide characteristics comparable to those obtained when a conventional material is fired at a high temperature of about 350 ° C.
- the film after heat-curing remains as a permanent film in the device, so the physical properties of the cured film, particularly the elongation, is very important.
- chemical processing is repeatedly performed at the time of forming metal wiring, so that chemical resistance that can withstand the processing is required.
- Patent Document 3 a method using a polybenzoxazole precursor having an aliphatic group (Patent Document 3) and a photosensitive resin composition containing a novolak resin having a crosslinkable group has been proposed (Patent Document). 4).
- JP-A-11-199557 Japanese Patent Laid-Open No. 11-24271 JP 2008-224984 A JP 2011-197362 A
- the polybenzoxazole precursor having an aliphatic group has a problem that the lower the curing temperature, the lower the chemical resistance.
- the photosensitive resin composition containing the novolak resin which has a crosslinkable group had a problem inferior in elongation.
- the present invention has been made in view of the problems associated with the prior art as described above, and a resin composition capable of obtaining a cured film having excellent chemical resistance and film characteristics even at a low-temperature heat treatment of 200 ° C. or lower. And a heat resistant resin used in the resin composition, and further, a diamine compound as a raw material thereof.
- a diamine compound represented by the general formula (1) A diamine compound represented by the general formula (1).
- R 1 and R 2 represent a divalent aliphatic group.
- R 3 and R 4 are divalent aliphatic groups, alicyclic groups, aromatic groups, and aromatic groups are —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ).
- 2- or -C (CF 3 ) 2- (where F is fluorine), a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality An aromatic group is —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 —: (where F is fluorine)
- a bonded divalent organic group In the case of a bonded divalent organic group,
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 — (where F is fluorine). When it is a group, is shown.
- p and q are each independently an integer in the range of 0 to 3.
- R 1 and R 2 in the general formula (1) are each independently a divalent aliphatic group represented by the general formula (2) or the general formula (3).
- R 3 and R 4 are divalent aliphatic groups, alicyclic groups, aromatic groups, and aromatic groups are —O—, —CO—, —SO 2 —, —CH 2. -, -C (CH 3 ) 2- , or -C (CF 3 ) 2- : (where F is fluorine), a divalent organic group bonded, and a plurality of aromatic groups bonded by a single bond A divalent organic group or a plurality of aromatic groups are —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 —: In the case where it is a divalent organic group bonded by (wherein F is fluorine).
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 — (where F is fluorine). When it is a group, is shown. p and q are each independently an integer in the range of 0 to 3. )
- R 7 to R 10 each independently represents an alkylene group having 1 to 10 carbon atoms, and a, b, and c are 1 ⁇ a ⁇ 20, 0 ⁇ b ⁇ 20, 0, respectively.
- R 11 and R 12 are each independently hydrogen, fluorine or an alkyl group having 1 to 6 carbon atoms, n is an integer of 1 to 20, and * is a chemical bond (ie, , Terminal portion of a divalent group).
- R 3 in the general formula (1) is a divalent organic group represented by the formula (4)
- R 4 in the general formula (1) is represented by the formula ( The diamine compound according to [1] or [2], which is a divalent organic group represented by 5).
- R 1 and R 2 represent a divalent aliphatic group.
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 — (where F is fluorine). When it is a group, is shown. p and q are each independently an integer in the range of 0 to 3. )
- the heat resistant resin according to [4] including at least one selected from polyimide, polyamide, polybenzoxazole, polybenzimidazole, polybenzothiazole, a precursor thereof, and a copolymer thereof.
- a resin composition comprising the heat-resistant resin according to [4] or [5], (b) a photosensitive compound, and (c) a solvent.
- the relief pattern of the cured film according to [11], wherein the step of applying the resin composition onto a substrate and drying to form a resin film includes a step of applying the resin composition onto the substrate using a slit nozzle. Manufacturing method.
- a resin composition capable of obtaining a cured film having excellent chemical resistance and film characteristics even at a low-temperature heat treatment of 200 ° C. or lower, a heat-resistant resin used in the resin composition, and these raw materials A diamine compound is provided.
- the present invention is a diamine compound represented by the general formula (1).
- R 1 and R 2 represent a divalent aliphatic group.
- R 3 and R 4 are divalent aliphatic groups, alicyclic groups, aromatic groups, and aromatic groups are —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ).
- 2- or -C (CF 3 ) 2- (where F is fluorine), a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality An aromatic group is —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 —: (where F is fluorine)
- a bonded divalent organic group In the case of a bonded divalent organic group,
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- R 5 and R 6 are preferably a hydrogen atom or an aliphatic group from the viewpoint of easy dehydration and ring closure at a low temperature.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 —: (where F is fluorine) When it is a group, is shown.
- R 3 to R 6 and A are organic groups having an aromatic group, they may contain a hydroxyl group, and some or all of the hydrogen on the aromatic ring may be substituted with a hydroxyl group.
- p and q are each independently an integer in the range of 0 to 3.
- the present invention does not exclude the case where R 1 and R 3 or R 2 and R 4 are the same group. That is, in such a case, it is understood that there is a group having the minimum number of carbon atoms (for example, a methylene group in the case of an aliphatic group) and a group other than the group (for example, ⁇ When a portion corresponding to R 3 —R 1 — has a propylene group, it is understood as a combination of a methylene group and an ethylene group).
- R 1 and R 2 have an aliphatic group
- the diamine compound itself can be dehydrated and ring-closed at 200 ° C. or lower and have an oxazole part, so that high chemical resistance can be obtained even at low temperature curing, Further, a highly stretched cured film can be obtained due to the flexibility of the aliphatic group.
- R 1 and R 2 in the general formula (1) are each independently a divalent aliphatic group represented by the general formula (2) or the general formula (3).
- the divalent aliphatic group represented by the general formula (2) or the general formula (3) is preferable because it has high flexibility and thus has a high effect of improving elongation.
- R 7 to R 10 each independently represents an alkylene group having 1 to 10 carbon atoms, and a, b, and c are 1 ⁇ a ⁇ 20, 0 ⁇ b ⁇ 20, 0 ⁇ , respectively. It represents an integer in the range of c ⁇ 20, and the arrangement of repeating units may be block or random. * Indicates a chemical bond (that is, a terminal part of a divalent group). 1 ⁇ a + b + c ⁇ 10 is preferable from the viewpoints of heat resistance, dehydration ring closure temperature, and elongation.
- R 11 and R 12 are each independently hydrogen, fluorine or an alkyl group having 1 to 6 carbon atoms, and n is an integer of 1 to 20. * Indicates a chemical bond (that is, a terminal part of a divalent group). From the viewpoint of flexibility, R 11 and R 12 are preferably hydrogen or an alkyl group having 1 to 2 carbon atoms.
- N is preferably 3 or more from the viewpoint of stretchability, and preferably 10 or less from the viewpoint of the heat resistance of the resulting compound.
- R 3 in the general formula (1) is a divalent organic group represented by the formula (4), and R 4 in the general formula (1) is a formula (5). It is more preferably a divalent organic group represented.
- the phenoxy group represented by the formula (4) or the formula (5) is directly connected to the amino group and the aliphatic group and suppresses the solubility of the diamine compound, it is preferable in terms of obtaining high chemical resistance.
- the phenyl group is preferably formed by forming an ether bond with the aliphatic group, so that stretchability is obtained and an effect of high elongation is obtained.
- a part or all of hydrogen on the benzene ring is preferably substituted with an alkyl group having 5 or less carbon atoms or a monovalent aromatic group having preferably 10 or less carbon atoms.
- the manufacturing method of the diamine compound represented by General formula (1) can be produced by following a known method for producing a diamine compound. Although not particularly limited, the following method can be employed.
- a tertiary amine such as triethylamine, an epoxy compound such as propylene oxide, an unsaturated cyclic ether such as dihydropyran, and an unsaturated bond such as ethyl methacrylate are dissolved in a solution in which the following hydroxydiamine compound is dissolved.
- a phthalimidic chloride derivative is added dropwise in the presence of the containing compound.
- the dehydrochlorination reaction is carried out in the presence of an epoxy compound and an unsaturated cyclic ether compound.
- the diamine represented by the general formula (1) can be obtained by removing phthalic acid from the diphthalimide body.
- a phthalic acid elimination method hydrazine, methyl hydrazine, or the like can be used. Alcohol can be used as the solvent.
- This deprotection step can be performed under heating and reflux.
- R 1 and R 2 represent a divalent aliphatic group.
- R 3 and R 4 are divalent aliphatic groups, alicyclic groups, aromatic groups, and aromatic groups are —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ).
- 2- or -C (CF 3 ) 2- (where F is fluorine), a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality An aromatic group is —O—, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 —: (where F is fluorine)
- a bonded divalent organic group In the case of a bonded divalent organic group,
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 — (where F is fluorine).
- p and q are each independently an integer in the range of 0 to 3.
- R 3 is a divalent organic group represented by the formula (4) and R 4 in the general formula (1) is represented by the formula (5), it is preferably produced by the following method. .
- a tertiary amine such as triethylamine, an epoxy compound such as propylene oxide, an unsaturated cyclic ether such as dihydropyran, and an unsaturated bond such as ethyl methacrylate are dissolved in a solution in which the following hydroxydiamine compound is dissolved.
- the nitrocarboxylic acid chloride derivative is added dropwise.
- the dehydrochlorination reaction is carried out in the presence of an epoxy compound and an unsaturated cyclic ether compound.
- the diamine represented by the general formula (1) can be obtained by reducing the dinitro compound.
- This reduction method includes a method in which hydrogen gas is allowed to act in the presence of a metal catalyst such as palladium / carbon and Raney nickel, a method in which ammonium formate is allowed to act in the presence of a metal catalyst such as palladium / carbon and Raney nickel, stannous chloride And a method using hydrochloric acid, a method using iron and hydrochloric acid, a method using hydrazine, and the like.
- R 1 and R 2 represent a divalent aliphatic group.
- R 5 and R 6 are any one of a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aliphatic group, an aromatic group, an acetyl group, a carboxyl group, an ester group, an amide group, an imide group, and a urea group. Represents an organic group.
- A is a divalent aliphatic group, alicyclic group, aromatic group, a divalent organic group in which a plurality of aromatic groups are bonded by a single bond, or a plurality of aromatic groups are —O—, —S Divalent organic bonded with —, —CO—, —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —, or —C (CF 3 ) 2 — (where F is fluorine). When it is a group, is shown. p and q are integers in the range of 0 to 3.
- reaction solvent examples include ketones such as methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, methyl ethyl ketone, and acetone, esters such as ethyl acetate, butyl acetate, and isobutyl acetate, tetrahydrofuran, dimethoxyethane, diethoxyethane, dibutyl ether, and diethylene glycol dimethyl ether. And ethers.
- acetone from the viewpoint of solubility and versatility. These may be used alone or in combination of two or more.
- the reaction solvent is preferably used in an amount of 100 to 5000 parts by mass with respect to 100 parts by mass of the diamine compound from the viewpoint of solubility.
- diamine compounds include bis (3-amino-4-hydroxyphenyl) hexafluoropropane (BAHF), bis (3-amino-4-hydroxyphenyl) sulfone, bis (3-amino-4-hydroxyphenyl) propane, bis (3-amino-4-hydroxyphenyl) methylene, bis (3-amino-4-hydroxyphenyl) ether, bis (3-amino-4-hydroxy) biphenyl, bis (3-amino-4-hydroxyphenyl) fluorene, etc.
- BAHF bis (3-amino-4-hydroxyphenyl) hexafluoropropane
- bis (3-amino-4-hydroxyphenyl) sulfone bis (3-amino-4-hydroxyphenyl) propane
- bis (3-amino-4-hydroxyphenyl) methylene bis (3-amino-4-hydroxyphenyl) ether
- bis (3-amino-4-hydroxy) biphenyl bis (3-amino-4-hydroxypheny
- the heat resistant resin of the present invention is a heat resistant resin having a structure derived from the diamine compound described in the general formula (1), and may be a precursor of the heat resistant resin.
- the heat-resistant resin of the present invention may contain a diamine residue other than the diamine residue derived from the general formula (1), but the ratio of the diamine residue derived from the general formula (1) is the total diamine residue. It is desirable that it is 50 mol% or more and 100 mol% or less. Even if it is low-temperature heat processing by setting it as the content rate more than this lower limit, since the cured film which is excellent in chemical-resistance and a film characteristic is obtained, it is preferable.
- At least one of polyimide, polyamide, polybenzoxazole, polybenzimidazole, polybenzothiazole, precursors thereof, and copolymers thereof contained in the heat resistant resin of the present invention is derived from the diamine compound of the present invention. It is preferable to have a structure.
- the heat-resistant resin of the present invention has a structure in which the polyamide is represented by the general formula (6), and the polyimide precursor and the polyimide are selected from structures represented by the general formula (7) and the general formula (8).
- the polybenzoxazole is a resin having a structure represented by the general formula (9).
- Y 1 to Y 4 are organic groups derived from the general formula (1), Y 1 to Y 3 each independently represents a tetravalent to hexavalent organic group, Y 4 represents a 6 to 8 valent organic group, X 1 represents a 2 to 6 valent organic group, X 2 and X 3 each independently represents a 4 to 10 valent organic group, and X 4 represents 2 to Represents a hexavalent organic group, R represents hydrogen or an organic group having 1 to 20 carbon atoms, q, s, u, and w are each independently an integer of 2 to 4, p, r, t, v Are each independently an integer of 0 to 4.)
- X 1 and X 4 represent a divalent to hexavalent organic group having 2 or more carbon atoms and represent an acid structural component.
- X 1 and X 4 are terephthalic acid, isophthalic acid, diphenyl ether dicarboxylic acid, naphthalenedicarboxylic acid, aromatic dicarboxylic acid such as bis (carboxyphenyl) propane, cyclobutanedicarboxylic acid, cyclohexanedicarboxylic acid, malonic acid, dimethylmalonic acid, ethyl Malonic acid, isopropylmalonic acid, di-n-butylmalonic acid, succinic acid, tetrafluorosuccinic acid, methylsuccinic acid, 2,2-dimethylsuccinic acid, 2,3-dimethylsuccinic acid, dimethylmethylsuccinic acid Glutaric acid, hexafluoroglutaric acid, 2-methylglutaric acid, 3-methylglutaric acid, 2,2-dimethylglutaric acid, 3,3-dimethylglutaric acid, 3-ethyl-3-methylglutaric acid, a
- a structure derived from one containing a bond such as-, -COO-, -CONH-, -OCONH-, or -NHCONH-.
- X 1 and X 4 are derived from an aromatic dicarboxylic acid is preferable because ring closure hardly occurs at the time of thermosetting, thereby suppressing an increase in stress due to film shrinkage and improving adhesion.
- the carboxylic acid groups of the raw material compounds of X 1 and X 4 are activated for the reactivity of the carboxylic acid groups as shown in the following general formula.
- a compound modified with a group is used.
- B and C are each independently a hydrogen atom, methyl group, ethyl group, propyl group, isopropyl group, t-butyl group, trifluoromethyl group, halogen group, phenoxy group, nitro group and the like. However, it is not limited to these.
- an active group other than the chloride compound By using an active group other than the chloride compound, chlorine ions in the obtained resin can be reduced, and peeling from the metal substrate due to the presence of chlorine ions can be prevented. Further, it is more preferable to use a diimidazolide compound as the active group. Since the leaving group of the diimidazolide compound becomes water-soluble imidazole, reprecipitation and washing of the obtained resin can be performed with water. Furthermore, since the detached imidazole is basic, it acts as a ring closure accelerator for the polyimide precursor structure during polymerization, and at the stage of producing the polyamide resin, it is possible to increase the ring closure rate of imidization. . As a result, the ring closure rate when a cured film is produced by heat treatment can be lowered.
- Y 1 to Y 3 represent tetravalent to hexavalent organic groups
- Y 4 represents a 6 to 8 valent organic group
- Y 1 to Y 4 in the general formulas (6) to (8) contain a phenolic hydroxyl group. Become. By including a diamine residue having a phenolic hydroxyl group, moderate solubility of the resin in an alkaline developer can be obtained, so that a high contrast between the exposed area and the unexposed area can be obtained, and a desired pattern can be formed.
- the heat resistant resin used in the present invention may have a structure derived from a diamine compound having a phenolic hydroxyl group other than the diamine compound represented by the general formula (1).
- Specific examples include, for example, bis (3-amino-4-hydroxyphenyl) hexafluoropropane, bis (3-amino-4-hydroxyphenyl) sulfone, bis (3-amino-4-hydroxyphenyl) propane, Bis (3-amino-4-hydroxyphenyl) methylene, bis (3-amino-4-hydroxyphenyl) ether, bis (3-amino-4-hydroxy) biphenyl, 2,2′-ditrifluoromethyl-5,5 Aromatic diamines such as' -dihydroxyl-4,4'-diaminobiphenyl, bis (3-amino-4-hydroxyphenyl) fluorene, 2,2'-bis (trifluoromethyl) -5,5'-dihydroxybenzidine Or some of these aromatic rings and hydrocarbon hydrogen atoms may be substituted with alkyl groups having 1 to 10 carbon atoms or fluoro Kill group, compounds substituted with a halogen atom, and the like can be given.
- Other diamine to be copolymerized can be used as it is or as a corresponding diisocyanate compound or trimethylsilylated diamine.
- the heat-resistant resin of the present invention may contain a diamine residue other than a diamine having a phenolic hydroxyl group. By copolymerizing these, heat resistance can be improved.
- Specific examples of the aromatic diamine residue include 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,4 '-Diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfone, 3,4'-diaminodiphenylsulfide, 4,4'-diaminodiphenylsulfide, 1,4-bis (4-aminophenoxy) benzene, benzine, m- Phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-naphthalenedi
- the heat resistant resin of the present invention preferably contains a diamine residue having an aliphatic group in addition to the residue derived from the diamine compound represented by the general formula (1). Since the diamine residue having an aliphatic group has high affinity with a metal, it can be a resin having high metal adhesion. In addition, since aliphatic diamine has high basicity, it acts as a ring closure accelerator during polymerization, so that the ring closure rate of the imide skeleton can be increased at the stage of producing the polyamide resin. As a result, it is possible to reduce the ring closure rate during thermosetting, and to suppress the shrinkage of the cured film and the resulting increase in the stress of the cured film.
- the diamine having an aliphatic group used in the heat resistant resin of the present invention preferably has an organic group of at least one of an alkylene group and an alkyl ether group. Specifically, it is a diamine selected from at least one of an alkylene group, a cycloalkyl group, an alkyl ether group, and a cycloalkyl ether group, wherein some of the hydrogen atoms of these hydrocarbons are substituted with alkyl having 1 to 10 carbon atoms.
- diamine having an aliphatic group examples include ethylenediamine, 1,3-diaminopropane, 2-methyl-1,3-propanediamine, 1,4-diaminobutane, 1,5-diaminopentane, 2- Methyl-1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane, 1,2-cyclohexanediamine, 1,3-cyclohexanediamine, 1,4-cyclohexanediamine, 1,2-bis (aminomethyl) cyclohexane, 1,3-bis (aminomethyl) cyclohexane, 1,4-bis (aminomethyl) cycloo
- the diamine having an aliphatic group is an organic group having at least one selected from an alkylene group and an alkyl ether group, and these have an acyclic structure in which the main chain is a straight chain. Some have better flexibility and stretchability, and can achieve low stress and high elongation when used as a cured film.
- the alkyl ethers the tetramethylene ether group is superior in heat resistance, so it is reliable. Since metal adhesion after evaluation can be provided, it is preferable. Examples include, but are not limited to, RT-1000, HE-1000, HT-1100, HT-1700, (trade name, manufactured by HUNTSMAN Co., Ltd.) and the like.
- the content of the diamine residue having an aliphatic group is preferably 5 to 40 mol% in the total diamine residues.
- the content of the diamine residue having an aliphatic group is preferably 5 to 40 mol% in the total diamine residues.
- the arrangement of the repeating unit of the diamine residue having an aliphatic group may be block-like or random, but in addition to being able to impart high metal adhesion and low stress to the polyamide structure, the elongation is improved. It is preferably included in the structure.
- the heat-resistant resin of the present invention may copolymerize an aliphatic group having a siloxane structure.
- the diamine component include those obtained by copolymerizing 1 to 10 mol% of bis (3-aminopropyl) tetramethyldisiloxane, bis (p-amino-phenyl) octamethylpentasiloxane, and the like.
- X 2 to X 3 represent an acid dianhydride residue, Organic group.
- acid dianhydride examples include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′, 4′-biphenyltetracarboxylic acid.
- R 16 represents an oxygen atom, C (CF 3 ) 2 , C (CH 3 ) 2 or SO 2
- R 17 and R 18 represent a hydrogen atom, a hydroxyl group or a thiol group.
- R represents hydrogen or a monovalent organic group having 1 to 20 carbon atoms. From the viewpoint of solubility in an alkaline developer and the solution stability of the resulting photosensitive resin composition, it is preferable that 10 mol% to 90 mol% of R is hydrogen. Further, it is more preferable that R contains at least one monovalent hydrocarbon group having 1 to 16 carbon atoms, and the others are hydrogen atoms.
- the molar ratio of the structures represented by the general formulas (6) to (9) in the present invention can be obtained by a method of calculating from the molar ratio of monomers used for polymerization or a nuclear magnetic resonance apparatus (NMR). It can be confirmed by a method for detecting a peak of a polyamide structure, an imide precursor structure, or an imide structure in a cured resin, a photosensitive resin composition, or a cured film.
- NMR nuclear magnetic resonance apparatus
- the heat-resistant resin of the present invention preferably has a weight average molecular weight in the range of 3,000 to 200,000. In this range, moderate solubility in an alkali developer can be obtained, so that a high contrast between the exposed area and the unexposed area can be obtained, and a desired pattern can be formed. In terms of solubility in an alkali developer, 100,000 or less is more preferable, and 50,000 or less is more preferable. Moreover, 1.000 or more is preferable from the surface of an elongation improvement.
- the molecular weight can be measured by gel permeation chromatography (GPC) and converted from a standard polystyrene calibration curve.
- the heat-resistant resin is sealed with other end-capping agents such as monoamine, monocarboxylic acid, acid anhydride, monoactive ester compound at the main chain end. May be.
- the introduction ratio of the end-capping agent is preferably 0.1 mol% with respect to the total amine component in order to suppress the increase in the weight average molecular weight of the heat-resistant resin of the present invention and the decrease in solubility in an alkaline solution. As mentioned above, More preferably, it is 5 mol% or more. Moreover, in order to suppress that the mechanical characteristic of the cured film obtained when the weight average molecular weight of a polyamide resin becomes low is suppressed, Preferably it is 60 mol% or less, More preferably, it is 50 mol% or less. Further, a plurality of terminal blocking agents may be reacted to introduce a plurality of different terminal groups.
- monoamines used as end-capping agents include M-600, M-1000, M-2005, and M-2070 (trade names, manufactured by HUNTSMAN Co., Ltd.), aniline, 2-ethynylaniline, and 3-ethynyl.
- Monocarboxylic acids and monoactive ester compounds as end-capping agents include 3-carboxyphenol, 4-carboxyphenol, 3-carboxythiophenol, 4-carboxythiophenol, 1-hydroxy-7-carboxynaphthalene, 1-hydroxy -6-carboxynaphthalene, 1-hydroxy-5-carboxynaphthalene, 1-mercapto-7-carboxynaphthalene, 1-mercapto-6-carboxynaphthalene, 1-mercapto-5-carboxynaphthalene, 3-carboxybenzenesulfonic acid, 4 -Monocarboxylic acids such as carboxybenzene sulfonic acid and active ester compounds in which these carboxyl groups are esterified, phthalic anhydride, maleic anhydride, nadic anhydride, cyclohexanedicarboxylic anhydride, 3-hydroxy Acid anhydrides such as loxyphthalic anhydride, phthalic acid which is a dicarboxylic acid,
- the resin end of the heat resistant resin and the resin side chain in the present invention preferably have a structure sealed with an imide precursor or imide such as amide acid or amide acid ester.
- an imide precursor or imide such as amide acid or amide acid ester.
- the resin terminal has more parts that are in contact with other components and the substrate than the main chain of the resin, it is possible to enhance the adhesion and improve the storage stability of the resin composition.
- the structure in which the resin terminal and the resin side chain of the heat resistant resin of the present invention are sealed with an imide precursor or imide such as amide acid or amide acid ester are phthalic anhydride, maleic anhydride, nadic acid anhydride, cyclohexanedicarboxylic acid.
- Acid anhydrides acid anhydrides such as 3-hydroxyphthalic acid anhydride, dicarboxylic acid phthalic acid, maleic acid, nadic acid, cyclohexanedicarboxylic acid, 3-hydroxyphthalic acid, 5-norbornene-2,3-dicarboxylic acid
- trimellitic acids such as trimellitic acid, trimesic acid, diphenyl ether tricarboxylic acid, terephthalic acid, phthalic acid, maleic acid, cyclohexanedicarboxylic acid, 1,5-dicarboxynaphthalene, 1,6-dicarboxynaphthalene, 1,7 -Dicarboxynaphthalene, 2,6-dicarboxynaphthalene
- Active ester compounds obtained by reacting one carboxyl group of any dicarboxylic acid with N-hydroxybenzotriazole, imidazole, N-hydroxy-5-norbornene-2,3-dicarboximide, their aromatic rings or hydro
- the end capping agent that can be used in the present invention can be easily detected by the following method.
- an alkali-soluble resin into which a terminal blocking agent has been introduced is dissolved in an acidic solution and decomposed into an amine component and an acid anhydride component, which are structural units, which are analyzed by gas chromatography (GC) or NMR.
- GC gas chromatography
- NMR nuclear magnetic resonance
- the end capping agent used in the invention can be easily detected. Apart from this, it can also be easily detected by directly measuring the alkali-soluble resin component into which the end-capping agent has been introduced, by pyrolysis gas chromatography (PGC), infrared spectrum and 13 C-NMR spectrum.
- PPC pyrolysis gas chromatography
- the heat resistant resin of the present invention is synthesized, for example, by the following method, but is not limited thereto.
- the reaction is preferably performed at 70 to 200 ° C.
- the polyimide precursor structure is a structure derived from an acid anhydride in the polymerization method.
- the polyimide precursor structure is obtained by reacting a carboxylic acid with an esterifying agent after the polymerization.
- the heat-resistant resin of the present invention includes a case where it is a polyimide.
- the polyimide obtains an imide precursor using a method for producing a structure represented by the general formula (7).
- a method of polymerizing at 200 ° C. a method of closing all imide rings of the imide precursor using a known imidization reaction method, a method of stopping the imidation reaction in the middle and introducing a part of the imide structure, And a method of partially introducing an imide structure by mixing the polyimide precursor with a closed ring imide polymer in which all imide rings of the imide precursor are closed.
- the benzoxazole used in the present invention can be synthesized using, for example, a method of obtaining polyamide and polymerizing it at 150 to 250 ° C., or a method of adding an acidic catalyst to cyclize.
- the organic solvent used for resin polymerization include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N, N ′.
- the heat-resistant resin of the present invention is preferably isolated after being polymerized by the above-described method, and then poured into a large amount of water or a mixed solution of methanol and water, precipitated, filtered and dried.
- the drying temperature is preferably 40 to 100 ° C., more preferably 50 to 80 ° C.
- the imidation ratio in the heat resistant resin of the present invention can be easily determined by, for example, the following method. First, measuring the infrared absorption spectrum of the polymer, absorption peaks of an imide structure caused by a polyimide (1780 cm around -1, 1377 cm around -1) to confirm the presence of. Next, the polymer was heat-treated at 350 ° C. for 1 hour, an infrared absorption spectrum was measured using a sample having an imidization rate of 100%, and the peak intensity around 1377 cm ⁇ 1 of the resin before and after the heat treatment was compared, whereby the heat treatment was performed. The content of imide groups in the pre-resin is calculated to determine the imidization rate. The imidation rate is preferably 50% or more, and more preferably 80% or more, because the change in the ring closure rate during thermosetting is suppressed and the effect of reducing the stress is obtained.
- the heat resistant resin obtained by the method of the present invention can be used as a resin composition.
- the heat-resistant resin obtained by the method of the present invention and (b) a resin composition using a photoacid generator as a photosensitive compound can be used as a positive photosensitive resin composition (positive photosensitive varnish). .
- the resin obtained by the method of the present invention and the resin composition using a photopolymerizable compound as a photosensitizer can be made as a negative photosensitive resin composition (negative photosensitive varnish).
- the positive photosensitive composition is superior to the negative photosensitive resin composition in terms of resolution, it is suitable for use in forming a fine processing pattern.
- a quinonediazide compound is preferably used as the photoacid generator of the positive photosensitive resin composition.
- quinonediazide sulfonic acid is ester-bonded to a polyhydroxy compound
- quinonediazide sulfonic acid is sulfonamide-bonded to a polyamino compound
- quinonediazide sulfonic acid is ester-bonded and / or sulfonamide to a polyhydroxypolyamino compound. Examples include those that are combined. Although all the functional groups of these polyhydroxy compounds, polyamino compounds, and polyhydroxypolyamino compounds may not be substituted with quinonediazide, it is preferable that 40 mol% or more of the entire functional groups are substituted with quinonediazide on average. .
- a positive photosensitive resin composition that is sensitive to i-line (wavelength 365 nm), h-line (wavelength 405 nm), and g-line (wavelength 436 nm) of a mercury lamp, which is a general ultraviolet ray. Obtainable.
- polyhydroxy compound examples include Bis-Z, BisP-EZ, TekP-4HBPA, TrisP-HAP, TrisP-PA, TrisP-SA, TrisOCR-PA, BisOCHP-Z, BisP-MZ, BisP-PZ, BisP -IPZ, BisOCP-IPZ, BisP-CP, BisRS-2P, BisRS-3P, BisP-OCHP, Methylenetris-FR-CR, BisRS-26X, DML-MBPC, DML-MBOC, DML-OCHP, DML-PCHP, DML-PC, DML-PTBP, DML-34X, DML-EP, DML-POP, dimethylol-BisOC-P, DML-PFP, DML-PSBP, DML-MTrisPC, TriML-P, TriML-35XL, TML-B , TML-HQ, TML-pp-BPF, TML-BPA, TMOM-BP, HML-TPPHBA, HML-T
- polyamino compound examples include 1,4-phenylenediamine, 1,3-phenylenediamine, 4,4′-diaminodiphenyl ether, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylsulfone, 4,4 Examples thereof include, but are not limited to, '-diaminodiphenyl sulfide.
- polyhydroxypolyamino compound examples include 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane and 3,3′-dihydroxybenzidine, but are not limited thereto. .
- the quinonediazide compound preferably contains an ester with a phenol compound and a 4-naphthoquinonediazidesulfonyl group.
- the content of the quinonediazide compound used in the photosensitive resin composition of the present invention is preferably 1 to 50 parts by mass and more preferably 10 to 40 parts by mass with respect to 100 parts by mass of the resin.
- the resin composition of the present invention contains a compound represented by the following general formula (10), thereby improving the elongation characteristics of the cured film after reliability evaluation and the adhesion to a metal material.
- the compound represented by the general formula (10) acts as an antioxidant to suppress oxidative degradation of aliphatic groups and phenolic hydroxyl groups of the heat resistant resin. Moreover, metal oxidation can be suppressed by the antirust effect
- R 13 represents a hydrogen atom or an alkyl group having 2 or more carbon atoms
- R 14 represents an alkylene group having 2 or more carbon atoms
- R 15 represents a monovalent to tetravalent organic group containing at least one of an alkylene group having 2 or more carbon atoms, an O atom, and an N atom.
- k is an integer of 1 to 4 and can act on the heat resistant resin and the metal material at the same time. Therefore, k is more preferably 2 to 4.
- an alkyl group, a cycloalkyl group, an alkoxy group, an alkyl ether group, an alkylsilyl group, an alkoxysilyl group, an aryl group, an aryl ether group, a carboxyl group, a carbonyl group, an allyl group, a vinyl group, a heterocyclic group, —O—, —NH—, —NHNH—, a combination thereof, and the like may be included, and a substituent may be further included.
- alkyl ethers and —NH— are preferable from the viewpoint of solubility in a developer and metal adhesion, and —NH from the viewpoint of interaction with a heat-resistant resin and metal complex formation. -Is more preferable.
- Examples of the compound represented by the following general formula (10) include the following, but are not limited to the following structures.
- the amount of the compound represented by the general formula (10) is preferably 0.1 to 10 parts by mass, more preferably 0.5 to 5 parts by mass with respect to the heat resistant resin.
- the added amount is less than 0.1 parts by mass, it is difficult to obtain the effect of improving the elongation properties after reliability and the adhesion to the metal material. There is a risk of lowering the sensitivity of the resin composition.
- the resin composition of the present invention preferably contains a thermal crosslinking agent.
- a compound having two or more groups of at least any one of an alkoxymethyl group and a methylol group (hereinafter sometimes referred to as (d) compound) is preferable.
- the compound may have two or more alkoxymethyl groups, may have two or more methylol groups, or may have one or more alkoxymethyl groups and one methylol group. You may have it above. By having two or more of these groups, it is possible to obtain a strong crosslinked structure by a condensation reaction with the resin and the same type of molecule. By using in combination with a photoacid generator or a photopolymerization initiator, a wider range of designs is possible to improve sensitivity and mechanical properties of the cured film.
- Preferred examples of such a compound include, for example, DML-PC, DML-PEP, DML-OC, DML-OEP, DML-34X, DML-PTBP, DML-PCHP, DML-OCHP, DML-PFP, DML- PSBP, DML-POP, DML-MBOC, DML-MBPC, DML-MTrisPC, DML-BisOC-Z, DMLBisOCHP-Z, DML-BPC, DML-BisOC-P, DMOM-PC, DMOM-PTBP, DMOM-MBPC, TriML-P, TriML-35XL, TML-HQ, TML-BP, TML-pp-BPF, TML-BPE, TML-BPA, TML-BPAF, TML-BPAP, TMOM-BP, TMOM-BPE, TMOM-BPA, TMOM-BPAF, TM M-BPAP, HML-TPPHBA, HML-TPPHAP, HM
- the addition amount of the compound having at least two of at least any one of an alkoxymethyl group and a methylol group is preferably 10 to 60 parts by mass with respect to 100 parts by mass of the heat-resistant resin of the present invention, More preferred is 40 parts by weight.
- the addition amount is more than 10 parts by mass, the crosslink density by the thermal crosslinking agent is high, so that the chemical resistance of the cured film is improved, and when it is less than 60 parts by mass, sufficient flexibility is obtained. This is preferable because high elongation can be obtained.
- the resin composition of the present invention can further improve elongation and reduce stress by containing a thermal crosslinking agent having a structural unit represented by the following general formula (11).
- R 17 and R 18 each independently represent a hydrogen atom or a methyl group.
- R 16 is a divalent organic group having an alkylene group having 2 or more carbon atoms, and may be linear, branched, or cyclic.
- R 16 includes an alkylene group, a cycloalkylene group, an alkyl ether group, an alkylsilyl group, an alkoxysilyl group, an arylene group, an aryl ether group, an ester group, a carbonyl group, a heterocyclic group, a combination thereof, and the like. It may have a substituent.
- the thermal crosslinking agent itself has a flexible alkylene group and a rigid aromatic group, it is possible to improve the elongation and reduce the stress while having heat resistance.
- the crosslinkable group include, but are not limited to, an acrylic group, a methylol group, an alkoxymethyl group, and an epoxy group.
- an epoxy group is preferable because it can react with the phenolic hydroxyl group of the heat-resistant resin to improve the heat resistance of the cured film and can react without dehydration.
- Examples of the compound containing the structural unit represented by the following general formula (11) include, but are not limited to, the following structures.
- n is an integer of 1 to 5
- m is an integer of 1 to 20.
- n is preferably 1 to 2 and m is preferably 3 to 7 from the viewpoint of achieving both heat resistance and improvement in elongation.
- a low molecular compound having a phenolic hydroxyl group may be contained within a range that does not reduce the shrinkage residual film ratio after curing. Thereby, the development time can be shortened.
- Examples of these compounds include Bis-Z, BisP-EZ, TekP-4HBPA, TrisP-HAP, TrisP-PA, BisOCHP-Z, BisP-MZ, BisP-PZ, BisP-IPZ, BisOCP-IPZ, BisP- CP, BisRS-2P, BisRS-3P, BisP-OCHP, Methylenetris-FR-CR, BisRS-26X (trade name, manufactured by Honshu Chemical Industry Co., Ltd.), BIP-PC, BIR-PC, BIR-PTBP BIR-BIPC-F (trade name, manufactured by Asahi Organic Materials Co., Ltd.) and the like. Two or more of these may be contained.
- the content of the low molecular compound having a phenolic hydroxyl group is preferably 1 to 40 parts by mass with respect to 100 parts by mass of the heat resistant resin.
- the resin composition of the present invention preferably contains (c) a solvent.
- Solvents include N-methyl-2-pyrrolidone, ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, 1,3-dimethyl-2 -Polar aprotic solvents such as imidazolidinone, N, N'-dimethylpropyleneurea, N, N-dimethylisobutyramide, methoxy-N, N-dimethylpropionamide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, propylene Ethers such as glycol monoethyl ether, ketones such as acetone, methyl ethyl ketone, diisobutyl ketone, ethyl acetate, butyl acetate, isobutyl a
- the content of the solvent is preferably 100 parts by mass or more in order to dissolve the composition with respect to 100 parts by mass of the heat resistant resin, and 1,500 parts by mass to form a coating film having a thickness of 1 ⁇ m or more. It is preferable to contain below.
- the resin composition of the present invention is a surfactant, esters such as ethyl lactate and propylene glycol monomethyl ether acetate, alcohols such as ethanol, ketones such as cyclohexanone and methyl isobutyl ketone for the purpose of improving the wettability with the substrate. And ethers such as tetrahydrofuran and dioxane.
- the resin composition of the present invention includes, as a silicon component, trimethoxyaminopropylsilane, trimethoxyepoxysilane, trimethoxyvinylsilane, trimethoxythiolpropyl as long as storage stability is not impaired.
- a silane coupling agent such as silane may be contained.
- a preferable content of the silane coupling agent is 0.01 to 5 parts by mass with respect to 100 parts by mass of the heat resistant resin.
- the resin composition of the present invention preferably has another alkali-soluble resin in addition to the heat-resistant resin of the present invention.
- a siloxane resin an acrylic polymer copolymerized with acrylic acid, a novolac resin, a resole resin, a polyhydroxystyrene resin, and a modified product in which a crosslinking group such as a methylol group, an alkoxymethyl group or an epoxy group is introduced
- Examples thereof include copolymer polymers thereof.
- Such a resin is soluble in an alkaline solution such as tetramethylammonium hydroxide, choline, triethylamine, dimethylaminopyridine, monoethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, and sodium carbonate.
- an alkaline solution such as tetramethylammonium hydroxide, choline, triethylamine, dimethylaminopyridine, monoethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, and sodium carbonate.
- the preferred content of these resins is 5 to 200 parts by mass, and more preferably 15 to 150 parts by mass with respect to 100 parts by mass of the heat-resistant resin of the present invention.
- the resin composition of the present invention may contain a dissolution regulator within a range that does not increase the shrinkage after curing.
- a dissolution regulator any compound can be preferably used as long as it is a compound generally used as a solubility regulator in a positive resist, such as a polyhydroxy compound, a sulfonamide compound, and a urea compound.
- a polyhydroxy compound which is a raw material for synthesizing a quinonediazide compound is preferably used.
- the resin composition of the present invention is a negative photosensitive resin composition that is insolubilized by light when a photopolymerizable compound is blended.
- a photopolymerizable compound contains a polymerizable unsaturated functional group.
- the polymerizable unsaturated functional group include unsaturated double bond functional groups such as vinyl group, allyl group, acryloyl group and methacryloyl group, and unsaturated triple bond functional groups such as propargyl.
- a group selected from a conjugated vinyl group, an acryloyl group, and a methacryloyl group is preferable in terms of polymerizability.
- the number of functional groups contained is preferably 1 to 4 from the viewpoint of stability, and the groups may not be the same.
- the photopolymerizable compound preferably has a number average molecular weight of 30 to 800. When the number average molecular weight is in the range of 30 to 800, the compatibility with the polyamide is good and the stability of the resin composition solution is good.
- Preferred photopolymerizable compounds include, for example, diethylene glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane diacrylate, trimethylol.
- 1,9-nonanediol dimethacrylate 1,10-decanediol dimethacrylate, dimethylol-tricyclodecane diacrylate, isobornyl acrylate, isobornyl methacrylate, pentaerythritol tris.
- the content of the photopolymerizable compound in the resin composition of the present invention is preferably 5 to 200 parts by mass with respect to 100 parts by mass of the heat resistant resin, and 5 to 150 parts by mass from the viewpoint of compatibility. Is more preferable.
- the viscosity of the resin composition of the present invention is preferably 2 to 5,000 mPa ⁇ s.
- the viscosity can be measured using an E-type rotary viscometer. By adjusting the solid content concentration so that the viscosity is 2 mPa ⁇ s or more, it becomes easy to obtain a desired film thickness. On the other hand, if the viscosity is 5,000 mPa ⁇ s or less, it becomes easy to obtain a highly uniform coating film. A resin composition having such a viscosity can be easily obtained, for example, by setting the solid content concentration to 5 to 60% by mass.
- the resin composition of the present invention is applied to a substrate.
- substrates silicon wafers, ceramics, gallium arsenide, organic circuit boards, inorganic circuit boards, composite substrates of silicon wafers and sealing resins such as epoxy resins, and circuit constituent materials are arranged on these boards
- examples include, but are not limited to:
- organic circuit boards include: glass substrate copper-clad laminates such as glass cloth and epoxy copper-clad laminates, composite copper-clad laminates such as glass nonwoven fabrics and epoxy copper-clad laminates, temporary carrier substrates, polyetherimide Examples thereof include heat-resistant / thermoplastic substrates such as resin substrates, polyetherketone resin substrates and polysulfone resin substrates, polyester copper-clad film substrates, and polyimide copper-clad film substrates.
- Examples of inorganic circuit boards include glass substrates, alumina substrates, aluminum nitride substrates, ceramic substrates such as silicon carbide substrates, and metal substrates such as aluminum base substrates and iron base substrates.
- Examples of circuit components include conductors containing metals such as silver, gold and copper, resistors containing inorganic oxides, low dielectrics containing glass materials and / or resins, resins and high Examples thereof include high dielectric materials containing dielectric constant inorganic particles, insulators containing glass-based materials, and the like.
- Application methods include spin coating using spinner, spray coating, roll coating, screen printing, blade coater, die coater, calendar coater, meniscus coater, bar coater, roll coater, comma roll coater, gravure coater, screen coater, slit die coater. Or the like.
- the coating film thickness varies depending on the coating method, the solid content concentration of the composition, the viscosity, and the like, but is usually applied so that the film thickness after drying is 0.1 to 150 ⁇ m. When it is set as a photosensitive uncured sheet, it is then dried and peeled off.
- the substrate can be pretreated with the aforementioned silane coupling agent.
- Surface treatment is performed by spin coating, dipping, spray coating, steam treatment or the like. In some cases, a heat treatment is subsequently performed at 50 ° C. to 300 ° C. to advance the reaction between the substrate and the silane coupling agent.
- the substrate obtained by applying or laminating the resin composition or the uncured sheet on the substrate is dried to obtain a photosensitive resin composition film. Drying is preferably performed using an oven, a hot plate, infrared rays, or the like in the range of 50 ° C. to 150 ° C. for 1 minute to several hours.
- the resin composition film is exposed to actinic radiation through a mask having a desired pattern.
- actinic radiation there are ultraviolet rays, visible rays, electron beams, X-rays and the like.
- a developer is used to remove the exposed portion in the case of the positive type and the unexposed portion in the case of the negative type.
- Developers include tetramethylammonium hydroxide, diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylaminoethyl acetate, dimethylaminoethanol, dimethyl
- an alkaline compound such as aminoethyl methacrylate, cyclohexylamine, ethylenediamine or hexamethylenediamine is preferred.
- these alkaline solutions may contain polar solvents such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, ⁇ -butyrolactone, dimethylacrylamide, methanol, ethanol, Alcohols such as isopropanol, esters such as ethyl lactate and propylene glycol monomethyl ether acetate, ketones such as cyclopentanone, cyclohexanone, isobutyl ketone, and methyl isobutyl ketone may be added singly or in combination. Good.
- polar solvents such as N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, ⁇ -butyrolactone, dimethylacrylamide, methanol, ethanol, Alcohols such as isopropanol, esters such as ethyl lactate and propy
- Development can be performed by spraying the developer onto the coating surface, immersing in the developer, applying ultrasonic waves while immersing, or spraying the developer while rotating the substrate. After development, it is preferable to rinse with water.
- alcohols such as ethanol and isopropyl alcohol
- esters such as ethyl lactate and propylene glycol monomethyl ether acetate may be added to water for rinsing treatment.
- a temperature of 150 ° C. to 500 ° C. is applied to advance the thermal crosslinking reaction.
- Crosslinking can improve heat resistance and chemical resistance.
- a method of selecting a temperature and increasing the temperature stepwise, or a method of selecting a certain temperature range and continuously increasing the temperature for 5 minutes to 5 hours can be selected.
- the former there is a method of performing heat treatment at 130 ° C. and 200 ° C. for 30 minutes each.
- An example of the latter is a method of linearly raising the temperature from room temperature to 400 ° C. over 2 hours.
- the curing condition in the present invention is preferably 150 ° C. or higher and 350 ° C. or lower.
- the present invention provides a cured film particularly excellent in low-temperature curability, 160 ° C. or higher and 250 ° C. or lower is more preferable. 160 ° C. or more and 190 ° C. or less is more preferable in view of the influence on
- the heat resistant resin film formed from the resin composition of the present invention can be used for electronic devices such as semiconductor devices and multilayer wiring boards, and organic EL display devices.
- a semiconductor passivation film, a surface protection film of a semiconductor element, an interlayer insulating film, an interlayer insulating film of a multilayer wiring for high-density mounting, an interlayer insulating film of an electronic component such as an inductor or a SAW filter, an organic electroluminescent element Although it is suitably used for applications such as an insulating layer or a flat layer of organic EL), it is not limited to this and can have various structures.
- FIG. 1 is an enlarged cross-sectional view of a pad portion of a semiconductor device having a bump according to the present invention.
- a passivation film 3 is formed on an input / output aluminum (hereinafter, Al) pad 2 in a silicon wafer 1, and a via hole is formed in the passivation film 3.
- an insulating film 4 is formed thereon as a pattern made of the resin composition of the present invention, and further, a metal (Cr, Ti, etc.) film 5 is formed so as to be connected to the Al pad 2 and the metal is formed by electrolytic plating or the like.
- Wiring (Al, Cu, etc.) 6 is formed.
- the metal film 5 etches the periphery of the solder bump 10 to insulate between the pads.
- a barrier metal 8 and a solder bump 10 are formed on the insulated pad.
- the resin composition of the insulating film 7 can be processed with a thick film in the scribe line 9. When a flexible component is introduced into the resin composition, since the wafer warpage is small, exposure and wafer transportation can be performed with high accuracy.
- the resin of the present invention is also excellent in high extensibility, the resin itself is deformed, so that stress from the sealing resin can be relieved even during mounting, resulting in damage to bumps, wiring, and low-k layers. And a highly reliable semiconductor device can be provided.
- FIG. 2a of FIG. 2 an input / output Al pad 2 and a passivation film 3 are formed on the silicon wafer 1, and an insulating film 4 is formed as a pattern of the resin composition of the present invention.
- a metal (Cr, Ti, etc.) film 5 is formed so as to be connected to the Al pad 2, and as shown in 2c of FIG. 2, the metal wiring 6 is formed by a plating method. Form a film.
- the resin composition of the present invention is applied, and the insulating film 7 is formed in a pattern as shown in 2d of FIG.
- a wiring can be further formed on the insulating film 7.
- a structure can be formed. At this time, the formed insulating film comes into contact with various chemicals a plurality of times, but the insulating film obtained from the resin composition of the present invention is excellent in adhesion and chemical resistance.
- a multilayer wiring structure can be formed. There is no upper limit to the number of layers in the multilayer wiring structure, but 10 or fewer layers are often used.
- a barrier metal 8 and a solder bump 10 are formed. Then, the wafer is diced along the last scribe line 9 and cut into chips.
- FIG. 3 is an enlarged cross-sectional view of a pad portion of a semiconductor device having an insulating film of the present invention, which has a structure called a fan-out wafer level package (fan-out WLP).
- the silicon wafer 1 on which the Al pad 2 and the passivation film 3 are formed is diced and cut into chips, and then sealed with a resin 11.
- an insulating film 4 is formed as a pattern of the resin composition of the present invention, and further, a metal (Cr, Ti, etc.) film 5 and a metal wiring 6 are formed.
- the fan-out WLP is provided with an extended portion using a sealing resin such as epoxy resin around the semiconductor chip, rewiring from the electrode on the semiconductor chip to the extended portion, and mounting a solder ball on the extended portion.
- a sealing resin such as epoxy resin around the semiconductor chip
- wiring is installed so as to straddle the boundary line formed by the main surface of the semiconductor chip and the main surface of the sealing resin. That is, an interlayer insulating film is formed on a base material made of two or more materials such as a semiconductor chip provided with metal wiring and a sealing resin, and wiring is formed on the interlayer insulating film.
- the fan-out WLP is disposed as an interlayer insulating film between rewirings on a support substrate on which a temporary bonding material is disposed, and after a silicon chip and a sealing resin are disposed on the support substrate, the temporary bonding material is disposed on the support substrate.
- RDL-first a type of package created by a process called RDL-first that peels off the substrate and the rewiring.
- a glass substrate or the like that is more likely to warp than a silicon wafer is often used as a support substrate, and therefore it is preferable that the insulating film has low stress.
- a barrier metal such as Ti is formed on the support substrate 20 by sputtering, and a Cu seed (seed layer) is further formed thereon by sputtering, and then an electrode pad 21 is formed by plating.
- the photosensitive resin composition of the present invention is applied, and a patterned insulating film 22 is formed through a photolithography process.
- a seed layer is formed again by a sputtering method, and a metal wiring 23 (rewiring layer) is formed by a plating method. Thereafter, the steps 3b and 3c are repeated in order to match the pitch of the conductive portion of the semiconductor chip and the pitch of the metal wiring to form a multilayer wiring structure as shown in 3d.
- step 3e the photosensitive resin composition of the present invention is applied again, and after a photolithography process, a patterned insulating film is formed, and then a Cu post 24 is formed by a plating method.
- the pitch of the Cu posts is equal to the pitch of the conductive portions of the semiconductor chip. That is, in order to make the rewiring layer multilayer while narrowing the metal wiring pitch, as shown in 3e of FIG. 3, the thickness of the interlayer insulating film is as follows: interlayer insulating film 1> interlayer insulating film 2> interlayer insulating film 3> Interlayer insulating film 4>.
- the semiconductor chip 26 is connected through the solder bumps 25, and an RDL first semiconductor device having a multilayer wiring structure can be obtained.
- wiring is installed so as to straddle the boundary line between the main surface of the semiconductor chip and the main surface of the printed circuit board.
- an interlayer insulating film is formed on a base material made of two or more materials, and wiring is formed on the interlayer insulating film.
- the cured film formed by curing the resin composition of the present invention has high elongation and high adhesion to a semiconductor chip provided with metal wiring, and also has high adhesion to the sealing resin to an epoxy resin or the like. Therefore, it is suitably used as an interlayer insulating film provided on a substrate made of two or more materials.
- the cured film of the resin composition of the present invention is suitable for fine rewiring because it has a high metal adhesion even for a wiring in which the width of the metal wiring and the distance between adjacent wirings are 5 ⁇ m or less.
- the width of the metal wiring and the distance between adjacent wirings become narrower, and the thickness of the interlayer insulating film becomes thinner as it approaches the semiconductor chip. Therefore, it corresponds to high integration of chips. For this reason, along with higher resolution, in-plane uniformity on a rewiring with a step becomes an important issue.
- FIG. 4 is a cross-sectional view of a coil component having an insulating film of the present invention.
- an insulating film 13 is formed on the substrate 12, and an insulating film 14 is formed thereon as a pattern.
- the resin composition of the present invention may be used for either the insulating film 13 or the insulating film 14.
- a metal (Cr, Ti, etc.) film 15 is formed in the opening of this pattern, and a metal wiring (Ag, Cu, etc.) 16 is formed thereon by plating.
- the metal wiring 16 (Ag, Cu, etc.) is formed on the spiral. By repeating the steps 13 to 16 a plurality of times and laminating, the function as a coil can be provided. Finally, the metal wiring 16 (Ag, Cu, etc.) is connected to the electrode 18 by the metal wiring 17 (Ag, Cu, etc.) and sealed with the sealing resin 19.
- the resin composition of the present invention is also suitably used for organic EL display devices.
- the organic EL display device has a driving circuit, a planarizing layer, a first electrode, an insulating layer, a light emitting layer, and a second electrode on a substrate, and the planarizing layer and / or the insulating layer is made of the cured film of the present invention. Become.
- Organic EL light-emitting materials are susceptible to deterioration due to moisture and may adversely affect the area ratio of the light-emitting portion relative to the area of the light-emitting pixels, but the cured film of the present invention has a low water absorption rate, so stable driving and light emission Characteristics are obtained.
- an active matrix display device it has a TFT on a substrate made of glass, various plastics, etc., and a wiring located on a side portion of the TFT and connected to the TFT, and covers unevenness thereon.
- the planarization layer is provided, and the display element is provided on the planarization layer.
- the display element and the wiring are connected through a contact hole formed in the planarization layer.
- FIG. 6 shows a cross-sectional view of an example of a TFT substrate.
- bottom gate type or top gate type TFTs thin film transistors
- an insulating layer 29 is formed so as to cover the TFTs 27.
- a wiring 28 connected to the TFT 27 is provided on the insulating layer 29.
- a planarizing layer 30 is provided on the insulating layer 29 in a state where the wiring 28 is embedded.
- a contact hole 33 reaching the wiring 28 is provided in the planarization layer 30.
- An ITO (transparent electrode) 31 is formed on the planarizing layer 30 while being connected to the wiring 28 through the contact hole 33.
- the ITO 31 serves as an electrode of a display element (for example, an organic EL element).
- the organic EL element may be a top emission type that emits emitted light from the side opposite to the substrate 32 or a bottom emission type that extracts light from the substrate 32 side.
- an active matrix type organic EL display device in which the TFT 27 for driving the organic EL element is connected to each organic EL element is obtained.
- the insulating layer 29, the planarization layer 30, and / or the insulating layer 34 are a step of forming a photosensitive resin film made of the resin composition or resin sheet of the present invention, a step of exposing the photosensitive resin film, It can form by the process of developing the exposed photosensitive resin film, and the process of heat-processing the developed photosensitive resin film.
- An organic EL display device can be obtained from the manufacturing method having these steps.
- varnish a resin composition (hereinafter referred to as varnish) filtered in advance with a 1 ⁇ m polytetrafluoroethylene filter (manufactured by Sumitomo Electric Industries, Ltd.) was used.
- the molecular weight of the heat-resistant resin was measured using a GPC (gel permeation chromatography) apparatus Waters 2690-996 (manufactured by Nihon Waters Co., Ltd.), and the developing solvent was N-methyl-2-pyrrolidone (hereinafter NMP).
- NMP N-methyl-2-pyrrolidone
- the ring closure rate and polyimidization rate of the polyhydroxyamide were calculated by spin-coating varnish on a silicon wafer and drying at 120 ° C. for 3 minutes to obtain a coating film having a thickness of 5 ⁇ m. Further, this coating film is heated at 180 ° C. for 10 minutes or at 300 to 350 ° C. for 10 minutes to obtain a cured film (cured film (A) heated at 180 ° C., cured film (B) heated at 300 to 350 ° C.). Obtained. The infrared absorption spectra of these cured film (A) and cured film (B) were measured, and the absorbance of the peak due to CO stretching vibration near 1050 cm ⁇ 1 was determined. The ring closure rate of the cured film (A) was calculated with the ring closure rate of the polyhydroxyamide of the cured film (B) as 100%.
- the ring closure rate of polyhydroxyamide is preferably 30% or more.
- the absorbance of C near the absorption peak (1377 cm ⁇ 1 ) of the imide structure attributed to polyimide was determined.
- the imidization rate of the cured film (A) was calculated with the imidization rate of the cured film (B) as 100%.
- the imidation ratio is preferably 50% or more, and more preferably 80% or more, because the solubility during thermosetting is suppressed and the effect of high chemical resistance is obtained.
- the wafer was taken out, measured for film thickness, and then immersed in a solvent of resist stripping solution ST-120 (manufactured by Tokyo Ohka Kogyo Co., Ltd.) at 60 ° C. for 30 minutes. After the wafer taken out from the solvent is washed with pure water, the film thickness is measured again. If the absolute value of the change rate exceeds 20% or the cured film is peeled off (C), within 20% Thus, a value exceeding 10% was acceptable (B), and a value within 10% was regarded as better (A).
- resist stripping solution ST-120 manufactured by Tokyo Ohka Kogyo Co., Ltd.
- the wafer was taken out and immersed in 45% by mass of hydrofluoric acid for 5 minutes to peel off the resin composition film from the wafer.
- This film was cut into strips having a width of 1 cm and a length of 9 cm, and using Tensilon RTM-100 (manufactured by Orientec Co., Ltd.) at a room temperature of 23.0 ° C. and a humidity of 45.0% RH, a tensile rate of 50 mm /
- the sample was pulled in minutes and the elongation at break was measured. The measurement was performed on 10 strips per specimen, and the average value of the top 5 points was obtained from the results.
- the elongation at break value is very good when the elongation at break is 90% or more (A), good when 70% or more and less than 90% (B), 40% or more and less than 70% Things were acceptable (C), and less than 40% were insufficient (D).
- the diamines (A-1), (A-2), (A-3), HFHA, and acid A used in the synthesis examples are as follows.
- Examples 1 to 8 Comparative Examples 1 to 3
- a varnish was prepared by adding 2.0 g of a photosensitive compound, 3.0 g of a thermal crosslinking agent, and 20 g of ⁇ -butyrolactone as a solvent to 10 g of the resins (I) to (XI).
- the photosensitive compounds and thermal crosslinking agents used in the examples are as follows.
- Table 1 shows the raw materials and blending of resins in each Example and Comparative Example, and Table 2 shows the evaluation results of the obtained resin compositions.
- the present invention can be preferably used for applications of electronic components such as semiconductor devices and multilayer wiring boards, and organic EL display devices.
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Abstract
Description
[1]一般式(1)で表される、ジアミン化合物。
p、qはそれぞれ独立に0~3の範囲内の整数である。)
[2]一般式(1)で表され、前記一般式(1)におけるR1、R2がそれぞれ独立に一般式(2)または一般式(3)で表される2価の脂肪族基である、[1]に記載のジアミン化合物。
p、qはそれぞれ独立に0~3の範囲内の整数である。)
[3]一般式(1)で表され、前記一般式(1)におけるR3が式(4)で表される二価の有機基であり、前記一般式(1)におけるR4が式(5)で表される二価の有機基である、[1]または[2]に記載のジアミン化合物。
p、qはそれぞれ独立に0~3の範囲内の整数である。)
[4][1]~[3]のいずれかに記載のジアミン化合物に由来する構造を有する耐熱性樹脂。
[5]ポリイミド、ポリアミド、ポリベンゾオキサゾール、ポリベンゾイミダゾール、ポリベンゾチアゾール、それらの前駆体、およびそれらの共重合体、から選ばれる少なくとも1種類を含む、[4]に記載の耐熱性樹脂。
[6][4]または[5]に記載の耐熱性樹脂と、(b)感光性化合物および(c)溶剤を含有することを特徴とする樹脂組成物。
[7]さらに、(d)アルコキシメチル基およびメチロール基のうち少なくともいずれか1つの基を2つ以上有する化合物を含有する、[6]に記載の樹脂組成物。
[8][6]または[7]に記載の樹脂組成物から形成された樹脂シート。
[9][6]または[7]に記載の樹脂組成物を硬化した硬化膜。
[10][8]に記載の樹脂シートを硬化した硬化膜。
[11][6]または[7]に記載の樹脂組成物を基板上に塗布し、または[8]に記載の樹脂シートを基板上にラミネートし、乾燥して樹脂膜を形成する工程と、
マスクを介して露光する工程と、
照射部をアルカリ溶液で溶出または除去して現像する工程と、
および現像後の樹脂膜を加熱処理する工程を含む、硬化膜のレリーフパターンの製造方法。
[12]前記樹脂組成物を基板上に塗布し、乾燥して樹脂膜を形成する工程が、スリットノズルを用いて基板上に塗布する工程を含む、[11]に記載の硬化膜のレリーフパターンの製造方法。
[13][9]または[10]に記載の硬化膜が、パターン化されまたはされないで、駆動回路上の平坦化層および第1電極上の絶縁層のいずれかまたは両方に配置された有機EL表示装置。
[14][9]または[10]に記載の硬化膜が、パターン化されまたはされないで、再配線間の層間絶縁膜として配置された、電子部品または半導体装置。
[15]前記再配線が銅金属配線であり、前記銅金属配線の幅と隣り合う配線同士の間隔が5μm以下である、[14]に記載の電子部品または半導体装置。
[16][9]または[10]に記載の硬化膜が、パターン化されまたはされないで、シリコンチップが配置された封止樹脂基板上に、再配線間の層間絶縁膜として配置された、電子部品または半導体装置。
[17] 前記再配線が銅金属配線であって、更にバンプを介して半導体チップと銅金属配線とを接続している[14]~[16]の何れかに記載の半導体電子部品または半導体装置。
[18]再配線層が、半導体チップに近づくにつれ、金属配線の幅と隣り合う配線同士の間隔が狭くなる[14]~[17]の何れかに記載の半導体電子部品または半導体装置。
[19]再配線間に配置された層間絶縁膜の厚みが、半導体チップに対して近づくにつれ、薄くなる[14]~[18]の何れかに記載の半導体電子部品または半導体装置。
[20][9]または[10]に記載の硬化膜を、仮貼り材料が配置された支持基板上に再配線間の層間絶縁膜として配置する工程と、
その上にシリコンチップと封止樹脂を配置する工程と、
その後、仮貼り材料が配置された支持基板と再配線を剥離する工程を含む、
電子部品または半導体装置の製造方法。
本発明は上記一般式(1)で表されるジアミン化合物である。一般式(1)で表される、ジアミン化合物において、R1、R2は2価の脂肪族基を示す。
R3~R6、Aは芳香族基を有する有機基である場合、水酸基を含み、芳香族環上の水素の一部または全部が水酸基で置換されていても差し支えない。p、qはそれぞれ独立に0~3の範囲内の整数である。
柔軟性の観点から、R11、R12は、水素、または炭素数1~2のアルキル基であることが好ましい。
ここで、式(4)の酸素はR1の側に、式(5)の酸素はR2の側に好ましく結合する。
一般式(1)で表されるジアミン化合物は、公知のジアミン化合物の製造方法に倣って製造することができる。特に限定はされないが、下記方法をとることができる。
p、qはそれぞれ独立に0~3の範囲内の整数である。)
R3が式(4)で表される二価の有機基であり、前記一般式(1)におけるR4が式(5)で表される場合については、以下の方法により製造することが好ましい。
p、qは0~3の範囲内の整数である。)
反応溶媒としては、例えばメチルイソブチルケトン、ジイソブチルケトン、シクロヘキサノン、メチルエチルケトン、アセトンなどのケトン類、酢酸エチル、酢酸ブチル、酢酸イソブチルなどのエステル類、テトラヒドロフラン、ジメトキシエタン、ジエトキシエタン、ジブチルエーテル、ジエチレングリコールジメチルエーテルなどのエーテル類を挙げることができる。このうち溶解性と汎用性の点から、アセトンを使用することがより好ましい。これらは単独でも2種類以上を混合して使用することもできる。反応溶媒の使用量はジアミン化合物100質量部に対して、溶解性の点から、100~5000質量部の範囲で使用することが好ましい。
本発明の耐熱性樹脂は、一般式(1)に記載のジアミン化合物に由来する構造を有する、耐熱性樹脂であり、また耐熱性樹脂の前駆体であってもよい。
上記一般式(6)中、X1、X4は炭素数2以上の2価~6価の有機基を示し、酸の構造成分を表している。X1、X4は、テレフタル酸、イソフタル酸、ジフェニルエーテルジカルボン酸、ナフタレンジカルボン酸、ビス(カルボキシフェニル)プロパンなどの芳香族ジカルボン酸、シクロブタンジカルボン酸、シクロヘキサンジカルボン酸、マロン酸、ジメチルマロン酸、エチルマロン酸、イソプロピルマロン酸、ジ-n-ブチルマロン酸、スクシン酸、テトラフルオロスクシン酸、メチルスクシン酸、2,2-ジメチルスクシン酸、2,3-ジメチルスクシン酸、ジメチルメチルスクシン酸、グルタル酸、ヘキサフルオログルタル酸、2-メチルグルタル酸、3-メチルグルタル酸、2,2-ジメチルグルタル酸、3,3-ジメチルグルタル酸、3-エチル-3-メチルグルタル酸、アジピン酸、オクタフルオロアジピン酸、3-メチルアジピン酸、オクタフルオロアジピン酸、ピメリン酸、2,2,6,6-テトラメチルピメリン酸、スベリン酸、ドデカフルオロスベリン酸、アゼライン酸、セバシン酸、ヘキサデカフルオロセバシン酸、1,9-ノナン二酸、ドデカン二酸、トリデカン二酸、テトラデカン二酸、ペンタデカン二酸、ヘキサデカン二酸、ヘプタデカン二酸、オクタデカン二酸、ノナデカン二酸、エイコサン二酸、ヘンエイコサン二酸、ドコサン二酸、トリコサン二酸、テトラコサン二酸、ペンタコサン二酸、ヘキサコサン二酸、ヘプタコサン二酸、オクタコサン二酸、ノナコサン二酸、トリアコンタン二酸、ヘントリアコンタン二酸、ドトリアコンタン二酸、ジグリコール酸などの脂肪族ジカルボン酸や、さらに下記一般式で示されるジカルボン酸や、トリメリット酸、トリメシン酸などのトリカルボン酸、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換されているものや、―S―、―SO―、―SO2―、―NH―、―NCH3―、―N(CH2CH3)―、―N(CH2CH2CH3)―、―N(CH(CH3)2)―、―COO―、―CONH―、―OCONH―、または―NHCONH―などの結合を含んでいるものを由来とする構造である。
この中でも、X1、X4が、芳香族を有するジカルボン酸を由来とする構造は、熱硬化時に閉環が起こりにくいため、膜収縮による応力上昇を抑え、密着性を高められるため好ましい。
本発明において、肪族基を有するジアミンは、アルキレン基、およびアルキルエーテル基から選ばれる少なくとも1つを有する有機基であって、これらは、主鎖が直鎖となっている非環化構造である方が、柔軟性および伸縮性が得られ、硬化膜としたときに低応力化、高伸度化を達成できるため好ましい
アルキルエーテルの中でも、テトラメチレンエーテル基は耐熱性に優れるため、信頼性評価後の金属密着性を付与できるため好ましい。例としては、RT-1000、HE-1000、HT-1100、HT-1700、(以上商品名、HUNTSMAN(株)製)などがあげられるが、これに限定されない。
ジカルボキシフェニル)エーテル二無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、9,9-ビス(3,4-ジカルボキシフェニル)フルオレン酸二無水物、9,9-ビス{4-(3,4-ジカルボキシフェノキシ)フェニル}フルオレン酸二無水物、ブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、1,3,3a,4,5,9b-ヘキサヒドロ-5(テトラヒドロ-2,5-ジオキソ-3-フラニル)ナフト[1,2-c]フラン-1,3-ジオンが好ましい。これらは単独でまたは2種以上を組み合わせて使用される。
上記構造の中でも、耐熱性と伸度向上を両立する点から、nは1~2、mは3~7であることが好ましい。
次に、本発明の樹脂組成物を用いた、インダクタ装置のコイル部品への応用例3について図面を用いて説明する。図4本発明の絶縁膜を有するコイル部品の断面図である。図3に示すように、基板12には絶縁膜13、その上にパターンとして絶縁膜14が形成される。基板12としてはフェライト等が用いられる。本発明の樹脂組成物は絶縁膜13と絶縁膜14のどちらに使用してもよい。このパターンの開口部に金属(Cr、Ti等)膜15が形成され、この上に金属配線(Ag、Cu等)16がめっき形成される。金属配線16(Ag、Cu等)はスパイラル上に形成されている。13~16の工程を複数回繰り返し、積層させることでコイルとしての機能を持たせることができる。最後に金属配線16(Ag、Cu等)は金属配線17(Ag、Cu等)によって電極18に接続され、封止樹脂19により封止される。
本発明の樹脂組成物は有機EL表示装置にも好適に用いられる。該有機EL表示装置は、基板上に、駆動回路、平坦化層、第1電極、絶縁層、発光層および第2電極を有し、平坦化層および/または絶縁層が本発明の硬化膜からなる。有機EL発光材料は水分による劣化を受けやすく、発光画素の面積に対する発光部の面積率低下など、悪影響を与える場合があるが、本発明の硬化膜は吸水率が低いため、安定した駆動および発光特性が得られる。アクティブマトリックス型の表示装置を例に挙げると、ガラスや各種プラスチックなどの基板上に、TFTと、TFTの側方部に位置しTFTと接続された配線とを有し、その上に凹凸を覆うようにして平坦化層を有し、さらに平坦化層上に表示素子が設けられている。表示素子と配線とは、平坦化層に形成されたコンタクトホールを介して接続される。
かかる絶縁層29、平坦化層30および/または絶縁層34は、前述の通り本発明の樹脂組成物または樹脂シートからなる感光性樹脂膜を形成する工程、前記感光性樹脂膜を露光する工程、露光した感光性樹脂膜を現像する工程および現像した感光性樹脂膜を加熱処理する工程により形成することができる。これらの工程を有する製造方法より、有機EL表示装置を得ることができる。
耐熱性樹脂の分子量は、GPC(ゲルパーミエーションクロマトグラフィー)装置Waters2690-996(日本ウォーターズ(株)製)を用い、展開溶媒をN-メチル-2-ピロリドン(以降NMPと呼ぶ)として測定し、ポリスチレン換算で重量平均分子量(Mw)を計算した。
閉環率の算出は、ワニスをシリコンウエハ上にスピンコートして、120℃で3分間乾燥し、膜厚5μmの塗布膜を得た。さらにこの塗布膜を180℃で10分、または300~350℃で10分加熱して硬化膜(180℃で加熱した硬化膜(A)、300~350℃で加熱した硬化膜(B))を得た。これらの硬化膜(A)、および硬化膜(B)の赤外吸収スペクトルを測定し、1050cm-1付近のC-O伸縮振動に起因するピークの吸光度を求めた。硬化膜(B)のポリヒドロキシアミドの閉環率を100%として、硬化膜(A)の閉環率を算出した。
ワニスを6インチのシリコンウエハ上に塗布した。塗布現像装置Mark-7を用い、120℃で3分間プリベークした後の膜厚が11μmとなるようにした。塗布方法はスピンコート法を用いた。プリベークした後、イナートオーブンCLH-21CD-S(光洋サーモシステム(株)製)を用いて、酸素濃度20ppm以下で3.5℃/分で180℃まで昇温し、180℃で1時間加熱処理を行なった。温度が50℃以下になったところでウエハを取り出し、膜厚を測定後、60℃でレジスト剥離液ST-120(東京応化工業製)の溶剤にそれぞれウエハを30分浸漬した。溶剤から取り出したウエハを純水で洗浄した後、再度膜厚を測定し、その変化率の絶対値が20%を超えるものや硬化膜が剥離したものを不十分(C)、20%以内であって10%を超えるものを可(B)、10%以内であるものをより良好(A)とした。
ワニスを8インチのシリコンウエハ上に、120℃で3分間のプリベーク後の膜厚が11μmとなるように塗布現像装置ACT-8を用いてスピンコート法で塗布およびプリベークした後、イナートオーブンCLH-21CD-S(光洋サーモシステム(株)製)を用いて、酸素濃度20ppm以下で3.5℃/分で190℃まで昇温し、180℃で1時間加熱処理を行なった。温度が50℃以下になったところでウエハを取り出し、45質量%のフッ化水素酸に5分間浸漬することで、ウエハより樹脂組成物の膜を剥がした。この膜を幅1cm、長さ9cmの短冊状に切断し、テンシロンRTM-100((株)オリエンテック製)を用いて、室温23.0℃、湿度45.0%RH下で引張速度50mm/分で引っ張り、破断点伸度の測定を行なった。測定は1検体につき10枚の短冊について行ない、結果から上位5点の平均値を求めた。破断点伸度の値が、破断点伸度の値が、90%以上のものを非常に良好(A)、70%以上90%未満のものを良好(B)、40%以上70%未満のものを可(C)、40%未満のものを不十分(D)とした。
ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05モル)をアセトン100ml、プロピレンオキシド17.4g(0.3モル)に溶解させ、-15℃に冷却した。ここに2-(4―ニトロフェノキシ)アセチルクロライド20.41g(0.11モル)をアセトン100mlに溶解させた溶液を滴下した。滴下終了後、-15℃で4時間反応させ、その後室温に戻した。溶液をロータリーエバポレーターで濃縮し、得られた固体をテトラヒドロフランとエタノールの溶液で再結晶した。
FT-IR/cm-1:3350~3005、2938、2875、1650、1604,1550、1501、1420、1299、1130、820。
1H-NMR(DMSO):δ ( p p m ):10.3(s、2H)、9.2(s、2H)、8.0(s、2H)、6.5-6.9(m、12H)、4.6(s、4H)、4.2(s、4H)。
ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05モル)をアセトン100ml、プロピレンオキシド17.4g(0.3モル)に溶解させ、-15℃に冷却した。ここに6-(4―ニトロフェノキシ)ヘキサノイルクロライド26.6g(0.11モル)をアセトン100mlに溶解させた溶液を滴下した。滴下終了後、-15℃で4時間反応させ、その後室温に戻した。溶液をロータリーエバポレーターで濃縮し、得られた固体をテトラヒドロフランとエタノールの溶液で再結晶した。
FT-IR/cm-1:3350~3005、2940、2880、1650、1604,1550、1501、1420、1299、1130、820。
1H-NMR(DMSO):δ ( p p m ):10.3(s、2H)、9.2(s、2H)、8.0(s、2H)、6.5-6.9(m、12H)、4.6(s、4H)、3.8(t、4H)、2.5(t、4H)、1.4-1.7(m、12H)。
ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05モル)をアセトン100ml、プロピレンオキシド17.4g(0.3モル)に溶解させ、-15℃に冷却した。ここに3-(1、3―ジオキソイソインドリンー2-イル)プロパノイルクロライド26.1g(0.11モル)をアセトン100mlに溶解させた溶液を滴下した。滴下終了後、-15℃で4時間反応させ、その後室温に戻した。溶液をロータリーエバポレーターで濃縮し、得られた固体をテトラヒドロフランとエタノールの溶液で再結晶した。
FT-IR/cm-1:3350~3005、2943、2900、1650、1604,1550、1501、1420、1299、1130、820。
1H-NMR(DMSO):δ ( p p m ):10.3(s、2H)、9.2(s、2H)、8.0(s、2H)、6.5-6.9(m、4H)、4.6(s、4H)、4.0(m、4H)、2.5(t、4H)。
乾燥窒素気流下、合成例1で得られた(A-1)33.21g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体の(I)を得た。重量平均分子量は32,300であった。
乾燥窒素気流下、合成例2で得られた(A-2)34.63g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体の(II)を得た。重量平均分子量は35,300であった。
乾燥窒素気流下、合成例3で得られた(A-3)25.41g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体の(III)を得た。重量平均分子量は29,400であった。
乾燥窒素気流下、合成例2で得られた(A-2)34.63g(0.05モル)、をNMP100gに溶解させた。ここに、酸A(13.51g、0.045モル)、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)をNMP25gとともに加えて、85℃で3時間反応させた。反応終了後、室温まで冷却し、酢酸(13.20g、0.25モル)をNMP25gとともに加えて、室温で1時間撹拌した。撹拌終了後、溶液を水1.5Lに投入して白色沈殿を得た。この沈殿を濾過で集めて、水で3回洗浄した後、50℃の通風乾燥機で3日間乾燥し、ポリヒドロキシアミドの(IV)を得た。重量平均分子量は37,400であった。
乾燥窒素気流下、合成例2で得られた(A-2)34.63g(0.05モル)、をNMP100gに溶解させた。ここに、酸A(6.76g、0.023モル)、ODPA6.98g(0.023モル)、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)をNMP25gとともに加えて、85℃で3時間反応させた。反応終了後、室温まで冷却し、酢酸(13.20g、0.25モル)をNMP25gとともに加えて、室温で1時間撹拌した。撹拌終了後、溶液を水1.5Lに投入して白色沈殿を得た。この沈殿を濾過で集めて、水で3回洗浄した後、50℃の通風乾燥機で3日間乾燥し、ポリヒドロキシアミドーポリイミド共重合体(V)を得た。重量平均分子量は35,500であった。
乾燥窒素気流下、合成例2で得られた(A-2)17.32g(0.025モル)、BAHF9.16g(0.025モル)をNMP100gに溶解させた。ここに、酸A(6.76g、0.023モル)、ODPA6.98g(0.023モル)、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)をNMP25gとともに加えて、85℃で3時間反応させた。反応終了後、室温まで冷却し、酢酸(13.20g、0.25モル)をNMP25gとともに加えて、室温で1時間撹拌した。撹拌終了後、溶液を水1.5Lに投入して白色沈殿を得た。この沈殿を濾過で集めて、水で3回洗浄した後、50℃の通風乾燥機で3日間乾燥し、ポリヒドロキシアミドーポリイミド共重合体(VI)を得た。重量平均分子量は37,200は.1.9であった。
乾燥窒素気流下、合成例2で得られた(A-2)17.32g(0.025モル)、BAHF7.33g(0.020モル)、RT-1000(5.0g、0.005モル)をNMP100gに溶解させた。ここに、酸A(6.76g、0.023モル)、ODPA6.98g(0.023モル)、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)をNMP25gとともに加えて、85℃で3時間反応させた。反応終了後、室温まで冷却し、酢酸(13.20g、0.25モル)をNMP25gとともに加えて、室温で1時間撹拌した。撹拌終了後、溶液を水1.5Lに投入して白色沈殿を得た。この沈殿を濾過で集めて、水で3回洗浄した後、50℃の通風乾燥機で3日間乾燥し、ポリヒドロキシアミドーポリイミド共重合体(VII)を得た。重量平均分子量は39,200であった。
乾燥窒素気流下、BAHF18.31g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体(VIII)を得た。重量平均分子量は29,500であった。
乾燥窒素気流下、HFHA30.23g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体(IX)を得た。重量平均分子量は29,500であった。
乾燥窒素気流下、BAHF18.31g(0.05モル)をNMP100gに溶解させた。ここに、ドデカン二酸ジクロリド(酸B)14.67g(0.045モル)をNMP25gとともに加えて、85℃で3時間反応させた。反応終了後、室温まで冷却し、酢酸(13.20g、0.25モル)をNMP25gとともに加えて、室温で1時間撹拌した。撹拌終了後、溶液を水1.5Lに投入して白色沈殿を得た。この沈殿を濾過で集めて、水で3回洗浄した後、50℃の通風乾燥機で3日間乾燥し、ポリヒドロキシアミド(X)を得た。重量平均分子量は31,400であった。
ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン18.3g(0.05モル)をアセトン100ml、プロピレンオキシド17.4g(0.3モル)に溶解させ、-15℃に冷却した。ここに3-(2-(2-(2-(1,3-ジオキソイソインドリン-2-イル)エトキシ)エトキシ)エトキシ)プロピルクロライド 40.6g(0.11モル)をアセトン100mlに溶解させた溶液を滴下した。滴下終了後、-15℃で4時間反応させ、その後室温に戻した。溶液をロータリーエバポレーターで濃縮し、得られた固体をテトラヒドロフランとエタノールの溶液で再結晶した。
FT-IR/cm-1:3350~3005、2943、2900、1650、1604,1550、1501、1420、1299、1130、820。
1H-NMR(DMSO): δ ( p p m ):10.3(s、2H)、9.2(s、2H)、8.0(s、2H)、6.5-6.9(m、4H)、4.6(s、4H)、4.3-4.5(4.0(m、24H)、2.3(t、4H)。
乾燥窒素気流下、合成例14で得られた(A-4)38.61g(0.05モル)をN-メチル-2-ピロリドン(NMP)80gに溶解させた。ここに3,3’,4,4’-ジフェニルエーテルテトラカルボン酸無水物(ODPA)13.95g(0.045モル)をNMP10gとともに加えて、40℃で1時間反応させた。その後、末端封止剤として、5-ノルボルネン-2,3-ジカルボン酸無水物(NA)1.64g(0.01モル)を加え、さらに40℃で1時間反応させた。その後、N,N’-ジメチルホルムアミドジメチルアセタール12.50g(0.11モル)をNMP15gで希釈した溶液を10分かけて滴下した。滴下後、40℃で2時間撹拌した。反応終了後、溶液を水2Lに投入して、ポリマー固体の沈殿をろ過で集めた。ポリマー固体を50℃の真空乾燥機で72時間乾燥しポリイミド前駆体の(III)を得た。重量平均分子量は45,300であった。
上記樹脂(I)~(XI)10gに対し、感光性化合物2.0g、熱架橋剤3.0g、溶剤としてγ-ブチロラクトンを20g加えてワニスを作製した。
2 Alパッド
3 パッシベーション膜
4 絶縁膜
5 金属(Cr、Ti等)膜
6 金属配線(Al、Cu等)
7 絶縁膜
8 バリアメタル
9 スクライブライン
10 ハンダバンプ
11 封止樹脂
12 基板
13 絶縁膜
14 絶縁膜
15 金属(Cr、Ti等)膜
16 金属配線(Ag、Cu等)
17 金属配線(Ag、Cu等)
18 電極
19 封止樹脂
20 支持基板(ガラス基板、シリコンウェハ)
21 電極バッド(Cu)
22 絶縁膜
23 金属配線(Cu)
24 Cuポスト
25 ハンダバンプ
26 半導体チップ
27 TFT(薄膜トランジスタ)
28 配線
29 TFT絶縁層
30 平坦化層
31 ITO(透明電極)
32 基板
33 コンタクトホール
34 絶縁層
Claims (20)
- 一般式(1)で表される、ジアミン化合物。
R3、R4は、2価の脂肪族基、脂環基、芳香族基、
芳香族基が-O-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基、
複数ある芳香族基が単結合で結合された2価の有機基、
または複数ある芳香族基が-O-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基を示す。
R5、R6は、水素原子、ハロゲン原子、水酸基、ニトロ基、シアノ基、脂肪族基、芳香族基、アセチル基、カルボキシル基、エステル基、アミド基、イミド基、ウレア基のいずれかを有する有機基を表す。
Aは、2価の脂肪族基、脂環式基、芳香族基、複数ある芳香族基が単結合で結合された2価の有機基、
または複数ある芳香族基が-O-、-S-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基を示す。
p、qは0~3の範囲内の整数である。) - 一般式(1)で表され、前記一般式(1)におけるR1、R2がそれぞれ独立に一般式(2)または一般式(3)で表される2価の脂肪族基である、請求項1に記載のジアミン化合物。
芳香族基が-O-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基、
複数ある芳香族基が単結合で結合された2価の有機基、
または複数ある芳香族基が-O-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基を示す。
R5、R6は、水素原子、ハロゲン原子、水酸基、ニトロ基、シアノ基、脂肪族基、芳香族基、アセチル基、カルボキシル基、エステル基、アミド基、イミド基、ウレア基のいずれかを有する有機基を表す。
Aは、2価の脂肪族基、脂環式基、芳香族基、複数ある芳香族基が単結合で結合された2価の有機基、
または複数ある芳香族基が-O-、-S-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基を示す。
p、qは0~3の範囲内の整数である。)
- 一般式(1)で表され、前記一般式(1)におけるR3が式(4)で表される二価の有機基であり、前記一般式(1)におけるR4が式(5)で表される二価の有機基である、請求項1または2に記載のジアミン化合物。
R5、R6は、水素原子、ハロゲン原子、水酸基、ニトロ基、シアノ基、脂肪族基、芳香族基、アセチル基、カルボキシル基、エステル基、アミド基、イミド基、ウレア基のいずれかを有する有機基を表す。
Aは、2価の脂肪族基、脂環式基、芳香族基、複数ある芳香族基が単結合で結合された2価の有機基、
または複数ある芳香族基が-O-、-S-、-CO-、-SO2-、-CH2-、-C(CH3)2-、もしくは-C(CF3)2-:(ここでFはフッ素)で結合された2価の有機基である場合、を示す。
p、qは0~3の範囲内の整数である。)
- 請求項1~3のいずれかに記載のジアミン化合物に由来する構造を有する耐熱性樹脂。
- ポリイミド、ポリアミド、ポリベンゾオキサゾール、ポリベンゾイミダゾール、ポリベンゾチアゾール、それらの前駆体、およびそれらの共重合体、からなる群から選ばれる少なくとも1種類を含む、請求項4に記載の耐熱性樹脂。
- 請求項4または5に記載の耐熱性樹脂と、(b)感光性化合物および(c)溶剤を含有する樹脂組成物。
- さらに、(d)アルコキシメチル基およびメチロール基のうち少なくともいずれか1つの基を2つ以上有する化合物を含有する、請求項6に記載の樹脂組成物。
- 請求項6または7に記載の樹脂組成物から形成された樹脂シート。
- 請求項6または7に記載の樹脂組成物を硬化した硬化膜。
- 請求項8に記載の樹脂シートを硬化した硬化膜。
- 請求項6または7に記載の樹脂組成物を基板上に塗布し、または、請求項8に記載の樹脂シートを基板上にラミネートし、乾燥して樹脂膜を形成する工程と、
マスクを介して露光する工程と、
照射部をアルカリ溶液で溶出または除去して現像する工程と、
現像後の樹脂膜を加熱処理する工程とを含む、硬化膜のレリーフパターンの製造方法。 - 前記樹脂組成物を基板上に塗布し、乾燥して樹脂膜を形成する工程が、スリットノズルを用いて基板上に塗布する工程を含む、請求項11に記載の硬化膜のレリーフパターンの製造方法。
- 請求項9または10に記載の硬化膜が、パターン化されまたはされないで、駆動回路上の平坦化層および第1電極上の絶縁層のいずれかまたは両方に配置された有機EL表示装置。
- 請求項9または10に記載の硬化膜が、パターン化されまたはされないで、再配線間の層間絶縁膜として配置された、電子部品または半導体装置。
- 前記再配線が銅金属配線であり、前記銅金属配線の幅と隣り合う配線同士の間隔が5μm以下である、請求項14に記載の電子部品または半導体装置。
- 請求項9または10に記載の硬化膜が、パターン化されまたはされないで、シリコンチップが配置された封止樹脂基板上に、再配線間の層間絶縁膜として配置された、電子部品または半導体装置。
- 前記再配線が銅金属配線であって、更にバンプを介して半導体チップと銅金属配線とを接続している請求項14~16の何れかに記載の半導体電子部品または半導体装置。
- 再配線層が、半導体チップに近づくにつれ、金属配線の幅と隣り合う配線同士の間隔が狭くなる請求項14~17の何れかに記載の半導体電子部品または半導体装置。
- 再配線間に配置された層間絶縁膜の厚みが、半導体チップに対して近づくにつれ、薄くなる請求項14~18の何れかに記載の半導体電子部品または半導体装置。
- 請求項9または10に記載の硬化膜を、仮貼り材料が配置された支持基板上に再配線間の層間絶縁膜として配置する工程と、
その上にシリコンチップと封止樹脂を配置する工程と、
その後、仮貼り材料が配置された支持基板と再配線を剥離する工程を含む、
電子部品または半導体装置の製造方法。
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CN109061155A (zh) * | 2018-09-21 | 2018-12-21 | 中国烟草总公司郑州烟草研究院 | 一种检测甲霜灵的试纸条及其制备方法和应用 |
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US11333975B2 (en) | 2020-04-14 | 2022-05-17 | International Business Machines Corporation | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component |
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JP7073717B2 (ja) | 2022-05-24 |
CN109906217B (zh) | 2022-05-10 |
TW201829372A (zh) | 2018-08-16 |
CN109906217A (zh) | 2019-06-18 |
TWI726165B (zh) | 2021-05-01 |
KR102460973B1 (ko) | 2022-11-02 |
US20190256655A1 (en) | 2019-08-22 |
US11802181B2 (en) | 2023-10-31 |
JPWO2018087990A1 (ja) | 2019-10-03 |
SG11201903455QA (en) | 2019-05-30 |
KR20190083329A (ko) | 2019-07-11 |
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