WO2015005220A1 - 導電性硬化物の製造方法及び導電性硬化物並びにパルス光硬化性組成物の硬化方法及びパルス光硬化性組成物 - Google Patents
導電性硬化物の製造方法及び導電性硬化物並びにパルス光硬化性組成物の硬化方法及びパルス光硬化性組成物 Download PDFInfo
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/001—Conductive additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2312/00—Crosslinking
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0215—Metallic fillers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
Definitions
- the present invention relates to a method for producing a conductive cured product that is cured by irradiation with pulsed light, a method for curing a pulsed photocurable composition, and a pulsed photocurable composition.
- the substrate as a base material is made of a polymer material having a relatively low melting point, such as PET, deformation is caused when the substrate is heated and cured. There was a problem that it would occur.
- a conductive curable composition of a type that is moisture-cured at room temperature it is not necessary to cure by heating, so even if it is used for a substrate using a heat-sensitive material such as PET, the substrate Although deformation does not occur, since the time required for curing is long, there is also a problem that the line tact (process working time) becomes long.
- the present invention relates to a method for producing a conductive cured product that can be used for a heat-sensitive substrate while achieving rapid curing, a conductive cured product, a curing method for a pulsed photocurable composition, and a pulsed photocurable composition.
- the purpose is to provide.
- the method for producing a conductive cured product of the present invention includes (A) one or more selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture-curable urethane-based organic polymer.
- a conductive cured product is formed by irradiating pulsed light.
- a composition that is cured by irradiation with pulsed light is referred to as a pulsed light curable composition.
- moisture curing is promoted by pulsed light irradiation, and fast curability is exhibited.
- fast curability means curing within 2 minutes, more desirably within 1 minute.
- moisture curing is accelerated by irradiation with pulsed light, and the composition is cured within 2 minutes, more preferably within 1 minute. Therefore, it can be used for a base material (PET or the like) that is sensitive to heat while achieving fast curability. That is, by irradiating with pulsed light, light having high energy is irradiated intermittently, so that there is no fear that the substrate has heat, and moisture curing is promoted.
- the pulse light curable composition does not substantially contain a photopolymerization initiator (10 ppm or less) and is cured by pulse light irradiation. During transportation and storage, it does not harden even when exposed to ordinary light such as sunlight, but it exhibits rapid curability for the first time by irradiating with pulsed light and hardens. Therefore, there is no need to transport or store the curable composition in the dark, and it is not necessary to avoid exposure to normal light such as sunlight, so stability and workability are good. There is an advantage. Furthermore, in the present invention, moisture curing is promoted by pulsed light irradiation, so unlike an ultraviolet curable conductive curable composition, even when applied to a thick film, it cures to the deep part and has excellent deep part curability. There is also an advantage.
- the conductive cured product is formed on a substrate.
- the curing method of the pulse light curable composition of the present invention includes (A) one or more moisture curable resins selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture curable urethane organic polymer, A composition containing (B) a conductive filler and (C) a condensation catalyst is cured by irradiation with pulsed light.
- the pulse photocurable composition of the present invention comprises (A) one or more moisture curable resins selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture curable urethane-based organic polymer, (B) It contains an electrically conductive filler and (C) a condensation catalyst.
- the conductive cured product of the present invention is manufactured by the method for manufacturing a conductive cured product.
- the electronic circuit of the present invention is characterized by using the conductive cured product. It is preferable that the base material and the electronic component are bonded by the conductive cured product. Alternatively, it is preferable that an electronic circuit is formed on the substrate by coating or printing with the conductive cured product.
- the electronic circuit of the present invention is manufactured by adhering an electronic component to the base material on which the circuit is formed with the conductive cured product. Or it manufactures by forming an electronic circuit in a base material by application
- the substrate on which the circuit is formed can be suitably used even if it is a heat-sensitive substrate such as PET.
- cured material which can be used also to a heat-sensitive base material which achieves rapid curability, an electroconductive hardened material, the hardening method of a pulse photocurable composition, and pulse photocurability
- the composition can be provided.
- the method for producing a conductive cured product of the present invention comprises (A) one or more moisture curable resins selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture curable urethane organic polymer, (B The conductive cured product is formed by irradiating a composition containing the conductive filler and (C) the condensation catalyst with pulsed light.
- the curing method of the pulse light curable composition of the present invention includes (A) one or more moisture curable resins selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture curable urethane organic polymer,
- the composition containing (B) a conductive filler and (C) a condensation catalyst is cured by irradiating it with pulsed light.
- the pulse photocurable composition of the present invention comprises (A) one or more moisture curable resins selected from the group consisting of a crosslinkable silicon group-containing organic polymer and a moisture curable urethane-based organic polymer, (B) A conductive filler and (C) a condensation catalyst are included.
- crosslinkable silicon group-containing organic polymer of the moisture curable resin (A) used in the pulse light curable composition according to the present invention it has a crosslinkable silicon group, and the main chain skeleton is a polyoxyallequin series.
- An organic polymer that is at least one selected from the group consisting of a polymer, a saturated hydrocarbon polymer, a (meth) acrylic acid ester polymer, and a diorganopolysiloxane polymer is used.
- the crosslinkable silicon group of the organic polymer is a group having a hydroxyl group or a hydrolyzable group bonded to a silicon atom and capable of crosslinking by forming a siloxane bond.
- a representative example is a group represented by the following general formula (1).
- R 1 is an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, or R 1 3 SiO— (R 1 is the same as above) represents a triorganosiloxy group, and when two or more R 1 are present, they may be the same or different.
- X represents a hydroxyl group or a hydrolyzable group, and when two or more X exist, they may be the same or different.
- a represents 0, 1, 2, or 3
- b represents 0, 1, or 2, respectively.
- n represents an integer of 0 to 19. However, a + (sum of b) ⁇ 1 is satisfied.
- b in n following General formula (2) does not need to be the same.
- the hydrolyzable group or hydroxyl group can be bonded to one silicon atom in the range of 1 to 3, and a + (sum of b) is preferably in the range of 1 to 5.
- a + (sum of b) is preferably in the range of 1 to 5.
- two or more hydrolyzable groups or hydroxyl groups are bonded to the crosslinkable silicon group, they may be the same or different.
- the number of silicon atoms forming the crosslinkable silicon group may be one or two or more, but in the case of silicon atoms linked by a siloxane bond or the like, there may be about 20 silicon atoms.
- crosslinkable silicon group a crosslinkable silicon group represented by the following general formula (3) is preferable because it is easily available.
- R 1 , X, and a are the same as described above.
- the hydrolyzable group represented by X is not particularly limited as long as it is a conventionally known hydrolyzable group.
- Specific examples include a hydrogen atom, a halogen atom, an alkoxy group, an acyloxy group, a ketoximate group, an amino group, an amide group, an acid amide group, an aminooxy group, a mercapto group, and an alkenyloxy group.
- a hydrogen atom, an alkoxy group, an acyloxy group, a ketoximate group, an amino group, an amide group, an aminooxy group, a mercapto group, and an alkenyloxy group are preferable, and an alkoxy group, an amide group, and an aminooxy group are more preferable.
- An alkoxy group is particularly preferred from the viewpoint of mild hydrolysis and easy handling.
- the alkoxy groups those having a smaller number of carbon atoms have higher reactivity, and the reactivity increases as the number of carbon atoms increases in the order of methoxy group> ethoxy group> propoxy group.
- a methoxy group or an ethoxy group is usually used.
- a is preferably 2 or more in consideration of curability. Usually, when a is 3, the curing rate is higher than when a is 2.
- crosslinkable silicon group examples include trialkoxysilyl groups such as trimethoxysilyl group and triethoxysilyl group, dialkoxysilyl groups such as —Si (OR) 3 , methyldimethoxysilyl group, and methyldiethoxysilyl group.
- Group, —SiR 1 (OR) 2 is an alkyl group such as a methyl group or an ethyl group.
- crosslinkable silicon group may be used alone or in combination of two or more.
- the crosslinkable silicon group can be present in the main chain, the side chain, or both.
- the number of silicon atoms forming the crosslinkable silicon group is one or more, but in the case of silicon atoms linked by a siloxane bond or the like, it is preferably 20 or less.
- the organic polymer having a crosslinkable silicon group may be linear or branched, and its number average molecular weight is about 500 to 100,000 in terms of polystyrene in GPC, more preferably 1,000 to 50,000. Particularly preferred is 3,000 to 30,000. If the number average molecular weight is less than 500, the cured product tends to be disadvantageous in terms of elongation characteristics, and if it exceeds 100,000, the viscosity tends to be inconvenient because of high viscosity.
- the number of crosslinkable silicon groups contained in the organic polymer is not particularly limited. However, in order to obtain a rubber-like cured product having high strength, high elongation, and low elastic modulus, On average, there should be at least 1, preferably 1.1-5. If the number of crosslinkable silicon groups contained in the molecule is less than 1 on average, the curability becomes insufficient and it becomes difficult to exhibit good rubber elastic behavior.
- the crosslinkable silicon group may be at the end of the main chain of the organic polymer molecular chain, at the end of the side chain, or at both ends.
- the crosslinkable silicon group is only at the end of the main chain of the molecular chain, so that the strength and elongation are high. It becomes easy to obtain a rubber-like cured product exhibiting a low elastic modulus.
- the polyoxyarlequine polymer containing a crosslinkable silicon group used as the organic polymer is essentially a polymer having a repeating unit represented by the following general formula (4). -R 2 -O- (4)
- R 2 is a linear or branched alkylene group having 1 to 14 carbon atoms, carbon atoms 1 to 14, preferably 2 to 4, a linear or branched alkylene group Is preferred.
- repeating unit represented by the general formula (4) include, for example, -CH 2 O -, - CH 2 CH 2 O -, - CH 2 CH (CH 3) O -, - CH 2 CH (C 2 H 5) O -, - CH 2 C (CH 3) 2 O-, —CH 2 CH 2 CH 2 CH 2 O— Etc.
- the main chain skeleton of the polyoxyalkylene polymer may be composed of only one type of repeating unit, or may be composed of two or more types of repeating units.
- a method for synthesizing a polyoxyalkylene polymer for example, a polymerization method using an alkali catalyst such as KOH, for example, organic aluminum as disclosed in JP-A-61-197631, JP-A-61-215622, JP-A-61-215623
- KOH alkali catalyst
- organic aluminum for example, organic aluminum as disclosed in JP-A-61-197631, JP-A-61-215622, JP-A-61-215623
- a polymerization method using an organoaluminum-porphyrin complex catalyst obtained by reacting a compound with a porphyrin for example, a polymerization method using a double metal cyanide complex catalyst shown in JP-B-46-27250 and JP-B-59-15336
- a polyoxyalkylene system having a high molecular weight with a number average molecular weight of 6,000 or more and Mw / Mn of 1.6 or less and a narrow molecular weight distribution according to a polymerization method using an organic aluminum-porphyrin complex catalyst or a polymerization method using a double metal cyanide complex catalyst A polymer can be obtained.
- the main chain skeleton of the polyoxyalkylene polymer may contain other components such as a urethane bond component.
- a urethane bond component examples include aromatic polyisocyanates such as toluene (tolylene) diisocyanate, diphenylmethane diisocyanate, xylylene diisocyanate; aliphatic polyisocyanates such as isophorone diisocyanate and hexamethylene diisocyanate, and polyoxyalkylene heavy compounds having a hydroxyl group.
- lifted The thing obtained from reaction with coalescence can be mention
- the introduction of a crosslinkable silicon group into a polyoxyalkylene polymer can be performed on a polyoxyalkylene polymer having a functional group such as an unsaturated group, a hydroxyl group, an epoxy group or an isocyanate group in the molecule.
- the reaction can be carried out by reacting a compound having a reactive functional group and a crosslinkable silicon group (hereinafter referred to as a polymer reaction method).
- a hydrosilane or mercapto compound obtained by allowing a hydrosilane having a crosslinkable silicon group or a mercapto compound having a crosslinkable silicon group to act on an unsaturated group-containing polyoxyalkylene polymer to form a crosslinkable silicon group
- the method of obtaining the polyoxyalkylene type polymer which has this can be mention
- An unsaturated group-containing polyoxyalkylene polymer is obtained by reacting an organic polymer having a functional group such as a hydroxyl group with an organic compound having an active group and an unsaturated group that are reactive with the functional group, A polyoxyalkylene polymer containing can be obtained.
- polymer reaction method examples include a method of reacting a polyoxyalkylene polymer having a hydroxyl group at a terminal with a compound having an isocyanate group and a crosslinkable silicon group, or a polyoxyalkylene system having an isocyanate group at a terminal.
- examples thereof include a method of reacting a polymer with a compound having an active hydrogen group such as a hydroxyl group or an amino group and a crosslinkable silicon group.
- an isocyanate compound is used, a polyoxyalkylene polymer having a crosslinkable silicon group can be easily obtained.
- polyoxyalkylene polymer having a crosslinkable silicon group examples include JP-B Nos. 45-36319, 46-12154, JP-A Nos. 50-156599, 54-6096, and 55-13767.
- No. 57-164123 Japanese Patent Publication No. 3-2450, Japanese Patent Application Laid-Open No. 2005-213446, No. 2005-306891, International Publication No. WO 2007-040143, US Pat. No. 3,632,557, No. 4,345,053,
- the ones proposed in the publications such as 4,960,844 can be listed.
- the above polyoxyalkylene polymers having a crosslinkable silicon group may be used alone or in combination of two or more.
- the saturated hydrocarbon polymer containing a crosslinkable silicon group used as an organic polymer is a polymer that does not substantially contain a carbon-carbon unsaturated bond other than an aromatic ring, and the polymer constituting the skeleton thereof is: (1) Polymerize olefin compounds having 2 to 6 carbon atoms such as ethylene, propylene, 1-butene, isobutylene as main monomers, or (2) homopolymerize diene compounds such as butadiene, isoprene, etc.
- the isobutylene polymer or hydrogenated polybutadiene polymer can easily introduce a functional group at the end,
- the molecular weight is easy to control, and the number of terminal functional groups can be increased, and an isobutylene polymer is particularly preferable.
- Those whose main chain skeleton is a saturated hydrocarbon polymer have characteristics of excellent heat resistance, weather resistance, durability, and moisture barrier properties.
- all of the monomer units may be formed from isobutylene units, or may be a copolymer with other monomers, but the repeating unit derived from isobutylene is 50 from the viewpoint of rubber properties. Those containing at least mass% are preferred, those containing at least 80 mass% are more preferred, and those containing from 90 to 99 mass% are particularly preferred.
- Examples of the method for producing a saturated hydrocarbon polymer having a crosslinkable silicon group include, for example, JP-B-4-69659, JP-B-7-108928, JP-A-62-254149, JP-A-62-2904, Although described in each specification of Kaihei 1-197509, Japanese Patent Publication No. 2539445, Japanese Patent Publication No. 2873395, and Japanese Patent Application Laid-Open No. 7-53882, it is not particularly limited thereto.
- the above saturated hydrocarbon polymer having a crosslinkable silicon group may be used alone or in combination of two or more.
- the (meth) acrylic acid ester monomer constituting the main chain of the (meth) acrylic acid ester polymer containing a crosslinkable silicon group used as the organic polymer is not particularly limited, and various types can be used. it can. Examples include (meth) acrylic acid, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, Isobutyl (meth) acrylate, tert-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, n-heptyl (meth) acrylate, N-octyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, nony
- the following vinyl monomers can be copolymerized together with the (meth) acrylic acid ester monomer.
- the vinyl monomers include styrene monomers such as styrene, vinyl toluene, ⁇ -methyl styrene, chlorostyrene, styrene sulfonic acid, and salts thereof; fluorine-containing vinyl monomers such as perfluoroethylene, perfluoropropylene, and vinylidene fluoride.
- Silicon-containing vinyl monomers such as vinyltrimethoxysilane and vinyltriethoxysilane; maleic anhydride, maleic acid, monoalkyl and dialkyl esters of maleic acid; fumaric acid, monoalkyl and dialkyl esters of fumaric acid; maleimide, Methyl maleimide, ethyl maleimide, propyl maleimide, butyl maleimide, hexyl maleimide, octyl maleimide, dodecyl maleimide, stearyl maleimide, phenyl maleimide, cyclohexyl Maleimide monomers such as maleimide; Nitrile group-containing vinyl monomers such as acrylonitrile and methacrylonitrile; Amide group-containing vinyl monomers such as acrylamide and methacrylamide; Vinyl acetate, vinyl propionate, vinyl pivalate, vinyl benzoate, cinnamon Examples thereof include vinyl esters such as vinyl acid; alkenes such as ethylene and prop
- the (meth) acrylic acid ester monomer and vinyl monomer may be used alone or a plurality of them may be copolymerized.
- the polymer which consists of a styrene-type monomer and a (meth) acrylic-acid type monomer from the physical property of a product etc. is preferable. More preferred is a (meth) acrylic polymer comprising an acrylate monomer and a methacrylic acid ester monomer, and particularly preferred is an acrylic polymer comprising an acrylate monomer.
- these preferable monomers may be copolymerized with other monomers, and further block copolymerized, and in this case, it is preferable that these preferable monomers are contained in a mass ratio of 40% or more.
- (meth) acrylic acid represents acrylic acid and / or methacrylic acid.
- the Tg of the (meth) acrylic acid ester polymer is not particularly limited, and either a high Tg type or a low Tg type can be used.
- a high Tg type is suitable, and as the high Tg type, a Tg of 10 to 180 ° C. is preferable, and that of 20 to 120 ° C. is more preferable.
- the low Tg type it is preferable to use the low Tg type in order to give the cured product flexibility so that it can be used for a flexible substrate.
- Tg of ⁇ 60 ° C. to 0 ° C. is preferable, and that of ⁇ 60 ° C. to ⁇ 30 ° C. is more preferable.
- Tg is a calculated glass transition temperature calculated by the following formula (I).
- Tg is a calculated glass transition temperature of a (meth) acrylic acid ester-based polymer containing a crosslinkable silicon group
- Wi is a monomer i (excluding a crosslinkable silicon group-containing compound).
- the weight fraction, Tgi indicates the glass transition temperature of the homopolymer of monomer i.
- the method for synthesizing the (meth) acrylic acid ester-based polymer is not particularly limited, and may be performed by a known method.
- a polymer obtained by a normal free radical polymerization method using an azo compound or a peroxide as a polymerization initiator has a problem that the molecular weight distribution is generally as large as 2 or more and the viscosity is increased. Yes. Therefore, in order to obtain a (meth) acrylate polymer having a narrow molecular weight distribution and a low viscosity and having a crosslinkable functional group at the molecular chain terminal at a high ratio. It is preferable to use a living radical polymerization method.
- the above (meth) acrylic acid ester-based polymer having a crosslinkable silicon group may be used alone or in combination of two or more.
- organic polymers having a crosslinkable silicon group may be used alone or in combination of two or more. Specifically, it comprises a polyoxyalkylene polymer having a crosslinkable silicon group, a saturated hydrocarbon polymer having a crosslinkable silicon group, and a (meth) acrylic acid ester polymer having a crosslinkable silicon group.
- An organic polymer obtained by blending two or more selected from the group can also be used.
- a method for producing an organic polymer obtained by blending a polyoxyalkylene polymer having a crosslinkable silicon group and a (meth) acrylic acid ester polymer having a crosslinkable silicon group is disclosed in JP-A-59-122541.
- Japanese Laid-Open Patent Publication No. 63-112642 Japanese Laid-Open Patent Publication No. 6-172631, and Japanese Laid-Open Patent Publication No. 11-116763
- the invention is not particularly limited thereto.
- a preferred specific example is a (meth) acrylic acid ester monomer unit having a crosslinkable silicon group and a molecular chain substantially having an alkyl group having 1 to 8 carbon atoms represented by the following general formula (5): And a polyoxyalkylene polymer having a crosslinkable silicon group in a copolymer comprising a (meth) acrylic acid ester monomer unit having an alkyl group having 10 or more carbon atoms and represented by the following general formula (6): It is a method of blending and producing a coalescence. —CH 2 —C (R 3 ) (COOR 4 ) — (5) —CH 2 —C (R 3 ) (COOR 5 ) — (6)
- R 3 represents a hydrogen atom or a methyl group
- R 4 represents an alkyl group having 1 to 8 carbon atoms.
- R 4 in the general formula (5) for example, a methyl group, an ethyl group, a propyl group, an n-butyl group, a t-butyl group, a 2-ethylhexyl group and the like have 1 to 8, preferably 1 to 4 carbon atoms. More preferred are 1 to 2 alkyl groups.
- the alkyl group of R 4 may alone, or may be a mixture of two or more.
- R 3 is the same as above, and R 5 is an alkyl group having 10 or more carbon atoms.
- R 5 in the general formula (6) is, for example, a long chain having 10 or more carbon atoms such as lauryl group, tridecyl group, cetyl group, stearyl group, behenyl group, etc., usually 10-30, preferably 10-20.
- an alkyl group is a R 4, alone may or may be a mixture of two or more.
- the molecular chain of the (meth) acrylic acid ester-based copolymer is substantially composed of monomer units of the formulas (5) and (6), and the term “substantially” here refers to the copolymer. It means that the total of the monomer units of the formula (5) and the formula (6) present therein exceeds 50% by mass.
- the total of the monomer units of the formula (5) and the formula (6) is preferably 70% by mass or more.
- the abundance ratio of the monomer unit of the formula (5) and the monomer unit of the formula (6) is preferably 95: 5 to 40:60, more preferably 90:10 to 60:40 by mass ratio.
- Examples of monomer units other than those represented by formulas (5) and (6) that may be contained in the copolymer include ⁇ , ⁇ -unsaturated carboxylic acids such as acrylic acid and methacrylic acid; acrylamide and methacrylamide , An amide group such as N-methylol acrylamide and N-methylol methacrylamide, an epoxy group such as glycidyl acrylate and glycidyl methacrylate, a monomer containing an amino group such as diethylaminoethyl acrylate, diethylaminoethyl methacrylate and aminoethyl vinyl ether; other acrylonitrile, Examples thereof include monomer units derived from styrene, ⁇ -methylstyrene, alkyl vinyl ether, vinyl chloride, vinyl acetate, vinyl propionate, ethylene and the like.
- a method for producing an organic polymer obtained by blending a (meth) acrylic acid ester-based copolymer having a crosslinkable silicon functional group in addition, in the presence of an organic polymer having a crosslinkable silicon group, A method of polymerizing a (meth) acrylic acid ester monomer can be used. This production method is specifically disclosed in JP-A-59-78223, JP-A-59-168014, JP-A-60-228516, JP-A-60-228517, etc. It is not limited to these.
- diorganopolysiloxane-based polymer containing a crosslinkable silicon group used as the organic polymer include those having a structure represented by the following general formula (i).
- R 12 is a group selected from a monovalent hydrocarbon group, a halogenated hydrocarbon group and a cyanoalkyl group, and the number of carbon atoms such as a methyl group, an ethyl group, a propyl group, a butyl group, and an octyl group.
- alkyl groups such as cyclopentyl group and cyclohexyl group; alkenyl groups such as vinyl group and allyl group; aryl groups such as phenyl group, tolyl group and naphthyl group; benzyl group, phenylethyl group, phenylfluoro group
- aralkyl groups such as a pill group; halogenated hydrocarbon groups such as a trifluoropropyl group and a chloropropyl group; and cyanoalkyl groups such as a 2-cyanoethyl group and a 3-cyanopropyl group.
- a methyl group is preferred.
- Y is an oxygen atom or a divalent hydrocarbon group.
- the divalent hydrocarbon group is preferably an alkylene group having 1 to 10 carbon atoms such as a methylene group, an ethylene group, a propylene group, a butylene group or a hexene group.
- m is a number such that the viscosity at 25 ° C. is 20 to 1,000,000 mPa ⁇ s.
- the moisture curable urethane-based organic polymer of the (A) moisture curable resin in the pulse light curable composition used in the present invention a polyurethane prepolymer having a known isocyanate group obtained by reacting a polyol and a polyisocyanate is used. Polymers can be widely used.
- the polyol is not particularly limited as long as it is an active hydrogen-containing compound having two or more active hydrogen groups.
- polyether polyol polyether polyol, polyester polyol, amine polyol, polycarbonate polyol, polybutadiene polyol, and acrylic polyol.
- Polyether polyol, polyester polyol or amine polyol is preferably used, and polyether polyol is particularly preferable.
- polyol those having a molecular weight of 100 to 12000 and 2 to 4 OH groups in one molecule can be preferably used. These polyols may be used alone or in combination of two or more.
- examples of the polyether polyol include diols such as ethylene glycol, propylene glycol and butylene glycol, triols such as glycerin and trimethylolpropane, and one or two amines such as ammonia and ethylenediamine.
- examples of the polyether polyol include diols such as ethylene glycol, propylene glycol and butylene glycol, triols such as glycerin and trimethylolpropane, and one or two amines such as ammonia and ethylenediamine.
- examples of the polyether polyol include diols such as ethylene glycol, propylene glycol and butylene glycol, triols such as glycerin and trimethylolpropane, and one or two amines such as ammonia and ethylenediamine.
- examples of the polyether polyol include diols such as ethylene glycol, propylene glycol and butylene glycol, triols such as
- polyester polyol examples include polyesters such as copolymers obtained by polycondensation of adipic acid, sebacic acid, terephthalic acid and the like in the presence of ethylene glycol, propylene glycol, 1,4 butanediol, neopentyl glycol and the like.
- polyesters such as copolymers obtained by polycondensation of adipic acid, sebacic acid, terephthalic acid and the like in the presence of ethylene glycol, propylene glycol, 1,4 butanediol, neopentyl glycol and the like.
- polyols, and other low molecular active hydrogen compounds having two or more active hydrogen groups such as bisphenol A and ramester of castor oil.
- the amine polyol can be obtained, for example, by addition reaction of an alkylene oxide with an amine compound, and is preferably a triamine or higher polyamine polyol on average.
- the amine compound include ethylamine, butylamine, octylamine, laurylamine, ethylenediamine, diethylenetriamine, triethylenetetraamine, tetraethylenepentamine, propylenediamine, methylaminomethylamine, methylaminoethylamine, ethylaminoethylamine, 1,2 -Diaminopropane, 1,3-diaminopropane, methylaminopropylamine, bis (3-aminopropyl) ether, 1,3-bis (3-aminopropyl) ethane, 1,4-diaminobutane, laurylaminopropylamine,
- Examples include aliphatic polyamines such as iminobispropylamine and
- polyisocyanate examples include aromatic polyisocyanates such as diphenylmethane diisocyanate (MDI), tolylene diisocyanate (TDI), naphthalene diisocyanate, hexamethylene diisocyanate (HDI), lysine methyl ester diisocyanate, and the like.
- aromatic polyisocyanates such as diphenylmethane diisocyanate (MDI), tolylene diisocyanate (TDI), naphthalene diisocyanate, hexamethylene diisocyanate (HDI), lysine methyl ester diisocyanate, and the like.
- MDI's are from the standpoint of toxicity and price. Use is preferred.
- the urethane prepolymer having an isocyanate group obtained by reacting the polyol and polyisocyanate may be used alone or in combination of two or more.
- the combination is not particularly limited, and prepolymers using different polyols or polyisocyanates, for example, a prepolymer using polypropylene glycol and a prepolymer using amine polyol are used in combination. May be.
- conductive filler (B) used in the pulse light curable composition according to the present invention known conductive fillers having conductive performance can be widely used, and there is no particular limitation.
- silver powder, copper powder, gold powder, Nickel powder, aluminum powder, and silver-plated powder thereof, and metal powder such as silver-coated glass, silver-coated silica, and silver-coated plastic; zinc oxide, titanium oxide, ITO, ATO, and the like can be mentioned, from the viewpoint of fast curing Metal powder is preferable, and silver powder and silver plating powder are more preferable.
- a nanoparticulate metal powder such as nanosilver (particle diameter: 1 to 100 nm), which is a nanoparticulate silver powder, can also be used.
- silver neodecanoate carboxylic acid silver salts such as silver oleate; silver complexes such as silver acetylacetonate complex and silver amine complex can be further added. By adding these, the resistance of the cured product of the pulse light curable composition can be further reduced.
- the shape of the conductive filler (B) is not particularly limited, and various shapes such as flakes and granules can be used, but the combined use of flakes and granules is preferred.
- the flake shape includes a shape called a flat shape, a flake shape, or a scale shape, and is a shape obtained by crushing a solid shape such as a spherical shape or a lump shape in one direction.
- granular means all shapes that are not flaked, for example, agglomerated powder in the shape of a bunch of grapes, spherical shape, approximately spherical shape, lump shape, dendritic shape, spike shape, and these A mixture of powders having the shape of
- the 50% average particle size of the conductive filler (B) is preferably 0.5 to 30 ⁇ m.
- the 50% average particle diameter in this specification refers to 50% particle diameter (D 50 ), for example, a laser Doppler type particle size distribution measuring device (manufactured by Nikkiso Co., Ltd., Microtrac (registered trademark) particle size distribution measuring device). MT3000II) and the like.
- the blending ratio of the conductive filler (B) is not particularly limited, but it is 50% by mass or more of the total content (in terms of solid content) not including the solvent, diluent and plasticizer of the conductive composition.
- the mass% or less is preferable.
- Examples of the (C) condensation catalyst used in the pulse light curable composition according to the present invention include titanic acid esters such as tetrabutyl titanate and tetrapropyl titanate; dibutyltin dilaurate, dibutyltin maleate, dibutyltin diacetate, 4 such as dibutyltin diacetylacetonate, dibutyltin oxide, dioctyltin dilaurate, dioctyltin maleate, dioctyltin diacetate, dioctyltin dineodecanate (dioctyltin diversate), dioctyltin oxide, reaction product of dibutyltin oxide and phthalate, etc.
- titanic acid esters such as tetrabutyl titanate and tetrapropyl titanate
- dibutyltin dilaurate dibutyltin maleate
- Organotin compounds such as divalent tin compounds such as divalent tin compounds, tin dioctylate, tin dinaphthenate, tin distearate and tin dinedecanoate (tinversaic acid tin); aluminum trisacetylacetonate, Organoaluminum compounds such as luminium trisethyl acetoacetate, diisopropoxy aluminum ethyl acetoacetate, aluminum monoacetylacetonate bis (ethyl acetoacetate); bismuth-tris (2-ethylhexoate), bismuth-tris (neodecanoate) Reaction product of bismuth salt such as carboxylic acid or organic amine, etc .; zirconium tetraacetylacetonate, titanium diethoxide bis (ethyl acetoacetate), titanium diisopropoxide bis (ethyl acetoacetate), titanium dibutoxid
- condensation catalysts may be used alone or in combination of two or more.
- organometallic compounds or a combined system of organometallic compounds and an amine compound are preferred from the viewpoint of curability.
- dibutyltin maleate, a reaction product of dibutyltin oxide and a phthalate ester, dibutyltin diacetylacetonate, and dioctyltin dineodecanate are preferred because of their high curing speed.
- a dioctyl tin compound is preferable from the viewpoint of environmental problems.
- the pulsed photocurable composition according to the present invention when applying or printing the pulsed photocurable composition according to the present invention on a substrate, when using screen printing, gravure printing, flexographic printing, etc., it is necessary to ensure the pot life at room temperature, so that When applying or printing on a substrate using a simple printing method, it is preferable to use an aluminum chelate compound.
- the curing catalyst is preferably used in an amount of 0.1 to 10 parts by mass with respect to 100 parts by mass of the component (A) resin.
- the pulse photocurable composition according to the present invention includes a filler, a plasticizer, an adhesion-imparting agent, a stabilizer, a physical property modifier, a thixotropic agent, a dehydrating agent ( Storage stability improvers), tackifiers, flame retardants, radical polymerization initiators and the like may be blended, or other compatible polymers may be blended.
- plasticizer examples include phthalate esters such as diisodecyl phthalate, diundecyl phthalate, diisoundecyl phthalate, dioctyl phthalate, dibutyl phthalate, butyl benzyl phthalate; dimethyl adipate, dioctyl adipate, isodecyl succinate, dibutyl sebacate, etc.
- phthalate esters such as diisodecyl phthalate, diundecyl phthalate, diisoundecyl phthalate, dioctyl phthalate, dibutyl phthalate, butyl benzyl phthalate; dimethyl adipate, dioctyl adipate, isodecyl succinate, dibutyl sebacate, etc.
- Aliphatic dibasic acid esters such as diethylene glycol dibenzoate, glycol esters such as pentaerythritol ester, etc .; Aliphatic esters such as butyl oleate and methyl acetylricinoleate; Epoxidized soybean oil, epoxidized linseed oil, epoxy Epoxy plasticizers such as benzyl stearate; Polyester plasticizers such as polyesters of dibasic acids and dihydric alcohols; Polypropylene glycol and its derivatives Ethers; poly (meth) acrylate plasticizers such as poly (meth) acrylic acid alkyl esters; polystyrenes such as poly- ⁇ -methylstyrene and polystyrene; polybutadiene, butadiene-acrylonitrile copolymers, polychloroprene, polyisoprene Plasticizers such as polyisobutene, paraffinic hydrocarbons, naphthenic hydrocarbons, paraffin
- polyether plasticizers such as polypropylene glycol and its derivatives, poly (meth) acrylate plasticizers, polyisobutene, paraffin and the like that do not contain an unsaturated bond in the polymer main chain are preferred from the viewpoint of weather resistance.
- polyether plasticizers such as polypropylene glycol and derivatives thereof and poly (meth) acrylate plasticizers, which are polymer plasticizers, are preferable.
- a plasticizer is preferably added in an amount of 1 to 200 parts by weight, more preferably 5 to 150 parts by weight, based on 100 parts by weight of the component (A) resin.
- Adhesive agents include ⁇ -aminopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane, ⁇ -aminopropylmethyldimethoxysilane, N- ( ⁇ -aminoethyl) - ⁇ -aminopropyltrimethoxysilane, N- Amino group-containing silanes such as ( ⁇ -aminoethyl) - ⁇ -aminopropyltriethoxysilane, N- ( ⁇ -aminoethyl) - ⁇ -aminopropylmethyldimethoxysilane, 1,3-diaminoisopropyltrimethoxysilane; N -(1,3-dimethylbutylidene) -3- (triethoxysilyl) -1-propanamine, N- (1,3-dimethylbutylidene) -3- (trimethoxysilyl) -1-propanamine, etc.
- Ketimine type silanes ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltrie Epoxy group-containing silanes such as toxisilane, ⁇ -glycidoxypropylmethyldimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane; ⁇ -mercaptopropyltrimethoxysilane, ⁇ -mercaptopropylmethyldimethoxysilane, etc.
- vinyl-type unsaturated group-containing silanes such as vinyltrimethoxysilane, vinyltriethoxysilane, ⁇ -methacryloyloxypropyltrimethoxysilane, and ⁇ -acryloyloxypropylmethyldimethoxysilane
- ⁇ -chloropropyltri Chlorine atom-containing silanes such as methoxysilane
- Isocyanate-containing silanes such as ⁇ -isocyanatopropyltriethoxysilane and ⁇ -isocyanatopropylmethyldimethoxysilane
- methyldimethoxysilane, Silane although hydro silanes such as methyl diethoxy silane can be specifically exemplified, but the invention is not limited thereto.
- modified amino group-containing silanes in which the amino group is modified by reacting the amino group-containing silanes with an epoxy group-containing compound, isocyanate group-containing compound, or (meth) acryloyl group-containing compound containing the silanes. Also good.
- Fillers include reinforcing fillers such as fumed silica, precipitated silica, crystalline silica, fused silica, dolomite, anhydrous silicic acid, hydrous silicic acid, and carbon black; heavy calcium carbonate, colloidal calcium carbonate, carbonic acid Magnesium, diatomaceous earth, calcined clay, clay, talc, titanium oxide, bentonite, organic bentonite, ferric oxide, aluminum fine powder, flint powder, zinc oxide, activated zinc white, shirasu balloon, glass microballoon, phenolic resin and chloride
- fillers such as resin powders such as organic microballoons of vinylidene resin, PVC powder, and PMMA powders; fibrous fillers such as asbestos, glass fibers, and filaments.
- the amount used is 1 to 250 parts by weight, preferably 10 to 200 parts by weight, per 100 parts by weight of the component (A) resin.
- These fillers may be used alone or in combination of two or more.
- the filler is uniformly mixed with a dehydrating agent such as calcium oxide, and then sealed in a bag made of an airtight material and allowed to stand for an appropriate time. It is also possible to dehydrate and dry in advance. By using this low water content filler, storage stability can be improved particularly when a one-component composition is used.
- a dehydrating agent such as calcium oxide
- fillers mainly fumed silica, precipitated silica, crystalline silica, fused silica, dolomite, silicic anhydride, hydrous silicic acid and carbon black, surface treatment
- a filler selected from fine calcium carbonate, calcined clay, clay, activated zinc white and the like is preferable, and preferable results are obtained when used in the range of 1 to 200 parts by mass with respect to 100 parts by mass of the resin (A).
- calcium carbonate such as titanium oxide and heavy calcium carbonate, magnesium carbonate, talc, ferric oxide, zinc oxide, and shirasu balloon
- a preferable result can be obtained by using a filler selected from, for example, 5 to 200 parts by mass with respect to 100 parts by mass of the resin (A).
- a filler selected from, for example, 5 to 200 parts by mass with respect to 100 parts by mass of the resin (A).
- calcium carbonate has a greater effect of improving the breaking strength, breaking elongation, and adhesiveness of the cured product as the value of the specific surface area increases.
- the particle diameter of the surface-treated fine calcium carbonate is preferably 0.5 ⁇ m or less, and the surface treatment is preferably treated with a fatty acid or a fatty acid salt. Moreover, the particle size of calcium carbonate having a large particle size is preferably 1 ⁇ m or more, and an untreated surface can be used.
- an organic balloon or an inorganic balloon In order to improve the workability (such as sharpness) of the composition, it is preferable to add an organic balloon or an inorganic balloon. These fillers can be surface-treated, and may be used alone or in combination of two or more. In order to improve workability (such as sharpness), the balloon particle size is preferably 0.1 mm or less.
- silica in order to prevent bleed while ensuring flowability without increasing viscosity.
- These silicas can be surface-treated, and may be used alone or in combination of two or more. From the viewpoint of preventing bleeding, it is preferable to use hydrophilic silica or hydrophobic silica hydrophobized with a specific surface treatment agent.
- the hydrophobic silica is at least one surface treatment selected from the group consisting of dimethyldichlorosilane, hexamethyldisilazane, (meth) acrylsilane, octylsilane (for example, trimethoxyoctylsilane), and aminosilane. Hydrophobic silica hydrophobized with an agent is preferred.
- a solvent or a diluent may be added as long as the object of the present invention is achieved.
- the solvent include aromatic hydrocarbon solvents such as toluene and xylene; ester solvents such as ethyl acetate, butyl acetate, amyl acetate and cellosolve; ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone.
- the diluent include normal paraffin, isoparaffin, and the like.
- a tackifier may be added to improve the wettability of the adherend and to increase the peel strength.
- Examples include petroleum resin-based, rosin / rosin ester-based, acrylic resin-based, terpene resin, hydrogenated terpene resin, phenolic resin copolymer thereof, and phenol / phenol novolac resin-based tackifier resin.
- additives examples include sagging inhibitors such as hydrogenated castor oil, organic bentonite, and calcium stearate, coloring agents, antioxidants, ultraviolet absorbers, and light stabilizers.
- additives such as other resins such as epoxy resins, curing agents such as epoxy resin curing agents, physical property modifiers, storage stability improvers, lubricants, and foaming agents can be added as necessary. .
- the pulse light curable composition according to the present invention can be a one-component type or a two-component type as required, and can be suitably used particularly as a one-component type.
- the pulse light curable composition according to the present invention is a liquid composition, it is excellent in workability.
- the conductive composition of the present invention preferably has a viscosity at 23 ° C. in the range of 100 to 800 Pa ⁇ s.
- the pulse light curable composition according to the present invention has high conductivity by being applied or printed on a substrate and cured, and can be used instead of solder.
- the pulse light curable composition according to the present invention is suitable for applications such as bonding and mounting of electronic parts such as semiconductor element chip parts and discrete parts, circuit connection, bonding and fixing of crystal resonators and piezoelectric elements, and sealing of packages. Used for.
- a circuit in which one or more electronic components such as a semiconductor element, a chip component, and a discrete component are bonded can be formed on the substrate surface using the pulse light curable composition according to the present invention.
- the pulse light curable composition according to the present invention is particularly useful for a heat-sensitive substrate, and is suitable for forming a circuit or mounting a chip on a heat-sensitive substrate such as PET. Further, it is also suitable for bonding a transparent substrate (light transmissive material) and a member to each other with a pulsed light curable composition, etc., on the side irradiated with pulsed light.
- the method for using the pulse photocurable composition according to the present invention is not particularly limited, but it is preferable to produce a wiring board by performing at least one of the following steps (a) to (c). a step; a step of forming a circuit or an electrode by applying or printing the pulsed photocurable composition according to the present invention on a printed wiring board or a flexible printed circuit board and irradiating the pulsed light; Step b: Step of filling the through hole of the multilayer substrate with the pulse photocurable composition according to the present invention and irradiating the pulsed light to obtain electrical conduction between the layers, Step c: a step of applying or printing the pulse light curable composition according to the present invention on a printed circuit board by dispensing, screen printing or stencil printing, and mounting a semiconductor element or a chip component and irradiating with pulse light to join them.
- an organic base material As a base material to which the pulse light curable composition according to the present invention is applied, either an organic base material or an inorganic base material is applicable.
- organic base materials include PET (polyethylene terephthalate) substrates, paper / phenolic resin copper clad laminates (FR-1, FR-2, XXXpc, Xpc), and paper / epoxy resin copper clad laminates (FR-3).
- Paper-based copper-clad laminates such as paper / polyester resin copper-clad laminates; glass cloth / epoxy resin copper-clad laminates (FR-4, G-10), heat-resistant glass cloth / epoxy resin copper-clad laminates ( FR-5, G-11), glass cloth / polyimide resin copper clad laminate (GPY), glass cloth / fluororesin copper clad laminate, multilayer material [prepreg / thin material] (FR-4, FR-5, GPY), glass substrate copper clad laminates such as multilayer copper clad laminates (FR-4, FR-5, GPY) with inner layer circuit; paper, glass cloth, epoxy resin copper clad laminate (CEM-1), glass Nonwoven fabric, glass cloth, epoxy resin copper-clad Composite copper-clad laminates such as layer board (CEM-3), glass nonwoven fabric, glass cloth, polyester resin copper clad laminate (FR-6), glass mat, glass cloth, polyester resin copper clad laminate; polyester base copper Flexible copper-clad plates such as tension plates, polyimide-imi
- PET substrates are vulnerable to heat and are suitable as a base material to which the pulsed photocurable composition according to the present invention is applied.
- inorganic base materials include metal bases such as metal bases, metal cores, and enamels; ceramic bases such as alumina substrates, aluminum nitride substrates (AlN), silicon carbide substrates (SiC), and low-temperature fired substrates.
- Substrate examples include, but are not limited to, a glass substrate.
- the pulse photocurable composition according to the present invention is a circuit on ITO or IO glass electrode, a contact, or a circuit or contact of a nesa glass electrode, a conductive contact between glass inside the liquid crystal panel, or photoconductivity.
- a circuit on ITO or IO glass electrode a contact, or a circuit or contact of a nesa glass electrode, a conductive contact between glass inside the liquid crystal panel, or photoconductivity.
- the pulse light curable composition according to the present invention comprises a device such as a mesh screen plate, a stencil plate, a gravure, an offset, a flexo, an ink jet, a roller coater, a dispenser, and a dipping on the organic and inorganic substrates.
- the method can be used by coating, printing, or filling.
- the pulsed light curable composition according to the present invention can be rapidly cured by irradiation with pulsed light.
- the pulsed light in the present invention is light irradiated by an apparatus such as a laser or a flash lamp, and the irradiation time measured at a point where the irradiation light intensity is 1 ⁇ 2 of the peak is 5 ⁇ s to 3000 ⁇ s. More preferably, it is more preferably 20 ⁇ s to 2000 ⁇ s.
- Total irradiation energy is preferably 10 ⁇ 200J / cm 2, and more preferably 20 ⁇ 150J / cm 2.
- the number of irradiations is preferably 10 times or more. In particular, when the irradiation time is 1 millisecond or less, 100 times or more is preferable.
- the irradiation energy is measured by a thermopile or pyroelectric element of a semiconductor junction element array.
- the pulsed light is preferably irradiated using a flash lamp.
- Xenon, helium, neon, and argon can be used as the discharge lamp of the flash lamp, but xenon is preferably used.
- the flash lamp device used in the present invention includes a device that emits discharge light in a flash lamp in which a gas such as xenon is sealed and a trigger wire is attached, or emits pulsed light in a short time with high power under an inert gas.
- a device to be used can be used.
- SINTERON2000 or RC series of XENON USA and as a latter example, Pulseforge 3100 of Novacentrix USA can be exemplified.
- each step can be performed by known methods and conditions, except that the pulsed light curable composition according to the present invention is used as the conductive paste.
- the number average molecular weight of the obtained polymer A1 was about 26000, Mw / Mn was 1.3, and Tg was ⁇ 56.0 ° C.
- the average number of silyl groups introduced per molecule of the polymer was determined by 1 H NMR analysis, it was about 1.8.
- Example 1 As shown in Table 1, 80 parts by mass of the resin of Synthesis Example 1 and 20 parts by mass of the resin of Synthesis Example 2 were mixed with Aerosil R972 (trade name, manufactured by Nippon Aerosil Co., Ltd., hydrophobic silica treated with dimethyldichlorosilane). After mass parts were stirred and defoamed with a stirring mixer, they were dehydrated by heating at 100 ° C for 1 hour and cooled to 50 ° C or lower. Thereafter, the remaining compounding substances were added, and the mixture was stirred and degassed to obtain a paste-like pulse photocurable composition.
- Aerosil R972 trade name, manufactured by Nippon Aerosil Co., Ltd., hydrophobic silica treated with dimethyldichlorosilane
- polymers A1 to A3 are the polymers A1 to A3 obtained in Synthesis Examples 1 to 3, respectively.
- the synthetic titanium catalyst is the synthetic titanium catalyst obtained in Synthesis Example 5, and 38.7% of the 10 parts by mass of the synthetic titanium catalyst is equivalent to the condensation catalyst of component (C).
- MA440 Made by Kaneka Co., Ltd., trade name Cyryl MA440, a polymer of polyoxypropylene with a main chain having a dimethoxysilyl group at the molecular end and a polymethacrylate ester in the main chain. A mixture with a polymer having a silyl group.
- EP-505S manufactured by Kaneka Co., Ltd., trade name: Epion EP-505S, containing 33% by weight of process oil, a polymer having polyisobutylene as the main chain and having a methyldimethoxysilyl group at the molecular end.
- Aerosil R972 trade name, manufactured by Nippon Aerosil Co., Ltd., hydrophobic silica treated with dimethyldichlorosilane.
- AO-60 A phenolic antioxidant manufactured by ADEKA Corporation.
- NOCRACK CD Trade name, 4,4′-bis ( ⁇ , ⁇ -dimethylbenzyl) diphenylamine, manufactured by Ouchi Shinsei Chemical Co., Ltd.
- LA-63P trade name, manufactured by ADEKA Corporation, a hindered amine anti-aging agent.
- Silcote AgC-B trade name of Fukuda Metal Foil Powder Industry Co., Ltd., specific surface area 1.35 m 2 / g, tap density 4.6 g / cm 3 , 50% average particle size 4 ⁇ m, flaky silver powder.
- SILCOAT AgC-G trade name of Fukuda Metal Foil Powder Industry Co., Ltd., specific surface area 2.5 m 2 / g, tap density 1.4 g / cm 3 , granular silver powder (reduced powder).
- ACAX-3 A trade name made by Mitsui Mining & Smelting Co., Ltd. Silver-plated copper powder obtained by silver-plating dendritic copper powder at a weight ratio of 20%.
- 1400YP (10%) Silver plated copper powder obtained by silver plating at a weight ratio of 10% on 1400YP (copper powder) manufactured by Mitsui Mining & Smelting Co., Ltd. * 11)
- N-11 Product name: Cactus normal paraffin N-11, manufactured by JX Nippon Oil & Energy Corporation, paraffinic diluent.
- KBM-1003 Trade name, vinyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd. * 13)
- KBM-903 trade name, 3-aminopropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.
- Aluminum chelate D trade name, manufactured by Kawaken Fine Chemicals Co., Ltd., aluminum monoacetylacetonate bis (ethylacetoacetate).
- U-800P Dioctyltin oxide, trade name: Neostan U-800P, manufactured by Nitto Kasei Co., Ltd.
- conductive filler content means from the whole composition of the pulse light curable composition, solvent / diluent and plasticizer (N-11 and dimethyl adipate) It means weight% excluding.
- the following measurements 1) to 4) were performed on the obtained pulse photocurable composition.
- 1) Curability test by pulsed light irradiation Using a pulsed photocurable composition, using a metal mask with a thickness of 75 ⁇ m, a conductor width 1 on a PET film (thickness 100 ⁇ m, Lumirror 100S, manufactured by Toray Industries, Inc.) A circuit pattern was stencil-printed with a thickness of 0.0 mm, a conductor interval of 1 mm, and a length of 70.0 mm. Immediately after printing, pulse light was irradiated using a xenon pulse irradiation apparatus RC-802 manufactured by Xenon Corporation of the United States under the following irradiation conditions.
- Pulse width 168 ⁇ sec ⁇
- Irradiation time 10 seconds
- Irradiation distance 25 mm
- Integrated irradiation energy 55 J / cm 2
- Lamp type LH-810 (pulse energy 207J / pulse)
- Example 2 As shown in Table 1, a pulse light curable composition was obtained in the same manner as in Example 1 except that the formulation was changed. Measurements 1) to 4) were performed in the same manner as in Example 1 on the obtained pulsed photocurable composition. The results are shown in Table 2.
- Example 10 Using the pulse photocurable composition shown in Example 1, using a 75 ⁇ m thick metal mask, a PET film (thickness 100 ⁇ m, Lumirror 100S, manufactured by Toray Industries, Inc.) with a conductor width of 1.0 mm, A circuit pattern was stencil-printed with a conductor interval of 1 mm and a length of 70.0 mm. Immediately after printing, pulse light was irradiated under the following irradiation conditions using a xenon pulse irradiation apparatus SINTERON 2000 manufactured by Xenon Corporation of the United States.
- Example 10 pulsed light was irradiated under the following irradiation conditions. ⁇ Pulse width: 500 ⁇ sec ⁇ Voltage: 3800V ⁇ Irradiation time: 10 seconds ⁇ Irradiation distance: 25 mm ⁇ Amount of irradiation energy: 55 J / cm 2
- Example 11 pulsed light was irradiated under the following irradiation conditions. ⁇ Pulse width: 2000 ⁇ sec ⁇ Voltage: 2000V ⁇ Irradiation time: 10 seconds ⁇ Irradiation distance: 25 mm ⁇ Amount of irradiation energy: 29 J / cm 2
- Example 12 100 parts by mass of deoxime-type silicone sealant manufactured by Cemedine Co., Ltd., 300 parts by mass of Silcote AgC-B manufactured by Fukuda Metal Foil Co., Ltd., 200 parts by mass of Silcote Silcote AgC-G, JX Nippon Oil & Energy ( 30 parts by mass of Cactus normal paraffin N-11 manufactured by Co., Ltd. was added and stirred and degassed to obtain a paste-like pulse photocurable composition. A test was performed under the same conditions as in Example 10 using the obtained pulsed photocurable composition. The results are shown in Table 3.
- polymers A1 to A3 are the polymers A1 to A3 obtained in Synthesis Examples 1 to 3, respectively.
- the synthetic titanium catalyst is the synthetic titanium catalyst obtained in Synthesis Example 5, and 38.7% of the 10 parts by mass of the synthetic titanium catalyst is equivalent to the condensation catalyst of component (C).
- * 1 to 6, 11 to 15 are the same as in Table 1, and * 16 to 18 are as follows.
- * 16) Popelite H32: Showa Denko Co., Ltd., aluminum hydroxide (average particle size 8 ⁇ m).
- Whiteon SB Trade name, heavy calcium carbonate, manufactured by Shiroishi Calcium Co., Ltd. (Average particle size 2.2 ⁇ m) * 18) Calfine 200: trade name manufactured by Maruo Calcium Co., Ltd., fatty acid surface-treated calcium carbonate, primary particle diameter (electron microscope) 0.07 ⁇ m.
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Abstract
Description
パルス化された光を照射することにより、導電性硬化物を形成することを特徴とする。本願明細書において、パルス光照射により硬化する組成物をパルス光硬化性組成物と称する。
上記R1の具体例としては、たとえばメチル基、エチル基等のアルキル基、シクロヘキシル基等のシクロアルキル基、フェニル基等のアリール基、ベンジル基等のアラルキル基や、R1 3SiO-で示されるトリオルガノシロキシ基等があげられる。これらの中ではメチル基が好ましい。
架橋性珪素基を形成する珪素原子は1個以上であるが、シロキサン結合などにより連結された珪素原子の場合には、20個以下であることが好ましい。
-R2-O- ・・・(4)
前記一般式(4)中、R2は炭素原子数1~14の直鎖状もしくは分岐アルキレン基であり、炭素原子数1~14、好ましくは2~4の、直鎖状もしくは分岐アルキレン基が好適である。
-CH2O-、-CH2CH2O-、-CH2CH(CH3)O-、-CH2CH(C2H5)O-、-CH2C(CH3)2O-、-CH2CH2CH2CH2O-
等が挙げられる。
前記ポリオキシアルキレン系重合体の主鎖骨格は、1種類だけの繰り返し単位からなってもよいし、2種類以上の繰り返し単位からなってもよい。
主鎖骨格が飽和炭化水素系重合体であるものは、耐熱性、耐候性、耐久性、及び、湿気遮断性に優れる特徴を有する。
-CH2-C(R3)(COOR4)-(5)
-CH2-C(R3)(COOR5)-(6)
また式(5)の単量体単位と式(6)の単量体単位の存在比は、質量比で95:5~40:60が好ましく、90:10~60:40がさらに好ましい。
また、上記導電性フィラーの他、ネオデカン酸銀や、オレイン酸銀等のカルボン酸銀塩;銀アセチルアセトナート錯体や、銀アミン錯体等の銀錯体等を更に添加することができる。これらを添加することにより、前記パルス光硬化性組成物の硬化物をより低抵抗化することができる。
a工程;プリント配線板やフレキシブルプリント基板の上に本発明に係るパルス光硬化性組成物を塗布又は印刷してパルス光照射して回路や電極を形成する工程、
b工程;多層基板のスルーホールに本発明に係るパルス光硬化性組成物を充填しパルス光照射して層間の電気的導通を得る工程、
c工程;プリント基板上にディスペンス、スクリーン印刷ないしステンシル印刷で本発明に係るパルス光硬化性組成物を塗布又は印刷した上に、半導体素子やチップ部品を搭載しパルス光照射して接合する工程。
また、無機系基材としては、例えば、メタル・ベース、メタル・コア、ホーロー等の金属系基板;アルミナ基板、窒化アルミニウム基板(AlN)、炭化ケイ素基板(SiC)、低温焼成基板等のセラミック系基板;ガラス基板等が挙げられるが、これらに限定されない。
窒素雰囲気下、250L反応機にCuBr(1.09kg)、アセトニトリル(11.4kg)、アクリル酸ブチル(26.0kg)及び2,5-ジブロモアジピン酸ジエチル(2.28kg)を加え、70~80℃で30分程度撹拌した。これにペンタメチルジエチレントリアミンを加え、反応を開始した。反応開始30分後から2時間かけて、アクリル酸ブチル(104kg)を連続的に追加した。反応途中ペンタメチルジエチレントリアミンを適宜添加し、内温70℃~90℃となるようにした。ここまでで使用したペンタメチルジエチレントリアミン総量は220gであった。反応開始から4時間後、80℃で減圧下、加熱攪拌することにより揮発分を除去した。これにアセトニトリル(45.7kg)、1,7-オクタジエン(14.0kg)、ペンタメチルジエチレントリアミン(439g)を添加して8時間撹拌を続けた。混合物を80℃で減圧下、加熱攪拌して揮発分を除去した。この濃縮物にトルエンを加え、重合体を溶解させた後、ろ過助剤として珪藻土、吸着剤として珪酸アルミ、ハイドロタルサイトを加え、酸素窒素混合ガス雰囲気下(酸素濃度6%)、内温100℃で加熱攪拌した。混合液中の固形分をろ過で除去し、ろ液を内温100℃で減圧下、加熱攪拌して揮発分を除去した。
更に吸着剤として珪酸アルミ、ハイドロタルサイトを追加し、酸化防止剤を加え、酸素窒素混合ガス雰囲気下(酸素濃度6%)、内温150℃で加熱攪拌した。この濃縮物にトルエンを加え、重合体を溶解させた後、混合液中の固形分をろ過で除去し、ろ液を減圧下加熱攪拌して揮発分を除去し、アルケニル基を有する重合体を得た。このアルケニル基を有する重合体、ジメトキシメチルシラン(アルケニル基に対して2.0モル当量)、オルトギ酸メチル(アルケニル基に対して1.0モル当量)、白金触媒[ビス(1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン)白金錯体触媒のキシレン溶液白金として重合体1kgに対して10mg)を混合し、窒素雰囲気下、100℃で加熱攪拌した。アルケニル基が消失したことを確認し、反応混合物を濃縮して末端にジメトキシシリル基を有するポリ(アクリル酸-n-ブチル)重合体A1を得た。得られた重合体A1の数平均分子量は約26000、Mw/Mnが1.3であり、Tgは-56.0℃であった。重合体1分子当たりに導入された平均のシリル基の数を1H NMR分析により求めたところ、約1.8個であった。
フラスコに溶剤である酢酸エチル40質量部、メチルメタクリレート59質量部、2-エチルヘキシルメタクリレート25質量部、γ-メタクリロキシプロピルメチルジメトキシシラン21質量部、及び金属触媒としてルテノセンジクロライド0.1質量部を仕込み窒素ガスを導入しながら80℃に加熱した。ついで、3-メルカプトプロピルメチルジメトキシシラン7.5質量部をフラスコ内に添加し80℃で6時間反応を行った。室温に冷却後、ベンゾキノン溶液(95%THF溶液)を20質量部添加して重合を停止した。溶剤および未反応物を留去し、ポリスチレン換算の質量平均分子量が約6000であり、Mw/Mnが1.6であり、Tgが61.2℃であるジメトキシシリル基を有するアクリル酸エステル系重合体A2を得た。
フラスコに溶剤である酢酸エチル40質量部、メチルメタクリレート59質量部、2-エチルヘキシルメタクリレート25質量部、γ-メタクリロキシプロピルトリメトキシシラン22質量部、及び金属触媒としてルテノセンジクロライド0.1質量部を仕込み、窒素ガスを導入しながら80℃に加熱した。ついで、3-メルカプトプロピルトリメトキシシラン8質量部をフラスコ内に添加し80℃で6時間反応を行った。室温に冷却後、ベンゾキノン溶液(95%THF溶液)を20質量部添加して重合を停止した。溶剤および未反応物を留去し、ポリスチレン換算の質量平均分子量が約6000であり、Mw/Mnが1.6であり、Tgが61.2℃であるトリメトキシシリル基を有するアクリル酸エステル系重合体A3を得た。
攪拌装置、窒素ガス導入管、温度計、滴下装置および環流冷却器を備えたフラスコに、3-アミノプロピルトリメトキシシラン(商品名:Z-6610、東レ・ダウコーニング・シリコーン(株)製)100g、3-グリシドキシプロピルトリメトキシシラン(商品名:Z-6040、東レ・ダウコーニング・シリコーン(株)製)276gを加え、50℃にて72時間撹拌し、カルバシラトランを得た。得られたカルバシラトランについて、FT-IRにて910cm-1付近のエポキシ基に起因するピークの消失を確認し、1140cm-1付近の2級アミンのピークを確認し、また、29Si-NMRより-60ppmから-70ppmに新たなピークの出現が確認できた。
攪拌装置、窒素ガス導入管、温度計、滴下装置および環流冷却器を備えたフラスコに、合成例4で得たカルバシラトランを100g入れ、続いてオルガチックス TC-750[マツモトファインケミカル(株)製の商品名、チタニウムジイソプロポキシビス(エチルアセトアセテート)]を63.1g入れ、70℃にて144時間加熱撹拌することにより熟成し、合成チタン触媒を得た。得られた合成チタン触媒について、29Si-NMRよりピークの変化を確認した。
表1に示した如く、合成例1の樹脂80質量部、合成例2の樹脂20質量部に、アエロジルR972〔日本アエロジル(株)製の商品名、ジメチルジクロロシラン処理された疎水性シリカ〕5質量部を攪拌混合機にて攪拌・脱泡した後、100℃にて1時間加熱脱水して50℃以下まで冷却した。その後、残りの配合物質を加え、撹拌・脱泡してペースト状のパルス光硬化性組成物を得た。
*1)MA440:(株)カネカ製、商品名サイリルMA440、主鎖がポリオキシプロピレンで分子末端にジメトキシシリル基を有するポリマーと、主鎖がポリメタクリル酸エステルの共重合体で分子中にジメトキシシリル基を有するポリマーとの混合物。
*2)EP-505S:(株)カネカ製、商品名:エピオンEP-505S、プロセスオイルを33重量%含有する、主鎖がポリイソブチレンで分子末端にメチルジメトキシシリル基を有するポリマー。
*3)アエロジルR972:日本アエロジル(株)製の商品名、ジメチルジクロロシラン処理された疎水性シリカ。
*4)AO-60:(株)ADEKA製、フェノール系酸化防止剤。
*5)ノクラックCD: 大内新興化学(株)製の商品名、4,4'-ビス(α,α-ジメチルベンジル)ジフェニルアミン。
*6)LA-63P:(株)ADEKA製の商品名、ヒンダードアミン系老化防止剤。
*7)シルコートAgC-B:福田金属箔粉工業(株)製の商品名、比表面積1.35m2/g、タップ密度4.6g/cm3、50%平均粒径4μm、フレーク状銀粉。
*8)シルコートAgC-G:福田金属箔粉工業(株)製の商品名、比表面積2.5m2/g、タップ密度1.4g/cm3、粒状銀粉(還元粉))。
*9)ACAX-3:三井金属鉱業(株)製の商品名、樹枝状銅粉に重量比20%で銀メッキした銀メッキ銅粉。
*10)1400YP(10%):三井金属鉱業(株)製、1400YP(銅粉)に重量比10%で銀メッキした銀メッキ銅粉。
*11)N-11:JX日鉱日石エネルギー(株)製、商品名カクタスノルマルパラフィンN-11、パラフィン系希釈剤。
*12)KBM-1003:信越化学工業(株)製の商品名、ビニルトリメトキシシラン。
*13)KBM-903:信越化学工業(株)製の商品名、3-アミノプロピルトリメトキシシラン。
*14)アルミキレートD:川研ファインケミカル(株)製の商品名、アルミニウムモノアセチルアセトネートビス(エチルアセトアセテート)。
*15)U-800P:ジオクチル錫オキサイド、商品名:ネオスタンU-800P、日東化成(株)製。
1)パルス光照射による硬化性試験
パルス光硬化性組成物を用いて、厚さ75μmのメタルマスクを用いて、PETフィルム(厚さ100μm、ルミラー100S、東レ(株)社製)に導体幅1.0mm、導体間隔1mm、長さ70.0mmで回路パターンを孔版印刷し、印刷後直ちに米国Xenon Corporation製キセノンパルス照射装置RC-802を用い下記照射条件によりパルス光を照射した。
・パルス幅:168μsec
・照射時間:10秒
・照射距離:25mm
・積算照射エネルギー量:55J/cm2
・ランプの種類:LH-810(パルスエネルギー 207J/パルス)
照射後、パルス光硬化性組成物が硬化したことを下記評価基準で評価した。結果を表2に示す。
・評価基準 ○:硬化、△:一部未硬化、×:未硬化。
上述したパルス光照射による硬化性試験後、PETフィルムの歪み具合を下記評価基準で評価した。結果を表2に示す。
・評価基準 ○:歪みなし、△:一部歪み有り、×:歪み有り。
上述したパルス光照射による硬化性試験後、日置電機株式会社製抵抗計RM3548にて両端間の抵抗値を測定した。測定上限である1.0MΩを超えた場合はN.D.とした。結果を表2に示した。
上述したパルス光照射による硬化性試験後、パルス光硬化性組成物で作成した導体に粘着テープを貼った後勢いよく引きはがし、はく離状態を観察した。結果を表2に示す。
・評価基準 〇:はく離なし、△:はく離した面積が50%以下、×:PETフィルムから全てはく離。
表1に示した如く、配合物を変更した以外は実施例1と同様にパルス光硬化性組成物を得た。得られたパルス光硬化性組成物に対して、実施例1と同様に測定1)~4)を行った。結果を表2に示した。
実施例1に示したパルス光硬化性組成物を用いて、厚さ75μmのメタルマスクを用いて、PETフィルム(厚さ100μm、ルミラー100S、東レ(株)社製)に導体幅1.0mm、導体間隔1mm、長さ70.0mmで回路パターンを孔版印刷し、印刷後直ちに米国Xenon Corporation製キセノンパルス照射装置SINTERON2000を用い下記照射条件によりパルス光を照射した。
・パルス幅:500μsec
・電圧:3800V
・照射時間:10秒
・照射距離:25mm
・照射エネルギー量:55J/cm2
・パルス幅:2000μsec
・電圧:2000V
・照射時間:10秒
・照射距離:25mm
・照射エネルギー量:29J/cm2
セメダイン(株)製脱オキシム型シリコーンシーラント100質量部に福田金属箔粉工業(株)製シルコートAgC-Bを300質量部、シルコートシルコートAgC-Gを200質量部、JX日鉱日石エネルギー(株)製カクタスノルマルパラフィンN-11を30質量部加え、撹拌・脱泡してペースト状のパルス光硬化性組成物を得た。
得られたパルス光硬化性組成物を用いて、実施例10と同様の条件により試験を行った。結果を表3に示す。
表4に示した如く、配合物を変更した以外は実施例1と同様にペースト組成物を得た。得られたペースト組成物に対して、実施例1と同様に測定1)~4)を行った。結果を表5に示した。
*16)ハイジライトH32:昭和電工(株)製、水酸化アルミニウム(平均粒径8μm)。
*17)ホワイトンSB:白石カルシウム(株)製の商品名、重質炭酸カルシウム。(平均粒径2.2μm)
*18)カルファイン200:丸尾カルシウム(株)製の商品名、脂肪酸表面処理炭酸カルシウム、一次粒子径(電子顕微鏡)0.07μm。
Claims (6)
- (A)架橋性珪素基含有有機重合体及び湿気硬化型ウレタン系有機重合体からなる群から選択される1種以上の湿気硬化性樹脂、
(B)導電性フィラー、及び
(C)縮合触媒、
を含む組成物に対し、パルス化された光を照射することにより、導電性硬化物を形成することを特徴とする導電性硬化物の製造方法。 - 前記導電性硬化物を、基材上に形成させることを特徴とする請求項1記載の導電性硬化物の製造方法。
- (A)架橋性珪素基含有有機重合体及び湿気硬化型ウレタン系有機重合体からなる群から選択される1種以上の湿気硬化性樹脂、
(B)導電性フィラー、及び
(C)縮合触媒、
を含む組成物に対し、パルス化された光を照射することにより、硬化せしめることを特徴とするパルス光硬化性組成物の硬化方法。 - (A)架橋性珪素基含有有機重合体及び湿気硬化型ウレタン系有機重合体からなる群から選択される1種以上の湿気硬化性樹脂、
(B)導電性フィラー、及び
(C)縮合触媒、
を含むことを特徴とするパルス光硬化性組成物。 - 請求項1又は2記載の方法により製造されてなることを特徴とする導電性硬化物。
- 請求項5記載の導電性硬化物を用いてなることを特徴とする電子回路。
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2015078322A (ja) * | 2013-10-18 | 2015-04-23 | 国立大学法人大阪大学 | 樹脂硬化物の製造方法及び硬化性樹脂組成物 |
WO2016017644A1 (ja) * | 2014-07-31 | 2016-02-04 | タツタ電線株式会社 | 導電性組成物およびそれを備えた導電性シート |
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JP2015078322A (ja) * | 2013-10-18 | 2015-04-23 | 国立大学法人大阪大学 | 樹脂硬化物の製造方法及び硬化性樹脂組成物 |
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KR20180037024A (ko) * | 2015-08-07 | 2018-04-10 | 다이요 잉키 세이조 가부시키가이샤 | 도전성 조성물, 도전체 및 플렉시블 프린트 배선판 |
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JP7490256B2 (ja) | 2021-03-31 | 2024-05-27 | 積水フーラー株式会社 | 湿気硬化性組成物 |
Also Published As
Publication number | Publication date |
---|---|
EP3020767A4 (en) | 2017-03-15 |
US20160174385A1 (en) | 2016-06-16 |
JP6489441B2 (ja) | 2019-03-27 |
KR102175447B1 (ko) | 2020-11-06 |
JPWO2015005220A1 (ja) | 2017-03-02 |
CN105377993B (zh) | 2019-03-22 |
CN105377993A (zh) | 2016-03-02 |
EP3020767A1 (en) | 2016-05-18 |
KR20160058743A (ko) | 2016-05-25 |
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