TWD237223S - 物理氣相沉積（pvd）腔室中使用的準直儀 - Google Patents

物理氣相沉積（pvd）腔室中使用的準直儀 Download PDF

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Publication number
TWD237223S
TWD237223S TW111303281F TW111303281F TWD237223S TW D237223 S TWD237223 S TW D237223S TW 111303281 F TW111303281 F TW 111303281F TW 111303281 F TW111303281 F TW 111303281F TW D237223 S TWD237223 S TW D237223S
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Taiwan
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pvd
chamber
vapor deposition
physical vapor
collimator
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TW111303281F
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English (en)
Inventor
張富宏
富宏 張
萊克馬丁李
馬丁李 萊克
班加洛爾烏姆許蘇哈
蘇哈 班加洛爾烏姆許
席莫卡麥拉瑞帕瑪丹庫瑪
瑪丹庫瑪 席莫卡麥拉瑞帕
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美商應用材料股份有限公司 (美國)
美商應用材料股份有限公司
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Publication of TWD237223S publication Critical patent/TWD237223S/zh

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Abstract

【物品用途】;本設計請求具有視覺效果之物理氣相沉積(PVD)腔室中使用的準直儀。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;剖面視圖為俯視圖中依據18-18之截線所取之剖面圖。

Description

物理氣相沉積(PVD)腔室中使用的準直儀
本設計請求具有視覺效果之物理氣相沉積(PVD)腔室中使用的準直儀。
圖式所揭露之虛線部分，為本案不主張設計之部分。
剖面視圖為俯視圖中依據18-18之截線所取之剖面圖。
TW111303281F 2022-01-12 2022-07-04 物理氣相沉積（pvd）腔室中使用的準直儀 TWD237223S (zh)

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US29/822,866 2022-01-12
US29/822,866 USD1038901S1 (en) 2022-01-12 2022-01-12 Collimator for a physical vapor deposition chamber

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TWD237223S true TWD237223S (zh) 2025-04-01

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Citations (1)

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TWD200242S (zh) 2018-03-16 2019-10-11 美商應用材料股份有限公司 用於物理氣相沉積(pvd)腔室中的準直器

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