TWD200242S - 用於物理氣相沉積(pvd)腔室中的準直器 - Google Patents
用於物理氣相沉積(pvd)腔室中的準直器Info
- Publication number
- TWD200242S TWD200242S TW107305411F TW107305411F TWD200242S TW D200242 S TWD200242 S TW D200242S TW 107305411 F TW107305411 F TW 107305411F TW 107305411 F TW107305411 F TW 107305411F TW D200242 S TWD200242 S TW D200242S
- Authority
- TW
- Taiwan
- Prior art keywords
- collimator
- pvd
- chamber
- vapor deposition
- physical vapor
- Prior art date
Links
- 238000005240 physical vapour deposition Methods 0.000 title abstract 3
Abstract
【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室中的準直器。;【設計說明】;無。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/640,787 USD858468S1 (en) | 2018-03-16 | 2018-03-16 | Collimator for a physical vapor deposition chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD200242S true TWD200242S (zh) | 2019-10-11 |
Family
ID=67735531
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107305411D01F TWD202102S (zh) | 2018-03-16 | 2018-09-13 | 用於物理氣相沉積(pvd)腔室中的準直器 |
| TW107305411F TWD200242S (zh) | 2018-03-16 | 2018-09-13 | 用於物理氣相沉積(pvd)腔室中的準直器 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107305411D01F TWD202102S (zh) | 2018-03-16 | 2018-09-13 | 用於物理氣相沉積(pvd)腔室中的準直器 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD858468S1 (zh) |
| TW (2) | TWD202102S (zh) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| TWD235530S (zh) | 2022-12-16 | 2024-12-21 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室中的準直器 |
| TWD237229S (zh) | 2022-12-16 | 2025-04-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室的準直器 |
| TWD237228S (zh) | 2022-12-16 | 2025-04-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積(pvd)腔室的準直器 |
| TWD237730S (zh) | 2022-02-17 | 2025-04-21 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（ｐｖｄ）腔室中的準直器 |
| TWD237985S (zh) | 2022-02-17 | 2025-05-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室中的準直器 |
| TWD243359S (zh) | 2024-10-18 | 2026-03-11 | 美商應用材料股份有限公司 (美國) | 處理室準直器 |
| TWD243360S (zh) | 2024-10-18 | 2026-03-11 | 美商應用材料股份有限公司 (美國) | 處理室準直器 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1009816S1 (en) * | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1026054S1 (en) * | 2022-04-22 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| USD1103950S1 (en) | 2024-03-21 | 2025-12-02 | Applied Materials, Inc. | Process chamber collimator |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2061119C (en) * | 1991-04-19 | 1998-02-03 | Pei-Ing P. Lee | Method of depositing conductors in high aspect ratio apertures |
| US5958193A (en) * | 1994-02-01 | 1999-09-28 | Vlsi Technology, Inc. | Sputter deposition with mobile collimator |
| JPH07335552A (ja) * | 1994-06-08 | 1995-12-22 | Tel Varian Ltd | 処理装置 |
| US5643428A (en) * | 1995-02-01 | 1997-07-01 | Advanced Micro Devices, Inc. | Multiple tier collimator system for enhanced step coverage and uniformity |
| US5702573A (en) * | 1996-01-29 | 1997-12-30 | Varian Associates, Inc. | Method and apparatus for improved low pressure collimated magnetron sputter deposition of metal films |
| US5705042A (en) * | 1996-01-29 | 1998-01-06 | Micron Technology, Inc. | Electrically isolated collimator and method |
| US6362097B1 (en) * | 1998-07-14 | 2002-03-26 | Applied Komatsu Technlology, Inc. | Collimated sputtering of semiconductor and other films |
| TWM267462U (en) | 2000-07-17 | 2005-06-11 | Dura Tek Inc | Collimator for sputtering apparatus |
| US20030015421A1 (en) * | 2001-07-20 | 2003-01-23 | Applied Materials, Inc. | Collimated sputtering of cobalt |
| US20030029715A1 (en) * | 2001-07-25 | 2003-02-13 | Applied Materials, Inc. | An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems |
| WO2003030224A2 (en) * | 2001-07-25 | 2003-04-10 | Applied Materials, Inc. | Barrier formation using novel sputter-deposition method |
| EP1710324B1 (en) * | 2005-04-08 | 2008-12-03 | STMicroelectronics S.r.l. | PVD process and chamber for the pulsed deposition of a chalcogenide material layer of a phase change memory device |
| US7355192B2 (en) * | 2006-03-30 | 2008-04-08 | Intel Corporation | Adjustable suspension assembly for a collimating lattice |
| US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
| TWI356916B (en) | 2008-03-14 | 2012-01-21 | Everlight Electronics Co Ltd | Alterable collimator and lightening module thereof |
| TWM346018U (en) | 2008-03-14 | 2008-12-01 | Everlight Electronics Co Ltd | Alterable gear collimator |
| US20090308739A1 (en) * | 2008-06-17 | 2009-12-17 | Applied Materials, Inc. | Wafer processing deposition shielding components |
| KR20200093084A (ko) * | 2008-06-17 | 2020-08-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 균일한 증착을 위한 장치 및 방법 |
| USD598717S1 (en) * | 2008-09-19 | 2009-08-25 | Dart Industries Inc. | Can strainer |
| CA140095S (en) * | 2010-10-29 | 2011-11-21 | Unilever Plc | Tea capsule |
| USD665071S1 (en) | 2012-01-25 | 2012-08-07 | Applied Materials, Inc. | Deposition chamber liner |
| KR20150048089A (ko) * | 2012-04-26 | 2015-05-06 | 인테벡, 인코포레이티드 | 물리 기상 증착 처리용 협소 소스 |
| TWD159676S (zh) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | 基板處理裝置用廻轉器 |
| TWD159673S (zh) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | 基板處理裝置用廻轉器 |
| TWD159675S (zh) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | 基板處理裝置用廻轉器 |
| TWD159674S (zh) | 2012-11-30 | 2014-04-01 | 日立國際電氣股份有限公司 | 基板處理裝置用廻轉器 |
| TWD166552S (zh) | 2013-01-25 | 2015-03-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器 |
| TWD169790S (zh) | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器之部分 |
| TWD165428S (zh) * | 2013-07-17 | 2015-01-11 | 紐富來科技股份有限公司 | 帶電粒子束描繪裝置用腔室 |
| USD759603S1 (en) * | 2013-07-17 | 2016-06-21 | Nuflare Technology, Inc. | Chamber of charged particle beam drawing apparatus |
| US9831074B2 (en) * | 2013-10-24 | 2017-11-28 | Applied Materials, Inc. | Bipolar collimator utilized in a physical vapor deposition chamber |
| USD746647S1 (en) * | 2014-03-13 | 2016-01-05 | Vienar Roaks | Strainer |
| TWD178898S (zh) | 2014-11-01 | 2016-10-11 | 米歇爾維尼希股份公司 | 開槽機 |
| US9543126B2 (en) | 2014-11-26 | 2017-01-10 | Applied Materials, Inc. | Collimator for use in substrate processing chambers |
| JP1534915S (zh) | 2014-12-22 | 2015-10-13 | ||
| JP1535123S (zh) | 2014-12-22 | 2015-10-13 | ||
| JP1534914S (zh) | 2014-12-22 | 2015-10-13 | ||
| USD753449S1 (en) * | 2015-01-06 | 2016-04-12 | WineStor, LLC | Strainer for beverage shaker |
| JP1551512S (zh) | 2015-06-12 | 2016-06-13 | ||
| JP1546801S (zh) | 2015-06-12 | 2016-03-28 | ||
| JP1546799S (zh) | 2015-06-12 | 2016-03-28 | ||
| SG10202003396PA (en) | 2015-10-27 | 2020-06-29 | Applied Materials Inc | Biasable flux optimizer/collimator for pvd sputter chamber |
| JP1564934S (zh) | 2016-02-26 | 2016-12-05 | ||
| USD805700S1 (en) * | 2016-06-06 | 2017-12-19 | Joe J. Owens, III | Pet food bowl |
| USD821140S1 (en) * | 2016-12-27 | 2018-06-26 | Tristar Products, Inc. | Steamer plate |
-
2018
- 2018-03-16 US US29/640,787 patent/USD858468S1/en active Active
- 2018-09-13 TW TW107305411D01F patent/TWD202102S/zh unknown
- 2018-09-13 TW TW107305411F patent/TWD200242S/zh unknown
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1038901S1 (en) * | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| TWD237223S (zh) | 2022-01-12 | 2025-04-01 | 美商應用材料股份有限公司 (美國) | 物理氣相沉積（pvd）腔室中使用的準直儀 |
| TWD238346S (zh) | 2022-01-12 | 2025-05-21 | 美商應用材料股份有限公司 (美國) | 物理氣相沉積（pvd）腔室中使用的準直儀 |
| TWD237730S (zh) | 2022-02-17 | 2025-04-21 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（ｐｖｄ）腔室中的準直器 |
| TWD237985S (zh) | 2022-02-17 | 2025-05-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室中的準直器 |
| USD1025935S1 (en) * | 2022-11-03 | 2024-05-07 | Applied Materials, Inc. | Collimator for a physical vapor deposition (PVD) chamber |
| TWD234473S (zh) | 2022-11-03 | 2024-11-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積(pvd)腔室的準直器 |
| TWD235530S (zh) | 2022-12-16 | 2024-12-21 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室中的準直器 |
| TWD237229S (zh) | 2022-12-16 | 2025-04-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積（pvd）腔室的準直器 |
| TWD237228S (zh) | 2022-12-16 | 2025-04-01 | 美商應用材料股份有限公司 (美國) | 用於物理氣相沉積(pvd)腔室的準直器 |
| TWD243359S (zh) | 2024-10-18 | 2026-03-11 | 美商應用材料股份有限公司 (美國) | 處理室準直器 |
| TWD243360S (zh) | 2024-10-18 | 2026-03-11 | 美商應用材料股份有限公司 (美國) | 處理室準直器 |
Also Published As
| Publication number | Publication date |
|---|---|
| USD858468S1 (en) | 2019-09-03 |
| TWD202102S (zh) | 2020-01-11 |
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