ATE340277T1 - Zusammengesetztes zerstäubungs-target und phosphor-abscheidungsmethode - Google Patents
Zusammengesetztes zerstäubungs-target und phosphor-abscheidungsmethodeInfo
- Publication number
- ATE340277T1 ATE340277T1 AT03767324T AT03767324T ATE340277T1 AT E340277 T1 ATE340277 T1 AT E340277T1 AT 03767324 T AT03767324 T AT 03767324T AT 03767324 T AT03767324 T AT 03767324T AT E340277 T1 ATE340277 T1 AT E340277T1
- Authority
- AT
- Austria
- Prior art keywords
- phases
- target
- phosphor
- reactive species
- sputtering
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
- C09K11/7729—Chalcogenides
- C09K11/7731—Chalcogenides with alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
- C09K11/7729—Chalcogenides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
- Physical Vapour Deposition (AREA)
- Materials For Medical Uses (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43357602P | 2002-12-16 | 2002-12-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE340277T1 true ATE340277T1 (de) | 2006-10-15 |
Family
ID=32595213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03767324T ATE340277T1 (de) | 2002-12-16 | 2003-12-04 | Zusammengesetztes zerstäubungs-target und phosphor-abscheidungsmethode |
Country Status (11)
Country | Link |
---|---|
US (1) | US7282123B2 (de) |
EP (1) | EP1573084B1 (de) |
JP (1) | JP2006509911A (de) |
KR (1) | KR20050092703A (de) |
CN (1) | CN1726299A (de) |
AT (1) | ATE340277T1 (de) |
AU (1) | AU2003291866A1 (de) |
CA (1) | CA2508523A1 (de) |
DE (1) | DE60308550T2 (de) |
TW (1) | TW200420193A (de) |
WO (1) | WO2004055231A2 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006045195A1 (en) | 2004-10-29 | 2006-05-04 | Ifire Technology Corp. | Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films |
JP2007153996A (ja) * | 2005-12-02 | 2007-06-21 | Nippon Hoso Kyokai <Nhk> | 蛍光体の製造方法およびそれにより製造された蛍光体 |
JP5580972B2 (ja) * | 2008-06-06 | 2014-08-27 | デクセリアルズ株式会社 | スパッタリング複合ターゲット |
USD836572S1 (en) | 2016-09-30 | 2018-12-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD851613S1 (en) | 2017-10-05 | 2019-06-18 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD877101S1 (en) | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD888903S1 (en) | 2018-12-17 | 2020-06-30 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
US11961723B2 (en) | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
CN113444520B (zh) * | 2021-06-25 | 2022-03-25 | 佛山安亿纳米材料有限公司 | 具有包覆层的硫化物荧光体及制备具有包覆层的硫化物荧光体的磁控溅射法 |
USD1004393S1 (en) * | 2021-11-09 | 2023-11-14 | Ehwa Diamond Industrial Co., Ltd. | Grinding pad |
USD1000928S1 (en) * | 2022-06-03 | 2023-10-10 | Beng Youl Cho | Polishing pad |
WO2024003344A1 (en) * | 2022-07-01 | 2024-01-04 | Danmarks Tekniske Universitet | Production of the radionuclide lanthanum-135 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3803438A (en) * | 1973-04-19 | 1974-04-09 | Rca Corp | Electroluminescent film and method for preparing same |
US4172020A (en) * | 1978-05-24 | 1979-10-23 | Gould Inc. | Method and apparatus for monitoring and controlling sputter deposition processes |
US4675092A (en) * | 1986-03-27 | 1987-06-23 | Gte Laboratories Incorporated | Method of producing thin film electroluminescent structures |
US4725344A (en) * | 1986-06-20 | 1988-02-16 | Rca Corporation | Method of making electroluminescent phosphor films |
US5432015A (en) * | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
JPH06163157A (ja) * | 1992-09-24 | 1994-06-10 | Fuji Electric Co Ltd | 薄膜el素子の製造方法 |
US5518432A (en) * | 1992-09-24 | 1996-05-21 | Fuji Electric Company, Ltd. | Method for manufacturing thin-film EL device |
US5853552A (en) * | 1993-09-09 | 1998-12-29 | Nippondenso Co., Ltd. | Process for the production of electroluminescence element, electroluminescence element |
JP2940477B2 (ja) * | 1995-08-11 | 1999-08-25 | 株式会社デンソー | 誘電体薄膜と透明導電膜との積層膜および誘電体薄膜を用いた薄膜el素子 |
US6338908B1 (en) * | 1998-06-26 | 2002-01-15 | Tdk Corporation | Organic electroluminescent device |
US6295784B1 (en) * | 1999-10-28 | 2001-10-02 | Danny J. Richard | Mobile home foundation |
US6228555B1 (en) * | 1999-12-28 | 2001-05-08 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US20010043043A1 (en) | 2000-01-07 | 2001-11-22 | Megumi Aoyama | Organic electroluminescent display panel and organic electroluminescent device used therefor |
US6610352B2 (en) * | 2000-12-22 | 2003-08-26 | Ifire Technology, Inc. | Multiple source deposition process |
US6447654B1 (en) * | 2001-05-29 | 2002-09-10 | Ifire Technology Inc. | Single source sputtering of thioaluminate phosphor films |
US6793782B2 (en) * | 2001-12-21 | 2004-09-21 | Ifire Technology Inc. | Sputter deposition process for electroluminescent phosphors |
-
2003
- 2003-12-04 WO PCT/CA2003/001887 patent/WO2004055231A2/en active IP Right Grant
- 2003-12-04 KR KR1020057010978A patent/KR20050092703A/ko not_active Application Discontinuation
- 2003-12-04 CN CNA2003801062537A patent/CN1726299A/zh active Pending
- 2003-12-04 CA CA002508523A patent/CA2508523A1/en not_active Abandoned
- 2003-12-04 EP EP03767324A patent/EP1573084B1/de not_active Expired - Lifetime
- 2003-12-04 DE DE60308550T patent/DE60308550T2/de not_active Expired - Fee Related
- 2003-12-04 JP JP2004559516A patent/JP2006509911A/ja not_active Withdrawn
- 2003-12-04 AU AU2003291866A patent/AU2003291866A1/en not_active Abandoned
- 2003-12-04 AT AT03767324T patent/ATE340277T1/de not_active IP Right Cessation
- 2003-12-15 US US10/736,255 patent/US7282123B2/en not_active Expired - Fee Related
- 2003-12-16 TW TW092135575A patent/TW200420193A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2004055231A3 (en) | 2004-11-18 |
WO2004055231A2 (en) | 2004-07-01 |
TW200420193A (en) | 2004-10-01 |
AU2003291866A8 (en) | 2004-07-09 |
AU2003291866A1 (en) | 2004-07-09 |
DE60308550D1 (de) | 2006-11-02 |
CA2508523A1 (en) | 2004-07-01 |
EP1573084A2 (de) | 2005-09-14 |
EP1573084B1 (de) | 2006-09-20 |
DE60308550T2 (de) | 2007-06-06 |
CN1726299A (zh) | 2006-01-25 |
KR20050092703A (ko) | 2005-09-22 |
JP2006509911A (ja) | 2006-03-23 |
US7282123B2 (en) | 2007-10-16 |
US20040149567A1 (en) | 2004-08-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |