USD1004393S1 - Grinding pad - Google Patents
Grinding pad Download PDFInfo
- Publication number
- USD1004393S1 USD1004393S1 US29/836,031 US202229836031F USD1004393S US D1004393 S1 USD1004393 S1 US D1004393S1 US 202229836031 F US202229836031 F US 202229836031F US D1004393 S USD1004393 S US D1004393S
- Authority
- US
- United States
- Prior art keywords
- grinding pad
- view
- grinding
- pad
- ornamental design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
Claims (1)
- The ornamental design for a grinding pad, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20210053170 | 2021-11-09 | ||
KR30-2021-0053170 | 2021-11-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD1004393S1 true USD1004393S1 (en) | 2023-11-14 |
Family
ID=88690940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/836,031 Active USD1004393S1 (en) | 2021-11-09 | 2022-04-22 | Grinding pad |
Country Status (1)
Country | Link |
---|---|
US (1) | USD1004393S1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1021595S1 (en) * | 2022-08-31 | 2024-04-09 | Smart, Llc | Polishing pad |
Citations (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2564217A (en) * | 1948-10-30 | 1951-08-14 | Carborundum Co | Abrasive cutoff wheel |
US2806772A (en) * | 1954-09-15 | 1957-09-17 | Electro Refractories & Abrasiv | Abrasive bodies |
US3353308A (en) * | 1963-06-04 | 1967-11-21 | Zane Riccardo | Flexible abrasive disc |
US3464166A (en) * | 1967-05-23 | 1969-09-02 | Ferro Corp | Polishing plate |
USD247672S (en) * | 1976-04-01 | 1978-04-04 | James Allen Kruse | Grinding wheel |
US4629373A (en) * | 1983-06-22 | 1986-12-16 | Megadiamond Industries, Inc. | Polycrystalline diamond body with enhanced surface irregularities |
US5020283A (en) * | 1990-01-22 | 1991-06-04 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
US5054246A (en) * | 1988-09-09 | 1991-10-08 | Cornelius Phaal | Abrasive compacts |
US5533923A (en) * | 1995-04-10 | 1996-07-09 | Applied Materials, Inc. | Chemical-mechanical polishing pad providing polishing unformity |
US5778481A (en) * | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
US5782682A (en) * | 1995-06-09 | 1998-07-21 | Ehwa Diamond Ind. Co. Ltd. | Grinding wheel having abrasive tips |
USD397012S (en) * | 1997-02-11 | 1998-08-18 | Sankyo Diamond Industrial Co., Ltd. | Diamond abrasive saw blade |
USD401829S (en) * | 1996-12-03 | 1998-12-01 | Sankyo Diamond Industrial Co., Ltd. | Diamond abrasive saw blade |
US6019672A (en) * | 1994-09-08 | 2000-02-01 | Struers A/S | Grinding/polishing cover sheet for placing on a rotatable grinding/polishing disc |
US6071182A (en) * | 1997-01-23 | 2000-06-06 | Sanwa Kenma Kogyo Co., Ltd. | Grindstone and method of manufacturing the same |
USD426560S (en) * | 1998-11-23 | 2000-06-13 | Tyrolit Schleifmittelwerke | Grinding plate |
US6165904A (en) * | 1998-10-07 | 2000-12-26 | Samsung Electronics Co., Ltd. | Polishing pad for use in the chemical/mechanical polishing of a semiconductor substrate and method of polishing the substrate using the pad |
USD439011S1 (en) * | 2000-04-04 | 2001-03-13 | Farecla Products Ltd. | Applicator pad |
US6439986B1 (en) * | 1999-10-12 | 2002-08-27 | Hunatech Co., Ltd. | Conditioner for polishing pad and method for manufacturing the same |
US20020127962A1 (en) * | 1998-04-25 | 2002-09-12 | Sung-Bum Cho | Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk |
US20020187735A1 (en) * | 2001-06-06 | 2002-12-12 | Osamu Nabeya | Polishing apparatus |
US20030019570A1 (en) * | 2001-07-26 | 2003-01-30 | Hsueh-Chung Chen | Polishing pad for a chemical mechanical polishing process |
US6540597B1 (en) * | 1999-08-25 | 2003-04-01 | Riken | Polishing pad conditioner |
USD474666S1 (en) * | 2002-02-08 | 2003-05-20 | Ehwa Diamond Industrial Co., Ltd. | Pad for grinding stone |
US20030109209A1 (en) * | 2001-08-24 | 2003-06-12 | Rogers Inoac Corporation | Polishing pad |
US20030182867A1 (en) * | 2002-04-02 | 2003-10-02 | Son Shuk-Dae | Stone polishing pad containing cork powder and method for manufacturing the same |
US20040149567A1 (en) * | 2002-12-16 | 2004-08-05 | Alexander Kosyachkov | Composite sputter target and phosphor deposition method |
US6837780B1 (en) * | 1998-11-19 | 2005-01-04 | Lam-Plan S.A. | Lapping and polishing device |
USD502378S1 (en) * | 2002-11-18 | 2005-03-01 | Ehwa Diamond Industrial Co., Ltd. | Pad for grinding stone |
US20050070214A1 (en) * | 2003-09-25 | 2005-03-31 | Dave Marquardt | Uniform fluid distribution and exhaust system for a chemical-mechanical planarization device |
US20060079160A1 (en) * | 2004-10-12 | 2006-04-13 | Applied Materials, Inc. | Polishing pad conditioner with shaped abrasive patterns and channels |
US20060172665A1 (en) * | 2003-03-14 | 2006-08-03 | Katsuya Okumura | Polishing tool and polishing apparatus |
US20060178099A1 (en) * | 2005-02-07 | 2006-08-10 | Inoac Corporation | Polishing pad |
US7169029B2 (en) * | 2004-12-16 | 2007-01-30 | 3M Innovative Properties Company | Resilient structured sanding article |
USD541124S1 (en) * | 2005-10-07 | 2007-04-24 | Popov Georgi M | Abrasive plate |
USD548757S1 (en) * | 2006-09-07 | 2007-08-14 | Kerong Ruan | Grind stone for grinding wheel |
US20080003935A1 (en) * | 2006-07-03 | 2008-01-03 | Chung-Chih Feng | Polishing pad having surface texture |
US20080085661A1 (en) * | 2006-07-19 | 2008-04-10 | Innopad, Inc. | Polishing Pad Having Micro-Grooves On The Pad Surface |
US20080220702A1 (en) * | 2006-07-03 | 2008-09-11 | Sang Fang Chemical Industry Co., Ltd. | Polishing pad having surface texture |
USD579296S1 (en) * | 2006-04-12 | 2008-10-28 | Popov Georgi M | Detachable abrasive plate |
US20120122380A1 (en) * | 2009-04-30 | 2012-05-17 | Schwappach Karl G | Abrasive article with array of composite polishing pads |
USD684611S1 (en) * | 2009-07-02 | 2013-06-18 | Buff And Shine Manufacturing, Inc. | Buffing pad |
US20150224622A1 (en) * | 2014-02-13 | 2015-08-13 | Kabushiki Kaisha Toshiba | Polish cloth and method of manufacturing polish cloth |
USD742195S1 (en) * | 2013-12-16 | 2015-11-03 | 3M Innovation Properties Company | Sanding article with pattern |
USD742196S1 (en) * | 2013-12-16 | 2015-11-03 | 3M Innovative Properties Company | Sanding article with pattern |
USD767840S1 (en) * | 2014-05-20 | 2016-09-27 | Maruishi Sanyo Co., Ltd | Polishing pad |
US20170252892A1 (en) * | 2014-08-27 | 2017-09-07 | Fujimi Incorporated | Polishing pad |
USD803651S1 (en) * | 2016-03-25 | 2017-11-28 | Buff And Shine Manufacturing, Inc. | Buffing pad |
US20180281150A1 (en) * | 2017-03-30 | 2018-10-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Polishing pad having grooves on bottom surface of top layer |
USD840206S1 (en) * | 2016-03-25 | 2019-02-12 | Buff And Shine Manufacturing, Inc. | Buffing pad |
USD893277S1 (en) * | 2018-10-16 | 2020-08-18 | Epstein Industrial Supply, Inc. | Rotary cutting tool |
USD893974S1 (en) * | 2016-10-21 | 2020-08-25 | 3M Innovative Properties Company | Trapezoidal structured abrasive article |
USD937330S1 (en) * | 2019-05-21 | 2021-11-30 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
USD950873S1 (en) * | 2019-12-19 | 2022-05-03 | 3M Innovative Properties Company | Sponge with surface pattern |
USD950872S1 (en) * | 2019-12-19 | 2022-05-03 | 3M Innovative Properties Company | Sponge with surface pattern |
USD952432S1 (en) * | 2020-10-23 | 2022-05-24 | Jing Men Jun Kai E-commerce Co., Ltd. | Polishing pad |
-
2022
- 2022-04-22 US US29/836,031 patent/USD1004393S1/en active Active
Patent Citations (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2564217A (en) * | 1948-10-30 | 1951-08-14 | Carborundum Co | Abrasive cutoff wheel |
US2806772A (en) * | 1954-09-15 | 1957-09-17 | Electro Refractories & Abrasiv | Abrasive bodies |
US3353308A (en) * | 1963-06-04 | 1967-11-21 | Zane Riccardo | Flexible abrasive disc |
US3464166A (en) * | 1967-05-23 | 1969-09-02 | Ferro Corp | Polishing plate |
USD247672S (en) * | 1976-04-01 | 1978-04-04 | James Allen Kruse | Grinding wheel |
US4629373A (en) * | 1983-06-22 | 1986-12-16 | Megadiamond Industries, Inc. | Polycrystalline diamond body with enhanced surface irregularities |
US5054246A (en) * | 1988-09-09 | 1991-10-08 | Cornelius Phaal | Abrasive compacts |
US5020283A (en) * | 1990-01-22 | 1991-06-04 | Micron Technology, Inc. | Polishing pad with uniform abrasion |
US6019672A (en) * | 1994-09-08 | 2000-02-01 | Struers A/S | Grinding/polishing cover sheet for placing on a rotatable grinding/polishing disc |
US5533923A (en) * | 1995-04-10 | 1996-07-09 | Applied Materials, Inc. | Chemical-mechanical polishing pad providing polishing unformity |
US5782682A (en) * | 1995-06-09 | 1998-07-21 | Ehwa Diamond Ind. Co. Ltd. | Grinding wheel having abrasive tips |
US5778481A (en) * | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
USD401829S (en) * | 1996-12-03 | 1998-12-01 | Sankyo Diamond Industrial Co., Ltd. | Diamond abrasive saw blade |
US6071182A (en) * | 1997-01-23 | 2000-06-06 | Sanwa Kenma Kogyo Co., Ltd. | Grindstone and method of manufacturing the same |
USD397012S (en) * | 1997-02-11 | 1998-08-18 | Sankyo Diamond Industrial Co., Ltd. | Diamond abrasive saw blade |
US20020127962A1 (en) * | 1998-04-25 | 2002-09-12 | Sung-Bum Cho | Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk |
US6165904A (en) * | 1998-10-07 | 2000-12-26 | Samsung Electronics Co., Ltd. | Polishing pad for use in the chemical/mechanical polishing of a semiconductor substrate and method of polishing the substrate using the pad |
US6837780B1 (en) * | 1998-11-19 | 2005-01-04 | Lam-Plan S.A. | Lapping and polishing device |
USD426560S (en) * | 1998-11-23 | 2000-06-13 | Tyrolit Schleifmittelwerke | Grinding plate |
US6540597B1 (en) * | 1999-08-25 | 2003-04-01 | Riken | Polishing pad conditioner |
US6439986B1 (en) * | 1999-10-12 | 2002-08-27 | Hunatech Co., Ltd. | Conditioner for polishing pad and method for manufacturing the same |
USD439011S1 (en) * | 2000-04-04 | 2001-03-13 | Farecla Products Ltd. | Applicator pad |
US20020187735A1 (en) * | 2001-06-06 | 2002-12-12 | Osamu Nabeya | Polishing apparatus |
US20030019570A1 (en) * | 2001-07-26 | 2003-01-30 | Hsueh-Chung Chen | Polishing pad for a chemical mechanical polishing process |
US20030109209A1 (en) * | 2001-08-24 | 2003-06-12 | Rogers Inoac Corporation | Polishing pad |
USD474666S1 (en) * | 2002-02-08 | 2003-05-20 | Ehwa Diamond Industrial Co., Ltd. | Pad for grinding stone |
US20030182867A1 (en) * | 2002-04-02 | 2003-10-02 | Son Shuk-Dae | Stone polishing pad containing cork powder and method for manufacturing the same |
USD502378S1 (en) * | 2002-11-18 | 2005-03-01 | Ehwa Diamond Industrial Co., Ltd. | Pad for grinding stone |
US20040149567A1 (en) * | 2002-12-16 | 2004-08-05 | Alexander Kosyachkov | Composite sputter target and phosphor deposition method |
US20060172665A1 (en) * | 2003-03-14 | 2006-08-03 | Katsuya Okumura | Polishing tool and polishing apparatus |
US20050070214A1 (en) * | 2003-09-25 | 2005-03-31 | Dave Marquardt | Uniform fluid distribution and exhaust system for a chemical-mechanical planarization device |
US20060079160A1 (en) * | 2004-10-12 | 2006-04-13 | Applied Materials, Inc. | Polishing pad conditioner with shaped abrasive patterns and channels |
US7169029B2 (en) * | 2004-12-16 | 2007-01-30 | 3M Innovative Properties Company | Resilient structured sanding article |
US20060178099A1 (en) * | 2005-02-07 | 2006-08-10 | Inoac Corporation | Polishing pad |
USD541124S1 (en) * | 2005-10-07 | 2007-04-24 | Popov Georgi M | Abrasive plate |
USD579296S1 (en) * | 2006-04-12 | 2008-10-28 | Popov Georgi M | Detachable abrasive plate |
US20080003935A1 (en) * | 2006-07-03 | 2008-01-03 | Chung-Chih Feng | Polishing pad having surface texture |
US20080220702A1 (en) * | 2006-07-03 | 2008-09-11 | Sang Fang Chemical Industry Co., Ltd. | Polishing pad having surface texture |
US20080085661A1 (en) * | 2006-07-19 | 2008-04-10 | Innopad, Inc. | Polishing Pad Having Micro-Grooves On The Pad Surface |
USD548757S1 (en) * | 2006-09-07 | 2007-08-14 | Kerong Ruan | Grind stone for grinding wheel |
US20120122380A1 (en) * | 2009-04-30 | 2012-05-17 | Schwappach Karl G | Abrasive article with array of composite polishing pads |
USD684611S1 (en) * | 2009-07-02 | 2013-06-18 | Buff And Shine Manufacturing, Inc. | Buffing pad |
USD742196S1 (en) * | 2013-12-16 | 2015-11-03 | 3M Innovative Properties Company | Sanding article with pattern |
USD742195S1 (en) * | 2013-12-16 | 2015-11-03 | 3M Innovation Properties Company | Sanding article with pattern |
US20150224622A1 (en) * | 2014-02-13 | 2015-08-13 | Kabushiki Kaisha Toshiba | Polish cloth and method of manufacturing polish cloth |
USD767840S1 (en) * | 2014-05-20 | 2016-09-27 | Maruishi Sanyo Co., Ltd | Polishing pad |
US20170252892A1 (en) * | 2014-08-27 | 2017-09-07 | Fujimi Incorporated | Polishing pad |
USD803651S1 (en) * | 2016-03-25 | 2017-11-28 | Buff And Shine Manufacturing, Inc. | Buffing pad |
USD840206S1 (en) * | 2016-03-25 | 2019-02-12 | Buff And Shine Manufacturing, Inc. | Buffing pad |
USD893974S1 (en) * | 2016-10-21 | 2020-08-25 | 3M Innovative Properties Company | Trapezoidal structured abrasive article |
US20180281150A1 (en) * | 2017-03-30 | 2018-10-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Polishing pad having grooves on bottom surface of top layer |
USD893277S1 (en) * | 2018-10-16 | 2020-08-18 | Epstein Industrial Supply, Inc. | Rotary cutting tool |
USD937330S1 (en) * | 2019-05-21 | 2021-11-30 | Sumitomo Electric Hardmetal Corp. | Cutting tool |
USD950873S1 (en) * | 2019-12-19 | 2022-05-03 | 3M Innovative Properties Company | Sponge with surface pattern |
USD950872S1 (en) * | 2019-12-19 | 2022-05-03 | 3M Innovative Properties Company | Sponge with surface pattern |
USD952432S1 (en) * | 2020-10-23 | 2022-05-24 | Jing Men Jun Kai E-commerce Co., Ltd. | Polishing pad |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1021595S1 (en) * | 2022-08-31 | 2024-04-09 | Smart, Llc | Polishing pad |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |