TW200905829A - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
- Publication number
- TW200905829A TW200905829A TW97112537A TW97112537A TW200905829A TW 200905829 A TW200905829 A TW 200905829A TW 97112537 A TW97112537 A TW 97112537A TW 97112537 A TW97112537 A TW 97112537A TW 200905829 A TW200905829 A TW 200905829A
- Authority
- TW
- Taiwan
- Prior art keywords
- wire
- pad
- wafer
- source
- semiconductor device
- Prior art date
Links
Classifications
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- H10W70/457—
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- H10W72/00—
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- H10W70/411—
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- H10W70/424—
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- H10W70/466—
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- H10W70/481—
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- H10W72/016—
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- H10W72/0711—
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/34—Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
- H01L2224/39—Structure, shape, material or disposition of the strap connectors after the connecting process
- H01L2224/40—Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
- H01L2224/401—Disposition
- H01L2224/40151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/40221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/40245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/40247—Connecting the strap to a bond pad of the item
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/411—Insulated-gate bipolar transistors [IGBT]
- H10D12/441—Vertical IGBTs
- H10D12/461—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
- H10D12/481—Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/665—Vertical DMOS [VDMOS] FETs having edge termination structures
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
- H10D30/668—Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/256—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are recessed in semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
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- H10W46/00—
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- H10W46/103—
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- H10W46/401—
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- H10W46/607—
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- H10W70/60—
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- H10W72/07336—
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- H10W72/07337—
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- H10W72/07533—
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- H10W72/07535—
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- H10W72/07552—
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- H10W72/07553—
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- H10W72/07554—
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- H10W72/07633—
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- H10W72/07652—
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- H10W72/07653—
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- H10W72/325—
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- H10W72/352—
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- H10W72/353—
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- H10W72/527—
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- H10W72/534—
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- H10W72/536—
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- H10W72/5363—
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- H10W72/537—
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- H10W72/5438—
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- H10W72/5475—
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- H10W72/5522—
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- H10W72/5524—
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- H10W72/59—
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- H10W72/627—
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- H10W72/652—
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- H10W72/853—
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- H10W72/871—
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- H10W72/884—
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- H10W72/923—
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- H10W72/926—
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- H10W72/952—
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- H10W74/00—
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- H10W90/736—
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- H10W90/756—
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- H10W90/766—
Landscapes
- Electrodes Of Semiconductors (AREA)
- Wire Bonding (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Die Bonding (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007118833 | 2007-04-27 | ||
| JP2007162684A JP2008294384A (ja) | 2007-04-27 | 2007-06-20 | 半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200905829A true TW200905829A (en) | 2009-02-01 |
Family
ID=39885945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97112537A TW200905829A (en) | 2007-04-27 | 2008-04-07 | Semiconductor device |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US7667307B2 (enExample) |
| JP (1) | JP2008294384A (enExample) |
| KR (1) | KR20080096483A (enExample) |
| CN (2) | CN102543771A (enExample) |
| TW (1) | TW200905829A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI585978B (zh) * | 2012-10-17 | 2017-06-01 | 瑞薩電子股份有限公司 | Semiconductor device and manufacturing method thereof |
Families Citing this family (71)
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|---|---|---|---|---|
| JP4248953B2 (ja) | 2003-06-30 | 2009-04-02 | 株式会社ルネサステクノロジ | 半導体装置およびその製造方法 |
| JP4989437B2 (ja) * | 2007-12-14 | 2012-08-01 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| US7646089B2 (en) * | 2008-05-15 | 2010-01-12 | Fujitsu Limited | Semiconductor package, method for manufacturing a semiconductor package, an electronic device, method for manufacturing an electronic device |
| WO2010004609A1 (ja) * | 2008-07-07 | 2010-01-14 | 三菱電機株式会社 | 電力用半導体装置 |
| US7884444B2 (en) * | 2008-07-22 | 2011-02-08 | Infineon Technologies Ag | Semiconductor device including a transformer on chip |
| JP2010080925A (ja) * | 2008-08-26 | 2010-04-08 | Sanyo Electric Co Ltd | 半導体装置 |
| JP5341435B2 (ja) * | 2008-08-26 | 2013-11-13 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 半導体装置 |
| JP5271778B2 (ja) * | 2009-04-10 | 2013-08-21 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| WO2011030368A1 (ja) * | 2009-09-08 | 2011-03-17 | パナソニック株式会社 | 半導体装置とその製造方法 |
| US8581378B2 (en) * | 2009-09-29 | 2013-11-12 | Panasonic Corporation | Semiconductor device and method of manufacturing the same |
| JP5566296B2 (ja) * | 2009-11-26 | 2014-08-06 | パナソニック株式会社 | 半導体装置の製造方法 |
| JP2012015202A (ja) * | 2010-06-29 | 2012-01-19 | On Semiconductor Trading Ltd | 半導体装置およびその製造方法 |
| DE112011103782B4 (de) * | 2010-11-16 | 2019-05-09 | Mitsubishi Electric Corporation | Halbleiterelement, Halbleitervorrichtung und Verfahren zum Herstellen eines Halbleiterelements |
| JP5714916B2 (ja) * | 2011-01-12 | 2015-05-07 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| JP5866774B2 (ja) * | 2011-02-25 | 2016-02-17 | 富士通株式会社 | 半導体装置の製造方法 |
| US8354733B2 (en) * | 2011-03-04 | 2013-01-15 | International Rectifier Corporation | IGBT power semiconductor package having a conductive clip |
| CN102163562B (zh) * | 2011-03-18 | 2012-09-19 | 聚信科技有限公司 | 一种功率半导体管芯的安装方法和同步降压转换器 |
| US9230928B2 (en) * | 2011-09-12 | 2016-01-05 | Conexant Systems, Inc. | Spot plated leadframe and IC bond pad via array design for copper wire |
| US20160277017A1 (en) * | 2011-09-13 | 2016-09-22 | Fsp Technology Inc. | Snubber circuit |
| CN102361025B (zh) * | 2011-10-28 | 2012-10-03 | 深圳市气派科技有限公司 | 一种高密度集成电路封装结构、封装方法以及集成电路 |
| JP5943795B2 (ja) * | 2012-09-26 | 2016-07-05 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| JP5879238B2 (ja) * | 2012-09-26 | 2016-03-08 | 日立オートモティブシステムズ株式会社 | パワー半導体モジュール |
| DE102012019391A1 (de) * | 2012-10-02 | 2014-04-03 | Infineon Technologies Ag | Leitungshalbleitergehäuse mit redundanter Funktionalität |
| JP5512845B2 (ja) * | 2013-02-25 | 2014-06-04 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| US9515172B2 (en) * | 2014-01-28 | 2016-12-06 | Samsung Electronics Co., Ltd. | Semiconductor devices having isolation insulating layers and methods of manufacturing the same |
| KR102199986B1 (ko) * | 2014-02-17 | 2021-01-08 | 엘지이노텍 주식회사 | 발광 장치 |
| US9780061B2 (en) * | 2014-05-26 | 2017-10-03 | Infineon Technologies Ag | Molded chip package and method of manufacturing the same |
| JP6374225B2 (ja) * | 2014-06-02 | 2018-08-15 | ルネサスエレクトロニクス株式会社 | 半導体装置および電子装置 |
| US9852928B2 (en) * | 2014-10-06 | 2017-12-26 | Infineon Technologies Ag | Semiconductor packages and modules with integrated ferrite material |
| KR101644913B1 (ko) * | 2015-01-08 | 2016-08-04 | (주) 루트세미콘 | 초음파 용접을 이용한 반도체 패키지 및 제조 방법 |
| JP6520437B2 (ja) * | 2015-06-12 | 2019-05-29 | 富士電機株式会社 | 半導体装置 |
| DE102016112289B4 (de) * | 2016-07-05 | 2020-07-30 | Danfoss Silicon Power Gmbh | Leiterrahmen und Verfahren zur Herstellung desselben |
| JP6872711B2 (ja) * | 2016-09-27 | 2021-05-19 | パナソニックIpマネジメント株式会社 | 半導体装置および製造方法 |
| JP6698499B2 (ja) | 2016-11-15 | 2020-05-27 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| JP6901902B2 (ja) * | 2017-04-27 | 2021-07-14 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| US20190109061A1 (en) * | 2017-10-11 | 2019-04-11 | Texas Instruments Incorporated | Edge Bend for Isolation Packages |
| US10950494B2 (en) * | 2018-01-19 | 2021-03-16 | Infineon Technologies Ag | Semiconductor device including first and second contact layers and manufacturing method |
| JP7137955B2 (ja) * | 2018-04-05 | 2022-09-15 | ローム株式会社 | 半導体装置 |
| JP6962457B2 (ja) * | 2018-04-19 | 2021-11-05 | 日産自動車株式会社 | 半導体装置及び半導体装置の製造方法 |
| DE102018207308B4 (de) * | 2018-05-09 | 2020-07-02 | Infineon Technologies Ag | Halbleiterbauteil mit integriertem shunt-widerstand und verfahren zu dessen herstellung |
| CN110914981B (zh) * | 2018-05-29 | 2023-06-16 | 新电元工业株式会社 | 半导体模块 |
| CN110544681A (zh) * | 2018-05-29 | 2019-12-06 | 株式会社加藤电器制作所 | 半导体模块 |
| CN110544675A (zh) * | 2018-05-29 | 2019-12-06 | 株式会社加藤电器制作所 | 半导体模块 |
| US10777489B2 (en) | 2018-05-29 | 2020-09-15 | Katoh Electric Co., Ltd. | Semiconductor module |
| US11955440B2 (en) | 2018-09-12 | 2024-04-09 | Rohm Co., Ltd. | Semiconductor device with detection conductor |
| JP6457144B1 (ja) * | 2018-09-19 | 2019-01-23 | 株式会社加藤電器製作所 | 半導体モジュール |
| JP6498829B1 (ja) * | 2018-09-19 | 2019-04-10 | 株式会社加藤電器製作所 | 半導体モジュール |
| WO2020075549A1 (ja) * | 2018-10-09 | 2020-04-16 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
| CN110001436A (zh) * | 2019-03-07 | 2019-07-12 | 浙江叶尼塞电气有限公司 | 一种全新大功率充电桩智能防反装置 |
| JP7548714B2 (ja) * | 2019-03-25 | 2024-09-10 | ローム株式会社 | 電子装置、電子装置の製造方法、およびリードフレーム |
| US10630080B1 (en) * | 2019-06-28 | 2020-04-21 | Alpha And Omega Semiconductor (Cayman) Ltd. | Super-fast transient response (STR) AC/DC Converter for high power density charging application |
| WO2021002132A1 (ja) * | 2019-07-03 | 2021-01-07 | 富士電機株式会社 | 半導体モジュールの回路構造 |
| JP7359581B2 (ja) * | 2019-07-10 | 2023-10-11 | 株式会社デンソー | 半導体装置 |
| JP7156230B2 (ja) * | 2019-10-02 | 2022-10-19 | 株式会社デンソー | 半導体モジュール |
| JP7266508B2 (ja) * | 2019-10-21 | 2023-04-28 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP7334655B2 (ja) * | 2020-03-06 | 2023-08-29 | 三菱電機株式会社 | 半導体装置 |
| JP7339933B2 (ja) * | 2020-09-11 | 2023-09-06 | 株式会社東芝 | 半導体装置 |
| JP7438071B2 (ja) * | 2020-09-15 | 2024-02-26 | 株式会社東芝 | 半導体装置 |
| CN111933606B (zh) * | 2020-09-16 | 2021-08-03 | 苏州日月新半导体有限公司 | 集成电路装置及其封装方法 |
| JP7422696B2 (ja) * | 2021-02-09 | 2024-01-26 | 三菱電機株式会社 | 半導体装置および半導体装置の製造方法 |
| JP7630321B2 (ja) * | 2021-03-22 | 2025-02-17 | ローム株式会社 | 半導体装置 |
| JP7653305B2 (ja) | 2021-06-02 | 2025-03-28 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| WO2023026389A1 (ja) * | 2021-08-25 | 2023-03-02 | 株式会社オートネットワーク技術研究所 | 車載用の半導体スイッチ装置 |
| US20240429911A1 (en) * | 2021-08-25 | 2024-12-26 | Autonetworks Technologies, Ltd. | Vehicle-mounted semiconductor switch device |
| US12224230B2 (en) * | 2021-09-16 | 2025-02-11 | Amkor Technology Singapore Holding Pte. Ltd. | Semiconductor devices and methods of manufacturing semiconductor devices |
| CN115881762A (zh) * | 2021-09-26 | 2023-03-31 | 苏州东微半导体股份有限公司 | Igbt功率器件 |
| CN114496966A (zh) * | 2021-12-31 | 2022-05-13 | 绍兴中芯集成电路制造股份有限公司 | 条带结构、连接片结构以及封装结构 |
| CN115295510A (zh) * | 2022-09-06 | 2022-11-04 | 日月新半导体(威海)有限公司 | 半导体分立器件封装件 |
| WO2024116933A1 (ja) * | 2022-12-02 | 2024-06-06 | ローム株式会社 | 半導体装置、および、半導体装置の製造方法 |
| WO2024190426A1 (ja) * | 2023-03-15 | 2024-09-19 | ローム株式会社 | 半導体装置および車両 |
| CN118763060A (zh) * | 2024-09-02 | 2024-10-11 | 广东气派科技有限公司 | 一种mosfet的封装结构 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03274755A (ja) * | 1990-03-26 | 1991-12-05 | Hitachi Ltd | 樹脂封止半導体装置とその製造方法 |
| KR100266726B1 (ko) * | 1995-09-29 | 2000-09-15 | 기타지마 요시토시 | 리드프레임과 이 리드프레임을 갖춘 반도체장치 |
| US6692989B2 (en) * | 1999-10-20 | 2004-02-17 | Renesas Technology Corporation | Plastic molded type semiconductor device and fabrication process thereof |
| US6084264A (en) | 1998-11-25 | 2000-07-04 | Siliconix Incorporated | Trench MOSFET having improved breakdown and on-resistance characteristics |
| US20010001494A1 (en) | 1999-04-01 | 2001-05-24 | Christopher B. Kocon | Power trench mos-gated device and process for forming same |
| JP2000349221A (ja) * | 1999-06-02 | 2000-12-15 | Sharp Corp | リードフレームおよびそれを用いた半導体デバイス |
| JP3898459B2 (ja) * | 2001-04-18 | 2007-03-28 | 加賀東芝エレクトロニクス株式会社 | 半導体装置の製造方法 |
| US20040217488A1 (en) * | 2003-05-02 | 2004-11-04 | Luechinger Christoph B. | Ribbon bonding |
| JP4248953B2 (ja) * | 2003-06-30 | 2009-04-02 | 株式会社ルネサステクノロジ | 半導体装置およびその製造方法 |
| JP2006032873A (ja) * | 2004-07-22 | 2006-02-02 | Toshiba Corp | ストラップボンディング装置及びストラップボンディング方法 |
| JP2007129182A (ja) * | 2005-05-11 | 2007-05-24 | Toshiba Corp | 半導体装置 |
| JP4842118B2 (ja) * | 2006-01-24 | 2011-12-21 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
| JP4916745B2 (ja) * | 2006-03-28 | 2012-04-18 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
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2007
- 2007-06-20 JP JP2007162684A patent/JP2008294384A/ja active Pending
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2008
- 2008-03-27 US US12/057,328 patent/US7667307B2/en active Active
- 2008-04-07 TW TW97112537A patent/TW200905829A/zh unknown
- 2008-04-25 CN CN2012100431624A patent/CN102543771A/zh active Pending
- 2008-04-25 CN CN2008100935954A patent/CN101295687B/zh not_active Expired - Fee Related
- 2008-04-28 KR KR1020080039531A patent/KR20080096483A/ko not_active Ceased
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2010
- 2010-01-05 US US12/652,311 patent/US20100105174A1/en not_active Abandoned
-
2011
- 2011-10-19 US US13/276,995 patent/US20120034742A1/en not_active Abandoned
-
2013
- 2013-03-18 US US13/846,730 patent/US20130207252A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI585978B (zh) * | 2012-10-17 | 2017-06-01 | 瑞薩電子股份有限公司 | Semiconductor device and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| US20120034742A1 (en) | 2012-02-09 |
| US20080265386A1 (en) | 2008-10-30 |
| CN102543771A (zh) | 2012-07-04 |
| US20100105174A1 (en) | 2010-04-29 |
| KR20080096483A (ko) | 2008-10-30 |
| US7667307B2 (en) | 2010-02-23 |
| CN101295687B (zh) | 2012-05-16 |
| CN101295687A (zh) | 2008-10-29 |
| US20130207252A1 (en) | 2013-08-15 |
| JP2008294384A (ja) | 2008-12-04 |
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