SG157962A1 - Exposure apparatus and method for producing device - Google Patents

Exposure apparatus and method for producing device

Info

Publication number
SG157962A1
SG157962A1 SG200704279-9A SG2007042799A SG157962A1 SG 157962 A1 SG157962 A1 SG 157962A1 SG 2007042799 A SG2007042799 A SG 2007042799A SG 157962 A1 SG157962 A1 SG 157962A1
Authority
SG
Singapore
Prior art keywords
exposure apparatus
producing device
flush
filtered
substrate
Prior art date
Application number
SG200704279-9A
Other languages
English (en)
Inventor
Masahiro Nei
Naoyuki Kobayashi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG157962A1 publication Critical patent/SG157962A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200704279-9A 2002-12-10 2003-12-08 Exposure apparatus and method for producing device SG157962A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002357958 2002-12-10
JP2003296491 2003-08-20

Publications (1)

Publication Number Publication Date
SG157962A1 true SG157962A1 (en) 2010-01-29

Family

ID=32510636

Family Applications (3)

Application Number Title Priority Date Filing Date
SG200704279-9A SG157962A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704280-7A SG158745A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704278-1A SG150388A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG200704280-7A SG158745A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704278-1A SG150388A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device

Country Status (9)

Country Link
US (3) US20050219488A1 (ko)
EP (1) EP1571695A4 (ko)
JP (1) JP4596077B2 (ko)
KR (2) KR20120127755A (ko)
CN (2) CN101852993A (ko)
AU (1) AU2003289236A1 (ko)
SG (3) SG157962A1 (ko)
TW (1) TW200425268A (ko)
WO (1) WO2004053953A1 (ko)

Families Citing this family (233)

* Cited by examiner, † Cited by third party
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US8089611B2 (en) 2012-01-03
EP1571695A4 (en) 2008-10-15
TW200425268A (en) 2004-11-16
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US20090180089A1 (en) 2009-07-16
US7589820B2 (en) 2009-09-15
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US20060238730A1 (en) 2006-10-26

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