PL1869690T3 - Sposób pracy pulsacyjnego źródła łuku - Google Patents

Sposób pracy pulsacyjnego źródła łuku

Info

Publication number
PL1869690T3
PL1869690T3 PL06705363T PL06705363T PL1869690T3 PL 1869690 T3 PL1869690 T3 PL 1869690T3 PL 06705363 T PL06705363 T PL 06705363T PL 06705363 T PL06705363 T PL 06705363T PL 1869690 T3 PL1869690 T3 PL 1869690T3
Authority
PL
Poland
Prior art keywords
operating
arc source
pulsed arc
pulsed
source
Prior art date
Application number
PL06705363T
Other languages
English (en)
Other versions
PL1869690T5 (pl
Inventor
Jürgen Ramm
Oliver Gstoehl
Beno Widrig
Daniel Lendi
Original Assignee
Oerlikon Surface Solutions Ag Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35149632&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL1869690(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Oerlikon Surface Solutions Ag Truebbach filed Critical Oerlikon Surface Solutions Ag Truebbach
Publication of PL1869690T3 publication Critical patent/PL1869690T3/pl
Publication of PL1869690T5 publication Critical patent/PL1869690T5/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
    • F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
    • F01D5/12—Blades
    • F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
    • F01D5/288—Protective coatings for blades
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2230/00—Manufacture
    • F05D2230/30—Manufacture with deposition of material
    • F05D2230/31—Layer deposition
    • F05D2230/313—Layer deposition by physical vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Rectifiers (AREA)
  • Dc-Dc Converters (AREA)
  • Generation Of Surge Voltage And Current (AREA)
  • Plasma Technology (AREA)
PL06705363T 2005-03-24 2006-03-01 Sposób pracy pulsacyjnego źródła łuku PL1869690T5 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH5182005 2005-03-24
EP06705363.7A EP1869690B2 (de) 2005-03-24 2006-03-01 Verfahren zum betreiben einer gepulsten arcquelle
PCT/CH2006/000123 WO2006099758A2 (de) 2005-03-24 2006-03-01 Verfahren zum betreiben einer gepulsten arcquelle

Publications (2)

Publication Number Publication Date
PL1869690T3 true PL1869690T3 (pl) 2015-08-31
PL1869690T5 PL1869690T5 (pl) 2018-10-31

Family

ID=35149632

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06705363T PL1869690T5 (pl) 2005-03-24 2006-03-01 Sposób pracy pulsacyjnego źródła łuku

Country Status (10)

Country Link
US (3) US9997338B2 (pl)
EP (2) EP2447978A3 (pl)
JP (5) JP5571898B2 (pl)
KR (2) KR20080012260A (pl)
CN (4) CN101175867B (pl)
BR (1) BRPI0609127B1 (pl)
ES (1) ES2539017T5 (pl)
PL (1) PL1869690T5 (pl)
SG (2) SG160351A1 (pl)
WO (1) WO2006099758A2 (pl)

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7250196B1 (en) * 1999-10-26 2007-07-31 Basic Resources, Inc. System and method for plasma plating
US20030180450A1 (en) * 2002-03-22 2003-09-25 Kidd Jerry D. System and method for preventing breaker failure
US20050126497A1 (en) * 2003-09-30 2005-06-16 Kidd Jerry D. Platform assembly and method
US9771648B2 (en) 2004-08-13 2017-09-26 Zond, Inc. Method of ionized physical vapor deposition sputter coating high aspect-ratio structures
SG160397A1 (en) * 2005-03-24 2010-04-29 Oerlikon Trading Ag Hard material layer
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source
GB2437080B (en) * 2006-04-11 2011-10-12 Hauzer Techno Coating Bv A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus
KR101508159B1 (ko) * 2006-10-10 2015-04-14 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 적어도 하나의 다중 산화물의 혼합 결정층을 포함하는 층 시스템
US7939181B2 (en) * 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
US9605338B2 (en) * 2006-10-11 2017-03-28 Oerlikon Surface Solutions Ag, Pfaffikon Method for depositing electrically insulating layers
DE102006058078A1 (de) * 2006-12-07 2008-06-19 Systec System- Und Anlagentechnik Gmbh & Co. Kg Vakuumbeschichtungsanlage zur homogenen PVD-Beschichtung
ES2648995T3 (es) * 2007-04-17 2018-01-09 Oerlikon Surface Solutions Ag, Pfäffikon Fuente de evaporación por arco voltaico al vacío, así como una cámara de evaporación por arco voltaico con una fuente de evaporación por arco voltaico al vacío
US8129040B2 (en) 2007-05-16 2012-03-06 Oerlikon Trading Ag, Truebbach Cutting tool
EP2148939B1 (de) * 2007-05-25 2017-06-14 Oerlikon Surface Solutions AG, Pfäffikon Vakuumbehandlungsanlage und vakuumbehandlungsverfahren
WO2009056173A1 (en) 2007-11-01 2009-05-07 Oerlikon Trading Ag Method for manufacturing a treated surface and vacuum plasma sources
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
SE531933C2 (sv) 2007-12-14 2009-09-08 Seco Tools Ab Belagt hårdmetallskär för bearbetning av stål och rostfria stål
US8652589B2 (en) 2008-01-25 2014-02-18 Oerlikon Trading Ag, Truebbach Permeation barrier layer
CA2721249C (en) * 2008-04-22 2016-10-18 Oerlikon Trading Ag, Truebbach Method for manufacturing workpieces with ion-etched surface
JP5429771B2 (ja) * 2008-05-26 2014-02-26 株式会社アルバック スパッタリング方法
ES2388899T3 (es) * 2008-09-05 2012-10-19 Lmt Fette Werkzeugtechnik Gmbh & Co. Kg Herramienta de fresado por generación con un revistimiento y procedimiento para el nuevo revestimiento de una herramienta de fresado por generación
DE102008047198B4 (de) * 2008-09-15 2012-11-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Betreiben einer Hohlkathoden-Bogenentladung
PL2166128T3 (pl) 2008-09-19 2012-05-31 Oerlikon Trading Ag Sposób wytwarzania powłok z tlenków metali przez naparowywanie łukowe
DE102008062332A1 (de) * 2008-12-15 2010-06-17 Gühring Ohg Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten
ATE527390T1 (de) * 2009-03-30 2011-10-15 Oerlikon Trading Ag Verfahren zur vorbehandlung von substraten fuer pvd verfahren
US9416438B2 (en) 2009-07-22 2016-08-16 Oerlikon Surface Solutions Ag, Pfaffikon Method for producing coatings with a single composite target
TR200906864A2 (tr) * 2009-09-04 2011-03-21 Eczacibaşi Yapi Gereçleri̇ Sanayi̇ Ve Ti̇caret A.Ş. Seramik vitrifiye ürünlerinin pvd yöntemi ile kaplanması
DE102009044927A1 (de) * 2009-09-23 2011-04-07 Walter Ag Werkzeugbeschichtung
CN102666908B (zh) 2009-09-25 2020-07-21 欧瑞康表面解决方案股份公司，普费菲孔 用于制备立方氧化锆层的方法
US20110138335A1 (en) * 2009-12-08 2011-06-09 Sybase, Inc. Thin analytics for enterprise mobile users
JP5445847B2 (ja) * 2010-01-28 2014-03-19 三菱マテリアル株式会社 高速重切削加工で硬質被覆層がすぐれた耐チッピング性、耐摩耗性を発揮する表面被覆切削工具
US9217197B2 (en) * 2010-02-26 2015-12-22 Applied Materials, Inc. Methods for depositing a layer on a substrate using surface energy modulation
EP2369031B1 (de) 2010-03-18 2016-05-04 Oerlikon Trading AG, Trübbach Beschichtung auf nial2o4 basis in spinellstruktur
TW201135817A (en) * 2010-04-09 2011-10-16 Hon Hai Prec Ind Co Ltd Colourful multi-layer film structure and the method manufacturing the same
RU2478139C2 (ru) * 2010-05-13 2013-03-27 Общество с ограниченной ответственностью "Научно-производственное предприятие "Уралавиаспецтехнология" Способ ионно-плазменного нанесения покрытия в вакууме на поверхность гравюры штампа из жаропрочного никелевого сплава
US9175568B2 (en) 2010-06-22 2015-11-03 Honeywell International Inc. Methods for manufacturing turbine components
CN102373410A (zh) * 2010-08-16 2012-03-14 鸿富锦精密工业（深圳）有限公司 涂层、具有该涂层的被覆件及该被覆件的制备方法
DE102010052687A1 (de) * 2010-11-26 2012-05-31 GFE Gesellschaft für Fertigungstechnik u. Entwicklung Schmalkalden e.V. Hartstoff-Beschichtung für Maschinenteile und Werkzeuge zum Verschleißschutz und zur Wärmedämmung
US9085980B2 (en) 2011-03-04 2015-07-21 Honeywell International Inc. Methods for repairing turbine components
DE102011016681A1 (de) * 2011-04-11 2012-10-11 Oerlikon Trading Ag, Trübbach Kohlenstofffunkenverdampfung
PL2540858T3 (pl) * 2011-06-30 2015-06-30 Lamina Tech Sa Osadzania za pomocą łuku katodowego
US8506836B2 (en) 2011-09-16 2013-08-13 Honeywell International Inc. Methods for manufacturing components from articles formed by additive-manufacturing processes
CN103031509A (zh) * 2011-10-08 2013-04-10 中国农业机械化科学研究院 一种强化钛合金表面的方法
TW201321542A (zh) * 2011-11-29 2013-06-01 Chenming Mold Ind Corp 製造ic屏蔽鍍膜之設備及ic之金屬屏蔽膜層
CN102534506A (zh) * 2012-01-20 2012-07-04 纳峰真空镀膜（上海）有限公司 低温真空镀膜装置
US9266170B2 (en) 2012-01-27 2016-02-23 Honeywell International Inc. Multi-material turbine components
EP2825683B1 (en) * 2012-03-12 2019-01-02 Oerlikon Surface Solutions AG, Pfäffikon Coating with enhanced sliding properties
WO2013159870A1 (en) 2012-04-22 2013-10-31 Oerlikon Trading Ag, Trübbach Arc-deposited al-cr-o coatings having enhanced coating properties
JP5417650B2 (ja) * 2012-05-08 2014-02-19 住友電工ハードメタル株式会社 表面被覆切削工具
US9120151B2 (en) * 2012-08-01 2015-09-01 Honeywell International Inc. Methods for manufacturing titanium aluminide components from articles formed by consolidation processes
JP6055324B2 (ja) * 2013-01-29 2016-12-27 株式会社神戸製鋼所 軟質金属に対する耐凝着性に優れた硬質皮膜
KR102236892B1 (ko) * 2013-04-16 2021-04-07 외를리콘 서피스 솔루션즈 아게, 페피콘 크로뮴-기반 산화 보호층
JP6441318B2 (ja) * 2013-05-23 2018-12-19 エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン ターボチャージャー用バリア層
DE102014104672A1 (de) * 2014-04-02 2015-10-08 Kennametal Inc. Beschichtetes Schneidwerkzeug und Verfahren zu seiner Herstellung
ES2717934T3 (es) * 2014-05-13 2019-06-26 Argor Aljba Sa Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío
EP3150740B1 (en) 2014-06-02 2018-09-05 Mitsubishi Hitachi Tool Engineering, Ltd. Rigid coating film, member coated with rigid coating film, production processes therefor, and target for use in producing rigid coating film
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
JP5997417B1 (ja) * 2015-06-24 2016-09-28 キヤノンアネルバ株式会社 真空アーク成膜装置および成膜方法
WO2016208094A1 (ja) 2015-06-24 2016-12-29 キヤノンアネルバ株式会社 真空アーク成膜装置および成膜方法
CN108368601B (zh) * 2015-12-22 2020-10-30 山特维克知识产权股份有限公司 涂覆的切削工具和方法
CN107022741A (zh) * 2016-02-01 2017-08-08 沈阳科友真空技术有限公司 一种pems等离子体增强磁控溅射镀膜设备
KR20180112803A (ko) * 2016-02-19 2018-10-12 발터 악티엔게젤샤프트 커팅 공구
KR101883369B1 (ko) * 2016-11-15 2018-07-30 마이크로코팅 주식회사 다층박막 코팅 장치
JP6507399B2 (ja) * 2017-03-28 2019-05-08 株式会社タンガロイ 被覆切削工具
CA3060609A1 (en) * 2017-04-21 2018-10-25 Oerlikon Surface Solutions Ag, Pfaffikon Superalloy target
WO2018215558A1 (en) * 2017-05-23 2018-11-29 Oerlikon Surface Solutions Ag, Pfäffikon Thick TiAlTaN/AlCrN multilayer coating films on turbine components
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
DE102017219642A1 (de) * 2017-11-06 2019-05-09 Siemens Aktiengesellschaft Schichtsystem und Schaufel
WO2019101919A1 (en) * 2017-11-24 2019-05-31 Oerlikon Surface Solution Ag, Pfäffikon Al-cr-based ceramic coatings with increased thermal stability
DE102017128402B4 (de) * 2017-11-30 2025-05-22 Pva Tepla Ag Lichtbogenunterdrückende Puls-Plasma-Anlage und Verfahren zur Unterdrückung eines sich ausbildenden Lichtbogens
PL3728695T3 (pl) * 2017-12-22 2023-02-06 Oerlikon Surface Solutions Ag, Pfäffikon Powłoka odporna na korozję i erozję do łopatek turbinowych turbin gazowych
JP6846387B2 (ja) * 2018-06-22 2021-03-24 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
US11655544B2 (en) * 2018-10-17 2023-05-23 Oerlikon Surface Solutions Ag, Pfäffikon PVD barrier coating for superalloy substrates
WO2020126531A1 (de) * 2018-12-21 2020-06-25 Oerlikon Surface Solutions Ag, Pfäffikon Magnetanordnung für eine plasmaquelle zur durchführung von plasmabehandlungen
CH715877A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
CH715878A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Magnetanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
DE102019207367A1 (de) * 2019-05-20 2020-11-26 Oerlikon Surface Solutions Ag Verfahren zum Aufbringen einer Beschichtung auf eine Oberfläche eines Mullitmaterials, Mullitmaterial mit einer Beschichtung und Gasturbinenbauteil
CN110172674A (zh) * 2019-05-29 2019-08-27 汕头万顺新材集团股份有限公司 一种高透明性阻隔膜及其制备方法
JP6737944B1 (ja) * 2019-07-16 2020-08-12 株式会社神戸製鋼所 機械学習方法、機械学習装置、機械学習プログラム、通信方法、及び成膜装置
EP4031690A1 (de) * 2019-09-19 2022-07-27 Oerlikon Surface Solutions AG, Pfäffikon Substrat mit einem molydännitrid schichtsystem, sowie beschichtungsverfahren zur herstellung eines schichtsystems
CN111489956B (zh) * 2020-04-07 2023-04-07 武汉大学 晶体管用AlCrNbSiTi高熵合金氧化物绝缘薄膜材料及制备方法
EP3964604A1 (en) * 2020-09-03 2022-03-09 IHI Ionbond AG Doped dlc for bipolar plate (bpp) and tribological applications
US12577682B2 (en) 2020-12-02 2026-03-17 Oerlikon Surface Solutions Ag, Pfäffikon Al—Si corrosion protection coatings
WO2022180093A1 (en) * 2021-02-23 2022-09-01 Oerlikon Surface Solutions Ag, Pfäffikon Coating system for plastic processing applications
CN113981385B (zh) * 2021-10-13 2023-08-25 广东工业大学 一种快速阴极电弧蒸发沉积硬质涂层的方法
CN114481017B (zh) * 2022-02-11 2023-10-27 松山湖材料实验室 一种镀膜装置及清洗工艺
CN115142029B (zh) * 2022-08-25 2023-07-28 西安稀有金属材料研究院有限公司 一种耐蚀Cr基多层结构复合涂层的制备方法
CN118109786B (zh) * 2024-04-18 2024-08-16 长沙市熔材科技有限公司 一种氧解离辅助物理气相沉积制备热障涂层的装置与方法
WO2026018704A1 (ja) * 2024-07-17 2026-01-22 東京エレクトロン株式会社 プラズマ処理装置、バイアス電源、及びプラズマ処理方法
CN120719247A (zh) * 2025-06-30 2025-09-30 成都工业职业技术学院 一种镁合金表面硬质氮化物陶瓷涂层的制备方法

Family Cites Families (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
IL71530A (en) 1984-04-12 1987-09-16 Univ Ramot Method and apparatus for surface-treating workpieces
EP0285745B1 (de) * 1987-03-06 1993-05-26 Balzers Aktiengesellschaft Verfahren und Vorrichtungen zum Vakuumbeschichten mittels einer elektrischen Bogenentladung
FR2612204A1 (fr) * 1987-03-12 1988-09-16 Vac Tec Syst Procede et appareil pour le depot par un plasma d'arc electrique sous vide de revetements decoratifs et de revetements resistant a l'usure
JPS6428362A (en) * 1987-07-22 1989-01-30 Kobe Steel Ltd Method and device for forming thin insulating film
JPS6442574A (en) * 1987-08-07 1989-02-14 Nissin Electric Co Ltd Arc power source device for vacuum arc discharge type pvd device
EP0306612B2 (de) * 1987-08-26 1996-02-28 Balzers Aktiengesellschaft Verfahren zur Aufbringung von Schichten auf Substraten
US4904542A (en) * 1988-10-11 1990-02-27 Midwest Research Technologies, Inc. Multi-layer wear resistant coatings
JP2718731B2 (ja) * 1988-12-21 1998-02-25 株式会社神戸製鋼所 真空アーク蒸着装置及び真空アーク蒸着方法
EP0385475A3 (en) * 1989-03-02 1991-04-03 Asahi Glass Company Ltd. Method of forming a transparent conductive film
CN1043961A (zh) * 1989-08-21 1990-07-18 机械电子工业部北京机械工业自动化研究所 磁控电弧离子镀膜法
JPH03126867A (ja) * 1989-10-09 1991-05-30 Fuji Photo Film Co Ltd スパッタリング方法
DE9109503U1 (de) * 1991-07-31 1991-10-17 Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik
JPH06145975A (ja) * 1992-03-20 1994-05-27 Komag Inc 炭素フィルムをスパタリングする方法及びその製造物
CH689767A5 (de) * 1992-03-24 1999-10-15 Balzers Hochvakuum Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage.
US5922176A (en) * 1992-06-12 1999-07-13 Donnelly Corporation Spark eliminating sputtering target and method for using and making same
US5413877A (en) * 1992-09-22 1995-05-09 Moller International, Inc. Combination thermal barrier and wear coating for internal combustion engines
DE4231968A1 (de) * 1992-09-24 1994-03-31 Bosch Gmbh Robert Getaktete Stromversorgungsschaltung
EP0663019B1 (en) * 1992-09-30 1998-12-02 Advanced Energy Industries, Inc. Topographically precise thin film coating system
DE4233720C2 (de) * 1992-10-07 2001-05-17 Leybold Ag Einrichtung für die Verhinderung von Überschlägen in Vakuum-Zerstäubungsanlagen
JPH0734242A (ja) * 1993-07-16 1995-02-03 Matsushita Electric Ind Co Ltd スパッタリング装置
DE4401986A1 (de) 1994-01-25 1995-07-27 Dresden Vakuumtech Gmbh Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür
CH688863A5 (de) 1994-06-24 1998-04-30 Balzers Hochvakuum Verfahren zum Beschichten mindestens eines Werkstueckes und Anlage hierfuer.
CH693035A5 (de) † 1994-06-24 2003-01-31 Unaxis Balzers Ag Verfahren zur Herstellung eines Targets, nach dem Verfahren hergestelltes Target und Verwendung desselben.
US5518597A (en) 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
JP2877058B2 (ja) * 1995-12-15 1999-03-31 日新電機株式会社 膜形成方法
DE19609647A1 (de) * 1996-03-12 1997-09-18 Univ Sheffield Hartstoffschicht
SE9704607D0 (sv) * 1997-12-09 1997-12-09 Chemfilt R & D Ab A method and apparatus for magnetically enhanced sputtering
ES2217549T3 (es) * 1997-06-13 2004-11-01 Unaxis Trading Ag Procedimiento para la fabricacion de piezas recubiertas con una capa epitactica.
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
JPH11251096A (ja) * 1998-02-26 1999-09-17 Toshiba Corp 粒子加速電源装置
US6827976B2 (en) * 1998-04-29 2004-12-07 Unaxis Trading Ag Method to increase wear resistance of a tool or other machine component
JP4155641B2 (ja) * 1998-10-27 2008-09-24 住友電工ハードメタル株式会社 耐摩耗性被膜およびその製造方法ならびに耐摩耗部材
DE19902146C2 (de) * 1999-01-20 2003-07-31 Fraunhofer Ges Forschung Verfahren und Einrichtung zur gepulsten Plasmaaktivierung
JP3825936B2 (ja) * 1999-04-09 2006-09-27 キヤノン株式会社 光学薄膜の製造方法及びその薄膜形成装置
DE19924094C2 (de) 1999-05-21 2003-04-30 Fraunhofer Ges Forschung Vakuumbogenverdampfer und Verfahren zu seinem Betrieb
JP2001186765A (ja) * 1999-10-13 2001-07-06 Hitachi Ltd 多チャンネル直流電源
JP2001211645A (ja) * 2000-01-25 2001-08-03 Hitachi Ltd 直流電源装置
DE10010126C2 (de) 2000-03-03 2002-10-10 Cobes Gmbh Nachrichten Und Dat Verfahren und Vorrichtung zum Plasmabehandeln der Oberfläche von Substraten durch Ionenbeschuß
JP2001262335A (ja) * 2000-03-21 2001-09-26 Nippon Sheet Glass Co Ltd 被膜の被覆方法
DE10016958A1 (de) * 2000-04-06 2001-10-18 Widia Gmbh Verfahren zur Herstellung von Multilagenschichten auf Substratkörpern und Verbundwerkstoff, bestehend aus einem beschichteten Substratkörper
DE10018143C5 (de) * 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
JP3865570B2 (ja) * 2000-06-16 2007-01-10 伊藤光学工業株式会社 プラズマ加工法
EP1303644A4 (en) * 2000-07-17 2008-01-09 Commw Scient Ind Res Org Production of carbon and carbon-based materials
JP2002069664A (ja) * 2000-08-28 2002-03-08 Hiroshi Takigawa プラズマ加工方法及びプラズマ加工装置
US6875700B2 (en) * 2000-08-29 2005-04-05 Board Of Regents, The University Of Texas System Ion-Ion plasma processing with bias modulation synchronized to time-modulated discharges
DE50115410D1 (de) 2000-09-05 2010-05-12 Oerlikon Trading Ag Vakuumanlage mit koppelbarem Werkstückträger
JP2002187793A (ja) * 2000-10-11 2002-07-05 Osg Corp ダイヤモンド被膜の平滑化方法、およびダイヤモンド被覆部材の製造方法
JP4822378B2 (ja) * 2001-02-06 2011-11-24 株式会社ブリヂストン 成膜装置および成膜方法
JP2002254228A (ja) * 2001-02-27 2002-09-10 Mmc Kobelco Tool Kk 高速切削ですぐれた耐摩耗性を発揮する表面被覆超硬合金製ドリル
AUPR353601A0 (en) 2001-03-05 2001-03-29 Commonwealth Scientific And Industrial Research Organisation Deposition process
US6551722B2 (en) * 2001-04-11 2003-04-22 Masco Corporation Of Indiana Coated article having a stainless steel color
SE525231C2 (sv) * 2001-06-14 2005-01-11 Chemfilt R & D Ab Förfarande och anordning för att alstra plasma
JP4756434B2 (ja) * 2001-06-14 2011-08-24 日立金属株式会社 皮膜形成装置
EP1278294B9 (en) * 2001-07-16 2010-09-01 CPAutomation S.A. An electrical power supply suitable in particular for dc plasma processing
KR100434188B1 (ko) * 2001-08-28 2004-06-04 삼성전자주식회사 장벽 금속층 적층 방법
JP2003073814A (ja) * 2001-08-30 2003-03-12 Mitsubishi Heavy Ind Ltd 製膜装置
US6750156B2 (en) * 2001-10-24 2004-06-15 Applied Materials, Inc. Method and apparatus for forming an anti-reflective coating on a substrate
US7033682B1 (en) * 2001-12-28 2006-04-25 Ues, Inc. Coating solutions for titanium and titanium alloy machining
AU2003209606A1 (en) 2002-01-14 2003-07-24 Varco Ltd. Cathode for vacuum arc evaporators
JP4108348B2 (ja) * 2002-02-19 2008-06-25 株式会社三社電機製作所 電源装置
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
AU2003203127A1 (en) * 2002-03-15 2003-09-29 Unaxis Balzers Ag Vacuum plasma generator
US7247221B2 (en) * 2002-05-17 2007-07-24 Applied Films Corporation System and apparatus for control of sputter deposition process
JP2003342717A (ja) * 2002-05-27 2003-12-03 Mitsubishi Materials Kobe Tools Corp 真空アーク方式蒸着装置及びこれを用いた成膜方法
JP4284941B2 (ja) * 2002-08-07 2009-06-24 パナソニック株式会社 硬質炭素膜被覆部材及び成膜方法
JP2004076069A (ja) * 2002-08-13 2004-03-11 Mitsubishi Heavy Ind Ltd 表面処理装置
DE10302107A1 (de) * 2003-01-21 2004-07-29 Fuchs Technology Ag Zylinderoberfläche
DE10312549B3 (de) * 2003-03-21 2004-08-26 Hüttinger Elektronik Gmbh + Co. Kg Gasentladungsprozess-Spannungsversorgungseinheit
JP2004316850A (ja) * 2003-04-18 2004-11-11 Toyota Motor Corp 摺動部材およびその製造方法
SE0302045D0 (sv) * 2003-07-10 2003-07-10 Chemfilt R & D Ab Work piece processing by pulsed electric discharges in solid-gas plasmas
US7455890B2 (en) * 2003-08-05 2008-11-25 General Electric Company Ion implantation of turbine engine rotor component
CN1616707A (zh) * 2003-11-11 2005-05-18 北京长城钛金公司 用脉冲电弧等离子体蒸发离化源制备纳米多层膜的方法
JP4500061B2 (ja) * 2004-02-02 2010-07-14 株式会社神戸製鋼所 硬質皮膜の成膜方法
US9997338B2 (en) * 2005-03-24 2018-06-12 Oerlikon Surface Solutions Ag, Pfäffikon Method for operating a pulsed arc source

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