KR20070086667A - 항치매 약물의 안정화 방법 - Google Patents
항치매 약물의 안정화 방법 Download PDFInfo
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Abstract
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Claims (31)
- 항치매 약물 및 고분자량 염기성 물질을 포함하는 제약 조성물에 고분자량 산성 물질을 첨가하는 것을 포함하는 항치매 약물 안정화 방법.
- 제1항에 있어서, 고분자량 산성 물질이 항치매 약물과 고분자량 염기성 물질의 접촉에 의해 생성되는 항치매 약물의 분해물을 억제할 수 있는 양으로 첨가되는 항치매 약물 안정화 방법.
- 제1항 또는 제2항에 있어서, 항치매 약물이 3급 아미노기를 갖는 화합물인 항치매 약물 안정화 방법.
- 제1항 내지 제3항 중 어느 한 항에 있어서, 항치매 약물이 리바스티그민, 갈란타민, 도네페질, 3-[1-(페닐메틸)피페리딘-4-일]-1-(2,3,4,5-테트라히드로-1H-1-벤즈아제핀-8-일)-1-프로판 및 5,7-디히드로-3-[2-[1-(페닐메틸)-4-피페리디닐]에틸]-6H-피롤로[4,5-f]-1,2-벤즈이속사졸-6-온, 및 이들의 제약학적으로 허용되는 염들로 이루어지는 군으로부터 선택되는 것인 항치매 약물 안정화 방법.
- 제1항 내지 제4항 중 어느 한 항에 있어서, 항치매 약물이 도네페질 또는 그의 제약학적으로 허용되는 염인 항치매 약물 안정화 방법.
- 제1항 내지 제5항 중 어느 한 항에 있어서, 고분자량 염기성 물질이 수불용성 중합체 물질인 항치매 약물 안정화 방법.
- 제1항 내지 제6항 중 어느 한 항에 있어서, 고분자량 염기성 물질이 에틸셀룰로오스, 아크릴산에틸-메타크릴산메틸 공중합체 및 폴리에틸렌옥시드로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제1항 내지 제7항 중 어느 한 항에 있어서, 고분자량 산성 물질이 장용성 중합체 물질인 항치매 약물 안정화 방법.
- 제1항 내지 제8항 중 어느 한 항에 있어서, 고분자량 산성 물질이 메타크릴산-아크릴산에틸 공중합체, 메타크릴산-메타크릴산메틸 공중합체, 히드록시프로필메틸셀룰로오스 프탈레이트 및 히드록시프로필메틸셀룰로오스 아세테이트 숙시네이트로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제1항 내지 제9항 중 어느 한 항에 있어서, 저분자량 산성 물질 및 항산화제 중 하나 이상을 첨가하는 것을 추가로 포함하는 항치매 약물 안정화 방법.
- 제10항에 있어서, 저분자량 산성 물질이 카르복실산, 술폰산, 히드록시산, 산성 아미노산 및 무기산으로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제10항 또는 제11항에 있어서, 저분자량 산성 물질이 히드록시산, 산성 아미노산 및 무기산으로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제10항 내지 제12항 중 어느 한 항에 있어서, 저분자량 산성 물질이 숙신산, 타르타르산, 시트르산, 푸마르산, 말레산, 말산, 아스파르트산, 글루탐산, 글루탐산 히드로클로라이드, 염산 및 인산으로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제10항 내지 제13항 중 어느 한 항에 있어서, 저분자량 산성 물질이 숙신산, 타르타르산, 시트르산, 말산, 아스파르트산, 글루탐산, 글루탐산 히드로클로라이드, 염산 및 인산으로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 제10항 내지 제14항 중 어느 한 항에 있어서, 항산화제가 아스코르브산, 황 함유 아미노산, 히드로퀴논 유도체 및 토코페롤로 이루어지는 군으로부터 선택되는 하나 이상의 물질인 항치매 약물 안정화 방법.
- 항치매 약물과 고분자량 염기성 물질의 접촉에 의해 생성되는 항치매 약물의 분해물을 억제하기 위한 고분자량 산성 물질의 용도.
- 항치매 약물과 고분자량 염기성 물질의 접촉에 의해 생성되는 항치매 약물의 분해물을 억제하기 위한 저분자량 산성 물질 및 항산화제 중 하나 이상 및 고분자량 산성 물질의 용도.
- 항치매 약물 및 고분자량 염기성 물질을 포함하며, 항치매 약물을 안정화시키기 위한 고분자량 산성 물질을 추가로 포함하는 제약 조성물.
- 제18항에 있어서, 항치매 약물을 안정화시키기 위한 저분자량 산성 물질 및 항산화제 중 하나 이상을 추가로 포함하는 제약 조성물.
- 제18항에 있어서, 항치매 약물, 고분자량 염기성 물질 및 항치매 약물을 안정화시키기 위한 고분자량 산성 물질의 혼합물을 포함하는 매트릭스를 포함하는 제약 조성물.
- 제20항에 있어서, 항치매 약물을 안정화시키기 위한 저분자량 산성 물질 및 항산화제 중 하나 이상이 매트릭스 내에 혼합되어 있는 제약 조성물.
- 제18항에 있어서, 항치매 약물을 포함하는 코어 및 코어를 피복하는 고분자량 염기성 물질을 포함하는 코팅층을 포함하며, 고분자량 산성 물질은 코어 및 코팅층 중 하나 이상 내에 혼합되어 있는 제약 조성물.
- 제22항에 있어서, 항치매 약물을 안정화시키기 위한 저분자량 산성 물질 및 항산화제 중 하나 이상이 코어 및 코팅층 중 하나 이상에 추가로 혼합되어 있는 제약 조성물.
- 제18항 내지 제23항 중 어느 한 항에 있어서, 서방성 제제인 제약 조성물.
- 제18항 내지 제24항 중 어느 한 항에 있어서, 고분자량 산성 물질이 장용성 중합체 물질인 제약 조성물.
- 도네페질 또는 그의 제약학적으로 허용되는 염,고분자량 염기성 물질, 및고분자량 산성 물질을 포함하는 매트릭스형 서방성 제제.
- 제26항에 있어서, 저분자량 산성 물질 및 항산화제 중 하나 이상을 추가로 포함하는 매트릭스형 서방성 제제.
- 항치매 약물 및 고분자량 염기성 물질을 혼합하는 단계, 및혼합물을 과립화하는 단계를 포함하며,항치매 약물을 안정화시키기 위한 고분자량 산성 물질을 혼합 단계 및 과립화 단계 중 하나 이상의 단계 중에 항치매 약물 및 고분자량 염기성 물질의 혼합물에 첨가하는, 제약 조성물 제조 방법.
- 제28항에 있어서, 고분자량 산성 물질을 분말로서 첨가하는 제조 방법.
- 제28항 또는 제29항에 있어서, 항치매 약물을 안정화시키기 위한 저분자량 산성 물질 및 항산화제 중 하나 이상을 혼합 단계 및 과립화 단계 중 하나 이상의 단계 중에 항치매 약물 및 고분자량 염기성 물질의 혼합물에 추가로 첨가하는, 제조 방법.
- 제29항에 있어서, 저분자량 산성 물질 및 항산화제 중 하나 이상을 용액 또는 현탁액으로서 첨가하는 제조 방법.
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JP2004376770 | 2004-12-27 | ||
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JP2005041492 | 2005-02-18 |
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KR100866720B1 KR100866720B1 (ko) | 2008-11-05 |
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US (2) | US8481565B2 (ko) |
EP (1) | EP1830886B1 (ko) |
JP (2) | JP2008525313A (ko) |
KR (1) | KR100866720B1 (ko) |
AU (1) | AU2005320547B2 (ko) |
BR (1) | BRPI0518396A2 (ko) |
CA (1) | CA2592605C (ko) |
HK (1) | HK1112399A1 (ko) |
IL (1) | IL183650A (ko) |
MX (1) | MX2007007836A (ko) |
NO (1) | NO20073482L (ko) |
NZ (1) | NZ555693A (ko) |
RU (1) | RU2401125C2 (ko) |
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Cited By (1)
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WO2016175546A3 (ko) * | 2015-04-27 | 2016-12-22 | 주식회사 네비팜 | 리바스티그민 함유 서방출 의약조성물 |
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US20090208579A1 (en) * | 2004-12-27 | 2009-08-20 | Eisai R & D Management Co., Ltd. | Matrix Type Sustained-Release Preparation Containing Basic Drug or Salt Thereof, and Method for Manufacturing the Same |
RU2401125C2 (ru) | 2004-12-27 | 2010-10-10 | Эйсай Ар Энд Ди Менеджмент Ко., Лтд. | Способ стабилизации лекарственного средства против деменции |
US20070129402A1 (en) * | 2004-12-27 | 2007-06-07 | Eisai Research Institute | Sustained release formulations |
WO2006118265A1 (ja) * | 2005-04-28 | 2006-11-09 | Eisai R & D Management Co., Ltd. | 抗痴呆薬を含有する組成物 |
KR101408500B1 (ko) * | 2006-12-01 | 2014-06-17 | 닛토덴코 가부시키가이샤 | 안정화된 도네페질 함유 접착 제제 |
WO2008066179A1 (fr) * | 2006-12-01 | 2008-06-05 | Nitto Denko Corporation | Préparation d'absorption percutanée |
CA2671000C (en) * | 2006-12-01 | 2014-01-21 | Nitto Denko Corporation | Method for suppressing coloring of adhesive preparation containing donepezil and method for reducing amounts of donepezil-related substances formed |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2016175546A3 (ko) * | 2015-04-27 | 2016-12-22 | 주식회사 네비팜 | 리바스티그민 함유 서방출 의약조성물 |
CN107530290A (zh) * | 2015-04-27 | 2018-01-02 | 株式会社那笔制药 | 含利凡斯的明的缓释性医药组合物 |
US10835497B2 (en) | 2015-04-27 | 2020-11-17 | Navipharm Co., Ltd. | Rivastigmine-containing sustained-release pharmaceutical composition |
CN107530290B (zh) * | 2015-04-27 | 2021-04-27 | 株式会社那笔制药 | 含利凡斯的明的缓释性医药组合物 |
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RU2007128767A (ru) | 2009-02-10 |
EP1830886A4 (en) | 2012-10-10 |
RU2401125C2 (ru) | 2010-10-10 |
BRPI0518396A2 (pt) | 2008-11-18 |
MX2007007836A (es) | 2007-08-20 |
NO20073482L (no) | 2007-09-27 |
AU2005320547A1 (en) | 2006-07-06 |
EP1830886A1 (en) | 2007-09-12 |
AU2005320547B2 (en) | 2009-02-05 |
IL183650A (en) | 2013-12-31 |
KR100866720B1 (ko) | 2008-11-05 |
NZ555693A (en) | 2010-10-29 |
WO2006070930A1 (en) | 2006-07-06 |
CA2592605A1 (en) | 2006-07-06 |
US20080213368A1 (en) | 2008-09-04 |
HK1112399A1 (zh) | 2008-09-05 |
JP2008525313A (ja) | 2008-07-17 |
CA2592605C (en) | 2010-12-07 |
JP2012144568A (ja) | 2012-08-02 |
JP5514249B2 (ja) | 2014-06-04 |
US8507527B2 (en) | 2013-08-13 |
IL183650A0 (en) | 2007-09-20 |
US20100152164A1 (en) | 2010-06-17 |
EP1830886B1 (en) | 2016-04-13 |
US8481565B2 (en) | 2013-07-09 |
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